WO2003068671A2 - Verfahren zur herstellung einer sensor- oder aktuatoranordnung sowie sensor- oder aktuatoranordnung - Google Patents
Verfahren zur herstellung einer sensor- oder aktuatoranordnung sowie sensor- oder aktuatoranordnung Download PDFInfo
- Publication number
- WO2003068671A2 WO2003068671A2 PCT/EP2003/001222 EP0301222W WO03068671A2 WO 2003068671 A2 WO2003068671 A2 WO 2003068671A2 EP 0301222 W EP0301222 W EP 0301222W WO 03068671 A2 WO03068671 A2 WO 03068671A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- protective cover
- sensor
- chip
- actuator
- channel
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
- B81B7/0061—Packages or encapsulation suitable for fluid transfer from the MEMS out of the package or vice versa, e.g. transfer of liquid, gas, sound
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/04—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
Definitions
- the invention relates to a method for producing a sensor or actuator arrangement, wherein at least one sensor or at least one actuator is provided on or in a chip, the chip being covered with a first protective cover and at least one channel to a sensor or to an actuator is provided.
- the invention further relates to a method for producing a sensor or actuator arrangement, wherein a plurality of chips are arranged on a wafer, at least one sensor or at least one actuator being provided on or in a chip, the wafer being covered with a first protective cover, and wherein at least one channel to a sensor or to an actuator is provided.
- the invention further relates to a sensor or actuator arrangement, at least one sensor or at least one actuator being provided on or in a chip, the chip being covered with a first protective cover and at least one channel being provided to a sensor or to an actuator.
- the invention further relates to a sensor or actuator arrangement, a plurality of chips being arranged on a wafer, at least one sensor or at least one actuator being provided on or in a chip, the wafer being covered with a first protective cover and at least one channel being closed a sensor or an actuator is provided.
- a sensor or actuator arrangement a plurality of chips being arranged on a wafer, at least one sensor or at least one actuator being provided on or in a chip, the wafer being covered with a first protective cover and at least one channel being closed a sensor or an actuator is provided.
- a sensor e.g. a chemical sensor, a micromirror field, an acceleration sensor or an optoelectronic sensor is arranged, which is covered with a protective cover.
- the protective cover is arranged at a distance from the sensor by means of spacers, so that an externally sealed cavity is formed between the protective cover and the sensor.
- a first device-related solution to this problem is described in claim 20.
- a second device solution to this problem is described in claim 21 '.
- the inventive method according to claim 1 provides to provide at least one sensor or at least one actuator on a chip and to cover the chip with a first protective cover which is designed as an interface between the sensor or the actuator on the one hand and the environment on the other.
- An adhesive layer can be provided between the chip and the first protective cover, which is formed alone or together with the first protective cover as an interface between the sensor or the actuator on the one hand and the environment on the other.
- the protective cover and / or the adhesive layer is designed as a receiving channel for a sensor or as a transmitting channel for an actuator. This channel running laterally to the surface of the chip leads from one side of the arrangement to the sensor or to the actuator.
- the method described in claim 2 differs from that described in claim 1 in that the first protective cover is applied to a multi-chip wafer, which is then sawn to obtain the individual chips with the protective cover, while in the method according to claim 1 the protective cover is only applied to the individual chips after the wafer has been sawn.
- claim 20 relates to a sensor or actuator arrangement in which the protective cover is attached to the chip, while in the device according to claim 21 the protective cover is applied to the wafer, which is then sawn. In one case, the protective cover is therefore only after
- the channel running from one side of the arrangement to the sensor or to the actuator is guided through the adhesive layer.
- the channel running from one side of the arrangement to the sensor or to the actuator is guided through the protective cover.
- the channel running from one side of the arrangement to the sensor or to the actuator is guided through both the adhesive layer and the protective cover.
- Another exemplary embodiment of the invention provides for a hole to be worked into the protective cover above the sensor or actuator, so that the sensor or actuator is exposed in this hole.
- the reaction volume is preferably determined by the dimensions of this hole.
- the channel according to the invention leads from one side of the chip to the hole.
- Another exemplary embodiment of the invention provides at least one inlet hole and at least one outlet hole in the protective cover, which are connected to one another via at least one channel.
- a sensor or an actuator is freely accessible in this channel.
- the inlet hole and the outlet hole can be connected to one another via three channels.
- a sensor is arranged in each channel.
- the sensors arranged in the three channels work completely independently of each other.
- the protective cover to be made translucent, e.g. can be designed as an optical filter, as an optical waveguide or as an optical lens.
- the protective cover covers the connection points of the chip against a medium to be examined, e.g. protects against an aggressive gas or liquid.
- a further exemplary embodiment of the invention provides for additional but removable protective covers to be attached to the first protective cover, which protective covers, if appropriate, can also be designed as an interface for the sensor to the environment.
- FIG. 1 shows a first exemplary embodiment of the invention in a perspective view
- FIG. 2 shows a second exemplary embodiment in a perspective view
- FIG. 3 shows a third exemplary embodiment in a perspective view
- FIG. 4 shows a fourth exemplary embodiment in a perspective view
- FIG. 5 shows a section through the fourth exemplary embodiment
- FIG. 6 shows a fifth exemplary embodiment in a perspective view
- Figure 7 shows a sixth embodiment in perspective view
- FIG. 8 shows a seventh exemplary embodiment in plan view
- Figure 9 shows an eighth embodiment in perspective view
- Figure 10 shows a ninth embodiment of the invention in an exploded view.
- Figure 1 shows a first embodiment of the invention in perspective view.
- a protective cover AI is glued using an adhesive KL.
- a continuous channel KL is incorporated into the adhesive layer KL, in which the sensor S1 of the chip C is freely accessible.
- a liquid or gaseous medium can flow through the channel K1.
- the protective cover AI can be made translucent, for example, so that the reaction space above the sensor S1 can be observed.
- the channel K1 preferably determines the reaction volume. Because the channel KL has a height that corresponds to the thickness of the adhesive layer KL, only the adhesive layer KL has to be structured. This embodiment is therefore particularly simple to manufacture.
- the channel KL is guided through the protective cover AI, while in the exemplary embodiment shown in FIG. 3 it is guided both through the adhesive layer KL and through the protective cover.
- FIG. 4 shows a fourth exemplary embodiment of the invention in a perspective view.
- a protective cover AI is glued to a chip C by means of an adhesive KL, in which a sensor S1 or an actuator is embedded.
- a hole L is incorporated into the protective cover AI above the sensor S1, so that the sensor S1 is accessible from above through the hole L.
- the channel KL can be guided through the adhesive layer KL, through the protective cover AI or both. Through the hole L and the channel Kl e.g. flow a gaseous or liquid medium.
- FIG. 5 shows a section through the fourth exemplary embodiment.
- an optical filter F sits on the sensor S1 embedded in the chip C.
- FIG. 6 shows a fifth exemplary embodiment of the invention.
- a protective cover AI is glued onto a chip C with a sensor S1 by means of an adhesive KL.
- a channel Kl runs through the protective cover AI and the adhesive layer KL from one side to the opposite side.
- a hole L is worked into the protective cover AI from above.
- the channel Kl and the hole L intersect.
- At the intersection of the Kl and the hole L is a sensor S1 or an actuator of the chip C.
- the reaction volume is preferably defined by the hole L and the channel KL.
- the protective cover AI is made of a translucent material, such as glass, to observe the reaction volume.
- the channel KL can, for example, only be guided through the adhesive layer KL or only through the protective cover AI.
- Figure 7 shows a sixth embodiment of the invention in perspective view.
- a protective cover AI is glued onto a chip C by means of an adhesive KL, into which an inlet hole E and an outlet hole A are made from above.
- the inlet hole E and the outlet hole A are connected to one another in the protective cover AI and in the adhesive layer KL via a channel KL in which a sensor S1 or an actuator of the chip C is located.
- a gaseous or liquid medium can flow or flow into the inlet hole E and from there via the channel Kl to the outlet hole A, where it flows out or flows out again.
- the inlet hole E, the channel K1 and the outlet hole A preferably determine the reaction volume.
- the protective cover AI from a transparent material, such as Glass.
- a seventh exemplary embodiment is shown in plan view in FIG.
- a protective cover AI is glued to a chip C by means of an adhesive KL.
- an inlet hole E and an outlet hole A are worked into the upper side of the protective cover and are connected to one another via a first channel K1, a second channel K2 and a third channel K3.
- a sensor S1 to S3 or an actuator of the chip C is arranged in each channel K1 to K3. Sensors and actuators can also be combined in channels K1 to K3.
- the seventh embodiment is not limited to an inlet hole, an outlet hole and three channels.
- the number of inlet holes, outlet holes and channels is arbitrary.
- reaction volumes are preferably defined by the channels and the holes.
- the protective cover AI e.g. made of a translucent material such as Glass.
- a glass carrier G on the underside of which first contacts, the so-called land grid array pads LP, are arranged, is glued with its top to the underside of a chip C by means of an adhesive KL, on the top of which second contacts, the so-called bond pads BP are arranged, which are connected to the land grid array pads LP by means of connections V.
- a protective cover AI is glued using an adhesive KL.
- a hole L incorporated, at the bottom of which is a sensor S1 or an actuator of the chip C.
- the reaction volume is defined by hole L.
- the protective cover AI is preferably made of a translucent material, such as glass.
- FIG. 9 A ninth exemplary embodiment of the invention is shown in an exploded view in FIG.
- a first protective cover AI is glued by means of an adhesive KL, in the upper side of which a hole L is made, which leads to a sensor S1 or actuator arranged on the chip C or the Si wafer ,
- a channel Kl leads from one side of the arrangement to the hole L.
- the channel Kl can e.g. only through the adhesive layer KL, only through the first protective cover AI or both.
- Contact points LP are arranged on the underside of the chip C or the Si wafer.
- a sealing coating D is applied to the top of the first protective cover AI, on which sits a second removable protective cover A2, which closes off the reaction volume formed by the hole L.
- the second protective cover A2 is preferably made of a translucent material so that the reaction volume can be easily observed.
- the second protective cover A2 can be an optical filter in order to irradiate the reaction volume with light of a precisely defined frequency.
- Chemical sensors, mechanical sensors, acceleration sensors or optoelectronic see sensors such as photodiodes are provided.
- a light emitting diode can be used as an actuator.
- the invention is distinguished by the advantage that on the one hand the electrical contacts and the chip are reliably protected, but on the other hand parameters of a liquid or a gas can be measured or determined by means of the sensor.
- the number of holes and channels made in the protective cover is arbitrary. Any combination of holes and channels can be realized, which can be connected to one another, but need not necessarily be.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Micromachines (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Automatic Analysis And Handling Materials Therefor (AREA)
- Casings For Electric Apparatus (AREA)
- Mounting Of Printed Circuit Boards And The Like (AREA)
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03706452A EP1474357A2 (de) | 2002-02-16 | 2003-02-07 | Verfahren zur herstellung einer sensor-oder aktuatoranordnung sowie sensor - oder aktuatoranordnung |
IL16354503A IL163545A0 (en) | 2002-02-16 | 2003-02-07 | Method for producing a sensor or actuator arrangement, and corresponding sensor or actuator arrangement |
JP2003567815A JP2005518525A (ja) | 2002-02-16 | 2003-02-07 | センサーまたはアクチュエータ配列の製造方法ならびにセンサーまたはアクチュエータ配列 |
AU2003208812A AU2003208812A1 (en) | 2002-02-16 | 2003-02-07 | Method for producing a sensor or actuator arrangement, and corresponding sensor or actuator arrangement |
US10/504,738 US7592195B2 (en) | 2002-02-16 | 2003-02-07 | Method for producing a sensor or actuator arrangement, and corresponding sensor or actuator arrangement |
KR10-2004-7012681A KR20040089636A (ko) | 2002-02-16 | 2003-02-07 | 센서 또는 액츄에이터 장치의 제조 방법과 센서 또는액츄에이터 장치 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10206464A DE10206464A1 (de) | 2002-02-16 | 2002-02-16 | Verfahren zur Herstellung einer Sensor- oder Aktuatoranordnung sowie Sensor- oder Aktuatoranordnung |
DE10206464.4 | 2002-02-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003068671A2 true WO2003068671A2 (de) | 2003-08-21 |
WO2003068671A3 WO2003068671A3 (de) | 2003-12-24 |
Family
ID=27635024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/001222 WO2003068671A2 (de) | 2002-02-16 | 2003-02-07 | Verfahren zur herstellung einer sensor- oder aktuatoranordnung sowie sensor- oder aktuatoranordnung |
Country Status (8)
Country | Link |
---|---|
US (1) | US7592195B2 (de) |
EP (1) | EP1474357A2 (de) |
JP (1) | JP2005518525A (de) |
KR (1) | KR20040089636A (de) |
AU (1) | AU2003208812A1 (de) |
DE (1) | DE10206464A1 (de) |
IL (1) | IL163545A0 (de) |
WO (1) | WO2003068671A2 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1772731A2 (de) * | 2005-10-07 | 2007-04-11 | Micronas GmbH | Integrierte Sensoranordnung |
DE102007057903A1 (de) * | 2007-11-29 | 2009-06-04 | Continental Automotive Gmbh | Sensormodul und Verfahren zur Herstellung des Sensormoduls |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005026528B4 (de) * | 2005-06-08 | 2019-08-22 | Infineon Technologies Ag | Halbleiterbauteil mit mindestens einem Medienkanal und Verfahren zur Herstellung von Halbleiterbauteilen jeweils mit mindestens einem Medienkanal |
NL2003340C2 (en) * | 2009-08-10 | 2011-02-14 | Univ Delft Tech | Method of manufacturing a micro unit and micro unit for use in a microscope. |
JP5969950B2 (ja) * | 2012-04-20 | 2016-08-17 | 富士フイルム株式会社 | 放射線画像検出装置及び放射線撮影システム |
US9324984B2 (en) * | 2013-02-01 | 2016-04-26 | GM Global Technology Operations LLC | Direct formation of a separator with a protective edge on an electrode |
KR101707002B1 (ko) * | 2015-03-04 | 2017-02-15 | 숭실대학교산학협력단 | 복합 감지형 센서 및 제조방법 |
US10056590B2 (en) | 2016-08-31 | 2018-08-21 | GM Global Technology Operations LLC | Methods of making separators for lithium ion batteries |
EP3301072B1 (de) * | 2016-09-30 | 2024-02-21 | Sciosense B.V. | Halbleiterbauelement und verfahren zur herstellung des halbleiterbauelements |
US10680222B2 (en) | 2017-12-19 | 2020-06-09 | GM Global Technology Operations LLC | Method of making thermally-stable composite separators for lithium batteries |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0488947A1 (de) * | 1990-11-26 | 1992-06-03 | Ciba-Geigy Ag | Detektorzelle |
EP0545284A1 (de) * | 1991-11-29 | 1993-06-09 | Canon Kabushiki Kaisha | Messvorrichtung und Messsystem für Proben |
WO1995025275A1 (de) * | 1994-03-12 | 1995-09-21 | Meinhard Knoll | Miniaturisierte durchflussmesskammer mit integrierten chemo- und/oder biosensorelementen |
WO1998050154A1 (en) * | 1997-05-08 | 1998-11-12 | University Of Minnesota | Integrated microchip genetic testing system |
WO1999033559A1 (en) * | 1997-12-24 | 1999-07-08 | Cepheid | Integrated fluid manipulation cartridge |
WO2001043181A1 (en) * | 1999-12-10 | 2001-06-14 | Shellcase Ltd. | Methods for producing packaged integrated circuit devices & packaged integrated circuit devices produced thereby |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1187227A3 (de) * | 1989-05-31 | 2002-08-28 | Osram Opto Semiconductors GmbH & Co. OHG | Oberflächenmontierbares Opto-Bauelement und Verfahren zum Herstellen desselben |
DE4106721A1 (de) * | 1991-03-02 | 1992-09-10 | Ant Nachrichtentech | Anordnung zur ankopplung von lichtwellenleiterenden an empfangselemente |
US5323656A (en) * | 1992-05-12 | 1994-06-28 | The Foxboro Company | Overpressure-protected, polysilicon, capacitive differential pressure sensor and method of making the same |
DE4232608C2 (de) * | 1992-09-29 | 1994-10-06 | Bosch Gmbh Robert | Verfahren zum Herstellen eines Deckels für eine integriert optische Schaltung |
DE4318407A1 (de) * | 1993-06-03 | 1994-12-08 | Rossendorf Forschzent | Mikrokapillare mit integrierten chemischen Mikrosensoren und Verfahren zu ihrer Herstellung |
US5369057A (en) * | 1993-12-21 | 1994-11-29 | Delco Electronics Corporation | Method of making and sealing a semiconductor device having an air path therethrough |
JPH08193897A (ja) * | 1995-01-19 | 1996-07-30 | Mitsubishi Electric Corp | 半導体圧力センサ |
JPH09222372A (ja) * | 1996-02-19 | 1997-08-26 | Mitsubishi Electric Corp | 半導体式センサ |
US5824204A (en) * | 1996-06-27 | 1998-10-20 | Ic Sensors, Inc. | Micromachined capillary electrophoresis device |
DE19755734A1 (de) * | 1997-12-15 | 1999-06-24 | Siemens Ag | Verfahren zur Herstellung eines oberflächenmontierbaren optoelektronischen Bauelementes |
WO1999036941A2 (en) * | 1998-01-15 | 1999-07-22 | Cornell Research Foundation, Inc. | Trench isolation for micromechanical devices |
JPH11295172A (ja) * | 1998-04-06 | 1999-10-29 | Denso Corp | 半導体圧力センサ |
US6278167B1 (en) * | 1998-08-14 | 2001-08-21 | Infineon Technologies Ag | Semiconductor sensor with a base element and at least one deformation element |
DE19840829B4 (de) * | 1998-09-07 | 2005-10-20 | Siemens Ag | Verfahren zum Befestigen eines mikromechanischen Sensors in einem Gehäuse und Sensoranordnung |
WO2000047969A1 (en) * | 1999-02-15 | 2000-08-17 | Yamatake Corporation | Semiconductor pressure sensor |
DE10019488B4 (de) * | 2000-04-19 | 2005-12-01 | Infineon Technologies Ag | Oberflächenmontierbares optoelektronisches Bauelement, einteiliger Zuschnitt zur Herstellung eines gehäusten oberflächenmontierbaren optoelektronischen Bauelementes und Gehäuse für oberflächenmontierbare optolektronische Schaltungen |
US6548895B1 (en) * | 2001-02-21 | 2003-04-15 | Sandia Corporation | Packaging of electro-microfluidic devices |
US7033664B2 (en) * | 2002-10-22 | 2006-04-25 | Tessera Technologies Hungary Kft | Methods for producing packaged integrated circuit devices and packaged integrated circuit devices produced thereby |
US7211873B2 (en) * | 2003-09-24 | 2007-05-01 | Denso Corporation | Sensor device having thin membrane and method of manufacturing the same |
-
2002
- 2002-02-16 DE DE10206464A patent/DE10206464A1/de not_active Withdrawn
-
2003
- 2003-02-07 KR KR10-2004-7012681A patent/KR20040089636A/ko not_active Application Discontinuation
- 2003-02-07 EP EP03706452A patent/EP1474357A2/de not_active Ceased
- 2003-02-07 IL IL16354503A patent/IL163545A0/xx unknown
- 2003-02-07 WO PCT/EP2003/001222 patent/WO2003068671A2/de active Application Filing
- 2003-02-07 AU AU2003208812A patent/AU2003208812A1/en not_active Abandoned
- 2003-02-07 US US10/504,738 patent/US7592195B2/en not_active Expired - Fee Related
- 2003-02-07 JP JP2003567815A patent/JP2005518525A/ja active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0488947A1 (de) * | 1990-11-26 | 1992-06-03 | Ciba-Geigy Ag | Detektorzelle |
EP0545284A1 (de) * | 1991-11-29 | 1993-06-09 | Canon Kabushiki Kaisha | Messvorrichtung und Messsystem für Proben |
WO1995025275A1 (de) * | 1994-03-12 | 1995-09-21 | Meinhard Knoll | Miniaturisierte durchflussmesskammer mit integrierten chemo- und/oder biosensorelementen |
WO1998050154A1 (en) * | 1997-05-08 | 1998-11-12 | University Of Minnesota | Integrated microchip genetic testing system |
WO1999033559A1 (en) * | 1997-12-24 | 1999-07-08 | Cepheid | Integrated fluid manipulation cartridge |
WO2001043181A1 (en) * | 1999-12-10 | 2001-06-14 | Shellcase Ltd. | Methods for producing packaged integrated circuit devices & packaged integrated circuit devices produced thereby |
Non-Patent Citations (3)
Title |
---|
BAECHI D ET AL: "A high density microchannel network with integrated valves and photodiodes" , PROCEEDINGS OF THE IEEE 14TH. ANNUAL INTERNATIONAL CONFERENCE ON MICROELECTRO MECHANICAL SYSTEMS, MEMS 2001, INTERLAKEN, SWITZERLAND, JAN. 21 - 25, 2001, IEEE INTERNATIONAL MICRO ELECTRO MECHANICAL SYSTEMS CONFERENCE, NEW YORK, NY: IEEE, US, VOL. CON XP010534648 ISBN: 0-7803-5998-4 das ganze Dokument * |
See also references of EP1474357A2 * |
SUZUKI H ET AL: "Micromachined sensing module for pO2, pCO2, and pH and its design optimization for practical use" SENSORS AND ACTUATORS B, ELSEVIER SEQUOIA S.A., LAUSANNE, CH, Bd. 76, Nr. 1-3, 1. Juni 2001 (2001-06-01), Seiten 565-572, XP004241175 ISSN: 0925-4005 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1772731A2 (de) * | 2005-10-07 | 2007-04-11 | Micronas GmbH | Integrierte Sensoranordnung |
EP1772731A3 (de) * | 2005-10-07 | 2007-08-08 | Micronas GmbH | Integrierte Sensoranordnung |
DE102007057903A1 (de) * | 2007-11-29 | 2009-06-04 | Continental Automotive Gmbh | Sensormodul und Verfahren zur Herstellung des Sensormoduls |
DE102007057903B4 (de) * | 2007-11-29 | 2010-07-08 | Continental Automotive Gmbh | Sensormodul und Verfahren zur Herstellung des Sensormoduls |
Also Published As
Publication number | Publication date |
---|---|
US7592195B2 (en) | 2009-09-22 |
AU2003208812A1 (en) | 2003-09-04 |
IL163545A0 (en) | 2005-12-18 |
KR20040089636A (ko) | 2004-10-21 |
EP1474357A2 (de) | 2004-11-10 |
WO2003068671A3 (de) | 2003-12-24 |
US20050155411A1 (en) | 2005-07-21 |
JP2005518525A (ja) | 2005-06-23 |
DE10206464A1 (de) | 2003-08-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE10060433B4 (de) | Verfahren zur Herstellung eines Fluidbauelements, Fluidbauelement und Analysevorrichtung | |
DE102016103646B4 (de) | Integriertes photoakustisches gassensormodul | |
DE3138296C2 (de) | ||
DE102010016696B4 (de) | Halbleiter-Bauelement | |
DE19852967A1 (de) | Meßeinrichtung sowie Verfahren zu deren Herstellung | |
EP3004858B1 (de) | Verfahren zum erzeugen einer vielzahl von messbereichen auf einem chip sowie chip mit messbereichen | |
EP1869705A1 (de) | Verfahren zur herstellung gehäuster elektronischer bauelemente und gehäustes elektronisches bauelement | |
WO2003068671A2 (de) | Verfahren zur herstellung einer sensor- oder aktuatoranordnung sowie sensor- oder aktuatoranordnung | |
DE102008011153A1 (de) | Anordnung mit mindestens zwei lichtemittierenden Halbleiterbauelementen und Verfahren zur Herstellung einer Anordnung mit mindestens zwei lichtemittierenden Halbleiterbauelementen | |
DE19859693A1 (de) | Vorrichtung zum Ableiten einer Flüssigkeit aus Kapillaren | |
DE102014115597A1 (de) | Wafer-Level-Pakete mit Lücken für optoelektronische Vorrichtungen | |
DE102012107578A1 (de) | Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements | |
CH684611A5 (de) | Verfahren zur Herstellung kapazitiver Sensoren und kapazitiver Sensor. | |
DE19835769C2 (de) | Optoelektronischer Gassensor auf der Basis von Optoden | |
DE102013110320B3 (de) | Sensorvorrichtung zur Überwachung eines Schmierstoffzustands sowie Verfahren zur Fertigung der Sensorvorrichtung | |
DE102018104382A1 (de) | Optoelektronisches bauelement und herstellungsverfahren | |
EP1322947B1 (de) | Verfahren zum herstellen einer 3-d-mikrodurchflusszelle und 3-d-mikrodurchflusszelle | |
EP1397201B2 (de) | Reaktionsgefäss zur herstellung von proben | |
DE3330975A1 (de) | Verfahren und anordnung zur kapselung eines halbleiterbauelementes | |
WO2005085808A1 (de) | Mikrostrukturierter sensor | |
DE102007022518B4 (de) | Strahlungswandler, Strahlungsdetektor und Verfahren zu deren Herstellung | |
DE19716480B4 (de) | Verfahren zum Herstellen einer Vorrichtung mit einem Hohlraum zur Aufnahme eines Lichtwellenleiters | |
EP1116035A1 (de) | Vorrichtung zur messung der migrationsfähigkeit von amöboid beweglichen zellen | |
DE102018207548B3 (de) | Sensorvorrichtung mit einer hydrophoben und/oder anti-adhäsiven Schutzschicht und Verfahren zur Herstellung einer solchen Sensorvorrichtung | |
DE4105676C1 (en) | Electrostatic pump or flow velocity sensor - has seal around flow aperture mounted on surface of semiconductor device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SC SD SE SG SK SL TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2003567815 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 163545 Country of ref document: IL |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020047012681 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2003706452 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 2003706452 Country of ref document: EP |
|
REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10504738 Country of ref document: US |