WO2002008486A3 - Electrode apparatus and method for plasma processing - Google Patents

Electrode apparatus and method for plasma processing Download PDF

Info

Publication number
WO2002008486A3
WO2002008486A3 PCT/US2001/022510 US0122510W WO0208486A3 WO 2002008486 A3 WO2002008486 A3 WO 2002008486A3 US 0122510 W US0122510 W US 0122510W WO 0208486 A3 WO0208486 A3 WO 0208486A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma processing
electrode
electrode apparatus
source electrode
metal drive
Prior art date
Application number
PCT/US2001/022510
Other languages
French (fr)
Other versions
WO2002008486A2 (en
Inventor
Murray D Sirkis
Wayne L Johnson
Steven T Fink
Original Assignee
Tokyo Electon Ltd
Murray D Sirkis
Wayne L Johnson
Steven T Fink
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electon Ltd, Murray D Sirkis, Wayne L Johnson, Steven T Fink filed Critical Tokyo Electon Ltd
Priority to AU2001273538A priority Critical patent/AU2001273538A1/en
Publication of WO2002008486A2 publication Critical patent/WO2002008486A2/en
Publication of WO2002008486A3 publication Critical patent/WO2002008486A3/en
Priority to US10/345,232 priority patent/US20030106644A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/3255—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32605—Removable or replaceable electrodes or electrode systems

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Cleaning In General (AREA)

Abstract

A plasma processing system includes an electrode assembly (150) having a metal drive electrode (154) coupled to a source electrode (152) using fasteners (132) which not introduce contaminants into the plasma processing chamber. In addition, the source electrode (152) is provided with at least a partially metallized surface (151) that serves as the interface between the metal drive electrode (154) and the source electrode material (153).
PCT/US2001/022510 2000-07-20 2001-07-19 Electrode apparatus and method for plasma processing WO2002008486A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2001273538A AU2001273538A1 (en) 2000-07-20 2001-07-19 Electrode apparatus and method for plasma processing
US10/345,232 US20030106644A1 (en) 2001-07-19 2003-01-16 Electrode apparatus and method for plasma processing

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21945300P 2000-07-20 2000-07-20
US60/219,453 2000-07-20

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/345,232 Continuation US20030106644A1 (en) 2001-07-19 2003-01-16 Electrode apparatus and method for plasma processing

Publications (2)

Publication Number Publication Date
WO2002008486A2 WO2002008486A2 (en) 2002-01-31
WO2002008486A3 true WO2002008486A3 (en) 2002-06-20

Family

ID=22819317

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/022510 WO2002008486A2 (en) 2000-07-20 2001-07-19 Electrode apparatus and method for plasma processing

Country Status (2)

Country Link
AU (1) AU2001273538A1 (en)
WO (1) WO2002008486A2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0095200A2 (en) * 1982-05-21 1983-11-30 Tegal Corporation Plasma reactor removeable insert
US5074456A (en) * 1990-09-18 1991-12-24 Lam Research Corporation Composite electrode for plasma processes
US5569356A (en) * 1995-05-19 1996-10-29 Lam Research Corporation Electrode clamping assembly and method for assembly and use thereof
US6073577A (en) * 1998-06-30 2000-06-13 Lam Research Corporation Electrode for plasma processes and method for manufacture and use thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0095200A2 (en) * 1982-05-21 1983-11-30 Tegal Corporation Plasma reactor removeable insert
US5074456A (en) * 1990-09-18 1991-12-24 Lam Research Corporation Composite electrode for plasma processes
US5569356A (en) * 1995-05-19 1996-10-29 Lam Research Corporation Electrode clamping assembly and method for assembly and use thereof
US6073577A (en) * 1998-06-30 2000-06-13 Lam Research Corporation Electrode for plasma processes and method for manufacture and use thereof

Also Published As

Publication number Publication date
WO2002008486A2 (en) 2002-01-31
AU2001273538A1 (en) 2002-02-05

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