WO2000046833A1 - Shadowmask for cathode-ray tube - Google Patents

Shadowmask for cathode-ray tube Download PDF

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Publication number
WO2000046833A1
WO2000046833A1 PCT/JP2000/000487 JP0000487W WO0046833A1 WO 2000046833 A1 WO2000046833 A1 WO 2000046833A1 JP 0000487 W JP0000487 W JP 0000487W WO 0046833 A1 WO0046833 A1 WO 0046833A1
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WO
WIPO (PCT)
Prior art keywords
mask
shadow mask
width
slit
light source
Prior art date
Application number
PCT/JP2000/000487
Other languages
French (fr)
Japanese (ja)
Inventor
Akira Makita
Takeshi Ikegami
Yoshinori Hirobe
Original Assignee
Dai Nippon Printing Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co., Ltd. filed Critical Dai Nippon Printing Co., Ltd.
Priority to DE10080397T priority Critical patent/DE10080397T1/en
Priority to KR1020007010740A priority patent/KR20010042220A/en
Publication of WO2000046833A1 publication Critical patent/WO2000046833A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06Screens for shielding; Masks interposed in the electron stream
    • H01J29/07Shadow masks for colour television tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06Screens for shielding; Masks interposed in the electron stream
    • H01J29/07Shadow masks for colour television tubes
    • H01J29/076Shadow masks for colour television tubes characterised by the shape or distribution of beam-passing apertures

Definitions

  • the present invention relates to a shadow mask for a cathode-ray tube, and more particularly, it includes a plurality of slits and a mask formed by an etching process, and the mask uses the mask to irradiate a light emitted from a light source of the cathode-ray tube to a phosphor screen.
  • An aperture-grill hereinafter referred to as “AG”) shaped shadow mask for a CRT.
  • FIG. 5 is a schematic perspective view showing an example of the structure of an AG type color CRT.
  • the AG type color cathode ray tube 51 converges three electron beams arranged in-line in the single electron gun 52 while crossing them at the center of one main lens, and then, by electrostatic deflection, to the shadow mask 53.
  • the cathode ray tube is a cathode ray tube that intensively passes formed slits and lands on the corresponding phosphor on the vertical stripe-shaped phosphor screen 54 to emit light.
  • the shadow mask 53 is used for landing the electron beam at a predetermined position with a predetermined width to select colors of the AG type color cathode ray tube 51.
  • the shadow mask 53 is formed into a desired shape by etching a thin metal plate, and is composed of a slit in the vertical direction and an ID mask.
  • Such a shadow mask 53 is attached to the steel frame 61 with an appropriate tension as shown in FIGS. 6A and 6B, and is fixed with high positional accuracy so that the interdigital mask does not vibrate.
  • the method for attaching the shadow mask 53 to the steel frame 61 is as shown in Fig. 6 (A).
  • the upper and lower sides of the shadow mask 53 are pressed while applying pressure to the four or more places of the steel frame 61 from above and below at a predetermined pressure F, while keeping the steel frame 61 deformed within the elastic limit.
  • There is a method of joining and attaching to the steel frame 61 by welding such as resistance heating welding or laser one-beam welding.
  • the shadow mask 53 welded in this manner is fixed at an appropriate tension by removing the pressure F applied to the steel frame 61.
  • the welding at this time is usually performed by aligning the steel frame 61 and the shadow mask 53, from one end to the other end, or from near the center to both ends.
  • wrinkles due to welding distortion and the like are generated on the upper side and the lower side of the shadow mask 53 welded to the steel frame 61 as welding progresses, and gradually accumulate.
  • the accumulated wrinkles may cause a phenomenon such that the slit shape is deformed.
  • Such a phenomenon causes a problem that a predetermined slit width cannot be maintained uniformly over the entire shadow mask.
  • the slit at the end in the direction to be welded is accumulated due to accumulation of wrinkles.
  • the shadow mask 53 is welded from the center of the steel frame 61 toward both ends when the slit width is reduced due to the deformation of the slit, the slits at both ends of the shadow mask 53 If the slit width is reduced due to deformation, some problems may occur.
  • FIGS. 4 (A) and 4 (B) are schematic diagrams showing the relationship between an extra slit 44 formed on those shadow masks and a fluorescent screen 54.
  • FIG. The extrusion slit shown in FIG. 4 (A) has the same cross-sectional shape as the slit of the effective screen section, and has a small opening width on the light source side and a large opening width on the phosphor screen side.
  • the extra slit in FIG. 4 (B) is obtained by etching from both the light source side and the phosphor screen side, and is formed by shifting the pattern on the phosphor screen side and the light source side.
  • These extra slits 44 have a slit in the effective screen section for the purpose of absorbing variations in the extreme slit width and shielding the electron beam so that exposure by the extra slits does not occur. It is formed with a through width Z of a narrow width of 40 to 70% of the gate width.
  • the present invention solves the above problems by absorbing the deformation of the slit caused by wrinkles caused by welding distortion and the like. Further, the present invention makes it easier to form the slit and to reduce the fluorescent surface of the cathode ray tube.
  • a shadow mask for a cathode ray tube having an extra slit capable of obtaining an irradiation width smaller than an exposure width.
  • the CRT shadow mask of the present invention includes a plurality of slits 2 formed by etching and a mask 3.
  • the shadow mask 1 for a cathode ray tube in which the irradiation width X of light emitted from the light source of the cathode ray tube to the fluorescent screen 54 is determined at least one of slits 2 provided at both ends of the shadow mask 1 is slit.
  • an extra slit 4 is provided on the outside of the mask, and the extra slit 4 has a light source side end portion 23 of the mask 22 on the center side of the shadow mask and a fluorescent light of the mask 29 on the outer peripheral side of the shadow mask.
  • Penetration width W defined by surface side edge 26, mask width edge T2 defined between mask edge edges 24, 28 on both sides in the fluorescent screen side, and mask edge edge 25 on both sides in the light source direction 27, and an opening width S defined between 27, and furthermore, the center of the opening width T defined between the mask end faces 24, 28 on both sides in the direction of the fluorescent screen side.
  • Position P is on both sides in the light source side direction.
  • the opening width T and the opening width S are shifted to the center side of the shadow mask from the center position Q of the opening width S defined between the mask end face edges 25 and 27. It is characterized in that it has a penetration width Y or more defined between the mask edge faces on both sides in the light source side direction.
  • the opening width T and the opening width S forming the cross-sectional shape of the extra slit 4 are formed to be equal to or larger than the penetration width Y defined between the mask end face edges on both sides of the slit 2 in the light source side. Therefore, etching can be easily performed with a larger mask pattern than that for forming the slit 2.
  • the extra slit 4 is provided outside the slit 2 at one end, and the light source side end 23 of the mask 2 at the center of the shadow mask 1 and the mask at the outer peripheral side of the shadow mask 1 are provided. 29 has a penetration width W defined by the end 26 on the phosphor screen side, and an opening width T defined between the mask end faces 24 and 28 on both sides in the direction of the phosphor screen.
  • the light source described above is used.
  • ⁇ side The end 23 and the end 26 on the phosphor screen side are formed at different positions in the coordinate position in the direction orthogonal to the shadow mask plane. As a result, even when the mask 22 on the center side of the shadow mask approaches the mask 29 on the outer peripheral side of the shadow mask when the wrinkles generated during welding are absorbed, the end 23 on the light source side and the phosphor screen are not affected. The end 26 on the side does not hit the opposing part if the length is less than the penetration width W.
  • the extra slit 4 obtained in this way can absorb the wrinkles generated when the shadow mask 1 is welded to the steel frame 61, so that at least one of the slits 2 at one end is prevented from being deformed by the wrinkles.
  • the effective width of all the slits 2 formed in the shadow mask 1 can be secured.
  • the irradiation width X of the light passing through the extra slit 4 is smaller than the exposure width of the fluorescent screen 54, and A part of the light 21 incident obliquely is shielded by the mask end face edge 25 toward the light source at the center of the shadow mask and the mask end face edge 28 toward the phosphor screen at the outer periphery of the shadow mask. It is unique that it is determined.
  • the extra slit 4 acts to make the irradiation width X smaller when absorbing wrinkles during welding of the shadow mask 1, No exposure of the phosphor screen occurs.
  • the present invention provides the shadow mask for a cathode ray tube described above, wherein the light source side end 23 of the mask on the center side of the shadow mask and the phosphor screen side end 26 of the mask on the outer side of the shadow mask are: It is characterized in that it is formed at a distance of 5 / m or more as a coordinate position length ⁇ in a direction orthogonal to the shadow mask surface.
  • the light source side end 23 of the mask on the shadow mask center side and the phosphor screen side end 26 of the mask on the shadow mask outer peripheral side are coordinate position lengths in a direction orthogonal to the shadow mask surface. Since it is formed at a distance of 5 m or more as ⁇ ⁇ , the mask 22 on the center side of the shadow mask approaches the mask 29 on the outer side of the shadow mask when the wrinkles generated during welding are absorbed. However, the light source side end portion 23 and the phosphor screen side end portion 26 do not abut each other when the length is not more than the penetration width W.
  • FIG. 1 is a plan view showing an example of a shadow mask for an aperture-Daryl-type color CRT of the present invention.
  • FIG. 2 is an enlarged cross-sectional view showing an example of a cross-sectional shape of a slit and an extra slit formed on the shadow mask of the present invention.
  • FIG. 3 is an enlarged cross-sectional view showing another example of the cross-sectional shape of the extra slit formed on the shadow mask of the present invention.
  • FIG. 4 is a schematic diagram showing a relationship between an extra slit formed on a conventional shadow mask and a phosphor screen.
  • FIG. 5 is a schematic perspective view showing the structure of an aperture-grill type empty tube.
  • FIG. 1 is a plan view showing an example of a shadow mask for an aperture-Daryl-type color CRT of the present invention.
  • FIG. 2 is an enlarged cross-sectional view showing an example of a cross-sectional shape of a slit and an extra slit formed on the
  • FIG. 6 is a front view (A) and a longitudinal cross-sectional view (B) showing a state where a steel frame is welded by applying tension.
  • FIG. 1 is a plan view showing an example of a shadow mask for an A-G color CRT according to the present invention.
  • the shadow mask 1 has a plurality of slits 2 and a mask 3, and is formed by etching a substantially rectangular thin metal plate.
  • the mask 3 acts to block extra light among the light emitted from the light source of the cathode ray tube at a predetermined angle ⁇ .
  • the light that should reach the phosphor screen passes through the slit 2 that has been etched to a predetermined width, and the irradiation width is determined by the shape and dimensions of the mask 3 .
  • Extra slits 4 are provided further outside the left and right slits of the shadow mask 1.
  • the upper side 6 and the lower side 7 of the shadow mask 1 are welded to a separately prepared steel frame 61 (see Fig. 6) so that the shadow mask 1 can be held down with an appropriate tension.
  • a material having a small coefficient of thermal expansion such as a nickel-iron alloy, or an iron-based material having improved creep characteristics is usually used.
  • FIG. 2 is an enlarged cross-sectional view showing an example of a cross-sectional shape of a slit and an extruded slit formed on the shadow mask of the present invention.
  • FIG. 3 is an enlarged sectional view showing another example of the sectional shape of the extra slit formed on the shadow mask of the present invention.
  • the extra slit shown in FIG. 2 the light source side end 23 of the mask 22 on the center side of the shadow mask and the mask end surface edge 25 are common, and the fluorescent surface of the mask 29 on the outer side of the shadow mask is also used.
  • the side end portion 26 and the mask end surface edge 28 have a common cross-sectional shape.
  • the extra slits shown in FIG. 3 have different cross-sectional shapes.
  • the slit 2 exposes the fluorescent screen 54 inside the panel 55 to vertical stripes. It acts to pass ultraviolet light for irradiating, or to color-select the irradiation light when the three electron beams emitted from the electron gun 52 are concentrated and passed. Then, the irradiation light that has passed through the slit 2 lands on the phosphor at the position corresponding to the vertical stripe-shaped phosphor screen 54 disposed inside the panel 55, and the phosphor emits light. . As shown in FIG.
  • such a slit 2 usually has a mortar shape with a small opening width on the light source side and a large opening width on the phosphor surface 54 side. It is formed with the number, pitch, penetration width Y and cross-sectional shape.
  • the shadow mask 1 used for a high-definition color cathode ray tube has a small slit 2 and a small through-hole width Y, and requires more precise etching.
  • the extra slit 4 acts to absorb wrinkles generated by welding distortion and the like when the shadow mask 1 is welded, and to prevent deformation of the slit 2 shape at both ends.
  • the extra slits 4 are formed at positions further outside the slits 2 at the left and right ends, and are formed by the same etching process as the formation of the slits 2.
  • the shadow mask 1 can be welded from its center to both ends. Even when welding is performed from one end of the shadow mask to the other end, if the welding direction is not particularly determined, it is convenient to provide them at both ends in advance. When the welding direction is determined, the extra slit 4 can be provided only on the side where welding is completed. In order to sufficiently absorb the wrinkles generated by welding, it is preferable that the length of the extra slit 4 in the longitudinal direction is approximately the same as the length of the slit 2 in the longitudinal direction.
  • the cross-sectional shape of the extraslit 4 is as shown in Figs. 2 and 3.
  • the penetration defined by the light source side end 23 of the mask 22 on the center side of the shadow mask and the phosphor screen side end 26 of the mask 29 on the outer side of the shadow mask The width W, the opening width T defined between the mask end edges 24 and 28 on both sides in the fluorescent screen side direction, and the opening width S defined between the mask end edges 25 and 27 on both sides in the light source direction.
  • the opening width T and the opening width S are shifted from the center position Q of the width S to the center side of the shadow mask, so that the opening width T and the opening width S are defined between the mask edge edges on both sides of the slit 2 in the light source side. It has a cross-sectional shape with a width of Y or more.
  • the penetration width W of the extra slit 4 may be larger or smaller than the penetration width Y of the slit 2 and is not particularly limited.
  • the opening width T and the opening width S are formed to be equal to or larger than the through width Y of the slit 2, a mask mask for etching that is larger than the formation of the slit 2 can be used. . Therefore, an advanced slit is not required, and the extra slit 4 can be easily formed by a normal etching process.
  • the light source side end 23 and the phosphor screen side end 26 constituting the extra slit 4 are formed in a shape like a knife edge formed on the surface of each mask. It may be common to the end faces 25 and 28, respectively, or may be a shape formed at a position slightly intruding from each mask surface as shown in FIG.
  • the cross-sectional shape of the extra slit 4 can be appropriately set according to the etching conditions at the time of etching.
  • such a light source side end 23 and a phosphor screen side end 26 are formed. It is formed at a different position in the coordinate position in the direction orthogonal to the shadow mask surface. As a result, even when the mask 22 on the center of the shadow mask approaches the mask 29 on the outer periphery of the shadow mask when the wrinkles generated during welding are absorbed, the end 23 on the light source side and the fluorescent screen side The end 26 does not abut on an opposing portion if the length is not more than the penetration width W.
  • the extra slit 4 obtained in this way can absorb wrinkles generated when the shadow mask 1 is welded to the steel frame 61, thereby preventing deformation due to wrinkles occurring at least at the slit 2 at one end.
  • the effective width of all the slits 2 formed in the shadow mask 1 can be secured.
  • the light 21 obliquely incident on the extra slit 4 is a mask end face edge 25 facing the light source side at the center of the shadow mask of the extra slit 4, and a mask facing the phosphor screen at the outer peripheral side of the shadow mask. A part thereof is shielded by the edge edges 28 and passes through the extra slit 4 with a predetermined irradiation width X to irradiate the fluorescent screen 54.
  • the shift amount between the center position P of the opening width T and the center position Q of the opening width S is adjusted so that the irradiation width X is smaller than the width for exposing the phosphor screen 54.
  • the phosphor screen 54 is not exposed regardless of whether wrinkles occur when the shadow mask 1 is welded, and even when wrinkles occur, the irradiation width X is made smaller. As described above, the extra slit 4 acts, so that the phosphor screen is not exposed.
  • the positional relationship between the edges 25 and 28 is based on the difference in the incident angle of light 0 based on the difference in the size of the cathode ray tube on which the shadow mask 1 is mounted, and the thickness of the metal sheet used for the shadow mask 1. It is set appropriately according to differences, differences in etching processing conditions, differences in the exposing properties of the phosphor screen (phosphor screen material and ultraviolet intensity), etc., but the center position P of the opening width T and the center position Q of the opening width S Shi It is preferable that the shift is performed at a distance of 30 m or more on a coordinate axis orthogonal to the shadow mask plane.
  • the size of the opening width S on the light source side and the opening width T on the phosphor screen side can be appropriately set on condition that the above positional relationship is satisfied.
  • the light source side end 23 of the mask on the center side of the shadow mask and the phosphor screen side end 26 of the mask on the outer side of the shadow mask have a coordinate position length ⁇ ⁇ in a direction perpendicular to the shadow mask plane of 5 ⁇ . Preferably, they are formed at a distance of at least m. As a result, when the wrinkles generated during welding are absorbed, even if the mask 22 on the shadow mask center side approaches the mask 29 on the shadow mask outer peripheral side, the light source side end 23 and the fluorescent screen side can be used.
  • the end 26 does not abut on an opposing portion if the length is less than the penetration width W.
  • the fluorescent screen 54 of the ordinary cathode ray tube 51 may be exposed by irradiating it with a width exceeding 50 mm, so that the extra slit 4 has an irradiation width X of 50 or less.
  • the degree of exposure of the phosphor screen 54 may vary depending on the photosensitive material that forms the phosphor screen and the exposure conditions such as the intensity of ultraviolet light used for exposure, so the exposure conditions should be considered in special cases. Then, the irradiation width X is appropriately determined. When the sensitivity and ultraviolet intensity of the phosphor are high, it is preferable to form an extra slit that makes the irradiation width X on the phosphor screen 54 smaller.
  • the shadow mask 1 When the shadow mask 1 is welded to the steel frame 61 when welding is performed from one end of the shadow mask 1 to the other end, it is not always necessary to provide extra slits on both sides. It may be formed on one side.
  • the shadow mask 1 described above can be manufactured by a conventionally known method. Usually, it is performed in a series of steps using photo-etching technology. Manufactured on continuous in-line or off-line equipment. For example, first, a water-soluble colloidal photoresist is applied to both sides of a thin metal plate. After drying, the original plate for exposure is brought into close contact with both surfaces, exposed with ultraviolet-rich light such as high-pressure mercury, and developed with water. After the development, the exposed portions of the metal covered with the resist film are etched. As a result, as shown in FIGS.
  • the slit 2 etched in a mortar shape, the opening center P on the phosphor screen side and the opening center Q on the light source side are offset, and A shadow mask 1 having an extra slit 4 etched into a shape in which the opening center P on the side is shifted to the center side of the shadow mask 1 is manufactured.
  • the pattern of the original exposure plate and the close contact position thereof are adjusted such that the shape of the extra slit 4 becomes the shape shown in FIG. 2 or FIG.
  • the etching process is performed by spraying a ferric chloride solution from both sides of the metal sheet after heat treatment, etc., followed by continuous post-processing such as water washing and peeling. .
  • the shadow mask for a cathode ray tube of the present invention it is possible to easily perform an etching process with a mask pattern larger than the formation of the slit, so that the shadow mask can be easily manufactured. It can be preferably applied to a shadow mask used for a cathode ray tube which requires a higher definition.
  • the phosphor screen is not exposed, regardless of whether wrinkles occur when the shadow mask is welded.
  • the light source side end and the phosphor screen side end have a penetration width W or less. With the length of, it will not hit the opposite part, so it can absorb the wrinkles that occur

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  • Non-Portable Lighting Devices Or Systems Thereof (AREA)

Abstract

A shadowmask (1) comprising an extra slit (4) which is provided outside a slit (2) made in at least one edge of the shadowmask (1). The extra slit (4) has a cross section defined by a through width (W) defined by the edge (23) on the light source side of the mask (22) on the central side of the shadowmask and the edge (26) on the fluorescent screen side of the mask (29) on the periphery side of the shadowmask, an opening width (T) defined by the mask end face edges (24, 28) on both sides in the direction toward the fluorescent screen, and an opening width (S) defined by the mask end face edges (25, 27) on both side in the direction toward the light source. The position (P) of the center of the opening width (T) is shifted from the position (Q) of the center of the opening width (S) toward the center of the shadowmask. The opening width (T) and the opening width (S) are greater than the through width (Y) of the slit (2) defined by the mask end face edges on both sides in the direction toward the light source.

Description

明 細 書 ― ブラウン管用シャ ドウマスク 技術分野  Description-CRT shadow mask Technical field
本発明は、 ブラウン管用シャ ドウマスクに関し、 更に詳しくは、 エツ チング加工によって形成された複数のスリッ トとマスクとからなり、 そ のマスクによって、 ブラウン管の光源から蛍光面に照射される光の照射 幅が決定されるアパーチャ一グリル (以下 「A G」 という。 ) 形のカラ 一ブラウン管用シャ ドウマスクに関する。 背景技術  The present invention relates to a shadow mask for a cathode-ray tube, and more particularly, it includes a plurality of slits and a mask formed by an etching process, and the mask uses the mask to irradiate a light emitted from a light source of the cathode-ray tube to a phosphor screen. An aperture-grill (hereinafter referred to as “AG”) shaped shadow mask for a CRT. Background art
第 5図は、 A G形カラーブラウン管の構造の一例を示す概略斜視図で ある。 A G形カラーブラウン管 5 1は、 単電子銃 5 2内でインラインに 配置された 3本の電子ビームを一つの主レンズの中心で交差させつつ収 束させ、 次いで静電偏向によってシャ ドウマスク 5 3に形成されたスリ ッ トを集中通過させ、 縦縞状の蛍光面 5 4の対応する蛍光体にランディ ングさせて発光するようにしたブラウン管である。  FIG. 5 is a schematic perspective view showing an example of the structure of an AG type color CRT. The AG type color cathode ray tube 51 converges three electron beams arranged in-line in the single electron gun 52 while crossing them at the center of one main lens, and then, by electrostatic deflection, to the shadow mask 53. The cathode ray tube is a cathode ray tube that intensively passes formed slits and lands on the corresponding phosphor on the vertical stripe-shaped phosphor screen 54 to emit light.
シャ ドウマスク 5 3は、 電子ビームを所定の幅で所定の位置にランデ イングさせて、 A G形カラ一ブラウン管 5 1の色選別を行うために用い られる。 このシャ ドウマスク 5 3は、 金属薄板にエッチング加工するこ とによって所望の形状に形成され、 縦方向のスリッ トとすだれ状のマス クとで構成されている。 こうしたシャ ドウマスク 5 3は、 第 6図の (A ) ( B ) に示すように、 鋼枠 6 1に適当な張力で取り付けられ、 すだれ 状のマスクが振動しないように位置精度よく固定される。 シャ ドウマス ク 5 3を鋼枠 6 1 に取り付ける方法には、 第 6図 (A ) に示すように、 鋼枠 6 1の 4力所以上の部位を上下から所定の圧力 Fで加圧し、 弾性限 界内で鋼枠 6 1 を変形させた状態に保ちつつ、 シャ ドウマスク 5 3の上 辺と下辺を抵抗加熱溶接やレーザ一ビーム溶接等の溶接によつて鋼枠 6 1 に接合装着させる方法がある。 この方法で溶接されたシャ ドウマスク 5 3は、 鋼枠 6 1 に加えた圧力 Fを取り去ることによって、 適当な張力 で固定される。 The shadow mask 53 is used for landing the electron beam at a predetermined position with a predetermined width to select colors of the AG type color cathode ray tube 51. The shadow mask 53 is formed into a desired shape by etching a thin metal plate, and is composed of a slit in the vertical direction and an ID mask. Such a shadow mask 53 is attached to the steel frame 61 with an appropriate tension as shown in FIGS. 6A and 6B, and is fixed with high positional accuracy so that the interdigital mask does not vibrate. The method for attaching the shadow mask 53 to the steel frame 61 is as shown in Fig. 6 (A). The upper and lower sides of the shadow mask 53 are pressed while applying pressure to the four or more places of the steel frame 61 from above and below at a predetermined pressure F, while keeping the steel frame 61 deformed within the elastic limit. There is a method of joining and attaching to the steel frame 61 by welding such as resistance heating welding or laser one-beam welding. The shadow mask 53 welded in this manner is fixed at an appropriate tension by removing the pressure F applied to the steel frame 61.
この際の溶接は、 通常、 鋼枠 6 1 とシャ ドウマスク 5 3を合わせ、 そ の一端から他端に向かって行ったり、 その中心付近から両端に向かって 行う。 このとき、 鋼枠 6 1に溶接されるシャ ドウマスク 5 3の上辺と下 辺には、 溶接が進むにしたがって、 溶接歪み等に基づく しわが発生して 徐々に蓄積するようになる。 その結果、 溶接が終了する側の端部付近に は、 蓄積したしわによってスリツ トの形状が変形するといった現象を生 じることがある。 こうした現象は、 シャ ドウマスク全域に渡って所定の スリ ッ ト幅を均一に維持することができないといった問題を起こす。 例 えば、 鋼枠 6 1の一方の端部から他方の端部に向かってシャ ドウマスク 5 3を溶接していく場合には、 生じたしわの蓄積によって、 溶接する方 向の端部のスリッ 卜が変形してスリッ ト幅が小さくなつたり、 鋼枠 6 1 の中心から両端部に向かってシャ ドウマスク 5 3を溶接していく場合に は、 シャ ドウマスク 5 3の両側端部のスリ ッ 卜が変形してスリッ 卜幅が 小さくなるといつた問題が生じるおそれがある。  The welding at this time is usually performed by aligning the steel frame 61 and the shadow mask 53, from one end to the other end, or from near the center to both ends. At this time, wrinkles due to welding distortion and the like are generated on the upper side and the lower side of the shadow mask 53 welded to the steel frame 61 as welding progresses, and gradually accumulate. As a result, near the end on the side where welding is completed, the accumulated wrinkles may cause a phenomenon such that the slit shape is deformed. Such a phenomenon causes a problem that a predetermined slit width cannot be maintained uniformly over the entire shadow mask. For example, when the shadow mask 53 is welded from one end of the steel frame 61 to the other end, the slit at the end in the direction to be welded is accumulated due to accumulation of wrinkles. When the shadow mask 53 is welded from the center of the steel frame 61 toward both ends when the slit width is reduced due to the deformation of the slit, the slits at both ends of the shadow mask 53 If the slit width is reduced due to deformation, some problems may occur.
このような問題に対するシャ ドウマスクとして、 特開平 5— 1 5 9 7 1 6号公報ゃ特開平 5— 3 1 4 9 2 0号公報が開示されている。 第 4図 ( A ) ( B ) は、 それらのシャ ドウマスクに形成されるエキストラスリ ッ ト 4 4と蛍光面 5 4との関係を示す概略図である。 第 4図 (A ) のェ キス トラスリッ トは、 有効画面部のスリ ッ トと同様の断面形状を有し、 光源側の開口幅が小さく、 蛍光面側の開口幅が大きく形成されている。 図 4 ( B ) のエキス トラスリ ッ トは、 光源側と蛍光面側の両方からエツ チングしたものであり、 蛍光面側と光源側のパターンをシフ 卜して形成 されている。 これらのエキス トラスリッ ト 4 4は、 最端スリ ッ ト幅のバ ラツキを吸収し、 しかもそのエキス トラスリツ トによる露光が起こらな いように電子ビームを遮蔽することを目的として、 有効画面部のスリッ ト幅の 4 0〜 7 0 %の細幅の貫通幅 Zで形成されている。 As shadow masks for solving such a problem, Japanese Patent Application Laid-Open Nos. 5-159716 and 5-314920 are disclosed. FIGS. 4 (A) and 4 (B) are schematic diagrams showing the relationship between an extra slit 44 formed on those shadow masks and a fluorescent screen 54. FIG. The extrusion slit shown in FIG. 4 (A) has the same cross-sectional shape as the slit of the effective screen section, and has a small opening width on the light source side and a large opening width on the phosphor screen side. The extra slit in FIG. 4 (B) is obtained by etching from both the light source side and the phosphor screen side, and is formed by shifting the pattern on the phosphor screen side and the light source side. These extra slits 44 have a slit in the effective screen section for the purpose of absorbing variations in the extreme slit width and shielding the electron beam so that exposure by the extra slits does not occur. It is formed with a through width Z of a narrow width of 40 to 70% of the gate width.
しかしながら、 こうしたエキストラスリッ ト 4 4は、 有効画面部のス リッ トよりも小さい貫通幅で形成する必要があるため、 有効画面部のス リッ トを形成する場合よりも一層高いエッチング精度が要求される。 そ のため、 その形成が困難になるという製造上の問題がある。 特に高精細 度が要求されるブラウン管に使用されるシャ ドウマスクの場合にはその 傾向が著しい。 さらに、 貫通幅 Zが小さいので、 溶接歪み等によって発 生したしわの蓄積が大きい場合には、 そのしわを十分に吸収することが できなくなり、 端部のスリッ トの幅寸法を所定の幅寸法に維持すること ができないおそれがある。 発明の開示  However, since such an extra slit 44 needs to be formed with a smaller penetration width than the slit of the effective screen portion, higher etching accuracy is required than in the case of forming the slit of the effective screen portion. You. Therefore, there is a manufacturing problem that the formation is difficult. This tendency is particularly pronounced in the case of shadow masks used for cathode ray tubes that require high definition. Furthermore, since the penetration width Z is small, if the accumulation of wrinkles generated by welding distortion, etc. is large, the wrinkles cannot be sufficiently absorbed, and the width of the slit at the end is set to the predetermined width. May not be maintained. Disclosure of the invention
本発明は、 上記問題を解決するため、 溶接歪み等によって発生したし わによるスリ ッ トの変形を吸収することができ、 さらに、 スリッ トの形 成よりも簡単に、 且つブラウン管の蛍光面を露光する幅よりも小さい照 射幅が得られるエキス トラスリッ トを有するブラウン管用シャ ドウマス クを提供する。  The present invention solves the above problems by absorbing the deformation of the slit caused by wrinkles caused by welding distortion and the like. Further, the present invention makes it easier to form the slit and to reduce the fluorescent surface of the cathode ray tube. Provided is a shadow mask for a cathode ray tube having an extra slit capable of obtaining an irradiation width smaller than an exposure width.
以下、 本発明について、 実施形態を示す図面に対応付けて説明する。 但し、 本発明は図示の形態に限定されない。  Hereinafter, the present invention will be described with reference to the drawings showing the embodiments. However, the present invention is not limited to the illustrated embodiment.
本発明のブラウン管用シャ ドウマスクは、 エッチング加工によって形 成された複数のスリツ ト 2とマスク 3とからなり、 当該マスク 3によつ てブラウン管の光源から蛍光面 5 4に照射される光の照射幅 Xが決定さ れるブラウン管用シャ ドウマスク 1 において、 前記シャ ドウマスク 1の 両端に設けられたスリ ツ ト 2のうち、 少なくとも一端のスリツ トのさら に外側にエキス トラスリッ ト 4を有し、 前記エキストラスリ ッ ト 4は、 前記シャ ドウマスク中心側のマスク 2 2の光源側端部 2 3と当該シャド ゥマスク外周側のマスク 2 9の蛍光面側端部 2 6とで規定される貫通幅 Wと、 蛍光面側方向両側のマスク端面エッジ 2 4 、 2 8間で規定される 開口幅 Tと、 光源側方向両側のマスク端面エッジ 2 5 、 2 7間で規定さ れる開口幅 Sとで構成される断面形状を有し、 さらに、 前記蛍光面側方 向両側のマスク端面エツジ 2 4 、 2 8間で規定される開口幅 Tの中心位 置 Pが、 前記光源側方向両側のマスク端面エッジ 2 5 、 2 7間で規定さ れる開口幅 Sの中心位置 Qよりもシャ ドウマスク中心側にシフ トしてな り、 前記の開口幅 Tと開口幅 Sとが、 前記スリッ ト 2の光源側方向両側 のマスク端面エツジ間で規定される貫通幅 Y以上であることに特徴を有 する。 The CRT shadow mask of the present invention includes a plurality of slits 2 formed by etching and a mask 3. In the shadow mask 1 for a cathode ray tube in which the irradiation width X of light emitted from the light source of the cathode ray tube to the fluorescent screen 54 is determined, at least one of slits 2 provided at both ends of the shadow mask 1 is slit. Further, an extra slit 4 is provided on the outside of the mask, and the extra slit 4 has a light source side end portion 23 of the mask 22 on the center side of the shadow mask and a fluorescent light of the mask 29 on the outer peripheral side of the shadow mask. Penetration width W defined by surface side edge 26, mask width edge T2 defined between mask edge edges 24, 28 on both sides in the fluorescent screen side, and mask edge edge 25 on both sides in the light source direction 27, and an opening width S defined between 27, and furthermore, the center of the opening width T defined between the mask end faces 24, 28 on both sides in the direction of the fluorescent screen side. Position P is on both sides in the light source side direction. The opening width T and the opening width S are shifted to the center side of the shadow mask from the center position Q of the opening width S defined between the mask end face edges 25 and 27. It is characterized in that it has a penetration width Y or more defined between the mask edge faces on both sides in the light source side direction.
この発明によれば、 エキス トラスリッ ト 4の断面形状を構成する開口 幅 Tと開口幅 Sとが、 スリ ッ ト 2の光源側方向両側のマスク端面エツジ 間で規定される貫通幅 Y以上で形成されているので、 スリッ ト 2の形成 よりも大きなマスクパターンで容易にエッチング加工することができる 。 また、 エキストラスリッ ト 4は、 一端のスリ ッ ト 2のさらに外側に設 けられており、 シャ ドウマスク 1中心側のマスク 2 2の光源側の端部 2 3と、 シャ ドウマスク 1外周側のマスク 2 9の蛍光面側の端部 2 6とで 規定される貫通幅 Wを有し、 さらに、 蛍光面側方向両側のマスク端面ェ ッジ 2 4 、 2 8間で規定される開口幅 Tの中心位置 Pが、 前記光源側方 向両側のマスク端面エツジ 2 5 、 2 7間で規定される開口幅 Sの中心位 置 Qよりもシャ ドウマスク中心側にシフ トしているので、 上記の光源側 の端部 2 3 と蛍光面側の端部 2 6とが、 シャ ドウマスク面に直交する方 向の座標位置において、 異なる位置に形成されている。 その結果、 溶接 時に発生するしわが吸収される際にシャ ドウマスク中心側のマスク 2 2 がシャ ドウマスク外周側のマスク 2 9に近づいていっても、 上記の光源 側の端部 2 3 と蛍光面側の端部 2 6 とは、 貫通幅 W以下の長さでは相対 向する部位に突き当たることがない。 こうして得られたエキストラスリ ッ ト 4は、 シャ ドウマスク 1を鋼枠 6 1 に溶接する際に発生するしわを 吸収することができるので、 少なく とも一端のスリッ ト 2で起こるしわ による変形を防ぐことができ、 シャ ドウマスク 1 に形成された全てのス リッ ト 2の有効幅を確保することができる。 According to the present invention, the opening width T and the opening width S forming the cross-sectional shape of the extra slit 4 are formed to be equal to or larger than the penetration width Y defined between the mask end face edges on both sides of the slit 2 in the light source side. Therefore, etching can be easily performed with a larger mask pattern than that for forming the slit 2. The extra slit 4 is provided outside the slit 2 at one end, and the light source side end 23 of the mask 2 at the center of the shadow mask 1 and the mask at the outer peripheral side of the shadow mask 1 are provided. 29 has a penetration width W defined by the end 26 on the phosphor screen side, and an opening width T defined between the mask end faces 24 and 28 on both sides in the direction of the phosphor screen. Since the center position P is shifted toward the center of the shadow mask with respect to the center position Q of the opening width S defined between the mask edge surfaces 25 and 27 on both sides in the light source side, the light source described above is used. ~ side The end 23 and the end 26 on the phosphor screen side are formed at different positions in the coordinate position in the direction orthogonal to the shadow mask plane. As a result, even when the mask 22 on the center side of the shadow mask approaches the mask 29 on the outer peripheral side of the shadow mask when the wrinkles generated during welding are absorbed, the end 23 on the light source side and the phosphor screen are not affected. The end 26 on the side does not hit the opposing part if the length is less than the penetration width W. The extra slit 4 obtained in this way can absorb the wrinkles generated when the shadow mask 1 is welded to the steel frame 61, so that at least one of the slits 2 at one end is prevented from being deformed by the wrinkles. Thus, the effective width of all the slits 2 formed in the shadow mask 1 can be secured.
さらに、 本発明は、 上記のブラウン管用シャ ドウマスクにおいて、 前 記エキス トラスリ ッ ト 4を通過する光の照射幅 Xは、 前記蛍光面 5 4の 露光幅よりも小さく、 前記エキストラスリッ ト 4に対して斜めに入射す る光 2 1の一部が、 シャ ドウマスク中心側で光源側方向のマスク端面ェ ッジ 2 5 と、 シャ ドウマスク外周側で蛍光面側方向のマスク端面エッジ 2 8 とで遮蔽されて決定されることに特徵を有する。  Further, in the shadow mask for a cathode ray tube according to the present invention, the irradiation width X of the light passing through the extra slit 4 is smaller than the exposure width of the fluorescent screen 54, and A part of the light 21 incident obliquely is shielded by the mask end face edge 25 toward the light source at the center of the shadow mask and the mask end face edge 28 toward the phosphor screen at the outer periphery of the shadow mask. It is unique that it is determined.
この発明によれば、 エキス トラスリッ ト 4を通過する光の照射幅 Xが 、 蛍光面 5 4の露光幅よりも小さいので、 シャ ドウマスク 1の溶接の際 にしわが発生しない場合であっても、 蛍光面 5 4を露光させることがな い。 また、 エキス トラスリッ ト 4は、 上述のように、 開口幅 Tの中心位 置 Pが開口幅 Sの中心位置 Qよりもシャ ドウマスク中心側にシフ 卜して おり、 そのエキス トラスリッ ト 4に対して斜めに入射する光 2 1の一部 が、 シャ ドウマスク中心側で光源側方向のマスク端面エッジ 2 5と、 シ ャ ドウマスク外周側で蛍光面側方向のマスク端面エッジ 2 8とで遮蔽さ れて決定されるので、 エキストラスリッ ト 4は、 シャ ドウマスク 1の溶 接時のしわを吸収する際に照射幅 Xをより小さくするように作用して、 蛍光面の露光が起こらない。 ― According to the present invention, since the irradiation width X of the light passing through the extra slit 4 is smaller than the exposure width of the phosphor screen 54, even if wrinkles do not occur when the shadow mask 1 is welded, the fluorescence The surface 54 is not exposed. As described above, in the extra slit 4, the center position P of the opening width T is shifted toward the center of the shadow mask with respect to the center position Q of the opening width S. Part of the obliquely incident light 21 is shielded by the mask end face edge 25 toward the light source at the center of the shadow mask and the mask end face edge 28 toward the phosphor screen at the outer periphery of the shadow mask. As determined, the extra slit 4 acts to make the irradiation width X smaller when absorbing wrinkles during welding of the shadow mask 1, No exposure of the phosphor screen occurs. ―
さらに、 本発明は、 上記のブラウン管用シャ ドウマスクにおいて、 前 記シャ ドウマスク中心側のマスクの光源側端部 2 3と、 当該シャ ドウマ スク外周側のマスクの蛍光面側端部 2 6 とが、 前記シャ ドウマスク面に 直交する方向の座標位置長さ Δ Ηとして、 5 / m以上離れて形成されて いることに特徴を有する。  Furthermore, the present invention provides the shadow mask for a cathode ray tube described above, wherein the light source side end 23 of the mask on the center side of the shadow mask and the phosphor screen side end 26 of the mask on the outer side of the shadow mask are: It is characterized in that it is formed at a distance of 5 / m or more as a coordinate position length ΔΗ in a direction orthogonal to the shadow mask surface.
この発明によれば、 シャ ドウマスク中心側のマスクの光源側端部 2 3 と、 シャ ドウマスク外周側のマスクの蛍光面側端部 2 6 とが、 シャ ドウ マスク面に直交する方向の座標位置長さ Δ Ηとして、 5 m以上離れて 形成されているので、 溶接時に発生するしわが吸収される際にシャ ドウ マスク中心側のマスク 2 2がシャ ドウマスク外周側のマスク 2 9に近づ いていっても、 上記の光源側端部 2 3と蛍光面側端部 2 6 とは、 貫通幅 W以下の長さでは相対向する部位に突き当たることがない。 図面の簡単な説明  According to the present invention, the light source side end 23 of the mask on the shadow mask center side and the phosphor screen side end 26 of the mask on the shadow mask outer peripheral side are coordinate position lengths in a direction orthogonal to the shadow mask surface. Since it is formed at a distance of 5 m or more as Δ Δ, the mask 22 on the center side of the shadow mask approaches the mask 29 on the outer side of the shadow mask when the wrinkles generated during welding are absorbed. However, the light source side end portion 23 and the phosphor screen side end portion 26 do not abut each other when the length is not more than the penetration width W. BRIEF DESCRIPTION OF THE FIGURES
第 1図は、 本発明のアパーチャ一ダリル形カラ一ブラウン管用のシャ ドウマスクの一例を示す平面図である。 第 2図は、 本発明のシャ ドウマ スクに形成されたスリツ 卜とエキス トラスリツ 卜の断面形状の一例を示 す拡大断面図である。 第 3図は、 本発明のシャ ドウマスクに形成された エキストラスリツ 卜の断面形状の他の一例を示す拡大断面図である。 第 4図は、 従来のシャ ドウマスクに形成されるエキストラスリ ツ 卜と蛍光 面との関係を示す概略図である。 第 5図は、 アパーチャ一グリル形カラ 一ブラウン管の構造を示す概略斜視図である。 第 6図は、 鋼枠に張力を 加えて溶接した状態を示す正面図 (A ) と縦断面図 (B ) である。 発明を実施するための最良の形態 以下、 本発明を図面に基づいて説明する。 ― FIG. 1 is a plan view showing an example of a shadow mask for an aperture-Daryl-type color CRT of the present invention. FIG. 2 is an enlarged cross-sectional view showing an example of a cross-sectional shape of a slit and an extra slit formed on the shadow mask of the present invention. FIG. 3 is an enlarged cross-sectional view showing another example of the cross-sectional shape of the extra slit formed on the shadow mask of the present invention. FIG. 4 is a schematic diagram showing a relationship between an extra slit formed on a conventional shadow mask and a phosphor screen. FIG. 5 is a schematic perspective view showing the structure of an aperture-grill type empty tube. FIG. 6 is a front view (A) and a longitudinal cross-sectional view (B) showing a state where a steel frame is welded by applying tension. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described with reference to the drawings. ―
第 1図は、 本発明の A G形カラーブラウン管用のシャ ドウマスクの一 例を示す平面図である。 シャ ドウマスク 1は、 複数のスリ ッ ト 2とマス ク 3とを有するものであり、 略長方形の金属薄板をエッチング加工する ことによって形成される。 マスク 3は、 ブラウン管の光源から所定の角 度 Θで照射される光のうち、 余分な光を遮るように作用する。 ブラウン 管の光源から照射される光のうち、 蛍光面に到達させるべき光は、 所定 幅にエッチング加工されたスリッ ト 2を通過し、 その照射幅は、 マスク 3の形状や寸法によって決定される。 シャ ドウマスク 1の左右両端のス リツ トのさらに外側には、 エキス トラスリッ ト 4が設けられている。 ま た、 シャ ドウマスク 1の上辺 6と下辺 7には、 シャ ドウマスク 1が適当 な張力で張り押さえられるように、 別に用意される鋼枠 6 1 (第 6図を 参照。 ) に溶接される溶接部を有している。 なお、 金属薄板としては、 通常、 ニッケル—鉄合金等の熱膨張係数の小さな材料や、 クリープ特性 を改善した鉄系材料等が用いられる。  FIG. 1 is a plan view showing an example of a shadow mask for an A-G color CRT according to the present invention. The shadow mask 1 has a plurality of slits 2 and a mask 3, and is formed by etching a substantially rectangular thin metal plate. The mask 3 acts to block extra light among the light emitted from the light source of the cathode ray tube at a predetermined angle Θ. Of the light emitted from the light source of the cathode ray tube, the light that should reach the phosphor screen passes through the slit 2 that has been etched to a predetermined width, and the irradiation width is determined by the shape and dimensions of the mask 3 . Extra slits 4 are provided further outside the left and right slits of the shadow mask 1. The upper side 6 and the lower side 7 of the shadow mask 1 are welded to a separately prepared steel frame 61 (see Fig. 6) so that the shadow mask 1 can be held down with an appropriate tension. Part. As the metal sheet, a material having a small coefficient of thermal expansion, such as a nickel-iron alloy, or an iron-based material having improved creep characteristics is usually used.
第 2図は、 本発明のシャ ドウマスクに形成されたスリツ 卜とエキスト ラスリッ トの断面形状の一例を示す拡大断面図である。 第 3図は、 本発 明のシャ ドウマスクに形成されたエキストラスリツ トの断面形状の他の 一例を示す拡大断面図である。 第 2図に示したエキス トラスリッ トは、 シャ ドウマスク中心側のマスク 2 2の光源側端部 2 3 とマスク端面エツ ジ 2 5とが共通し、 さらにシャ ドウマスク外周側のマスク 2 9の蛍光面 側端部 2 6 とマスク端面エッジ 2 8 とが共通する断面形状である。 一方 、 第 3図に示したエキス トラスリッ トは、 それらが共通していない断面 形状である。  FIG. 2 is an enlarged cross-sectional view showing an example of a cross-sectional shape of a slit and an extruded slit formed on the shadow mask of the present invention. FIG. 3 is an enlarged sectional view showing another example of the sectional shape of the extra slit formed on the shadow mask of the present invention. In the extra slit shown in FIG. 2, the light source side end 23 of the mask 22 on the center side of the shadow mask and the mask end surface edge 25 are common, and the fluorescent surface of the mask 29 on the outer side of the shadow mask is also used. The side end portion 26 and the mask end surface edge 28 have a common cross-sectional shape. On the other hand, the extra slits shown in FIG. 3 have different cross-sectional shapes.
スリッ ト 2は、 第 5図に示すように、 シャ ドウマスク 1がブラウン管 5 1 に装着された際に、 パネル 5 5の内側の蛍光面 5 4を縦縞状に露光 するための紫外線を通過させるために作用したり、 電子銃 5 2から照射 された 3本の電子ビームを集中通過させる時にその照射光の色選別を行 うために作用する。 そして、 このスリッ ト 2を通過した照射光が、 パネ ル 5 5の内側に配置された縦縞状の蛍光面 5 4の対応する位置の蛍光体 にランディ ングすることによって、 その蛍光体が発光する。 こうしたス リッ ト 2は、 第 2図に示すように、 通常、 光源側の開口幅が小さく、 蛍 光面 5 4側の開口幅が大きいすり鉢状であり、 従来と同様のエッチング 加工によって所定の数、 ピッチ、 貫通幅 Yおよび断面形状等で形成され る。 特に、 高精細度のカラ一ブラウン管に使用されるシャ ドウマスク 1 は、 スリ ッ ト 2のピッチや貫通幅 Yが小さく、 より精密なエッチング加 ェが要求される。 As shown in Fig. 5, when the shadow mask 1 is mounted on the cathode ray tube 51, the slit 2 exposes the fluorescent screen 54 inside the panel 55 to vertical stripes. It acts to pass ultraviolet light for irradiating, or to color-select the irradiation light when the three electron beams emitted from the electron gun 52 are concentrated and passed. Then, the irradiation light that has passed through the slit 2 lands on the phosphor at the position corresponding to the vertical stripe-shaped phosphor screen 54 disposed inside the panel 55, and the phosphor emits light. . As shown in FIG. 2, such a slit 2 usually has a mortar shape with a small opening width on the light source side and a large opening width on the phosphor surface 54 side. It is formed with the number, pitch, penetration width Y and cross-sectional shape. In particular, the shadow mask 1 used for a high-definition color cathode ray tube has a small slit 2 and a small through-hole width Y, and requires more precise etching.
エキス トラスリッ ト 4は、 シャ ドウマスク 1を溶接する際の溶接歪み 等によって発生するしわを吸収して、 両端部のスリッ ト 2形状の変形を 防ぐように作用する。 エキス トラスリ ッ ト 4は、 左右両端のスリ ッ ト 2 のさらに外側の位置に形成され、 スリ ッ ト 2の形成と同じエッチング加 ェによって形成される。  The extra slit 4 acts to absorb wrinkles generated by welding distortion and the like when the shadow mask 1 is welded, and to prevent deformation of the slit 2 shape at both ends. The extra slits 4 are formed at positions further outside the slits 2 at the left and right ends, and are formed by the same etching process as the formation of the slits 2.
エキス トラスリ ッ ト 4を左右両端に設けることにより、 シャ ドウマス ク 1の溶接を、 その中央から両端に向かって行うことができる。 また、 シャ ドウマスクの一端から他の一端に向かって溶接する場合であっても 、 溶接方向が特に決まっていないような場合には、 予め両端に設けてお く ことが便利である。 溶接方向が決まっているような場合には、 溶接が 終了する側のみにエキス トラスリツ ト 4を設けることができる。 溶接に よって発生するしわを十分に吸収するためには、 エキス トラスリ ツ ト 4 の長手方向の長さを、 スリッ ト 2の長手方向の長さと同程度の長さにす ることが好ましい。  By providing the extra slits 4 at the left and right ends, the shadow mask 1 can be welded from its center to both ends. Even when welding is performed from one end of the shadow mask to the other end, if the welding direction is not particularly determined, it is convenient to provide them at both ends in advance. When the welding direction is determined, the extra slit 4 can be provided only on the side where welding is completed. In order to sufficiently absorb the wrinkles generated by welding, it is preferable that the length of the extra slit 4 in the longitudinal direction is approximately the same as the length of the slit 2 in the longitudinal direction.
エキス トラスリッ ト 4の断面形状は、 第 2図や第 3図に示すように、 シャ ドウマスク面に直交する方向の断面形状において、 シャ ドウマスク 中心側のマスク 2 2の光源側端部 2 3とシャ ドウマスク外周側のマスク 2 9の蛍光面側端部 2 6とで規定される貫通幅 Wと、 蛍光面側方向両側 のマスク端面エッジ 2 4 、 2 8間で規定される開口幅 Tと、 光源側方向 両側のマスク端面エッジ 2 5 、 2 7間で規定される開口幅 Sとで構成さ れてなるものである。 さらに、 蛍光面側方向両側のマスク端面エッジ 2 4 、 2 8間で規定される開口幅 Tの中心位置 P力 、 光源側方向両側のマ スク端面エッジ 2 5 、 2 7間で規定される開口幅 Sの中心位置 Qよりも シャ ドウマスク中心側にシフ トしてなり、 上記の開口幅 Tと開口幅 Sと が、 スリ ッ ト 2の光源側方向両側のマスク端面エツジ間で規定される貫 通幅 Y以上の断面形状で構成されている。 このとき、 エキス トラスリツ ト 4の貫通幅 Wは、 スリッ ト 2の貫通幅 Yよりも大きくても小さくても よく、 特に限定されない。 The cross-sectional shape of the extraslit 4 is as shown in Figs. 2 and 3. In the cross-sectional shape in the direction perpendicular to the shadow mask surface, the penetration defined by the light source side end 23 of the mask 22 on the center side of the shadow mask and the phosphor screen side end 26 of the mask 29 on the outer side of the shadow mask The width W, the opening width T defined between the mask end edges 24 and 28 on both sides in the fluorescent screen side direction, and the opening width S defined between the mask end edges 25 and 27 on both sides in the light source direction. It is composed of In addition, the center position P of the opening width T defined between the mask end edges 24 and 28 on both sides in the phosphor screen direction, and the opening defined between the mask end edges 25 and 27 on both sides in the light source direction. The opening width T and the opening width S are shifted from the center position Q of the width S to the center side of the shadow mask, so that the opening width T and the opening width S are defined between the mask edge edges on both sides of the slit 2 in the light source side. It has a cross-sectional shape with a width of Y or more. At this time, the penetration width W of the extra slit 4 may be larger or smaller than the penetration width Y of the slit 2 and is not particularly limited.
従って、 開口幅 Tと開口幅 Sとが、 スリッ ト 2の貫通幅 Y以上で形成 されているので、 スリッ ト 2の形成よりも大きなエッチング加工用のマ スクパ夕一ンを使用することができる。 そのため、 高度なエッチング加 ェが要求されることがなく、 通常のエッチング工程で容易にエキストラ スリッ ト 4を形成できる。  Accordingly, since the opening width T and the opening width S are formed to be equal to or larger than the through width Y of the slit 2, a mask mask for etching that is larger than the formation of the slit 2 can be used. . Therefore, an advanced slit is not required, and the extra slit 4 can be easily formed by a normal etching process.
エキス トラスリッ ト 4を構成する光源側端部 2 3や蛍光面側端部 2 6 は、 第 2図に示すように、 各々のマスク表面に形成されたナイフエッジ のような形状で形成され、 マスク端面エッジ 2 5 、 2 8とそれぞれ共通 するものであってもよく、 第 3図に示すように、 各々のマスク表面から 少し入り込んだ位置に形成された形状であってもよい。 こうしたエキス トラスリ ッ ト 4の断面形状は、 エッチング加工の際のエッチング条件に よつて適宜設定することができる。  As shown in FIG. 2, the light source side end 23 and the phosphor screen side end 26 constituting the extra slit 4 are formed in a shape like a knife edge formed on the surface of each mask. It may be common to the end faces 25 and 28, respectively, or may be a shape formed at a position slightly intruding from each mask surface as shown in FIG. The cross-sectional shape of the extra slit 4 can be appropriately set according to the etching conditions at the time of etching.
本発明においては、 こうした光源側端部 2 3と蛍光面側端部 2 6とが 、 シャ ドウマスク面に直交する方向の座標位置 おいて、 異なる位置に 形成されている。 その結果、 溶接時に発生するしわが吸収される際にシ ャ ドウマスク中心側のマスク 2 2がシャ ドウマスク外周側のマスク 2 9 に近づいていっても、 光源側の端部 2 3 と蛍光面側の端部 2 6とは、 貫 通幅 W以下の長さでは相対向する部位に突き当たることがない。 こうし て得られたエキストラスリッ ト 4は、 シャ ドウマスク 1 を鋼枠 6 1に溶 接する際に発生するしわを吸収することができるので、 少なくとも一端 のスリ ッ ト 2で起こるしわによる変形を防ぐことができ、 シャ ドウマス ク 1 に形成された全てのスリ ツ ト 2の有効幅を確保することができる。 エキス トラスリ ッ ト 4に対して斜めに入射する光 2 1は、 エキストラ スリ ッ ト 4のシャ ドウマスク中心側で光源側方向のマスク端面エッジ 2 5と、 シャ ドウマスク外周側で蛍光面側方向のマスク端面エツジ 2 8と でその一部が遮蔽され、 所定の照射幅 Xでエキストラスリッ ト 4を通過 して蛍光面 5 4に照射される。 開口幅 Tの中心位置 Pと開口幅 Sの中心 位置 Qとのシフ ト量は、 照射幅 Xが蛍光面 5 4を露光する幅よりも小さ くなるように調節され、 各々の端面エッジ 2 5 、 2 8が所定の位置関係 となるようにシャ ドウマスクを形成する。 これにより、 シャ ドウマスク 1を溶接する際のしわ発生の有無に関わらず、 蛍光面 5 4を露光させる ことがなく、 また、 しわの発生する場合であっても、 照射幅 Xをより小 さくするようにエキス トラスリッ ト 4が作用するので、 蛍光面の露光が 起こらない。 In the present invention, such a light source side end 23 and a phosphor screen side end 26 are formed. It is formed at a different position in the coordinate position in the direction orthogonal to the shadow mask surface. As a result, even when the mask 22 on the center of the shadow mask approaches the mask 29 on the outer periphery of the shadow mask when the wrinkles generated during welding are absorbed, the end 23 on the light source side and the fluorescent screen side The end 26 does not abut on an opposing portion if the length is not more than the penetration width W. The extra slit 4 obtained in this way can absorb wrinkles generated when the shadow mask 1 is welded to the steel frame 61, thereby preventing deformation due to wrinkles occurring at least at the slit 2 at one end. Thus, the effective width of all the slits 2 formed in the shadow mask 1 can be secured. The light 21 obliquely incident on the extra slit 4 is a mask end face edge 25 facing the light source side at the center of the shadow mask of the extra slit 4, and a mask facing the phosphor screen at the outer peripheral side of the shadow mask. A part thereof is shielded by the edge edges 28 and passes through the extra slit 4 with a predetermined irradiation width X to irradiate the fluorescent screen 54. The shift amount between the center position P of the opening width T and the center position Q of the opening width S is adjusted so that the irradiation width X is smaller than the width for exposing the phosphor screen 54. , 28 are formed in a predetermined positional relationship. As a result, the phosphor screen 54 is not exposed regardless of whether wrinkles occur when the shadow mask 1 is welded, and even when wrinkles occur, the irradiation width X is made smaller. As described above, the extra slit 4 acts, so that the phosphor screen is not exposed.
各々のエッジ 2 5 、 2 8の位置関係は、 シャ ドウマスク 1が装着され るブラウン管の大きさの相違に基づく光の入射角度 0の相違、 シャ ドウ マスク 1 に使用される金属薄板の厚さの相違、 エッチング加工条件の相 違、 蛍光面の露光性 (蛍光面材料や紫外線強度) の相違等によって適宜 設定されるが、 開口幅 Tの中心位置 Pと開口幅 Sの中心位置 Qとが、 シ ャ ドウマスク面に直交する座標軸において 3 0 m以上の距離でシフト していることが好ましい。 The positional relationship between the edges 25 and 28 is based on the difference in the incident angle of light 0 based on the difference in the size of the cathode ray tube on which the shadow mask 1 is mounted, and the thickness of the metal sheet used for the shadow mask 1. It is set appropriately according to differences, differences in etching processing conditions, differences in the exposing properties of the phosphor screen (phosphor screen material and ultraviolet intensity), etc., but the center position P of the opening width T and the center position Q of the opening width S Shi It is preferable that the shift is performed at a distance of 30 m or more on a coordinate axis orthogonal to the shadow mask plane.
光源側の開口幅 Sと蛍光面側の開口幅 Tの大きさは、 上述の位置関係 を有することを条件として適宜設定することができるが、 通常は貫通幅 W以上で形成される。  The size of the opening width S on the light source side and the opening width T on the phosphor screen side can be appropriately set on condition that the above positional relationship is satisfied.
シャ ドウマスク中心側のマスクの光源側端部 2 3と、 シャ ドウマスク 外周側のマスクの蛍光面側端部 2 6とは、 シャ ドウマスク面に直交する 方向の座標位置長さ Δ Ηとして、 5 ^ m以上離れて形成されていること が好ましい。 これにより、 溶接時に発生するしわが吸収される際に、 シ ャ ドウマスク中心側のマスク 2 2がシャ ドウマスク外周側のマスク 2 9 に近づいていっても、 光源側端部 2 3と蛍光面側端部 2 6とは、 貫通幅 W以下の長さでは相対向する部位に突き当たることがない。  The light source side end 23 of the mask on the center side of the shadow mask and the phosphor screen side end 26 of the mask on the outer side of the shadow mask have a coordinate position length Δ の in a direction perpendicular to the shadow mask plane of 5 ^. Preferably, they are formed at a distance of at least m. As a result, when the wrinkles generated during welding are absorbed, even if the mask 22 on the shadow mask center side approaches the mask 29 on the shadow mask outer peripheral side, the light source side end 23 and the fluorescent screen side can be used. The end 26 does not abut on an opposing portion if the length is less than the penetration width W.
また、 通常のブラウン管 5 1の蛍光面 5 4は、 5 0 ΠΙを超える幅で 照射されることによって露光する場合があるので、 照射幅 Xを 5 0 以下とするようなエキス トラスリッ ト 4であることが好ましい。 蛍光面 5 4の露光の程度は、 蛍光面を形成する感光材料や、 露光のために使用 する紫外線の強度等の露光条件によって異なる場合があるので、 特殊な 態様の場合には露光条件を考慮して照射幅 Xが適宜決定される。 蛍光体 の感度や紫外線強度が高い場合には、 蛍光面 5 4上の照射幅 Xをより小 さくするようなエキス トラスリッ トを形成することが好ましい。  In addition, the fluorescent screen 54 of the ordinary cathode ray tube 51 may be exposed by irradiating it with a width exceeding 50 mm, so that the extra slit 4 has an irradiation width X of 50 or less. Is preferred. The degree of exposure of the phosphor screen 54 may vary depending on the photosensitive material that forms the phosphor screen and the exposure conditions such as the intensity of ultraviolet light used for exposure, so the exposure conditions should be considered in special cases. Then, the irradiation width X is appropriately determined. When the sensitivity and ultraviolet intensity of the phosphor are high, it is preferable to form an extra slit that makes the irradiation width X on the phosphor screen 54 smaller.
なお、 シャ ドウマスク 1を鋼枠 6 1に溶接する際の溶接加工が、 シャ ドウマスク 1の一端から他の一端に向かって行われる場合には、 エキス トラスリツ トを必ずしも両側に設ける必要はなく、 少なくとも一方に形 成すればよい。  When the shadow mask 1 is welded to the steel frame 61 when welding is performed from one end of the shadow mask 1 to the other end, it is not always necessary to provide extra slits on both sides. It may be formed on one side.
以上説明したシャ ドウマスク 1は、 従来公知の方法で製造することが できる。 通常、 フォ トエッチング技術を用いた一連の工程で行われ、 連 続したインライン装置またはオフライン装置で製造される。 例えば、 先 ず、 金属薄板の両面に水溶性コロイ ド系フォ トレジス ト等が塗布される 。 乾燥後、 その両面に露光用原板を密着させて、 高圧水銀等の紫外線に 富んだ光によって露光し、 水で現像する。 現像後、 レジス ト膜で周囲が カバ一された金属の露出部分は、 エッチング加工される。 その結果、 第 2図や第 3図に示すように、 すり鉢状にエッチング加工されたスリツ ト 2と、 蛍光面側の開口中心 Pと光源側の開口中心 Qとがオフセッ トし、 且つ蛍光面側の開口中心 Pがシャ ドウマスク 1の中心側にシフ 卜した形 状にエッチング加工されたエキス トラスリ ッ ト 4とを有するシャ ドウマ スク 1が製造される。 このとき、 エキス トラスリ ッ ト 4の形状が第 2図 または第 3図に示す形状になるように、 露光用原板のパターンおよびそ の密着位置が調整される。 なお、 エッチング加工は、 熱処理等がなされ た後、 金属薄板の両面側から塩化第二鉄溶液をスプレー等することによ つて行われ、 その後、 水洗い、 剥離等の後工程が連続的に行われる。 産業上の利用可能性 The shadow mask 1 described above can be manufactured by a conventionally known method. Usually, it is performed in a series of steps using photo-etching technology. Manufactured on continuous in-line or off-line equipment. For example, first, a water-soluble colloidal photoresist is applied to both sides of a thin metal plate. After drying, the original plate for exposure is brought into close contact with both surfaces, exposed with ultraviolet-rich light such as high-pressure mercury, and developed with water. After the development, the exposed portions of the metal covered with the resist film are etched. As a result, as shown in FIGS. 2 and 3, the slit 2 etched in a mortar shape, the opening center P on the phosphor screen side and the opening center Q on the light source side are offset, and A shadow mask 1 having an extra slit 4 etched into a shape in which the opening center P on the side is shifted to the center side of the shadow mask 1 is manufactured. At this time, the pattern of the original exposure plate and the close contact position thereof are adjusted such that the shape of the extra slit 4 becomes the shape shown in FIG. 2 or FIG. The etching process is performed by spraying a ferric chloride solution from both sides of the metal sheet after heat treatment, etc., followed by continuous post-processing such as water washing and peeling. . Industrial applicability
以上説明したように、 本発明のブラウン管用シャ ドウマスクによれば 、 スリ ッ トの形成よりも大きなマスクパターンで容易にエッチング加工 することが可能となるので、 シャ ドウマスクの製造を容易に行うことが できる、 さらに高精細度が要求されるブラウン管に使用されるシャ ドウ マスクに対しても好ましく適用することができる。 また、 シャ ドウマス クの溶接時のしわの発生の有無に関わらず、 蛍光面を露光させることが ない。 さらに、 溶接時に発生するしわが吸収される際にシャ ドウマスク 中心側のマスクがシャ ドウマスク外周側のマスクに近づいていっても、 光源側端部と蛍光面側端部とは、 貫通幅 W以下の長さでは相対向する部 位に突き当たることがないので、 発生するしわを十分に吸収することが As described above, according to the shadow mask for a cathode ray tube of the present invention, it is possible to easily perform an etching process with a mask pattern larger than the formation of the slit, so that the shadow mask can be easily manufactured. It can be preferably applied to a shadow mask used for a cathode ray tube which requires a higher definition. In addition, the phosphor screen is not exposed, regardless of whether wrinkles occur when the shadow mask is welded. Furthermore, even when the center of the shadow mask approaches the mask on the outer periphery of the shadow mask when the wrinkles generated during welding are absorbed, the light source side end and the phosphor screen side end have a penetration width W or less. With the length of, it will not hit the opposite part, so it can absorb the wrinkles that occur
。? ^ ώ· ει . ? ^ ώ · ει
LSP00/00d£/lDd ££8 ^/00 Ο  LSP00 / 00d £ / lDd ££ 8 ^ / 00

Claims

請 求 の 範 囲 — The scope of the claims -
1 . エツチング加工によって形成された複数のスリツ 卜とマスクとから なり、 当該マスクによってブラウン管の光源から蛍光面に照射される光 の照射幅が決定されるブラウン管用シャ ドウマスクにおいて、 1. A shadow mask for a CRT comprising a plurality of slits and a mask formed by an etching process, and the mask determines the irradiation width of light emitted from the light source of the CRT to the phosphor screen.
前記シャ ドウマスクの両端に設けられたスリ ツ トのうち、 少なくとも 一端のスリッ トのさらに外側にエキス トラスリッ トを有し、  Among the slits provided at both ends of the shadow mask, at least one of the slits has an extra slit further outside the slit,
前記エキス トラスリ ッ トは、 前記シャ ドウマスク中心側のマスクの光 源側端部と当該シャ ドウマスク外周側のマスクの蛍光面側端部とで規定 される貫通幅 Wと、 蛍光面側方向両側のマスク端面エツジ間で規定され る開口幅 Tと、 光源側方向両側のマスク端面エッジ間で規定される開口 幅 Sとで構成される断面形状を有し、  The extra slit has a penetration width W defined by the light source side end of the mask on the center side of the shadow mask and the fluorescent screen side end of the mask on the outer peripheral side of the shadow mask, and both sides in the fluorescent screen side direction. It has a cross-sectional shape consisting of an opening width T defined between mask edge edges and an opening width S defined between mask edge edges on both sides in the light source direction,
さらに、 前記蛍光面側方向両側のマスク端面エッジ間で規定される開 口幅 Tの中心位置 Pが、 前記光源側方向両側のマスク端面エツジ間で規 定される開口幅 Sの中心位置 Qよりもシャ ドウマスク中心側にシフ卜し てなり、  Further, the center position P of the opening width T defined between the mask end faces on both sides in the fluorescent screen side direction is different from the center position Q of the opening width S defined between the mask end faces on both sides in the light source direction. Is shifted toward the center of the shadow mask,
前記の開口幅 Tと開口幅 Sとが、 前記スリ ッ トの光源側方向両側のマ スク端面エツジ間で規定される貫通幅 Y以上であることを特徴とするブ ラゥン管用シャ ドウマスク。  A shadow mask for a brown tube, wherein the opening width T and the opening width S are not less than a through width Y defined between mask edge edges on both sides of the slit in a light source side.
2 . 請求の範囲第 1項に記載のブラウン管用シャ ドウマスクにおいて、 前記エキス トラスリ ツ トを通過する光の照射幅 Xは、 前記蛍光面の露 光幅よりも小さく、 前記エキストラスリッ トに対して斜めに入射する光 の一部が、 シャ ドウマスク中心側で光源側方向のマスク端面エッジと、 シャ ドウマスク外周側で蛍光面側方向のマスク端面エツジとで遮蔽され て決定されることを特徴とするブラウン管用シャ ドウマスク。  2. The shadow mask for a CRT according to claim 1, wherein an irradiation width X of light passing through the extra slit is smaller than an exposure width of the phosphor screen, and A part of the obliquely incident light is determined by being shielded by the mask end face edge in the light source direction at the shadow mask center side and the mask end face edge in the phosphor screen direction on the shadow mask outer peripheral side. Shadow mask for CRT.
3 . 請求の範囲第 1項または第 2項に記載のブラウン管用シャ ドウマス クにおいて、 ― 3. Shadow cathode for a CRT according to claim 1 or 2. In the
前記シャ ドウマスク中心側のマスクの光源側端部と、 当該シャ ドウマ スク外周側のマスクの蛍光面側端部とが、 前記シャ ドウマスク面に直交 する方向の座標位置長さ Δ Ηとして、 5 ^ m以上離れて形成されている ことを特徴とするブラウン管用シャ ドウマスク。  The light source side end of the mask on the shadow mask center side and the phosphor screen side end of the shadow mask outer peripheral side mask have a coordinate position length Δ の in a direction orthogonal to the shadow mask surface, 5 ^. A shadow mask for a cathode ray tube, which is formed at a distance of at least m.
PCT/JP2000/000487 1999-02-01 2000-01-28 Shadowmask for cathode-ray tube WO2000046833A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE10080397T DE10080397T1 (en) 1999-02-01 2000-01-28 Hole mask for Braun tube
KR1020007010740A KR20010042220A (en) 1999-02-01 2000-01-28 Shadowmask for cathode-ray tube

Applications Claiming Priority (4)

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JP11/23378 1999-02-01
JP2337899 1999-02-01
JP11/200431 1999-07-14
JP11200431A JP2000294161A (en) 1999-02-01 1999-07-14 Shadow mask for cathode-ray tube

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945949B1 (en) * 1969-12-15 1974-12-06
JPH05314920A (en) * 1992-04-30 1993-11-26 Sony Corp Aperture grille
JPH0729504A (en) * 1993-07-09 1995-01-31 Mitsubishi Electric Corp Color cathode-ray tube
US5396145A (en) * 1991-12-06 1995-03-07 Sony Corporation Aperture grill having additional slits preventing deformation of end slits and capable of intercepting light rays

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945949B1 (en) * 1969-12-15 1974-12-06
US5396145A (en) * 1991-12-06 1995-03-07 Sony Corporation Aperture grill having additional slits preventing deformation of end slits and capable of intercepting light rays
JPH05314920A (en) * 1992-04-30 1993-11-26 Sony Corp Aperture grille
JPH0729504A (en) * 1993-07-09 1995-01-31 Mitsubishi Electric Corp Color cathode-ray tube

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JP2000294161A (en) 2000-10-20
CN1146949C (en) 2004-04-21
CN1296636A (en) 2001-05-23
DE10080397T1 (en) 2001-05-31

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