WO1995024261B1 - Microfabricated particle filter - Google Patents

Microfabricated particle filter

Info

Publication number
WO1995024261B1
WO1995024261B1 PCT/US1995/002754 US9502754W WO9524261B1 WO 1995024261 B1 WO1995024261 B1 WO 1995024261B1 US 9502754 W US9502754 W US 9502754W WO 9524261 B1 WO9524261 B1 WO 9524261B1
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
filter
film structure
slits
sacrificial layer
Prior art date
Application number
PCT/US1995/002754
Other languages
French (fr)
Other versions
WO1995024261A1 (en
Filing date
Publication date
Priority claimed from US08/207,457 external-priority patent/US5651900A/en
Application filed filed Critical
Priority to JP52356295A priority Critical patent/JP3741440B2/en
Priority to AU19801/95A priority patent/AU1980195A/en
Priority to EP95912743A priority patent/EP0749352B1/en
Publication of WO1995024261A1 publication Critical patent/WO1995024261A1/en
Publication of WO1995024261B1 publication Critical patent/WO1995024261B1/en

Links

Definitions

  • step of providing a first thin film structure includes the substeps of providing a wafer, growing a second sacrificial layer on said wafer, growing said first structural layer on said second sacrificial layer, and patterning said first structural layer; and the method further comprises a step of etching said second sacrificial layer after said second thin film structure is formed whereby the wafer may be reused.
  • the filter of claim 1 further including at least one reinforcing rib.
  • a filter comprising: a first thin film structure having openings therethrough; and a second thin film structure having openings therethrough, said second thin film structure positioned relative to said first thin film structure such that said openings of said first thin film structure are partially blocked by said second thin film structure and said openings of said second thin film structure are partially blocked by said first thin film structure to produce pores of a substantially uniform predetermined width, said pores being spaces between said first thin film structure and said second thin film structure.
  • a method for fabricating a filter comprising: providing a first thin film structure having openings therethrough; forming a first sacrificial layer over at least part of said first thin film structure; forming a second thin film structure over said first thin film structure and said first sacrificial layer, said first sacrificial layer and said second thin film structure blocking said openings of said first thin film structure, and said second thin film structure having openings therethrough, said openings exposing a portion of said first sacrificial layer; and etching said first sacrificial layer.
  • said pores have a length between about 1000 angstroms and about 5000 angstroms.
  • the filter of claim 1 further comprising at least one additional thin film structure having pores, and a polymer matrix holding said thin-film structures.
  • step of providing a first thin film structure includes forming a reinforcing rib in a trench on a substrate.
  • said first sacrificial layer is formed by a chemical reaction at an exposed surface of said first thin film structure.
  • said first thin film structure includes silicon and said chemical reaction is an oxidation.
  • said anchor layer includes a material from the group consisting of alumina and silicon nitride.
  • step of forming said second thin film structure includes etching back said second thin film structure without patterning.
  • the method of claim 39 further including: after forming said second thin film structure and before etching said first sacrificial layer, doping an exposed surface of said first and second thin film structure with boron; and after etching said first sacrificial layer, partially etching an undoped portion of said first and second thin film structures; and wherein said first and second thin film structures include silicon.
  • step of forming said second thin film structure includes patterning openings over unetched portions of said first thin film structure.
  • step of forming said first sacrificial layer includes etching anchoring holes in said first sacrificial layer to expose said first thin film structure.
  • the method of claim 43 further including, after forming said first sacrificial layer and before forming said second thin film layer, partially etching through said first thin film structure where it is exposed by said anchoring holes.
  • the method of claim 43 further including, after forming said first sacrificial layer and before forming said second thin film layer, etching through said first thin film structure where it is exposed by said anchoring holes and partly etching underneath said first thin film structure where it is exposed by said anchoring holes to provide a space for a rivet-like shape of said second thin film structure.
  • the method of claim 3 further including: etching trenches to form filter islands; applying and curing a polymer matrix; and patterning entrance holes in said polymer matrix.
  • the method of claim 3 further including: after etching said first sacrificial layer, growing a thin film on walls of pores of said filter.
  • the method of claim 47 further including: etching said thin film.
  • a method for fabricating a filter with short pore length comprising: forming a. first structural layer over a sacrificial top layer of a substrate; forming a pore sacrificial layer whose thickness defines a width of said pores; forming a second structural layer covering vertical sidewalls of a sidewall support sacrificial layer, a thickness of said second structural layer defining a length of said pores; anisotropically etching said second structural layer to remove its horizontal portions; forming an entrance hole sacrificial layer covering a bottom portion of said second structural layer and leaving exposed a top portion of said second structural layer; forming a third structural layer; etching entrance holes in said third structural layer; and etching all sacrificial layers filling said pores and underlying said filter. 50. The method of claim 49 wherein said pore sacrificial layer is formed after etching exit holes in said first structural layer and forming said sidewall support sacrificial layer.
  • a method for operating a molecular crystallization valve comprising: providing a filter having pores coated with a straight chain molecular coating capable of effectively crystallizing below a specific freezing point; and controlling a temperature of said coating.
  • a method for operating a molecular polarization valve comprising: providing a filter having pores coated with highly polarizable chain molecules; and controlling an electric field across said pores.

Abstract

A thin film filter portion (20) comprises a plurality of members (22) and (24) interconnected by bridges (26), forming walls of a plurality of port slits (28). The width (W) of slits (28) corresponds to diameter of the largest spherical particles that can pass through the slits (28) while the length (L) of slits (28) is the shortest path through the slits (28). The dimension of the slit width (W) can be precisely controlled and as small as about 50 angstroms. The filter portions (20) can withstand high temperatures and harsh solvents.

Description

4. The method of claim 3, wherein said step of providing a first thin film structure includes the substeps of providing a wafer, growing a second sacrificial layer on said wafer, growing said first structural layer on said second sacrificial layer, and patterning said first structural layer; and the method further comprises a step of etching said second sacrificial layer after said second thin film structure is formed whereby the wafer may be reused.
5. A filter produced by the method of claim 3.
6. The filter of claim 1 further including at least one reinforcing rib.
7. The filter of claim 6, wherein said rib has a height of between about 0.01 mm and about 0.25 mm.
8. The filter of claim 1, wherein said width is at most about 3000 angstroms.
9. The filter of claim 8, wherein said width is at most about 2000 angstroms.
10. The filter of claim 9, wherein said width is at most about 1000 angstroms.
11. The filter of claim 8, 9 or 10 wherein said width is substantially uniform.
12. The filter of claim 1 wherein said thin film structures include silicon.
13. The filter of claim 12 wherein walls of said pores are doped with boron.
/WENDED SHEET(ARTICLE 19) AMENDED CLAIMS
[received by the International Bureau on 7 June 1995 (07.06.95); original claims 1 and 3 amended; new claims 6-52 added; remaining claims unchanged (8 pages)]
1. A filter, comprising: a first thin film structure having openings therethrough; and a second thin film structure having openings therethrough, said second thin film structure positioned relative to said first thin film structure such that said openings of said first thin film structure are partially blocked by said second thin film structure and said openings of said second thin film structure are partially blocked by said first thin film structure to produce pores of a substantially uniform predetermined width, said pores being spaces between said first thin film structure and said second thin film structure.
2. The filter of claim 1, wherein said pores have a length in the range of about 1 micron to about 10000 microns.
3. A method for fabricating a filter, the method comprising: providing a first thin film structure having openings therethrough; forming a first sacrificial layer over at least part of said first thin film structure; forming a second thin film structure over said first thin film structure and said first sacrificial layer, said first sacrificial layer and said second thin film structure blocking said openings of said first thin film structure, and said second thin film structure having openings therethrough, said openings exposing a portion of said first sacrificial layer; and etching said first sacrificial layer. 14. The filter of claim 13 wherein said pores have a length between about 1000 angstroms and about 5000 angstroms.
15. The filter of claim 2 wherein said length is in the range of about 2 microns to about 4 microns.
16. The filter of claim 1 wherein said pores are straight-through pores.
17. The filter of claim 1 wherein said pores have ends, said ends not being in line of sight of each other.
18. The filter of claim 1 wherein said second structure formes a rivet-like shape underneath said first structure.
19. The filter of claim 1 wherein said pores have a length between about 500 angstroms and about 5000 angstroms.
20. The filter of claim 1 further comprising at least one additional thin film structure having pores, and a polymer matrix holding said thin-film structures.
21. The filter of claim 1 wherein said first and second thin film structures are conductive and are not in electrical contact.
22. The filter of claim 21 wherein at least one of said first and second thin film structures includes a metal film. 23. The filter of claim 22 having metal films on opposite sides.
24. The filter of claim 1 wherein said thin film structures have hydrophobic surfaces.
25. The filter of claim 24 wherein said width is less than about 3000 angstroms.
26. The filter of claim 1 wherein said thin film structures have surfaces with monoclonal antibodies bonded thereto.
27. The filter of claim 1 wherein said thin film structures have surfaces with a chemical coating covalently bonded thereto.
28. The filter of claim 27 wherein said chemical coating can effectively crystallize below a freezing point to stop flow through said pores.
29. The filter of claim 27 wherein said chemical coating is highly polarizable chain molecules.
30. The method of claim 3 wherein said step of providing a first thin film structure includes forming a reinforcing rib in a trench on a substrate.
31. The method of claim 30 wherein said first thin film structure is grown by chemical vapor deposition.
32. The method of claim 3 wherein said first sacrificial layer is formed by a chemical reaction at an exposed surface of said first thin film structure. 33. The method of claim 32 wherein said first thin film structure includes silicon and said chemical reaction is an oxidation.
34. The method of claim 32 wherein before said step of forming said first sacrificial layer, a portion of an initially exposed surface of said first thin film structure is covered with an anchor layer.
35. The method of claim 34 wherein said first and second thin film structures are conductive and said anchor layer is insulating.
36. The method of claim 35 wherein said first and second thin film structures include silicon and said chemical reaction is an oxidation.
37. The method of claim 36 wherein said anchor layer includes a material from the group consisting of alumina and silicon nitride.
38. The method of claim 3 wherein said second thin film structure is grown by chemical vapor deposition.
39. The method of claim 38 wherein said step of forming said second thin film structure includes etching back said second thin film structure without patterning.
40. The method of claim 39 wherein said first thin film structure is a sidewall structure.
41. The method of claim 39 further including: after forming said second thin film structure and before etching said first sacrificial layer, doping an exposed surface of said first and second thin film structure with boron; and after etching said first sacrificial layer, partially etching an undoped portion of said first and second thin film structures; and wherein said first and second thin film structures include silicon.
42. The method of claim 3 wherein said step of forming said second thin film structure includes patterning openings over unetched portions of said first thin film structure.
43. The method of claim 3 wherein said step of forming said first sacrificial layer includes etching anchoring holes in said first sacrificial layer to expose said first thin film structure.
44. The method of claim 43 further including, after forming said first sacrificial layer and before forming said second thin film layer, partially etching through said first thin film structure where it is exposed by said anchoring holes.
45. The method of claim 43 further including, after forming said first sacrificial layer and before forming said second thin film layer, etching through said first thin film structure where it is exposed by said anchoring holes and partly etching underneath said first thin film structure where it is exposed by said anchoring holes to provide a space for a rivet-like shape of said second thin film structure. 46. The method of claim 3 further including: etching trenches to form filter islands; applying and curing a polymer matrix; and patterning entrance holes in said polymer matrix.
47. The method of claim 3 further including: after etching said first sacrificial layer, growing a thin film on walls of pores of said filter.
48. The method of claim 47 further including: etching said thin film.
49. A method for fabricating a filter with short pore length, comprising: forming a. first structural layer over a sacrificial top layer of a substrate; forming a pore sacrificial layer whose thickness defines a width of said pores; forming a second structural layer covering vertical sidewalls of a sidewall support sacrificial layer, a thickness of said second structural layer defining a length of said pores; anisotropically etching said second structural layer to remove its horizontal portions; forming an entrance hole sacrificial layer covering a bottom portion of said second structural layer and leaving exposed a top portion of said second structural layer; forming a third structural layer; etching entrance holes in said third structural layer; and etching all sacrificial layers filling said pores and underlying said filter. 50. The method of claim 49 wherein said pore sacrificial layer is formed after etching exit holes in said first structural layer and forming said sidewall support sacrificial layer.
51. A method for operating a molecular crystallization valve, comprising: providing a filter having pores coated with a straight chain molecular coating capable of effectively crystallizing below a specific freezing point; and controlling a temperature of said coating.
52. A method for operating a molecular polarization valve, comprising: providing a filter having pores coated with highly polarizable chain molecules; and controlling an electric field across said pores.
PCT/US1995/002754 1994-03-07 1995-03-07 Microfabricated particle filter WO1995024261A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP52356295A JP3741440B2 (en) 1994-03-07 1995-03-07 Micro assembled particle filter
AU19801/95A AU1980195A (en) 1994-03-07 1995-03-07 Microfabricated particle filter
EP95912743A EP0749352B1 (en) 1994-03-07 1995-03-07 Microfabricated particle filter

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/207,457 US5651900A (en) 1994-03-07 1994-03-07 Microfabricated particle filter
US08/207,457 1994-03-07

Publications (2)

Publication Number Publication Date
WO1995024261A1 WO1995024261A1 (en) 1995-09-14
WO1995024261B1 true WO1995024261B1 (en) 1995-11-09

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1995/002754 WO1995024261A1 (en) 1994-03-07 1995-03-07 Microfabricated particle filter

Country Status (5)

Country Link
US (2) US5651900A (en)
EP (1) EP0749352B1 (en)
JP (2) JP3741440B2 (en)
AU (1) AU1980195A (en)
WO (1) WO1995024261A1 (en)

Families Citing this family (109)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5651900A (en) * 1994-03-07 1997-07-29 The Regents Of The University Of California Microfabricated particle filter
US5770076A (en) * 1994-03-07 1998-06-23 The Regents Of The University Of California Micromachined capsules having porous membranes and bulk supports
US5798042A (en) * 1994-03-07 1998-08-25 Regents Of The University Of California Microfabricated filter with specially constructed channel walls, and containment well and capsule constructed with such filters
US5985328A (en) * 1994-03-07 1999-11-16 Regents Of The University Of California Micromachined porous membranes with bulk support
US6107102A (en) * 1995-06-07 2000-08-22 Regents Of The University Of California Therapeutic microdevices and methods of making and using same
US5797898A (en) * 1996-07-02 1998-08-25 Massachusetts Institute Of Technology Microchip drug delivery devices
US7070590B1 (en) * 1996-07-02 2006-07-04 Massachusetts Institute Of Technology Microchip drug delivery devices
US6090726A (en) * 1996-07-05 2000-07-18 National Science Council Pretreatment method of a silicon wafer using nitric acid
US5938923A (en) * 1997-04-15 1999-08-17 The Regents Of The University Of California Microfabricated filter and capsule using a substrate sandwich
US6290685B1 (en) 1998-06-18 2001-09-18 3M Innovative Properties Company Microchanneled active fluid transport devices
US6524488B1 (en) 1998-06-18 2003-02-25 3M Innovative Properties Company Method of filtering certain particles from a fluid using a depth loading filtration media
US6080243A (en) * 1998-06-18 2000-06-27 3M Innovative Properties Company Fluid guide device having an open structure surface for attachement to a fluid transport source
US6265026B1 (en) 1998-01-16 2001-07-24 The Regents Of The University Of California Vapor phase deposition
US6376549B1 (en) * 1998-09-17 2002-04-23 Akesis Pharmaceuticals, Inc. Metforimin-containing compositions for the treatment of diabetes
US6852760B1 (en) * 1998-09-17 2005-02-08 Akesis Pharmaceuticals, Inc. Compositions and methods for treatment for glucose metabolism disorders
US6355270B1 (en) 1999-01-11 2002-03-12 The Regents Of The University Of California Particles for oral delivery of peptides and proteins
WO2000042231A2 (en) 1999-01-15 2000-07-20 The Regents Of The University Of California Polycrystalline silicon germanium films for forming micro-electromechanical systems
US6635163B1 (en) * 1999-06-01 2003-10-21 Cornell Research Foundation, Inc. Entropic trapping and sieving of molecules
US6273938B1 (en) 1999-08-13 2001-08-14 3M Innovative Properties Company Channel flow filter
CA2381951A1 (en) 1999-08-18 2001-02-22 Microchips, Inc. Thermally-activated microchip chemical delivery devices
US6454839B1 (en) 1999-10-19 2002-09-24 3M Innovative Properties Company Electrofiltration apparatus
US6822304B1 (en) * 1999-11-12 2004-11-23 The Board Of Trustees Of The Leland Stanford Junior University Sputtered silicon for microstructures and microcavities
EP1233927A4 (en) * 1999-11-17 2003-01-08 Univ California Apparatus and method for forming a membrane with nanometer scale pores
US20030205552A1 (en) * 1999-11-17 2003-11-06 The Regents Of The University Of California Method of forming a membrane with nanometer scale pores and application to biofiltration
EP1229901B1 (en) 1999-11-17 2009-03-18 Boston Scientific Limited Microfabricated devices for the delivery of molecules into a carrier fluid
US6982058B2 (en) * 1999-12-08 2006-01-03 Baxter International, Inc. Method for fabricating three dimensional structures
CA2361930A1 (en) 1999-12-08 2001-06-14 Baxter International Inc. Microporous filter membrane, method of making microporous filter membrane and separator employing microporous filter membranes
US20030168396A1 (en) * 1999-12-08 2003-09-11 Jacobson James D. Monolithic filter body and fabrication technique
WO2001041736A2 (en) * 1999-12-10 2001-06-14 Massachusetts Institute Of Technology Microchip devices for delivery of molecules and methods of fabrication thereof
EP1108677B1 (en) * 1999-12-15 2006-09-27 Asulab S.A. Method of hermetic In Situ encapsulation of microsystems
ATE499988T1 (en) 2000-03-02 2011-03-15 Microchips Inc MICROMECHANICAL DEVICES AND METHODS FOR STORAGE AND SELECTIVE EXPOSURE OF CHEMICALS
AU2001265128A1 (en) 2000-05-30 2001-12-11 Massachusetts Institute Of Technology Methods and devices for sealing microchip reservoir devices
NL1016030C1 (en) 2000-08-28 2002-03-01 Aquamarijn Holding B V Spraying device with a nozzle plate, a nozzle plate, as well as methods for manufacturing and applying such a nozzle plate.
US6464347B2 (en) * 2000-11-30 2002-10-15 Xerox Corporation Laser ablated filter
US20020128179A1 (en) * 2000-12-01 2002-09-12 Tacon William C. Shaped microparticles for pulmonary drug delivery
US6881198B2 (en) * 2001-01-09 2005-04-19 J. David Brown Glaucoma treatment device and method
US7811768B2 (en) 2001-01-26 2010-10-12 Aviva Biosciences Corporation Microdevice containing photorecognizable coding patterns and methods of using and producing the same
US7015047B2 (en) * 2001-01-26 2006-03-21 Aviva Biosciences Corporation Microdevices having a preferential axis of magnetization and uses thereof
US7316769B2 (en) * 2001-03-19 2008-01-08 Cornell Research Foundation, Inc. Length-dependent recoil separation of long molecules
US6811695B2 (en) * 2001-06-07 2004-11-02 Nanostream, Inc. Microfluidic filter
US20030010638A1 (en) * 2001-06-15 2003-01-16 Hansford Derek J. Nanopump devices and methods
EP1399135B1 (en) * 2001-06-28 2004-12-29 Microchips, Inc. Methods for hermetically sealing microchip reservoir devices
US7393517B2 (en) * 2001-08-23 2008-07-01 The Ohio State University Shaped microcomponents via reactive conversion of synthetic microtemplates
EP1424957A2 (en) 2001-09-14 2004-06-09 Francis J. Martin Microfabricated nanopore device for sustained release of therapeutic agent
US7371258B2 (en) 2001-10-26 2008-05-13 St. Jude Medical, Inc. Valved prosthesis with porous substrate
US20030080060A1 (en) * 2001-10-30 2003-05-01 .Gulvin Peter M Integrated micromachined filter systems and methods
US6780786B2 (en) * 2001-11-26 2004-08-24 The Regents Of The University Of California Method for producing a porous silicon film
AU2002358803A1 (en) * 2001-12-31 2003-07-15 Asm Automation Sensorik Messtechnik Gmbh Magnetostrictive sensor element
US20040060902A1 (en) * 2002-02-05 2004-04-01 Evans John D. Microprotrusion array and methods of making a microprotrusion
US20030150791A1 (en) * 2002-02-13 2003-08-14 Cho Steven T. Micro-fluidic anti-microbial filter
US20040038260A1 (en) * 2002-04-18 2004-02-26 Imedd, Inc. Nanopump device for analyzing DNA sequences
CN1817421B (en) * 2002-07-25 2012-07-04 大日本印刷株式会社 Thin film supporting substrate used in filter for hydrogen production and method for manufacturing filter for hydrogen production
AU2003272310A1 (en) * 2002-09-11 2004-04-30 The Cleveland Clinic Foundation Ultrafiltration membrane, device, bioartificial organ and methods
US20040064050A1 (en) * 2002-09-20 2004-04-01 Jun Liu System and method for screening tissue
FR2844725B1 (en) * 2002-09-24 2005-01-07 Commissariat Energie Atomique METHOD FOR MANUFACTURING BIOMIMETIC MEMBRANE, BIOMIMETIC MEMBRANE, AND APPLICATIONS THEREOF
US20040060867A1 (en) * 2002-09-27 2004-04-01 Bmc Industries, Inc. Membrane support devices and methods of manufacturing
JP3642340B2 (en) * 2003-03-28 2005-04-27 ダイキン工業株式会社 Hazardous substance removing method, air purifying filter, wiping sheet and other harmful substance removing material used therefor, and storage method thereof
ES2387062T3 (en) * 2003-09-23 2012-09-12 Lilliputian Systems, Inc. Fuel cell with tension-resistant thin film membranes
US8029503B2 (en) * 2003-10-11 2011-10-04 The Regents Of The University Of California Nerve repair by selective surgical repair of axons
WO2005039668A2 (en) * 2003-10-21 2005-05-06 Boiarski Anthony A Implantable drug delivery device for sustained release of therapeutic agent
US7226540B2 (en) * 2004-02-24 2007-06-05 Becton, Dickinson And Company MEMS filter module
US20050194303A1 (en) * 2004-03-02 2005-09-08 Sniegowski Jeffry J. MEMS flow module with filtration and pressure regulation capabilities
US7544176B2 (en) * 2005-06-21 2009-06-09 Becton, Dickinson And Company Glaucoma implant having MEMS flow module with flexing diaphragm for pressure regulation
US20060036207A1 (en) * 2004-02-24 2006-02-16 Koonmen James P System and method for treating glaucoma
US20060219627A1 (en) * 2005-03-31 2006-10-05 Rodgers M S MEMS filter module with concentric filtering walls
US7384550B2 (en) * 2004-02-24 2008-06-10 Becton, Dickinson And Company Glaucoma implant having MEMS filter module
DE102005005551B4 (en) * 2004-03-03 2015-10-01 Robert Bosch Gmbh Micromechanical component with a membrane and method for producing such a component
KR20050093018A (en) * 2004-03-18 2005-09-23 한국과학기술연구원 Efficient 3-d nanostructured membranes
US7323033B2 (en) * 2004-04-30 2008-01-29 Lucent Technologies Inc. Nanostructured surfaces having variable permeability
EP1748836A2 (en) * 2004-05-03 2007-02-07 Friesland Brands B.V. Device with a membrane on a carrier, as well as a method for manufacturing such a membrane
FR2871291B1 (en) * 2004-06-02 2006-12-08 Tracit Technologies PROCESS FOR TRANSFERRING PLATES
EP1807171A1 (en) * 2004-10-15 2007-07-18 Cuno Incorporated Pleated multi-layer filter media and cartridge
US7413846B2 (en) * 2004-11-15 2008-08-19 Microchips, Inc. Fabrication methods and structures for micro-reservoir devices
WO2006108053A2 (en) * 2005-04-05 2006-10-12 The Ohio State University Diffusion delivery systems and methods of fabrication
KR100558932B1 (en) * 2005-04-21 2006-03-10 주식회사 엠제이스마트 테크놀러지 Manufacturing method of a ceramic membrane and ceramic membrane that is made by it membrane
CA2621993A1 (en) * 2005-09-16 2007-03-29 Bg Implant, Inc. Glaucoma treatment devices and methods
US20070151920A1 (en) * 2005-12-06 2007-07-05 Kay Ronald J System and method of micromolded filtration microstructure and devices
WO2007092852A2 (en) 2006-02-06 2007-08-16 Mynosys Cellular Devices, Inc. Microsurgical cutting instruments
US20070275035A1 (en) * 2006-05-24 2007-11-29 Microchips, Inc. Minimally Invasive Medical Implant Devices for Controlled Drug Delivery
JP4821466B2 (en) * 2006-07-03 2011-11-24 富士ゼロックス株式会社 Droplet discharge head
WO2008054180A1 (en) * 2006-11-02 2008-05-08 Digital Bio Technology Co., Ltd. Channel filter having surface topology for filtering micro-particles and method for manufacturing of the same
EP2125171A4 (en) 2007-01-10 2012-05-16 Univ Michigan Ultrafiltration membrane, device, bioartificial organ, and related methods
US20080277332A1 (en) * 2007-05-11 2008-11-13 Becton, Dickinson And Company Micromachined membrane filter device for a glaucoma implant and method for making the same
EP2200931B1 (en) 2007-09-19 2017-06-07 The Charles Stark Draper Laboratory, Inc. Microfluidic structures with circular cross-section
US20090186190A1 (en) * 2008-01-17 2009-07-23 Shan Guan Silicon filter
US20090234332A1 (en) * 2008-03-17 2009-09-17 The Charles Stark Draper Laboratory, Inc Artificial microvascular device and methods for manufacturing and using the same
WO2009158279A1 (en) * 2008-06-24 2009-12-30 The University Of North Carolina At Chapel Hill High fidelity through hole film, and associated method
US8173115B2 (en) * 2008-07-29 2012-05-08 The Board Of Regents Of The University Of Texas System Particle compositions with a pre-selected cell internalization mode
EP2355864B1 (en) 2008-11-14 2016-11-09 The Board of Regents of The University of Texas System Nanochanneled device and related methods
CN102019114B (en) * 2009-09-21 2012-11-14 庄淑媛 Nanoscale filter material structure for respiration and manufacturing method thereof
WO2011044116A2 (en) * 2009-10-05 2011-04-14 The Charles Stark Draper Laboratory, Inc. Three-dimensional microfluidic platforms and methods of use and manufacture thereof
US20110082563A1 (en) * 2009-10-05 2011-04-07 The Charles Stark Draper Laboratory, Inc. Microscale multiple-fluid-stream bioreactor for cell culture
US8101129B2 (en) 2009-10-13 2012-01-24 Chuang Shu-Yuan Nano filter structure for breathing and manufacturing method thereof
AU2013273668B2 (en) * 2009-12-14 2016-05-12 3M Innovative Properties Company Microperforated polymeric film and methods of making and using the same
TWI506070B (en) 2009-12-14 2015-11-01 3M Innovative Properties Co Microperforated polymeric film and methods of making and using the same
SG181759A1 (en) 2009-12-21 2012-07-30 Janssen R & D Ireland Degradable removable implant for the sustained release of an active compound
US20110288497A1 (en) 2010-05-19 2011-11-24 Nanomedical Systems, Inc. Nano-Scale Coatings and Related Methods Suitable for In-Vivo Use
JP2012101196A (en) * 2010-11-11 2012-05-31 Tokyo Electron Ltd Method for manufacturing filter for filtration
US8956696B2 (en) * 2011-02-10 2015-02-17 Inficon Gmbh Ultra-thin membrane for chemical analyzer and related method for forming membrane
US20130043559A1 (en) * 2011-08-17 2013-02-21 International Business Machines Corporation Trench formation in substrate
JP2014057934A (en) * 2012-09-19 2014-04-03 Tokyo Electron Ltd Method for manufacturing filter for filtration
EP2724773A1 (en) * 2012-10-25 2014-04-30 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Nanosieve composite membrane
US9956529B2 (en) * 2014-04-03 2018-05-01 New York University Microfabricated ion-selective filter for filtration of ions and molecules
US10736778B2 (en) 2014-12-31 2020-08-11 Microoptx Inc. Glaucoma treatment devices and methods
EP3355983A4 (en) 2015-09-30 2019-06-26 Microoptx Inc. Dry eye treatment devices and methods
WO2020045695A1 (en) * 2018-08-28 2020-03-05 한국에너지기술연구원 Method for manufacturing ultrathin graphene membrane having nanopores
US11161066B2 (en) 2018-09-13 2021-11-02 International Business Machines Corporation Micro-machined filter for magnetic particles
US11833477B2 (en) 2020-10-09 2023-12-05 Global Life Sciences Solutions Usa, Llc Tangential flow cassette-HF emulation
CN114534647B (en) * 2022-01-04 2023-04-18 北京航空航天大学 Film emulsifying device and manufacturing method thereof

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2246380A (en) * 1938-02-19 1941-06-17 Edward O Norris Inc Electrolytic method of producing screens
US2226381A (en) * 1938-04-22 1940-12-24 Edward O Norris Inc Process of producing electrolytic foraminous sheets
US2226383A (en) * 1938-08-31 1940-12-24 Edward O Norris Inc Process of producing foraminous sheets
US2226384A (en) * 1938-12-14 1940-12-24 Edward O Norris Inc Process of electrolytically producing foraminous sheets
US3329541A (en) * 1960-05-20 1967-07-04 Buckbee Mears Co Method of forming fine mesh screens
US3502455A (en) * 1967-10-09 1970-03-24 Bendix Corp Method of fabricating a thin film vitreous continuous membrane product
US3600147A (en) * 1970-01-02 1971-08-17 Charles L Mckinnis Method of making a glass semipermeable membrane
US4063271A (en) * 1972-07-26 1977-12-13 Texas Instruments Incorporated FET and bipolar device and circuit process with maximum junction control
NL7416645A (en) * 1974-12-20 1976-06-22 Tno DYNAMICALLY SHAPED MEMBRANE.
US3962052A (en) * 1975-04-14 1976-06-08 International Business Machines Corporation Process for forming apertures in silicon bodies
CH625966A5 (en) * 1977-07-15 1981-10-30 Kilcher Chemie Ag
JPS5636143A (en) * 1979-08-31 1981-04-09 Hitachi Ltd Manufacture of semiconductor device
EP0039179B1 (en) * 1980-04-28 1985-07-24 National Research Development Corporation Improvements in or relating to porous glass
US4307507A (en) * 1980-09-10 1981-12-29 The United States Of America As Represented By The Secretary Of The Navy Method of manufacturing a field-emission cathode structure
DE3681663D1 (en) * 1985-03-06 1991-10-31 Memtec Ltd CHANGE IN PORE SIZE DISTRIBUTION.
US4689150A (en) * 1985-03-07 1987-08-25 Ngk Insulators, Ltd. Separation membrane and process for manufacturing the same
DE3546091A1 (en) * 1985-12-24 1987-07-02 Kernforschungsz Karlsruhe CROSS-CURRENT MICROFILTER
US4698900A (en) * 1986-03-27 1987-10-13 Texas Instruments Incorporated Method of making a non-volatile memory having dielectric filled trenches
US4853001A (en) * 1986-06-06 1989-08-01 Ppg Industries, Inc. Porous inorganic siliceous-containing gas enriching material and process of manufacture and use
US4797175A (en) * 1987-03-09 1989-01-10 Hughes Aircraft Company Method for making solid element fluid filter for removing small particles from fluids
US5238613A (en) * 1987-05-20 1993-08-24 Anderson David M Microporous materials
DE3879771D1 (en) * 1987-05-27 1993-05-06 Siemens Ag ETCHING METHOD FOR PRODUCING HOLE OPENINGS OR TRENCHES IN N-DOPED SILICON.
NL8702759A (en) * 1987-11-19 1989-06-16 Hoogovens Groep Bv METHOD FOR MANUFACTURING A MICRO-PERMEABLE MEMBRANE AND APPARATUS FOR APPLYING THIS MEMBRANE TO A CARRIER
JPH01138110A (en) * 1987-11-25 1989-05-31 Showa Denko Kk Pipe made of diamond and production thereof
SE463654B (en) * 1988-03-11 1991-01-07 Nils Goeran Stemme MEMBRANE STRUCTURE AS WELL AS MANUFACTURING THEM
SU1680270A1 (en) * 1989-05-12 1991-09-30 Inzh Ts Ekologiya V Svarochnom Filtering element
JPH0338061A (en) * 1989-07-05 1991-02-19 Fujitsu Ltd Semiconductor memory
FR2660874B1 (en) * 1990-04-12 1992-06-12 Aluminum Co Of America SEMI-PERMEABLE POROUS INORGANIC COMPOSITE MEMBRANE AND PREPARATION METHOD.
US5131978A (en) * 1990-06-07 1992-07-21 Xerox Corporation Low temperature, single side, multiple step etching process for fabrication of small and large structures
US5271801A (en) * 1990-07-09 1993-12-21 Commissariat A L'energie Atomique Process of production of integrated optical components
ATE154259T1 (en) * 1991-02-28 1997-06-15 Heinze Dyconex Patente METHOD FOR PRODUCING A COMPOSITE BODY CONSISTING OF MICRO SCREEN
DE4202454C1 (en) * 1992-01-29 1993-07-29 Siemens Ag, 8000 Muenchen, De
US5234594A (en) * 1992-06-12 1993-08-10 The United States Of America As Represented By The Secretary Of The Navy Nanochannel filter
US5275766A (en) * 1992-10-30 1994-01-04 Corning Incorporate Method for making semi-permeable polymer membranes
DE69435124D1 (en) * 1993-10-04 2008-09-25 Res Internat Inc Micromachined filters
US5651900A (en) * 1994-03-07 1997-07-29 The Regents Of The University Of California Microfabricated particle filter

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