WO1995024261B1 - Microfabricated particle filter - Google Patents
Microfabricated particle filterInfo
- Publication number
- WO1995024261B1 WO1995024261B1 PCT/US1995/002754 US9502754W WO9524261B1 WO 1995024261 B1 WO1995024261 B1 WO 1995024261B1 US 9502754 W US9502754 W US 9502754W WO 9524261 B1 WO9524261 B1 WO 9524261B1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- thin film
- filter
- film structure
- slits
- sacrificial layer
- Prior art date
Links
- 239000002245 particle Substances 0.000 title abstract 2
- 239000010409 thin film Substances 0.000 abstract description 54
- 239000002904 solvent Substances 0.000 abstract 1
- 239000011148 porous material Substances 0.000 description 21
- 238000005530 etching Methods 0.000 description 17
- 238000004873 anchoring Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000007710 freezing Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000003014 reinforcing Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N AI2O3 Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N Silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229960000070 antineoplastic Monoclonal antibodies Drugs 0.000 description 1
- 230000000903 blocking Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000005712 crystallization Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229960000060 monoclonal antibodies Drugs 0.000 description 1
- 102000005614 monoclonal antibodies Human genes 0.000 description 1
- 108010045030 monoclonal antibodies Proteins 0.000 description 1
- 239000002103 nanocoating Substances 0.000 description 1
Definitions
- step of providing a first thin film structure includes the substeps of providing a wafer, growing a second sacrificial layer on said wafer, growing said first structural layer on said second sacrificial layer, and patterning said first structural layer; and the method further comprises a step of etching said second sacrificial layer after said second thin film structure is formed whereby the wafer may be reused.
- the filter of claim 1 further including at least one reinforcing rib.
- a filter comprising: a first thin film structure having openings therethrough; and a second thin film structure having openings therethrough, said second thin film structure positioned relative to said first thin film structure such that said openings of said first thin film structure are partially blocked by said second thin film structure and said openings of said second thin film structure are partially blocked by said first thin film structure to produce pores of a substantially uniform predetermined width, said pores being spaces between said first thin film structure and said second thin film structure.
- a method for fabricating a filter comprising: providing a first thin film structure having openings therethrough; forming a first sacrificial layer over at least part of said first thin film structure; forming a second thin film structure over said first thin film structure and said first sacrificial layer, said first sacrificial layer and said second thin film structure blocking said openings of said first thin film structure, and said second thin film structure having openings therethrough, said openings exposing a portion of said first sacrificial layer; and etching said first sacrificial layer.
- said pores have a length between about 1000 angstroms and about 5000 angstroms.
- the filter of claim 1 further comprising at least one additional thin film structure having pores, and a polymer matrix holding said thin-film structures.
- step of providing a first thin film structure includes forming a reinforcing rib in a trench on a substrate.
- said first sacrificial layer is formed by a chemical reaction at an exposed surface of said first thin film structure.
- said first thin film structure includes silicon and said chemical reaction is an oxidation.
- said anchor layer includes a material from the group consisting of alumina and silicon nitride.
- step of forming said second thin film structure includes etching back said second thin film structure without patterning.
- the method of claim 39 further including: after forming said second thin film structure and before etching said first sacrificial layer, doping an exposed surface of said first and second thin film structure with boron; and after etching said first sacrificial layer, partially etching an undoped portion of said first and second thin film structures; and wherein said first and second thin film structures include silicon.
- step of forming said second thin film structure includes patterning openings over unetched portions of said first thin film structure.
- step of forming said first sacrificial layer includes etching anchoring holes in said first sacrificial layer to expose said first thin film structure.
- the method of claim 43 further including, after forming said first sacrificial layer and before forming said second thin film layer, partially etching through said first thin film structure where it is exposed by said anchoring holes.
- the method of claim 43 further including, after forming said first sacrificial layer and before forming said second thin film layer, etching through said first thin film structure where it is exposed by said anchoring holes and partly etching underneath said first thin film structure where it is exposed by said anchoring holes to provide a space for a rivet-like shape of said second thin film structure.
- the method of claim 3 further including: etching trenches to form filter islands; applying and curing a polymer matrix; and patterning entrance holes in said polymer matrix.
- the method of claim 3 further including: after etching said first sacrificial layer, growing a thin film on walls of pores of said filter.
- the method of claim 47 further including: etching said thin film.
- a method for fabricating a filter with short pore length comprising: forming a. first structural layer over a sacrificial top layer of a substrate; forming a pore sacrificial layer whose thickness defines a width of said pores; forming a second structural layer covering vertical sidewalls of a sidewall support sacrificial layer, a thickness of said second structural layer defining a length of said pores; anisotropically etching said second structural layer to remove its horizontal portions; forming an entrance hole sacrificial layer covering a bottom portion of said second structural layer and leaving exposed a top portion of said second structural layer; forming a third structural layer; etching entrance holes in said third structural layer; and etching all sacrificial layers filling said pores and underlying said filter. 50. The method of claim 49 wherein said pore sacrificial layer is formed after etching exit holes in said first structural layer and forming said sidewall support sacrificial layer.
- a method for operating a molecular crystallization valve comprising: providing a filter having pores coated with a straight chain molecular coating capable of effectively crystallizing below a specific freezing point; and controlling a temperature of said coating.
- a method for operating a molecular polarization valve comprising: providing a filter having pores coated with highly polarizable chain molecules; and controlling an electric field across said pores.
Abstract
A thin film filter portion (20) comprises a plurality of members (22) and (24) interconnected by bridges (26), forming walls of a plurality of port slits (28). The width (W) of slits (28) corresponds to diameter of the largest spherical particles that can pass through the slits (28) while the length (L) of slits (28) is the shortest path through the slits (28). The dimension of the slit width (W) can be precisely controlled and as small as about 50 angstroms. The filter portions (20) can withstand high temperatures and harsh solvents.
Description
4. The method of claim 3, wherein said step of providing a first thin film structure includes the substeps of providing a wafer, growing a second sacrificial layer on said wafer, growing said first structural layer on said second sacrificial layer, and patterning said first structural layer; and the method further comprises a step of etching said second sacrificial layer after said second thin film structure is formed whereby the wafer may be reused.
5. A filter produced by the method of claim 3.
6. The filter of claim 1 further including at least one reinforcing rib.
7. The filter of claim 6, wherein said rib has a height of between about 0.01 mm and about 0.25 mm.
8. The filter of claim 1, wherein said width is at most about 3000 angstroms.
9. The filter of claim 8, wherein said width is at most about 2000 angstroms.
10. The filter of claim 9, wherein said width is at most about 1000 angstroms.
11. The filter of claim 8, 9 or 10 wherein said width is substantially uniform.
12. The filter of claim 1 wherein said thin film structures include silicon.
13. The filter of claim 12 wherein walls of said pores are doped with boron.
/WENDED SHEET(ARTICLE 19)
AMENDED CLAIMS
[received by the International Bureau on 7 June 1995 (07.06.95); original claims 1 and 3 amended; new claims 6-52 added; remaining claims unchanged (8 pages)]
1. A filter, comprising: a first thin film structure having openings therethrough; and a second thin film structure having openings therethrough, said second thin film structure positioned relative to said first thin film structure such that said openings of said first thin film structure are partially blocked by said second thin film structure and said openings of said second thin film structure are partially blocked by said first thin film structure to produce pores of a substantially uniform predetermined width, said pores being spaces between said first thin film structure and said second thin film structure.
2. The filter of claim 1, wherein said pores have a length in the range of about 1 micron to about 10000 microns.
3. A method for fabricating a filter, the method comprising: providing a first thin film structure having openings therethrough; forming a first sacrificial layer over at least part of said first thin film structure; forming a second thin film structure over said first thin film structure and said first sacrificial layer, said first sacrificial layer and said second thin film structure blocking said openings of said first thin film structure, and said second thin film structure having openings therethrough, said openings exposing a portion of said first sacrificial layer; and etching said first sacrificial layer.
14. The filter of claim 13 wherein said pores have a length between about 1000 angstroms and about 5000 angstroms.
15. The filter of claim 2 wherein said length is in the range of about 2 microns to about 4 microns.
16. The filter of claim 1 wherein said pores are straight-through pores.
17. The filter of claim 1 wherein said pores have ends, said ends not being in line of sight of each other.
18. The filter of claim 1 wherein said second structure formes a rivet-like shape underneath said first structure.
19. The filter of claim 1 wherein said pores have a length between about 500 angstroms and about 5000 angstroms.
20. The filter of claim 1 further comprising at least one additional thin film structure having pores, and a polymer matrix holding said thin-film structures.
21. The filter of claim 1 wherein said first and second thin film structures are conductive and are not in electrical contact.
22. The filter of claim 21 wherein at least one of said first and second thin film structures includes a metal film.
23. The filter of claim 22 having metal films on opposite sides.
24. The filter of claim 1 wherein said thin film structures have hydrophobic surfaces.
25. The filter of claim 24 wherein said width is less than about 3000 angstroms.
26. The filter of claim 1 wherein said thin film structures have surfaces with monoclonal antibodies bonded thereto.
27. The filter of claim 1 wherein said thin film structures have surfaces with a chemical coating covalently bonded thereto.
28. The filter of claim 27 wherein said chemical coating can effectively crystallize below a freezing point to stop flow through said pores.
29. The filter of claim 27 wherein said chemical coating is highly polarizable chain molecules.
30. The method of claim 3 wherein said step of providing a first thin film structure includes forming a reinforcing rib in a trench on a substrate.
31. The method of claim 30 wherein said first thin film structure is grown by chemical vapor deposition.
32. The method of claim 3 wherein said first sacrificial layer is formed by a chemical reaction at an exposed surface of said first thin film structure.
33. The method of claim 32 wherein said first thin film structure includes silicon and said chemical reaction is an oxidation.
34. The method of claim 32 wherein before said step of forming said first sacrificial layer, a portion of an initially exposed surface of said first thin film structure is covered with an anchor layer.
35. The method of claim 34 wherein said first and second thin film structures are conductive and said anchor layer is insulating.
36. The method of claim 35 wherein said first and second thin film structures include silicon and said chemical reaction is an oxidation.
37. The method of claim 36 wherein said anchor layer includes a material from the group consisting of alumina and silicon nitride.
38. The method of claim 3 wherein said second thin film structure is grown by chemical vapor deposition.
39. The method of claim 38 wherein said step of forming said second thin film structure includes etching back said second thin film structure without patterning.
40. The method of claim 39 wherein said first thin film structure is a sidewall structure.
41. The method of claim 39 further including:
after forming said second thin film structure and before etching said first sacrificial layer, doping an exposed surface of said first and second thin film structure with boron; and after etching said first sacrificial layer, partially etching an undoped portion of said first and second thin film structures; and wherein said first and second thin film structures include silicon.
42. The method of claim 3 wherein said step of forming said second thin film structure includes patterning openings over unetched portions of said first thin film structure.
43. The method of claim 3 wherein said step of forming said first sacrificial layer includes etching anchoring holes in said first sacrificial layer to expose said first thin film structure.
44. The method of claim 43 further including, after forming said first sacrificial layer and before forming said second thin film layer, partially etching through said first thin film structure where it is exposed by said anchoring holes.
45. The method of claim 43 further including, after forming said first sacrificial layer and before forming said second thin film layer, etching through said first thin film structure where it is exposed by said anchoring holes and partly etching underneath said first thin film structure where it is exposed by said anchoring holes to provide a space for a rivet-like shape of said second thin film structure.
46. The method of claim 3 further including: etching trenches to form filter islands; applying and curing a polymer matrix; and patterning entrance holes in said polymer matrix.
47. The method of claim 3 further including: after etching said first sacrificial layer, growing a thin film on walls of pores of said filter.
48. The method of claim 47 further including: etching said thin film.
49. A method for fabricating a filter with short pore length, comprising: forming a. first structural layer over a sacrificial top layer of a substrate; forming a pore sacrificial layer whose thickness defines a width of said pores; forming a second structural layer covering vertical sidewalls of a sidewall support sacrificial layer, a thickness of said second structural layer defining a length of said pores; anisotropically etching said second structural layer to remove its horizontal portions; forming an entrance hole sacrificial layer covering a bottom portion of said second structural layer and leaving exposed a top portion of said second structural layer; forming a third structural layer; etching entrance holes in said third structural layer; and etching all sacrificial layers filling said pores and underlying said filter.
50. The method of claim 49 wherein said pore sacrificial layer is formed after etching exit holes in said first structural layer and forming said sidewall support sacrificial layer.
51. A method for operating a molecular crystallization valve, comprising: providing a filter having pores coated with a straight chain molecular coating capable of effectively crystallizing below a specific freezing point; and controlling a temperature of said coating.
52. A method for operating a molecular polarization valve, comprising: providing a filter having pores coated with highly polarizable chain molecules; and controlling an electric field across said pores.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52356295A JP3741440B2 (en) | 1994-03-07 | 1995-03-07 | Micro assembled particle filter |
AU19801/95A AU1980195A (en) | 1994-03-07 | 1995-03-07 | Microfabricated particle filter |
EP95912743A EP0749352B1 (en) | 1994-03-07 | 1995-03-07 | Microfabricated particle filter |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/207,457 US5651900A (en) | 1994-03-07 | 1994-03-07 | Microfabricated particle filter |
US08/207,457 | 1994-03-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1995024261A1 WO1995024261A1 (en) | 1995-09-14 |
WO1995024261B1 true WO1995024261B1 (en) | 1995-11-09 |
Family
ID=22770623
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1995/002754 WO1995024261A1 (en) | 1994-03-07 | 1995-03-07 | Microfabricated particle filter |
Country Status (5)
Country | Link |
---|---|
US (2) | US5651900A (en) |
EP (1) | EP0749352B1 (en) |
JP (2) | JP3741440B2 (en) |
AU (1) | AU1980195A (en) |
WO (1) | WO1995024261A1 (en) |
Families Citing this family (109)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5651900A (en) * | 1994-03-07 | 1997-07-29 | The Regents Of The University Of California | Microfabricated particle filter |
US5770076A (en) * | 1994-03-07 | 1998-06-23 | The Regents Of The University Of California | Micromachined capsules having porous membranes and bulk supports |
US5798042A (en) * | 1994-03-07 | 1998-08-25 | Regents Of The University Of California | Microfabricated filter with specially constructed channel walls, and containment well and capsule constructed with such filters |
US5985328A (en) * | 1994-03-07 | 1999-11-16 | Regents Of The University Of California | Micromachined porous membranes with bulk support |
US6107102A (en) * | 1995-06-07 | 2000-08-22 | Regents Of The University Of California | Therapeutic microdevices and methods of making and using same |
US5797898A (en) * | 1996-07-02 | 1998-08-25 | Massachusetts Institute Of Technology | Microchip drug delivery devices |
US7070590B1 (en) * | 1996-07-02 | 2006-07-04 | Massachusetts Institute Of Technology | Microchip drug delivery devices |
US6090726A (en) * | 1996-07-05 | 2000-07-18 | National Science Council | Pretreatment method of a silicon wafer using nitric acid |
US5938923A (en) * | 1997-04-15 | 1999-08-17 | The Regents Of The University Of California | Microfabricated filter and capsule using a substrate sandwich |
US6290685B1 (en) | 1998-06-18 | 2001-09-18 | 3M Innovative Properties Company | Microchanneled active fluid transport devices |
US6524488B1 (en) | 1998-06-18 | 2003-02-25 | 3M Innovative Properties Company | Method of filtering certain particles from a fluid using a depth loading filtration media |
US6080243A (en) * | 1998-06-18 | 2000-06-27 | 3M Innovative Properties Company | Fluid guide device having an open structure surface for attachement to a fluid transport source |
US6265026B1 (en) | 1998-01-16 | 2001-07-24 | The Regents Of The University Of California | Vapor phase deposition |
US6376549B1 (en) * | 1998-09-17 | 2002-04-23 | Akesis Pharmaceuticals, Inc. | Metforimin-containing compositions for the treatment of diabetes |
US6852760B1 (en) * | 1998-09-17 | 2005-02-08 | Akesis Pharmaceuticals, Inc. | Compositions and methods for treatment for glucose metabolism disorders |
US6355270B1 (en) | 1999-01-11 | 2002-03-12 | The Regents Of The University Of California | Particles for oral delivery of peptides and proteins |
WO2000042231A2 (en) | 1999-01-15 | 2000-07-20 | The Regents Of The University Of California | Polycrystalline silicon germanium films for forming micro-electromechanical systems |
US6635163B1 (en) * | 1999-06-01 | 2003-10-21 | Cornell Research Foundation, Inc. | Entropic trapping and sieving of molecules |
US6273938B1 (en) | 1999-08-13 | 2001-08-14 | 3M Innovative Properties Company | Channel flow filter |
CA2381951A1 (en) | 1999-08-18 | 2001-02-22 | Microchips, Inc. | Thermally-activated microchip chemical delivery devices |
US6454839B1 (en) | 1999-10-19 | 2002-09-24 | 3M Innovative Properties Company | Electrofiltration apparatus |
US6822304B1 (en) * | 1999-11-12 | 2004-11-23 | The Board Of Trustees Of The Leland Stanford Junior University | Sputtered silicon for microstructures and microcavities |
EP1233927A4 (en) * | 1999-11-17 | 2003-01-08 | Univ California | Apparatus and method for forming a membrane with nanometer scale pores |
US20030205552A1 (en) * | 1999-11-17 | 2003-11-06 | The Regents Of The University Of California | Method of forming a membrane with nanometer scale pores and application to biofiltration |
EP1229901B1 (en) | 1999-11-17 | 2009-03-18 | Boston Scientific Limited | Microfabricated devices for the delivery of molecules into a carrier fluid |
US6982058B2 (en) * | 1999-12-08 | 2006-01-03 | Baxter International, Inc. | Method for fabricating three dimensional structures |
CA2361930A1 (en) | 1999-12-08 | 2001-06-14 | Baxter International Inc. | Microporous filter membrane, method of making microporous filter membrane and separator employing microporous filter membranes |
US20030168396A1 (en) * | 1999-12-08 | 2003-09-11 | Jacobson James D. | Monolithic filter body and fabrication technique |
WO2001041736A2 (en) * | 1999-12-10 | 2001-06-14 | Massachusetts Institute Of Technology | Microchip devices for delivery of molecules and methods of fabrication thereof |
EP1108677B1 (en) * | 1999-12-15 | 2006-09-27 | Asulab S.A. | Method of hermetic In Situ encapsulation of microsystems |
ATE499988T1 (en) | 2000-03-02 | 2011-03-15 | Microchips Inc | MICROMECHANICAL DEVICES AND METHODS FOR STORAGE AND SELECTIVE EXPOSURE OF CHEMICALS |
AU2001265128A1 (en) | 2000-05-30 | 2001-12-11 | Massachusetts Institute Of Technology | Methods and devices for sealing microchip reservoir devices |
NL1016030C1 (en) | 2000-08-28 | 2002-03-01 | Aquamarijn Holding B V | Spraying device with a nozzle plate, a nozzle plate, as well as methods for manufacturing and applying such a nozzle plate. |
US6464347B2 (en) * | 2000-11-30 | 2002-10-15 | Xerox Corporation | Laser ablated filter |
US20020128179A1 (en) * | 2000-12-01 | 2002-09-12 | Tacon William C. | Shaped microparticles for pulmonary drug delivery |
US6881198B2 (en) * | 2001-01-09 | 2005-04-19 | J. David Brown | Glaucoma treatment device and method |
US7811768B2 (en) | 2001-01-26 | 2010-10-12 | Aviva Biosciences Corporation | Microdevice containing photorecognizable coding patterns and methods of using and producing the same |
US7015047B2 (en) * | 2001-01-26 | 2006-03-21 | Aviva Biosciences Corporation | Microdevices having a preferential axis of magnetization and uses thereof |
US7316769B2 (en) * | 2001-03-19 | 2008-01-08 | Cornell Research Foundation, Inc. | Length-dependent recoil separation of long molecules |
US6811695B2 (en) * | 2001-06-07 | 2004-11-02 | Nanostream, Inc. | Microfluidic filter |
US20030010638A1 (en) * | 2001-06-15 | 2003-01-16 | Hansford Derek J. | Nanopump devices and methods |
EP1399135B1 (en) * | 2001-06-28 | 2004-12-29 | Microchips, Inc. | Methods for hermetically sealing microchip reservoir devices |
US7393517B2 (en) * | 2001-08-23 | 2008-07-01 | The Ohio State University | Shaped microcomponents via reactive conversion of synthetic microtemplates |
EP1424957A2 (en) | 2001-09-14 | 2004-06-09 | Francis J. Martin | Microfabricated nanopore device for sustained release of therapeutic agent |
US7371258B2 (en) | 2001-10-26 | 2008-05-13 | St. Jude Medical, Inc. | Valved prosthesis with porous substrate |
US20030080060A1 (en) * | 2001-10-30 | 2003-05-01 | .Gulvin Peter M | Integrated micromachined filter systems and methods |
US6780786B2 (en) * | 2001-11-26 | 2004-08-24 | The Regents Of The University Of California | Method for producing a porous silicon film |
AU2002358803A1 (en) * | 2001-12-31 | 2003-07-15 | Asm Automation Sensorik Messtechnik Gmbh | Magnetostrictive sensor element |
US20040060902A1 (en) * | 2002-02-05 | 2004-04-01 | Evans John D. | Microprotrusion array and methods of making a microprotrusion |
US20030150791A1 (en) * | 2002-02-13 | 2003-08-14 | Cho Steven T. | Micro-fluidic anti-microbial filter |
US20040038260A1 (en) * | 2002-04-18 | 2004-02-26 | Imedd, Inc. | Nanopump device for analyzing DNA sequences |
CN1817421B (en) * | 2002-07-25 | 2012-07-04 | 大日本印刷株式会社 | Thin film supporting substrate used in filter for hydrogen production and method for manufacturing filter for hydrogen production |
AU2003272310A1 (en) * | 2002-09-11 | 2004-04-30 | The Cleveland Clinic Foundation | Ultrafiltration membrane, device, bioartificial organ and methods |
US20040064050A1 (en) * | 2002-09-20 | 2004-04-01 | Jun Liu | System and method for screening tissue |
FR2844725B1 (en) * | 2002-09-24 | 2005-01-07 | Commissariat Energie Atomique | METHOD FOR MANUFACTURING BIOMIMETIC MEMBRANE, BIOMIMETIC MEMBRANE, AND APPLICATIONS THEREOF |
US20040060867A1 (en) * | 2002-09-27 | 2004-04-01 | Bmc Industries, Inc. | Membrane support devices and methods of manufacturing |
JP3642340B2 (en) * | 2003-03-28 | 2005-04-27 | ダイキン工業株式会社 | Hazardous substance removing method, air purifying filter, wiping sheet and other harmful substance removing material used therefor, and storage method thereof |
ES2387062T3 (en) * | 2003-09-23 | 2012-09-12 | Lilliputian Systems, Inc. | Fuel cell with tension-resistant thin film membranes |
US8029503B2 (en) * | 2003-10-11 | 2011-10-04 | The Regents Of The University Of California | Nerve repair by selective surgical repair of axons |
WO2005039668A2 (en) * | 2003-10-21 | 2005-05-06 | Boiarski Anthony A | Implantable drug delivery device for sustained release of therapeutic agent |
US7226540B2 (en) * | 2004-02-24 | 2007-06-05 | Becton, Dickinson And Company | MEMS filter module |
US20050194303A1 (en) * | 2004-03-02 | 2005-09-08 | Sniegowski Jeffry J. | MEMS flow module with filtration and pressure regulation capabilities |
US7544176B2 (en) * | 2005-06-21 | 2009-06-09 | Becton, Dickinson And Company | Glaucoma implant having MEMS flow module with flexing diaphragm for pressure regulation |
US20060036207A1 (en) * | 2004-02-24 | 2006-02-16 | Koonmen James P | System and method for treating glaucoma |
US20060219627A1 (en) * | 2005-03-31 | 2006-10-05 | Rodgers M S | MEMS filter module with concentric filtering walls |
US7384550B2 (en) * | 2004-02-24 | 2008-06-10 | Becton, Dickinson And Company | Glaucoma implant having MEMS filter module |
DE102005005551B4 (en) * | 2004-03-03 | 2015-10-01 | Robert Bosch Gmbh | Micromechanical component with a membrane and method for producing such a component |
KR20050093018A (en) * | 2004-03-18 | 2005-09-23 | 한국과학기술연구원 | Efficient 3-d nanostructured membranes |
US7323033B2 (en) * | 2004-04-30 | 2008-01-29 | Lucent Technologies Inc. | Nanostructured surfaces having variable permeability |
EP1748836A2 (en) * | 2004-05-03 | 2007-02-07 | Friesland Brands B.V. | Device with a membrane on a carrier, as well as a method for manufacturing such a membrane |
FR2871291B1 (en) * | 2004-06-02 | 2006-12-08 | Tracit Technologies | PROCESS FOR TRANSFERRING PLATES |
EP1807171A1 (en) * | 2004-10-15 | 2007-07-18 | Cuno Incorporated | Pleated multi-layer filter media and cartridge |
US7413846B2 (en) * | 2004-11-15 | 2008-08-19 | Microchips, Inc. | Fabrication methods and structures for micro-reservoir devices |
WO2006108053A2 (en) * | 2005-04-05 | 2006-10-12 | The Ohio State University | Diffusion delivery systems and methods of fabrication |
KR100558932B1 (en) * | 2005-04-21 | 2006-03-10 | 주식회사 엠제이스마트 테크놀러지 | Manufacturing method of a ceramic membrane and ceramic membrane that is made by it membrane |
CA2621993A1 (en) * | 2005-09-16 | 2007-03-29 | Bg Implant, Inc. | Glaucoma treatment devices and methods |
US20070151920A1 (en) * | 2005-12-06 | 2007-07-05 | Kay Ronald J | System and method of micromolded filtration microstructure and devices |
WO2007092852A2 (en) | 2006-02-06 | 2007-08-16 | Mynosys Cellular Devices, Inc. | Microsurgical cutting instruments |
US20070275035A1 (en) * | 2006-05-24 | 2007-11-29 | Microchips, Inc. | Minimally Invasive Medical Implant Devices for Controlled Drug Delivery |
JP4821466B2 (en) * | 2006-07-03 | 2011-11-24 | 富士ゼロックス株式会社 | Droplet discharge head |
WO2008054180A1 (en) * | 2006-11-02 | 2008-05-08 | Digital Bio Technology Co., Ltd. | Channel filter having surface topology for filtering micro-particles and method for manufacturing of the same |
EP2125171A4 (en) | 2007-01-10 | 2012-05-16 | Univ Michigan | Ultrafiltration membrane, device, bioartificial organ, and related methods |
US20080277332A1 (en) * | 2007-05-11 | 2008-11-13 | Becton, Dickinson And Company | Micromachined membrane filter device for a glaucoma implant and method for making the same |
EP2200931B1 (en) | 2007-09-19 | 2017-06-07 | The Charles Stark Draper Laboratory, Inc. | Microfluidic structures with circular cross-section |
US20090186190A1 (en) * | 2008-01-17 | 2009-07-23 | Shan Guan | Silicon filter |
US20090234332A1 (en) * | 2008-03-17 | 2009-09-17 | The Charles Stark Draper Laboratory, Inc | Artificial microvascular device and methods for manufacturing and using the same |
WO2009158279A1 (en) * | 2008-06-24 | 2009-12-30 | The University Of North Carolina At Chapel Hill | High fidelity through hole film, and associated method |
US8173115B2 (en) * | 2008-07-29 | 2012-05-08 | The Board Of Regents Of The University Of Texas System | Particle compositions with a pre-selected cell internalization mode |
EP2355864B1 (en) | 2008-11-14 | 2016-11-09 | The Board of Regents of The University of Texas System | Nanochanneled device and related methods |
CN102019114B (en) * | 2009-09-21 | 2012-11-14 | 庄淑媛 | Nanoscale filter material structure for respiration and manufacturing method thereof |
WO2011044116A2 (en) * | 2009-10-05 | 2011-04-14 | The Charles Stark Draper Laboratory, Inc. | Three-dimensional microfluidic platforms and methods of use and manufacture thereof |
US20110082563A1 (en) * | 2009-10-05 | 2011-04-07 | The Charles Stark Draper Laboratory, Inc. | Microscale multiple-fluid-stream bioreactor for cell culture |
US8101129B2 (en) | 2009-10-13 | 2012-01-24 | Chuang Shu-Yuan | Nano filter structure for breathing and manufacturing method thereof |
AU2013273668B2 (en) * | 2009-12-14 | 2016-05-12 | 3M Innovative Properties Company | Microperforated polymeric film and methods of making and using the same |
TWI506070B (en) | 2009-12-14 | 2015-11-01 | 3M Innovative Properties Co | Microperforated polymeric film and methods of making and using the same |
SG181759A1 (en) | 2009-12-21 | 2012-07-30 | Janssen R & D Ireland | Degradable removable implant for the sustained release of an active compound |
US20110288497A1 (en) | 2010-05-19 | 2011-11-24 | Nanomedical Systems, Inc. | Nano-Scale Coatings and Related Methods Suitable for In-Vivo Use |
JP2012101196A (en) * | 2010-11-11 | 2012-05-31 | Tokyo Electron Ltd | Method for manufacturing filter for filtration |
US8956696B2 (en) * | 2011-02-10 | 2015-02-17 | Inficon Gmbh | Ultra-thin membrane for chemical analyzer and related method for forming membrane |
US20130043559A1 (en) * | 2011-08-17 | 2013-02-21 | International Business Machines Corporation | Trench formation in substrate |
JP2014057934A (en) * | 2012-09-19 | 2014-04-03 | Tokyo Electron Ltd | Method for manufacturing filter for filtration |
EP2724773A1 (en) * | 2012-10-25 | 2014-04-30 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Nanosieve composite membrane |
US9956529B2 (en) * | 2014-04-03 | 2018-05-01 | New York University | Microfabricated ion-selective filter for filtration of ions and molecules |
US10736778B2 (en) | 2014-12-31 | 2020-08-11 | Microoptx Inc. | Glaucoma treatment devices and methods |
EP3355983A4 (en) | 2015-09-30 | 2019-06-26 | Microoptx Inc. | Dry eye treatment devices and methods |
WO2020045695A1 (en) * | 2018-08-28 | 2020-03-05 | 한국에너지기술연구원 | Method for manufacturing ultrathin graphene membrane having nanopores |
US11161066B2 (en) | 2018-09-13 | 2021-11-02 | International Business Machines Corporation | Micro-machined filter for magnetic particles |
US11833477B2 (en) | 2020-10-09 | 2023-12-05 | Global Life Sciences Solutions Usa, Llc | Tangential flow cassette-HF emulation |
CN114534647B (en) * | 2022-01-04 | 2023-04-18 | 北京航空航天大学 | Film emulsifying device and manufacturing method thereof |
Family Cites Families (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2246380A (en) * | 1938-02-19 | 1941-06-17 | Edward O Norris Inc | Electrolytic method of producing screens |
US2226381A (en) * | 1938-04-22 | 1940-12-24 | Edward O Norris Inc | Process of producing electrolytic foraminous sheets |
US2226383A (en) * | 1938-08-31 | 1940-12-24 | Edward O Norris Inc | Process of producing foraminous sheets |
US2226384A (en) * | 1938-12-14 | 1940-12-24 | Edward O Norris Inc | Process of electrolytically producing foraminous sheets |
US3329541A (en) * | 1960-05-20 | 1967-07-04 | Buckbee Mears Co | Method of forming fine mesh screens |
US3502455A (en) * | 1967-10-09 | 1970-03-24 | Bendix Corp | Method of fabricating a thin film vitreous continuous membrane product |
US3600147A (en) * | 1970-01-02 | 1971-08-17 | Charles L Mckinnis | Method of making a glass semipermeable membrane |
US4063271A (en) * | 1972-07-26 | 1977-12-13 | Texas Instruments Incorporated | FET and bipolar device and circuit process with maximum junction control |
NL7416645A (en) * | 1974-12-20 | 1976-06-22 | Tno | DYNAMICALLY SHAPED MEMBRANE. |
US3962052A (en) * | 1975-04-14 | 1976-06-08 | International Business Machines Corporation | Process for forming apertures in silicon bodies |
CH625966A5 (en) * | 1977-07-15 | 1981-10-30 | Kilcher Chemie Ag | |
JPS5636143A (en) * | 1979-08-31 | 1981-04-09 | Hitachi Ltd | Manufacture of semiconductor device |
EP0039179B1 (en) * | 1980-04-28 | 1985-07-24 | National Research Development Corporation | Improvements in or relating to porous glass |
US4307507A (en) * | 1980-09-10 | 1981-12-29 | The United States Of America As Represented By The Secretary Of The Navy | Method of manufacturing a field-emission cathode structure |
DE3681663D1 (en) * | 1985-03-06 | 1991-10-31 | Memtec Ltd | CHANGE IN PORE SIZE DISTRIBUTION. |
US4689150A (en) * | 1985-03-07 | 1987-08-25 | Ngk Insulators, Ltd. | Separation membrane and process for manufacturing the same |
DE3546091A1 (en) * | 1985-12-24 | 1987-07-02 | Kernforschungsz Karlsruhe | CROSS-CURRENT MICROFILTER |
US4698900A (en) * | 1986-03-27 | 1987-10-13 | Texas Instruments Incorporated | Method of making a non-volatile memory having dielectric filled trenches |
US4853001A (en) * | 1986-06-06 | 1989-08-01 | Ppg Industries, Inc. | Porous inorganic siliceous-containing gas enriching material and process of manufacture and use |
US4797175A (en) * | 1987-03-09 | 1989-01-10 | Hughes Aircraft Company | Method for making solid element fluid filter for removing small particles from fluids |
US5238613A (en) * | 1987-05-20 | 1993-08-24 | Anderson David M | Microporous materials |
DE3879771D1 (en) * | 1987-05-27 | 1993-05-06 | Siemens Ag | ETCHING METHOD FOR PRODUCING HOLE OPENINGS OR TRENCHES IN N-DOPED SILICON. |
NL8702759A (en) * | 1987-11-19 | 1989-06-16 | Hoogovens Groep Bv | METHOD FOR MANUFACTURING A MICRO-PERMEABLE MEMBRANE AND APPARATUS FOR APPLYING THIS MEMBRANE TO A CARRIER |
JPH01138110A (en) * | 1987-11-25 | 1989-05-31 | Showa Denko Kk | Pipe made of diamond and production thereof |
SE463654B (en) * | 1988-03-11 | 1991-01-07 | Nils Goeran Stemme | MEMBRANE STRUCTURE AS WELL AS MANUFACTURING THEM |
SU1680270A1 (en) * | 1989-05-12 | 1991-09-30 | Inzh Ts Ekologiya V Svarochnom | Filtering element |
JPH0338061A (en) * | 1989-07-05 | 1991-02-19 | Fujitsu Ltd | Semiconductor memory |
FR2660874B1 (en) * | 1990-04-12 | 1992-06-12 | Aluminum Co Of America | SEMI-PERMEABLE POROUS INORGANIC COMPOSITE MEMBRANE AND PREPARATION METHOD. |
US5131978A (en) * | 1990-06-07 | 1992-07-21 | Xerox Corporation | Low temperature, single side, multiple step etching process for fabrication of small and large structures |
US5271801A (en) * | 1990-07-09 | 1993-12-21 | Commissariat A L'energie Atomique | Process of production of integrated optical components |
ATE154259T1 (en) * | 1991-02-28 | 1997-06-15 | Heinze Dyconex Patente | METHOD FOR PRODUCING A COMPOSITE BODY CONSISTING OF MICRO SCREEN |
DE4202454C1 (en) * | 1992-01-29 | 1993-07-29 | Siemens Ag, 8000 Muenchen, De | |
US5234594A (en) * | 1992-06-12 | 1993-08-10 | The United States Of America As Represented By The Secretary Of The Navy | Nanochannel filter |
US5275766A (en) * | 1992-10-30 | 1994-01-04 | Corning Incorporate | Method for making semi-permeable polymer membranes |
DE69435124D1 (en) * | 1993-10-04 | 2008-09-25 | Res Internat Inc | Micromachined filters |
US5651900A (en) * | 1994-03-07 | 1997-07-29 | The Regents Of The University Of California | Microfabricated particle filter |
-
1994
- 1994-03-07 US US08/207,457 patent/US5651900A/en not_active Expired - Lifetime
-
1995
- 1995-03-07 AU AU19801/95A patent/AU1980195A/en not_active Abandoned
- 1995-03-07 JP JP52356295A patent/JP3741440B2/en not_active Expired - Lifetime
- 1995-03-07 EP EP95912743A patent/EP0749352B1/en not_active Expired - Lifetime
- 1995-03-07 WO PCT/US1995/002754 patent/WO1995024261A1/en active IP Right Grant
-
1997
- 1997-05-02 US US08/848,981 patent/US5948255A/en not_active Expired - Lifetime
-
2005
- 2005-08-22 JP JP2005240250A patent/JP3928971B2/en not_active Expired - Lifetime
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