WO1995002500A1 - Appareil de modelage par photopolymerisation a fonction de decalage des donnees de triangulation et methode de decalage associee - Google Patents

Appareil de modelage par photopolymerisation a fonction de decalage des donnees de triangulation et methode de decalage associee Download PDF

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Publication number
WO1995002500A1
WO1995002500A1 PCT/JP1993/000997 JP9300997W WO9502500A1 WO 1995002500 A1 WO1995002500 A1 WO 1995002500A1 JP 9300997 W JP9300997 W JP 9300997W WO 9502500 A1 WO9502500 A1 WO 9502500A1
Authority
WO
WIPO (PCT)
Prior art keywords
tessellation
light irradiation
normal vector
data
calculating
Prior art date
Application number
PCT/JP1993/000997
Other languages
English (en)
Japanese (ja)
Inventor
Seiji Hayano
Original Assignee
Cmet, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cmet, Inc. filed Critical Cmet, Inc.
Priority to PCT/JP1993/000997 priority Critical patent/WO1995002500A1/fr
Publication of WO1995002500A1 publication Critical patent/WO1995002500A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/30—Auxiliary operations or equipment
    • B29C64/386—Data acquisition or data processing for additive manufacturing
    • B29C64/393—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

Definitions

  • the present invention relates to a photocuring molding technique, and more particularly to a technique for improving the shape accuracy of a molded article.
  • Figure 1 is a diagram schematically showing this technology, and illustrates the contents of the telesegmentation that defines the three-dimensional shape indicated by reference numeral 10 that exists in the X-Y-Z coordinate system. are doing.
  • a three-dimensional shape can be approximately represented as a set of tessellations 1, 2, 3,...
  • the position and shape force of each tessellation is defined by the coordinates of the vertex.
  • Figure 1 illustrates the case where each tessellation is a triangle. If each tessellation is a triangle, three vertices belonging to each tessellation, for example, for tessellation 2, the vertices 2 1 2 2
  • the position and the shape force are defined by the coordinates.
  • the coordinates of each vertex are given by (X, y, z) components.
  • a three-dimensional shape 10 is defined by a set of coordinates of the vertices of each tessellation.
  • each tessellation is provided with a normal vector.
  • FIG. 1 shows an example in which the normal vector 24 of the tessellation 2 goes from inside to outside of the shape 10.
  • the normal vector has the regularity that the object force moves from the existing side to the non-existing side. I understand.
  • the normal vector 24 force ⁇ going from outside to inside it turns out that the shape 10 defines a hole, not an object.
  • the three-dimensional shape is defined as a set of data indicating the coordinates of the vertices of each tessellation and the normal vector of each tessellation (this is called tessellation data). become.
  • FIG. 1 shows the case of each triangulation force triangle, it may be defined by a polygon.
  • FIG. 2 is a diagram schematically showing the technology.
  • a liquid resin 25 that cures when irradiated with light a substrate 26 that forms the basis of the molded article, and an irradiation device 20 that can control the light irradiation area are used.
  • the substrate 26 is immersed at a predetermined distance Z from the liquid surface 27 of the liquid resin 25. In this state, the liquid level 27 is irradiated by the irradiation device 20.
  • the irradiation area at this time is defined as the inside of the contour 28 in the lowest section of the three-dimensional shape 10 defined by the tessellation data.
  • the irradiation intensity is set so that the liquid 25 can be cured from the liquid surface 27 to a depth ⁇ . Then, a cured layer 28 a having a contour ⁇ 28 and a thickness ⁇ ⁇ is formed on the substrate 26.
  • the substrate 26 is sunk by ⁇ , and the inside of the contour 29 in the cross section above by ⁇ in the three-dimensional shape 10 is irradiated with light.
  • a hardened layer 29 3 having a thickness ⁇ ⁇ ⁇ corresponding to the contour 29 is formed, and both hardened layers 28 a and 29 a are integrated. .
  • a cured product is formed in the liquid 25, and the cured product has a shape 10 defined by tessellation data.
  • the above example is an example of photo-curing molding technology, and there are various methods such as a method of irradiating light from the bottom and pulling up the substrate, and a method of fixing the substrate and raising the liquid level. Existing.
  • This photo-curing molding technology is extremely useful because the three-dimensional shape defined by Tessellation de can be automatically converted into a tool.
  • the following two points affect the shape accuracy.
  • the contour is traced by a light beam. In this case, as shown in FIG. If the center force is moved along the contour 30, the light beam 31 will be hardened to the outside of the contour 30 by the radius r of the light beam 31, and the object will be more outward than the desired shape. It becomes big.
  • Figure 4 illustrates this. If the shape to be shaped is shown as 40, and it is overhanging to the side at the top, first irradiate the inside of contour 45, then layer the liquid, and then irradiate the inside of contour 44. The process of laminating the liquid later is repeated. As a result, in the portion that protrudes outward, as shown by a hatched portion 46 in the figure, the portion becomes excessively thicker by the hardening depth d.
  • the modeled object is as shown in Fig. 6 (B), which is different from that of Fig. 6 (A).
  • the level 60 irradiation area is determined by the Brillouin product of the level 60 contour and the level 61 contour
  • the level 61 contour will determine the level 60 irradiation area.
  • modeling is performed in the area, the shape indicated by 69 in the figure will be molded. That is, the portion indicated by 68 in the figure is missing.
  • the present invention solves the above problem. It never improves the shape accuracy of the modeled object.
  • the light-curing modeling apparatus inputs tessellation data that defines a three-dimensional shape, calculates contour data for each cross section based on the tessellation data, and converts the contour data into calculated contour data.
  • the three-dimensional shape is formed by controlling the light irradiation area on the basis of the light irradiation area, and as shown schematically in FIG. 7, means 71 for storing tessellation data, and A means 72 for calculating a normal vector at the vertex is provided.
  • the normal vector at a vertex is calculated by synthesizing the normal vector of the tessellation to which the vertex belongs.
  • the vertex 80 shown in FIG. 7 commonly belongs to the six tessellations 81 to 86, and thus the normal vector 8 ON of the vertex 80 is 81 to 86.
  • the orientation is determined according to FIG. In FIG. 8, the Z direction is the light irradiation direction, and ZH is a plane orthogonal to the direction.
  • the direction is along the light irradiation direction, and when the normal vector N points in the upper side of the figure, the direction is opposite.
  • This apparatus uses a direction discriminating means 73 to set the coordinates of the vertex having a normal vector in the direction along the light irradiation direction in the light irradiation direction in the direction opposite to the light irradiation direction, that is, as shown in FIG. Means 74 for offsetting by the curing depth in the direction of ZA.
  • the curing depth d is a depth indicated as d in FIGS. 3 and 4, and is a depth at which curing is performed by scanning with a light beam.
  • the curing force advances to the coordinates before the offset.
  • the offset process is not performed on the vertex in the direction opposite to the direction of normal vector light irradiation of the vertex.
  • a means for calculating a vector component in a plane orthogonal to the light irradiation direction of the normal vector and a coordinate in a plane orthogonal to the light irradiation direction of the vertex are calculated.
  • Means for offsetting by the curing radius in the direction opposite to the direction defined by the vector component are provided.
  • the curing depth is indicated by r in Fig. 3. --Indicates radius. In this case, offset processing is performed for all vertices regardless of the type of vertices.
  • means for storing the tessellation data offset by means 74 and Z or means 78 is provided, and means for calculating the contour for each section based on this data is provided. 6 and means 77 for controlling the light irradiation area based on the contour data calculated by the means 76.
  • Means 74 When the force is applied, the vertex of each tessellation on the surface facing the light irradiation direction is offset in the direction opposite to the light irradiation direction. Therefore, if the irradiation area is controlled based on the offset coordinates, the lower end of the hardened part will match the coordinates before the offset, and the shape of the modeled object will be the shape defined by the tessellation data before the offset. Well approximate. Note that for the surface oriented in the opposite direction to the light irradiation direction, the accuracy reduction described in FIGS. 5 and 6 does not pose a problem, and no offset is required. In addition, when means 78 are provided, the movement trajectory of the light beam is offset to the inside of the contour, and the problem of FIG. 3 is solved.
  • Fig. 1 Diagram illustrating an example and contents of telemetry data
  • FIG. 1 Diagram showing conventional photocuring molding technology
  • Figure 3 Diagram showing the problem of the hardened layer expanding outward in the radial direction
  • Figure 4 Diagram showing the problem of excessive growth of the hardened layer in the light irradiation direction
  • Figure 5 Diagram illustrating the traditional approach to addressing the problem of Figure 4
  • Fig. 7 Diagram schematically showing an example of the present invention
  • Fig. 8 Diagram showing the relationship between the light irradiation direction and the normal vector
  • Figure 11 Diagram illustrating the overall system of one embodiment
  • Figure 1 2 Diagram explaining the operation of the system according to Figure 11
  • FIG. 11 shows a system configuration of a photocuring modeling apparatus incorporating the present invention.
  • reference numeral 110 denotes a memory device for storing memory of the tessellation data before the offset and an area for storing memory of the tessellation data after the offset 1 1 2 It has an area 113 for storing d and r and curing parameters, and an area for storing various control programs.
  • the hardening parameters d and r are shown in Fig. 12, and store the radius r and depth d that are hardened as the laser beam travels. Since the curing radius r and the curing depth d are different depending on the intensity, radius, running speed, and resin used of the laser beam, d and 1 ′′ are stored in the area 113 under various conditions.
  • the control program storage area 114 stores a program for inputting the tessellation data sent from the 3D CAD and storing it in the area 111. By executing this program, the program shown in FIG. Tessellation data is stored in area 1 1 1; f o
  • control program storage area In the control program storage area, a program for executing the following contents is stored.
  • This program extracts the tessellation to which all vertices belong. For example, for vertex 80 in FIG. 7, tessellation 81 to 86 is extracted.
  • the normal vector at the vertex is calculated by vector addition of the normal vector of the tessellation extracted by the program (1).
  • the Z-direction component N z is extracted from the normal vector N calculated by the program (2) (see FIG. 12).
  • the Z direction coincides with the light irradiation direction. If the extracted Z-direction component N z force has a positive value, the normal vector of the vertex is the direction along the light irradiation direction, and if it has a negative value, the normal vector of the vertex is In the opposite direction.
  • the coordinates of the irradiation direction for example, the vertex 21 in FIG. Subtracts d from z 2 1).
  • the offset coordinates indicate coordinates that are offset from the coordinates before the offset by d (hardening depth) in a direction opposite to the light irradiation direction. This offset is not performed for vertices whose Z direction component calculated by program (3) is negative and whose direction is opposite to the light irradiation direction.
  • N xy is a component in the plane xy of the normal vector N
  • N x is an X component of N xy
  • y is a y component of N xy.
  • N x, N y, and N z indicate the magnitude of the vector.
  • N xy is a vector component in a plane (xy plane) orthogonal to the light irradiation direction Z of the normal vector N calculated by the program (2).
  • the shape accuracy is improved both in the xy plane and in the z direction.
  • the offset means in the Z direction does not function even if present, and therefore, the offset means in the Z direction can be omitted.
  • the offset processing of equations (1) and (2) may be omitted.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)

Abstract

Appareil de modelage par photopolymérisation de formes en trois dimensions consistant à: entrer des données de triangulation définissant une forme en trois dimensions, à calculer les caractéristiques de chacun des triangles sur la base des données précitées et à définir une zone à irradier sur la base des caractéristiques calculées. L'appareil comporte des moyens d'enregistrement des données de triangulation, des moyens de calcul d'un vecteur normal au sommet de chacun des triangles, des moyens permettant d'évaluer si ledit vecteur est orienté dans le sens de propagation de la lumière ou dans le sens opposé, des moyens de décalage des sommets dans le sens de la source de rayonnement lorsque les moyens d'appréciation estiment que le vecteur normal est orienté dans le sens de la source de rayonnement, et des moyens de calcul des caractéristiques de chacune des sections sur la base des données de triangulation ainsi décalées. La forme peut être définie avec précision avant le décalage.
PCT/JP1993/000997 1993-07-15 1993-07-15 Appareil de modelage par photopolymerisation a fonction de decalage des donnees de triangulation et methode de decalage associee WO1995002500A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP1993/000997 WO1995002500A1 (fr) 1993-07-15 1993-07-15 Appareil de modelage par photopolymerisation a fonction de decalage des donnees de triangulation et methode de decalage associee

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1993/000997 WO1995002500A1 (fr) 1993-07-15 1993-07-15 Appareil de modelage par photopolymerisation a fonction de decalage des donnees de triangulation et methode de decalage associee

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5999184A (en) * 1990-10-30 1999-12-07 3D Systems, Inc. Simultaneous multiple layer curing in stereolithography

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04118222A (ja) * 1990-05-02 1992-04-20 Mitsubishi Corp 光固化造形装置
JPH04138245A (ja) * 1990-09-29 1992-05-12 Sony Corp 立体形状形成装置
JPH04169221A (ja) * 1990-11-02 1992-06-17 Mitsubishi Corp 高精度光固化造形装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04118222A (ja) * 1990-05-02 1992-04-20 Mitsubishi Corp 光固化造形装置
JPH04138245A (ja) * 1990-09-29 1992-05-12 Sony Corp 立体形状形成装置
JPH04169221A (ja) * 1990-11-02 1992-06-17 Mitsubishi Corp 高精度光固化造形装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5999184A (en) * 1990-10-30 1999-12-07 3D Systems, Inc. Simultaneous multiple layer curing in stereolithography
US6366825B1 (en) 1990-10-30 2002-04-02 3D Systems, Inc. Simultaneous multiple layer curing in stereolithography

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