WO2003005423A1 - Substrate processing apparatus - Google Patents

Substrate processing apparatus Download PDF

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Publication number
WO2003005423A1
WO2003005423A1 PCT/JP2002/006683 JP0206683W WO03005423A1 WO 2003005423 A1 WO2003005423 A1 WO 2003005423A1 JP 0206683 W JP0206683 W JP 0206683W WO 03005423 A1 WO03005423 A1 WO 03005423A1
Authority
WO
WIPO (PCT)
Prior art keywords
check
items
information
setting
unit
Prior art date
Application number
PCT/JP2002/006683
Other languages
French (fr)
Japanese (ja)
Inventor
Takashi Aiuchi
Akihito Suzuki
Hirotsugu Kamamoto
Shuichi Yonemura
Takashi Imafu
Kazuhisa Sakamoto
Original Assignee
Tokyo Electron Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Limited filed Critical Tokyo Electron Limited
Priority to JP2003511292A priority Critical patent/JPWO2003005423A1/en
Publication of WO2003005423A1 publication Critical patent/WO2003005423A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput

Definitions

  • the present invention relates to a substrate processing apparatus.
  • the photolithography process in the semiconductor device manufacturing process includes a resist coating unit for forming a resist film on the wafer surface, a developing unit for developing the exposed wafer, and a resist coating unit. Thereafter, the coating is performed by a coating and developing apparatus equipped with a plurality of processing units such as a heat processing unit for performing a heat treatment before and after the development processing.
  • a coating and developing apparatus equipped with a plurality of processing units such as a heat processing unit for performing a heat treatment before and after the development processing.
  • This coating / developing apparatus is sold by a vendor to a wafer manufacturer, and when the coating / developing apparatus is installed in a factory of the wafer manufacturer, the so-called coating / developing apparatus is called by a worker on the vendor side.
  • Start-up work is performed. This start-up work involves setting and adjusting each processing unit in the coating and developing equipment so that the operation of the coating and developing equipment can be started.
  • the start-up work is performed according to predetermined check items, and various setting values, adjustment values, etc. set by the worker at that time are written on a predetermined sheet, that is, a so-called check list creation work. Is performed.
  • the so-called checklist created at this time is intended to prevent operator settings and adjustment omissions, and to store initial setting information.
  • the check list has several tens of pages, and it takes a lot of time to complete the check list.
  • the worker's checklist creation work involved omissions and transcription errors, and it took more time to correct them. If it takes a long time to create a so-called check list, the delivery of the coating and developing processing equipment to the wafer manufacturing side will be delayed, and the start of wafer processing will also be delayed. Disclosure of the invention
  • the present invention has been made in view of the above points, and provides a substrate processing apparatus for quickly and accurately creating a check list when starting up a substrate processing apparatus such as a coating and developing apparatus.
  • An object of the present invention is to provide a processing apparatus for processing a substrate, wherein the processing apparatus is used to set specifications of various devices and members for operating the processing apparatus.
  • a setting input section for inputting setting information relating to the specified setting items; and a display section for displaying a check list screen relating to predetermined check items in the processing device, wherein the checked items include the setting items.
  • the setting information input by the setting input unit is automatically displayed in a check item column corresponding to the setting information on the check list screen.
  • the substrate processing apparatus further includes an input unit for inputting check information relating to check items that cannot be set from the setting input unit, and the check information input from the input unit is used for the check list screen.
  • the check list screen may include a check item that has already been checked and a check item that has not been checked. May be displayed so that they can be identified.
  • the check list screen may display information on an operator who has performed setting work of the processing apparatus.
  • the check list screen includes the check information of the displayed check item as a standard check of the check item. If it is different from the check information, the check item may be displayed so that it can be identified.
  • the substrate processing apparatus of the present invention may include communication means for transmitting check information on the check items displayed on the check list screen to a vendor of the processing apparatus via the Internet. .
  • the substrate processing apparatus of the present invention may include a communication unit for obtaining check information on another substrate processing apparatus.
  • the check list screen relating to the check items of the processing apparatus is displayed on the display unit.
  • the setting information input for setting the specifications of the processing device members and the like is automatically entered and displayed in a predetermined column of the check list screen. This eliminates the need for the operator to re-enter the setting information in the checklist for the specified paper, and the checklist is quickly created accordingly. Also, since the setting information that has been entered is entered directly into the checklist, there is no need for a transcription error as in the past, and the checklist can be created more accurately. Furthermore, since the checklist is displayed as a screen, the worker can proceed with the work while looking at the screen, thereby improving work efficiency. Also, if storage as paper is required, it may be printed out by hard copy or the like.
  • the specifications of the various devices and members of the processing apparatus include, for example, various units provided in the processing apparatus for processing a substrate and members constituting the unit.
  • the check items include adjustment items and confirmation items in addition to the above-mentioned setting items.
  • the check items include various items such as the processing temperature, processing humidity, wind speed in the processing unit, discharge amount of processing liquid, and discharge flow rate of each processing.
  • the apparatus further comprises an input unit for inputting check information on check items that cannot be set from the setting input unit, and the check information input from the input unit is displayed on the check list screen.
  • the check information is displayed in the column of check items corresponding to the check information, all check items can be entered on the screen of the display unit.
  • the check items that cannot be set from the setting input unit include, for example, check items that are inspected and measured by the work of workers, and the measured values are entered.
  • the check items include the center position of the substrate in each processing unit, the position of the processing liquid discharge nozzle, the reference position of the transport unit, and the like.
  • the worker can check the checked items. Items are easier to grasp, work efficiency is improved, and there is no omission of checks.
  • unchecked items and checked items may be displayed in different colors, or unset items may be extracted and displayed.
  • the information on the worker who performed the setting work displayed on the check list screen includes, for example, the name of the worker, the employee number, the name of the office to which the worker belongs, and the like.
  • the name of the worker may be described on the check list screen to provide a function as a confirmation sign for the checked items. That is, a worker's confirmation sign may be displayed for each check item on the check list screen.
  • the operator when the check information of the check item displayed on the check list screen is different from the standard check information, the operator can identify the check item. It is possible to confirm that the check information is different from the standard information, and to reconfirm the check information.
  • the standard check information may be, for example, processing information of a processing device having the same specifications, which may be a reference of a processing device serving as a predetermined reference, or a process that has already been checked and is operating normally. It may be check information of the device.
  • the substrate processing apparatus of the present invention further includes communication means for transmitting check information on the check items displayed on the check list screen to a vendor of the processing apparatus via the Internet.
  • the vendor can be notified of the settings made by the workers and the progress of the start-up work. This makes it possible to monitor the start-up work of the manager of the vendor, who is an expert, and to promptly give instructions to the workers if necessary. Also, after the work is completed, a checklist screen can be sent, and the vendor can save it as a checklist.
  • the substrate processing apparatus of the present invention further includes a communication means for obtaining check information on another substrate processing apparatus, the check information on other processing is obtained as necessary.
  • the check information on other processing is obtained as necessary.
  • FIG. 1 is a perspective view schematically showing a coating and developing treatment apparatus according to an embodiment.
  • FIG. 2 is a plan view schematically showing the configuration of the coating and developing treatment apparatus.
  • FIG. 3 is a front view of the coating and developing apparatus of FIG.
  • Figure 4 is an explanatory diagram of a longitudinal section showing the outline of the configuration of the resist coating unit.
  • FIG. 5 is a rear view of the coating and developing apparatus of FIG.
  • Figure 6 is a block diagram showing the configuration of the control section.
  • Figure 7 is an explanatory diagram showing an example of the checklist screen.
  • FIG. 8 is an explanatory diagram showing an example of the setting input screen.
  • FIG. 9 is an explanatory diagram showing an example of a setting input screen in which numerical values have been input.
  • Figure 10 is an explanatory diagram showing an example of a check list screen on which check information has been entered.
  • Fig. 11 is an explanatory diagram showing an example of the check list screen when identifying the checked check items.
  • Figure 12 is a schematic configuration diagram of a transmission system for transmitting check information to a vendor.
  • Figure 13 is a block diagram showing the configuration of a control section with a communication unit.
  • FIG. 1 is a perspective view schematically showing a configuration of a coating and developing apparatus 1 as a processing apparatus according to the present embodiment
  • FIG. 2 is a plan view of the coating and developing apparatus 1.
  • the coating and developing apparatus 1 loads 25 wafers W from the outside into the coating and developing processing apparatus 1 in cassette units, and A cassette station 2 for loading and unloading wafers W, a processing station 3 having a plurality of processing units for processing wafers W in a single-wafer manner, and a processing station 3 provided adjacent to the processing station 3 And an interface unit 4 for transferring a wafer W to and from an exposure processing apparatus (not shown).
  • a plurality of cassettes C can be placed at predetermined positions on the cassette mounting table 10 in a line in the X direction (up and down direction in Fig. 2).
  • a wafer transfer unit 11 is provided along the transfer path 12 so as to be movable in the X direction.
  • the wafer transfer unit 11 can carry in / out the wafer W to / from the cassette C.
  • To 5 3 Can access and transfer the wafer W.
  • the cassette station 2 is provided with a control section 13 of the coating and developing apparatus 1, which will be described later.
  • a main transfer unit 20 is provided at the center of the processing station 3, and various processing units are provided in multiple stages around the main transfer unit 20.
  • a plurality of processing unit groups G1, G2, G3, and G4 are provided.
  • the first and second processing unit groups Gl and G2 are disposed on the front side of the coating and developing processing apparatus 1, and the first processing unit group G1 includes a wafer W as shown in FIG.
  • a resist coating unit 21 for applying a resist solution to form a resist film and a developing unit 22 for developing the wafer W are provided in two stages from the bottom.
  • the second processing unit group G2 is provided with a resist coating unit 23 and a developing unit 24 in order from the bottom.
  • the resist coating unit 21 includes a spin chuck 30 for holding and rotating the wafer W by suction and a spin chuck 30 for holding the wafer W in a casing 2 la.
  • the resist liquid discharge nozzle 32 is connected to the resist liquid supply pipe 34, and the resist liquid supply pipe 34 has a control valve 35 for adjusting the discharge flow rate of the resist liquid. Is provided.
  • the control valve 35 is controlled by a discharge amount control unit 36, and the discharge amount of the resist liquid from the resist liquid discharge nozzle 32 is controlled to a predetermined discharge amount.
  • the gas supply pipe 33 is provided with a damper 37 for adjusting the gas supply amount.
  • the dambar 37 is controlled by the gas supply control unit 38, and the supply amount from the gas supply pipe 33 is controlled.
  • the inside of cup 3 1 Thus, the wind speed in the cup 31 during processing can be maintained at a predetermined wind speed.
  • the gas supply pipe 33 is provided with a temperature / humidity controller 39 for controlling the temperature and humidity of the gas.
  • the discharge amount control unit 36, the gas supply control unit 38, and the temperature / humidity control unit 39 perform various controls based on setting information from the control section 13 described later.
  • the third processing unit group G3 of processing station 3 is arranged adjacent to cassette station 2, as shown in Fig. 2.
  • the third processing unit group G3 includes cooling units 50 and 51 for cooling and processing the wafer W, and enhances the fixability between the resist solution and the wafer W.
  • the adhering unit 52, the extension unit 53 for transferring the wafer W, and the pre-wetting units 54 and 55 for evaporating the solvent in the resist solution are, for example, 6 from the bottom. Stacked in columns.
  • the fourth processing unit group G4 is arranged adjacent to the interface unit 4.
  • the fourth processing unit group G4 includes, for example, a cooling unit 60, an extension / cooling unit 61 for naturally cooling the placed wafer W, an extension unit 62, and a post-exposure unit.
  • Post-exposure baking units 63 and 64 for performing heat treatment and post-baking units 65 and 66 for performing heat treatment after image processing are stacked, for example, in seven stages from the bottom. .
  • the interface unit 4 is provided with, for example, a wafer transfer unit 70 and a peripheral exposure unit 71.
  • the wafer transfer unit 70 is used for the extension 'cooling unit 61, extension unit 62, peripheral exposure unit 71, and an exposure processing unit (not shown) belonging to the fourth processing unit group G4. Access and for each It is configured to transfer wafer W.
  • the control section 13 is a section for controlling the processing performed in the coating and developing processing apparatus 1.
  • the control section 13 includes, for example, a setting input section 80, a main control section 81, a storage section 82, a display section 83, and a manual input section 84 as an input section as shown in FIG. And
  • the setting input unit 80 is for inputting and setting, for example, setting information relating to the entire coating and developing apparatus 1 and various units.
  • the various units are the main transfer unit 20 described above, the wafer transfer units 11 and 70, the resist coating units 21 and 23, the development units 22 and 24, and the development processing units 22 and 24.
  • the main control unit 81 directly controls the entire coating and developing processing apparatus 1 and various units based on the setting information input from the setting input unit 80, for example, or sends the setting information to the control unit of various units. And indirectly control the unit.
  • the storage unit 82 has, for example, a plurality of storage areas, and stores setting information input from the setting input unit 80, a predetermined program executed by the main control unit 81, and the like.
  • the display section 83 is composed of, for example, a dot matrix type color liquid crystal display cell or a CRT (Cathode Ray Tube), and as shown in FIG. Display a checklist screen T in a predetermined format created during startup work.
  • the display section 83 is provided, for example, on the front side of the cassette station 2 as shown in FIG. 1 and adjacent to the setting input section 80, and the operator inputs check information while checking the setting information. You can check the list screen T.
  • the same date and time as the clock function (not shown) provided in the coating and developing apparatus 1 are displayed.
  • the operator's sign for example, input information from the manual input section 84 is displayed, and the operator's name can be entered from the manual input section 84. .
  • the names of workers for example, passwords, ID codes, etc. may be input as necessary.
  • a column is provided to display the serial number of the coating and developing equipment and the names of all workers, and can be entered using, for example, the manual input section 84.
  • the worker on the vendor side inputs the identification number of coating / developing apparatus 1 and his / her own name from manual input section 84, and fills in check list screen T on display section 83. At this time, if there are multiple workers, for example, enter the names of all the workers.
  • various settings, adjustments, and confirmations are performed according to the items on the checklist screen T displayed on the display unit 83.
  • the items to be checked include the temperature and humidity settings in the cup of the resist coating unit 21, the wind speed in the cup, the discharge amount setting of the resist solution, the height adjustment of the resist solution discharge nozzle,
  • the operator first opens the setting input screen S for the resist coating unit 21 as shown in FIG.
  • the setting input screen S includes, for example, a setting information column for inputting setting information for each setting item relating to the resist dispensing unit 21 and a confirm button for confirming the setting.
  • the operator inputs predetermined values recommended by the vendor in the setting information fields of the temperature and humidity in the cup, the wind speed in the cup, and the discharge amount of the resist liquid.
  • the confirm button is pressed, for example, the main controller 81 to the temperature / humidity controller 39, the gas supply controller 38, and the discharge amount controller 36
  • the setting information such as the predetermined numerical value is output, and the temperature and humidity in the cup 31, the wind speed in the cup 31, and the discharge amount of the resist liquid are set.
  • each numerical value input on the setting input screen S is displayed in the column of each check information on the check list screen T on the display section 83 as shown in FIG.
  • the date and time when the start-up work was performed are displayed in the date / time column.
  • the name of the worker who performed the work related to the check items is input, for example, from the manual input section 84, and is entered in the worker's signature field.
  • the worker when the worker adjusts the position of the resist solution discharge nozzle of the resist dispensing unit 21 and adjusts the center position of the needle C on the spin chuck 30, for example, the worker first uses a caliper. The position of the resist solution discharge nozzle 32 and the center position of the wafer W are actually measured using measuring instruments such as a jig and a jig. Next, if the measured value is within the allowable range, enter the measured value from the manual input section 84 and enter it in the check information field of the checklist screen T.
  • the measured value is not within the allowable range, the position and the like of the resist solution discharge nozzle 32 are corrected and corrected, and the measured value is measured again, and the measured value is input from the manual input unit 84.
  • the actual measured value after the correction is entered in the check information column of the checklist screen T.
  • the date and time are automatically entered in the same way as the input from the setting input section 80 described above. Then, for example, the name of the worker who performed the work is input from the manual input section 84, and is entered in the sign field of the worker on the checklist screen T.
  • the input from the setting input section 80 and the input from the manual input section 84 are sequentially performed according to the check items on the check list screen T, so that the check list is displayed on the screen. Is created.
  • the check list screen T in which all the check items have been entered in this way is stored in the storage section 82 of the control section 13 as, for example, check list information. If necessary, a printing device (not shown) such as a printer may be used. Output according to the location.
  • the check list created during the start-up work is displayed as a check list screen on the display section 83 of the coating and developing apparatus 1, and the setting input section is displayed. Since the setting information such as the set value set in 80 is automatically entered in the checklist screen T as it is, mistakes in the checklist entry and omission of entry can be prevented. Also, since it is not necessary for the operator to write down the set values and the like, the checklist is created quickly, and the time required for the startup work is reduced.
  • the check items that have already been checked and the check items that have not been checked may be identified and displayed. For example, as shown in Fig. 11, checked and unchecked items are displayed in different colors. In such a case, unchecked items can be seen at a glance, thus preventing omission of checks.
  • the check items may be identified by other methods, for example, by brightness or blinking. Also, only unchecked items may be extracted and displayed.
  • the manual input section 84 is provided independently.
  • the display section 83 may be provided with an input function and integrated.
  • the display unit 83 is configured with a touch screen or the like as a pointing device, and the check list and the operator's sign that are not input from the setting input unit 80 are displayed in the check list 83.
  • the setting input unit 80 and the display unit 83 are provided separately in the above embodiment, the setting input unit 80 and the display unit 83 are provided separately. Choi
  • the list screen may be displayed at one place. For example, a checklist screen T can be displayed on the setting input section 80 that is a touch screen. Then, the check list screen T and setting input screen S can be switched. This allows the setting input and the display of the checklist to be performed in one place. Since the setting input section 80 is a touch screen, the manual input performed by the manual input section 84 can also be performed.
  • check information displayed on the check list screen T described in the above embodiment may be transmitted to the vendor side via the Internet.
  • Figure 12 is a schematic diagram of the communication system 100 for transmitting the check information displayed on the check list screen T to the vendor.
  • a plurality of coating and developing units M 1 to M n with the same specifications and an advanced group computer (AGC) 1 that collectively manages the coating and developing units M 1 to M n 02 is provided on the factory 101 side.
  • AGC102 and the coating and developing equipment Ml to Mn are connected by LAN103.
  • the control section 104 of the coating and developing apparatus Ml has a communication section 105 as a communication means for communicating information with the AGC 102. Is provided.
  • the AGC 102 also has a communication unit (not shown).
  • a host computer 107 is provided on the vendor 106 side.
  • the host computer 107 is provided with a communication unit (not shown).
  • the host computer 107 and the AGC 102 are connected via the Internet 108 and can communicate with each other.
  • the check information of the display unit 83 of the coating and developing processing apparatus M1 is transmitted to the host computer 10 of the vendor 106 through the Internet 108 via the AGC 102. 7 can be sent.
  • paint The check information displayed on the check list screen T is transmitted to the vendor 106 at predetermined time intervals when the cloth development processor Ml is started up.
  • vendor 106 check information can be obtained as a checklist and stored as data by vendor 106.
  • the check information stored at the factory 101 can be obtained whenever necessary.
  • the check information of the coating and developing processing apparatus M 1 the check information of another coating and developing processing apparatus that has already been started up, for example, the coating and developing processing apparatus M 2 is obtained, and the check information is obtained.
  • the standard check information may be compared with the check information on the checklist screen T.
  • the communication unit 105 obtains the check information of the coating and developing processing apparatus M 2 via the LAN 103 and stores it in, for example, the storage unit 82.
  • the check information of the coating and developing treatment apparatus M2 is compared with the check information displayed on the checklist screen T by a predetermined program, and different items are identified and displayed. Workers are to re-set, confirm, etc. for the different items. By doing so, setting and adjustment mistakes are suppressed, and the start-up work is performed more accurately.
  • the standard check information includes other check information, such as check information of the coating and developing processing equipment that is already operating normally, check information of the coating and developing processing equipment in other factories, and ideal chucks created by vendors in advance. It may be information or the like.
  • the host computer 107 obtains the chip information of the other factory via the Internet 108 and executes the coating and developing processing. You may make it transmit to apparatus M1.
  • the embodiment described above relates to a coating and developing processing apparatus, the present invention can be applied to other processing apparatuses, for example, an exposure apparatus, an etching apparatus, and an inspection apparatus. Further, the present invention has been applied to a wafer processing apparatus, but can also be applied to a processing apparatus for a substrate other than a wafer, for example, an LCD substrate or a mask reticle substrate for a photomask. Industrial applicability

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  • Automation & Control Theory (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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  • Coating Apparatus (AREA)
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Abstract

A checklist used in starting the operation of a substrate processing apparatus is created more quickly and accurately than conventional. The substrate processing apparatus comprises a setting entering unit for entering setting information on setting items of the processing apparatus and a display unit for displaying a checklist image concerning predetermined check items of the processing apparatus. The check items include the setting items. The setting information entered through the setting entering unit is automatically displayed in the respective corresponding check item boxes of the checklist image.

Description

明細書  Specification
基板の処理装置  Substrate processing equipment
技術分野 Technical field
本発明は基板の処理装置に関するものである。  The present invention relates to a substrate processing apparatus.
発明の背景 Background of the Invention
例えば, 半導体デバイスの製造プロセスにおけるフォ ト リ ソグラフ ィー工程は,ウェハ表面にレジス ト膜を形成するレジス ト塗布ュニッ ト, 露光後のウェハに対して現像を行う現像処理ュニッ ト, レジス ト塗布後, 現像処理前後等に熱処理を行う熱処理ュニッ ト等の複数の処理ュニッ ト を備えた塗布現像処理装置で行われる。  For example, the photolithography process in the semiconductor device manufacturing process includes a resist coating unit for forming a resist film on the wafer surface, a developing unit for developing the exposed wafer, and a resist coating unit. Thereafter, the coating is performed by a coating and developing apparatus equipped with a plurality of processing units such as a heat processing unit for performing a heat treatment before and after the development processing.
この塗布現像処理装置が, ベンダーからウェハ製造メーカーに販売 され, 当該塗布現像処理装置が, ウェハ製造メーカー側の工場に設置さ れる際には, ベンダー側の作業員により, 塗布現像処理装置のいわゆる 立ち上げ作業が行われる。 この立ち上げ作業は, 塗布現像処理装置内の 各処理ユニッ ト等を設定, 調節し, 塗布現像処理装置の稼動を開始でき る状態にする作業である。  This coating / developing apparatus is sold by a vendor to a wafer manufacturer, and when the coating / developing apparatus is installed in a factory of the wafer manufacturer, the so-called coating / developing apparatus is called by a worker on the vendor side. Start-up work is performed. This start-up work involves setting and adjusting each processing unit in the coating and developing equipment so that the operation of the coating and developing equipment can be started.
ところで, 前記立ち上げ作業は, 予め定められているチェック事項 に従って行われ, 作業員がその時設定等した各種設定値, 調整値等を所 定の用紙に記載する, いわゆるチェック リ ス トの作成作業が行われる。 この時作成されるいわゆるチェック リ ス トは, 作業員の設定, 調整漏れ を防止し, 初期の設定情報等を保存しておくためのものである。 、  By the way, the start-up work is performed according to predetermined check items, and various setting values, adjustment values, etc. set by the worker at that time are written on a predetermined sheet, that is, a so-called check list creation work. Is performed. The so-called checklist created at this time is intended to prevent operator settings and adjustment omissions, and to store initial setting information. ,
しかしながら, 多数のチェック事項を有する塗布現像処理装置にお いては, 前記チェック リ ス トは, 数十頁にも及び, これを完成させるた めには, 多大な時間を要していた。 また, 作業員のチェック リ ス ト作成 作業には, 記入漏れや転記ミ スを伴い, それを訂正するには, さ らに時 間がかかっていた。 このよ うに, いわゆるチェック リ ス トの作成に時間がかかると, ゥ ェハ製造メ一力一側への塗布現像処理装置の引き渡しが遅れ, ウェハ処 理の開始も遅れることになる。 発明の開示 However, in a coating / developing apparatus having a large number of check items, the check list has several tens of pages, and it takes a lot of time to complete the check list. In addition, the worker's checklist creation work involved omissions and transcription errors, and it took more time to correct them. If it takes a long time to create a so-called check list, the delivery of the coating and developing processing equipment to the wafer manufacturing side will be delayed, and the start of wafer processing will also be delayed. Disclosure of the invention
本発明は, かかる点に鑑みてなされたものであり, 塗布現像処理装 置等の基板の処理装置の立ち上げ作業時におけるチェック リ ス トの作成 を迅速かつ正確に行う基板の処理装置を提供することをその目的とする < 本発明は, 基板の処理を行う処理装置であって, 前記処理装置を稼 動させるための各種機器, 部材等の諸元を設定するために, 前記処理装 置の設定事項に関する設定情報を入力する設定入力部と, 前記処理装置 における所定のチェック事項に関するチェック リ ス ト画面を表示する表 示部とを備え, 前記チェック事項には, 前記設定事項が含まれており, 前記設定入力部で入力された設定情報は, 前記チェック リ ス ト画面にお ける当該設定情報に対応するチェック事項の欄に自動的に表示される。  The present invention has been made in view of the above points, and provides a substrate processing apparatus for quickly and accurately creating a check list when starting up a substrate processing apparatus such as a coating and developing apparatus. An object of the present invention is to provide a processing apparatus for processing a substrate, wherein the processing apparatus is used to set specifications of various devices and members for operating the processing apparatus. A setting input section for inputting setting information relating to the specified setting items; and a display section for displaying a check list screen relating to predetermined check items in the processing device, wherein the checked items include the setting items. The setting information input by the setting input unit is automatically displayed in a check item column corresponding to the setting information on the check list screen.
本発明の基板の処理装置において, 前記設定入力部からでは設定で きないチェック事項に関するチェック情報を入力する入力部を備え, 前 記入力部から入力されたチェック情報は, 前記チェック リ ス ト画面にお ける当該チエツク情報に対応するチェック事項の欄に表示されてもよい, 本発明の基板の処理装置において, 前記チェック リ ス ト画面は, 既 にチェック済みのチェック事項と未チヱックのチェック事項とが識別で きるよ うに表示されるよ うにしてもよい。  The substrate processing apparatus according to the present invention further includes an input unit for inputting check information relating to check items that cannot be set from the setting input unit, and the check information input from the input unit is used for the check list screen. In the substrate processing apparatus of the present invention, the check list screen may include a check item that has already been checked and a check item that has not been checked. May be displayed so that they can be identified.
本発明の基板の処理装置において, 前記チェック リ ス ト画面には, 前記処理装置の設定作業を行った作業員に関する情報が表示されるよ う にしてもよレヽ。  In the substrate processing apparatus of the present invention, the check list screen may display information on an operator who has performed setting work of the processing apparatus.
本発明の基板の処理装置において, 前記チェック リ ス ト画面は, 表 示されたチヱック事項のチェック情報が当該チェック事項の標準チェッ ク情報と異なっている場合に, 当該チェック事項が識別できるよ うに表 示されるよ うにしてもよレ、。 In the substrate processing apparatus according to the present invention, the check list screen includes the check information of the displayed check item as a standard check of the check item. If it is different from the check information, the check item may be displayed so that it can be identified.
本発明の基板の処理装置は, 前記チェック リ ス ト画面に表示された チェック事項に関するチェック情報を, 前記処理装置のベンダーにイン ターネッ トを介して送信するための通信手段を備えていてもよい。  The substrate processing apparatus of the present invention may include communication means for transmitting check information on the check items displayed on the check list screen to a vendor of the processing apparatus via the Internet. .
本発明の基板の処理装置は, 他の基板の処理装置に関するチエック 情報を入手するための通信手段を備えていてもよい。  The substrate processing apparatus of the present invention may include a communication unit for obtaining check information on another substrate processing apparatus.
本発明の基板の処理装置によれば, 表示部に, 処理装置のチェック 事項に関するチェック リ ス ト画面が表示される。 処理装置の部材等の諸 元を設定するために入力された設定情報は, 前記チェック リ ス ト画面の 所定の欄に自動的に記入され, 表示される。 これによ り, 作業員が前記 設定情報を改めて所定用紙のチェック リ ス トに記載する必要が無く なる ので, その分チェック リ ス トが迅速に作成される。 また, 設定入力され た設定情報は, そのままチェック リ ス トに記入されるので, 従来のよ う な転記ミスが無く なり, チェック リ ス トをよ り正確に作成できる。 さ ら に, チェック リ ス トが画面と して表示されるので, 作業員が当該画面を 見ながら作業を進めることができ, 作業の効率化が図られる。 また, ぺ ーパと しての保存が要求される場合には, ハー ドコピーするなどしてプ リ ン トアウ トすればよい。 なお, 前記処理装置の各種機器, 部材等の諸 元には, 例えば基板の処理を行うために処理装置内に設けられている各 種ユニッ ト, 当該ユニッ トを構成する部材等が含まれる。 また, チエツ ク事項には, 前記設定事項の他, 調整事項, 確認事項等が含まれる。 例 えば, チェック事項には, 各処理の処理温度, 処理湿度, 処理ユニッ ト 内の風速, 処理液の吐出量, 吐出流量等の各種事項が含まれる。  According to the substrate processing apparatus of the present invention, the check list screen relating to the check items of the processing apparatus is displayed on the display unit. The setting information input for setting the specifications of the processing device members and the like is automatically entered and displayed in a predetermined column of the check list screen. This eliminates the need for the operator to re-enter the setting information in the checklist for the specified paper, and the checklist is quickly created accordingly. Also, since the setting information that has been entered is entered directly into the checklist, there is no need for a transcription error as in the past, and the checklist can be created more accurately. Furthermore, since the checklist is displayed as a screen, the worker can proceed with the work while looking at the screen, thereby improving work efficiency. Also, if storage as paper is required, it may be printed out by hard copy or the like. Note that the specifications of the various devices and members of the processing apparatus include, for example, various units provided in the processing apparatus for processing a substrate and members constituting the unit. The check items include adjustment items and confirmation items in addition to the above-mentioned setting items. For example, the check items include various items such as the processing temperature, processing humidity, wind speed in the processing unit, discharge amount of processing liquid, and discharge flow rate of each processing.
また, 本発明において, 前記設定入力部からでは設定できないチェ ック事項に関するチェック情報を入力する入力部をさ らに備え, 前記入 力部から入力されたチェック情報を, 前記チェック リ ス ト画面における 当該チェック情報に対応するチェック事項の欄に表示させるよ うにした 場合, 表示部の画面上において, 全てのチェック事項を記入することが できる。なお,前記設定入力部からでは設定できないチェック事項には, 例えば作業員の作業によって検査, 測定され, その測定値等を記入する チユ ック事項等が含まれる。 例えば, 当該チヱック事項には, 各処理ュ ニッ トにおける基板のセンタ位置, 処理液吐出ノズルの位置, 搬送ュニ ッ トの基準位置等が含まれる。 In the present invention, the apparatus further comprises an input unit for inputting check information on check items that cannot be set from the setting input unit, and the check information input from the input unit is displayed on the check list screen. In If the check information is displayed in the column of check items corresponding to the check information, all check items can be entered on the screen of the display unit. The check items that cannot be set from the setting input unit include, for example, check items that are inspected and measured by the work of workers, and the measured values are entered. For example, the check items include the center position of the substrate in each processing unit, the position of the processing liquid discharge nozzle, the reference position of the transport unit, and the like.
また本発明において, 前記チェック リ ス ト画面が, 既にチェック済 みのチェック事項と未チェックのチェック事項とが識別できるよ う に表 示されるよ う にした場合には, 作業員が未チェックの事項を把握し易く なり, 作業の効率化が図られ, また, チェック漏れもなく なる。 なお, 識別表示は, 未チェック事項とチェック済み事項とを色分けして表示し たり, 未設定事項を抽出して表示したり してもよい。  Also, in the present invention, when the check list screen is displayed so that the checked items that have already been checked and the checked items that have not been checked can be identified, the worker can check the checked items. Items are easier to grasp, work efficiency is improved, and there is no omission of checks. In the identification display, unchecked items and checked items may be displayed in different colors, or unset items may be extracted and displayed.
また上述のチェック リ ス ト画面に表示される前記設定作業を行った 作業員に関する情報には, 例えば作業員の氏名, 社員番号, 所属事業所 名称等が含まれる。 また, チェック リ ス ト画面に, 作業員の氏名を記載 することによって, チェック済み事項の確認サインと しての機能を持た せるよ うにしてもよい。 すなわち, 前記チェック リ ス ト画面の各チエツ ク事項に対して作業員の確認サインを表示するよ う にしてもよい。  The information on the worker who performed the setting work displayed on the check list screen includes, for example, the name of the worker, the employee number, the name of the office to which the worker belongs, and the like. In addition, the name of the worker may be described on the check list screen to provide a function as a confirmation sign for the checked items. That is, a worker's confirmation sign may be displayed for each check item on the check list screen.
本発明の基板の処理装置において, チェック リ ス ト画面に表示され たチヱック事項のチェック情報が標準チェック情報と異なっている場合 に, 当該チェック事項を識別できるよ う にした場合, 作業員は, チエツ ク情報が標準のものと異なることを確認でき, 当該チェック情報の再確 認等を行う ことができる。 なお, 標準チェック情報は, 例えば同じ仕様 の処理装置であって, 予め定められた基準となる処理装置のチェック情 報であってもよいし, 既にチェックが終了し, 正常に稼動している処理 装置のチェック情報であってもよい。 本発明の基板の処理装置が, 前記チェック リ ス ト画面に表示された チェック事項に関するチェック情報を, 前記処理装置のベンダ一にィン ターネッ トを介して送信するための通信手段をさ らに備えた場合には, 作業員の行った設定内容や, 立ち上げ作業の進埗状況を逐次ベンダーに 通知することができる。 これによ り, 専門家であるベンダー側の管理者 力 立ち上げ作業を監視し, 必要な場合には, 作業員に迅速に指示を与 えることができる。 また, 作業終了後に, チェック リ ス ト画面を送信し, ベンダー側がチェック リ ス ト と して保存するこ とができる。 In the substrate processing apparatus of the present invention, when the check information of the check item displayed on the check list screen is different from the standard check information, the operator can identify the check item. It is possible to confirm that the check information is different from the standard information, and to reconfirm the check information. The standard check information may be, for example, processing information of a processing device having the same specifications, which may be a reference of a processing device serving as a predetermined reference, or a process that has already been checked and is operating normally. It may be check information of the device. The substrate processing apparatus of the present invention further includes communication means for transmitting check information on the check items displayed on the check list screen to a vendor of the processing apparatus via the Internet. If provided, the vendor can be notified of the settings made by the workers and the progress of the start-up work. This makes it possible to monitor the start-up work of the manager of the vendor, who is an expert, and to promptly give instructions to the workers if necessary. Also, after the work is completed, a checklist screen can be sent, and the vendor can save it as a checklist.
本発明の基板の処理装置が, 他の基板の処理装置に関するチェック 情報を入手するための通信手段をさ らに備えた場合には, 必要に応じて 他の処理処理のチェック情報を入手し, 当該チェック情報とチェック リ ス ト画面に表示されたチヱック情報とを比較し, 異なる部分を他の処理 装置のチェック情報と合わせたり, 再確認したりすることができる。 し たがって, 立ち上げ作業をよ り正確かつ慎重に行う ことができる。 図面の簡単な説明  When the substrate processing apparatus of the present invention further includes a communication means for obtaining check information on another substrate processing apparatus, the check information on other processing is obtained as necessary. By comparing the check information with the check information displayed on the check list screen, different parts can be combined with the check information of other processing equipment or reconfirmed. Therefore, the start-up work can be performed more accurately and carefully. BRIEF DESCRIPTION OF THE FIGURES
図 1 は, 実施の形態にかかる塗布現像処理装置の概略を示す斜視図であ る。 FIG. 1 is a perspective view schematically showing a coating and developing treatment apparatus according to an embodiment.
図 2は, 塗布現像処理装置の構成の概略を示す平面図である。 FIG. 2 is a plan view schematically showing the configuration of the coating and developing treatment apparatus.
図 3は, 図 2の塗布現像処理装置の正面図である。 FIG. 3 is a front view of the coating and developing apparatus of FIG.
図 4は, レジス ト塗布ュニッ トの構成の概略を示す縦断面の説明図であ る。 Figure 4 is an explanatory diagram of a longitudinal section showing the outline of the configuration of the resist coating unit.
図 5は, 図 2の塗布現像処理装置の背面図である。 FIG. 5 is a rear view of the coating and developing apparatus of FIG.
図 6は, コ ン トロールセクショ ンの構成を示すブロ ック図である。 Figure 6 is a block diagram showing the configuration of the control section.
図 7は, チェック リ ス ト画面の例を示す説明図である。 Figure 7 is an explanatory diagram showing an example of the checklist screen.
図 8は, 設定入力画面の例を示す説明図である。 FIG. 8 is an explanatory diagram showing an example of the setting input screen.
図 9は, 数値が入力された設定入力画面の例を示す説明図である。 図 1 0は, チェック情報が入力されたチェック リ ス ト画面の例を示す説 明図である。 FIG. 9 is an explanatory diagram showing an example of a setting input screen in which numerical values have been input. Figure 10 is an explanatory diagram showing an example of a check list screen on which check information has been entered.
図 1 1 は, チェック済みのチェック事項を識別表示する場合のチェック リ ス ト画面の例を示す説明図である。 Fig. 11 is an explanatory diagram showing an example of the check list screen when identifying the checked check items.
図 1 2は, チェック情報をベンダーに送信するための送信システムの概 略構成図である。 Figure 12 is a schematic configuration diagram of a transmission system for transmitting check information to a vendor.
図 1 3は, 通信部を設けたコン ト口一ルセクショ ンの構成を示すブロ ッ ク図である。 発明を実施するための最良の形態 Figure 13 is a block diagram showing the configuration of a control section with a communication unit. BEST MODE FOR CARRYING OUT THE INVENTION
以下, 本発明の好ま しい実施の形態について説明する。 図 1 は, 本 実施の形態にかかる処理装置と しての塗布現像処理装置 1の構成の概略 を示す斜視図であり, 図 2は, 塗布現像処理装置 1 の平面図である。  Hereinafter, preferred embodiments of the present invention will be described. FIG. 1 is a perspective view schematically showing a configuration of a coating and developing apparatus 1 as a processing apparatus according to the present embodiment, and FIG. 2 is a plan view of the coating and developing apparatus 1.
例えば塗布現像処理装置 1 は, 図 1, 図 2に示すよ うに例えば 2 5 枚のウェハ Wをカセッ ト単位で外部から塗布現像処理装置 1 に対して搬 入出したり, カセッ ト Cに対してウェハ Wを搬入出したりするカセッ ト ステーショ ン 2 と, ウェハ Wの処理が枚葉式で行われる各種処理ュニッ トを複数有する処理ステーショ ン 3 と, この処理ステーショ ン 3 に隣接 して設けられている図示しない露光処理装置との間でウェハ Wの受け渡 しを行うインターフェイス部 4 とを一体に接続した構成を有している。  For example, as shown in FIGS. 1 and 2, for example, the coating and developing apparatus 1 loads 25 wafers W from the outside into the coating and developing processing apparatus 1 in cassette units, and A cassette station 2 for loading and unloading wafers W, a processing station 3 having a plurality of processing units for processing wafers W in a single-wafer manner, and a processing station 3 provided adjacent to the processing station 3 And an interface unit 4 for transferring a wafer W to and from an exposure processing apparatus (not shown).
カセッ トステーショ ン 2では, 図 2に示すよ う にカセッ ト載置台 1 0上の所定の位置に, 複数のカセッ ト Cが X方向 (図 2中の上下方向) に一列に載置自在になっている。 また, カセッ トステーショ ン 2 には, ウェハ搬送ュニッ ト 1 1 が搬送路 1 2に沿って X方向に移動自在に設け られている。 ウェハ搬送ユニッ ト 1 1 は, カセッ ト Cに対してウェハ W を搬入出するこ とができ, さ らに, 後述する処理ステーショ ン 3側の第 3の処理ュニッ ト群 G 3に属するエクステンショ ンュニッ ト 5 3 に対し てもアクセス し, ウェハ Wを搬送する こ と ができ る。 また, カセ ッ トス テーシヨ ン 2には, 図 1 に示すよ うに塗布現像処理装置 1 の後述するコ ン ト ロールセクシヨ ン 1 3 が設けられている。 In the cassette station 2, as shown in Fig. 2, a plurality of cassettes C can be placed at predetermined positions on the cassette mounting table 10 in a line in the X direction (up and down direction in Fig. 2). Has become. In the cassette station 2, a wafer transfer unit 11 is provided along the transfer path 12 so as to be movable in the X direction. The wafer transfer unit 11 can carry in / out the wafer W to / from the cassette C. Further, the extension unit belonging to the third processing unit group G3 on the processing station 3 side described later. To 5 3 Can access and transfer the wafer W. As shown in Fig. 1, the cassette station 2 is provided with a control section 13 of the coating and developing apparatus 1, which will be described later.
処理ステ一ショ ン 3には, 図 2に示すよ うにその中心部に主搬送ュ ニッ ト 2 0が設けられており, この主搬送ユニッ ト 2 0の周辺には各種 処理ュニッ トが多段に配置された複数の処理ュニッ ト群 G l, G 2, G 3, G4 が設けられている。 例えば第 1及び第 2 の処理ユニッ ト群 G l, G2 は, 塗布現像処理装置 1 の正面側に配置され, 第 1 の処理ユニッ ト群 G 1 には, 図 3に示すようにウェハ Wにレジス ト液を塗布しレジス ト膜を 形成するレジス ト塗布ュニッ ト 2 1及びウェハ Wを現像処理する現像処 理ュニッ ト 2 2が下から順に 2段に設けられている。 第 2の処理ュニッ ト群 G 2 も同様に, レジス ト塗布ュニッ ト 2 3及び現像処理ュニッ ト 2 4が下から順に設けられている。  As shown in Fig. 2, a main transfer unit 20 is provided at the center of the processing station 3, and various processing units are provided in multiple stages around the main transfer unit 20. A plurality of processing unit groups G1, G2, G3, and G4 are provided. For example, the first and second processing unit groups Gl and G2 are disposed on the front side of the coating and developing processing apparatus 1, and the first processing unit group G1 includes a wafer W as shown in FIG. A resist coating unit 21 for applying a resist solution to form a resist film and a developing unit 22 for developing the wafer W are provided in two stages from the bottom. Similarly, the second processing unit group G2 is provided with a resist coating unit 23 and a developing unit 24 in order from the bottom.
例えば, レジス ト塗布ユニッ ト 2 1 は, 図 4に示すようにケーシン グ 2 l a内に, ウェハ Wを吸着保持し回転させるためのスピンチャック 3 0, ス ピンチャック 3 0に保持されたゥヱハ Wの外方を取り囲む略筒 状のカップ 3 1, ウェハ Wの上方からレジス ト液を吐出するレジス ト液 吐出ノズル 3 2 , ケーシング 2 1 a 内に清浄な気体を供給する気体供給 管 3 3を有する。  For example, as shown in FIG. 4, the resist coating unit 21 includes a spin chuck 30 for holding and rotating the wafer W by suction and a spin chuck 30 for holding the wafer W in a casing 2 la. A substantially cylindrical cup 31 surrounding the outside of the wafer, a resist liquid discharge nozzle 32 for discharging a resist liquid from above the wafer W, and a gas supply pipe 33 for supplying a clean gas into the casing 21a. Have.
レジス ト液吐出ノ ズル 3 2は, レジス ト液供給管 3 4に接続されて おり, レジス ト液供給管 3 4には, レジス ト液の吐出流量を調節するた めの調節弁 3 5が設けられている。 この調節弁 3 5は, 吐出量制御部 3 6により制御されており, レジス ト液吐出ノ ズル 3 2からのレジス ト液 の吐出量は, 所定の吐出量に制御される。  The resist liquid discharge nozzle 32 is connected to the resist liquid supply pipe 34, and the resist liquid supply pipe 34 has a control valve 35 for adjusting the discharge flow rate of the resist liquid. Is provided. The control valve 35 is controlled by a discharge amount control unit 36, and the discharge amount of the resist liquid from the resist liquid discharge nozzle 32 is controlled to a predetermined discharge amount.
気体供給管 3 3には, 気体の供給量を調節するダンバ 3 7が設けら れている。 ダンバ 3 7は, 気体供給制御部 3 8によ り制御されており, 気体供給管 3 3からの供給量が制御される。 これによ り, カップ 3 1 内 の風速が制御され, 処理時のカップ 3 1 内を風速を所定の風速に維持す るこ とができる。 また, 気体供給管 3 3には, 気体の温度, 湿度を調節 する温湿度調節部 3 9が設けられている。 これによ り, カップ 3 1 内に 供給される気体の湿度, 温度を調節することができ, カップ 3 1 内を所 定の温度, 湿度に維持することができる。 なお, 吐出量制御部 3 6, 気 体供給制御部 3 8及び温湿度調節部 3 9は, 後述するコン ト ロールセク シヨ ン 1 3からの設定情報に基づいて各種制御を行う。 The gas supply pipe 33 is provided with a damper 37 for adjusting the gas supply amount. The dambar 37 is controlled by the gas supply control unit 38, and the supply amount from the gas supply pipe 33 is controlled. As a result, the inside of cup 3 1 Thus, the wind speed in the cup 31 during processing can be maintained at a predetermined wind speed. In addition, the gas supply pipe 33 is provided with a temperature / humidity controller 39 for controlling the temperature and humidity of the gas. Thus, the humidity and temperature of the gas supplied into the cup 31 can be adjusted, and the inside of the cup 31 can be maintained at the specified temperature and humidity. The discharge amount control unit 36, the gas supply control unit 38, and the temperature / humidity control unit 39 perform various controls based on setting information from the control section 13 described later.
一方, 処理ステーショ ン 3 の第 3 の処理ユニッ ト群 G3 は, 図 2に 示すよ う にカセッ トステーショ ン 2に隣接して配置されている。 第 3の 処理ユニッ ト群 G 3には, 例えば図 5に示すよ う に, ウェハ Wを冷却処 理するクーリ ングユニッ ト 5 0 , 5 1 , レジス ト液と ウェハ Wとの定着 性を高めるためのァ ドヒージョ ンュニッ ト 5 2, ウェハ Wの受け渡しを 行うためのェクステンショ ンュニッ ト 5 3 , レジス ト液中の溶剤を蒸発 させるためのプリべ一キングュニッ ト 5 4及ぴ 5 5が下から順に例えば 6段に積み重ねられている。  On the other hand, the third processing unit group G3 of processing station 3 is arranged adjacent to cassette station 2, as shown in Fig. 2. For example, as shown in FIG. 5, the third processing unit group G3 includes cooling units 50 and 51 for cooling and processing the wafer W, and enhances the fixability between the resist solution and the wafer W. The adhering unit 52, the extension unit 53 for transferring the wafer W, and the pre-wetting units 54 and 55 for evaporating the solvent in the resist solution are, for example, 6 from the bottom. Stacked in columns.
第 4 の処理ュニッ ト群 G4 は, イ ンターフェイ ス部 4 に隣接して配 置されている。 第 4の処理ユニッ ト群 G 4には, 例えばクーリ ングュニ ッ ト 6 0, 載置したウェハ Wを自然冷却させるェク ステンショ ン · クー リ ングユニッ ト 6 1, エクステンショ ンユニッ ト 6 2, 露光後の加熱処 理を行うポス トェクスポージャーべ一キングユニッ ト 6 3及び 6 4 , 現 像処理後の加熱処理を行うポス トベーキングュニッ ト 6 5及び 6 6が下 から順に例えば 7段に積み重ねられている。  The fourth processing unit group G4 is arranged adjacent to the interface unit 4. The fourth processing unit group G4 includes, for example, a cooling unit 60, an extension / cooling unit 61 for naturally cooling the placed wafer W, an extension unit 62, and a post-exposure unit. Post-exposure baking units 63 and 64 for performing heat treatment and post-baking units 65 and 66 for performing heat treatment after image processing are stacked, for example, in seven stages from the bottom. .
インターフェイス部 4には, 図 2に示すよ うに例えばウェハ搬送ュ ニッ ト 7 0 と周辺露光ュニッ ト 7 1 が設けられている。 ウェハ搬送ュニ ッ ト 7 0は, 第 4の処理装置群 G4 に属するエクステンショ ン ' クーリ ングユニッ ト 6 1 , エクステンショ ンユニッ ト 6 2, 周辺露光ユニッ ト 7 1及ぴ図示しない露光処理装置に対してアクセス して, 各々に対して ウェハ Wを搬送できるよ うに構成されている。 As shown in FIG. 2, the interface unit 4 is provided with, for example, a wafer transfer unit 70 and a peripheral exposure unit 71. The wafer transfer unit 70 is used for the extension 'cooling unit 61, extension unit 62, peripheral exposure unit 71, and an exposure processing unit (not shown) belonging to the fourth processing unit group G4. Access and for each It is configured to transfer wafer W.
次に, コ ン ト ロールセク ショ ン 1 3 の構成について説明する。 コン トロールセク ショ ン 1 3は, 塗布現像処理装置 1で行われる処理に関す る制御を行うためのセク ショ ンである。コ ン ト ロールセク ショ ン 1 3 は, 例えば図 6に示すよ うに設定入力部 8 0, 主制御部 8 1, 記憶部 8 2, 表示部 8 3及び入力部と してのマニュアル入力部 8 4 とを有する。  Next, the configuration of control section 13 is explained. The control section 13 is a section for controlling the processing performed in the coating and developing processing apparatus 1. The control section 13 includes, for example, a setting input section 80, a main control section 81, a storage section 82, a display section 83, and a manual input section 84 as an input section as shown in FIG. And
設定入力部 8 0は, 例えば塗布現像処理装置 1全体や各種ュニッ ト に関する設定情報を入力し, 設定するためのものである。 こ こで, 各種 ュニッ トとは, 上述の主搬送ュニッ ト 2 0, ウェハ搬送ュニッ ト 1 1, 7 0 , レジス ト塗布ユニッ ト 2 1, 2 3, 現像処理ュニッ ト 2 2, 2 4, クー リ ングユニッ ト 5 0, 5 1 , 6 0 , ア ドヒージョ ンユニッ ト 5 2, エクステンショ ンユニッ ト 5 3, 6 2 , プリ べ一キングユニッ ト 5 4, 5 5 , エクステンショ ン . ク一 リ ングユニッ ト 6 1 , ポス トェクスポー ジャーべ一キングュニッ ト 6 3 , 6 4 ,ポス トベーキングュニッ ト 6 5, 6 6, 周辺露光ユニッ ト 7 1等である。  The setting input unit 80 is for inputting and setting, for example, setting information relating to the entire coating and developing apparatus 1 and various units. Here, the various units are the main transfer unit 20 described above, the wafer transfer units 11 and 70, the resist coating units 21 and 23, the development units 22 and 24, and the development processing units 22 and 24. Cooling units 50, 51, 60, Adhesion units 52, Extension units 53, 62, Pre-baking units 54, 55, Extensions. The post-exposure baker's unity 63, 64, the post-baking unit 65, 66, and the peripheral exposure unit 71.
設定入力部 8 0は, 例えば図 1 に示すよ うにカセッ トステーショ ン 2の正面側に設けられている。 設定入力部 8 0は, 例えばポインティン グデバイスであるタツチスク リーンで構成され, 塗布現像処理装置 1 を 稼動させるための各種設定情報を, 画面の所定部分から入力することに よって, 前記各種ユニッ ト等を設定することができる。 また, 設定入力 部 8 0に入力された設定情報は, 後述する表示部 8 3 のチェック リ ス ト 画面 Tにチェック情報と して出力される。すなわち,設定入力部 8 0は, 後述するチェック リ ス ト画面 Tの入力装置と しても機能する。  The setting input section 80 is provided, for example, on the front side of the cassette station 2 as shown in FIG. The setting input section 80 is composed of, for example, a touch screen as a pointing device, and inputs various setting information for operating the coating and developing processing apparatus 1 from a predetermined portion of the screen, thereby obtaining the various units and the like. Can be set. The setting information input to the setting input section 80 is output as check information to a check list screen T of the display section 83 described later. In other words, the setting input section 80 also functions as an input device for the checklist screen T described later.
主制御部 8 1 は, 例えば設定入力部 8 0から入力された設定情報に 基づいて, 塗布現像処理装置 1全体及び各種ユニッ ト等を直接制御した り , 各種ユニッ トの制御部等に設定情報を送信し, 当該ユニッ ト等を間 接的に制御する。 記憶部 8 2は, 例えば複数の記憶領域を有し, 設定入力部 8 0から 入力される設定情報や主制御部 8 1 で実行される所定のプログラム等が 格納される。 The main control unit 81 directly controls the entire coating and developing processing apparatus 1 and various units based on the setting information input from the setting input unit 80, for example, or sends the setting information to the control unit of various units. And indirectly control the unit. The storage unit 82 has, for example, a plurality of storage areas, and stores setting information input from the setting input unit 80, a predetermined program executed by the main control unit 81, and the like.
表示部 8 3 は, 例えばドッ トマ ト リ ク スタイプのカラー液晶表示セ ル若しく は C R T ( C a t h o d e R a y T u b e ) 等力 ら構成さ れ, 図 7に示すよ うに塗布現像処理装置 1 の立ち上げ作業時に作成され る所定形式のチェック リ ス ト画面 Tを表示する。 表示部 8 3は, 例えば 図 1 に示すよ う にカセッ ト ステーショ ン 2の正面側であって, 設定入力 部 8 0に隣接して設けられ, 作業員が設定情報を入力しながら, チエツ ク リ ス ト画面 Tを確認することができる。  The display section 83 is composed of, for example, a dot matrix type color liquid crystal display cell or a CRT (Cathode Ray Tube), and as shown in FIG. Display a checklist screen T in a predetermined format created during startup work. The display section 83 is provided, for example, on the front side of the cassette station 2 as shown in FIG. 1 and adjacent to the setting input section 80, and the operator inputs check information while checking the setting information. You can check the list screen T.
チェック リ ス ト画面 Tには, 例えば予めベンダー等によって定めら れたチェック事項が羅列されている。 チェック事項は, 例えば塗布現像 処理装置 1全体及び各種ュニッ トに関する設定,調整,確認事項である。 また各チェック事項には,当該チェック事項の内容であるチェック情報, チェック 日付 時間及び作業員のサインを記載する欄が設けられている < チェック情報の欄の一部は, 設定入力部 8 0及ぴ後述のマニュアル 入力部 8 4からの入力情報が表示されるよ う になっており, 設定入力部 8 0及び後述のマニュアル入力部 8 4から入力された入力情報は, 当該 入力情報に対応したチェック事項の欄の所定部分に自動的に記入され, 表示される。  On the check list screen T, for example, check items determined in advance by a vendor or the like are listed. Check items are, for example, settings, adjustments, and confirmation items relating to the entire coating and developing processing apparatus 1 and various units. In addition, each check item is provided with a column that describes the check information, check date and time, and the operator's signature, which are the contents of the check item.入 力 The input information from the manual input section 84 described later is displayed, and the input information input from the setting input section 80 and the manual input section 84 described later correspond to the input information. The information is automatically entered and displayed in the specified part of the check item column.
チェック 日付/時間の欄には, 例えば塗布現像装置 1 に設けられた 図示しない時計機能と同じ日付, 時間が表示される。 また, 作業員のサ インの欄には, 例えばマニュアル入力部 8 4からの入力情報が表示され るよ うになつており, マニュアル入力部 8 4から作業員の氏名を記入す るこ とができる。 また, 作業員の氏名を入力する際には, 必要に応じて, 例えばパスワー ド, I D コー ド等を入力させるよ うにしてもよい。  In the check date / time column, for example, the same date and time as the clock function (not shown) provided in the coating and developing apparatus 1 are displayed. In the field of the operator's sign, for example, input information from the manual input section 84 is displayed, and the operator's name can be entered from the manual input section 84. . When inputting the names of workers, for example, passwords, ID codes, etc. may be input as necessary.
また, チェック リ ス ト画面 Tには, 例えば立ち上げ作業が行われた 塗布現像処理装置のシリアル番号, 全作業員の氏名を表示する欄が設け られており, 例えばマニュアル入力部 8 4を用いて入力することができ る。 On the checklist screen T, for example, startup work was performed. A column is provided to display the serial number of the coating and developing equipment and the names of all workers, and can be entered using, for example, the manual input section 84.
マニュアル入力部 8 4は, 例えばカーソールキーや数字入力キー等 を備えたキーボード等から構成され, 前記設定入力部 8 0によって設定 できる設定事項以外のチェック事項についてのチェック情報を, チエツ ク リス ト画面 Tに入力できる。 また, 上述のよ うに作業員のサイン欄に 記入される作業員の氏名を入力することもできる。 マニュアル入力部 8 4は, 例えば図 1 に示すよ うに表示部 8 3に隣接して設けられる。  The manual input section 84 is composed of, for example, a keyboard provided with a cursor key, a numeric input key, and the like. The check information on check items other than the setting items that can be set by the setting input section 80 is displayed on a check list screen. Can be entered in T. Also, as described above, the name of the worker can be entered in the worker's signature field. The manual input section 84 is provided adjacent to the display section 83, for example, as shown in FIG.
次に, 上述した塗布現像処理装置 1の立ち上げ作業時のチェック リ ス ト作成プロセスについて説明する。  Next, the check list creation process at the time of the start-up work of the coating and developing apparatus 1 described above will be described.
先ず, ベンダー側の作業員は, 塗布現像処理装置 1の識別番号, 自 己の氏名をマニュアル入力部 8 4から入力し, 表示部 8 3のチェック リ ス ト画面 Tに記入する。 このとき, 作業員が複数いる場合には, 例えば 全員の氏名を記入する。 次いで, 表示部 8 3に表示されたチェック リ ス ト画面 Tの項目に従って, 各種設定, 調整, 確認を行う。 例えば, 図 7 に示すよ うにチェック事項に, レジス ト塗布ュニッ ト 2 1 のカップ内温 湿度設定, カップ内風速設定, レジス ト液吐出量設定, レジス ト液吐出 ノ ズルの高さ調整, ウェハのセンタ位置調整等が挙がっている場合, 作 業員は, 先ず, 設定入力部 8 0において, 図 8に示すよ うなレジス ト塗 布ユニッ ト 2 1 に関する設定入力画面 Sを開く。 設定入力画面 Sは, 例 えばレジス ト塗布ュニッ ト 2 1に関する各設定事項に対し, 各設定情報 を入力する設定情報欄と, 設定を確定する確定ボタン等がある。  First, the worker on the vendor side inputs the identification number of coating / developing apparatus 1 and his / her own name from manual input section 84, and fills in check list screen T on display section 83. At this time, if there are multiple workers, for example, enter the names of all the workers. Next, various settings, adjustments, and confirmations are performed according to the items on the checklist screen T displayed on the display unit 83. For example, as shown in Fig. 7, the items to be checked include the temperature and humidity settings in the cup of the resist coating unit 21, the wind speed in the cup, the discharge amount setting of the resist solution, the height adjustment of the resist solution discharge nozzle, When the center position adjustment is performed, the operator first opens the setting input screen S for the resist coating unit 21 as shown in FIG. The setting input screen S includes, for example, a setting information column for inputting setting information for each setting item relating to the resist dispensing unit 21 and a confirm button for confirming the setting.
次いで作業員は, 例えば図 9に示すよ うにカップ内温湿度, カップ 内風速, レジス ト液吐出量の設定情報欄に, ベンダー側で推奨する所定 の数値を入力する。 そして, 確定ボタンを押下すると, 例えば主制御部 8 1から温湿度調節部 3 9, 気体供給制御部 3 8及び吐出量制御部 3 6 に, 当該所定の数値等の設定情報が出力され, カップ 3 1 内の温湿度, カップ 3 1 内の風速, レジス ト液の吐出量が設定される。 Next, as shown in Fig. 9, for example, the operator inputs predetermined values recommended by the vendor in the setting information fields of the temperature and humidity in the cup, the wind speed in the cup, and the discharge amount of the resist liquid. Then, when the confirm button is pressed, for example, the main controller 81 to the temperature / humidity controller 39, the gas supply controller 38, and the discharge amount controller 36 Then, the setting information such as the predetermined numerical value is output, and the temperature and humidity in the cup 31, the wind speed in the cup 31, and the discharge amount of the resist liquid are set.
これと同時に, 設定入力画面 Sで入力された各数値は, 図 1 0に示 すよ うに表示部 8 3 におけるチェック リ ス ト画面 Tの各チェック情報の 欄に表示される。 このとき, 立ち上げ作業の行われた日付, 時間が日付 時間欄に表示される。 その後, 当該チェック事項に関する作業を行つ た作業員の氏名が, 例えばマニュアル入力部 8 4から入力され, 作業員 サイン欄に記入される。  At the same time, each numerical value input on the setting input screen S is displayed in the column of each check information on the check list screen T on the display section 83 as shown in FIG. At this time, the date and time when the start-up work was performed are displayed in the date / time column. Then, the name of the worker who performed the work related to the check items is input, for example, from the manual input section 84, and is entered in the worker's signature field.
一方, 作業員が, 例えばレジス ト塗布ユニッ ト 2 1 のレジス ト液吐 出ノ ズルの位置調整, ス ピンチャ ック 3 0上のゥヱハのセンタ位置調整 を行う場合, 先ず, 作業員がノ ギス, 治具等の測定器具を用いてレジス ト液吐出ノ ズル 3 2 の位置やウェハ Wのセンタ位置を実測する。次いで, 当該実測値が許容範囲内のものである場合には, 当該実測値をマ二ユア ル入力部 8 4から入力し, チェック リ ス ト画面 Tのチヱック情報欄に記 入する。 一方, 実測値が許容範囲でない場合には, レジス ト液吐出ノズ ル 3 2の位置等を補正, 修正し, 再度測定して, 当該実測値をマ二ユア ル入力部 8 4から入力する。 これによ り, 当該補正後の実測値がチェ ッ ク リ ス ト画面 Tのチェック情報欄に記入される。 このとき, 上記設定入 力部 8 0からの入力と同様に, 日付, 時間が自動的に記入される。 その 後, 例えばマニュアル入力部 8 4から当該作業を行った作業員の氏名が 入力され, チェック リ ス ト画面 Tの作業員のサイン欄に記入される。  On the other hand, when the worker adjusts the position of the resist solution discharge nozzle of the resist dispensing unit 21 and adjusts the center position of the needle C on the spin chuck 30, for example, the worker first uses a caliper. The position of the resist solution discharge nozzle 32 and the center position of the wafer W are actually measured using measuring instruments such as a jig and a jig. Next, if the measured value is within the allowable range, enter the measured value from the manual input section 84 and enter it in the check information field of the checklist screen T. On the other hand, if the measured value is not within the allowable range, the position and the like of the resist solution discharge nozzle 32 are corrected and corrected, and the measured value is measured again, and the measured value is input from the manual input unit 84. As a result, the actual measured value after the correction is entered in the check information column of the checklist screen T. At this time, the date and time are automatically entered in the same way as the input from the setting input section 80 described above. Then, for example, the name of the worker who performed the work is input from the manual input section 84, and is entered in the sign field of the worker on the checklist screen T.
このよ うにして, チェック リ ス ト画面 Tのチェック事項に従って, 設定入力部 8 0からの入力と, マニュアル入力部 8 4からの入力を順次 行っていく こ とによって, 画面上にチェック リ ス トが作成される。  In this way, the input from the setting input section 80 and the input from the manual input section 84 are sequentially performed according to the check items on the check list screen T, so that the check list is displayed on the screen. Is created.
こ う して全てのチェック事項が記入されたチェック リ ス ト画面 Tは, 例えばチェ ック リ ス ト情報と してコ ン ト ロールセク シヨ ン 1 3 の記憶部 8 2に保存される。 また, 必要に応じてプリ ンタ等の図示しない印刷装 置によって出力する。 The check list screen T in which all the check items have been entered in this way is stored in the storage section 82 of the control section 13 as, for example, check list information. If necessary, a printing device (not shown) such as a printer may be used. Output according to the location.
以上の実施の形態によれば, 立ち上げ作業時に作成されるチェック リ ス トを, 塗布現像処理装置 1 の表示部 8 3にチェック リ ス ト画面丁と して表示しておき,設定入力部 8 0で設定された設定値等の設定情報が, そのまま自動的にチェック リ ス ト画面 Tに記入されるよ うにしたので, チェック リ ス トの記入ミスゃ記入漏れが防止できる。また,作業員が一々 設定値等を書き留めておく必要がないので, チェック リ ス トの作成が迅 速に行われて, 立ち'上げ作業に要する時間が短縮される。  According to the above embodiment, the check list created during the start-up work is displayed as a check list screen on the display section 83 of the coating and developing apparatus 1, and the setting input section is displayed. Since the setting information such as the set value set in 80 is automatically entered in the checklist screen T as it is, mistakes in the checklist entry and omission of entry can be prevented. Also, since it is not necessary for the operator to write down the set values and the like, the checklist is created quickly, and the time required for the startup work is reduced.
また, マニュアル入力部 8 4 を備えたので, 設定入力部 8 0 の設定 事項でないチェック事項に関しては,作業員がマニュアルで設定,調整, 確認等した後, 当該設定値等をマニュアル入力部 8 4からチェック リ ス ト画面 Tに記入できる。  In addition, since the manual input section 84 is provided, the operator manually sets, adjusts, and confirms the check items that are not the setting items of the setting input section 80, and then inputs the set values and the like to the manual input section 84. You can fill out the checklist screen T from.
かかる実施の形態で記載したチェック リ ス ト画面 Tにおいて, 既に チェック済みのチェック事項とそうでないチェック事項とを識別して表 示するよ うにしてもよレ、。 例えば, 図 1 1 に示すよ う にチェック済みの チェック事項と未チェックの事項とを色分け表示する。 かかる場合, 未 チェック事項が一見して分かるので,チェック漏れが防止される。なお, チェック事項の識別は, 他の方法, 例えば明度, 点滅によって識別する よ う にしてもよい。 また, 未チェック事項のみを抽出して表示するよ う にしてもよい。  In the check list screen T described in the embodiment, the check items that have already been checked and the check items that have not been checked may be identified and displayed. For example, as shown in Fig. 11, checked and unchecked items are displayed in different colors. In such a case, unchecked items can be seen at a glance, thus preventing omission of checks. The check items may be identified by other methods, for example, by brightness or blinking. Also, only unchecked items may be extracted and displayed.
以上の実施の形態では, マニュアル入力部 8 4を単独で設けたが, 表示部 8 3に入力機能を設けて, 一体化させてもよい。 この場合, 例え ば表示部 8 3は, ポインティ ングデバイスであるタッチスク リーン等で 構成され, 設定入力部 8 0から入力されないチェック事項や作業員のサ イ ンを表示部 8 3のチェック リ ス ト画面 Tに直接入力することができる, また, 前記実施の形態では, 設定入力部 8 0 と表示部 8 3 とが別々 に設けられていたが, 双方の機能を有する機器を用いて設定入力とチェ ック リ ス ト画面の表示を一箇所で行ってもよい。 例えば, タ ツチスク リ ーンになっている設定入力部 8 0にチェック リ ス ト画面 Tを表示できる よ う にする。 そして, このチェック リ ス ト画面 Tと設定入力画面 Sとを 切り替え可能にする。 これによ り, 設定入力とチェック リ ス トの表示を 一箇所で行う ことができる。 なお, 設定入力部 8 0は, タツチスク リー ンであるため, 前記マニュアル入力部 8 4で行われるマニュアル入力を 行う こと もできる。 In the above embodiment, the manual input section 84 is provided independently. However, the display section 83 may be provided with an input function and integrated. In this case, for example, the display unit 83 is configured with a touch screen or the like as a pointing device, and the check list and the operator's sign that are not input from the setting input unit 80 are displayed in the check list 83. Although the setting input unit 80 and the display unit 83 are provided separately in the above embodiment, the setting input unit 80 and the display unit 83 are provided separately. Choi The list screen may be displayed at one place. For example, a checklist screen T can be displayed on the setting input section 80 that is a touch screen. Then, the check list screen T and setting input screen S can be switched. This allows the setting input and the display of the checklist to be performed in one place. Since the setting input section 80 is a touch screen, the manual input performed by the manual input section 84 can also be performed.
さ らに, 以上の実施の形態で記載したチェック リ ス ト画面 Tに表示 されたチェック情報を, ィ ンターネッ トを介してベンダー側に送信でき るよ うにしてもよレヽ。  Furthermore, the check information displayed on the check list screen T described in the above embodiment may be transmitted to the vendor side via the Internet.
図 1 2は, チェック リ ス ト画面 Tに表示されたチェック情報をベン ダー側に送信するための通信システム 1 0 0の構成概略図である。 工場 1 0 1側には, 同一仕様の複数の塗布現像処理装置 M 1〜M n と, それ らの塗布現像処理装置 M l〜Mnを一括管理する AG C (A d v a n c e d G r o u p C o m p u t e r ) 1 0 2が設けられてレヽる。 AG C 1 0 2 と塗布現像処理装置 M l〜Mn とは, L AN 1 0 3で接続され ている。 例えば塗布現像処理装置 M lのコ ン トロールセクショ ン 1 0 4 には, 図 1 3に示すよ うに AG C 1 0 2 と情報を通信するために通信手 段と しての通信部 1 0 5が設けられている。 また, AG C 1 0 2にも, 図示しない通信部が設けられている。  Figure 12 is a schematic diagram of the communication system 100 for transmitting the check information displayed on the check list screen T to the vendor. On the factory 101 side, a plurality of coating and developing units M 1 to M n with the same specifications and an advanced group computer (AGC) 1 that collectively manages the coating and developing units M 1 to M n 02 is provided. AGC102 and the coating and developing equipment Ml to Mn are connected by LAN103. For example, as shown in Fig. 13, the control section 104 of the coating and developing apparatus Ml has a communication section 105 as a communication means for communicating information with the AGC 102. Is provided. The AGC 102 also has a communication unit (not shown).
一方, ベンダー 1 0 6側には, ホス トコンピュータ 1 0 7が設けら れている。 ホス ト コ ンピュータ 1 0 7には, 図示しない通信部が設けら れている。 ホス トコンピュータ 1 0 7 と AG C 1 0 2 とは, インターネ ッ ト 1 0 8を介して接続されており, 互いに通信することができる。 か かる構成によ り, 塗布現像処理装置 M 1 における表示部 8 3のチェック 情報を, AG C 1 0 2を介してイ ンターネッ ト 1 0 8を通じてベンダー 1 0 6側のホス ト コ ンピュータ 1 0 7に送信できる。 そして, 例えば塗 布現像処理装置 M l の立ち上げ作業時に, チェック リ ス ト画面 Tに表示 されたチェック情報を, 所定時間毎にベンダー 1 0 6側に送信するよ う にする。 これによ り, 当該チヱック情報を受け取った専門家であるベン ダ一 1 0 6側の管理者は, 当該チェック情報に基づいて工場 1 0 1側に いる作業員に指示等を与え, 当該立ち上げ作業を指揮監督することがで きる。 また, ベンダー 1 0 6力 チェック情報をチェック リ ス ト と して 入手し, ベンダー 1 0 6でデータ と して保存しておく ことができる。 さ らに, 工場 1 0 1側で保存されたチェック情報を必要に応じていつでも 入手することができる。 On the other hand, a host computer 107 is provided on the vendor 106 side. The host computer 107 is provided with a communication unit (not shown). The host computer 107 and the AGC 102 are connected via the Internet 108 and can communicate with each other. With this configuration, the check information of the display unit 83 of the coating and developing processing apparatus M1 is transmitted to the host computer 10 of the vendor 106 through the Internet 108 via the AGC 102. 7 can be sent. And, for example, paint The check information displayed on the check list screen T is transmitted to the vendor 106 at predetermined time intervals when the cloth development processor Ml is started up. As a result, the manager of the vendor 106 who is the expert who received the check information gives instructions to the worker at the factory 101 based on the check information, He can supervise the lifting work. In addition, vendor 106 check information can be obtained as a checklist and stored as data by vendor 106. In addition, the check information stored at the factory 101 can be obtained whenever necessary.
かかる実施の形態において, 塗布現像処理装置 M 1 力 S, 既に立ち上 げ作業の終了している他の塗布現像処理装置, 例えば塗布現像処理装置 M 2のチェック情報を入手し, 当該チェック情報を標準チェック情報と して, チェック リ ス ト画面 Tのチェック情報と比較検討するよ うにして よい。 例えば, 通信部 1 0 5が, 塗布現像処理装置 M 2 のチェック情報 を L A N 1 0 3 を介して入手し,例えば記憶部 8 2に格納する。そして, 所定のプログラムによって塗布現像処理装置 M 2のチェック情報とチェ ック リ ス ト画面 Tに表示されているチェック情報とを比較し, 相異する 事項については, 識別表示する。 作業員は, 当該相異する事項について は, 例えば再度設定, 確認等を行う よ う にする。 こ うすることによ り , 設定, 調整ミ ス等が抑制され, 立ち上げ作業がよ り正確に行われる。  In such an embodiment, the check information of the coating and developing processing apparatus M 1, the check information of another coating and developing processing apparatus that has already been started up, for example, the coating and developing processing apparatus M 2 is obtained, and the check information is obtained. The standard check information may be compared with the check information on the checklist screen T. For example, the communication unit 105 obtains the check information of the coating and developing processing apparatus M 2 via the LAN 103 and stores it in, for example, the storage unit 82. Then, the check information of the coating and developing treatment apparatus M2 is compared with the check information displayed on the checklist screen T by a predetermined program, and different items are identified and displayed. Workers are to re-set, confirm, etc. for the different items. By doing so, setting and adjustment mistakes are suppressed, and the start-up work is performed more accurately.
また, 標準チェック情報と して, 他のチェック情報, 例えば正常に 既に稼動している塗布現像処理装置のチェック情報, 他の工場の塗布現 像処理装置のチユック情報, 予めベンダーが作成した理想チュック情報 等であってもよい。 なお, 他の工場の塗布現像処理装置のチェック情報 を入手する場合, 例えばインターネッ ト 1 0 8を介してホス ト コ ンビュ —タ 1 0 7が他の工場のチヱック情報を入手し, 塗布現像処理装置 M 1 に送信するよ うにしてもよい。 以上で記載した実施の形態は, 塗布現像処理装置に関するものであ つたが, 本発明は, 他の処理装置, 例えば露光装置, エッチング装置, 検查装置等にも応用される。 また, 本発明は, ウェハの処理装置に適用 されたが, ウェハ以外の基板, 例えば L C D基板, フォ トマスク用のマ スク レチクル基板等の処理装置においても適用できる。 産業上の利用可能性 The standard check information includes other check information, such as check information of the coating and developing processing equipment that is already operating normally, check information of the coating and developing processing equipment in other factories, and ideal chucks created by vendors in advance. It may be information or the like. When obtaining check information of the coating and developing processing equipment of another factory, for example, the host computer 107 obtains the chip information of the other factory via the Internet 108 and executes the coating and developing processing. You may make it transmit to apparatus M1. Although the embodiment described above relates to a coating and developing processing apparatus, the present invention can be applied to other processing apparatuses, for example, an exposure apparatus, an etching apparatus, and an inspection apparatus. Further, the present invention has been applied to a wafer processing apparatus, but can also be applied to a processing apparatus for a substrate other than a wafer, for example, an LCD substrate or a mask reticle substrate for a photomask. Industrial applicability
半導体デバイスの製造を行う塗布現像処理装置において, 作業員な どが立ち上げ作業時のチェック リ ス トを作成する際に有用である。  This is useful when creating a checklist for start-up work by workers, etc. in coating and developing equipment that manufactures semiconductor devices.

Claims

請求の範囲 The scope of the claims
1 . 基板の処理を行う処理装置であって, 1. A processing device for processing substrates,
前記処理装置を稼動させるための各種機器, 部材等の諸元を設定するた めに, 前記処理装置の設定事項に関する設定情報を入力する設定入力部 と, A setting input unit for inputting setting information on setting items of the processing device in order to set specifications of various devices, members, and the like for operating the processing device;
前記処理装置における所定のチェック事項に関するチェック リ ス ト画面 を表示する表示部とを備え, A display unit for displaying a check list screen relating to predetermined check items in the processing device;
前記チェック事項には, 前記設定事項が含まれており, The check items include the setting items,
前記設定入力部で入力された設定情報は, 前記チェック リ ス ト画面にお ける当該設定情報に対応するチェック事項の欄に自動的に表示されるこ とを特徴とする, 基板の処理装置。 The substrate processing apparatus, wherein the setting information input by the setting input unit is automatically displayed in a check item column corresponding to the setting information on the check list screen.
2 . ク レーム 1 の基板の処理装置において,  2. In the processing system for the substrate of claim 1,
前記設定入力部からでは設定できないチェック事項に関するチェック情 報を入力する入力部を備え, An input unit for inputting check information on check items that cannot be set from the setting input unit;
前記入力部から入力されたチェック情報は, 前記チェック リ ス ト画面に おける当該チュック情報に対応するチェック事項の欄に表示される。The check information input from the input unit is displayed in a column of a check item corresponding to the check information on the check list screen.
3 . ク レーム 1 の基板の処理装置において, 3. In the processing system for the substrate of claim 1,
前記チェック リ ス ト画面は, 既にチェック済みのチェック事項と未チェ ックのチェック事項とが識別できるよ うに表示される。 The check list screen is displayed so that already checked items and unchecked items can be distinguished.
4, ク レーム 1 の基板の処理装置において, 4. In the processing equipment for the substrate of claim 1,
前記チェック リ ス ト画面には, 前記処理装置のチヱック作業を行った作 業員に関する情報が表示される。 The check list screen displays information about the worker who performed the picking operation of the processing device.
5 . ク レーム 1 の基板の処理装置において, 5. In the processing system for the substrate of claim 1,
前記チェック リ ス ト画面は,表示されたチェック事項のチヱック情報が, 標準チェック情報と異なっている場合に, 当該チェック事項が識別でき るよ うに表示される。 The check list screen can be used to identify the check item when the displayed check information is different from the standard check information. Is displayed.
6 . ク レーム 1 の基板の処理装置において,  6. In the processing system for the substrate of claim 1,
前記チェック リ ス ト画面に表示されたチェック事項に関するチェック情 報を, 前記処理装置のベンダーにインターネッ トを介して送信するため の通信手段を備える。 A communication unit is provided for transmitting check information on the check items displayed on the check list screen to the vendor of the processing device via the Internet.
7 . ク レーム 1 の基板の処理装置において,  7. In the processing system for the substrate of claim 1,
他の基板の処理装置に関するチェック情報を入手するための通信手段を 備える。 A communication unit is provided for obtaining check information on a processing apparatus for another substrate.
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