WO2003081712A3 - Gitterelement zum filtern von wellenlängen ≤ 100nm - Google Patents

Gitterelement zum filtern von wellenlängen ≤ 100nm Download PDF

Info

Publication number
WO2003081712A3
WO2003081712A3 PCT/EP2003/002419 EP0302419W WO03081712A3 WO 2003081712 A3 WO2003081712 A3 WO 2003081712A3 EP 0302419 W EP0302419 W EP 0302419W WO 03081712 A3 WO03081712 A3 WO 03081712A3
Authority
WO
WIPO (PCT)
Prior art keywords
grating
grating element
filtering wavelengths
individual
wavelengths
Prior art date
Application number
PCT/EP2003/002419
Other languages
English (en)
French (fr)
Other versions
WO2003081712A2 (de
Inventor
Klaus Heidemann
Karlfried Osterried
Original Assignee
Zeiss Carl Smt Ag
Klaus Heidemann
Karlfried Osterried
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Klaus Heidemann, Karlfried Osterried filed Critical Zeiss Carl Smt Ag
Priority to AU2003212324A priority Critical patent/AU2003212324A1/en
Priority to JP2003579308A priority patent/JP2005521107A/ja
Priority to EP03708203A priority patent/EP1485759A2/de
Publication of WO2003081712A2 publication Critical patent/WO2003081712A2/de
Publication of WO2003081712A3 publication Critical patent/WO2003081712A3/de
Priority to US10/945,626 priority patent/US20050180013A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

Die Erfindung betrifft ein Gitterelement zum Filtern von Wellenlängen ≤ 100 nm mit einer Vielzahl von Einzelgitterelementen, wobei die Einzelgitterelemente Gitterli­nien, ergebend eine Gitterperiodizität, aufweisen. Die Erfindung ist dadurch gekennzeichnet, dass die Einzelgitterelemente in Rich­tung der Strahlen eines Strahlbüschels, das auf das Gitterelement auftrifft, hinter­einander auf einer gekrümmten Trägerfläche relativ zu der durch das Gitterele­ment aufgespannten Ebene angeordnet sind.
PCT/EP2003/002419 2002-03-21 2003-03-10 Gitterelement zum filtern von wellenlängen ≤ 100nm WO2003081712A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2003212324A AU2003212324A1 (en) 2002-03-21 2003-03-10 Grating element for filtering wavelengths d 100nm
JP2003579308A JP2005521107A (ja) 2002-03-21 2003-03-10 １００ｎｍ以下の波長を濾光するための格子素子
EP03708203A EP1485759A2 (de) 2002-03-21 2003-03-10 Gitterelement zum filtern von wellenlängen = 100nm
US10/945,626 US20050180013A1 (en) 2002-03-21 2004-09-21 Grating element for filtering wavelengths < 100 nm

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2002112691 DE10212691A1 (de) 2002-03-21 2002-03-21 Gitterelement zum Filtern von Wellenlängen 100 nm
DE10212691.7 2002-03-21

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/945,626 Continuation US20050180013A1 (en) 2002-03-21 2004-09-21 Grating element for filtering wavelengths < 100 nm

Publications (2)

Publication Number Publication Date
WO2003081712A2 WO2003081712A2 (de) 2003-10-02
WO2003081712A3 true WO2003081712A3 (de) 2004-03-04

Family

ID=27798029

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/002419 WO2003081712A2 (de) 2002-03-21 2003-03-10 Gitterelement zum filtern von wellenlängen ≤ 100nm

Country Status (5)

Country Link
EP (1) EP1485759A2 (de)
JP (1) JP2005521107A (de)
AU (1) AU2003212324A1 (de)
DE (1) DE10212691A1 (de)
WO (1) WO2003081712A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7821900B2 (en) * 2008-05-15 2010-10-26 Northrop Grumman Systems Corporation Diffractive optical element and method of designing the same
NL2004816A (en) * 2009-07-07 2011-01-10 Asml Netherlands Bv Euv radiation generation apparatus.
DE102011003145A1 (de) 2010-02-09 2011-08-11 Carl Zeiss SMT GmbH, 73447 Optisches System mit Blendeneinrichtung
JP5637702B2 (ja) 2010-03-09 2014-12-10 キヤノン株式会社 露光装置およびデバイス製造方法
DE102017206066A1 (de) * 2017-04-10 2018-10-11 Anvajo GmbH Spektrometer
DE102021210671A1 (de) 2021-09-24 2022-12-01 Carl Zeiss Smt Gmbh Intensitätsanpassungsfilter für eine optische anordnung und optische anordnung mit einem entsprechenden intensitätsanpassungsfilter sowie verfahren zu dessen herstellung

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04120717A (ja) * 1990-09-12 1992-04-21 Nec Corp Ｘ線露光装置
EP0884736A1 (de) * 1997-06-11 1998-12-16 Istituto Nazionale Di Fisica Nucleare Mehrstufiger pseudo-sphärischer Diffraktor, hergestellt mit konstanter Stufenbreite (mehrstufiger Monochromator)
US6285497B1 (en) * 1998-08-06 2001-09-04 Euv Llc Diffractive element in extreme-UV lithography condenser
US20020097385A1 (en) * 2000-10-10 2002-07-25 Asm Lithography B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04120717A (ja) * 1990-09-12 1992-04-21 Nec Corp Ｘ線露光装置
EP0884736A1 (de) * 1997-06-11 1998-12-16 Istituto Nazionale Di Fisica Nucleare Mehrstufiger pseudo-sphärischer Diffraktor, hergestellt mit konstanter Stufenbreite (mehrstufiger Monochromator)
US6285497B1 (en) * 1998-08-06 2001-09-04 Euv Llc Diffractive element in extreme-UV lithography condenser
US20020097385A1 (en) * 2000-10-10 2002-07-25 Asm Lithography B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 016, no. 379 (E - 1247) 13 August 1992 (1992-08-13) *

Also Published As

Publication number Publication date
DE10212691A1 (de) 2003-10-02
EP1485759A2 (de) 2004-12-15
AU2003212324A1 (en) 2003-10-08
AU2003212324A8 (en) 2003-10-08
JP2005521107A (ja) 2005-07-14
WO2003081712A2 (de) 2003-10-02

Similar Documents

Publication Publication Date Title
EP0965864A3 (de) Diffraktives optisches Element
EP1072906A3 (de) Diffraktives optisches Element
DE60227840D1 (de) Nanokristlallstrukturen
EP1043110A3 (de) Verfahren zur Bearbeitung von keramischen Grünfolien und Vorrichtung zur Bearbeitung der keramischen Grünfolien
WO2003091042A3 (de) Sicherheitselement mit maetallbeschictungen
EP1753104A3 (de) Halbleiterlaser
WO2005051675A3 (en) Security printing using a diffraction grating
GB2429843A (en) Semiconductor structure processing using multiple laser beam spots
DE68912656D1 (de) Durch Beugungsgitter abgestimmter Laser.
IL136849A0 (en) Optical dynamic devices particularly for beam steering
WO2001020372A3 (en) Athermal and high throughput optical gratings
EP1239308A3 (de) Drahtgitter-Polarisator
WO2002064556A3 (en) Complex carbohydrate arrays and methods for the manufacture and uses thereof
ATE387015T1 (de) Verfahren zur zweidimensionalen quantisierung für das abtasten der strahlrichtung einer antennengruppe
WO2002071132A3 (en) Methods and apparatus for diffractive optical processing using an actuatable structure
CA2319139A1 (en) Surface pattern
WO2003081712A3 (de) Gitterelement zum filtern von wellenlängen ≤ 100nm
CA2249670A1 (en) Glass wave guide element and method of manufacturing the same
TW200640099A (en) Semiconductor laser apparatus
EP1239310A3 (de) Halbleiterchip mit einem Wellenleitergitter, Methode zur Herstellung eines derartigen Halbleiterchips und Modul mit einem derartigen Halbleiterchip
EP1300705A3 (de) Optischer Multiplexer/Demultiplexer und Abstimmverfahren
AU1966999A (en) Method for producing transgenic plants with modified 5-aminolevulinic acid biosynthesis, method for identifying 5-aminolevulinic acid synthesis effectors
EP1801623A3 (de) Optischer Multiplexer für optisches Aufzeichnungs/Wiedergabe-Gerät und Herstellungsverfahren dafür
WO2002086112A3 (en) Nucleic acid molecules encoding starch degrading enzymes
WO2003035881A3 (en) Stress tolerant plants

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SC SD SE SG SK SL TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2003708203

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2003579308

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 10945626

Country of ref document: US

WWP Wipo information: published in national office

Ref document number: 2003708203

Country of ref document: EP

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642