WO2003030229A1 - Aligneur et procede de fabrication du dispositif - Google Patents

Aligneur et procede de fabrication du dispositif Download PDF

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Publication number
WO2003030229A1
WO2003030229A1 PCT/JP2002/009954 JP0209954W WO03030229A1 WO 2003030229 A1 WO2003030229 A1 WO 2003030229A1 JP 0209954 W JP0209954 W JP 0209954W WO 03030229 A1 WO03030229 A1 WO 03030229A1
Authority
WO
WIPO (PCT)
Prior art keywords
space
aligner
gas
substrate
optical system
Prior art date
Application number
PCT/JP2002/009954
Other languages
English (en)
Japanese (ja)
Inventor
Soichi Owa
Hiroyuki Nagasaka
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2003533329A priority Critical patent/JPWO2003030229A1/ja
Publication of WO2003030229A1 publication Critical patent/WO2003030229A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne un aligneur dans lequel des substances absorbant la lumière peuvent être évacuées de manière appropriée de l'espace entre un système optique de projection et un substrat sans avoir un quelconque effet sur l'appareil périphérique. L'aligneur est équipé d'un orifice d'alimentation en gaz destiné à fournir à l'espace entre le système optique de projection et le substrat un gaz perméable au faisceau d'énergie, et un orifice d'évacuation placé à l'extérieur de l'orifice d'alimentation en gaz, tout en étant dirigé vers l'espace et en déchargeant un gaz contenant le gaz perméable à partir dudit espace à un débit supérieur à au débit d'alimentation du gaz perméable.
PCT/JP2002/009954 2001-09-27 2002-09-26 Aligneur et procede de fabrication du dispositif WO2003030229A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003533329A JPWO2003030229A1 (ja) 2001-09-27 2002-09-26 露光装置及びデバイス製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001298265 2001-09-27
JP2001-298265 2001-09-27

Publications (1)

Publication Number Publication Date
WO2003030229A1 true WO2003030229A1 (fr) 2003-04-10

Family

ID=19119188

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/009954 WO2003030229A1 (fr) 2001-09-27 2002-09-26 Aligneur et procede de fabrication du dispositif

Country Status (3)

Country Link
JP (1) JPWO2003030229A1 (fr)
TW (1) TW571345B (fr)
WO (1) WO2003030229A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7760323B2 (en) 2005-03-04 2010-07-20 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7427461B2 (ja) * 2020-02-06 2024-02-05 キヤノン株式会社 露光装置、及び物品の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5559584A (en) * 1993-03-08 1996-09-24 Nikon Corporation Exposure apparatus
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
US20020057423A1 (en) * 2000-11-16 2002-05-16 Hideki Nogawa Exposure apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2888353B2 (ja) * 1989-10-13 1999-05-10 東京エレクトロン株式会社 露光装置
JPH047815A (ja) * 1990-04-25 1992-01-13 Fujitsu Ltd 縦型ステッパ
JP2881362B2 (ja) * 1993-01-18 1999-04-12 東京エレクトロン株式会社 露光装置
WO2001006548A1 (fr) * 1999-07-16 2001-01-25 Nikon Corporation Procede et systeme d'exposition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5559584A (en) * 1993-03-08 1996-09-24 Nikon Corporation Exposure apparatus
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
US20020057423A1 (en) * 2000-11-16 2002-05-16 Hideki Nogawa Exposure apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7760323B2 (en) 2005-03-04 2010-07-20 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing device

Also Published As

Publication number Publication date
JPWO2003030229A1 (ja) 2005-01-20
TW571345B (en) 2004-01-11

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