WO2003029789A3 - Verfahren und vorrichtung zur unterdrückung von lichtabsorption, lichtstreuung und kontamination bei wellenlängen unterhalb von 200nm - Google Patents

Verfahren und vorrichtung zur unterdrückung von lichtabsorption, lichtstreuung und kontamination bei wellenlängen unterhalb von 200nm Download PDF

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Publication number
WO2003029789A3
WO2003029789A3 PCT/EP2002/010763 EP0210763W WO03029789A3 WO 2003029789 A3 WO2003029789 A3 WO 2003029789A3 EP 0210763 W EP0210763 W EP 0210763W WO 03029789 A3 WO03029789 A3 WO 03029789A3
Authority
WO
WIPO (PCT)
Prior art keywords
light
contamination
suppression
wavelengths below
beam path
Prior art date
Application number
PCT/EP2002/010763
Other languages
English (en)
French (fr)
Other versions
WO2003029789A2 (de
Inventor
Angela Duparre
Stefan Gliech
Gunther Notni
Joerg Steinert
Original Assignee
Fraunhofer Ges Forschung
Angela Duparre
Stefan Gliech
Gunther Notni
Joerg Steinert
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Ges Forschung, Angela Duparre, Stefan Gliech, Gunther Notni, Joerg Steinert filed Critical Fraunhofer Ges Forschung
Priority to EP02779421A priority Critical patent/EP1423679A2/de
Publication of WO2003029789A2 publication Critical patent/WO2003029789A2/de
Publication of WO2003029789A3 publication Critical patent/WO2003029789A3/de

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • G01N2201/023—Controlling conditions in casing
    • G01N2201/0233—Gas purge

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Particle Accelerators (AREA)

Abstract

Reduktion der gasbedingten Lichtabsorption beziehungsweise Lichtstreuung und/oder Kontamination bei Einsatz von Licht einer Einsatzwellenlänge unterhalb von 200 nm in optischen Strahlengängen. Dies wird erreicht, indem die Strahlengang befindlichen Gase zumindest teilweise auf einen unteratmosphärischen Druck evakuiert werden und gleichzeitig oder darauffolgend ein Spülgas in den Strahlengang eingeleitet wird, der trotz dieser Spülgaseinleitung auf einem unteratmosphärischen Druck verbleibt, wobei die Gesamtabsorption in den so behandelten Strahlengang höchstens 50 % aufweist.
PCT/EP2002/010763 2001-09-25 2002-09-25 Verfahren und vorrichtung zur unterdrückung von lichtabsorption, lichtstreuung und kontamination bei wellenlängen unterhalb von 200nm WO2003029789A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP02779421A EP1423679A2 (de) 2001-09-25 2002-09-25 Verfahren und vorrichtung zur unterdrückung von lichtabsorption, lichtstreuung und kontamination bei wellenlängen unterhalb von 200nm

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10147089.4 2001-09-25
DE10147089 2001-09-25

Publications (2)

Publication Number Publication Date
WO2003029789A2 WO2003029789A2 (de) 2003-04-10
WO2003029789A3 true WO2003029789A3 (de) 2003-12-11

Family

ID=7700132

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/010763 WO2003029789A2 (de) 2001-09-25 2002-09-25 Verfahren und vorrichtung zur unterdrückung von lichtabsorption, lichtstreuung und kontamination bei wellenlängen unterhalb von 200nm

Country Status (2)

Country Link
EP (1) EP1423679A2 (de)
WO (1) WO2003029789A2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2886015B1 (fr) * 2005-05-18 2007-07-13 Commissariat Energie Atomique Procede de mesure de la porosite par ellipsometrie et dispositif mettant en oeuvre un tel procede
DE102022102292A1 (de) 2022-02-01 2023-05-04 Asml Netherlands B.V. Verfahren zum betrieb einer vakuumkammer und vakuumkammer hierfür

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4237268A1 (en) * 1991-12-09 1993-06-17 Nanometrics Inc Improving optical measurement stability in UV appts. for determining material characteristics - flushing optically disturbing gas, e.g. ozone produced by oxidation, from optical path using inert gas
US5225681A (en) * 1991-05-02 1993-07-06 Spectro Analytical Instruments Gesellschaft Fur Analytische Messgerate Mbh Gas-filled uv spectrometer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5225681A (en) * 1991-05-02 1993-07-06 Spectro Analytical Instruments Gesellschaft Fur Analytische Messgerate Mbh Gas-filled uv spectrometer
DE4237268A1 (en) * 1991-12-09 1993-06-17 Nanometrics Inc Improving optical measurement stability in UV appts. for determining material characteristics - flushing optically disturbing gas, e.g. ozone produced by oxidation, from optical path using inert gas

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
GLIECH S, ET AL: "DUV-VUV LIGHT SCATTERING MEASUREMENT OF OPTICAL COMPONENTS FOR LITHOGRAPHY APPLICATIONS", SPIE CONFERENCE ON OPTICAL METROLOGY ROADMAP FOR THE SEMICONDUCTOR, OPTICAL AND DATA STORAGE INDUSTRIES, vol. 4099, 2000, pages 74 - 81, XP009006805 *
STEINERT J, ET AL: "INSTRUMENT FOR LIGHT SCATTER MEASUREMENTS AT 157 NM AND 193 NM", TRENDS IN OPTICS AND PHOTONICS SERIES: OPTICAL INTERFERENCE COATINGS, vol. 63, 2001, pages ThA8-1 - ThA8-3, XP002235367 *
STEINERT J, ET AL: "INSTRUMENT FOR LIGHT SCATTER MEASUREMENTS AT 157 NM AND 193 NM", VORTRAG - OPTICAL INTERFERENCE COATINGS, 15 July 2001 (2001-07-15) - 20 July 2001 (2001-07-20), Banff, Canada, XP002235368 *

Also Published As

Publication number Publication date
EP1423679A2 (de) 2004-06-02
WO2003029789A2 (de) 2003-04-10

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