WO2002071143A1 - Light source device, light illuminating device and exposure device, and device producing method - Google Patents

Light source device, light illuminating device and exposure device, and device producing method Download PDF

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Publication number
WO2002071143A1
WO2002071143A1 PCT/JP2002/001968 JP0201968W WO02071143A1 WO 2002071143 A1 WO2002071143 A1 WO 2002071143A1 JP 0201968 W JP0201968 W JP 0201968W WO 02071143 A1 WO02071143 A1 WO 02071143A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
wavelength
producing method
phase matching
light source
Prior art date
Application number
PCT/JP2002/001968
Other languages
French (fr)
Japanese (ja)
Inventor
Hitoshi Kawai
Hiroshi Kitano
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2002570000A priority Critical patent/JPWO2002071143A1/en
Publication of WO2002071143A1 publication Critical patent/WO2002071143A1/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/353Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G02F1/3534Three-wave interaction, e.g. sum-difference frequency generation
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/353Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G02F1/354Third or higher harmonic generation

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A non-linear optical crystal (189), onto which a light with a first wavelength and a light with a second wavelength are coaxially shone, efficiently produces from the first-wavelength light a third light being a second higher harmonic thereof by non-critical phase matching or pseudo phase matching and almost coaxially outputs the second-wavelength light and the third-wavelength light. Therefore, a non-linear optical crystal (191) in the latter stage can efficiently produce a sum frequency without using optical path adjusting components for phase matching required in producing a sum frequency of the second-wavelength light and the third-wavelength light, enabling an efficient production of wavelength-converted light with a simple configuration.
PCT/JP2002/001968 2001-03-02 2002-03-04 Light source device, light illuminating device and exposure device, and device producing method WO2002071143A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002570000A JPWO2002071143A1 (en) 2001-03-02 2002-03-04 Light source device, light irradiation device, exposure device, and device manufacturing method

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001-058970 2001-03-02
JP2001058970 2001-03-02
JP2001-248655 2001-08-20
JP2001248655 2001-08-20

Publications (1)

Publication Number Publication Date
WO2002071143A1 true WO2002071143A1 (en) 2002-09-12

Family

ID=26610558

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/001968 WO2002071143A1 (en) 2001-03-02 2002-03-04 Light source device, light illuminating device and exposure device, and device producing method

Country Status (2)

Country Link
JP (1) JPWO2002071143A1 (en)
WO (1) WO2002071143A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011158749A (en) * 2010-02-02 2011-08-18 Nikon Corp Laser device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10186428A (en) * 1996-12-26 1998-07-14 Sony Corp Laser beam generating device
JPH11212128A (en) * 1998-01-23 1999-08-06 Mitsubishi Materials Corp Wavelength converting element, production thereof and solid laser device using the same
WO2000016140A1 (en) * 1998-09-14 2000-03-23 The Secretary Of State For Defence Fabrication of optical waveguides
EP1063742A1 (en) * 1998-03-11 2000-12-27 Nikon Corporation Ultraviolet laser apparatus and exposure apparatus comprising the ultraviolet laser apparatus
EP1067426A1 (en) * 1998-03-27 2001-01-10 Japan Science and Technology Corporation Wavelength conversion crystal and method for generating laser beam, and apparatus for generating laser beam
JP2001158692A (en) * 1999-12-02 2001-06-12 Mitsubishi Heavy Ind Ltd Wavelength sensing element
JP2001352116A (en) * 2000-06-07 2001-12-21 Nikon Corp Laser device, aligner using the same, and exposing method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10186428A (en) * 1996-12-26 1998-07-14 Sony Corp Laser beam generating device
JPH11212128A (en) * 1998-01-23 1999-08-06 Mitsubishi Materials Corp Wavelength converting element, production thereof and solid laser device using the same
EP1063742A1 (en) * 1998-03-11 2000-12-27 Nikon Corporation Ultraviolet laser apparatus and exposure apparatus comprising the ultraviolet laser apparatus
EP1067426A1 (en) * 1998-03-27 2001-01-10 Japan Science and Technology Corporation Wavelength conversion crystal and method for generating laser beam, and apparatus for generating laser beam
WO2000016140A1 (en) * 1998-09-14 2000-03-23 The Secretary Of State For Defence Fabrication of optical waveguides
JP2001158692A (en) * 1999-12-02 2001-06-12 Mitsubishi Heavy Ind Ltd Wavelength sensing element
JP2001352116A (en) * 2000-06-07 2001-12-21 Nikon Corp Laser device, aligner using the same, and exposing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011158749A (en) * 2010-02-02 2011-08-18 Nikon Corp Laser device

Also Published As

Publication number Publication date
JPWO2002071143A1 (en) 2004-07-02

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