WO1999044100B1 - Curable compositions - Google Patents

Curable compositions

Info

Publication number
WO1999044100B1
WO1999044100B1 PCT/GB1999/000598 GB9900598W WO9944100B1 WO 1999044100 B1 WO1999044100 B1 WO 1999044100B1 GB 9900598 W GB9900598 W GB 9900598W WO 9944100 B1 WO9944100 B1 WO 9944100B1
Authority
WO
WIPO (PCT)
Prior art keywords
composition according
ethylenically unsaturated
mixtures
anhydride
functional
Prior art date
Application number
PCT/GB1999/000598
Other languages
French (fr)
Other versions
WO1999044100A1 (en
Inventor
Stephen Anthony Hall
Julian Mark Steer
Original Assignee
Coates Brothers Plc
Stephen Anthony Hall
Julian Mark Steer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coates Brothers Plc, Stephen Anthony Hall, Julian Mark Steer filed Critical Coates Brothers Plc
Priority to AU32611/99A priority Critical patent/AU3261199A/en
Publication of WO1999044100A1 publication Critical patent/WO1999044100A1/en
Publication of WO1999044100B1 publication Critical patent/WO1999044100B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Abstract

A curable composition with an enhanced drying window for use in a primary or secondary imaging system is obtainable as the reaction product or an anhydride polymer and at least an ethylenically unsaturated material having one or more hydroxy groups. The anhydride functional polymer is obtainable as the reaction product of an ethylenically unsaturated monomer material and a cyclic anhydride capable of reacting with the unsaturated monomer material. The latter reaction is effected in the presence of a free radical initiator with a low-hydrogen abstracting capability. This is defined as an initiator having a hydrogen bond dissociation energy of no more than 430 KJ/mole.

Claims

16AMENDED CLAIMS[received by the International Bureau on 20 August 1999 (20.08.99); original claims 1-17 replaced by amended claims 1-15 (3 pages)]
1. A curable composition obtainable as the reaction product of an anhydride functional polymer and at least an ethylenically unsaturated material having one or more hydroxy groups, the anhydride functional polymer being obtainable as the reaction product of an ethylenically unsaturated monomer material and a cyclic anhyride material capable of reacting with the ethylenically unsaturated monomer material, in the presence of a free radical initiator comprising a tertiary amyl peroxide and which produces initiating radials having a hydrogen bond dissociation energy of no more than 430KJ/mole.
2. A composition according to claim 1 , wherein the bond dissociation energy is 420KJ/mole or less, preferably 415KJ/mole or less.
3. A composition according to any preceding claim, wherein the ethylenically unsaturated monomer material is selected from (meth) acrylate monomers, vinyl functional monomers and mixtures thereof.
4. A composition according to any preceding claim, wherein the ethylenically unsaturated monomer material is selected from alkyl acrylates, cycloalkyl acrylates, ether functional acrylates and other functional acrylates and methacrylic analogues of any of these and mixtures thereof.
5. A composition according to any preceding claim, wherein the ethylenically unsaturated monomer material is selected from aliphatic vinyl monomers, aromatic vinyl monomers and mixtures thereof.
6. A composition according to any preceding claim, wherein the cyclic anhydride material comprises a material selected from maleic anhydride, citraconic anhydride, itaconic anhvdride and mixtures thereof. 17
7. A composition according to any preceding claim, wherein the anhydride functional polymer has an average molecular weight of from 700 to 100,000.
8. A composition according to any preceding claim, wherein the ethylenically unsaturated material having one or more hydroxy groups is selected from aliphatic and/or aromatic hydroxy functional (meth) acrylates and mixtures thereof.
9. A composition according to any preceding claim, wherein the final reaction product is obtainable as the reaction product of the anhydride functional polymer, the ethylenically unsaturated material having one or more hydroxy groups and one or more amines and/or one or more non-acrylated functional polyols and/or one or more imides with a polymerisable double bond.
10. A composition according to claim 9, wherein the amine(s) is/are selected from primary and/or secondary alkyl and/or aryl amines.
11. A composition according to claim 9 or claim 10, wherein the amine(s) is/are selected from ethylamine, diethylamine, propylamine, diaminopropane, ethylene diamine and butylamine and mixtures thereof.
12. A composition according to any of claims 9-11, wherein the non-acrylated functional polyol(s) is/are selected from alkyl, amyl, cycloalkyl, alkylanyl and arylalkyl poly-alcohols and mixtures thereof.
13. A composition according to any of claims 9-1 1, wherein the non-acrylated functional polyol(s) is/are selected from methanol, propanol, cyclohexanol and mixtures thereof 18
14. A composition according to any of claims 9-12, wherein the imides is/are selected from maleimide, 3-maleimidopropionic acid, N-hydroxysuccinimide ester, 4- (maleimidomethyl) -1-cyclohexanecarboxylic acid, N-hydroxysuccinimide, N- methylmaleimide, N-ethylmaleimide and derivatives thereof, and mixtures thereof.
15. A composition according to any preceding claim, wherein the ethylenically unsaturated material having one or more hydroxy groups is selected from those which are capable upon exposure to radiation, especially U. V. light.
PCT/GB1999/000598 1998-02-27 1999-02-26 Curable compositions WO1999044100A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU32611/99A AU3261199A (en) 1998-02-27 1999-02-26 Curable compositions

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9804267.4 1998-02-27
GB9804267A GB2334719A (en) 1998-02-27 1998-02-27 Curable compositions

Publications (2)

Publication Number Publication Date
WO1999044100A1 WO1999044100A1 (en) 1999-09-02
WO1999044100B1 true WO1999044100B1 (en) 1999-10-21

Family

ID=10827758

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB1999/000598 WO1999044100A1 (en) 1998-02-27 1999-02-26 Curable compositions

Country Status (3)

Country Link
AU (1) AU3261199A (en)
GB (1) GB2334719A (en)
WO (1) WO1999044100A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7078457B2 (en) 2002-07-30 2006-07-18 Rohm And Haas Company Polymer composition and process for the preparation thereof
US20190369494A1 (en) * 2016-12-05 2019-12-05 Arkemea Inc. Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4777230A (en) * 1985-05-30 1988-10-11 Pennwalt Corporation Solution polymerization of acrylic acid derived monomers using tertiary alkyl(ηC5)hydroperoxides
US4939198A (en) * 1989-04-07 1990-07-03 Gaf Chemicals Corporation Solution feed, solution polymerization process for production of copolymers of maleic anhydride and an alkylvinyl ether having low viscosities and high solids content
US5082910A (en) * 1989-09-01 1992-01-21 Isp Investments Inc. Polymerization process using tertiary-amylperoxy pivalate as the free radical initiator
EP0499271A1 (en) * 1991-02-15 1992-08-19 Kawasaki Steel Corporation Photosensitive resin

Also Published As

Publication number Publication date
GB9804267D0 (en) 1998-04-22
GB2334719A (en) 1999-09-01
AU3261199A (en) 1999-09-15
WO1999044100A1 (en) 1999-09-02

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