WO2002008309A3 - Use of cross-linker and compositions made therefrom - Google Patents

Use of cross-linker and compositions made therefrom Download PDF

Info

Publication number
WO2002008309A3
WO2002008309A3 PCT/EP2001/007912 EP0107912W WO0208309A3 WO 2002008309 A3 WO2002008309 A3 WO 2002008309A3 EP 0107912 W EP0107912 W EP 0107912W WO 0208309 A3 WO0208309 A3 WO 0208309A3
Authority
WO
WIPO (PCT)
Prior art keywords
initiator
linker
cross
electron beam
disclosed
Prior art date
Application number
PCT/EP2001/007912
Other languages
French (fr)
Other versions
WO2002008309A2 (en
Inventor
Douglas C Neckers
Alexandre Mejiritski
John Malpert
Sue Ellen Williamson
Original Assignee
Ucb Sa
Douglas C Neckers
Alexandre Mejiritski
John Malpert
Sue Ellen Williamson
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ucb Sa, Douglas C Neckers, Alexandre Mejiritski, John Malpert, Sue Ellen Williamson filed Critical Ucb Sa
Priority to AU2001279729A priority Critical patent/AU2001279729A1/en
Priority to EP01957942A priority patent/EP1309645A2/en
Publication of WO2002008309A2 publication Critical patent/WO2002008309A2/en
Publication of WO2002008309A3 publication Critical patent/WO2002008309A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)

Abstract

The invention provides a method of polymerizing or crosslinking cationically curable components using X-rays, gamma rays or electron beam as an energy source. As the initiator for the cationic polymerization, an onium gallate compound having an anion of the formula GaXaRb wherein X is a halogen atom or a hydroxy group, R is an aryl group or a substituted aryl group, a and b are each represent an integer of 0 to 4 provided that the sum of a and b is 4 is disclosed. The invention also provides a composite material and a method for preparing the composite material using an electron beam and the onium gallate compound as an initiator. Finally, disclosed is a photoresist material containing the onium gallate compound as the acid generator or crosslinking initiator.
PCT/EP2001/007912 2000-07-17 2001-07-10 Use of cross-linker and compositions made therefrom WO2002008309A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2001279729A AU2001279729A1 (en) 2000-07-17 2001-07-10 Use of cross-linker and compositions made therefrom
EP01957942A EP1309645A2 (en) 2000-07-17 2001-07-10 Use of cross-linker and compositions made therefrom

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US62020400A 2000-07-17 2000-07-17
US09/620,204 2000-07-17

Publications (2)

Publication Number Publication Date
WO2002008309A2 WO2002008309A2 (en) 2002-01-31
WO2002008309A3 true WO2002008309A3 (en) 2002-05-16

Family

ID=24485003

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2001/007912 WO2002008309A2 (en) 2000-07-17 2001-07-10 Use of cross-linker and compositions made therefrom

Country Status (3)

Country Link
EP (1) EP1309645A2 (en)
AU (1) AU2001279729A1 (en)
WO (1) WO2002008309A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6708382B2 (en) * 2015-09-03 2020-06-10 サンアプロ株式会社 Curable composition and cured product using the same
EP3327091B1 (en) 2016-11-23 2023-01-18 Essilor International Epoxy functional composition protecting dyes from photo-degradation and cured coatings prepared therefrom
WO2019111796A1 (en) * 2017-12-06 2019-06-13 日本化薬株式会社 Photosensitive resin composition, dry film resist, and cured objects obtained therefrom
WO2019208443A1 (en) * 2018-04-23 2019-10-31 住友ベークライト株式会社 Photosensitive resin composition for bump protecting films, semiconductor device, method for manufacturing semiconductor device, and electronic device
CN111333880B (en) * 2020-04-21 2022-04-22 万华化学集团股份有限公司 Super water-absorbing polymer and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124417A (en) * 1990-02-12 1992-06-23 Minnesota Mining And Manufacturing Company Initiators for cationic polymerization
US6166233A (en) * 1999-08-17 2000-12-26 Spectra Group Limited, Inc. Onium gallates cationic initiators
EP1136533A1 (en) * 2000-01-28 2001-09-26 General Electric Company Curable silicone compositions incorporating photoactive onium salts

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124417A (en) * 1990-02-12 1992-06-23 Minnesota Mining And Manufacturing Company Initiators for cationic polymerization
US6166233A (en) * 1999-08-17 2000-12-26 Spectra Group Limited, Inc. Onium gallates cationic initiators
EP1136533A1 (en) * 2000-01-28 2001-09-26 General Electric Company Curable silicone compositions incorporating photoactive onium salts

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NECKERS DOUGLAS C ET AL: "Tetrakis(pentafluorophenyl)gallates (I)", TETRAHEDRON LETTERS, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, NL, vol. 41, no. 45, November 2000 (2000-11-01), pages 8669 - 8672, XP002160995, ISSN: 0040-4039 *

Also Published As

Publication number Publication date
AU2001279729A1 (en) 2002-02-05
WO2002008309A2 (en) 2002-01-31
EP1309645A2 (en) 2003-05-14

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