WO2002071555A3 - High repetition rate excimer laser system - Google Patents

High repetition rate excimer laser system Download PDF

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Publication number
WO2002071555A3
WO2002071555A3 PCT/US2002/006235 US0206235W WO02071555A3 WO 2002071555 A3 WO2002071555 A3 WO 2002071555A3 US 0206235 W US0206235 W US 0206235W WO 02071555 A3 WO02071555 A3 WO 02071555A3
Authority
WO
WIPO (PCT)
Prior art keywords
excimer laser
repetition rate
equal
laser system
khz
Prior art date
Application number
PCT/US2002/006235
Other languages
French (fr)
Other versions
WO2002071555A2 (en
WO2002071555A9 (en
Inventor
Michael A Pell
Charlene M Smith
Paul M Then
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Priority to EP02728380A priority Critical patent/EP1371117B1/en
Priority to JP2002570358A priority patent/JP2004523913A/en
Priority to KR1020037011494A priority patent/KR100870330B1/en
Priority to AU2002258435A priority patent/AU2002258435A1/en
Publication of WO2002071555A2 publication Critical patent/WO2002071555A2/en
Publication of WO2002071555A3 publication Critical patent/WO2002071555A3/en
Publication of WO2002071555A9 publication Critical patent/WO2002071555A9/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/12—Halides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H01S3/0346—Protection of windows or mirrors against deleterious effects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Lasers (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention provides a greater than or equal to 4 khz repetition rate argon fluoride excimer laser system for providing a uv 193 nm wavelength output. The greater than or equal to 4 khz repetition rate argon fluoride excimer laser system includes an argon fluoride excimer laser chamber (22) for producing a 193 nm discharge at a pulse repetition rate greater than or equal to 4 khz. The greater than or equal to 4 khz repetition rate argon fluoride excimer laser chamber (22) includes magnesium fluoride crystal optic windows (20) for outputting the 193 nm output (24) with the magnesium fluoride crystal optic windows (20) having a 255 nm induced absorption less than .08 Abs/42mm when exposed to 5 million pulses pfd 193 nm light at a fluence greater than or equal to 40 mj/cm/pulse and a 42 mm crystal 120nm transmission of at least 30%.
PCT/US2002/006235 2001-03-02 2002-03-01 High repetition rate excimer laser system WO2002071555A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP02728380A EP1371117B1 (en) 2001-03-02 2002-03-01 High repetition rate excimer laser system
JP2002570358A JP2004523913A (en) 2001-03-02 2002-03-01 High repetition rate excimer laser system
KR1020037011494A KR100870330B1 (en) 2001-03-02 2002-03-01 High repetition rate eximer laser system
AU2002258435A AU2002258435A1 (en) 2001-03-02 2002-03-01 High repetition rate excimer laser system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27281401P 2001-03-02 2001-03-02
US60/272,814 2001-03-02

Publications (3)

Publication Number Publication Date
WO2002071555A2 WO2002071555A2 (en) 2002-09-12
WO2002071555A3 true WO2002071555A3 (en) 2002-11-21
WO2002071555A9 WO2002071555A9 (en) 2003-12-18

Family

ID=23041411

Family Applications (3)

Application Number Title Priority Date Filing Date
PCT/US2002/005932 WO2002071558A1 (en) 2001-03-02 2002-02-25 High repetition rate uv excimer laser
PCT/US2002/006124 WO2002073244A2 (en) 2001-03-02 2002-03-01 Method of making high repetition rate excimer laser crystal optics and uv<200nm transmitting optical floride crystal
PCT/US2002/006235 WO2002071555A2 (en) 2001-03-02 2002-03-01 High repetition rate excimer laser system

Family Applications Before (2)

Application Number Title Priority Date Filing Date
PCT/US2002/005932 WO2002071558A1 (en) 2001-03-02 2002-02-25 High repetition rate uv excimer laser
PCT/US2002/006124 WO2002073244A2 (en) 2001-03-02 2002-03-01 Method of making high repetition rate excimer laser crystal optics and uv<200nm transmitting optical floride crystal

Country Status (8)

Country Link
US (2) US20020122450A1 (en)
EP (3) EP1371119A4 (en)
JP (3) JP3857236B2 (en)
KR (2) KR20030081482A (en)
CN (2) CN1507682A (en)
AU (2) AU2002258435A1 (en)
TW (1) TW569510B (en)
WO (3) WO2002071558A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6904073B2 (en) * 2001-01-29 2005-06-07 Cymer, Inc. High power deep ultraviolet laser with long life optics
US6801562B2 (en) * 2001-03-02 2004-10-05 Corning Incorporated High repetition rate excimer laser system
AU2003223174A1 (en) * 2002-02-13 2003-09-04 Corning Incorporated High repetition rate excimer laser system
JP2003347627A (en) * 2002-05-29 2003-12-05 Gigaphoton Inc Uv laser device
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
EP1924890A1 (en) * 2005-09-14 2008-05-28 Carl Zeiss SMT AG Optical system of a microlithographic exposure system
JP5352321B2 (en) * 2009-04-06 2013-11-27 ギガフォトン株式会社 Gas laser device for exposure
KR101810062B1 (en) 2011-10-14 2017-12-19 삼성디스플레이 주식회사 Laser crystallization apparatus and laser crystallizatio method using the same
CN106181073A (en) * 2016-08-25 2016-12-07 张美华 Laser drilling machine
CN108183383B (en) * 2018-01-22 2020-03-17 中国科学院合肥物质科学研究院 Excimer laser applied to vitiligo treatment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6242136B1 (en) * 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6345065B1 (en) * 1998-06-04 2002-02-05 Lambda Physik Ag F2-laser with line selection

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59227183A (en) * 1983-06-07 1984-12-20 Hamamatsu Photonics Kk Rare gas-halogen-excimer laser
JPH01115897A (en) * 1987-10-30 1989-05-09 Nippon Mining Co Ltd Production of magnesium fluoride single crystal
US5134518A (en) * 1990-07-11 1992-07-28 Bausch & Lomb Incorporated Missile windows
US5272710A (en) * 1992-09-08 1993-12-21 Hughes Aircraft Company Stress-free mounting and protection of liquid-cooled solid-state laser media
RU2041298C1 (en) 1993-08-17 1995-08-09 Акционерное общество "Инкром" Vapor phase crystal growing method
JP3071694B2 (en) * 1996-07-30 2000-07-31 日本電気株式会社 Narrow band excimer laser device
JPH10324571A (en) * 1997-05-23 1998-12-08 Riken Corp Molybdenum disilicide ceramic heat generating body and its production
US6137821A (en) * 1997-06-04 2000-10-24 Cymer, Inc. Durable etalon based output coupler
US6238479B1 (en) * 1997-10-24 2001-05-29 Canon Kabushiki Kaisha Raw material for manufacturing fluoride crystal, refining method of the same, fluoride crystal, manufacturing method of the same, and optical part
JP3969865B2 (en) * 1997-10-24 2007-09-05 キヤノン株式会社 Method for producing fluoride crystals
JP3657800B2 (en) * 1998-02-20 2005-06-08 株式会社リケン Molybdenum disilicide-based composite ceramic heating element and manufacturing method thereof
US6163559A (en) * 1998-06-22 2000-12-19 Cymer, Inc. Beam expander for ultraviolet lasers
JP2000034193A (en) * 1998-07-16 2000-02-02 Nikon Corp Heat treatment and production of fluoride single crystal
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
JP2000124534A (en) * 1998-10-12 2000-04-28 Komatsu Ltd ArF EXCIMER LASER AND BAND NARROWING MODULE THEREOF
JP3631063B2 (en) * 1998-10-21 2005-03-23 キヤノン株式会社 Method for purifying fluoride and method for producing fluoride crystal
US6587202B2 (en) * 2000-01-28 2003-07-01 Lambda Physik Ag Optical materials testing method
US6330256B1 (en) * 2000-02-01 2001-12-11 Raytheon Company Method and apparatus for non-dispersive face-cooling of multi-crystal nonlinear optical devices

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6345065B1 (en) * 1998-06-04 2002-02-05 Lambda Physik Ag F2-laser with line selection
US6242136B1 (en) * 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass

Also Published As

Publication number Publication date
AU2002258435A1 (en) 2002-09-19
EP1449013A2 (en) 2004-08-25
CN1299406C (en) 2007-02-07
CN1507682A (en) 2004-06-23
WO2002073244A2 (en) 2002-09-19
WO2002073244A9 (en) 2003-02-13
US20020122450A1 (en) 2002-09-05
CN1524323A (en) 2004-08-25
JP2004523122A (en) 2004-07-29
JP3857236B2 (en) 2006-12-13
TW569510B (en) 2004-01-01
EP1371117A2 (en) 2003-12-17
WO2002073244A3 (en) 2004-06-24
EP1371117B1 (en) 2011-08-31
JP2004534381A (en) 2004-11-11
WO2002071555A2 (en) 2002-09-12
US20030210726A1 (en) 2003-11-13
AU2002258427A1 (en) 2002-09-24
US6768762B2 (en) 2004-07-27
WO2002071558A1 (en) 2002-09-12
JP2004523913A (en) 2004-08-05
KR20030084958A (en) 2003-11-01
EP1371119A1 (en) 2003-12-17
EP1449013A4 (en) 2006-09-20
EP1371119A4 (en) 2006-10-11
KR20030081482A (en) 2003-10-17
EP1371117A4 (en) 2006-10-11
WO2002071555A9 (en) 2003-12-18
KR100870330B1 (en) 2008-11-25

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