WO2003010366A1 - Apparatus for plating treatment - Google Patents
Apparatus for plating treatment Download PDFInfo
- Publication number
- WO2003010366A1 WO2003010366A1 PCT/JP2002/007476 JP0207476W WO03010366A1 WO 2003010366 A1 WO2003010366 A1 WO 2003010366A1 JP 0207476 W JP0207476 W JP 0207476W WO 03010366 A1 WO03010366 A1 WO 03010366A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- plating
- vessel
- plating solution
- plating treatment
- solution
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
- H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01088—Radium [Ra]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
Abstract
An apparatus for plating treatment, characterized in that at least a part of the portion contacting with a plating solution is made from a material which exhibits a lower rate of the change in surface roughness during the contact with a removing agent for deposits from the plating solution than that of a resin. For example, a storage vessel (1), a plating vessel (2), a buffer vessel (3) and a piping (9) are made from a hard glass or a vitreous silica. The apparatus allows the suppression of deposition of a plating material as a foreign matter from a plating solution on the surface of the wall of a plating vessel or the like.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/484,628 US20040206622A1 (en) | 2001-07-25 | 2002-07-24 | Apparatus for plating treatment |
KR1020047000985A KR100591706B1 (en) | 2001-07-25 | 2002-07-24 | Apparatus for Plating Treatment |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001-225130 | 2001-07-25 | ||
JP2001225130A JP4014827B2 (en) | 2001-07-25 | 2001-07-25 | Plating equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003010366A1 true WO2003010366A1 (en) | 2003-02-06 |
Family
ID=19058174
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/007476 WO2003010366A1 (en) | 2001-07-25 | 2002-07-24 | Apparatus for plating treatment |
Country Status (6)
Country | Link |
---|---|
US (1) | US20040206622A1 (en) |
JP (1) | JP4014827B2 (en) |
KR (1) | KR100591706B1 (en) |
CN (1) | CN1292099C (en) |
TW (1) | TWI292000B (en) |
WO (1) | WO2003010366A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4295032B2 (en) * | 2003-07-22 | 2009-07-15 | 大日本スクリーン製造株式会社 | Plating equipment |
JP4707941B2 (en) * | 2003-09-02 | 2011-06-22 | アルメックスPe株式会社 | Plating processing apparatus and plating processing method |
WO2005090647A1 (en) * | 2004-03-23 | 2005-09-29 | Glomax S.R.L. | Process and apparatus for the electrogalvanic coating of metal items |
CN103834974B (en) * | 2012-11-20 | 2016-10-05 | 宝山钢铁股份有限公司 | One realizes metal tape thickness of coating equally distributed horizontal electroplating bath device |
JP6180893B2 (en) * | 2013-11-13 | 2017-08-16 | 矢崎総業株式会社 | Plating equipment |
EP3000918B1 (en) * | 2014-09-24 | 2018-10-24 | topocrom systems AG | Method and device for the galvanic application of a surface coating |
KR20180081094A (en) | 2015-11-05 | 2018-07-13 | 토포크롬 시스템스 아게 | Method and apparatus for electrochemical application of surface coatings |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2535454Y2 (en) * | 1992-06-29 | 1997-05-14 | 新日本製鐵株式会社 | Metal plate double-sided electrolytic device |
WO1999040241A2 (en) * | 1998-02-04 | 1999-08-12 | Pay Yih | Method for electroplating metal coating(s) on particulates at high coating speed with high current density |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2446331A (en) * | 1944-02-14 | 1948-08-03 | William Marsh Rice Inst For Th | Electrodeposition of aluminum |
US4322281A (en) * | 1980-12-08 | 1982-03-30 | Olin Corporation | Method for controlling foaming within gas-liquid separation area |
JP2624703B2 (en) * | 1987-09-24 | 1997-06-25 | 株式会社東芝 | Method and apparatus for forming bump |
JP3308333B2 (en) * | 1993-03-30 | 2002-07-29 | 三菱電機株式会社 | Electroplating apparatus and electrolytic plating method |
US6042889A (en) * | 1994-02-28 | 2000-03-28 | International Business Machines Corporation | Method for electrolessly depositing a metal onto a substrate using mediator ions |
US5911865A (en) * | 1997-02-07 | 1999-06-15 | Yih; Pay | Method for electroplating of micron particulates with metal coatings |
US6231728B1 (en) * | 1996-11-22 | 2001-05-15 | Hubert F. Metzger | Electroplating apparatus |
US6113769A (en) * | 1997-11-21 | 2000-09-05 | International Business Machines Corporation | Apparatus to monitor and add plating solution of plating baths and controlling quality of deposited metal |
US6151558A (en) * | 1998-02-10 | 2000-11-21 | Conant; James R | Ultrasonic marine speedometer system |
US6576110B2 (en) * | 2000-07-07 | 2003-06-10 | Applied Materials, Inc. | Coated anode apparatus and associated method |
US6413390B1 (en) * | 2000-10-02 | 2002-07-02 | Advanced Micro Devices, Inc. | Plating system with remote secondary anode for semiconductor manufacturing |
-
2001
- 2001-07-25 JP JP2001225130A patent/JP4014827B2/en not_active Expired - Fee Related
-
2002
- 2002-07-24 KR KR1020047000985A patent/KR100591706B1/en not_active IP Right Cessation
- 2002-07-24 US US10/484,628 patent/US20040206622A1/en not_active Abandoned
- 2002-07-24 CN CNB028148916A patent/CN1292099C/en not_active Expired - Fee Related
- 2002-07-24 WO PCT/JP2002/007476 patent/WO2003010366A1/en active Application Filing
- 2002-07-25 TW TW091116592A patent/TWI292000B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2535454Y2 (en) * | 1992-06-29 | 1997-05-14 | 新日本製鐵株式会社 | Metal plate double-sided electrolytic device |
WO1999040241A2 (en) * | 1998-02-04 | 1999-08-12 | Pay Yih | Method for electroplating metal coating(s) on particulates at high coating speed with high current density |
Also Published As
Publication number | Publication date |
---|---|
US20040206622A1 (en) | 2004-10-21 |
KR20040019355A (en) | 2004-03-05 |
JP4014827B2 (en) | 2007-11-28 |
CN1292099C (en) | 2006-12-27 |
CN1535331A (en) | 2004-10-06 |
KR100591706B1 (en) | 2006-06-20 |
JP2003034897A (en) | 2003-02-07 |
TWI292000B (en) | 2008-01-01 |
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