KR100730100B1 - Tension mask for flat cathode ray tube and the method for manufactoring the same - Google Patents

Abstract

Disclosed are a tension mask for a planar cathode ray tube and a method of manufacturing the same. The present invention forms a plurality of strips on a metal plate, forms intermittent strip-shaped slots in the areas between the strips, and forms a real bridge supporting the slots between the slots, and ends at both ends of the slots. And a tension mask, each connected to a plurality of ends, forming a dummy bridge, the other ends of which are separated from each other at the center of the slot and in contact with each other.

Description

Tension mask for flat cathode ray tube and the method for manufactoring the same}

1 is an enlarged plan view of a part of a conventional tension mask;

2 is an enlarged perspective view illustrating a dummy bridge portion of FIG. 1;

3 is a perspective view illustrating a tension mask assembly according to one embodiment of the present invention;

4 is a perspective view showing a part of the tension mask according to the first embodiment of the present invention;

5A is a perspective view illustrating a state after the dummy bridge of FIG. 4 is semi-etched;

5B is a perspective view illustrating a state after a tensile force is applied to the dummy bridge of FIG. 4;

6 is a plan view showing a part of a tension mask according to a second embodiment of the present invention.

<Brief description of symbols for the main parts of the drawings>

10 ... tension mask 11 ... metal plate

12,33 ... strip 13,34 ... slot

14,35 ... Real Bridge 15,36 ... Dummy Bridge

30 ... shadow mask assembly 31 ... tension mask

32 ... frame 37 ... support member                 

38 ... rigid member

The present invention relates to a planar cathode ray tube, and more particularly, to a structure of a dummy bridge formed in a tension mask having a color discrimination function and a method of manufacturing the same.

In general, the cathode ray tube implements an image by landing an electron beam emitted from an electron gun through a myriad of electron beam passing holes formed in a shadow mask and landing it on a fluorescent film on an inner surface of the panel.

The cathode ray tube is designed to have a predetermined curvature according to the deflection trajectory of the electron beam deflected by the deflection yoke mounted on the cone portion of the funnel, and the mask also has a curvature corresponding to the curvature of the screen. have.

However, in the cathode ray tube employing such a mask, a so-called doming phenomenon occurs, in which the mask is heated by the electron beam emitted from the electron gun and swells to the panel side. This doming phenomenon causes the electron beam to not land correctly on the desired fluorescent film. In addition, as the cathode ray tube is formed to have a curvature, the viewing angle is narrowed, and a fluorescent film is excited at the edge of the screen, thereby distorting the image.

In order to solve this problem, a cathode ray tube having a flat screen has been developed. The cathode ray tube is provided with a tension mask assembly fixed to the panel in a state where a tensile force is applied to the inside of the panel.

1 is a partially enlarged view of a conventional tension mask 10.

Referring to the drawings, the tension mask 10 includes a plurality of strips 12 formed on a metal plate 11 of a thin film spaced apart at predetermined intervals, a slot 13 formed in an intermittent strip form so that a myriad of electron beams pass therethrough, It includes a real bridge (14) for supporting the slot (13).

The real bridge 14 may reduce a howling phenomenon and poisson contraction caused by the vibration of the mask 11 due to an external impact. However, the real bridge 14 has a problem in that when the pitch is large, the shape of the bridge 14 appears as a residual in the image, thereby degrading the visibility line.

In order to prevent this, the mask 11 is provided with dummy bridges 15 connected to the strip 12 along both edges of the slot 13. As a result, the residual bridge that is covered by the fluorescent film by the real bridge 14 can be relatively uniformly taken by the dummy bridge 15, so that the viewer cannot recognize the residual that appears in the image.

In the conventional tension mask 10 having the above structure, the slot 13 is formed by a general photolithography process using a photo mask having a corresponding pattern. At this time, when the width of the portion of the slot 13 in which the dummy bridge 15 is formed is W, the electron beam passes through the slots 13 between the dummy bridges 15 which are formed to face each other as shown in FIG. Visibility is not completely solved.                         

According to the applicant's experiment, when the thickness of the metal plate 11 is 0.050 mm, the photolithography process is performed such that the width of the slot 13 of the portion where the dummy bridge 15 is formed is about 30 to 40 micrometers. Even when such a narrow slot 13 is formed, visibility or screen disturbance still occurs severely on the screen of the cathode ray tube used in a computer monitor requiring high resolution.

This phenomenon is due to the fact that the electron beam can pass through the slot 13 of the portion where the dummy bridge 15 is formed when etching the mask 11, and the minimum width of the slot 13 is solved for visibility. Will be required.

The present invention was devised to solve the above problems, and by half-etching the derby bridge and applying tensile force in one direction, the ends are physically contacted with each other to fundamentally solve the visibility problem and further improve the resolution of the image. It is an object of the present invention to provide a tension mask for a planar cathode ray tube and a method of manufacturing the same.

In order to achieve the above object, a planar cathode ray tube tension mask according to an aspect of the present invention,

As formed on the metal plate of the thin plate,

A plurality of strips formed to be spaced apart from each other by a predetermined distance;

A slot formed in an intermittent strip shape at predetermined intervals in an area between the strips, through which an electron beam scanned from an electron gun passes;

A real bridge formed between the slots and supporting the slots; And

Formed from both side edges of the slot,

And a dummy bridge having one end connected to the strip and the other end extending from the strip to be in contact with each other at the center of the slot.

In addition, the dummy bridge is characterized in that the thickness of the end portion in contact is irregularly formed over the entire surface of the metal plate.

Further, the dummy bridge is characterized in that the thickness of the end portion in contact with the thicker toward the peripheral portion from the center portion of the metal plate.

In addition, the dummy bridge is characterized in that the length in the longitudinal direction of the slot is formed narrower toward the peripheral portion from the central portion of the metal plate.

Method for producing a tension mask for a planar cathode ray tube according to another aspect of the present invention,

Preparing a thin metal plate;

Applying photoresist to the entire surface of the metal plate, arranging a mask having a pattern thereon, exposing and developing the pattern;

Forming a plurality of strips in the metal plate, intermittent strip-shaped slots supported by a real bridge between the strips, and dummy bridges formed along both edges of the slots and connected at both ends at the center of the slots; Etching;                     

Removing photoresist remaining on the metal plate; And

And applying a tensile force in the vertical direction with respect to the strip so that the dummy bridge connected to both ends at the center of the slot is separated and in contact with each other. 2.

In the step of etching the metal plate,

The dummy bridge is characterized in that the semi-etching so that the end is connected.

Furthermore, in the step of etching the metal plate,

The dummy bridge is etched to have a thicker end portion after semi-etching from the center portion of the metal plate toward the periphery portion.

In addition, in the step of etching the metal plate,

The dummy bridge is etched such that the length in the long side direction of the slot after the semi-etching is gradually shortened from the center portion to the periphery of the metal plate.

Further, in the step of applying a tensile force to the metal plate,

The real bridge is characterized in that the end of the dummy bridge is separated from the deformation does not occur to apply a tensile force to each other.

Hereinafter, a tension mask for a planar cathode ray tube and a method of manufacturing the same according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

3 illustrates a shadow mask assembly 30 according to one embodiment of the invention.

Referring to the drawings, the shadow mask assembly 30 includes a tension mask 31 and a frame 32 supporting the tension mask 31.

The tension mask 31 is made of a thin metal plate, and a plurality of strips 33 formed at predetermined intervals on the front surface of the mask 31 and an intermittent slot 34 to allow a myriad of electron beams to pass through are real bridges. (35, see FIG. 4). Dummy bridges 36 (see FIG. 4) are formed at both edges of the slot 34 to be connected to the strip 33.

The frame 32 is fixed to both end portions of the support members 37 and the support members 37 which are installed to face each other to support the tension mask 31 in the long side direction, and the tension masks ( 31, the rigid member 38 for applying tension to the.

According to a feature of the invention, the dummy bridge 36 is connected to the strip 33 in a state of being in physically contact with each other.

4 is an enlarged view of a portion of the tension mask 31 of FIG. 3.

Referring to the drawings, a plurality of strips 33 are formed in the tension mask 31 in the direction of the short side of the mask 31 at predetermined intervals. Between the strips 33 are formed slots 34 through which electron beams scanned from the electron gun can pass. The slot 34 is formed innumerably in the effective screen portion over the entire surface of the mask 31 in the form of an intermittent strip.

The slot 34 is maintained by a real bridge 35 formed at a portion corresponding to an area between adjacent slots. The real bridge 35 is formed to be connected to the strip 33 and its width may be arbitrarily adjustable.

A dummy bridge 36 is formed along both edges of the slot 34 to remove the residual effect in the image due to the formation of the real bridge 35. The dummy bridge 36 has one end extended to the center of the slot 34 with the strip 33 connected thereto. The dummy bridges 36 extend from both sides of the slot 34 so that the other ends thereof are in contact with each other at the center of the slot 34.

The slot 34 portion in which the dummy bridge 36 having the above structure is formed is formed by semi-etching and a predetermined tensile force.

More specifically, as shown in FIGS. 5A and 5B.

FIG. 5A illustrates a state after the dummy bridge 36 is formed by the semi-etching method, and FIG. 5B illustrates a state after the tensile force is applied to the dummy bridge 36 of FIG. 5A.

Referring to FIG. 5A, the dummy bridges 36 are half-etched on both sides of the tension mask 31 (see FIG. 3) so that the respective ends 36a are not cut off at the center of the slot 34. Are not interconnected. In addition, the thickness around the end portion 36a is relatively thinner than other portions of the dummy bridge 36 due to the semi-etching.                     

In this state, when the tension mask 31 is applied in one direction with respect to the strip 33 by using a mechanical method such as a roller or the like on both sides, another part, for example, the real bridge 35, around the end 36a is applied. The stress concentration occurs before), resulting in breakage. Accordingly, as shown in FIG. 5B, the dummy bridges 36 are separated from each other with their ends 36a in contact.

Looking at the manufacturing process of the tension mask 31 having the above structure as follows.

First, a thin metal plate is prepared.

Next, a photoresist is applied to the entire surface of the metal plate, the photo mask having a pattern to be formed on the metal plate is arranged on the upper portion of the metal plate, and the ultraviolet rays are irradiated from the light source to perform exposure and development processes.

After the exposure and development processes are completed, an etching solution is applied to the entire surface of the metal plate to perform an etching process. In this case, a plurality of strips 33, a strip-shaped slot 34 intermittently in the region between the strips 33, and the slot 34 are supported on the pattern formed on the photo mask, that is, the metal plate. A real bridge 35 is formed, and a dummy bridge 36 is formed at one end of which is connected to the strip 33 along both edges of the slot 34, and the other end thereof extends to the center of the slot 34.

Next, the photoresist remaining on the metal plate is removed.

Subsequently, the dummy bridge 36 is separated by applying a tensile force, for example, using a roller or the like, in a mechanical manner perpendicular to the strip 33 with respect to the strip 33. At this time, the strength of the tensile force applied is detachable in the state in which the ends 36a of the dummy bridge 36 are in contact with each other, while the real bridge 35 is preferably deformed.

To this end, the dummy bridge 36 is formed so that the end (36a) is not broken from each other during etching. That is, the dummy bridges 36 are semi-etched so that their ends 36a are not cut off from each other but are connected to each other.

At this time, the thickness of the end portion 36a after the semi-etching is formed non-uniformly through the entire metal plate. Preferably, it will be advantageous that the thickness becomes thicker from the center portion of the metal plate to the periphery thereof so that the end portion 36a is first broken at the center portion of the metal plate when the above-mentioned tension is applied.

In addition, the length of the end portion 36a of the dummy bridge 36 in the long side direction of the slot 34 may also be gradually shortened from the central portion of the metal plate toward the periphery, thereby improving visibility.

When the tension mask 31 having the above structure passes through the slot 34, the tension mask 31 may not land on the fluorescent film on the inner surface of the panel corresponding to the real bridge 35, thereby preventing the phosphor from being excited.

Therefore, the image appears as black dots, and the ends 36a of the plurality of dummy bridges 36 which are connected to the strip 33 along both edges of the slot 34 are formed to face each other. As the electron beam does not pass through this part, the point of the sword is evenly distributed over the entire screen, so that the viewer does not recognize the afterimage, thereby improving visibility.

6 shows a part of the tension mask 60 according to the second embodiment of the present invention.

Referring to the drawings, the tension mask 60 is made of a thin metal plate.

In the central portion of the tension mask 60, a plurality of first strips 61 are formed to be spaced apart at predetermined intervals in the short side direction of the mask 60, and are supported by the first real bridge 62 between the strips 61. The first slot 63 is formed in an intermittent strip form. In addition, first edge bridges 64 connected to the first strip 61 are formed at both edges of the first slot 63 to face the center of the slot 63.

Meanwhile, the real and dummy bridges gradually decrease toward the periphery of the tension mask 60. That is, a plurality of second strips 65 and a second slot 67 having a different length from the first slot 63 are formed between the strips 65 at the periphery of the tension mask 60. The second slot 67 is supported by a second real bridge 66 that differs in pitch from the first real bridge 62. A second dummy bridge 68 having a different frequency from the first dummy bridge 64 is connected to both edges of the second slot 67 from the second strip 65.

As such, the number of the real bridges 62 and 66 and the dummy bridges 64 and 68 gradually decreases from the center portion of the tension mask 60 toward the periphery thereof, so that the pitches vary.

The tension mask 60 having the above structure is formed such that the number of the real bridges 62 and 66 and the dummy bridges 64 and 68 are different from the center portion and the periphery of the mask 60. It is possible to attenuate transmission of vibration by sound waves.

That is, when the real bridges 62 and 66 and the dummy bridges 64 and 68 are formed in the same number through the entire mask, the transmission of vibrations is the same, but when differently formed, from the center to the periphery or It is possible to reduce the vibration transmitted from the peripheral portion to the center portion to obtain a damping effect of the vibration.

As described above, since the tension mask for the planar cathode ray tube and the manufacturing method thereof according to the present invention are separated from each other in contact with the end portion of the dummy bridge in the slot portion where the dummy bridge is formed, the following effects can be obtained.

First, the passage of the electron beam scanned from the electron gun hardly occurs through the space between the dummy bridges, thereby fundamentally solving the visibility problem in the cathode ray tube requiring high resolution.

Second, in the exposure process for forming the screen on the inner surface of the panel, light does not pass through this area, so it is easy to secure the straightness of the black mattress formed between the fluorescent films, and is caused by the difference in the exposure amount between the real bridge and the dummy bridge. This can also minimize the gap between the black mattress.

Third, since the dummy bridges are in contact with each other in a separated state, the amount of movement of the electron beam due to thermal deformation of the assembly due to thermal shock when the electron beam scanned from the electron gun collides with the shadow mask assembly is the same as before.                     

Although the present invention has been described with reference to one embodiment shown in the drawings, this is merely exemplary, and it will be understood by those skilled in the art that various modifications and equivalent other embodiments are possible. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Claims (9)

As formed on the metal plate of the thin plate, A plurality of strips formed on the metal plate to be spaced apart from each other by a predetermined distance; A slot formed in an intermittent strip shape at predetermined intervals in an area between the strips, through which an electron beam scanned from an electron gun passes; A real bridge formed between the slots and supporting the slots; And Formed from both side edges of the slot, And a dummy bridge having one end connected to each of the strips and the other end extending into the center of the slot, the dummy bridge being installed to be separated from each other and contacting each other at the center of the slot. The method of claim 1, The dummy bridge is a planar cathode tube tension mask, characterized in that the thickness of the end of the contact is irregularly formed over the entire surface of the metal plate. The method of claim 2, The dummy bridge is a planar cathode tube tension mask, characterized in that the thickness of the end portion in contact with the thicker formed from the central portion of the metal plate toward the periphery. The method of claim 3, The dummy bridge is a flat mask tension mask, characterized in that the length in the longitudinal direction of the slot is formed narrower toward the peripheral portion from the center of the metal plate. Preparing a thin metal plate; Applying photoresist to the entire surface of the metal plate, arranging a mask having a pattern thereon, exposing and developing the pattern; Forming a plurality of strips in the metal plate, intermittent strip-shaped slots supported by a real bridge between the strips, and dummy bridges formed along both edges of the slots and connected at both ends at the center of the slots; Etching; Removing photoresist remaining on the metal plate; And And applying a tensile force in the vertical direction with respect to the strip so that the dummy bridge connected at both ends at the center portion of the slot is detachable and contactable. The method of claim 5, In the step of etching the metal plate, The dummy bridge is a method of manufacturing a tension mask for planar cathode ray tube, characterized in that for performing the semi-etching so that the end is connected. The method of claim 6, In the step of etching the metal plate, The dummy bridge is a method of manufacturing a tension mask for a planar cathode ray tube, characterized in that the thickness of the end portion after the semi-etching thickened toward the peripheral portion from the center of the metal plate. The method of claim 7, wherein In the step of etching the metal plate, The dummy bridge is a method of manufacturing a tension mask for a planar cathode ray tube, characterized in that the length of the long side direction for the slot after the semi-etching is gradually shortened toward the peripheral portion from the metal plate. The method of claim 5, In the step of applying a tensile force to the metal plate, The real bridge is a method of manufacturing a tension mask for a flat cathode ray tube, characterized in that the end of the dummy bridge is separated from the deformation does not occur to apply a tensile force to each other.

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