WO1999048682A8 - Article, preparation resistant au ternissement, procede de fabrication et procedes d'utilisation associes - Google Patents

Article, preparation resistant au ternissement, procede de fabrication et procedes d'utilisation associes

Info

Publication number
WO1999048682A8
WO1999048682A8 PCT/US1999/006775 US9906775W WO9948682A8 WO 1999048682 A8 WO1999048682 A8 WO 1999048682A8 US 9906775 W US9906775 W US 9906775W WO 9948682 A8 WO9948682 A8 WO 9948682A8
Authority
WO
WIPO (PCT)
Prior art keywords
manufacture
preparation
methods
same
resistant article
Prior art date
Application number
PCT/US1999/006775
Other languages
English (en)
Other versions
WO1999048682A1 (fr
WO1999048682A9 (fr
Inventor
David H Waldeck
Thomas David Burleigh
Yuepeng Gu
Original Assignee
Univ Pittsburgh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Pittsburgh filed Critical Univ Pittsburgh
Publication of WO1999048682A1 publication Critical patent/WO1999048682A1/fr
Publication of WO1999048682A8 publication Critical patent/WO1999048682A8/fr
Publication of WO1999048682A9 publication Critical patent/WO1999048682A9/fr

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/02Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using non-aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/16Sulfur-containing compounds
    • C23F11/161Mercaptans

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)

Abstract

La présente invention a trait à un article de composition (21) métallique, de préférence en argent ou en cuivre, et à un revêtement (37) qui résiste au ternissement grâce à une application en couche mince unique, robuste, auto-assemblée et qui, lorsqu'il est appliqué sur un article ou un substrat, est non toxique, souple et apte au soudage. Le procédé de l'invention comporte une étape de lavage organique et une étape d'attaque à l'acide sulfurique ou à un de ses équivalents avant alkylthiolation.
PCT/US1999/006775 1998-03-27 1999-03-29 Article, preparation resistant au ternissement, procede de fabrication et procedes d'utilisation associes WO1999048682A1 (fr)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US4953098A 1998-03-27 1998-03-27
US09/049,530 1998-03-27
US25061499A 1999-02-16 1999-02-16
US25122699A 1999-02-16 1999-02-16
US09/250,614 1999-02-16
US09/251,226 1999-02-16

Publications (3)

Publication Number Publication Date
WO1999048682A1 WO1999048682A1 (fr) 1999-09-30
WO1999048682A8 true WO1999048682A8 (fr) 2000-05-18
WO1999048682A9 WO1999048682A9 (fr) 2000-07-20

Family

ID=27367552

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/006775 WO1999048682A1 (fr) 1998-03-27 1999-03-29 Article, preparation resistant au ternissement, procede de fabrication et procedes d'utilisation associes

Country Status (1)

Country Link
WO (1) WO1999048682A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7887885B2 (en) 2000-10-20 2011-02-15 Northwestern University Nanolithography methods and products therefor and produced thereby
US7524535B2 (en) * 2004-02-25 2009-04-28 Posco Method of protecting metals from corrosion using thiol compounds
DE102006030961A1 (de) * 2005-11-09 2007-05-10 Fixtest Gmbh Verfahren zum Beschichten elektrischer Kontakte
WO2008047375A1 (fr) * 2006-10-19 2008-04-24 Ramot At Tel-Aviv University Ltd Procédé de dépôt électrochimique de monocouches sur des surfaces métalliques et objets recouverts d'une monocouche organique
WO2009132321A1 (fr) 2008-04-25 2009-10-29 Northwestern University Lithographie au stylo polymère
JP2012528736A (ja) 2009-06-05 2012-11-15 ノースウェスタン ユニバーシティ シリコンペンナノリソグラフィー
US8753813B2 (en) 2009-12-07 2014-06-17 Northwestern University Generation of combinatorial patterns by deliberate tilting of a polymer-pen array
US8745761B2 (en) 2009-12-07 2014-06-03 Northwestern University Force feedback leveling of tip arrays for nanolithography
IT1398698B1 (it) 2010-02-24 2013-03-08 Mesa S A S Di Malimpensa Simona E Davide E C Metodo per la protezione di superfici di argento e sue leghe dall'imbrunimento.
WO2012125986A1 (fr) 2011-03-17 2012-09-20 Northwestern University Procédé d'analyse d'une substance à analyser à l'aide de réseaux combinatoires et de motifs uniformes
US9766551B2 (en) 2012-10-29 2017-09-19 Northwestern University Heat actuated and projected lithography systems and methods
EP3081673A1 (fr) * 2015-04-16 2016-10-19 COVENTYA S.p.A. Produit plaqué présentant une couche de finition de métal précieux et une résistance à la corrosion améliorée, son procédé de production et leurs utilisations
US10203598B2 (en) 2015-10-16 2019-02-12 Northwestern University Gradient spray coating polymer pen arrays
US9971239B2 (en) 2015-10-22 2018-05-15 Northwestern University Silica polymer pen lithography
US10563244B2 (en) 2016-09-20 2020-02-18 Northwestern University Nanopatterned extracellular matrices enable cell-based assays with a mass spectrometric readout
WO2022239017A1 (fr) * 2021-05-09 2022-11-17 Prerna Goradia Nouvelle méthodologie pour revêtir des articles non conducteurs par des couches de dépôt autocatalytique antimicrobiennes à large spectre

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5635047A (en) * 1992-07-28 1997-06-03 Iowa State University Research Foundation, Inc. Electrochemical method of controlling thiolate coverage on a conductive substrate such as gold
WO1994021386A2 (fr) * 1993-03-25 1994-09-29 Research Corporation Technologies, Inc. Polymeres utiles pour la formation de couches ultra-minces anisotropes collees auto-assemblees et leur utilisation
JPH07226211A (ja) * 1994-02-09 1995-08-22 Seiko Instr Inc アルカリ電池とその製造方法
US5514501A (en) * 1994-06-07 1996-05-07 The United States Of America As Represented By The Secretary Of Commerce Process for UV-photopatterning of thiolate monolayers self-assembled on gold, silver and other substrates
US5674592A (en) * 1995-05-04 1997-10-07 Minnesota Mining And Manufacturing Company Functionalized nanostructured films

Also Published As

Publication number Publication date
WO1999048682A1 (fr) 1999-09-30
WO1999048682A9 (fr) 2000-07-20

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