WO2000054311A1 - Appareil pour elever et abaisser un objet - Google Patents

Appareil pour elever et abaisser un objet Download PDF

Info

Publication number
WO2000054311A1
WO2000054311A1 PCT/US1999/005367 US9905367W WO0054311A1 WO 2000054311 A1 WO2000054311 A1 WO 2000054311A1 US 9905367 W US9905367 W US 9905367W WO 0054311 A1 WO0054311 A1 WO 0054311A1
Authority
WO
WIPO (PCT)
Prior art keywords
base
extending
rotatable means
bore
generally
Prior art date
Application number
PCT/US1999/005367
Other languages
English (en)
Inventor
Ted G. Yoshidome
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Priority to PCT/US1999/005367 priority Critical patent/WO2000054311A1/fr
Publication of WO2000054311A1 publication Critical patent/WO2000054311A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere

Definitions

  • This invention relates generally to apparatus for raising and lowering an object and further relates to apparatus particularly useful for raising and lowering an ampule containing a processing liquid and/or gas used in semiconductor wafer processing apparatus.
  • DMAH dimethylaluminum hydride
  • TDMAT tetrakis (dimethylamino) titanium
  • a single ampule (FIG. 1A) or a plurality of ampules 10, 11, and 12 are shown connected to a suitable gas box 14 fed by a suitable gas supply line 16 which, for example, may feed either DMAH or TDMAT gas to the gas box 14.
  • the gas box 14 has an input and an output which connect to the ampule 10.
  • the ampule 10, conversely, has an input and an output port.
  • the ampules are connected to the gas box 14 by suitable connectors or couplers C which may be, for example, VCR glands available from Cajon Corporation located in Masadonia, Ohio.
  • VCR gland 22 includes a lower connector 23 including an externally threaded and rotatable collar 24 and a generally semi-spherical head 25.
  • the VCR gland 22 further includes an upper connector 26 providing with internal threads 27 for threadably engaging the external threads 29 provided on the rotatable collar 24 to interconnect the upper and lower connectors.
  • a VCR gasket 30 is pressed between upper gland face 32 and lower gland face 25.
  • the valve 28 can then be turned and opened to transfer or convey the gas and/or liquid in the ampule 10 to the semiconductor wafer processing apparatus 20.
  • the second valve 31 provides a gas to the ampule that flows in the direction represented by arrow 33 to either bubble or push out the gas and or liquid inside ampule 10 to an output flow direction (represented by arrow 34) .
  • an output flow direction represented by arrow 34
  • such horizontal movement can damage the semi-spherical head 25 by producing scratches or grooves in the head 25.
  • Such scratches or grooves can become filled with DMAH or TDMAT, thus permitting the air to contact the gases during ampule disconnection. If the scratch or groove is deep and long enough, it may provide a path for the gas to leak into the system and such a leak reacts with DMAH to produce a fire, and if the air contains moisture, the moisture can react with TDMAT to produce a flame.
  • Such conditions are obviously hazardous to attendant personnel and can also cause highly expensive damage to the semiconductor wafer processing apparatus.
  • Apparatus satisfying such need and including the present invention may include a base, a rotatable cam mounted rotatably to the base and including a plurality of upwardly extending camming members, and a support member including a plurality of downwardly extending engaging members engaging the plurality of upwardly extending camming members. Upon rotation of the rotatable cam, the support member moves vertically relative to the base.
  • the apparatus may also include a first container residing on the support member and for containing the object, a second container for receiving the base, the rotatable cam, the support member and the first container and for engaging and preventing rotation of the support member.
  • a first container residing on the support member and for containing the object
  • a second container for receiving the base, the rotatable cam, the support member and the first container and for engaging and preventing rotation of the support member.
  • the plurality of upwardly extending camming members cam the plurality of engaging members and the support member upwardly to cause the support member to move the first container upwardly
  • the plurality of engaging members are cammed downwardly by the camming members to lower the support member and the first container.
  • the second container is a gas containment box for a semiconductor wafer processing system and the object to be lifted is an ampule of process liquid and/or gas.
  • the ampule is vertically lifted to facilitate attachment of VCR glands.
  • the apparatus of the present invention finds use in a system for filling ampules from a gas box.
  • FIGs . 1A and IB are diagrammatical illustrations of an ampule (s) connected to a gas box from which the ampule (s) are filled with liquid and/or gas;
  • FIG. 2 is a diagrammatical illustration of a liquid and/or gas-filled ampule and semiconductor wafer processing apparatus ,-
  • FIG. 3 is an exploded view illustrating the detailed structure of apparatus for raising and lowering an object, such as an ampule and which apparatus embodies the present invention
  • FIG. 4 is a bottom view of the rotatable cam of the present invention.
  • FIG. 5 is an enlarged cross-sectional view taken generally along the line 5-5 in FIG. 4 in the direction of the arrows ;
  • FIG. 6 is a generally cross-sectional vertical view illustrating the detailed structure of the center shaft of the present invention.
  • FIG. 7 is a generally cross-sectional vertical view illustrating the detailed structure of a detent of the present invention.
  • FIG. 8 depicts a bottom plan view of a support member for an alternative embodiment of the present invention
  • FIG. 9 depicts a cross-sectional view of the support member of FIG. 8 taken along line 9-9.
  • Apparatus 30 includes a generally rectangular hollow container 40, a base 50, a rotatable cam 60, a support member 70 and a generally rectangular hollow container 80.
  • the container 40 includes a generally rectangular base 42 circumscribed by an upwardly extending wall 44 and which base and wall provide in combination a hollow interior 46 for receiving the base 50, rotatable cam 60, support member 70 and container 80.
  • the container 40 is a safety box for containing the base 50, rotatable cam 60, support member 70 and container 80 and for containing a fire or explosion of the type referred to above with regard to DMAH and TDMAT.
  • the base 50 is generally rectangular and may be provided with a generally centrally formed circular indentation or recess 51 for rotatably receiving the rotatable cam 60.
  • the four corners of the generally rectangular base 50 are provided with pairs of generally U- shaped outwardly extending members 52a, 52b, 52c and 52d in which leveling members 53a, 53b, 53c (leveling member 53d not being shown) are mounted to level of the base 50.
  • the leveling members include, with reference to representative leveling member 53a, an externally threaded member 54 that is threaded into threaded bore 54A to affix member 53a to the container base 42.
  • the threaded annular member 55 being rotated with respect to the threaded member 54, the height of the base 50 can be adjusted upwardly and downwardly.
  • the base 50 can be made level.
  • the base 50 may further include a pair of cylindrical, upwardly extending and spaced apart rotation stops or limiting members 57 and 58 for limiting or stopping the counterclockwise and clockwise rotational movement of the rotatable cam 60 as described in detail below.
  • the base 50 is provided with an inwardly extending centrally formed threaded bore 59 and a bore 59a extending therethrough, the purpose of these bores will be described in detail below.
  • the rotatable cam 60 of FIG. 3 it will be noted that the rotatable cam 60 is generally circular and includes three upwardly extending cams 61, 62 and 63 which cams are disposed circularly and are spaced apart equidistantly.
  • a centrally formed bore 64 extends though the rotatable cam 60.
  • the cams 61, 62 and 63 have an angle of inclination of about 14.5° and are disposed circularly at a radius of about 4 inches .
  • the angle of inclination and radius are design parameters that can be changed to fit a particular application for the invention.
  • the bottom of the rotatable cam may be provided with a plurality of circularly disposed rollers 64, 65 and 66 which rollers are spaced apart equidistantly .
  • Representative roller 65 is shown in FIG. 5 and is shown residing partially in a housing 66 formed integrally with the rotatable cam 60.
  • Representative roller 65 is shown mounted rotatably on a suitable headed pin 67 extending through a pair of opposed bores 68a and 68b and the pin 67 is retained in such bores 68a and 68b by a . suitable spring clip 69.
  • Apparatus 30, FIG. 3 may further include a cylindrical centering shaft 90, a threaded member 92 and a washer 93.
  • the centering shaft 90 includes an upper cylindrical portion 94 provided with a counter bore 95 and a lower cylindrical portion 96 of reduced diameter having a bore 97 extending therethrough.
  • the threaded member 92 is inserted downwardly through counter bore 95 and threadedly engages the threaded bore 59 provided in the base 50. It will be understood, as shown in FIG.
  • the support member 70 is generally rectangular and is provided on its underside with three downwardly extending cams 71, 72 and 73.
  • the downwardly extending cams 71, 72, and 73 are disposed circularly and are spaced apart equidistantly and are complementary in size and shape to and engage the cams 61, 62 and 63 extending upwardly from the rotatable cam 60; be understood that the downwardly extending cam 71, 72 and 73 are provided with angles of inclination complementary to those of the upwardly extending cam 61, 62 and 63 and are disposed circularly at the same radius.
  • a portion of the cam 71 is shown in solid outline and the other cams 72 and 73 are shown in dashed outline.
  • a generally cylindrical member 75 Extending downwardly from the underside of the support member 70 is a generally cylindrical member 75 which is complementary in shape to and is dimensioned to be received within the counter bore 95, FIG. 6, provided in the centering shaft 90 so as to center the support member 70 with respect to the rotatable cam 60.
  • the support member 70 is received within the bottom container 40 and the wall 44 of the bottom container 40 engages the support member 70 and prevents the support member 70 from being rotated as vertical movement is imparted to the support member 70 as described below.
  • the dimensions of the support member 70 are such that the support member 70 can move freely upwardly and downwardly and slide with respect to the interior of the wall 44 of the container 40.
  • the container 80 generally operates as a spill pan to catch any liquid that may leak in a catastrophic event or malfunction of the ampule.
  • the container 80 may be provided with a pair of spaced apart and upwardly extending members 83 and 84 for limiting lateral movement of an object, such as the ampule 10, received in the container 80.
  • the apparatus 30 may further include a bracket 100 mounted to the rotatable cam 60 by a pair of screws 101 and 102 which extend through bores formed in the bracket 100 and into threaded bores formed in the rotatable cam 60 as indicated by the dashed lines 103 and 104.
  • Apparatus 30 may further include an upwardly extending handle 106 provided with a threaded lower portion 108 for threadedly engaging a threaded bore 107 provided in the bracket 100 to threadedly mount the handle 106 to the bracket 100.
  • the apparatus 30 may include a detent 110 for periodically securing the rotatable cam 60 to the base 50 and against rotation with respect to the base 50.
  • a detent 110 for periodically securing the rotatable cam 60 to the base 50 and against rotation with respect to the base 50.
  • FIG. 7 the detailed structure of a suitable detent 110 is shown generally in cross section.
  • Detent 110 includes a plunger 112 residing centrally of a housing 113 mounted to the rotatable cam 60 such as by brazing or screwing (fastening) .
  • the plunger 112 is provided intermediate its ends with an outwardly extending annular member 114 and a suitable compression spring 115 is mounted around the upper portion of the plunger and resides between the annular member 114 and the top of the housing 113 so as to bias the plunger 112 downwardly to cause the lower portion of the plunger 112 to be inserted into the bore 59 formed in the base 50 upon the plunger 112 being placed in registration with the bore 59a.
  • the rotatable cam 60 is secured against rotation as noted above.
  • the top of the plunger 112 is provided with a pull ring 116 into which an attendant's finger can be inserted to pull the plunger 112 upwardly against the action of the compression spring 115 so as to move the bottom portion of the plunger 112 out of the bore 59a thereby freeing the rotatable cam 60 for rotation with respect to base 50.
  • the upwardly extending stops 58 and 57 provided on the base 50 (FIG. 3) will engage the bracket 100 and limit the counterclockwise and clockwise rotational movement of the rotatable cam 60.
  • FIG. 8 depicts a bottom plan view of an alternative embodiment of support member 70 (shown as support member 800) and
  • FIG. 9 depicts a cross-sectional view of the support member 800 taken along line 9-9 of FIG. 8.
  • Support member 800 comprises a substantially square support plate 802, three roller assemblies 804, and a central pivot post 806.
  • a support ring 808 extends from the bottom of the plate 802 and, three sets of axle supports 810 of the roller assemblies 804 are arranged about the ring 808 and equally spaced from one another.
  • Each axle support 810 has a pair of spaced apart, vertically oriented flanges 812A and 812B.
  • a bore 814A and 814B is formed through both flanges 812A and 812B to support an axle 816.
  • the axle 816 has a head 818 that abuts an counterbore of bore 814A and a distal end 820 that is retained by a clip 822.
  • the axle 816 passes through a roller 824 such that the roller 824 freely rotates about the axle 816.
  • the rollers 824 engage the cams 61, 62, 63 of the rotatable cam 60 such that as the rotatable cam 60 moves, the rollers 824 move up the cams 61, 62, 63 and the support member 800 moves vertically.
  • the apparatus 30 imparts only vertical movement to the container 80, and any object containing therein such as the ampule 10 shown in FIGs . 1 and 2, and raises or lowers such object without lateral or horizontal movement.
  • Apparatus 30 is particularly useful for lowering and raising a liquid and/or gas filled ampule 10 in only vertical movement, and without lateral or horizontal movement, whereby scratching or gouging of a generally semi- spherical gland head, such as head 25 and 32 shown in FIG. 2, is eliminated.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Filling Of Jars Or Cans And Processes For Cleaning And Sealing Jars (AREA)

Abstract

Cette invention se rapporte à un appareil servant à élever et à abaisser un objet, tel qu'une ampoule remplie de liquide et/ou de gaz, sans imprimer de mouvement horizontal à l'objet. A cet effet, une came rotative soulève et abaisse par son mouvement de came un élément de support, lequel soutient un récipient dans lequel est contenu l'objet.
PCT/US1999/005367 1999-03-11 1999-03-11 Appareil pour elever et abaisser un objet WO2000054311A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/US1999/005367 WO2000054311A1 (fr) 1999-03-11 1999-03-11 Appareil pour elever et abaisser un objet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US1999/005367 WO2000054311A1 (fr) 1999-03-11 1999-03-11 Appareil pour elever et abaisser un objet

Publications (1)

Publication Number Publication Date
WO2000054311A1 true WO2000054311A1 (fr) 2000-09-14

Family

ID=22272336

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/005367 WO2000054311A1 (fr) 1999-03-11 1999-03-11 Appareil pour elever et abaisser un objet

Country Status (1)

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WO (1) WO2000054311A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2223133A1 (en) * 1973-03-26 1974-10-25 Honeywell Bull Soc Ind Elevating table for semi-conductor welding - amount of rise can be set to precisely control press. when welding leads
EP0684631A1 (fr) * 1994-05-24 1995-11-29 Fluoroware, Inc. Conteneur pour interface mécanique standardisé (SMIF)
US5601645A (en) * 1993-10-28 1997-02-11 Dainippon Screen Mfg. Co., Ltd. Substrate holder for a substrate spin treating apparatus
US5711427A (en) * 1996-07-12 1998-01-27 Fluoroware, Inc. Wafer carrier with door

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2223133A1 (en) * 1973-03-26 1974-10-25 Honeywell Bull Soc Ind Elevating table for semi-conductor welding - amount of rise can be set to precisely control press. when welding leads
US5601645A (en) * 1993-10-28 1997-02-11 Dainippon Screen Mfg. Co., Ltd. Substrate holder for a substrate spin treating apparatus
EP0684631A1 (fr) * 1994-05-24 1995-11-29 Fluoroware, Inc. Conteneur pour interface mécanique standardisé (SMIF)
US5711427A (en) * 1996-07-12 1998-01-27 Fluoroware, Inc. Wafer carrier with door

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