WO2001095316A2 - Method and apparatus for cleaning disc drive components - Google Patents
Method and apparatus for cleaning disc drive components Download PDFInfo
- Publication number
- WO2001095316A2 WO2001095316A2 PCT/US2001/017518 US0117518W WO0195316A2 WO 2001095316 A2 WO2001095316 A2 WO 2001095316A2 US 0117518 W US0117518 W US 0117518W WO 0195316 A2 WO0195316 A2 WO 0195316A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- exposed surface
- cleaning
- cleaning fluid
- slider bearing
- microstructure device
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 86
- 238000000034 method Methods 0.000 title claims description 20
- 239000012530 fluid Substances 0.000 claims abstract description 43
- 239000000758 substrate Substances 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 4
- 230000003068 static effect Effects 0.000 claims description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 239000002245 particle Substances 0.000 description 22
- 238000003860 storage Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/41—Cleaning of heads
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/50—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges
- G11B23/505—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
- G11B5/60—Fluid-dynamic spacing of heads from record-carriers
- G11B5/6005—Specially adapted for spacing from a rotating disc using a fluid cushion
Definitions
- the present invention relates to disc drive data storage devices.
- the present invention relates to cleaning discs and wafers used in making disc drives.
- discs have a thin layer of magnetic material at a sliding disc surface and read/write heads have various magnetic and insulating components formed at a sliding head surface.
- read/write heads have various magnetic and insulating components formed at a sliding head surface.
- Burnish heads For example, burnish heads, ultrasonic and megasonic cleaning have been used. However, burnish heads can break up particles into smaller particles which also adhere to the sliding surface. Ultrasonic or megasonic cleaning would have to use unacceptable amounts of power in order to get high enough pressure gradients to remove small particles. As areal densities of disc drives increase, the critical dimension between sliding components is becoming smaller and approaching 5 nanometers in some applications. A method and apparatus are needed that can clean extremely small particles from micromechanical sliding surfaces without damaging the micromechanical structures that are at or near the sliding surfaces during the cleaning process.
- the apparatus includes a fixture with a mounting surface adapted to receive the microstructure device.
- a cleaning fluid covers the exposed surface.
- a slider bearing coupled to a resilient mount flies over the exposed surface.
- a cleaning line on the exposed surface adjacent the slider bearing is subject to a flow of the cleaning fluid.
- the flow can be generated by relative motion between the microstructure device and the slider bearing or generated by a nozzle.
- FIG. 1 illustrates a disc drive storage device
- FIG. 2 illustrates fluid flow of a cleaning fluid between an exposed surface of a microstructure device and a slider bearing.
- FIG. 3 illustrates pressures and pressure gradients under the slider bearing in FIG. 2.
- FIGS. 4-5 illustrate a first embodiment of an apparatus adapted to clean multiple exposed surfaces.
- FIG. 6 illustrates a vacuum chuck plate securing multiple substrates that each include an array of disc drive heads.
- FIG. 7 illustrates a second embodiment of an apparatus adapted to clean multiple exposed surfaces.
- a cleaning apparatus cleans extremely small particles from exposed surfaces of microstructure devices such as disc drive sliders and discs.
- the microstructure devices are secured to mounting surfaces in the apparatus and a cleaning fluid covers the exposed surface.
- a slider bearing on a resilient mount is disposed over the exposed surfaces.
- Cleaning lines are formed on the exposed surfaces adjacent the slider bearings. The cleaning lines are then subjected to flow of the cleaning fluid. The flow can be generated by relative motion between the microstructure device and the slider bearing or generated by a nozzle. A boundary layer on the exposed surfaces is disturbed by the flow at the cleaning line and particles are efficiently removed.
- Disc drive 100 includes a disc pack 126 having storage surfaces 106 that are typically layers of magnetic material that are deposited using microstructure fabrication techniques.
- the disc pack 126 includes a stack of multiple discs and the read/write head assembly 112 includes a read/write transducer or head 110 for each stacked disc.
- the head 110 is typically formed using microstructure fabrication techniques.
- Disc pack 126 is spun or rotated as shown by arrow 107 to allow read/write head assembly 112 to access different rotational locations for data on the storage surfaces 106 on the disc pack 126.
- Read/write head assembly 112 is actuated to move radially, relative to the disc pack 126, as shown by arrow 122 to access different radial locations for data on the storage surfaces 106 of disc pack 126.
- the actuation of read/write head assembly 112 is provided by a voice coil motor 118.
- Voice coil motor 118 includes a rotor 116 that pivots on axle 120 and an arm 114 that actuates the read/write head assembly 112.
- Disc drive 100 includes electronic circuitry 130 for controlling the operation of the disc drive 100 and transferring data in and out of the disc drive.
- the disc drive head 110 slides over the storage surface 106 in the disc drive 100 as illustrated. If there are particles of a large enough dimension between the sliding surfaces, then there is an increased risk that one of the sliding surfaces may be damaged during operation. In modern disc drives a critical dimension can approach 5 nanometers between the head 110 and the storage surface 106. Particles can cause damage and need to be removed from the sliding surfaces before assembly of the disc drive 100. Methods and apparatus for cleaning the sliding surfaces are described below in connection with FIGS. 2-7.
- FIG. 2 illustrates a portion of a cleaning apparatus 138.
- a cleaning fluid 140 flows around an exposed surface 142 of a microstructure device 144 and around a slider bearing 146 during a cleaning operation.
- Cleaning fluid 140 can be a clean gas such as air or dry nitrogen, or it can be a liquid cleaning fluid.
- Cleaning fluid 140 is drawn over the microstructure device 144 at a relatively slow rate to carry away particles 148 as they are dislodged as explained in more detail below.
- the cleaning apparatus in FIG. 2 is used to remove the extremely small particles 148 from exposed surface 142 before the microstructure device 144 (or a portion of the microstructure device) is installed in a disc drive.
- Microstructure device 144 is a sliding disc drive component such as a disc or a substrate with an array of disc drive heads.
- Exposed surface 142 is a surface that, after assembly of a disc drive, will slide over another surface during operation of the disc drive.
- the exposed surface 142 is formed by microstructure fabrication techniques such as lapping, sputtering, chemical vapor deposition, epitaxy, evaporation or the like.
- Microstructure fabrication processes or associated handling and storage of the microstructure device 144 can leave the extremely small particles 148 adhered to the exposed surface 142.
- the particles 148 adhere strongly to exposed surface 142 and are difficult to remove. These particles 148 are so small that they remain embedded in a boundary layer 150 of the cleaning fluid 140, even when there is fluid flow above the exposed surface 142.
- the microstructure device 144 is rapidly moved or spun relative to the slider bearing 146.
- Mircrostructure device 144 is secured on a fixture 187 that spins the microstructure device 144.
- a mounting arm 154 subjects the slider bearing 146 to a resilient force urging the slider bearing 146 toward the exposed surface 142. Flow induced by the relative motion between the microstructure device 144 and the slider bearing 146 forces the boxmdary layer 150 to pass through a narrow gap 156 between the the slider bearing 146 and the exposed surface 142.
- the pressure P in the cleaning fluid 140 at 165 increases greatly at the narrow gap 156.
- the rate of change of pressure dP/dX increases in a turbulent wake 166 beyond the gap as illustrated at 164.
- the horizontal axis X represents position along the exposed surface 142 under the slider bearing 146.
- the solid vertical axis P represents pressure and the dashed vertical axis dP/dX represents pressure gradient.
- the increased pressure P at 165 (near X ⁇ O) generates a force that tends to lift the slider bearing 146 a small distance away from the exposed surface 142.
- Slider bearing 146 is able to move because it is resiliently mounted.
- the boundary layer 150 is forced through the narrow gap at 156 resulting in the desired high flow rates in the cleaning fluid which scrub the particles off of the exposed surface 142 along a cleaning line 147.
- the flow of cleaning fluid at 156 disturbs the boundary layer 150 and comes extremely close to the exposed surface 142.
- the particles 148 are entrained in the turbulent wake 166 behind the slider bearing 146 and carried away by the slow flow of cleaning fluid over the cleaning apparatus. In the case of liquid cleaning fluids, a static pressure is maintained on the cleaning fluid to reduce or eliminate any cavitation that might damage the exposed surface 142.
- the pressurized boundary layer at the trailing edge (at 156) generates high pressure gradients.
- the "bearing number" is equal to (6 ⁇ U L)/(h P) where ⁇ is the viscosity of the cleaning fluid, U is the relative velocity between the disc and the slider bearing, L is the slider bearing length and h is the minimum distance between the disc and the slider bearing, and P is the ambient pressure.
- This force is approximately two orders of magnitude larger than the forces that are generated with commercially available megasonic cleaning equipment. Cleaning using a slider bearing has the potential to be even more efficient than megasonic cleaning.
- FIGS. 4-5 illustrate a first embodiment of an apparatus 200 adapted to clean exposed surfaces 142.
- Apparatus 200 is arranged to clean multiple exposed surfaces 142 of microstructure devices 144.
- the arrangement of apparatus .200 is similar to that of a disc drive.
- microstructure devices 144 are discs for a disc drive, however, a vacuum chuck plate such as the one illustrated in FIG. 6 can be installed instead of discs.
- the microstructure device 144 are secured on multiple surfaces 187 of a fixture 186.
- Fixture 186 is a drive shaft of a servomotor 188 that is used to spin the drive shaft.
- the apparatus 200 is immersed in a bath of cleaning fluid 188 that is slowly moving as indicated by arrows to carry away dislodged particles.
- the slider bearings 146 are coupled to the resilient mountings 154 over the exposed surfaces 142.
- the microstructure devices 144 are spun by servomotor 188 .
- the microstructure devices 144 move as indicated by arrow 152, generally perpendicular to the slider bearings 146 and cleaning line 147. This relative motion provides flow of the cleaning fluid along the dashed cleaning line 147 on the exposed surfaces 142 adjacent the slider bearings 146.
- the cleaning lines 147 move over the exposed surfaces 142 along a line generally perpendicular to the cleaning line 147. Substantially all of areas of surfaces 142 are swept clean by the high flows at the cleaning lines 147.
- Turbulent wakes 166 follow the cleaning lines 147 and are carried away by the slow flow of cleaning fluid 188 over the apparatus 200.
- the slider bearings 146 and the resilient mountings 154 are moved from an operating position (as illustrated in FIG. 4) over the exposed surface to a second position out of the way of the exposed surfaces 142 as indicated by arrow 149.
- the resilient mounts 154 are attached to a hub 182 that pivots on an axle 184. The movement is driven by a voice coil motor 180 in a manner similar to a disc drive. This movement allows for convenient installation and removal of the microstructure devices 144.
- FIG. 6 illustrates an assembly 300 that includes a vacuum chuck plate 302 and multiple substrates 304 including arrays of disc drive heads.
- the multiple substrates 304 are secured to the vacuum chuck plate 302 by application of a vacuum under the substrates 304.
- the vacuum is provided from a central plenum shaft (not illustrated) via vacuum passageways 306.
- the assembly 300 can be loaded into an apparatus such as apparatus 200 of FIGS. 4- 5. Once loaded into an apparatus 200, a cleaning line 308 is formed and swept around the plate 302 to clean the multiple substrates 304.
- FIG. 7 illustrates a second embodiment of an apparatus 400 adapted to clean exposed surfaces 142 of micromechanical devices 304 secured to the vacuum chuck plate 302 as shown in FIG. 6.
- the vacuum chuck plate 302 is mounted on a shaft 320.
- Shaft 320 is arranged to be slowly rotated during a cleaning process to move multiple cleaning lines 308 over the exposed surfaces 142.
- Shaft 320 includes an internal passageway 322 that provides vacuum to the vacuum passageways 306 in vacuum chuck 302.
- a movable mounting plate 330 is mounted on a shaft 332.
- Mounting plate 330 can be in a cleaning position as illustrated or can be moved away as illustrated by lines 331 to permit convenient loading and unloading of micromechanical devices 304 in the chuck plate 302.
- Shaft 332 includes an internal passageway 334 that delivers highly pressurized cleaning fluid to a passageway 336 in the mounting plate 330.
- Passageway 336 couples the highly pressurized cleaning fluid to four nozzles 338 that are arranged beneath four slider bearings 340. For clarity, only two of the four arrangements of slider bearings 340 are illustrated in FIG. 7. Flow of the cleaning fluid 140 is generated by the pressurized nozzles 338 disposed between the slider bearings 340 and the exposed surfaces 142. In FIG. 7, no high speed relative motion is needed between the slider bearings 340 and the exposed surfaces 142.
- an apparatus (138, 200, 400) is adapted to clean an exposed surface (142) of a microstructure device (144, 304).
- the apparatus (138, 200, 400) includes a fixture (186, 302) having a mounting surface (187) adapted to secure the microstructure device (144, 304).
- a cleaning fluid (140, 188) covers the exposed surface (142).
- a slider bearing (146, 340) is disposed over the exposed surface (142).
- a resilient mount (154) couples to the slider bearing (146, 340).
- a cleaning line (147, 308) is present on the exposed surface (142) adjacent the slider bearing (146, 340). The cleaning line (147, 308) is subject to flow of the cleaning fluid (140, 188).
- microstructure devices for a disc drive storage system
- teachings of the present invention can be applied to other microstructure devices, like LCD panels or silicon or gallium arsenide semiconductor integrated circuit wafers, without departing from the scope and spirit of the present invention.
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002502771A JP3686406B2 (en) | 2000-06-02 | 2001-05-31 | Method and apparatus for cleaning disk drive components |
AU2001275045A AU2001275045A1 (en) | 2000-06-02 | 2001-05-31 | Method and apparatus for cleaning disc drive components |
DE10196295T DE10196295T5 (en) | 2000-06-02 | 2001-05-31 | Method and device for cleaning disk drive components |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US20888600P | 2000-06-02 | 2000-06-02 | |
US60/208,886 | 2000-06-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001095316A2 true WO2001095316A2 (en) | 2001-12-13 |
WO2001095316A3 WO2001095316A3 (en) | 2002-05-30 |
Family
ID=22776437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/017518 WO2001095316A2 (en) | 2000-06-02 | 2001-05-31 | Method and apparatus for cleaning disc drive components |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP3686406B2 (en) |
CN (1) | CN1440550A (en) |
AU (1) | AU2001275045A1 (en) |
DE (1) | DE10196295T5 (en) |
WO (1) | WO2001095316A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9691641B2 (en) | 2012-12-13 | 2017-06-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method of cleaning wafers |
MY180178A (en) | 2013-02-28 | 2020-11-24 | Seagate Technology Llc | Method of cleaning magnetic head slider |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3731291A (en) * | 1971-04-12 | 1973-05-01 | Burroughs Corp | Integrated positive pressure and self-purge system |
US4489740A (en) * | 1982-12-27 | 1984-12-25 | General Signal Corporation | Disc cleaning machine |
US4889564A (en) * | 1986-09-05 | 1989-12-26 | Fuji Photo Film Co., Ltd. | Magnetic disk cleaning method and apparatus |
US5231622A (en) * | 1990-03-26 | 1993-07-27 | Fuji Photo Film Co., Ltd. | Method of and system for cleaning a floppy disk with an ionizing needle |
US6021785A (en) * | 1996-07-24 | 2000-02-08 | Grutzediek; Hartmut | Procedure and device for cleaning disk-shaped objects in particular wafers by sonification with water as rinsing medium |
US6050276A (en) * | 1997-11-21 | 2000-04-18 | Pre-Tech Co., Ltd. | Apparatus and method for cleaning a precision substrate |
-
2001
- 2001-05-31 CN CN 01812312 patent/CN1440550A/en active Pending
- 2001-05-31 WO PCT/US2001/017518 patent/WO2001095316A2/en active Application Filing
- 2001-05-31 AU AU2001275045A patent/AU2001275045A1/en not_active Abandoned
- 2001-05-31 JP JP2002502771A patent/JP3686406B2/en not_active Expired - Fee Related
- 2001-05-31 DE DE10196295T patent/DE10196295T5/en not_active Withdrawn
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3731291A (en) * | 1971-04-12 | 1973-05-01 | Burroughs Corp | Integrated positive pressure and self-purge system |
US4489740A (en) * | 1982-12-27 | 1984-12-25 | General Signal Corporation | Disc cleaning machine |
US4889564A (en) * | 1986-09-05 | 1989-12-26 | Fuji Photo Film Co., Ltd. | Magnetic disk cleaning method and apparatus |
US5231622A (en) * | 1990-03-26 | 1993-07-27 | Fuji Photo Film Co., Ltd. | Method of and system for cleaning a floppy disk with an ionizing needle |
US6021785A (en) * | 1996-07-24 | 2000-02-08 | Grutzediek; Hartmut | Procedure and device for cleaning disk-shaped objects in particular wafers by sonification with water as rinsing medium |
US6050276A (en) * | 1997-11-21 | 2000-04-18 | Pre-Tech Co., Ltd. | Apparatus and method for cleaning a precision substrate |
Also Published As
Publication number | Publication date |
---|---|
AU2001275045A1 (en) | 2001-12-17 |
JP3686406B2 (en) | 2005-08-24 |
WO2001095316A3 (en) | 2002-05-30 |
CN1440550A (en) | 2003-09-03 |
DE10196295T5 (en) | 2004-04-22 |
JP2003536190A (en) | 2003-12-02 |
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