CN1440550A - Method and apparatus for cleaning disc drive components - Google Patents
Method and apparatus for cleaning disc drive components Download PDFInfo
- Publication number
- CN1440550A CN1440550A CN 01812312 CN01812312A CN1440550A CN 1440550 A CN1440550 A CN 1440550A CN 01812312 CN01812312 CN 01812312 CN 01812312 A CN01812312 A CN 01812312A CN 1440550 A CN1440550 A CN 1440550A
- Authority
- CN
- China
- Prior art keywords
- exposure
- sliding bearing
- washing fluid
- equipment
- microstructure device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 48
- 238000000034 method Methods 0.000 title claims description 19
- 239000012530 fluid Substances 0.000 claims abstract description 45
- 238000005406 washing Methods 0.000 claims description 41
- 238000009434 installation Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 4
- 230000003068 static effect Effects 0.000 claims description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 239000002245 particle Substances 0.000 description 24
- 238000003860 storage Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002105 nanoparticle Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- 108010022579 ATP dependent 26S protease Proteins 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/41—Cleaning of heads
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/50—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges
- G11B23/505—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
- G11B5/60—Fluid-dynamic spacing of heads from record-carriers
- G11B5/6005—Specially adapted for spacing from a rotating disc using a fluid cushion
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
An apparatus (138, 200; 400) adapted to clean an exposed surface of a microstructure device (144, 304) such as a disc or head for a disc drive. The apparatus includes a fixture (187, 302) with a mounting surface adapted to receive the microstructure device. A cleaning fluid (140) covers the exposed surface. A slider bearing (146, 340) coupled to a resilient mount (154) flies over the exposed surface. A cleaning line (147, 308) on the exposed surface adjacent the slider bearing is subject to flow of the cleaning fluid. The flow can be generated by relative motion between the device and the slider bearing or generated by a nozzle (338).
Description
Technical field
The present invention relates to the disc driver information accumulation device.More particularly, the present invention relates to clean disk and the wafer that in making disc driver, uses.
Background technology
In the device of disc driver storage device and other sophistication such as the LCD plate, have some surfaces that comprise the surface of being damaged or near MIniature machinery structure.For example, disk has the thin layer of a magnetic material at the slip magnetic disk surface, and read-write head has multiple magnetic and the insulated part that is formed on the glide head surface.When particle adhesion during, by sliding action particle is broken away from, and destroy the MIniature machinery structure of the precision on one or two slipping plane in slipping plane.
Cleaning technique can be used for effectively removing bigger particle.For example, used polishing magnetic head, ultrasound wave and especially big sound wave (megasonic) to clean.Yet the polishing magnetic head can be littler particle with particle breakdown, and these particles adhere to slipping plane equally.Ultrasound wave or especially big sound wave clean the unacceptable power of usage quantity of will having to, so that obtain sufficiently high pressure gradient, to remove smaller particles.Along with the increase of the surface density of disc driver, the critical size between the sliding component becomes littler, and reaches 5 nanometers in some applications.Need a kind ofly can to clean the method and apparatus of nano sized particles from the micromachine slipping plane, and during cleaning, can not destroy the slipping plane place or near MIniature machinery structure.
Summary of the invention
Disclosed a kind of method and apparatus that is suitable for cleaning an exposure of the microstructure device such as disk that is used for disc driver or magnetic head.This equipment comprises that one has the fixture of an installation surface, and this installation surface is suitable for admitting the microstructure device.One washing fluid covers exposure.
One sliding bearing that is connected to a flexible fastening piece moves above exposure.Cleaning Line near the sliding bearing the exposure stands flowing of washing fluid.Should flow and to produce by the relative motion between microstructure device and the sliding bearing, or produce by a nozzle.
Carefully check the following drawings and corresponding detailed description the in detail, will make additional features and benefit become clear.
Description of drawings
Fig. 1 shows a disc driver storage device.
Fig. 2 shows washing fluid and flows at the exposure and the fluid between the sliding bearing of a microstructure device.
Fig. 3 shows pressure and the pressure gradient under the sliding bearing of Fig. 2.
Fig. 4-5 shows one first embodiment of the equipment that is suitable for cleaning a plurality of exposures.
Fig. 6 shows the vacuum clip plate of fixing a plurality of substrates, and each substrate comprises one group of magnetic head of disc drive.
Fig. 7 shows one second embodiment of the equipment that is suitable for cleaning a plurality of exposures.
Embodiment
In the following embodiments, a cleaning equipment cleans nano sized particles from the exposure of the microstructure device such as disc driver slider and disk.The microstructure device is fixed in the installed surface in the equipment, and a washing fluid has covered exposure.Sliding bearing on one flexible fastening piece is arranged on the exposure top.Cleaning Line forms near the exposure the sliding bearing.Cleaning Line stands flowing of washing fluid then.Should flow and to produce by relative motion between microstructure device and the sliding bearing, or produce by a nozzle.By the Cleaning Line place flow a boundary layer on the disturbance exposure, and effectively remove particle.
In Fig. 1, show an embodiment of disc driver storage device 100.Disc driver 100 comprises a disk groups 126, and this disk groups has the storage surface 106 of the magnetic material layer that typically uses microstructure manufacturing technology deposition.Disk groups 126 comprises folded a plurality of disks, and read-write head assembly 112 comprises that one is used for the read-write transducer or the magnetic head 110 of each disk that piles up.Usually use the microstructure manufacturing technology to form magnetic head 110.Disk groups 126 is as rotating or rotate shown in the arrow 107, so that read-write head assembly 112 is near the different rotary position that is used for data on the storage surface on the disk groups 126 106.
Activate read-write head assembly 112, so that it moves radially (shown in arrow 122) with respect to disk groups 126, with near the different radial positions that are used for data on the storage surface 106 of disk groups 126.Usually, the actuating of read-write head assembly 112 is provided by a voice coil motor 118.Voice coil motor 118 comprises that a rotor 116 that pivots and activates the arm 114 of read-write head assembly 112 on axle 120.Disc driver 100 comprises the electronic circuit 130 that is used to control the operation of disc driver 100 and data is imported into and read from disc driver.
Usually, slide above the storage surface 106 of disc driver 110 in illustrated disc driver 100.If the enough big particle of size is arranged between slipping plane, the danger that then makes run duration damage one of slipping plane increases.In modern disk drives, the critical size between magnetic head 110 and the storage surface 106 can be near 5 nanometers.Particle can cause damaging, and need before loading disk driver 100 it be removed from slipping plane.The method and apparatus that is used to clean slipping plane below in conjunction with Fig. 2-7 narration.
Fig. 2 shows the part of cleaning equipment 138.During cleaning operation, washing fluid 140 is flowing around the exposure 142 of a microstructure device 144 and around the sliding bearing 146.Washing fluid 140 can be the clean gas such as air or dried nitrogen, perhaps can be the liquid washing fluid.When particle 148 was discharged from, washing fluid 140 moved to the top of microstructure device 144 with speed relatively slowly, so that particle is taken away, as what below will more be described in detail.Before microstructure device 144 (or part of microstructure device) was installed in the disc driver, the cleaning equipment among Fig. 2 was used for removing nano sized particles 148 from exposure 142.
Shown in 152, microstructure device 144 is with respect to sliding bearing 146 fast moving or rotation.Microstructure device 144 is fixed on the fixture 187 of a rotation microstructure device 144.One hold-down arm 154 makes sliding bearing 146 be subjected to one and pushes sliding bearing the elastic force of exposure 142 to.Caused the flowing of relative motion between microstructure device 144 and the sliding bearing 146 forces boundary layer 150 by the close clearance 156 between sliding bearing 146 and the exposure 142.
As shown in Figure 3, the pressure P in the washing fluid 140 at close clearance 156 places sharply increases at 165 places.Shown in 164, the speed dP/dX that pressure changes increases in surpassing the disorderly wake flow 166 in gap.In Fig. 3, transverse axis X representative is along the position of the exposure 142 of sliding bearing 146 belows.Solid line longitudinal axis P representative pressure, and dotted line longitudinal axis dP/dX representative pressure gradient.
The pressure that increases at 165 places (near X=0) produces the power of sliding bearing 146 liftings one being left the small distance of exposure 142.Because sliding bearing 146 is installed by elasticity, so it can move.Force boundary layer 150 to pass through close clearance at 156 places, cause the washing fluid of cleaning the particle of exposures 142 along Cleaning Line 147 to have the high flow rate of expectation.Washing fluid makes boundary layer 150 disturbances at the mobile of 156 places, and makes it extremely near exposure 142.Particle 148 is entrained in the sliding bearing 146 disorderly wake flow 166 afterwards, and is cleaned slow mobile the taking away of the washing fluid of equipment top.Under the situation of liquid washing fluid, maintain static pressure on the washing fluid, to reduce or eliminate any cavitation that to destroy exposure 142.
The supercharging boundary layer at trailing edge place (156 place) produces high pressure gradients.Can estimate the quantity of these gradients by the analytical solution of Reynolds equation.For example, have 1 * 10
4Bearing number, 1 centimetre bearing length, H
Max/ H
Min=200 and H
MinThe sliding bearing that=1 micron plane is wedge shape produces in air and acts on about 1 * 10 on the particle
11D
3Newton's power, wherein D is the diameter (unit is rice) of particle." bearing number " equals (6 μ UL)/(h
2P), wherein μ is the viscosity of washing fluid, and U is the relative velocity between disk and the sliding bearing, and L is a sliding bearing length, and h is the minor increment between disk and the sliding bearing, and P is an environmental pressure.Big two orders of magnitude of power that the especially big sound wave cleaning equipment that this power is sold than market is basically produced.The cleaning of use sliding bearing has the big sound wave of bit and cleans more efficiently potentiality.
Among Fig. 4 below-7, with identical label identification and the same or analogous feature of feature among Fig. 2.
Fig. 4-5 shows one first embodiment of the equipment 200 that is suitable for cleaning exposure 142.Equipment 200 is configured to clean a plurality of exposures 142 of microstructure device 144.The setting of equipment 200 is similar to being provided with of disc driver.Shown in Fig. 4-5, microstructure device 144 is disc driver disks, yet, all vacuum clip plates as shown in Figure 6 can be installed replace disk.Microstructure device 144 be fixed on a fixture 186 a plurality of surperficial 187 on.Fixture 186 is main drive shafts of a servomotor 188, and this servomotor is used for rotating driveshaft.Equipment 200 is immersed in the pond of washing fluid 188, and this washing fluid such slow moving as shown by arrows is to take away the particle that shifts out.
Sliding bearing 146 is connected to the flexible fastening piece 154 of exposure 142 tops.Microstructure device 144 is by servomotor 188 rotations.Microstructure device 144 is as moving shown in the arrow 152, and moving direction is vertical with Cleaning Line 147 with sliding bearing 146 usually.Relative motion makes washing fluid move along the Cleaning Line that is represented by dotted lines 147 near the exposure 142 the sliding bearing 146.When 144 rotations of microstructure device, Cleaning Line 147 moves above exposure 142 along a line that is approximately perpendicular to Cleaning Line 147.The All Ranges on surface 142 is cleaned the abundant flush clean of high fluidity at line 147 places.Disorderly wake flow 166 is followed Cleaning Line 147, and is taken away by slowly flowing of the washing fluid 188 of equipment 200 tops.
When finishing cleaning, sliding bearing 146 and flexible fastening piece 154 move to by the second place outside the track of the exposure 142 shown in the arrow 149 from a run location (as shown in Figure 4) of exposure top.Flexible fastening piece 154 is connected to a hub sleeve 182 that pivots on one 184.Voice coil motor 180 orders about it in the mode similar to disc driver and moves.It is convenient to move the installation and removal that can make microstructure device 144.
Fig. 6 shows an assembly 300 that comprises a vacuum clip plate 302 and comprise a plurality of substrates 304 of many group magnetic head of disc drive.Use the vacuum of substrate 304 belows, a plurality of substrates 304 are fixed in vacuum clip plate 302.Provide vacuum by vacuum passage 306 by a central ventilating shaft (not shown).Assembly 300 equipment the equipment 200 shown in Fig. 4-5 of can packing into.In case load facility 200 just will form and clean a Cleaning Line 308, to clean a plurality of substrates 304 around plate 302.
Also assembly 300 can be packed into device such as following equipment shown in Figure 7 400.
Fig. 7 shows one second embodiment of the equipment 400 of the exposure 142 that is suitable for cleaning microstructure device 304, and this microstructure device is fixed in vacuum clip plate 302 shown in Figure 6.Vacuum clip plate 302 is installed on one 320.Axle 320 slowly rotates during being provided in cleaning process, so that many Cleaning Line 308 of exposure 142 tops move.Axle 320 comprises an inner passage 322, and this passage offers vacuum passage 306 in the vacuum clip plate 302 with vacuum.With one movably installing plate 330 be installed on one 332.Installing plate 330 can be in as shown in the figure the cleaning positions, perhaps can moving apart like that shown in collinear 331, so that the loading and unloading of the microstructure device 304 in the chuck plate 302 are convenient.Axle 332 comprises an inner passage 334, and this passage flows to passage 336 in the installing plate 330 with the washing fluid of high pressure-charging.Passage 336 makes the high pressure-charging washing fluid be connected with four nozzles 338 that are arranged on four sliding bearing 340 belows.For clarity sake, only show four sliding bearings 340 two in being provided with among Fig. 7.The supercharging nozzle 338 that is arranged between sliding bearing 340 and the exposure 142 produces flowing of washing fluid 140.In Fig. 7, do not need relative motion at a high speed between sliding bearing 340 and the exposure 142.
In a word, an equipment (138,200,400) is suitable for cleaning an exposure (142) of a microstructure device (144,304).Equipment (138,200,400) comprises that one has the fixture (186,302) of an installation surface (187), and this installation surface is suitable for fixedly microstructure device (144,304).One washing fluid (140,188) covers exposure (142).One sliding bearing (146,340) is arranged on the top of exposure (142).One flexible fastening piece (154) is connected to sliding bearing (146,340).One Cleaning Line (147,308) is positioned near the exposure (142) of sliding bearing (146,340).Cleaning Line (147,308) stands flowing of washing fluid (140,188).
Should be understood that, though set forth many feature and advantage of various embodiments of the present invention in the narration in front, and the details of the 26S Proteasome Structure and Function of various embodiments of the present invention, yet should disclose just illustrative, can also according in the expressed maximum magnitude of principle of the present invention, the broad sense of clause in appended claims to the present invention---especially with the structure of part with the variation of doing aspect relevant on the details is set.For example, under the situation that does not deviate from scope and spirit of the present invention, keeping essentially identical functional while, can change particular element according to the application-specific of microstructure device.In addition, although preferred embodiment as herein described relates to the microstructure device that is used for the disc driver stocking system, but those skilled in the art should be appreciated that, under the situation that does not deviate from scope and spirit of the present invention, purport of the present invention can be applied to other microstructure device, as LCD plate or silicon or gallium arsenide semiconductor integrated circuit (IC) wafer.
Claims (20)
1. method of cleaning an exposure of a microstructure device, this method comprises:
A. described microstructure device is fixed on the fixture, described fixture has the described exposure that is immersed in the washing fluid;
B. a sliding bearing is installed on the flexible fastening piece of described exposure top; And
C. provide flowing of described washing fluid along the Cleaning Line near the described exposure the described sliding bearing.
2. the method for claim 1 is characterized in that, it also comprises:
D. move described microstructure device along a line of motion that is approximately perpendicular to described Cleaning Line with respect to described sliding bearing.
3. the method for claim 1 is characterized in that, described exposure is to use a slipping plane of the microstructure device in a disc driver.
4. method as claimed in claim 3 is characterized in that, described microstructure device is included in on-chip one group of magnetic head of disc drive.
5. method as claimed in claim 3 is characterized in that, described flexible fastening piece can move to a second place of leaving described exposure from a primary importance of described exposure top.
6. the method for claim 1 is characterized in that, flowing of described washing fluid produced by the relative motion between described sliding bearing and the described exposure.
7. the method for claim 1 is characterized in that, flowing of described washing fluid produced by a supercharging nozzle that is arranged between described sliding bearing and the described exposure.
8. the method for claim 1 is characterized in that, described washing fluid is to be subjected to a liquid that is enough to prevent the static pressure of cavitation during cleaning.
9. one kind is suitable for the equipment that usefulness is cleaned an exposure of a microstructure device, and this equipment comprises:
One fixture, described fixture have one and are suitable for fixing described microstructure Unit Installation face;
One washing fluid, described washing fluid covers described exposure;
One sliding bearing, described sliding bearing are positioned at described exposure top;
One flexible fastening piece, described fixture is connected to described sliding bearing; And
Cleaning Line near the one described exposure that is positioned at the described sliding bearing, described Cleaning Line stand flowing of described washing fluid.
10. equipment as claimed in claim 9 is characterized in that, described Cleaning Line moves above described exposure along a line that is approximately perpendicular to described Cleaning Line.
11. equipment as claimed in claim 9 is characterized in that, described exposure is a slipping plane that is used for a microstructure device of a disc driver.
12. equipment as claimed in claim 9 is characterized in that, described microstructure device is included in on-chip one group of magnetic head of disc drive.
13. equipment as claimed in claim 9 is characterized in that, described flexible fastening piece can move to a second place of leaving described exposure from a primary importance of described exposure top.
14. equipment as claimed in claim 9 is characterized in that, flowing of described washing fluid produced by the relative motion between described sliding bearing and the described exposure.
15. equipment as claimed in claim 9 is characterized in that, flowing of described washing fluid produced by a supercharging nozzle that is arranged between described sliding bearing and the described exposure.
16. equipment as claimed in claim 9 is characterized in that, described washing fluid is to be subjected to a liquid that is enough to prevent the static pressure of cavitation during cleaning.
17. equipment as claimed in claim 9 is characterized in that, described washing fluid is an air.
18. equipment as claimed in claim 9 is characterized in that, described microstructure device comprises a silicon wafer.
19. equipment as claimed in claim 9 is characterized in that, described microstructure device comprises a gallium arsenide wafer.
20. an equipment that is suitable for cleaning an exposure of a microstructure device, this equipment comprises:
One installs the structure of the fixture of described microstructure device, and its exposure is covered by a washing fluid and a sliding bearing;
Be used for producing the device that flows of described washing fluid along the Cleaning Line near the described exposure the described sliding bearing.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US20888600P | 2000-06-02 | 2000-06-02 | |
| US60/208,886 | 2000-06-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1440550A true CN1440550A (en) | 2003-09-03 |
Family
ID=22776437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 01812312 Pending CN1440550A (en) | 2000-06-02 | 2001-05-31 | Method and apparatus for cleaning disc drive components |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP3686406B2 (en) |
| CN (1) | CN1440550A (en) |
| AU (1) | AU2001275045A1 (en) |
| DE (1) | DE10196295T5 (en) |
| WO (1) | WO2001095316A2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103871839A (en) * | 2012-12-13 | 2014-06-18 | 台湾积体电路制造股份有限公司 | Apparatus and method of cleaning wafers |
| CN104021802A (en) * | 2013-02-28 | 2014-09-03 | 希捷科技有限公司 | Method of cleaning magnetic head slider |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3731291A (en) * | 1971-04-12 | 1973-05-01 | Burroughs Corp | Integrated positive pressure and self-purge system |
| US4489740A (en) * | 1982-12-27 | 1984-12-25 | General Signal Corporation | Disc cleaning machine |
| JPH0736263B2 (en) * | 1986-09-05 | 1995-04-19 | 富士写真フイルム株式会社 | Magnetic disk cleaning method and apparatus |
| US5231622A (en) * | 1990-03-26 | 1993-07-27 | Fuji Photo Film Co., Ltd. | Method of and system for cleaning a floppy disk with an ionizing needle |
| DE19629705A1 (en) * | 1996-07-24 | 1998-01-29 | Joachim Dr Scheerer | Ultrasonic cleaning especially of wafer |
| JP2944598B2 (en) * | 1997-11-21 | 1999-09-06 | 株式会社プレテック | Cleaning apparatus and method for cleaning precision substrate |
-
2001
- 2001-05-31 WO PCT/US2001/017518 patent/WO2001095316A2/en active Application Filing
- 2001-05-31 JP JP2002502771A patent/JP3686406B2/en not_active Expired - Fee Related
- 2001-05-31 CN CN 01812312 patent/CN1440550A/en active Pending
- 2001-05-31 AU AU2001275045A patent/AU2001275045A1/en not_active Abandoned
- 2001-05-31 DE DE10196295T patent/DE10196295T5/en not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103871839A (en) * | 2012-12-13 | 2014-06-18 | 台湾积体电路制造股份有限公司 | Apparatus and method of cleaning wafers |
| US9691641B2 (en) | 2012-12-13 | 2017-06-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method of cleaning wafers |
| CN103871839B (en) * | 2012-12-13 | 2017-08-22 | 台湾积体电路制造股份有限公司 | The apparatus and method for cleaning wafer |
| CN104021802A (en) * | 2013-02-28 | 2014-09-03 | 希捷科技有限公司 | Method of cleaning magnetic head slider |
| US10854240B1 (en) | 2013-02-28 | 2020-12-01 | Seagate Technology Llc | Method of cleaning magnetic head sliders |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3686406B2 (en) | 2005-08-24 |
| WO2001095316A3 (en) | 2002-05-30 |
| JP2003536190A (en) | 2003-12-02 |
| AU2001275045A1 (en) | 2001-12-17 |
| DE10196295T5 (en) | 2004-04-22 |
| WO2001095316A2 (en) | 2001-12-13 |
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
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