WO1996018206B1 - Vertical field emission devices and methods of fabrication with applications to flat panel displays - Google Patents

Vertical field emission devices and methods of fabrication with applications to flat panel displays

Info

Publication number
WO1996018206B1
WO1996018206B1 PCT/US1995/015760 US9515760W WO9618206B1 WO 1996018206 B1 WO1996018206 B1 WO 1996018206B1 US 9515760 W US9515760 W US 9515760W WO 9618206 B1 WO9618206 B1 WO 9618206B1
Authority
WO
WIPO (PCT)
Prior art keywords
cathode
anode
substrate
field emission
cavity
Prior art date
Application number
PCT/US1995/015760
Other languages
French (fr)
Other versions
WO1996018206A1 (en
Filing date
Publication date
Priority claimed from US08/353,402 external-priority patent/US5714837A/en
Application filed filed Critical
Publication of WO1996018206A1 publication Critical patent/WO1996018206A1/en
Publication of WO1996018206B1 publication Critical patent/WO1996018206B1/en

Links

Abstract

Vertical field emission devices (10) are described with very small anode to cathode separations. Preferred cathodes have sharp edge emitters (30) extending, outward perpendicular to the surface of the underlying substrate (12). These sharp edge emitters (30) are produced within planar photolithography by coating sacrificial conformal walls (32) and anisotropic etching. Microencapsulation is used to produce a sealed cavity under low pressure which includes space between the anode and cathode. The field emission components can be adapted for the production of light emitting field emission diodes. The individual cathode emitters can be integrated with solid state components on the substrate with each cathode being independently addressable. Arrays of closely packed light emitting, field emission diodes of the present invention are particularly suitable for use in displays. These displays would be useful for plat-panel computer displays and high definition television.

Claims

-25-AMENDED CLAIMS[received by the International Bureau on 25 June 1996 (25.06.96); original claims 1, 3 and 6-8 amended; remaining claims unchanged (4 pages)]
1. A field emission vacuum microelectronic component comprising:
a substrate presenting a generally planar surface;
a cathode comprising an emission projection extending outward, generally orthogonal to said substrate surface;
an anode presenting a surface generally facing said emission
projections of said cathode, said anode approaching said cathode
within a distance less than 15 μm, wherein said anode most closely
approaches said cathode in a direction generally orthogonal to said surface of said substrate; structure defining a surface forming a fully enclosed cavity, said cavity surface being spaced apart from said emission projections of said cathode and containing said surface of said anode, wherein said cavity is in isolation from atmosphere surrounding said component.
2. The field emission microelectronic component of claim 1 wherein
said anode approaching said cathode within a distance less than 5 μm.
3. The field emission microelectronic component of claim 1 wherein
said anode approaches said cathode within a distance less than 0.5 μm.
4. The field emission microelectronic component of claim 1 wherein said substrate is a single crystal silicon wafer.
5. The field emission microelectronic component of claim 1 wherein said anode is at least partially transparent to low energy electrons, said component further comprising: a phosphor capable of being luminescent upon interaction with low energy electrons.
6. A light emitting, field emission diode comprising: a substrate presenting a surface; a cathode projecting from said surface of said substrate; an anode presenting two surfaces oriented towards said cathode with one of said surfaces being at least partially transparent to visible light and the second of said surfaces being at least partially transparent to relatively low energy electrons; structure defining a surface forming a fully enclosed cavity, said cavity surface being spaced apart from said cathode and containing said surface of said anode, wherein said cavity is in isolation from atmosphere surrounding the device; -27-
a phosphor capable of being luminescent upon interaction with low energy electrons, said phosphor being located between said two surfaces of said anode oriented towards said cathode.
7. A method of producing a field emission microelectronic component comprising: providing a substrate presenting a surface; photolithographing, upon said surface of said substrate, layers comprising a cathode, a sacrificial layer, an anode most closely approaching said cathode in a direction generally orthogonal relative to said substrate, and one or more insulating layers including an insulating cover layer completely covering said sacrificial layer, wherein said anode approaches said cathode within
a distance less than 15 μm from said cathode;
etching a small channel within said insulating cover layer to expose a small portion of said sacrificial layer in a vicinity away from said cathode and said anode; chemically removing said sacrificial layer to expose a cavity defined by the structure surrounding said sacrificial layer prior to the removal of the sacrificial layer; and sealing said small channel under vacuum conditions.
8. A method of producing a field emission microelectronic component comprising: -28-
providing a substrate presenting a surface; producing a sacrificial layer using photolithographic techniques to conform to side walls to support sharp emission projections oriented generally perpendicular to said surface of said substrate; coating said conformal side wall with a conducting layer; performing an anisotropic etching to form sharp edge emitters on the cathode emission projection; photolithographing layers comprising a completed sacrificial layer, an anode most closely approaching said cathode in a direction generally orthogonal with respect to said substrate, and one or more insulating layers including an insulating cover layer; chemically removing said sacrificial layer to expose a cavity, a portion of said cavity defining a gap disposed between the sharp edge emitters on the cathode emission protection and the anode; sealing said cavity under vacuum conditions.
9. A solid state electronic device comprising: a plurality of field emission microelectronic components operably integrated into a surface of a silicon substrate such that each emission cathode is individually addressable, wherein each
PCT/US1995/015760 1994-12-09 1995-12-05 Vertical field emission devices and methods of fabrication with applications to flat panel displays WO1996018206A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/353,402 1994-12-09
US08/353,402 US5714837A (en) 1994-12-09 1994-12-09 Vertical field emission devices and methods of fabrication with applications to flat panel displays

Publications (2)

Publication Number Publication Date
WO1996018206A1 WO1996018206A1 (en) 1996-06-13
WO1996018206B1 true WO1996018206B1 (en) 1996-08-08

Family

ID=23388938

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1995/015760 WO1996018206A1 (en) 1994-12-09 1995-12-05 Vertical field emission devices and methods of fabrication with applications to flat panel displays

Country Status (2)

Country Link
US (1) US5714837A (en)
WO (1) WO1996018206A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5584740A (en) * 1993-03-31 1996-12-17 The United States Of America As Represented By The Secretary Of The Navy Thin-film edge field emitter device and method of manufacture therefor
FR2747839B1 (en) * 1996-04-18 1998-07-03 Pixtech Sa FLAT VISUALIZATION SCREEN WITH HYDROGEN SOURCE
DE69621017T2 (en) 1996-10-04 2002-10-31 St Microelectronics Srl Manufacturing method of a flat field emission display and display manufactured by this method
US6603257B1 (en) * 1999-05-27 2003-08-05 University Of North Carolina At Charlotte Cathodo-/electro-luminescent device and method of fabricating a cathodo-/electro-luminescent device using porous silicon/porous silicon carbide as an electron emitter
TW439303B (en) * 1999-11-22 2001-06-07 Nat Science Council Manufacturing method of field emission device
US6153271A (en) * 1999-12-30 2000-11-28 General Vacuum, Inc. Electron beam evaporation of transparent indium tin oxide
JP4323679B2 (en) * 2000-05-08 2009-09-02 キヤノン株式会社 Electron source forming substrate and image display device
US20060103299A1 (en) * 2004-11-15 2006-05-18 The Hong Kong University Of Science And Technology Polycrystalline silicon as an electrode for a light emitting diode & method of making the same
TWI528149B (en) 2011-12-14 2016-04-01 英特爾股份有限公司 Apparatus with thermal solution and method with the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8700834A (en) * 1987-04-09 1988-11-01 Philips Nv DIODE GUN WITH COMPOSITE ANODE.
US4855636A (en) * 1987-10-08 1989-08-08 Busta Heinz H Micromachined cold cathode vacuum tube device and method of making
JP3083547B2 (en) * 1990-07-12 2000-09-04 株式会社日立製作所 Semiconductor integrated circuit device
DE69205640T2 (en) * 1991-08-01 1996-04-04 Texas Instruments Inc Process for the production of a microelectronic component.
US5457355A (en) * 1993-12-01 1995-10-10 Sandia Corporation Asymmetrical field emitter

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