WO1995026371A1 - Intermediates for the preparation of poly(cyanoacrylates) and applications of the poly(cyanoacrylates) so prepared - Google Patents
Intermediates for the preparation of poly(cyanoacrylates) and applications of the poly(cyanoacrylates) so prepared Download PDFInfo
- Publication number
- WO1995026371A1 WO1995026371A1 PCT/IE1994/000018 IE9400018W WO9526371A1 WO 1995026371 A1 WO1995026371 A1 WO 1995026371A1 IE 9400018 W IE9400018 W IE 9400018W WO 9526371 A1 WO9526371 A1 WO 9526371A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polysubstituted
- optionally mono
- group
- hnear
- poly
- Prior art date
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- -1 poly(cyanoacrylates) Polymers 0.000 title claims abstract description 136
- 238000002360 preparation method Methods 0.000 title claims abstract description 26
- 239000000543 intermediate Substances 0.000 title abstract description 4
- 238000000034 method Methods 0.000 claims abstract description 77
- 150000001875 compounds Chemical class 0.000 claims abstract description 69
- IJVRPNIWWODHHA-UHFFFAOYSA-N 2-cyanoprop-2-enoic acid Chemical compound OC(=O)C(=C)C#N IJVRPNIWWODHHA-UHFFFAOYSA-N 0.000 claims abstract description 65
- 230000008569 process Effects 0.000 claims abstract description 55
- 150000002148 esters Chemical class 0.000 claims abstract description 43
- 239000000178 monomer Substances 0.000 claims abstract description 34
- 239000012038 nucleophile Substances 0.000 claims abstract description 31
- 230000002378 acidificating effect Effects 0.000 claims abstract description 19
- 239000003054 catalyst Substances 0.000 claims abstract description 18
- 239000012442 inert solvent Substances 0.000 claims abstract description 16
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims abstract description 13
- 230000002401 inhibitory effect Effects 0.000 claims abstract description 13
- 230000002441 reversible effect Effects 0.000 claims abstract description 11
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- 230000008030 elimination Effects 0.000 claims abstract description 6
- 238000003379 elimination reaction Methods 0.000 claims abstract description 6
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 6
- 239000011574 phosphorus Substances 0.000 claims abstract description 6
- 125000000446 sulfanediyl group Chemical group *S* 0.000 claims abstract description 4
- 150000003573 thiols Chemical class 0.000 claims abstract description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 76
- 125000000217 alkyl group Chemical group 0.000 claims description 61
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 57
- 229920006395 saturated elastomer Polymers 0.000 claims description 55
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 43
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims description 38
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 37
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 34
- 229920001651 Cyanoacrylate Polymers 0.000 claims description 31
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 30
- 125000003342 alkenyl group Chemical group 0.000 claims description 28
- 125000000304 alkynyl group Chemical group 0.000 claims description 28
- 239000000203 mixture Substances 0.000 claims description 28
- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 claims description 25
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 24
- 125000001072 heteroaryl group Chemical group 0.000 claims description 24
- 125000001624 naphthyl group Chemical group 0.000 claims description 24
- 239000002253 acid Substances 0.000 claims description 23
- 229920000642 polymer Polymers 0.000 claims description 23
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 20
- 238000006243 chemical reaction Methods 0.000 claims description 19
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 14
- 125000002252 acyl group Chemical group 0.000 claims description 14
- 239000000853 adhesive Substances 0.000 claims description 14
- 230000001070 adhesive effect Effects 0.000 claims description 14
- 125000004122 cyclic group Chemical group 0.000 claims description 12
- 239000002088 nanocapsule Substances 0.000 claims description 12
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 12
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 12
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 11
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 10
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 10
- 150000002500 ions Chemical class 0.000 claims description 10
- 125000005499 phosphonyl group Chemical group 0.000 claims description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 9
- 125000000129 anionic group Chemical group 0.000 claims description 9
- 125000000524 functional group Chemical group 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 8
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- 125000001424 substituent group Chemical group 0.000 claims description 8
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 7
- 150000003254 radicals Chemical class 0.000 claims description 7
- 239000013543 active substance Substances 0.000 claims description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 6
- 239000003112 inhibitor Substances 0.000 claims description 6
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 6
- 125000004434 sulfur atom Chemical group 0.000 claims description 6
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims description 5
- 229940079593 drug Drugs 0.000 claims description 5
- 239000003814 drug Substances 0.000 claims description 5
- YCWSUKQGVSGXJO-NTUHNPAUSA-N nifuroxazide Chemical group C1=CC(O)=CC=C1C(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 YCWSUKQGVSGXJO-NTUHNPAUSA-N 0.000 claims description 5
- 239000011541 reaction mixture Substances 0.000 claims description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 4
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical group CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 4
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims description 4
- 239000003377 acid catalyst Substances 0.000 claims description 4
- 125000003435 aroyl group Chemical group 0.000 claims description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 claims description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 4
- 125000003441 thioacyl group Chemical group 0.000 claims description 4
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 claims description 4
- 125000004119 disulfanediyl group Chemical group *SS* 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical group O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 2
- 229930192627 Naphthoquinone Natural products 0.000 claims description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 2
- 238000010533 azeotropic distillation Methods 0.000 claims description 2
- 150000001721 carbon Chemical group 0.000 claims description 2
- 239000001569 carbon dioxide Substances 0.000 claims description 2
- 125000004181 carboxyalkyl group Chemical group 0.000 claims description 2
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 claims description 2
- 239000007810 chemical reaction solvent Substances 0.000 claims description 2
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 claims description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 2
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- AEOCXXJPGCBFJA-UHFFFAOYSA-N ethionamide Chemical compound CCC1=CC(C(N)=S)=CC=N1 AEOCXXJPGCBFJA-UHFFFAOYSA-N 0.000 claims description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 claims description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 2
- 150000002791 naphthoquinones Chemical class 0.000 claims description 2
- 239000007858 starting material Substances 0.000 claims description 2
- 150000003457 sulfones Chemical class 0.000 claims description 2
- 150000003462 sulfoxides Chemical class 0.000 claims description 2
- 239000008096 xylene Substances 0.000 claims description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 claims 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract description 4
- 239000011593 sulfur Substances 0.000 abstract description 4
- 150000001298 alcohols Chemical class 0.000 abstract description 2
- 230000008878 coupling Effects 0.000 abstract description 2
- 238000010168 coupling process Methods 0.000 abstract description 2
- 238000005859 coupling reaction Methods 0.000 abstract description 2
- 150000002009 diols Chemical class 0.000 abstract description 2
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 abstract description 2
- 150000002989 phenols Chemical class 0.000 abstract description 2
- 229920005862 polyol Polymers 0.000 abstract description 2
- 150000003077 polyols Chemical class 0.000 abstract description 2
- 150000003003 phosphines Chemical class 0.000 abstract 1
- 239000010408 film Substances 0.000 description 44
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 22
- 239000000243 solution Substances 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 18
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- FGBJXOREULPLGL-UHFFFAOYSA-N ethyl cyanoacrylate Chemical compound CCOC(=O)C(=C)C#N FGBJXOREULPLGL-UHFFFAOYSA-N 0.000 description 13
- 239000010410 layer Substances 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 10
- 230000002829 reductive effect Effects 0.000 description 10
- 238000004821 distillation Methods 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- JDEFPFLTCXIVDH-UHFFFAOYSA-N 2-cyanopropanoic acid Chemical class N#CC(C)C(O)=O JDEFPFLTCXIVDH-UHFFFAOYSA-N 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002243 precursor Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- 238000009835 boiling Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 238000002679 ablation Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- XBEOUYAGWNMGMB-UHFFFAOYSA-N 2-cyano-3-hexadecoxypropanoic acid Chemical compound CCCCCCCCCCCCCCCCOCC(C#N)C(O)=O XBEOUYAGWNMGMB-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 4
- ARIZNXCQHSQSKV-UHFFFAOYSA-N ethyl 2-cyano-3-hexadecoxypropanoate Chemical compound CCCCCCCCCCCCCCCCOCC(C#N)C(=O)OCC ARIZNXCQHSQSKV-UHFFFAOYSA-N 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 229920000771 poly (alkylcyanoacrylate) Polymers 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- VEFXTGTZJOWDOF-UHFFFAOYSA-N benzene;hydrate Chemical compound O.C1=CC=CC=C1 VEFXTGTZJOWDOF-UHFFFAOYSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000005119 centrifugation Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- NGLOXYOGEMWSOD-UHFFFAOYSA-N cyano propanoate Chemical class CCC(=O)OC#N NGLOXYOGEMWSOD-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- ZJTGYTPFPKIEIM-UHFFFAOYSA-N hexadecyl 2-cyano-3-hexadecoxypropanoate Chemical compound CCCCCCCCCCCCCCCCOCC(C#N)C(=O)OCCCCCCCCCCCCCCCC ZJTGYTPFPKIEIM-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 238000005698 Diels-Alder reaction Methods 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 238000006000 Knoevenagel condensation reaction Methods 0.000 description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- WQAQPCDUOCURKW-UHFFFAOYSA-N butanethiol Chemical compound CCCCS WQAQPCDUOCURKW-UHFFFAOYSA-N 0.000 description 2
- 238000007385 chemical modification Methods 0.000 description 2
- HVYWMOMLDIMFJA-DPAQBDIFSA-N cholesterol Chemical compound C1C=C2C[C@@H](O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2 HVYWMOMLDIMFJA-DPAQBDIFSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- JBBVQXVFNRDFND-UHFFFAOYSA-N ethyl 2-cyano-3-diethoxyphosphorylpropanoate Chemical compound CCOC(=O)C(C#N)CP(=O)(OCC)OCC JBBVQXVFNRDFND-UHFFFAOYSA-N 0.000 description 2
- KUUHJNCQNKVDBG-UHFFFAOYSA-N ethyl 2-cyano-3-methoxypropanoate Chemical compound CCOC(=O)C(C#N)COC KUUHJNCQNKVDBG-UHFFFAOYSA-N 0.000 description 2
- ZIUSEGSNTOUIPT-UHFFFAOYSA-N ethyl 2-cyanoacetate Chemical compound CCOC(=O)CC#N ZIUSEGSNTOUIPT-UHFFFAOYSA-N 0.000 description 2
- XTRSYSJRJAHFJH-UHFFFAOYSA-N ethyl 3-butylsulfanyl-2-cyanopropanoate Chemical compound CCCCSCC(C#N)C(=O)OCC XTRSYSJRJAHFJH-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000693 micelle Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 238000005809 transesterification reaction Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- QCHFTSOMWOSFHM-WPRPVWTQSA-N (+)-Pilocarpine Chemical compound C1OC(=O)[C@@H](CC)[C@H]1CC1=CN=CN1C QCHFTSOMWOSFHM-WPRPVWTQSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- LTMRRSWNXVJMBA-UHFFFAOYSA-L 2,2-diethylpropanedioate Chemical compound CCC(CC)(C([O-])=O)C([O-])=O LTMRRSWNXVJMBA-UHFFFAOYSA-L 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- IFGHEEXVAVTLKH-UHFFFAOYSA-N 3,3-dicyanoprop-2-enoic acid Chemical class OC(=O)C=C(C#N)C#N IFGHEEXVAVTLKH-UHFFFAOYSA-N 0.000 description 1
- HRBVVYGEHUSYEV-UHFFFAOYSA-N 3-anthracen-1-ylfuran-2,5-dione Chemical compound O=C1OC(=O)C(C=2C3=CC4=CC=CC=C4C=C3C=CC=2)=C1 HRBVVYGEHUSYEV-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- XJUZRXYOEPSWMB-UHFFFAOYSA-N Chloromethyl methyl ether Chemical compound COCCl XJUZRXYOEPSWMB-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 238000006957 Michael reaction Methods 0.000 description 1
- QCHFTSOMWOSFHM-UHFFFAOYSA-N SJ000285536 Natural products C1OC(=O)C(CC)C1CC1=CN=CN1C QCHFTSOMWOSFHM-UHFFFAOYSA-N 0.000 description 1
- 239000004830 Super Glue Substances 0.000 description 1
- ZCDNRPPFBQDQHR-SSYATKPKSA-N Syrosingopine Chemical compound C1=C(OC)C(OC(=O)OCC)=C(OC)C=C1C(=O)O[C@H]1[C@H](OC)[C@@H](C(=O)OC)[C@H]2C[C@@H]3C(NC=4C5=CC=C(OC)C=4)=C5CCN3C[C@H]2C1 ZCDNRPPFBQDQHR-SSYATKPKSA-N 0.000 description 1
- VNBQGMADQPBGPM-UHFFFAOYSA-M [3-(1-cyanoethoxy)-3-oxopropyl]-triphenylphosphanium;2,2,2-trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F.C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCC(=O)OC(C)C#N)C1=CC=CC=C1 VNBQGMADQPBGPM-UHFFFAOYSA-M 0.000 description 1
- KCPJLBUDMSTBRT-UHFFFAOYSA-N [P].ClSCl Chemical class [P].ClSCl KCPJLBUDMSTBRT-UHFFFAOYSA-N 0.000 description 1
- 238000007171 acid catalysis Methods 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001345 alkine derivatives Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- MLIREBYILWEBDM-UHFFFAOYSA-N anhydrous cyanoacetic acid Natural products OC(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-N 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- LLCSWKVOHICRDD-UHFFFAOYSA-N buta-1,3-diyne Chemical group C#CC#C LLCSWKVOHICRDD-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 150000001734 carboxylic acid salts Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- TXHWYSOQHNMOOU-UHFFFAOYSA-N chloro(diethoxy)phosphane Chemical compound CCOP(Cl)OCC TXHWYSOQHNMOOU-UHFFFAOYSA-N 0.000 description 1
- XGRJZXREYAXTGV-UHFFFAOYSA-N chlorodiphenylphosphine Chemical compound C=1C=CC=CC=1P(Cl)C1=CC=CC=C1 XGRJZXREYAXTGV-UHFFFAOYSA-N 0.000 description 1
- 229940061627 chloromethyl methyl ether Drugs 0.000 description 1
- DQTRYXANLKJLPK-UHFFFAOYSA-N chlorophosphonous acid Chemical compound OP(O)Cl DQTRYXANLKJLPK-UHFFFAOYSA-N 0.000 description 1
- 235000012000 cholesterol Nutrition 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- NLCKLZIHJQEMCU-UHFFFAOYSA-N cyano prop-2-enoate Chemical class C=CC(=O)OC#N NLCKLZIHJQEMCU-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- JJJFUHOGVZWXNQ-UHFFFAOYSA-N enbucrilate Chemical compound CCCCOC(=O)C(=C)C#N JJJFUHOGVZWXNQ-UHFFFAOYSA-N 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- QRWOVIRDHQJFDB-UHFFFAOYSA-N isobutyl cyanoacrylate Chemical compound CC(C)COC(=O)C(=C)C#N QRWOVIRDHQJFDB-UHFFFAOYSA-N 0.000 description 1
- 238000011005 laboratory method Methods 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000005442 molecular electronic Methods 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- RPQUGMLCZLGZTG-UHFFFAOYSA-N octyl cyanoacrylate Chemical compound CCCCCCCCOC(=O)C(=C)C#N RPQUGMLCZLGZTG-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 238000005691 oxidative coupling reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 239000000546 pharmaceutical excipient Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229960001416 pilocarpine Drugs 0.000 description 1
- 125000003367 polycyclic group Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003333 secondary alcohols Chemical class 0.000 description 1
- 238000005389 semiconductor device fabrication Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-O triphenylphosphanium Chemical compound C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-O 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/30—Nitriles
- C08F22/32—Alpha-cyano-acrylic acid; Esters thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C253/00—Preparation of carboxylic acid nitriles
- C07C253/30—Preparation of carboxylic acid nitriles by reactions not involving the formation of cyano groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
- C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
- C07C255/19—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms containing cyano groups and carboxyl groups, other than cyano groups, bound to the same saturated acyclic carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
- C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
- C07C255/19—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms containing cyano groups and carboxyl groups, other than cyano groups, bound to the same saturated acyclic carbon skeleton
- C07C255/20—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms containing cyano groups and carboxyl groups, other than cyano groups, bound to the same saturated acyclic carbon skeleton the carbon skeleton being further substituted by singly-bound oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/60—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton with the carbon atom of at least one of the carboxyl groups bound to nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
- C07F9/40—Esters thereof
- C07F9/4003—Esters thereof the acid moiety containing a substituent or a structure which is considered as characteristic
- C07F9/4006—Esters of acyclic acids which can have further substituents on alkyl
Definitions
- This invention relates to the reversible coupling of a weak nucleophile to the carbon-carbon double bond of 2-cyanoacrylic acid or an ester thereof, so as to reversibly protect said bond.
- esters of 2-cyanoacrylic acid having the general formula:
- esters of 2-cyanoacrylic acid are widely used as monomers for the preparation of polymers and copolymers.
- cyanoacrylate esters are the main constituents of the rapid-bonding adhesives commonly known as "superglues". Bonding results from the conversion of a low-viscosity monomer into a solid polymer by anionic polymerisation.
- Esters of 2-cyanoacrylic acid are also used for the preparation of poly(alkyl 2-cyanoacrylate) nanoparticles and nanocapsules which may be employed as carrier or delivery systems for drugs or other active agents.
- esters of 2- cyanoacrylic acid can be used to prepare Langmuir-Blodgett type thin films which may be applied as coatings for components used in the electronics industry.
- the Knoevenagel method is limited to the preparation of alkyl 2-cyanoacrylates which have an alkyl moiety of no more than ten carbon atoms. Above this limit, the monomers cease to be distillable at temperatures which are below their respective thermal destruction temperatures. In fact, n-octyl 2- cyanoacrylate is the monomer with the greatest number of carbon atoms in the ester function that has been reported to have been prepared by the Knoevenagel method (Kublin, K.S. and Miguel, F.M., (1970), J. Amer. Vet. Ass., Vol. 156, No. 3, 313-318; Alco, J.J. and DeRenzis, F.A., (1971), J. Pharmacol. Ther. Dent., Vol. 1, No. 3, 129-132).
- a method for the synthesis of 2-cyanoacrylic acid esters involving prior protection of the carbon-carbon double bond of a simple cyanoacrylate derivative is described in U.S. Patent No. 3,903,055.
- the method can involve three or five steps.
- ethyl or isobutyl 2-cyanoacrylate is reacted with anthracene to form its stable Diels-Alder anthracene adduct.
- Basic hydrolysis of the ester function in the adduct gives the corresponding carboxylic acid salt from which the free acid is obtained upon acidification.
- the carboxylic acid is next converted into its acid chloride with thionyl chloride, and this is reacted with an alcohol to give a new ester.
- a displacement reaction involving the stronger dienophile maleic anhydride is then carried out to give the product cyanoacrylate ester together with the anthracene-maleic anhydride Diels-Alder adduct from which it must be separated.
- the cyanoacrylate ester formed can then be used as a monomer for the preparation of poly(alkyl 2-cyanoacrylates). It should be noted that this route to alkyl 2-cyanoacrylates is purely a laboratory method, and that it has not proved practicable on a larger scale.
- Patent Publication JP 91 065340 describes a route to the cyanohydrins of pyruvic acid and its esters which can be used as intermediates for the preparation of 2-cyanoacrylate esters.
- Patent Publication JP 91 075538 describes 1-acetoxy-l- cyanopropionic acid esters which can be converted into 2-cyanoacrylate esters by thermal elimination of a molecule of acetic acid.
- alkyl 2- cyanoacrylate monomers can be regulated by the preparation of monomers wherein the chemical structure of the ester moiety has been modified.
- solubility of cyanoacrylate esters in aqueous media is a function of the esterifying radical. A decrease in solubility is achieved by lengthening the alkyl chain.
- alkyl 2-cyanoacrylates Some control over the properties of alkyl 2-cyanoacrylates can thus be achieved by varying the nature of the esterifying group. However, these changes may lead to polymers which do not have desirable characteristics. Thus, for example, use of butyl 2- cyanoacrylate in an adhesive composition instead of methyl 2- cyanoacrylate may lead to a more manageable rate of polymerisation but will cause a significant decrease in the strength of the bond which is formed.
- Organosilanes have been added to 2-cyanoacrylic acid and esters thereof with formation of the corresponding saturated products
- Thiols and thioacetic acid can be added to ethyl 2-cyanoacrylate to yield ethyl 2-cyano-3-thioalkylpropionates and ethyl 2-cyano-3- acetylthiopropionatc, respectively (Kandror, I.I., Bragina, I.O.,
- Thiourea has been added to ethyl 2-cyanoacrylate in the presence of trifluoroacetic acid to give the corresponding saturated S-alkylthiouronium trifluoroacetate (Kolomnikova, Yu. D., Krilova, T.O., Chernoglasova, I.V., Petrovsky, P.V. and Gololobov, Yu. G., Izv. Russ. Akad. Nauk, Ser. Khim., (1993), No. 7, 1245).
- Dialkyl and diaryl phosphites have been added to 2-cyanoacrylic acid and its ethyl ester to give dialkyl and diaryl phosphonates
- Triethyl phosphite has been added to 2-cyanoacrylic acid to yield the derived 3-(diethylphosphono)propionic acid (Kandror, LI.,
- Catechyl chlorophosphite reacts similarly with ethyl 2-cyanoacrylate to give the derived catechylphosphonate derivative (Kolomnikova, Yu. D. et al. (1993) supra).
- Triphenylphosphine reacts with ethyl 2-cyanoacrylate under trifluoroacetic acid catalysis to give ethyl 2-cyano-3- (triphenylphosphonium)propionate trifluoroacetate (Kolomnikova, Yu. D. et al. (1993) supra).
- Phosphorus-sulfenyl chlorides have been added to 2- cyanoacrylates with formation of the corresponding thiophosphonates (Kolomnikova, G.D., Krilova, T.O. and Gololobov, Yu. G., J. Obsch. Khim., 1993, Vol. 63, No. 3, 716).
- Carbon nucleophiles derived from active methylene compounds such as methyl nitroacetate, diethyl malonate and ethyl cyanoacetate have been reacted with ethyl 2-cyanoacrylate to give the expected Michael adducts (Kandror, LI., Bragina, I.O., Galkina, M.A., Belokon, Yu. N., Lavrykhin, B.D. and Gololobov, Yu. N., Izv. Russ. Akad. Nauk, Ser. Khim., (1992) No. 10, 2449-2453).
- the invention provides in a first aspect a process for the reversible couphng of a weak nucleophile to the carbon-carbon double bond of 2-cyanoacrylic acid or an ester thereof, so as to reversibly protect said bond, which comprises reacting 2-cyanoacrylic acid or an ester thereof with said weak nucleophile in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst.
- the weak nucleophile can be an alcohol or a phenol.
- alcohol as used herein includes diols and polyols.
- the weak nucleophile can also be selected from:
- a dialkyl or diarylphosphite a dialkyl or diarylthiophosphite, a phosphine, phosphorus sulfenyl halide or other phosphorus nucleophile; and iii) a carbon acid
- This first aspect of the invention thus provides a method for the reversible protection of the chemically reactive carbon-carbon double bond of polymerisable alkyl or aryl 2-cyanoacrylates whereby a weak nucleophile added across the double bond can be eliminated under the conditions of base-initiated anionic polymerisation to yield poly(alkyl or aryl 2-cyanoacrylates) together with the relevant weak nucleophile.
- the acidic catalyst is suitably a non-volatile acid such as an aliphatic sulfonic acid or an aromatic sulfonic acid. Accordingly, the non- volatile acid is suitably methane sulfonic acid or p -toluenesulfonic acid.
- the acid catalyst can be a carboxylic acid.
- An essential feature of the acid catalyst is that it does not react with the alcohol or phenol or other weak nucleophile being used.
- the process is carried out under conditions which inhibit anionic polymerisation.
- the process is carried out in the presence of a weak acid.
- the weak acid is sulfur dioxide.
- gaseous sulfur dioxide is bubbled into the reaction mixture as a continuous stream.
- the anionic polymerisation inhibitor can be an aliphatic sulfonic acid, an aromatic sulfonic acid or carbon dioxide. Further, preferably, the process according to the invention is carried out in the presence of a free radical polymerisation inhibitor.
- the free radical polymerisation inhibitor is benzoquinone, hydroquinone, methylhydroquinone or naphthoquinone.
- the inert solvent is benzene, toluene, xylene, hexane or a chlorinated hydrocarbon.
- the process according to the invention is suitably carried out at a temperature in the range 20-200°C, more especially in the range 80- 100°C.
- reaction is carried out in the presence of sulfur dioxide to optimize conditions, because of the tendency of cyanoacrylate monomers to polymerise under the reaction conditions.
- the total volume of the reaction solvent is kept constant.
- Rl is: i) C ⁇ or higher saturated, optionally mono- or polysubstituted, linear or branched alkyl;
- R 2 is: i) a hydrogen atom
- a phenyl or optionally mono- or polysubstituted phenyl group or vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group.
- R 1 and R 2 are as hereinabove defined.
- Rl is: i) a methyl group
- R 2 is: i) a hydrogen atom
- Ci optionally mono- substituted, alkyl
- x) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or poly cyclic aromatic or heteroaromatic group.
- Functional groups which are representative of those which would normally be used to substitute an R or R 2 group as hereinabove defined include but are not limited to halogen, carboxyl, nitrile, acylamino and heteroelement-containing groups.
- the weak nucleophile can be a sulfhydryl group as found, for example, in a thiol, a thio acid or a dithio acid.
- the process according to the third aspect of the invention can be used for the preparation of a compound of the general formula (II) and its subsequent conversion into a 2-cyanoacrylate polymer
- R 3 is: i) Cj or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl or cycloalkyl;
- R 4 is: i) a hydrogen atom
- the sulfhydryl compound itself can act as the acidic catalyst.
- R 3 and R 4 are as hereinabove defined.
- 3-thioalkyl-, 3-thioaryl-, 3-thioacyl-, 3-dithioacyl-, 3-thiophosphoryl- and 3-dithiophosphoryl-2-cyanopropionic acids and esters thereof which may be employed as precursors to useful polymerisable 2- cyanoacrylic acid esters.
- R 3 is: i) C ⁇ optionally monosubstituted alkyl wherein the substituent is not a free carboxyl group whenever R 4 is an ethyl group;
- R 4 is: i) a hydrogen atom
- Ci or higher, hnear or branched optionally mono- or polysubstituted saturated alkyl
- the weak nucleophile can be a dialkyl or diaryl phosphite, a dialkyl or diaryl thiophosphite, a phosphine or other phosphorus nucleophile.
- This aspect of the invention provides another method for the reversible protection of the chemically reactive carbon-carbon double bond of polymerisable alkyl or aryl 2-cyanoacrylates as outlined supra.
- the process according to the fourth aspect invention can be used for the preparation of a compound of the general formula (III) and its subsequent conversion into a 2-cyanoacrylate polymer:
- R 5 is: i) Ci or higher linear or branched saturated alkyl
- R 6 is: i) a hydrogen atom
- X is: i) an oxygen atom; or ii) a sulfur atom;
- the phosphite or thiophosphite itself can act as the acidic catalyst.
- R 5 and R 6 are as hereinabove defined.
- R 5 is: i) a methyl group
- R 6 is: i) a hydrogen atom
- X is: i) an oxygen atom
- R 7 is: i) C4 or higher saturated alkyl or cycloalkyl
- R 8 is: i) a hydrogen atom
- Y is: a negatively charged ion
- Suitable negatively charged ions as values for Y include but are not limited to a chloride or other hahde ion, a trifluoroacetate ion or a perchlorate ion.
- the acidic catalyst has as its counterion the desired negatively charged ion Y of formula (IV).
- R 7 , R 8 and Y are as hereinabove defined.
- salts of 2- cyano-3-(trialkylphosphonium)- and 2-cyano-3-(triarylphosphonium) propionic acid and esters thereof which may be employed as precursors to useful polymerisable 2-cyanoacrylic acid esters.
- R 7 is: i) C4 or higher saturated alkyl or cycloalkyl
- R 8 is: i) a hydrogen atom
- Y is: a negatively charged ion.
- Suitable negatively charged ions as values for Y include but are not limited to a chloride or other hahde ion, a trifluoroacetate ion or a perchlorate ion.
- the weak nucleophile can be a carbon acid. This provides a further method for the reversible protection of the carbon-carbon double bond of polymerisable 2- cyanoacrylic acid esters.
- R 9 is: i) a hydrogen atom
- an electron- withdrawing organic functional group including but not limited to groups such as nitro, carboalkoxy, cyano, acyl, sulfonyl and phosphonyl groups;
- RlO is: an electron- withdrawing organic functional group including but not limited to groups such as nitro, carboalkoxy cyano, acyl, sulfonyl and phosphonyl groups,
- RH is: i) a hydrogen atom
- R 9 , Rl° and RH are as hereinabove defined.
- R 9 is: i) a hydrogen atom except when R O is a nitro group and RH is an ethyl group;
- any other compatible electron- withdrawing organic functional group including but not limited to nitro, cyano, sulfonyl and phosphonyl groups,
- RlO is: any compatible electron-withdrawing organic functional group including but not limited to groups such as nitro, carboalkoxy, cyano, acyl, aroyl, sulfonyl and phosphonyl groups,
- RH is: i) a hydrogen atom
- the reversible protection afforded by the invention can be used to protect the carbon-carbon double bond of a wide range of 2- cyanoacrylate monomers including substituted or unsubstituted long- chain alkyl cyanoacrylates and multi-functional cyanoacrylates including bis -cyanoacrylates.
- compositions comprising a compound of any of the formulae (I), (II), (III), (IV) or (V) as hereinbefore defined.
- Such compositions can include excipients such as a thinner.
- the compounds of the formulae (I), (II), (HI), (IV) and (V) hereinbefore defined can be used in adhesive compositions.
- the invention also provides poly(cyanoacrylate) materials formed from a compound of any one of the formulae (I), (II), (III), (IV) and (V) hereinbefore defined.
- a further use of the compounds of any one of the formulae (I), (II), (III), (IV) and (V) hereinbefore defined is in the formation of poly (cyanoacrylate) films.
- Such films include single or multi-layer Langmuir-Blodgett films.
- the compounds of the formulae (I), (II), (III), (IV) and (V) hereinbefore defined can also be used in the preparation of poly (cyanoacrylate) nanocapsules.
- the compounds of the formula (I) are especially suitable for the preparation of such poly(cyanoacrylate) nanocapsules.
- Poly(cyanoacrylate) nanocapsules prepared in accordance with the invention suitably contain an active agent such as a drug.
- esterifying group R 2 , R 4 , R 6 , R 8 or RH, as appropriate is a terminal alkyne could be precursors to useful 2- cyanoacrylate monomers and polymers which could be further modified by cross-linking via the well-known Glaser oxidative coupling reaction.
- the compounds according to the invention are expected to be capable of broad apphcation, particularly where thin-film technology is involved and especially where Langmuir-Blodgett type films are desirable.
- Poly(alkyl 2-cyanoacrylate) films are used as semiconductor . coating materials wherein they are applied to act as microlithographic photoresists due to their sensitivity to electron beams and to X-rays as described, for example, in U.S. Patent No. 4,279,984, and in Matveeva, N.K., (1990), Biol. Membr., Vol. 7, No. 11, 1200-1204.
- Such films are usually deposited by application of a solution of an alkyl 2- cyanoacrylate polymer, or its monomer followed by its subsequent polymerisation.
- the compounds according to the invention offer an alternative method of depositing such films since they are stable as solutions in inert solvents and can be converted into poly(alkyl 2-cyanoacrylates) under anionic conditions. Furthermore, when films laid down in this way are Langmuir-Blodgett or other very thin films then the necessary period of exposure to electron beams or to X-rays should be beneficially reduced. Also such thin films can be expected to greatly modify the capacitance effect and the relative permittivity effect thereby improving dynamic memory capability of the microchip. Accordingly, it is expected that these thin films will find apphcation in the manufacture of low power microchips.
- thinner films Another benefit resulting from the application of thinner films is increased transconductance with accompanying improved efficiency in terms of speed and memory capacity of thus formed devices.
- Reduced voltages employing such devices result in reduced power dissipation.
- tighter control over threshold voltage means that such devices may find use in lower power applications with sub-threshold operation in VLSI (very large-scale integration) required, for example, in hearing aids and implants.
- Thinner film thickness also means improved resolution and reduced feature sizes on microchips, such as, for example, the important interconnection feature between two adjacent "gates" resulting in improved overall performance.
- the alkyl ester part of the alkoxycyanopropionic ester molecule contains a metal such as iron (for example, in a ferrocenyl function) and the alkyl of the alkoxy part of the molecule is a long- chain alkyl group
- the resulting ordered Langmuir-Blodgett poly(alkyl cyanoacrylate) film laid down on a substrate such as a silicon chip may then be etched with a laser.
- Such treated areas of film would give rise to low-coke iron or iron oxide indented regions depending on whether the ablation is carried out under an inert atmosphere such as nitrogen or in the oxidising atmosphere of the air, respectively.
- More easily programmable EPROMS may also result from application of this technology.
- Thin, tightly controlled, low impurity films offer many advances in semiconductor device fabrication.
- Depolymerisation by means of laser (or other high-energy beam) etching has potential apphcations for accurately controlled volumetric geometries. Areas of surface can be selectively insulated.
- the engineering of regions, interconnects, channels and layers could be accomplished largely through a chemical route using available production equipment.
- laser etching can produce the features hereinabove mentioned.
- device trimming, essential in analogue integrated circuits is also more readily achievable to improved accuracies.
- the apphcation of the present invention to semiconductor technology may provide digital devices with very low gate delays operating at lower voltages (1.5V), thereby offering greater circuit speeds while maintaining low chip power levels.
- the reduced feature size, junction depth, and effective channel length could offer SRAM densities up to 4G. While operating voltage can be reduced, as mentioned, the technology could offer tighter control over threshold voltages by ensuring very low impurity levels.
- Linear devices could benefit from the improved control in manufacturing and region/feature definition, low power and higher levels of integration.
- MOS and bipolar technologies are equally amenable to the processes.
- Solvent removable (linear poly(cyanoacrylate) films may be laid down on silicon wafers from the monofunctional 2-cyanopropionate derivatives described herein and then masked. Subsequent treatment with laser followed by treatment with hydrofluoric acid (HF) and subsequent removal of remaining polymer using common organic solvents such as benzene, chloroform or acetone would be expected to give clean, well defined holes on the silicon surface. Cross-hnked and insoluble poly(cyanoacrylate) films may also be laid down on a silicon surface from multifunctional 2-cyanopropionate derivatives described herein and again be masked and treated in the manner hereinabove described with laser followed by HF.
- HF hydrofluoric acid
- a further poly(cyanoacrylate) layer could then be deposited on the stable solvent- resistant cross-linked poly(cyanoacrylate) film from an appropriate 2- cyanopropionate derivative.
- the ester portion of this derivative contains a metal such as iron, for example, in a ferrocenyl radical, ablation of exposed regions of resulting poly(cyanoacrylate) film in an inert atmosphere would give a layer of metal - in this case iron - on the surface.
- a layer would, of course, be conducting in nature.
- a further layer of silicon dioxide could be laid down, where required, by initial deposition of a poly(cyanoacrylate) film from a silicon-containing (ester portion of molecule) 2-cyanopropionate derivative followed by treatment with laser or high energy plasma in an oxygen-rich atmosphere. Such a layer could also be directly laid down on the sihcon surface.
- silicon chips containing insulating, conducting and semiconductor multilayers may be fabricated.
- phosphorus-containing poly(cyanoacrylate) films could be laid down from equivalent cyanopropionate derivatives directly onto silicon. Ablation of unmasked regions of film with laser in an inert atmosphere should give phosphorus-doped silicon semi-conductor region used in pnp transmission.
- Sulfur-containing cyanopropionate derivatives would in the same way as above give sulfur doped semiconductor regions on the silicon surface following treatment of polymer with laser. Such sulfur-doped areas would be expected to improve adhesion of subsequently formed metal films from ablation of metal-containing poly(cyanoacrylate) prepared from a metal-containing (in the ester portion of the molecule) 2-cyanopropionate derivative. Diacetylene functional 2-cyanopropipnate derivatives (ester portion of molecule) would give poly(cyanoacrylate) films which could be further modified.
- regions could be exposed to high energy ultra-violet light to give, by a free-radical polymerisation process, semi-conducting poly(acetylene) regions - masked or remaining polymer layer would be an insulating region.
- Doping of the semi-conducting poly(acetylene) region by, for example, iodine would give conductive zones.
- three types of region insulating, semiconducting, conducting
- Such techniques would be useful for the fabrication of molecular electronic devices for super-thin pnp transmission with dramatic component size reduction (down to 10-50
- Non-linear optical 2-cyanopropionates would possess asymmetric radicals in the alkyl portion of the molecule.
- liquid crystal 2-cyanopropionates would possess cholesterol or methoxy/cyanobiphenyl functionality in the alkyl portion of the molecule.
- Patent Publication EP 146,505 describes the use of thin (10 ⁇ m) poly(alkyl 2-cyanoacrylate) films in a process for image formation.
- the ability to lay down Langmuir-Blodgett, multi-layer or other very thin films utihsing compounds of the invention which are precursors to alkyl 2-cyanoacrylate esters and thus to poly(alkyl 2-cyanoacrylates) should permit further useful developments in this area.
- Conversion of the monomers produced in accordance with the invention into polymer may be carried out by prior application of a base such as an amine or tetraalkylammonium hydroxide to the surface to be coated or application of base from above as vapour, for example once a film of the compound has been laid down on the untreated surface.
- a base such as an amine or tetraalkylammonium hydroxide
- the compounds prepared in accordance with the invention could be vapour deposited following the method of Woods J., et al. supra.
- Priming of surfaces to be bonded by a suitable base means that the compounds in accordance with the invention may be used as adhesives as indicated above.
- the cyanoacrylate monomer produced in situ between the two surfaces would be expected to polymerise rapidly in the presence of base forming a solid polymer and hence an adhesive bond.
- alcohols have been used as physical additives with cyanoacrylate adhesives to impart porous bonding abihty to same as described in Patent Pubhcations JP 55012166 and JP 88039627.
- poly(alkyl cyanoacrylates) is not limited to the encapsulation of drugs.
- poly (alkyl cyanoacrylates) can be used to encapsulate other active agents. They have been used for example in an electrostatic suspension developer (Patent Publication DE-A 35 14 867). Cyanoacrylate monomer itself has been microencapsulated together with colour-former in a heat-developable, photo- and pressure- sensitive composition in Patent Publication JP 92278953.
- alkoxycyanopropionic acid esters should be able to be microencapsulated by poly(alkyl cyanoacrylate) to give an adhesive composition when used in conjunction with appropriate basic primer.
- Fig. 1 is a Langmuir isotherm for the Langmuir-Blodgett film formed in Example 7;
- Fig. 2 is a Langmuir isotherm for the Langmuir-Blodgett film formed in Example 8;
- Fig. 3 is a Langmuir isotherm for the Langmuir-Blodgett film formed in Example 9;
- Fig. 4 is a graph of area at constant pressure versus time before and after transferring a Langmuir-Blodgett film formed as described in Example 9 to a silicon [100] surface.
- 2-Cyanoacrylic acid (0.98 g), /.-toluenesulfonic acid (0.17 g) and hydroquinone (0.05 g) were dissolved in dry benzene (250 ml) contained in a 500 ml flask which had previously been washed with 10% sulfuric acid and dried using acetone, and which was fitted with a stirrer, a thermometer, sulfur dioxide and argon inlet adaptors, a dosing funnel and a Liebig condenser arranged for distillation.
- the solution was sparged with sulfur dioxide and 50 ml of water-benzene azeotrope was distilled off in order to ensure anhydrous conditions.
- the condenser was then arranged for reflux and a solution of n- hexadecyl alcohol (2.42 g) in dry benzene (50 ml) was added dropwise to the boiling contents of the flask with stirring and continuous sparging with dry sulfur dioxide. Following addition of the alcohol, the solution was heated under reflux during two hours. After this time, sparging with sulfur dioxide was substituted by sparging with argon and the volume of the mixture was reduced to 50 ml by distillation of solvent. The residue was extracted using boiling heptane (100 ml), and heptane and remaining benzene were removed in vacuum to give an oil which crystallised.
- Ethyl 2-cyanoacrylate (1.25 g), 2-cyanoacrylic acid (0.05 g) and hydroquinone (0.05 g) were dissolved in a mixture of dry benzene (200 ml) and dry toluene (50 ml) contained in a 500 ml flask which had previously been washed with 10% sulfuric acid and then dried using acetone, and which was fitted with a stirrer, a thermometer, sulfur dioxide and argon inlet adaptors, a dosing funnel and a Liebig condenser arranged for distillation. The solution was sparged with sulfur dioxide while water-benzene azeotrope (50 ml) was distilled off in order to ensure anhydrous conditions.
- the condenser was then arranged for reflux and a solution of n-hexadecyl alcohol (2.7 g) in dry benzene (50 ml) was added to the boiling contents of the flask with stirring and continuous sparging with dry sulfur dioxide. Following addition of the alcohol the mixture was continuously sparged with sulfur dioxide and heated in such a manner that slow distillation of solvent continued during two and one-half hours. After this time, sparging with sulfur dioxide was substituted by sparging with argon and the volume of the reaction mixture was reduced to 50 ml by distillation. The remaining solution was cooled, a solid residue which formed was removed by filtration, and remaining solvent was removed by distillation in vacuum to give a solid product (3.4 g).
- 2-Cyanoacrylic acid (0.96 g, 0.01 mol), -toluenesulfonic acid (0.17 g) and hydroquinone (0.05 g) were dissolved in dry benzene (250 ml) contained in a 500 flask which had previously been washed with 10% sulfuric acid and then dried using acetone, and which was fitted with a stirrer, a thermometer, sulfur dioxide and argon inlet adaptors, a dosing funnel and a Liebig condenser arranged for distillation.
- the solution was sparged using dry argon while water-benzene azeotrope (50 ml) was distilled off in order to ensure anhydrous conditions.
- the condenser was then arranged for reflux and a solution of n-hexadecyl alcohol (2.42 g 0.01 mol) in dry benzene (100 ml) was added to the boiling contents of the flask with stirring and continuous sparging with dry sulfur dioxide. Following addition of the alcohol, the mixture was refluxed during two hours. After this time, the sulfur dioxide sparging was substituted by argon sparging and the condenser was arranged for distillation. A solution of n-hexadecyl alcohol (2.6 g, 0.0108 mol) in dry benzene (100 ml) was added dropwise with constant removal of solvent by distillation.
- Ethyl 2-cyano-3-hexadecyloxypropionate (0.36 g) was dissolved in ethanol (5 ml) and water (1 ml) and the mixture was stirred during 24 hours to give an amorphous colourless sohd. This sohd was separated by centrifugation and dried in vacuum to give 0.35 g of an equimolar mixture of hexadecyl alcohol and poly(ethyl 2- cyanoacrylate, calculated C 71.93, H 11.17, H 3.81, found C 70.03, H 10.94, N 3.35%. The mixture was washed with alcohol and with acetone, and the sohd residue was dissolved in chloroform.
- the residual oil contained triphenyl((2-cyano-2- ethoxycarbonyl)ethyl)phosphonium trifluoroacetate, 3 l p NMR 21.82 p.p.m., *H NMR (CDCI3) 1.06 (3H, t, -OCH 2 CH 3 ), 3.72 (IH, m, - CH(CN)C02Et), 4.00 (2H, m, -OCH 2 CH 3 ), and 4.18 and 4.45 (each IH, m, PI13P-CH2-) p.p.m.
- the title compound was dissolved in pure, dry chloroform to give a solution containing 1 g/L.
- a measured volume (8 x 10" 5 L) of this solution was applied to the surface of pure water of pH 7.13 contained in a Langmuir trough fitted with a movable barrier connected to a torsion balance and a data handling system. After allowing time for the chloroform to evaporate, the surface of the trough was swept by the barrier at a speed of 1.2 cm 2 /s _ 1 and the isotherm of surface tension in mN/m versus surface area of the film in cm 2 was recorded. A classical Langmuir isotherm showing gas, liquid and sohd phases was obtained and is reproduced in Fig. 1.
- Example 7 supra.
- the Langmuir isotherm obtained is reproduced in Fig. 3.
- Example 10
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Abstract
A process is provided for the reversible coupling of weak nucleophiles to the carbon-carbon double bond of 2-cyanoacrylic acid or an ester thereof so as to reversibly protect the bond. Examples of weak nucleophiles include alcohols (including diols and polyols), phenols, sulfur nucleophiles such as thiols and thio acids, phosphorus nucleophiles such as dialkyl or diarylphosphites and phosphines, and carbon nucleophiles such as active methylene compounds. The process involves reacting 2-cyanoacrylic acid or an ester thereof with the weak nucleophile in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst. The compounds produced can be used as intermediates for the preparation of poly(cyanoacrylates), following elimination of the nucleophile added to give a 2-cyanoacrylate monomer which then polymerizes. The poly(cyanoacrylates) thereby produced have many applications, for example, in the preparation of films such as single- or multi-layer Langmuir-Blodgett films.
Description
Description
Intermediates for the preparation of poly(cyanoacrylates) and applications of the poly(cyanoacrylates) so prepared
Technical Field
This invention relates to the reversible coupling of a weak nucleophile to the carbon-carbon double bond of 2-cyanoacrylic acid or an ester thereof, so as to reversibly protect said bond.
Background Art
Esters of 2-cyanoacrylic acid having the general formula:
are widely used as monomers for the preparation of polymers and copolymers. The ability of 2-cyanoacrylic acid esters to polymerise rapidly under the influence of moisture or nucleophilic substances has led to their exploitation as instantaneous adhesives. Thus, cyanoacrylate esters are the main constituents of the rapid-bonding adhesives commonly known as "superglues". Bonding results from the conversion of a low-viscosity monomer into a solid polymer by anionic polymerisation. Esters of 2-cyanoacrylic acid are also used for the preparation of poly(alkyl 2-cyanoacrylate) nanoparticles and nanocapsules which may be employed as carrier or delivery systems for drugs or other active agents. Furthermore, esters of 2- cyanoacrylic acid can be used to prepare Langmuir-Blodgett type thin films which may be applied as coatings for components used in the electronics industry.
The inherent ability of 2-cyanoacrylic acid esters to undergo rapid anionic polymerisation causes complications as regards their
synthesis, chemical modification, and storage. It is necessary to be able to control the rate of polymerisation of cyanoacrylate monomers in order to permit their successful manipulation prior to carrying out the bonding process. Additionally, there is a need to be able to control the surface-active properties of cyanoacrylate monomers which are to be utilised in Langmuir-Blodgett film applications.
The principal method known for the regulation of the chemical and physical properties of 2-cyanoacrylate monomers and polymers is by variation of the structure of the ester moiety. However, opportunities for the chemical modification of simple cyanoacrylate esters in order to prepare new monomers are limited due to the high chemical reactivity of the carbon-carbon double bond.
Methods for the synthesis of 2-cyanoacrylic acid ester monomers are few in number. An important commercial route to these compounds is the Knoevenagel Condensation Method (H. Lee (Ed.) (1981), "Cyanoacrylic Resins - The Instant Adhesives", Pasadena Technology Press, Pasadena, U.S.A.). According to the Knoevenagel method a cyanoacetic acid ester and formaldehyde are reacted together in the presence of an amine to give alkyl cyanoacrylate oligomers. The free cyanoacrylate ester monomer is then generated by thermally cracking the oligomer and vacuum distilling the monomer on to an acidic stabihser. The Knoevenagel method is limited to the preparation of alkyl 2-cyanoacrylates which have an alkyl moiety of no more than ten carbon atoms. Above this limit, the monomers cease to be distillable at temperatures which are below their respective thermal destruction temperatures. In fact, n-octyl 2- cyanoacrylate is the monomer with the greatest number of carbon atoms in the ester function that has been reported to have been prepared by the Knoevenagel method (Kublin, K.S. and Miguel, F.M., (1970), J. Amer. Vet. Ass., Vol. 156, No. 3, 313-318; Alco, J.J. and DeRenzis, F.A., (1971), J. Pharmacol. Ther. Dent., Vol. 1, No. 3, 129-132).
Short chain (less than ten carbon atoms) alkyl 2-cyanoacrylates with polar groups such as hydroxyl, carboxyl and ester groups, and
aryl cyanoacrylates cannot generally be prepared by the Knoevenagel Condensation Method because of their high boiling points.
Another method for the preparation of alkyl 2-cyanoacrylic acid esters is based on the transesterification reaction (Voitekunas, J., Polyakova, A.M., Mager, K.A., Kokhanov, Yu. V. and Voitkov, A.I., U.S.S.R. Patent No. 726,086). This single-stage method involves the transesterification of methyl or ethyl 2-cyanoacrylate with a higher alcohol under acid-catalysed conditions. Because of the relatively low efficiency of the process it is necessary to separate residual methyl or ethyl 2- cyanoacrylate from the product ester by vacuum distillation.
A method for the synthesis of 2-cyanoacrylic acid esters involving prior protection of the carbon-carbon double bond of a simple cyanoacrylate derivative is described in U.S. Patent No. 3,903,055. The method can involve three or five steps. In the five- step process, ethyl or isobutyl 2-cyanoacrylate is reacted with anthracene to form its stable Diels-Alder anthracene adduct. Basic hydrolysis of the ester function in the adduct gives the corresponding carboxylic acid salt from which the free acid is obtained upon acidification. The carboxylic acid is next converted into its acid chloride with thionyl chloride, and this is reacted with an alcohol to give a new ester. A displacement reaction involving the stronger dienophile maleic anhydride is then carried out to give the product cyanoacrylate ester together with the anthracene-maleic anhydride Diels-Alder adduct from which it must be separated. The cyanoacrylate ester formed can then be used as a monomer for the preparation of poly(alkyl 2-cyanoacrylates). It should be noted that this route to alkyl 2-cyanoacrylates is purely a laboratory method, and that it has not proved practicable on a larger scale.
Patent Publication JP 91 065340 describes a route to the cyanohydrins of pyruvic acid and its esters which can be used as intermediates for the preparation of 2-cyanoacrylate esters.
Patent Publication JP 91 075538 describes 1-acetoxy-l- cyanopropionic acid esters which can be converted into 2-cyanoacrylate esters by thermal elimination of a molecule of acetic acid.
As mentioned supra, some of the physical properties of alkyl 2- cyanoacrylate monomers can be regulated by the preparation of monomers wherein the chemical structure of the ester moiety has been modified.
Modification of the ester moiety has been used as a means of controlling the surface-active properties, hydrophobicities, and solubilities of cyanoacrylate esters (Leonard, F., Collins, J.A. and Porter, H.J., (1966), J. Appl. Polym. Sci., Vol. 10, No. 11, 1617- 1623).
Long-chain 2-cyanoacrylate esters have been used for the formation of Langmuir-Blodgett films (Matveeva, N.K., Pasekov, V.F. and Savel'eva, L.V., (1991), Mikroelectronika (Akad. Nauk S.S.S.R.), Vol. 20, No. 5, 501-503).
The solubility of cyanoacrylate esters in aqueous media is a function of the esterifying radical. A decrease in solubility is achieved by lengthening the alkyl chain.
Some control over the properties of alkyl 2-cyanoacrylates can thus be achieved by varying the nature of the esterifying group. However, these changes may lead to polymers which do not have desirable characteristics. Thus, for example, use of butyl 2- cyanoacrylate in an adhesive composition instead of methyl 2- cyanoacrylate may lead to a more manageable rate of polymerisation but will cause a significant decrease in the strength of the bond which is formed.
It will be appreciated, therefore, that control of the properties of a 2-cyanoacrylate monomer by variation of the nature of the
esterifying group without at the same time influencing the properties of the derived polymer is not possible at present.
Accordingly, for the above reasons, a method for the modification of the physical and chemical properties of conventional and other alkyl 2-cyanoacrylate monomers which does not affect the properties of the polymers obtained therefrom is highly desirable.
The synthesis of ethyl 3-methoxy-2-cyanopropionate via reaction of the sodium salt of ethyl cyanoacetate with chloromethyl methyl ether has been described (Foldi, Z., v. Fodor, G., Demjen, L, Szekeres, H. and Halmos, I, Berichte, 1942, Vol. 75, No. 7, 755-763). The same ethyl 3-methoxy-2-cyanopropionate was prepared by an almost identical method in U.S. Patent No. 2,467,926 but was not isolated or characterised. No other 3-alkoxy-2-cyanopropionic acid derivatives have been reported, and this is not surprising since the chloromethyl alkyl ethers required for their synthesis as described supra are usually hazardous and unpleasant materials.
Some products resulting from the addition of nucleophiles to the carbon-carbon double bond of 2-cyanoacrylates have been described.
Organosilanes have been added to 2-cyanoacrylic acid and esters thereof with formation of the corresponding saturated products
(Kolomnikova, G.D., Prihodchenko, Yu. D. and Gololobov, Yu. G., Izv. R. Akad. Nauk, Ser. Khim., 1992, No. 7, 1655-1657).
Thiols and thioacetic acid can be added to ethyl 2-cyanoacrylate to yield ethyl 2-cyano-3-thioalkylpropionates and ethyl 2-cyano-3- acetylthiopropionatc, respectively (Kandror, I.I., Bragina, I.O.,
Galkina, M.A. and Gololobov, Yu. G., Izv. Akad. Naul S.S.S.R., Ser. Khim., 1990, No. 12, 2798-2801 : ibid., 15th International Symposium on the organic Chemistry of Sulfur, Caen, France, 1992).
Thiourea has been added to ethyl 2-cyanoacrylate in the presence of trifluoroacetic acid to give the corresponding saturated
S-alkylthiouronium trifluoroacetate (Kolomnikova, Yu. D., Krilova, T.O., Chernoglasova, I.V., Petrovsky, P.V. and Gololobov, Yu. G., Izv. Russ. Akad. Nauk, Ser. Khim., (1993), No. 7, 1245).
Dialkyl and diaryl phosphites have been added to 2-cyanoacrylic acid and its ethyl ester to give dialkyl and diaryl phosphonates
(Kolomnikova, G.D., Prihodchenko, Yu. D., Petrovsky, P.V. and Gololobov, Yu. G., Izv. R. Akad. Nauk, Ser. Khim., 1992, No. 8, 1913).
Triethyl phosphite has been added to 2-cyanoacrylic acid to yield the derived 3-(diethylphosphono)propionic acid (Kandror, LI.,
Lavrykhin, B.D., Bragina, I.O., Galkina, M.A. and Gololobov, Yu. G., J. Obsch. Khim., (1990), Vol. 6, No. 9, 2160-2168), and to ethyl 2- cyanoacrylate to give ethyl 2-cyano-3-(diethylphosphono)propionate (Kandror, I.I., et al. (1990) supra).
Diethyl chlorophosphite and chlorodiphenylphosphine react with ethyl 2-cyanoacrylate in the presence of trifluoroacetic acid to give, respectively, ethyl 2-cyano-3-(diethylphosphono)propionate and ethyl 2-cyano-3-(diphenylphosphinoxy)propionate (Kolomnikova, Yu. D. et al. (1993) supra). Catechyl chlorophosphite reacts similarly with ethyl 2-cyanoacrylate to give the derived catechylphosphonate derivative (Kolomnikova, Yu. D. et al. (1993) supra).
Triphenylphosphine reacts with ethyl 2-cyanoacrylate under trifluoroacetic acid catalysis to give ethyl 2-cyano-3- (triphenylphosphonium)propionate trifluoroacetate (Kolomnikova, Yu. D. et al. (1993) supra).
Phosphorus-sulfenyl chlorides have been added to 2- cyanoacrylates with formation of the corresponding thiophosphonates (Kolomnikova, G.D., Krilova, T.O. and Gololobov, Yu. G., J. Obsch. Khim., 1993, Vol. 63, No. 3, 716).
Carbon nucleophiles derived from active methylene compounds such as methyl nitroacetate, diethyl malonate and ethyl cyanoacetate have been reacted with ethyl 2-cyanoacrylate to give the expected Michael adducts (Kandror, LI., Bragina, I.O., Galkina, M.A., Belokon, Yu. N., Lavrykhin, B.D. and Gololobov, Yu. N., Izv. Russ. Akad. Nauk, Ser. Khim., (1992) No. 10, 2449-2453).
None of the compounds mentioned supra have been used for the reversible protection of the carbon-carbon double bond of 2- cyanoacrylates, and conditions for effecting the reverse Michael reactions needed for their conversion into monomeric 2-cyanoacrylates or into poly(2-cyanoacrylates) have not been described.
Disclosure of Invention
The invention provides in a first aspect a process for the reversible couphng of a weak nucleophile to the carbon-carbon double bond of 2-cyanoacrylic acid or an ester thereof, so as to reversibly protect said bond, which comprises reacting 2-cyanoacrylic acid or an ester thereof with said weak nucleophile in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst.
The weak nucleophile can be an alcohol or a phenol.
The term alcohol as used herein includes diols and polyols.
The weak nucleophile can also be selected from:
i) a thiol, thiophenol, a thioamide, a thio or dithio acid or other thionucleophile;
ii) a dialkyl or diarylphosphite, a dialkyl or diarylthiophosphite, a phosphine, phosphorus sulfenyl halide or other phosphorus nucleophile; and
iii) a carbon acid
as hereinafter described.
This first aspect of the invention thus provides a method for the reversible protection of the chemically reactive carbon-carbon double bond of polymerisable alkyl or aryl 2-cyanoacrylates whereby a weak nucleophile added across the double bond can be eliminated under the conditions of base-initiated anionic polymerisation to yield poly(alkyl or aryl 2-cyanoacrylates) together with the relevant weak nucleophile.
The acidic catalyst is suitably a non-volatile acid such as an aliphatic sulfonic acid or an aromatic sulfonic acid. Accordingly, the non- volatile acid is suitably methane sulfonic acid or p -toluenesulfonic acid.
Alternatively, the acid catalyst can be a carboxylic acid.
An essential feature of the acid catalyst is that it does not react with the alcohol or phenol or other weak nucleophile being used.
Preferably, the process is carried out under conditions which inhibit anionic polymerisation.
Further, preferably, the process is carried out in the presence of a weak acid.
Suitably the weak acid is sulfur dioxide.
Preferably, when the weak acid is sulfur dioxide, gaseous sulfur dioxide is bubbled into the reaction mixture as a continuous stream.
The anionic polymerisation inhibitor can be an aliphatic sulfonic acid, an aromatic sulfonic acid or carbon dioxide.
Further, preferably, the process according to the invention is carried out in the presence of a free radical polymerisation inhibitor.
Suitably the free radical polymerisation inhibitor is benzoquinone, hydroquinone, methylhydroquinone or naphthoquinone.
Preferably the inert solvent is benzene, toluene, xylene, hexane or a chlorinated hydrocarbon.
The process according to the invention is suitably carried out at a temperature in the range 20-200°C, more especially in the range 80- 100°C.
When secondary alcohols or phenols are being reacted in accordance with the invention, irrespective of whether 2-cyanoacrylic acid or an ester thereof is used, preferably the reaction is carried out in the presence of sulfur dioxide to optimize conditions, because of the tendency of cyanoacrylate monomers to polymerise under the reaction conditions.
When 2-cyanoacrylic acid is used as a starting compound in accordance with the invention to prepare a 3-alkoxy-2-cyanopropionic acid ester, the water produced is continually removed by azeotropic distillation.
Preferably, the total volume of the reaction solvent is kept constant.
Further, preferably, when an alcohol or phenol is used as the weak nucleophile, said alcohol or phenol is added gradually to the reaction mixture.
According to a second aspect of the invention there is provided a process for the preparation of a compound of the general formula (I):
wherein Rl is: i) C\ or higher saturated, optionally mono- or polysubstituted, linear or branched alkyl;
ii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly(cycloalkyl);
iii) C3 or higher, optionally mono- or polysubstituted, linear or branched alkenyl;
iv) C3 or higher, optionally mono- or polysubstituted, linear or branched alkynyl; or
v) a phenyl or optionally mono- or polysubstituted phenyl group,
and R2 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, linear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, linear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, linear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group.
which comprises reacting 2-cyanoacrylic acid or an ester thereof with an alcohol or phenol in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst.
The following scheme depicts the reactions involved in the process according to the second aspect of the invention hereinabove described:
wherein R1 and R2 are as hereinabove defined.
In accordance with the second aspect of the invention, there is produced 3-alkoxy- and 3-aryloxy-2-cyanopropionic acids and esters thereof which may be employed as precursors to useful polymerisable 2-cyanoacrylic acid esters, said precursors having desirable chemical and physical properties.
Thus, the invention provides a compound of the general formula (Ia):
wherein Rl is: i) a methyl group;
ii) C2 or higher saturated, optionally mono- or polysubstituted, linear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, linear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, linear or branched alkynyl; or
vi) a phenyl or optionally mono- or polysubstituted phenyl group,
and R2 is: i) a hydrogen atom;
ii) Ci, optionally mono- substituted, alkyl;
iii) C2 saturated alkyl except when Rl is methyl;
iv) C2 saturated, mono- or polysubstituted alkyl;
v) C3 or higher saturated, optionally mono- or polysubstituted, linear or branched alkyl;
vi) C5 or higher saturated, optionally mono- or .. polysubstituted cycloalkyl or poly (cycloalkyl);
vii) C3 or higher, optionally mono- or polysubstituted, linear or branched alkenyl;
viii) C3 or higher, optionally mono- or polysubstituted, linear or branched alkynyl;
ix) a phenyl or optionally mono- or polysubstituted phenyl group; or
x) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or poly cyclic aromatic or heteroaromatic group.
Functional groups which are representative of those which would normally be used to substitute an R or R2 group as hereinabove defined include but are not limited to halogen, carboxyl, nitrile, acylamino and heteroelement-containing groups.
In accordance with a third aspect of the invention the weak nucleophile can be a sulfhydryl group as found, for example, in a thiol, a thio acid or a dithio acid. This provides a further method for the reversible protection of the chemically reactive carbon-carbon double bond of polymerisable alkyl or aryl 2-cyanoacrylates whereby a thio compound added across the double bond can be eliminated under the conditions of base-catalysed anionic polymerisation to yield poly(alkyl or aryl 2-cyanoacrylates) together with the relevant thio compound.
The process according to the third aspect of the invention can be used for the preparation of a compound of the general formula (II) and its subsequent conversion into a 2-cyanoacrylate polymer
wherein R3 is: i) Cj or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl or cycloalkyl;
ii) C3 or higher, optionally mono- or polysubstituted Hnear or branched alkenyl or alkynyl;
iii) a phenyl or optionally mono- or polysubstituted phenyl group;
iv) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group;
v) an acyl or thioacyl group;
vi) a dialkyl- or diarylphosphonyl group; or
vii) a dialkyl- or diarylthiophosphonyl group,
and R4 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted linear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group,
which comprises reacting 2-cyanoacrylic acid or an ester thereof with a sulfhydryl compound in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst under the conditions hereinabove defined followed by elimination of the sulfhydryl addend to give a 2-cyanoacrylate monomer which then polymerises.
Alternatively, the sulfhydryl compound itself can act as the acidic catalyst.
The following scheme depicts the reactions involved in the process according to the third aspect of the invention:
wherein R3 and R4 are as hereinabove defined.
In this third aspect of the invention there is provided 3-thioalkyl-, 3-thioaryl-, 3-thioacyl-, 3-dithioacyl-, 3-thiophosphoryl- and 3-dithiophosphoryl-2-cyanopropionic acids and esters thereof which may be employed as precursors to useful polymerisable 2- cyanoacrylic acid esters.
Thus the invention provides a compound of the general formula (Ha):
wherein R3 is: i) C\ optionally monosubstituted alkyl wherein the substituent is not a free carboxyl group whenever R4 is an ethyl group;
ii) C2 optionally mono- or polysubstituted saturated alkyl wherein the or each substituent is not a primary amino group or a hydroxyl group whenever R4 is an ethyl group, or wherein the substituents do not include a primary amino group and a free carboxy group attached to the same carbon atom whenever R4 is an ethyl group, or wherein the β-substituent is not another sulfur atom bearing a 2'-carboxy-2'-cyanoethyl function as the free carboxylic acid or as its ethyl or allyl ester whenever the substituent R4 is, respectively, a hydrogen atom, an ethyl group or an allyl group;
iii) C3 hnear or branched, optionally mono- or polysubstituted saturated alkyl;
iv) C4 hnear or branched, optionally mono- or polysubstituted saturated alkyl wherein the mono-
substituent is not a hydrogen atom whenever R4 is an ethyl group;
v) C5 or higher linear or branched, optionally mono- or polysubstituted saturated alkyl or cycloalkyl;
vi) C3 or higher, optionally mono- or polysubstituted hnear or branched alkenyl;
vii) C3 or higher, optionally mono- or polysubstituted hnear or branched alkynyl,
viii) an unsubstituted phenyl group whenever R4 is not an ethyl group;
ix) a mono- or polysubstituted phenyl group;
x) a mono- or polysubstituted biphenyl, naphthyl or other polycyclic aromatic or heteroaromatic group,
xi) an acyl group other than acetyl except when R4 is other than an ethyl group when R3 may then be any acyl group;
xii) a thioacyl group;
xiii) a dialkyl or diaryl phosphonyl group excluding diethyl phosphonyl whenever R4 is an ethyl group;
xiv) a dialkyl or diaryl thiophosphonyl group excluding diethyl thiophosphonyl when R4 is an ethyl group,
and including sulfoxides and sulfones derived from any of i) - x) above,
and R4 is: i) a hydrogen atom;
ii) Ci or higher, hnear or branched optionally mono- or polysubstituted saturated alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted linear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group.
In accordance with a fourth aspect of the invention the weak nucleophile can be a dialkyl or diaryl phosphite, a dialkyl or diaryl thiophosphite, a phosphine or other phosphorus nucleophile. This aspect of the invention provides another method for the reversible protection of the chemically reactive carbon-carbon double bond of polymerisable alkyl or aryl 2-cyanoacrylates as outlined supra.
The process according to the fourth aspect invention can be used for the preparation of a compound of the general formula (III) and its subsequent conversion into a 2-cyanoacrylate polymer:
wherein R5 is: i) Ci or higher linear or branched saturated alkyl;
ii) C5 or higher cycloalkyl; or
iii) a phenyl or optionally mono- or polysubstituted phenyl group,
and R6 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, linear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono-or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group,
and X is: i) an oxygen atom; or
ii) a sulfur atom;
which comprises reacting 2-cyanoacrylic acid or an ester thereof with a phosphite or thiophosphite in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst under the conditions outlined hereinabove defined followed by ehmination of the addend to give a 2-cyanoacrylate monomer which then polymerises.
Alternatively, the phosphite or thiophosphite itself can act as the acidic catalyst.
The following scheme depicts the reactions involved in the process according to this aspect of the invention:
In this fourth aspect of the invention there is provided 2-cyano- 3-(dialkylphosphono)-, 2-cyano-3-(diarylphosphono)-, 2-cyano-3- (dialkylthiophosphono)- and 2-cyano-3-(diarylthiophosphono)- propionic acids and esters thereof which may be employed as precursors to useful polymerisable 2-cyanoacrylic acid esters.
Thus the invention provides a compound of the general formula (Ilia):
wherein R5 is: i) a methyl group;
ii) an ethyl group except when R6 is an ethyl group or a hydrogen atom;
iii) a propyl group or substituted propyl group;
iv) an isopropyl group except when R6 is an ethyl group or a hydrogen atom and when X is an oxygen atom;
v) C4 or higher saturated, optionally mono- or polysubstituted linear or branched alkyl;
vi) a cyclohexyl group;
vii) an unsubstituted phenyl group except when R6 is an ethyl group or a hydrogen atom and when X is an oxygen atom;
viii) a mono- or polysubstituted phenyl group; or
ix) a phenyl group attached simultaneously and ortho to both oxygen atoms except when R6 is an ethyl group and when X is an oxygen atom,
and R6 is: i) a hydrogen atom;
ii) Cj or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group,
and X is: i) an oxygen atom; or
ii) a sulfur atom.
According to a fifth aspect of the invention there is provided a process for the preparation of a compound of the general formula (IV) and its subsequent conversion into a 2-cyanoacrylate polymer:
wherein R7 is: i) C4 or higher saturated alkyl or cycloalkyl;
ii) phenyl except when R8 is an ethyl group; or
iii) a mono- or polysubstituted phenyl group,
and R8 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group,
and Y is: a negatively charged ion,
which comprises reacting 2-cyanoacrylic acid or an ester thereof with a phosphine in the presence of an inert solvent under polymerisation
inhibiting conditions and in the presence of an acidic catalyst under. the conditions hereinabove defined followed by ehmination of the phosphine to give a 2-cyanoacrylate monomer which then polymerises.
Suitable negatively charged ions as values for Y include but are not limited to a chloride or other hahde ion, a trifluoroacetate ion or a perchlorate ion.
Preferably the acidic catalyst has as its counterion the desired negatively charged ion Y of formula (IV).
The following scheme depicts the reaction involved in the process according to the fifth aspect of the invention:
wherein R7, R8 and Y are as hereinabove defined.
In this fifth aspect of the invention there are provided salts of 2- cyano-3-(trialkylphosphonium)- and 2-cyano-3-(triarylphosphonium) propionic acid and esters thereof which may be employed as precursors to useful polymerisable 2-cyanoacrylic acid esters.
wherein R7 is: i) C4 or higher saturated alkyl or cycloalkyl;
ii) phenyl except when R8 is an ethyl group; or
iii) a mono- or polysubstituted phenyl group,
and R8 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group,
and Y is: a negatively charged ion.
Suitable negatively charged ions as values for Y include but are not limited to a chloride or other hahde ion, a trifluoroacetate ion or a perchlorate ion.
In a sixth aspect of the invention the weak nucleophile can be a carbon acid. This provides a further method for the reversible protection of the carbon-carbon double bond of polymerisable 2- cyanoacrylic acid esters.
The process according to the sixth aspect of the invention can be used for the preparation of a compound of the general formula (V) and its subsequent conversion into a 2-cyanoacrylate polymer:
wherein R9 is: i) a hydrogen atom;
ii) an electron- withdrawing organic functional group including but not limited to groups such as nitro, carboalkoxy, cyano, acyl, sulfonyl and phosphonyl groups;
and RlO is: an electron- withdrawing organic functional group including but not limited to groups such as nitro, carboalkoxy cyano, acyl, sulfonyl and phosphonyl groups,
and RH is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, linear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, linear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group,
which comprises reacting 2-cyanoacrylic acid or an ester thereof with a singly or doubly activated carbon acid in an inert solvent under polymerisation-inhibiting conditions and in the presence of an acidic catalyst under the conditions hereinabove defined followed by ehmination of the addend to give a 2-cyanoacrylate monomer which then polymerises.
The following scheme depicts the reaction involved in the process according to the sixth aspect of the invention:
wherein R9, Rl° and RH are as hereinabove defined.
wherein R9 is: i) a hydrogen atom except when R O is a nitro group and RH is an ethyl group;
ii) a carboxymethyl group except when RlO is a nitro group and RH is an ethyl group;
iii) a carboxyethyl group except when RlO is a carboxyethyl group or an acetyl group or a cyano group when RH is an ethyl group;
iv) a carboxyalkyl group wherein the alkyl radical is C3 or higher saturated, linear or branched;
v) an acyl or aroyl group;
vi) any other compatible electron- withdrawing organic functional group including but not limited to nitro, cyano, sulfonyl and phosphonyl groups,
RlO is: any compatible electron-withdrawing organic functional group including but not limited to groups such as nitro, carboalkoxy, cyano, acyl, aroyl, sulfonyl and phosphonyl groups,
and RH is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group.
The processes according to the invention can be carried out in a simple, rapid, facile one-step manner with attendant advantages. Thus, the process according to the invention is a "one-step" process in contrast with the prior art methods described supra with their inherent limitations.
The reversible protection afforded by the invention can be used to protect the carbon-carbon double bond of a wide range of 2- cyanoacrylate monomers including substituted or unsubstituted long- chain alkyl cyanoacrylates and multi-functional cyanoacrylates including bis -cyanoacrylates.
The invention also provides a composition comprising a compound of any of the formulae (I), (II), (III), (IV) or (V) as hereinbefore defined. Such compositions can include excipients such as a thinner.
The compounds of the formulae (I), (II), (HI), (IV) and (V) hereinbefore defined can be used in adhesive compositions.
The invention also provides poly(cyanoacrylate) materials formed from a compound of any one of the formulae (I), (II), (III), (IV) and (V) hereinbefore defined.
A further use of the compounds of any one of the formulae (I), (II), (III), (IV) and (V) hereinbefore defined is in the formation of poly (cyanoacrylate) films. Such films include single or multi-layer Langmuir-Blodgett films.
The compounds of the formulae (I), (II), (III), (IV) and (V) hereinbefore defined can also be used in the preparation of poly (cyanoacrylate) nanocapsules. The compounds of the formula (I) are especially suitable for the preparation of such poly(cyanoacrylate) nanocapsules.
Poly(cyanoacrylate) nanocapsules prepared in accordance with the invention suitably contain an active agent such as a drug.
Compounds of any one of the general formulae (I), (II), (El),
(IV) and (V) wherein the esterifying group R2, R4, R6, R8 or RH, as appropriate is a terminal alkyne could be precursors to useful 2- cyanoacrylate monomers and polymers which could be further modified by cross-linking via the well-known Glaser oxidative coupling reaction.
Compounds of any one of the general formulae (I), (II), (El), (IV) and (V) wherein the esterifying group R2, R4, R6, R8 or RU, as appropriate incorporates di- or poly-yne functionality may be valuable for the formation of thin films having useful non-linear optical properties.
The compounds according to the invention are expected to be capable of broad apphcation, particularly where thin-film technology is involved and especially where Langmuir-Blodgett type films are desirable.
Poly(alkyl 2-cyanoacrylate) films are used as semiconductor . coating materials wherein they are applied to act as microlithographic photoresists due to their sensitivity to electron beams and to X-rays as described, for example, in U.S. Patent No. 4,279,984, and in Matveeva, N.K., (1990), Biol. Membr., Vol. 7, No. 11, 1200-1204. Such films are usually deposited by application of a solution of an alkyl 2- cyanoacrylate polymer, or its monomer followed by its subsequent polymerisation. Even solutions of cyanoacrylate polymers tend to be unstable over time as indicated in Patent Publications JP 9262588 and JP 0462558, and vapour-deposition techniques have been devised in an attempt to overcome this disadvantage (Woods, J., Guthrie, J., Rooney, J., Kelly, L., Doyle, A. and Noonan, E., (1989), Polymer, Vol. 30, No. 6, 1091-1098). This requires special apparatus, however.
The compounds according to the invention offer an alternative method of depositing such films since they are stable as solutions in inert solvents and can be converted into poly(alkyl 2-cyanoacrylates) under anionic conditions. Furthermore, when films laid down in this way are Langmuir-Blodgett or other very thin films then the necessary period of exposure to electron beams or to X-rays should be beneficially reduced. Also such thin films can be expected to greatly modify the capacitance effect and the relative permittivity effect thereby improving dynamic memory capability of the microchip. Accordingly, it is expected that these thin films will find apphcation in the manufacture of low power microchips.
Another benefit resulting from the application of thinner films is increased transconductance with accompanying improved efficiency in terms of speed and memory capacity of thus formed devices. Reduced voltages employing such devices result in reduced power dissipation. Additionally, tighter control over threshold voltage means that such devices may find use in lower power applications with sub-threshold operation in VLSI (very large-scale integration) required, for example, in hearing aids and implants.
Thinner film thickness also means improved resolution and reduced feature sizes on microchips, such as, for example, the important interconnection feature between two adjacent "gates" resulting in improved overall performance.
When the alkyl ester part of the alkoxycyanopropionic ester molecule contains a metal such as iron (for example, in a ferrocenyl function) and the alkyl of the alkoxy part of the molecule is a long- chain alkyl group, the resulting ordered Langmuir-Blodgett poly(alkyl cyanoacrylate) film laid down on a substrate such as a silicon chip may then be etched with a laser. Such treated areas of film would give rise to low-coke iron or iron oxide indented regions depending on whether the ablation is carried out under an inert atmosphere such as nitrogen or in the oxidising atmosphere of the air, respectively. Also, when sulfur is additionally contained in the alkyl ester radical of such a long- chain alkoxycyanopropionic acid ester, a well-ordered Langmuir- Blodgett poly(alkyl cyanoacrylate) layer would be expected to give semiconductor FeS regions when etched with a laser.
More easily programmable EPROMS may also result from application of this technology.
The prospect of achieving ultra-thin films as described herein opens up a wide range of possible apphcations in the manufacture of future generations of integrated circuits. Many of the key factors which must be present for the specifications of future semiconductor devices as predicted in the literature (see for example Chenming, Hu (1993) Proceedings of the IEEC, Vol. 81, No. 5, p. 682-689), such as, for example, decreased feature size to less than 0.1 μm, improved feature definition, higher speeds, greater density, increased reliability and thinner oxides, are facilitated by the present invention.
Thin, tightly controlled, low impurity films offer many advances in semiconductor device fabrication. Depolymerisation by means of laser (or other high-energy beam) etching has potential apphcations for accurately controlled volumetric geometries. Areas of surface can be
selectively insulated. The engineering of regions, interconnects, channels and layers could be accomplished largely through a chemical route using available production equipment. By laying multiple layers of poly(cyanoacrylate) film where the alkyl ester contains a metal, a semiconductor or an oxide (or where the oxide is produced by carrying out ablation in an oxidising atmosphere), laser etching can produce the features hereinabove mentioned. Furthermore, device trimming, essential in analogue integrated circuits, is also more readily achievable to improved accuracies.
The apphcation of the present invention to semiconductor technology may provide digital devices with very low gate delays operating at lower voltages (1.5V), thereby offering greater circuit speeds while maintaining low chip power levels. The reduced feature size, junction depth, and effective channel length could offer SRAM densities up to 4G. While operating voltage can be reduced, as mentioned, the technology could offer tighter control over threshold voltages by ensuring very low impurity levels.
Linear devices could benefit from the improved control in manufacturing and region/feature definition, low power and higher levels of integration. MOS and bipolar technologies are equally amenable to the processes.
Treatment of thin poly(cyanoacrylate) films with laser or high energy plasma gives coke-free clean holes.
Solvent removable (linear poly(cyanoacrylate) films may be laid down on silicon wafers from the monofunctional 2-cyanopropionate derivatives described herein and then masked. Subsequent treatment with laser followed by treatment with hydrofluoric acid (HF) and subsequent removal of remaining polymer using common organic solvents such as benzene, chloroform or acetone would be expected to give clean, well defined holes on the silicon surface.
Cross-hnked and insoluble poly(cyanoacrylate) films may also be laid down on a silicon surface from multifunctional 2-cyanopropionate derivatives described herein and again be masked and treated in the manner hereinabove described with laser followed by HF. A further poly(cyanoacrylate) layer could then be deposited on the stable solvent- resistant cross-linked poly(cyanoacrylate) film from an appropriate 2- cyanopropionate derivative. When the ester portion of this derivative contains a metal such as iron, for example, in a ferrocenyl radical, ablation of exposed regions of resulting poly(cyanoacrylate) film in an inert atmosphere would give a layer of metal - in this case iron - on the surface. Such a layer would, of course, be conducting in nature.
A further layer of silicon dioxide could be laid down, where required, by initial deposition of a poly(cyanoacrylate) film from a silicon-containing (ester portion of molecule) 2-cyanopropionate derivative followed by treatment with laser or high energy plasma in an oxygen-rich atmosphere. Such a layer could also be directly laid down on the sihcon surface.
In this way, silicon chips containing insulating, conducting and semiconductor multilayers may be fabricated.
Also phosphorus-containing poly(cyanoacrylate) films could be laid down from equivalent cyanopropionate derivatives directly onto silicon. Ablation of unmasked regions of film with laser in an inert atmosphere should give phosphorus-doped silicon semi-conductor region used in pnp transmission.
Sulfur-containing cyanopropionate derivatives would in the same way as above give sulfur doped semiconductor regions on the silicon surface following treatment of polymer with laser. Such sulfur-doped areas would be expected to improve adhesion of subsequently formed metal films from ablation of metal-containing poly(cyanoacrylate) prepared from a metal-containing (in the ester portion of the molecule) 2-cyanopropionate derivative.
Diacetylene functional 2-cyanopropipnate derivatives (ester portion of molecule) would give poly(cyanoacrylate) films which could be further modified. For example, some regions could be exposed to high energy ultra-violet light to give, by a free-radical polymerisation process, semi-conducting poly(acetylene) regions - masked or remaining polymer layer would be an insulating region. Doping of the semi-conducting poly(acetylene) region by, for example, iodine would give conductive zones. Hence three types of region (insulating, semiconducting, conducting) could be designed into the same poly (cyanoacrylate) monolayer. Such techniques would be useful for the fabrication of molecular electronic devices for super-thin pnp transmission with dramatic component size reduction (down to 10-50
A).
A wide variety of poly(cyanoacrylate) films could be prepared from the cyanopropionate derivatives according to the invention for use in photosensitive, non-linear optical and liquid crystal apphcations. Non-linear optical 2-cyanopropionates would possess asymmetric radicals in the alkyl portion of the molecule. In the same way liquid crystal 2-cyanopropionates would possess cholesterol or methoxy/cyanobiphenyl functionality in the alkyl portion of the molecule.
Patent Publication EP 146,505 describes the use of thin (10 μm) poly(alkyl 2-cyanoacrylate) films in a process for image formation. The ability to lay down Langmuir-Blodgett, multi-layer or other very thin films utihsing compounds of the invention which are precursors to alkyl 2-cyanoacrylate esters and thus to poly(alkyl 2-cyanoacrylates) should permit further useful developments in this area.
Conversion of the monomers produced in accordance with the invention into polymer may be carried out by prior application of a base such as an amine or tetraalkylammonium hydroxide to the surface to be coated or application of base from above as vapour, for example once a film of the compound has been laid down on the untreated surface. In addition the compounds prepared in accordance with the
invention could be vapour deposited following the method of Woods J., et al. supra. Priming of surfaces to be bonded by a suitable base means that the compounds in accordance with the invention may be used as adhesives as indicated above. The cyanoacrylate monomer produced in situ between the two surfaces would be expected to polymerise rapidly in the presence of base forming a solid polymer and hence an adhesive bond. The presence of an alcohol or phenol co-product may not be disadvantageous since in fact alcohols have been used as physical additives with cyanoacrylate adhesives to impart porous bonding abihty to same as described in Patent Pubhcations JP 55012166 and JP 88039627.
Long chain or fluorine containing alkoxycyanopropionic esters would be expected to wet previously difficult to bond surfaces such as polyolefins or poly(tetrafluoroethylene) (PTFE) and provide adhesive bonds between previously appropriately base-primed substrates.
However, even peeled poly(cyanoacrylate) films have found use in a transfer printing process in Patent Publication JP 8251487. Similarly long chain alkoxcyanopropionic esters instead of aligning themselves onto surfaces as Langmuir-Blodgett films may form micelles in aqueous solution and be used as a means to encapsulate active agents such as drugs upon subsequent polymerisation by addition of a base to the medium to form nanocapsules. This technique of micelle polymerisation has previously been employed starting with alkyl cyanoacrylate monomer to give pilocarpine-containing poly(alkyl cyanoacrylate) nanoparticles (Harmia-Pulkkenes, T, Tuomi, A., and
Kristoffersson, E. in J. Microencapsulation 1989, Vol. 6, No. 1 p. 87). As indicated above, the use of poly(alkyl cyanoacrylates) is not limited to the encapsulation of drugs. Thus poly (alkyl cyanoacrylates) can be used to encapsulate other active agents. They have been used for example in an electrostatic suspension developer (Patent Publication DE-A 35 14 867). Cyanoacrylate monomer itself has been microencapsulated together with colour-former in a heat-developable, photo- and pressure- sensitive composition in Patent Publication JP 92278953. In the same way, alkoxycyanopropionic acid esters should be able to be microencapsulated by poly(alkyl cyanoacrylate) to give an
adhesive composition when used in conjunction with appropriate basic primer.
Other potential applications for the compounds prepared in accordance with the invention include use as transparent fixation agents of plant tissues (the portions to be fixed should be treated with appropriate base) which may offer advantages over the more reactive and less 'discriminate' cyanoacrylate monomer described in Patent Publication JP 63255201.
Two recently reported apphcations of poly(alkyl cyanoacrylates) is their use as passivating layers on the hthium anode of hthium-thionyl chloride cells (Hsing Yaw H., Hsien Wen K., J. Power Sources 1989 Vol. 26 No. 3-4 p. 419) and Langmuir-Blodgett poly (cyanoacrylate) films as coatings for indium antimonide capacitors (Matveeva, N.K., Pasekov, V.F., and Sa Vel'eva, L.V. (Mikroelektronika Akad. Nauk. SSSR 1991, Vol 20, No. 5 pp. 501-503)). The compounds prepared in accordance with the invention could be used to lay down such layers in photo-resist fabrication.
Brief Description of Figures
Fig. 1 is a Langmuir isotherm for the Langmuir-Blodgett film formed in Example 7;
Fig. 2 is a Langmuir isotherm for the Langmuir-Blodgett film formed in Example 8;
Fig. 3 is a Langmuir isotherm for the Langmuir-Blodgett film formed in Example 9; and
Fig. 4 is a graph of area at constant pressure versus time before and after transferring a Langmuir-Blodgett film formed as described in Example 9 to a silicon [100] surface.
Modes for Carrying Out the Invention
The invention will be further illustrated by the following Examples.
Example 1
Synthesis of 2-cyano-3-hexadecyloxypropionic acid
2-Cyanoacrylic acid (0.98 g), /.-toluenesulfonic acid (0.17 g) and hydroquinone (0.05 g) were dissolved in dry benzene (250 ml) contained in a 500 ml flask which had previously been washed with 10% sulfuric acid and dried using acetone, and which was fitted with a stirrer, a thermometer, sulfur dioxide and argon inlet adaptors, a dosing funnel and a Liebig condenser arranged for distillation. The solution was sparged with sulfur dioxide and 50 ml of water-benzene azeotrope was distilled off in order to ensure anhydrous conditions. The condenser was then arranged for reflux and a solution of n- hexadecyl alcohol (2.42 g) in dry benzene (50 ml) was added dropwise to the boiling contents of the flask with stirring and continuous sparging with dry sulfur dioxide. Following addition of the alcohol, the solution was heated under reflux during two hours. After this time, sparging with sulfur dioxide was substituted by sparging with argon and the volume of the mixture was reduced to 50 ml by distillation of solvent. The residue was extracted using boiling heptane (100 ml), and heptane and remaining benzene were removed in vacuum to give an oil which crystallised. The solid was recrystallised from hexane to give 2- cyano-3-hexadecyloxypropionic acid (1.37 g; 40%), m.p. 63-65°C, calculated for C20H37NO3: C 70.8, H 10.1, N 4.1%; found C 69.15, H 10.07, N 4.65%, *H NMR (CόD6) 0.81 (3H, t, J = 5.7 Hz, -CH3), 1.18 (28H, m, -CH2-), 2.87 (1H, ABX dd, JχA = 5.28 Hz, JχB = 4.43 Hz, -CH(CN)Cθ2H), 3.07 (2H, t, J = 6.44 Hz, -OCH2CH2-), 3.18 (1H, ABX m, JAB = 9.30 Hz, -OCH2CH(CN)C02H), 3.31 (1H, ABX m, -OCH2CH(CN)C02H) and 7.13 (1H, s, -C02H) p.p.m.
Example 2
Synthesis of ethyl 2-cyano-3-hexadecyloxypropionate
Ethyl 2-cyanoacrylate (1.25 g), 2-cyanoacrylic acid (0.05 g) and hydroquinone (0.05 g) were dissolved in a mixture of dry benzene (200 ml) and dry toluene (50 ml) contained in a 500 ml flask which had previously been washed with 10% sulfuric acid and then dried using acetone, and which was fitted with a stirrer, a thermometer, sulfur dioxide and argon inlet adaptors, a dosing funnel and a Liebig condenser arranged for distillation. The solution was sparged with sulfur dioxide while water-benzene azeotrope (50 ml) was distilled off in order to ensure anhydrous conditions. The condenser was then arranged for reflux and a solution of n-hexadecyl alcohol (2.7 g) in dry benzene (50 ml) was added to the boiling contents of the flask with stirring and continuous sparging with dry sulfur dioxide. Following addition of the alcohol the mixture was continuously sparged with sulfur dioxide and heated in such a manner that slow distillation of solvent continued during two and one-half hours. After this time, sparging with sulfur dioxide was substituted by sparging with argon and the volume of the reaction mixture was reduced to 50 ml by distillation. The remaining solution was cooled, a solid residue which formed was removed by filtration, and remaining solvent was removed by distillation in vacuum to give a solid product (3.4 g). This was recrystallised from hexane to give ethyl 2-cyano-3-hexadecyloxy propionate (2.37 g; 61%), m.p. 44-46°C, calculated for C22H41NO3: C 71.93, H 11.17, N 3.81%; found C 72.17, H 11.68, N 3.56%, *H NMR (C6D6) 0.847 (3H, m, -(CH2)nCH3), 0.913 (3H, t, J = 7.16 Hz, -OCH2CH3), 1.42 (28H, m, -CH2-), 3.01 (1H, ABX dd, JχA = 5.21 Hz, JχB = 5.23 Hz, -CH(CN)C02Et), 3.23 (2H, t, J = 6.32 Hz, -CH2OCH2CH-), 3.42 (1H, ABX m, JAB = 9.35 Hz, -OCH2CH(CN) C02Et), 3.53 (1H, ABX m, -OCH2CH(CN)C02Et) and 3.88 (2H, q, J = 7.16 Hz, -C02CH2CH3) p.p.m.
Example 3
Synthesis of hexadecyl 2-cyano-3-hexadecyloxypropionate
2-Cyanoacrylic acid (0.96 g, 0.01 mol), -toluenesulfonic acid (0.17 g) and hydroquinone (0.05 g) were dissolved in dry benzene (250 ml) contained in a 500 flask which had previously been washed with 10% sulfuric acid and then dried using acetone, and which was fitted with a stirrer, a thermometer, sulfur dioxide and argon inlet adaptors, a dosing funnel and a Liebig condenser arranged for distillation. The solution was sparged using dry argon while water-benzene azeotrope (50 ml) was distilled off in order to ensure anhydrous conditions. The condenser was then arranged for reflux and a solution of n-hexadecyl alcohol (2.42 g 0.01 mol) in dry benzene (100 ml) was added to the boiling contents of the flask with stirring and continuous sparging with dry sulfur dioxide. Following addition of the alcohol, the mixture was refluxed during two hours. After this time, the sulfur dioxide sparging was substituted by argon sparging and the condenser was arranged for distillation. A solution of n-hexadecyl alcohol (2.6 g, 0.0108 mol) in dry benzene (100 ml) was added dropwise with constant removal of solvent by distillation. Following this addition, dry benzene (200 ml) was added and the mixture was distilled with stirring and constant sparging using argon until the volume had been reduced to 50 ml. The residue was extracted using boiling hexane (100 ml), and hexane and remaining benzene were removed in vacuum after prior coohng and filtration to give a solid residue (3.95 g). This was recrystallised from hexane to give the hexadecyl ester of 2-cyano-3-hexadecyloxypropionic acid (3.4 g; 60%) m.p. 42-43°C, calculated for C36H69NO3: C 76.73, H 10.48, N 2.48%; found C 75.57, H 11.09, N 2.59%, *H NMR (C6D6) 0.85 (6H, t, J - 6.2 Hz, 2 @ -CH2CH3), 1.12 (4H, m, 2 @ -CH2CH3), 1.33 (52H, m, -CH2-), 2.94 (1H, ABX dd, JχA = 5.42 Hz, JχB = 5.10 Hz, -CH2CH(CN)Cθ2-), 3.10 (2H, t, J = 6.3 Hz, -CH OCH2CH(CN)-), 3.29 (1H, ABX m, JBA = 9.33 Hz, -OCH2CH(CN)-), 3.42 (1H, ABX m, -OCH2CH(CN)-) and 3.86 (2H, t, J = 6.43 Hz, -C02CH2CH2-) p.p.m.
Example 4
Preparation of poly(ethyl 2- cyanoacrylate from ethyl 2-cyano-3- hexadecyloxypropionate
Ethyl 2-cyano-3-hexadecyloxypropionate (0.36 g) was dissolved in ethanol (5 ml) and water (1 ml) and the mixture was stirred during 24 hours to give an amorphous colourless sohd. This sohd was separated by centrifugation and dried in vacuum to give 0.35 g of an equimolar mixture of hexadecyl alcohol and poly(ethyl 2- cyanoacrylate, calculated C 71.93, H 11.17, H 3.81, found C 70.03, H 10.94, N 3.35%. The mixture was washed with alcohol and with acetone, and the sohd residue was dissolved in chloroform. It was then precipitated with hexane, filtered and dried in vacuum to give 0.1 g of poly(ethyl 2-cyanoacrylate), calculated for C6H7NO2: C 57.6, H 5.6, N 11.2; found C 58.31, H 6.11, N 10.43%, lU NMR (CDCI3) 0.77 (m, - OCH2CH3), 2.20-2.55 (m, -CH2-) and 4.23 (m, -OCH2CH3) p.p.m.
Example 5
Preparation of polyCethyl 2-cyanoacrylate from triphenyl((2-cyano-2- ethoxycarbonyDethyPphosphonium trifluoroacetate
To a solution of 1.6 g (2 ml, 12.5 mmol) of ethyl 2- cyanoacrylate and 2.6 ml (18 mmol) of trifluoroacetic acid in 2 ml of dry chloroform was added dropwise with stirring and sparging with sulfur dioxide a solution of 3.28 g (12.5 mmol) of triphenylphosphine in 4 ml of dry chloroform. The mixture was stirred at room temperature during 20 minutes and solvents were then evaporated in vacuum. The residual oil contained triphenyl((2-cyano-2- ethoxycarbonyl)ethyl)phosphonium trifluoroacetate, 3 lp NMR 21.82 p.p.m., *H NMR (CDCI3) 1.06 (3H, t, -OCH2CH3), 3.72 (IH, m, - CH(CN)C02Et), 4.00 (2H, m, -OCH2CH3), and 4.18 and 4.45 (each IH, m, PI13P-CH2-) p.p.m. A solution of 3 g of the above compound in 5 ml of acetone was added dropwise to 30 ml of water and the mixture was stirred during 24 hours to give an amorphous colourless sohd.
This sohd was separated by centrifugation, washed sequentially with water, alcohol and acetone, and dried in vacuum. It was then dissolved in chloroform, precipitated using hexane, filtered and dried in vacuum to give 0.72g (96%) of poly(ethyl 2-cyanoacrylate), calculated for C6H7NO2: C 57.6, H 5.6, N 11.2; found C 58.01, H 5.86, N 10.83%, XH NMR (CDCI3) 0.77 (3H, -OCH2CH3), 2.20-2.55 (2H, m, -CH2-) and 4.23 (2H, -OCH2CH3) p.p.m.
Example 6
Preparation of po ethyl 2-cyanoacrylate) from ethyl 2-cyano-4- thiaoctanoate
To a solution of 1.68 g (2 ml, 18.7 mmol) of n-butylmercaptan in 2 ml of dry chloroform was added dropwise with stirring to a solution of 1.6 g (2 ml, 12.5 mmol) of ethyl 2-cyanoacrylate in 2 ml of dry chloroform. The mixture was stirred at 20°C during 24 hours when solvent was evaporated in vacuum to give a colourless transparent oil. This oil was distilled in vacuum to give 1.88 g (70%) of ethyl 2- cyano-4-thiaoctanoate, b.p. 110°C at 0.5 mm Hg, *H NMR (CDCI3) 0.90 (3H, t, J 6 Hz, CH3CH2CH2-), 1.32 (3H, t, J 6.5 Hz, -OCH2CH3), 1.4 (2H, m, CH3CH2CH2-), 2.64 (2H, t, -CH2CH2S-), 2.99 and 3.09 (each IH, ABX, -SCH2CH-), 3.70 (IH, m, -CH2CH(CN)C02Et) and 4.28 (2H, q, J 6.5 Hz, -OCH2CH3) p.p.m. The above compound (1 g) was added dropwise to 30 ml of water and the mixture was stirred during 48 hours to give an amorphous colourless sohd. This sohd was separated by centrifugation, washed with water, dried in vacuum, dissolved in chloroform, precipitated using hexane, filtered and dried in vacuum to give 0.53 g (92%) of poly(ethyl 2-cyanoacrylate), calculated for C6H7NO2: C 57.6, H 5.6, N 11.2; found C 57.23, H. 5.45, N. 11.62%, *H NMR (CDCI3) 0.77 (m, -OCH2CH3), 2.20-2.55 (m, -CH2-) and 4.23 (m, -OCH2CH3) p.p.m.
Example 7
Formation of a Langmuir-Blodgett film using 2-cyano-3- hexadecyloxypropionic acid
The title compound was dissolved in pure, dry chloroform to give a solution containing 1 g/L. A measured volume (8 x 10"5 L) of this solution was applied to the surface of pure water of pH 7.13 contained in a Langmuir trough fitted with a movable barrier connected to a torsion balance and a data handling system. After allowing time for the chloroform to evaporate, the surface of the trough was swept by the barrier at a speed of 1.2 cm2/s_ 1 and the isotherm of surface tension in mN/m versus surface area of the film in cm2 was recorded. A classical Langmuir isotherm showing gas, liquid and sohd phases was obtained and is reproduced in Fig. 1.
Example 8
Formation of a Langmuir-Blodgett film using ethyl 2-cyano-3- hexadecyloxypropionate
This experiment was carried out exactly as described for Example 7 supra except that the amount of chloroform solution of the title compound which was apphed to the surface of the water in the trough was 6 x 10"5 L. The Langmuir isotherm obtained is reproduced in Fig. 2.
Example 9
Formation of a Langmuir-Blodgett film using hexadecyl 2-cyano-3- hexadecyloxypropionate
This experiment was carried out exactly as described for
Example 7 supra. The Langmuir isotherm obtained is reproduced in Fig. 3.
Example 10
Formation of a Langmuir-Blodgett film using hexadecyl 2-cyano-3- hexadecyloxypropionate, and its transfer to a silicon IT 001 surface
This experiment was initially carried out in the same way as Example 9 supra. A stable, constant area Langmuir-Blodgett film was obtained and maintained at a surface pressure of 35mN/m. At t = 54s (Fig. 4) a portion of the film was transferred by dipping to a silicon [100] surface of known area, giving a film-transfer ratio of 0.8:1.0. After dipping at t = 84s a stable Langmuir-Blodgett film of reduced constant area was obtained.
Claims
1. A process for the reversible couphng of a weak nucleophile to the carbon-carbon double bond of 2-cyanoacrylic acid or an ester thereof, so as to reversibly protect said bond, which comprises reacting 2-cyanoacrylic acid or an ester thereof with said weak nucleophile in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst.
2. A process according to Claim 1, wherein the weak nucleophile is an alcohol.
3. A process according to Claim 1, wherein the weak nucleophile is a phenol.
4. A process according to Claim 1, wherein the weak nucleophile is a thiol, a thiophenol, a thioamide or a thio or dithio acid.
5. A process according to Claim 1, wherein the weak nucleophile is a dialkyl or diary lphosphite, a dialkyl or diarylthiophosphite, a phosphine, or a phosphorus sulfenyl hahde.
6. A process according to Claim 1, wherein the weak nucleophile is a carbon acid.
7. A process according to any preceding claim, wherein the acidic catalyst is a non-volatile acid.
8. A process according to Claim 7, wherein the non-volatile acid is an ahphatic sulfonic acid or an aromatic sulfonic acid.
9. A process according to Claim 8, wherein the acid catalyst is methanesulfonic acid or /? -toluenesulfonic acid.
10. A process according to any one of Claims 1-6, wherein the acid catalyst is a carboxylic acid.
11. A process according to any one of Claims 1-10, which is carried out under conditions which inhibit anionic polymerisation.
12. A process according to Claim 11, which is carried out in the presence of a weak acid.
13. A process according to Claim 12, wherein the weak acid is sulfur dioxide.
14. A process according to Claim 13, wherein gaseous sulfur dioxide is bubbled into the reaction mixture as a continuous stream.
15. A process according to any one of Claims 1-11, wherein the anionic polymerisation inhibitor is an ahphatic sulfonic acid, an aromatic sulfonic acid or carbon dioxide.
16. A process according to any one of Claims 1-15, which is carried out in the presence of a free radical polymerisation inhibitor.
17. A process according to Claim 16, wherein the free radical polymerisation inhibitor is benzoquinone, hydroquinone, methylhydroquinone or naphthoquinone.
18. A process according to any one of Claims 1-17, wherein the inert solvent is benzene, toluene, xylene, hexane or a chlorinated hydrocarbon.
19. A process according to any one of Claims 1-18, which is carried out at a temperature in the range 20-200°C.
20. A process according to any one of Claims 1-19, wherein the total volume of the reaction solvent is kept constant.
21. A process according to any one of Claims 1-20, wherein when 2-cyanoacrylic acid is used as a starting compound to prepare a
3-alkoxy-2-cyanopropionic acid ester, the water produced is continually removed by azeotropic distillation.
22. A process according to any one of Claims 1-21, wherein when the weak nucleophile is an alcohol or phenol, the alcohol or phenol is added gradually to the reaction mixture.
23. A process according to any one of Claims 1-3 and 7-22 for the preparation of a compound of the general formula (I):
wherein Rl is: i) Cj or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
ii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iii) C3 or higher, optionally mono- or polysubstituted, linear or branched alkenyl;
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl; or
v) a phenyl or optionally mono- or polysubstituted phenyl group,
and R2 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cyclic or polycyclic aromatic or heteroaromatic group.
which comprises reacting 2-cyanoacrylic acid or an ester thereof with an alcohol or phenol in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst.
24. A process according to any one of Claims 1 , 4 and 7-20 for the preparation of a compound of the general formula (II) and its subsequent conversion into a 2-cyanoacrylate polymer:
wherein R3 is: i) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl or cycloalkyl;
ii) C3 or higher, optionally mono- or polysubstituted hnear or branched alkenyl or alkynyl;
iii) a phenyl or optionally mono- or polysubstituted phenyl group;
iv) a mono- or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group;
v) an acyl or thioacyl group;
vi) a dialkyl- or diarylphosphonyl group; or
vii) a dialkyl- or diarylthiophosphonyl group,
and R4 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group,
which comprises reacting 2-cyanoacrylic acid or an ester thereof with a sulfhydryl compound in the presence of an inert solvent under
polymerisation inhibiting conditions and in the presence of an acidic catalyst, followed by later ehmination of the sulfhydryl addend to give a 2- cyanoacrylate monomer which then polymerises.
25. A process according to any one of Claims 1, 5 and 7-20 for the preparation of a compound of the general formula (III) and its subsequent conversion into a 2-cyanoacrylate polymer:
wherein R5 is: i) Ci or higher linear or branched saturated alkyl;
ii) C5 or higher cycloalkyl; or
iii) a phenyl or optionally mono- or polysubstituted phenyl group,
and R6 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono-or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group,
and X is: i) an oxygen atom; or
ii) a sulfur atom;
which comprises reacting 2-cyanoacrylic acid or an ester thereof with a phosphite or thiophosphite in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst, followed by elimination of the addend to give a 2- cyanoacrylate monomer which then polymerises.
26. A process according to any one of Claims 1, 5 and 7-20 for the preparation of a compound of the general formula (IV) and its subsequent conversion into a 2-cyanoacrylate polymer:
wherein R7 is: i) C4 or higher saturated alkyl or cycloalkyl;
ii) phenyl except when R8 is an ethyl group; or
iii) a mono- or polysubstituted phenyl group,
and R8 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group,
and Y is: a negatively charged ion,
which comprises reacting 2-cyanoacrylic acid or an ester thereof with a phosphine in the presence of an inert solvent under polymerisation inhibiting conditions and in the presence of an acidic catalyst, followed by elimination of the phosphine to give a 2-cyanoacrylate monomer which then polymerises.
27. A process according to Claim 26, wherein Y is but is not limited to a halide ion, a trifluoroacetate ion or a perchlorate ion.
28. A process according to any one of Claims 1, 6 and 7-20 for the preparation of a compound of the general formula (V) and its subsequent conversion into a 2-cyanoacrylate polymer:
(V)
ii) an electron-withdrawing organic functional group selected from nitro, carboalkoxy, cyano, acyl, sulfonyl and phosphonyl groups;
and Rl° is: an electron- withdrawing organic functional group selected from nitro, carboalkoxy cyano, acyl, sulfonyl and phosphonyl groups,
and RH is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, linear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group,
which comprises reacting 2-cyanoacrylic acid or an ester thereof with a singly or doubly activated carbon acid in an inert solvent under polymerisation-inhibiting conditions and in the presence of an acidic catalyst followed by elimination of the addend to give a 2-cyanoacrylate monomer which then polymerises.
29. A compound of the general formula (Ia):
wherein Rl is: i) a methyl group;
ii) C2 or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl; or
vi) a phenyl or optionally mono- or polysubstituted phenyl group,
and R2 is: i) a hydrogen atom;
ii) Cj, optionally mono- substituted, alkyl;
iii) C2 saturated alkyl except when Rl is methyl;
iv) C saturated, mono- or polysubstituted alkyl;
v) C3 or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
vi) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
vii) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
viii) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
ix) a phenyl or optionally mono- or polysubstituted phenyl group; or
x) a mono- or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group.
30. A compound of the general formula (Ea):
wherein R3 is: i) Ci optionally monosubstituted alkyl wherein the substituent is not a free carboxyl group whenever R4 is an ethyl group;
ii) C2 optionally mono- or polysubstituted saturated alkyl wherein the or each substituent is not a primary amino group or a hydroxyl group whenever R4 is an ethyl group, or wherein the substituents do not include a primary amino group and a free carboxy group attached to the same carbon atom whenever R4 is an ethyl group, or wherein the β-substituent is not another sulfur atom bearing a 2'-carboxy-2'-cyanoethyl function as the free carboxylic acid or as its ethyl or
allyl ester whenever the substituent R4 is, respectively, a hydrogen atom, an ethyl group or an allyl group;
iii) C3 hnear or branched, optionally mono- or polysubstituted saturated alkyl;
5 iv) C4 hnear or branched, optionally mono- or polysubstituted saturated alkyl wherein the mono- substituent is not a hydrogen atom whenever R4 is an ethyl group;
v) C5 or higher linear or branched, optionally mono- 10 or polysubstituted saturated alkyl or cycloalkyl;
vi) C3 or higher, optionally mono- or polysubstituted hnear or branched alkenyl;
vii) C3 or higher, optionally mono- or polysubstituted hnear or branched alkynyl,
15 viii) an unsubstituted phenyl group whenever R4 is not an ethyl group;
ix) a mono- or polysubstituted phenyl group;
x) a mono- or polysubstituted biphenyl, naphthyl or other polycyclic aromatic or heteroaromatic group,
20 xi) an acyl group other than acetyl except when R4 is other than an ethyl group when R3 may then be any acyl group;
xii) a thioacyl group;
xiii) a dialkyl or diaryl phosphonyl group excluding 25 diethyl phosphonyl whenever R4 is an ethyl group;
xiv) a dialkyl or diaryl thiophosphonyl group excluding diethyl thiophosphonyl when R4 is an ethyl group,
and including sulfoxides and sulfones derived from any of i) - x) above,
and R4 is: i) a hydrogen atom;
ii) Cj or higher, hnear or branched optionally mono- or polysubstituted saturated alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted linear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group.
31. A compound of the general formula (Ela):
ii) an ethyl group except when R6 is an ethyl group or a hydrogen atom;
iii) a propyl group or substituted propyl group;
iv) an isopropyl group except when R6 is an ethyl group or a hydrogen atom and when X is an oxygen atom;
v) C4 or higher saturated, optionally mono- or polysubstituted linear or branched alkyl;
vi) a cyclohexyl group;
vii) an unsubstituted phenyl group except when R6 is an ethyl group or a hydrogen atom and when X is an oxygen atom;
viii) a mono- or polysubstituted phenyl group; or
ix) a phenyl group attached simultaneously and ortho to both oxygen atoms except when R6 is an ethyl group and when X is an oxygen atom,
and R6 is: i) a hydrogen atom;
ii) C\ or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, linear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group,
and X is: i) an oxygen atom; or
ii) a sulfur atom.
32. A compound of the general formula (IVa):
wherein R7 is: i) C4 or higher saturated alkyl or cycloalkyl;
ii) phenyl except when R8 is an ethyl group; or
iii) a mono- or polysubstituted phenyl group,
and R8 is: i) a hydrogen atom;
ii) Ci or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly(cycloalkyl;
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group,
and Y is: a negatively charged ion.
33. A compound according to Claim 32, wherein Y is but is not hmited to a hahde ion, a trifluoroacetate ion or a perchlorate ion.
34. A compound of the general formula (Va):
wherein R9 is: i) a hydrogen atom except when RlO is a nitro group and RH is an ethyl group;
ii) a carboxymethyl group except when Rl° is a nitro group and RU is an ethyl group;
iii) a carboxyethyl group except when Rl° is a carboxyethyl group or an acetyl group or a cyano group when RU is an ethyl group;
iv) a carboxyalkyl group wherein the alkyl radical is C3 or higher saturated, linear or branched;
v) an acyl or aroyl group;
vi) a compatible electron-withdrawing organic functional group selected from nitro, cyano, sulfonyl and phosphonyl groups,
RlO is: a compatible electron-withdrawing organic functional group selected from nitro, carboalkoxy, cyano, acyl, aroyl, sulfonyl and phosphonyl groups,
and RH is: i) a hydrogen atom;
ii) C\ or higher saturated, optionally mono- or polysubstituted, hnear or branched alkyl;
iii) C5 or higher saturated, optionally mono- or polysubstituted cycloalkyl or poly (cycloalkyl);
iv) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkenyl;
v) C3 or higher, optionally mono- or polysubstituted, hnear or branched alkynyl;
vi) a phenyl or optionally mono- or polysubstituted phenyl group; or
vii) a mono- or polysubstituted biphenyl, naphthyl or other cychc or polycyclic aromatic or heteroaromatic group.
35. A composition comprising a compound of the general formula (I) given and defined in Claim 23.
36. A composition comprising a compound of the general formula (II) given and defined in Claim 24.
37. A composition comprising a compound of the general formula (III) given and defined in Claim 25.
38. A composition comprising a compound of the general formula (IV) given and defined in Claim 26.
39. A composition comprising a compound of the general formula (V) given and defined in Claim 28.
40. A compound of the general formula (I) given and defined in Claim 23, for use in an adhesive composition.
41. A compound of the general formula (E) given and defined in Claim 24, for use in an adhesive composition.
42. A compound of the general formula (IE) given and defined in Claim 25, for use in an adhesive composition.
43. A compound of the general formula (IV) given and defined in Claim 26, for use in an adhesive composition.
44. A compound of the general formula (V) given and defined in Claim 28, for use in an adhesive composition.
45. A poly (cyanoacrylate) material formed from a compound of the general formula (I) given and defined in Claim 23.
46. A poly(cyanoacrylate) material formed from a compound of the general formula (II) given and defined in Claim 24.
47. A poly (cyanoacrylate) material formed from a compound of the general formula (IE) given and defined in Claim 25.
48. A poly(cyanoacrylate) material formed from a compound of the general formula (IV) given and defined in Claim 26.
49. A poly(cyanoacrylate) material formed from a compound of the general formula (V) given and defined in Claim 28.
50. A poly(cyanoacrylate) film formed from a compound of the general formula (I) given and defined in Claim 23.
51. A poly (cyanoacrylate) film formed from a compound of the general formula (II) given and defined in Claim 24.
52. A poly(cyanoacrylate) film formed from a compound of the general formula (III) given and defined in Claim 25.
53. A poly(cyanoacrylate) film formed from a compound of the general formula (IV) given and defined in Claim 26.
54. A poly(cyanoacrylate) film formed from a compound of the general formula (V) given and defined in Claim 28.
55. A poly (cyanoacrylate) film according to any one of Claims
50-54, which is a single or multi-layer Langmuir-Blodgett film.
56. Poly(cyanoacrylate) nanocapsules formed from a compound of the general formula (I) given and defined in Claim 23.
57. Poly (cyanoacrylate) nanocapsules formed from a compound of the general formula (E) given and defined in Claim 24.
58. Poly (cyanoacrylate) nanocapsules formed from a compound of the general formula (IE) given and defined in Claim 25.
59. Poly(cyanoacrylate) nanocapsules formed from a compound of the general formula (IV) given and defined in Claim 26.
60. Poly(cyanoacrylate) nanocapsules formed from a compound of the general formula (V) given and defined in Claim 28.
61. Poly (cyanoacrylate) nanocapsules according to any one of Claims 56-60 containing an active agent.
62. Poly (cyanoacrylate) nanocapsules according to Claim 61, wherein the active agent is a drug.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/IE1994/000018 WO1995026371A1 (en) | 1994-03-28 | 1994-03-28 | Intermediates for the preparation of poly(cyanoacrylates) and applications of the poly(cyanoacrylates) so prepared |
AU62897/94A AU6289794A (en) | 1994-03-28 | 1994-03-28 | Intermediates for the preparation of poly(cyanoacrylates) and applications of the poly(cyanoacrylates) so prepared |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/IE1994/000018 WO1995026371A1 (en) | 1994-03-28 | 1994-03-28 | Intermediates for the preparation of poly(cyanoacrylates) and applications of the poly(cyanoacrylates) so prepared |
Publications (1)
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PCT/IE1994/000018 WO1995026371A1 (en) | 1994-03-28 | 1994-03-28 | Intermediates for the preparation of poly(cyanoacrylates) and applications of the poly(cyanoacrylates) so prepared |
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AU (1) | AU6289794A (en) |
WO (1) | WO1995026371A1 (en) |
Cited By (3)
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WO1998005920A1 (en) * | 1996-08-08 | 1998-02-12 | William Marsh Rice University | Macroscopically manipulable nanoscale devices made from nanotube assemblies |
US10347463B2 (en) | 2016-12-09 | 2019-07-09 | Fei Company | Enhanced charged particle beam processes for carbon removal |
CN114796591A (en) * | 2022-06-06 | 2022-07-29 | 北京康派特医疗器械有限公司 | Cyanoacrylate medical adhesive and preparation method and application thereof |
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Cited By (5)
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WO1998005920A1 (en) * | 1996-08-08 | 1998-02-12 | William Marsh Rice University | Macroscopically manipulable nanoscale devices made from nanotube assemblies |
US7357906B2 (en) | 1996-08-08 | 2008-04-15 | William Marsh Rice University | Method for fractionating single-wall carbon nanotubes |
US7959779B2 (en) | 1996-08-08 | 2011-06-14 | William Marsh Rice University | Macroscopically manipulable nanoscale devices made from nanotube assemblies |
US10347463B2 (en) | 2016-12-09 | 2019-07-09 | Fei Company | Enhanced charged particle beam processes for carbon removal |
CN114796591A (en) * | 2022-06-06 | 2022-07-29 | 北京康派特医疗器械有限公司 | Cyanoacrylate medical adhesive and preparation method and application thereof |
Also Published As
Publication number | Publication date |
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AU6289794A (en) | 1995-10-17 |
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