WO1998006889A3 - Superheated vapor dryer system - Google Patents

Superheated vapor dryer system Download PDF

Info

Publication number
WO1998006889A3
WO1998006889A3 PCT/US1997/014274 US9714274W WO9806889A3 WO 1998006889 A3 WO1998006889 A3 WO 1998006889A3 US 9714274 W US9714274 W US 9714274W WO 9806889 A3 WO9806889 A3 WO 9806889A3
Authority
WO
WIPO (PCT)
Prior art keywords
parts
vapor
zone
drying
temperature
Prior art date
Application number
PCT/US1997/014274
Other languages
French (fr)
Other versions
WO1998006889A2 (en
Inventor
Robert H Clark
Anthony K Green
Steven E Sykes
Original Assignee
Forward Technology Ind Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forward Technology Ind Inc filed Critical Forward Technology Ind Inc
Priority to JP51000498A priority Critical patent/JP3896164B2/en
Publication of WO1998006889A2 publication Critical patent/WO1998006889A2/en
Publication of WO1998006889A3 publication Critical patent/WO1998006889A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microbiology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

In a vapor drying system, solvents such as isopropyl alcohol (IPA) are boiled and condensed to provide a means of removing water and other contamination from process parts loaded into the equipment. The parts enter the apparatus via an automated lift assembly (185). Upon entering the vapor zone (145), solvent condenses on the parts and fixtures due to a temperature differential, displacing the contaminants. This condensate/contaminant waste stream gravity drains to a buffer tank (125) below via a sloped, temperature-controlled drip tray (121). After vapor condensation on the parts ceases, drying is accomplished using superheated vapors formed in a stabilized zone generated by one or more offset boil sumps (106, 108) and separate vapor heat exchangers (112). Any liquid solvent remaining on the parts is flash-dried in the vapor zone, so that parts emerge clean and dry. The invention incorporates a computer-implemented PLC to control process parameters, cover mechanism (234), transport mechanism (236), safety features during operation (238), idle and standby conditions (240).
PCT/US1997/014274 1996-08-16 1997-08-14 Superheated vapor dryer system WO1998006889A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51000498A JP3896164B2 (en) 1996-08-16 1997-08-14 Superheated steam dryer system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2368696P 1996-08-16 1996-08-16
US60/023,686 1996-08-16

Publications (2)

Publication Number Publication Date
WO1998006889A2 WO1998006889A2 (en) 1998-02-19
WO1998006889A3 true WO1998006889A3 (en) 1998-07-02

Family

ID=21816607

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1997/014274 WO1998006889A2 (en) 1996-08-16 1997-08-14 Superheated vapor dryer system

Country Status (6)

Country Link
JP (1) JP3896164B2 (en)
KR (1) KR100492026B1 (en)
ID (1) ID18031A (en)
MY (1) MY121614A (en)
TW (1) TW413725B (en)
WO (1) WO1998006889A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6368183B1 (en) * 1999-02-03 2002-04-09 Speedfam-Ipec Corporation Wafer cleaning apparatus and associated wafer processing methods
US6951804B2 (en) 2001-02-02 2005-10-04 Applied Materials, Inc. Formation of a tantalum-nitride layer
US6878206B2 (en) 2001-07-16 2005-04-12 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
JP2007152231A (en) * 2005-12-05 2007-06-21 Nidec Sankyo Corp Cleaning device
US8196312B2 (en) 2006-05-18 2012-06-12 Fujifilm Corporation Drying method and apparatus for drying object
JP2011073211A (en) 2009-09-29 2011-04-14 Fujifilm Corp Method of manufacturing original planographic printing plate
JP5366324B2 (en) 2010-03-03 2013-12-11 富士フイルム株式会社 Planographic printing plate manufacturing method and manufacturing apparatus
CN102641859A (en) * 2012-05-07 2012-08-22 江苏合海机械制造有限公司 Stepping cycling auto-cleaning machine for work pieces
KR101554006B1 (en) 2013-05-27 2015-09-17 (주) 나인테크 The drying apparatus using superheated steam
CN108062990B (en) * 2018-01-11 2024-06-07 航天晨光股份有限公司 Radioactive waste liquid crystallization drying system and method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5085238A (en) * 1991-03-04 1992-02-04 Branson Ultrasonics Corporation Vapor degreasing apparatus
US5371950A (en) * 1990-02-23 1994-12-13 S & K Products International, Inc. Isopropyl alcohol vapor dryer system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5371950A (en) * 1990-02-23 1994-12-13 S & K Products International, Inc. Isopropyl alcohol vapor dryer system
US5085238A (en) * 1991-03-04 1992-02-04 Branson Ultrasonics Corporation Vapor degreasing apparatus

Also Published As

Publication number Publication date
ID18031A (en) 1998-02-19
MY121614A (en) 2006-02-28
JP2000516334A (en) 2000-12-05
TW413725B (en) 2000-12-01
KR100492026B1 (en) 2005-05-31
WO1998006889A2 (en) 1998-02-19
KR20000030012A (en) 2000-05-25
JP3896164B2 (en) 2007-03-22

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