WO1997033295A3 - Electronic tube system and method of manufacturing same - Google Patents
Electronic tube system and method of manufacturing same Download PDFInfo
- Publication number
- WO1997033295A3 WO1997033295A3 PCT/DE1997/000427 DE9700427W WO9733295A3 WO 1997033295 A3 WO1997033295 A3 WO 1997033295A3 DE 9700427 W DE9700427 W DE 9700427W WO 9733295 A3 WO9733295 A3 WO 9733295A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electrode
- tubes
- field
- electronic tube
- tube systems
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J21/00—Vacuum tubes
- H01J21/02—Tubes with a single discharge path
- H01J21/06—Tubes with a single discharge path having electrostatic control means only
- H01J21/10—Tubes with a single discharge path having electrostatic control means only with one or more immovable internal control electrodes, e.g. triode, pentode, octode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
- H01J17/38—Cold-cathode tubes
- H01J17/40—Cold-cathode tubes with one cathode and one anode, e.g. glow tubes, tuning-indicator glow tubes, voltage-stabiliser tubes, voltage-indicator tubes
- H01J17/44—Cold-cathode tubes with one cathode and one anode, e.g. glow tubes, tuning-indicator glow tubes, voltage-stabiliser tubes, voltage-indicator tubes having one or more control electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J19/00—Details of vacuum tubes of the types covered by group H01J21/00
- H01J19/02—Electron-emitting electrodes; Cathodes
- H01J19/24—Cold cathodes, e.g. field-emissive cathode
Landscapes
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP97918006A EP0885453A2 (en) | 1996-03-09 | 1997-03-03 | Electronic tube system and method of manufacturing same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19609234.5 | 1996-03-09 | ||
DE1996109234 DE19609234A1 (en) | 1996-03-09 | 1996-03-09 | Pipe systems and manufacturing processes therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1997033295A2 WO1997033295A2 (en) | 1997-09-12 |
WO1997033295A3 true WO1997033295A3 (en) | 1997-12-04 |
Family
ID=7787766
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE1997/000427 WO1997033295A2 (en) | 1996-03-09 | 1997-03-03 | Electronic tube system and method of manufacturing same |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0885453A2 (en) |
DE (1) | DE19609234A1 (en) |
TW (1) | TW357932U (en) |
WO (1) | WO1997033295A2 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6198557B1 (en) | 1997-06-25 | 2001-03-06 | Deutsche Telekom Ag | Telecommunication system having frequency-dividing optical components for the parallel processing of optical pulses |
DE10006361A1 (en) * | 1999-05-25 | 2000-11-30 | Deutsche Telekom Ag | Miniaturized terahertz radiation source, has element such as field emitter, electrostatic lens, beam deflector, metal grid and second anode mounted on semiconducting chip by nanolithography |
WO2000072413A2 (en) | 1999-05-25 | 2000-11-30 | Deutsche Telekom Ag | Miniaturized terahertz radiation source |
EP1363164B1 (en) | 2002-05-16 | 2015-04-29 | NaWoTec GmbH | Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
DE10302794A1 (en) * | 2003-01-24 | 2004-07-29 | Nawotec Gmbh | Manufacture of corpuscular radiation systems, e.g. electron beam or ion beam systems, producing corpuscular radiation systems on substrates using corpuscular radiation induced deposition |
US20070029046A1 (en) * | 2005-08-04 | 2007-02-08 | Applied Materials, Inc. | Methods and systems for increasing substrate temperature in plasma reactors |
WO2009084054A1 (en) * | 2007-12-28 | 2009-07-09 | Selex Sistemi Integrati S.P.A. | High frequency triode-type field emission device and process for manufacturing the same |
EP2413343B1 (en) * | 2010-07-26 | 2015-11-04 | Hans W.P. Dr. Koops | Device for generating THz radiation with free electron beams |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4855636A (en) * | 1987-10-08 | 1989-08-08 | Busta Heinz H | Micromachined cold cathode vacuum tube device and method of making |
WO1992002030A1 (en) * | 1990-07-18 | 1992-02-06 | International Business Machines Corporation | Process and structure of an integrated vacuum microelectronic device |
EP0490536A1 (en) * | 1990-11-28 | 1992-06-17 | Matsushita Electric Industrial Co., Ltd. | Vacuum microelectronic field-emission device |
EP0513777A2 (en) * | 1991-05-13 | 1992-11-19 | Seiko Epson Corporation | Multiple electrode field electron emission device and process for manufacturing it |
EP0535953A2 (en) * | 1991-10-02 | 1993-04-07 | Sharp Kabushiki Kaisha | Field-emission type electronic device |
US5249340A (en) * | 1991-06-24 | 1993-10-05 | Motorola, Inc. | Field emission device employing a selective electrode deposition method |
EP0569671A1 (en) * | 1992-05-12 | 1993-11-18 | Nec Corporation | Field emission cold cathode and method for manufacturing the same |
US5409568A (en) * | 1992-08-04 | 1995-04-25 | Vasche; Gregory S. | Method of fabricating a microelectronic vacuum triode structure |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4721885A (en) * | 1987-02-11 | 1988-01-26 | Sri International | Very high speed integrated microelectronic tubes |
JP2968014B2 (en) * | 1990-01-29 | 1999-10-25 | 三菱電機株式会社 | Micro vacuum tube and manufacturing method thereof |
US5192240A (en) * | 1990-02-22 | 1993-03-09 | Seiko Epson Corporation | Method of manufacturing a microelectronic vacuum device |
US5203731A (en) * | 1990-07-18 | 1993-04-20 | International Business Machines Corporation | Process and structure of an integrated vacuum microelectronic device |
US5150019A (en) * | 1990-10-01 | 1992-09-22 | National Semiconductor Corp. | Integrated circuit electronic grid device and method |
CA2070478A1 (en) * | 1991-06-27 | 1992-12-28 | Wolfgang M. Feist | Fabrication method for field emission arrays |
EP0525763B1 (en) * | 1991-08-01 | 1995-10-25 | Texas Instruments Incorporated | A method for building a vacuum microelectronics device |
JPH05182609A (en) * | 1991-12-27 | 1993-07-23 | Sharp Corp | Image display device |
GB9210419D0 (en) * | 1992-05-15 | 1992-07-01 | Marconi Gec Ltd | Cathode structures |
DE19502966A1 (en) * | 1995-01-31 | 1995-06-14 | Ignaz Prof Dr Eisele | Opto-electronic component for colour display screen or gas sensor |
-
1996
- 1996-03-09 DE DE1996109234 patent/DE19609234A1/en not_active Ceased
-
1997
- 1997-03-03 WO PCT/DE1997/000427 patent/WO1997033295A2/en active Application Filing
- 1997-03-03 EP EP97918006A patent/EP0885453A2/en not_active Ceased
- 1997-04-16 TW TW086205919U patent/TW357932U/en unknown
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4855636A (en) * | 1987-10-08 | 1989-08-08 | Busta Heinz H | Micromachined cold cathode vacuum tube device and method of making |
WO1992002030A1 (en) * | 1990-07-18 | 1992-02-06 | International Business Machines Corporation | Process and structure of an integrated vacuum microelectronic device |
EP0490536A1 (en) * | 1990-11-28 | 1992-06-17 | Matsushita Electric Industrial Co., Ltd. | Vacuum microelectronic field-emission device |
EP0513777A2 (en) * | 1991-05-13 | 1992-11-19 | Seiko Epson Corporation | Multiple electrode field electron emission device and process for manufacturing it |
US5249340A (en) * | 1991-06-24 | 1993-10-05 | Motorola, Inc. | Field emission device employing a selective electrode deposition method |
EP0535953A2 (en) * | 1991-10-02 | 1993-04-07 | Sharp Kabushiki Kaisha | Field-emission type electronic device |
EP0569671A1 (en) * | 1992-05-12 | 1993-11-18 | Nec Corporation | Field emission cold cathode and method for manufacturing the same |
US5409568A (en) * | 1992-08-04 | 1995-04-25 | Vasche; Gregory S. | Method of fabricating a microelectronic vacuum triode structure |
Also Published As
Publication number | Publication date |
---|---|
TW357932U (en) | 1999-05-01 |
WO1997033295A2 (en) | 1997-09-12 |
DE19609234A1 (en) | 1997-09-11 |
EP0885453A2 (en) | 1998-12-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100403060B1 (en) | Patterned resistor suitable for electron-emitting device, and associated fabrication method | |
US3935499A (en) | Monolythic staggered mesh deflection systems for use in flat matrix CRT's | |
US4020381A (en) | Cathode structure for a multibeam cathode ray tube | |
KR100343205B1 (en) | Field emission array using carbon nanotube and fabricating method thereof | |
US5173634A (en) | Current regulated field-emission device | |
US20010007783A1 (en) | Method for fabricating triode-structure carbon nanotube field emitter array | |
GB2146836A (en) | A source of ions with at least two ionization chambers, in particular for forming chemically reactive ion beams | |
US5847407A (en) | Charge dissipation field emission device | |
JPH02226635A (en) | Field emission type electron source | |
WO1997033295A3 (en) | Electronic tube system and method of manufacturing same | |
US2358542A (en) | Currentless grid tube | |
US5801486A (en) | High frequency field emission device | |
US3651360A (en) | Triode electron gun with positive grid and modular cathode | |
GB1464490A (en) | Beam-plasma type ion source | |
US2130281A (en) | Electron discharge tube | |
CN112599397B (en) | Storage type ion source | |
US6495953B1 (en) | Cold cathode electron gun | |
JPS6318297B2 (en) | ||
US3022933A (en) | Multiple electron beam ion pump and source | |
US2245614A (en) | Electron discharge device | |
US2092804A (en) | Screen grid electron discharge tube | |
US4886992A (en) | Electron source with magnetic means | |
US2340407A (en) | Electron multiplier apparatus | |
US2207354A (en) | Electron discharge apparatus | |
US9105434B2 (en) | High current, high energy beam focusing element |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): CA JP KP KR US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
AK | Designated states |
Kind code of ref document: A3 Designated state(s): CA JP KP KR US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A3 Designated state(s): AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1997918006 Country of ref document: EP |
|
NENP | Non-entry into the national phase |
Ref country code: JP Ref document number: 97531349 Format of ref document f/p: F |
|
WWP | Wipo information: published in national office |
Ref document number: 1997918006 Country of ref document: EP |
|
NENP | Non-entry into the national phase |
Ref country code: CA |