WO1994016310A1 - Ellipsometre de zeeman - Google Patents

Ellipsometre de zeeman Download PDF

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Publication number
WO1994016310A1
WO1994016310A1 PCT/NL1993/000283 NL9300283W WO9416310A1 WO 1994016310 A1 WO1994016310 A1 WO 1994016310A1 NL 9300283 W NL9300283 W NL 9300283W WO 9416310 A1 WO9416310 A1 WO 9416310A1
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WO
WIPO (PCT)
Prior art keywords
beam splitter
working
polarizing beam
polarizing
polarization
Prior art date
Application number
PCT/NL1993/000283
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English (en)
Inventor
Klaas Hemmes
Maurits Matthijs Wind
Rudolf Lepoole
Philip Ernst Habing
Original Assignee
Technische Universiteit Delft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Technische Universiteit Delft filed Critical Technische Universiteit Delft
Priority to AU58441/94A priority Critical patent/AU5844194A/en
Publication of WO1994016310A1 publication Critical patent/WO1994016310A1/fr

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/04—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by beating two waves of a same source but of different frequency and measuring the phase shift of the lower frequency obtained

Definitions

  • the present invention relates to an ellipsometer comprising at least a light source which during operation provides at least one light beam, a non-polarizing beam splitter for causing a work ⁇ ing beam modified by a sample, and a reference beam to interfere, a unit for separating two orthogonal components of the (interference) beam thus composed and providing two a.c. voltages corresponding thereto.
  • An ellipsometer of this type is disclosed by H.F. Hazebroek, W.M. Visser, "Automated laser-interferometric ellipso etry and precision reflectometry", J.Phys.E: Sci. Instrum., Vol. 16, 1983, pp. 654-661.
  • a light source L preferably consisting of an He-Ne laser, emits a beam of mono ⁇ chromatic, non-polarized light g, having a wavelength of, for example, 632.8 nm.
  • the light beam g first passes a beam splitter B which taps off a part g of the beam g for the benefit of signal processing purposes.
  • Said beam g is detected by a photodiode D3 which converts the calibration beam g into an electrical signal S3.
  • the signal S3 is supplied to suitable electronic signal pro ⁇ cessing means (not shown) .
  • the beam g passes a polarizer, for example a Glan-Thompson prism G, which polarizes the beam g linear- ly in such a way that the electric field of g is then at an angle of 45° with the normal on the plane of the working set-up shown in Figure 1.
  • a polarizer for example a Glan-Thompson prism G, which polarizes the beam g linear- ly in such a way that the electric field of g is then at an angle of 45° with the normal on the plane of the working set-up shown in Figure 1.
  • the light beam then impinges on a non-polarizing beam split ⁇ ter N.
  • the non-polarizing beam splitter N reflects at least sub- stantially half of the incident beam as the working beam g m in the direction of a sample S.
  • the remaining part g r of the incident beam passes the non-polarizing beam splitter N and serves as the refer ⁇ ence beam.
  • the working beam g m is reflected by the surface of the sample S to be analyzed.
  • the beam reflected by the sample S is autocol- limated very accurately by a mirror M which reflects the working beam g m towards the sample S.
  • the working beam g m is thus reflected twice by the surface of the sample S, whereupon a modified working beam g' is produced which is shifted, in amplitude and phase, with respect to the original working beam g m , the amplitude and the phase shift being a function of the properties of the surface of the sample S.
  • the reference beam g r is reflected by a cubic reflector C which is coupled to an (electromagnetic) drive unit (not shown) in order to be moved back and forth with a constant speed.
  • the reference beam g r is shifted in frequency, namely as a result of a Doppler shift.
  • the reflected beam g' which propagates along a different trajectory than the incident reference beam g r , impinges on the rear side of the non-polarizing beam splitter N.
  • the modified working beam g' likewise comes in, as a result of which interference arises between the modified working beam g' and the Doppler-shifted reference beam g' .
  • the interference beam is split into two orthogonal polarization modes by a Wollaston prism w corresponding to the p- and s-directions, as conventionally defined with respect to the specimen.
  • Each of these two orthogonal polarization modes is inter- cepted by a photodiode D1 and D2, respectively.
  • the photodiodes D1 , D2 convert the intensities of the two orthogonal polarization modes into corresponding a.c. voltage signals V1 , V2.
  • the sinusoidal a.c. voltage signals V1 , V2 both have a frequency which is equal to the Doppler shift caused by the moving cubic reflector C.
  • the frequency coupled to the Doppler shift is equal to twice the speed of the (electromagnetic) drive unit (not shown) of the cubic reflector C, divided by the wavelength of the light used.
  • the electrical signals V1 , V2 are supplied to a suitable electronic measurement processing system (not shown) .
  • the amplitude ratio of the electrical signals V1 , V2 and the phase difference between these two electrical signals V1 , V2 provide the desired ellipsometric information concerning the sample S in terms of the angles ⁇ and ⁇ .
  • the device By placing the mirror M at the position of the sample S and causing the working beam to be reflected along the same path, the device can be calibrated in a simple manner.
  • the two orthogonal polarization modes can be made visible directly.
  • the known device was used for measuring the optical properties of equilibrium sys ⁇ tems, for example metal surfaces, thin layers or interfaces between liquid and gas phase.
  • slowly changing processes on the surface such as corrosion or the growth of an electrochemical film, can also be studied accurately with the device according to Figure 1. Owing to the limited measurement frequency which is link ⁇ ed to the maximum speed at which the cubic reflector C can be driven, it is however not possible to study very rapidly changing processes on the surface of a sample S.
  • One object of the present invention is to eliminate (entire ⁇ ly) fluctuations in the signal frequency.
  • a further object of the invention is to increase the measure ⁇ ment accuracy.
  • Another object of the invention is to provide an ellipsometer by means of which very rapidly changing processes can be measured, the option existing of presenting the measured ellipsometric para- meters ⁇ and ⁇ in real time as analog signals.
  • an ellipsometer of the type mentioned in the preamble is characterized in that the light source is a Zeeman laser to generate two beams which are slightly shifted in frequency and which are both polarized linearly but perpendicular to one an ⁇ other, and in that polarization means are provided for adjusting the polarization directions of the working beam and/or the refer- ence beam in order to effect the desired interference between the modified working beam and the reference beam.
  • the light source is a Zeeman laser to generate two beams which are slightly shifted in frequency and which are both polarized linearly but perpendicular to one an ⁇ other
  • polarization means are provided for adjusting the polarization directions of the working beam and/or the refer- ence beam in order to effect the desired interference between the modified working beam and the reference beam.
  • an ellipsometer pro ⁇ vided with a Zeeman laser to generate two beams which are slightly shifted in frequency and which are both polarized linearly but per ⁇ pendicular to one another, polarization means being provided for adjusting the polarization directions of the working beam and/or the reference beam, is disclosed per se by EP-A-200.978.
  • the reference beam and the working beam modified by the sample surface both impinge, at different angles, directly onto the surface of a photodiode, where interference would then have to occur. Beams crossing at an arbitrary angle are not, however, able to interfere effectively with one another, so that this conventional ellipsometer probably cannot function properly.
  • the invention further makes provision for an ellipsometer of the above-mentioned type, which is provided with a mirror, for example a cubic reflector, for receiving the reference beam pro ⁇ quizd by transmission of part of the beam generated by the light source through the non-polarizing beam splitter, and for reflecting it to the rear side of the non-polarizing beam splitter, character- ized in that, in the optical path between the rear side of the non- polarizing beam splitter and the cubic reflector, a polarization unit is positioned which, for example, rotates by 45°.
  • a mirror for example a cubic reflector
  • the ellipsometer is provided with a polarizing beam splitter for separating the two beams originating from the Zeeman laser, the one beam serving as the working beam and the other as the reference beam.
  • the ellipsometer is characterized in that, in the path of the working beam between the polarizing beam splitter and the sample, a polarization element is positioned which rotates by an angle of, for example, 45°, and in the path of the reference beam between the polarizing beam splitter and the rear side of the non-polarizing beam splitter another polarization element is positioned which rotates the polarization direction by an angle of, for example, 45°, while the working beam impinges on the surface of the sample directly after transmission through the polarization element.
  • the ellipsometer is designed in such a way that the beam transmitted by the polarizing beam splitter impinges on the front side of the non-polarizing beam splitter and the part thereof which is reflected by the non-polar ⁇ izing beam splitter provides the working beam and the part thereof which is transmitted by the non-polarizing beam splitter is blocked or scattered.
  • Figure 2 shows a set-up to explain the basic principle of the invention, by means of which optical parameters of the working beam, not necessarily ⁇ and ⁇ , can be measured;
  • Figures 3 and 4 show preferred embodiments of ellipsometers.
  • interferometric ellipso ⁇ meters which employ a Zeeman laser.
  • a Zeeman laser By employing a Zeeman laser, a fixed instead of a moving cubic reflector C can be used.
  • Use of a cubic reflector C is not necessary; in principle it is also poss ⁇ ible to use a different type of mirror.
  • the correct ellipsometric information can be derived from the electri ⁇ cal a.c. voltages V1 , V2 ( Figure 1). It is very important that the measurement signal and the reference signal are selected carefully and that they can interfere with one another, because otherwise information from the sample S will be lost.
  • An ellipsometer accord- ing to the invention therefore has to satisfy the following three criteria: a) a polarization unit or a polarizing beam splitter in the path of the working beam between the sample S and the Wollaston prism W should be avoided.
  • a polarization unit namely, selectively transmits components of a light beam with the cor ⁇ rect polarization vector, as a result of which such a projec ⁇ tion of the polarization vector will in general lead to infor- mation loss concerning the sample S;
  • a different frequency dependence of the working beam and the reference beam should be achieved, as only then is it possible to achieve a non-trivial phase difference between the two a.c. voltages V1 , V2.
  • both beams have the same frequency depen- dence, it can be readily demonstrated that no phase difference arises between the signals V 1 and V- and only the amplitude ratio of the a.c. voltages V1 , V2 comprises information con ⁇ cerning the sample S; c) the two frequencies of a Zeeman laser used can only be separ- ated optically by employing the different polarization states.
  • both waves would be given the same polarization state and could no longer be separated from one another. Therefore, no polarization unit should be posi- tioned between the Zeeman laser used and the first beam split ⁇ ter.
  • a first ellipsometer which satisfies the above-mentioned criteria a), b) and c) can be designed based on the device accord ⁇ ing to Figure 2.
  • the device according to Figure 2 differs in three points from the device according to Figure 1 : instead of a mono ⁇ chromatic laser L, a Zeeman laser Z is used, a Glan-Thompson prism G is not used, and the cubic reflector C takes up a fixed position.
  • the Zeeman laser Z emits two waves g g 2 which, for example, have a frequency difference of approximately 1.8 MHz. Such a Zeeman laser is known and requires no further explanation here.
  • the waves g 1 , g 2 encounter a non-polarizing beam splitter N which separates them into two at least almost equal parts.
  • a first part is produced by reflection on the surface of the non-polarizing beam splitter N and provides working beams g ml , g m2 which are directed at the sample S.
  • . g' m2 are P r °duced in the configuration according to Figure 2, which are reflected onto the non-polarizing beam splitter N.
  • FIG. 2 Another part of the beams g-, g 2 generated by the Zeeman laser Z is transmitted by the non-polarizing beam splitter N and forms two reference beams g - , g r2 .
  • the fixed cubic reflector C reflects the reference beams g r1 , g r2 to the rear face of the non- polarizing beam splitter N.
  • the remaining components in Figure 2 are identical to those in Figure 1.
  • the configuration according to Figure 2 cannot function as such, because the modified working beams g' m1 , g' m2 do not interfere correctly, at the rear side of the non-polarizing beam splitter N, with the reference beams g rl , g r2 .
  • a non-polarizing beam splitter N is inevitable, because a pola ⁇ rizing beam splitter is not permitted, owing to criterion a; e) polarization units are not permitted at the positions a (owing to criterion c), b (owing to criterion a) or e (owing to cri ⁇ terion a) ; f) a polarization unit or quarter-wave plate is required at posi ⁇ tion c or d (owing to criterion b) .
  • the working beams g m1 , g m2 impinge on the sample S at an angle of, for example, approximately 45°, just as in the known device according to Figure 1. This is not strictly neces- sary, however, although it is indeed preferable.
  • the normal of the sample S may form an angle between 0 and 90° with the incident working beams g m1 , g m2 just as in the configuration according to Figure 1.
  • the most suitable choice to achieve a construction in which the sample S is perpendicular to the measuring waves g m1 , g m2 is to set up, at position d in the system according to Figure 2, a quarter-wave plate with an orientation of 45°.
  • Such a quarter-wave plate in combination with the cubic reflector C rotates the polar ⁇ ization of the reference beam by an angle of 90°.
  • the output signals V1 , V2 of the photodiodes D1 , D2, which are obtained by means of this set-up, are valid signals from which optical information can be derived; - strictly speaking, this set-up cannot be called an ellipso ⁇ meter, because a somewhat different combination of r and r s is measured; nevertheless, this combination may still be suitable for some applications; the different frequency dependence of the s- and p-waves in the reference beams g r1 , g r2 and the working beams g ml , g m2 make the system sensitive to vibrations of the optical elements used;
  • the working beams g m1 , g m2 reflected by the sample S are directed downwards from the optical plane. If this is to be avoided, the laser beams themselves or the laser Z should be rotated by 45°. The latter is simpler and can be achieved by placing, at point d in Figure 2, a Glan-Thompson polarization unit set to 45°. The follow ⁇ ing can be demonstrated for such a set-up: the set-up does not, strictly speaking, provide ellipsometric information;
  • a Zeeman laser Z generates two beams g.,, g 2 .
  • a first beam splitter B1 diverts a part of the beams g-, g 2 for signal processing purposes.
  • the diverted beams after transmission through a polarizing element (G 3 ), are intercepted by a photodiode D3 and converted into a sinusoidal a.c. voltage V3 having a frequency equal to the fre ⁇ quency difference between g 1 and g 2 .
  • G 3 polarizing element
  • V3 sinusoidal a.c. voltage
  • the use of a beam splitter B1 of this type for signal processing purposes is known per se and is not explained here in more detail. Its use is not essential for the action of the ellipsometer itself.
  • the remaining part of the beams g 1 , g 2 passes the beam splitter B1 and reaches a second polarizing beam splitter B2.
  • This second polarizing beam splitter B2 splits the two Zeeman beams g 1 , g 2 , because this polarizing beam splitter B2 is capable of differ ⁇ entiating between the different polarization directions of the two Zeeman beams g.,, g 2 .
  • the beam g 2 is used, in the present example, as a working beam and encounters the sample S, after the polariz- ation direction has been rotated with the aid of, for example, a Glan-Thompson prism G1 by an angle of 45°.
  • the working beam g' 2 reflected by the sample surface S then contains the optical infor ⁇ mation with regard to the surface of the sample S.
  • the Zeeman component g 1 propagates from the polarizing beam splitter B2 via a different path and first encounters a mirror M. After reflection on the mirror surface, said Zeeman component g.
  • the modified working beam g' 2 encounters the front face of the non-polarizing beam splitter N, and after transmission through the non-polarizing beam splitter N the modified working beam g' 2 interferes with the reference beam g 1 .
  • the composite beam is then split into two ortho- gonal polarizations (for example p and s) with the aid of, for example, a Wollaston prism W.
  • the two orthogonal polarizations are again each converted, by means of a photodiode D1 , D2, into elec ⁇ trical a.c. voltages V1 , V2.
  • the two electrical a.c. voltages V1 , V2 contain the same optical information as can be achieved with the set-up according to Figure 1 , albeit that the frequency of these a.c. voltages V1 , V2 is now equal to the frequency difference of the original Zeeman beams g.,, g 2 , which is, for example, in the order of magnitude of 1 MHz.
  • the measuring frequency is much higher than in the known device according to Figure 1. It can be seen in Figure 3 that the working beam g 2 arrives at an angle of 45° at the sample S. This considerably simplifies the interference of the working beam g' 2 , modified by the surface of the sample S, with the reference beam g 1 on the rear side of the non-polarizing beam splitter N. Should it be desired to have the working beam g 2 arrive at the sample S at a different angle, additional mirrors or suitably disposed glass fibre cables should be employed to arrange for interference to take place between the modified working beam g' 2 and the reference beam g ⁇ after combination in the non-polariz ⁇ ing beam splitter N.
  • the polarizations of the beams g 1 , g 2 separated downstream of the beam splitter B2 match each other in such a way at the rear face of the non-polarizing beam splitter N, that interference can occur.
  • the reference beam g- j it is not absolutely necessary for the reference beam g- j to be directed in the correct manner onto the rear face of the non-polarizing beam splitter N with the aid of one mirror M. If desired, it is also possible to use a plurality of mirrors, or alignment of the reference beam g 1 can take place with the aid of suitably chosen polarization-retaining glass fibre cables.
  • An advantage of the set-up according to Figure 3 may be that the working beam g 2 reflects only once on the surface of the sample S. As a result, weakly reflecting samples can also be studied.
  • FIG. 4 A preferred embodiment of an ellipsometer based on a Zeeman laser Z is shown in Figure 4.
  • the same reference numerals refer to the same components as in the previous figures, and the description of these will not be repeated here.
  • the Zeeman beam g 2 transmitted by the polarizing beam splitter B2 now impinges on the front side of a non-polarizing beam splitter N after passing through a polarization unit G1 which rotates the polarization direction by, for example, 45° and may be, for example, a Glan- Thompson prism. That part of the Zeeman beam g 2 , which is reflected by the front face of the non-polarizing beam splitter N, impinges on the surface of the sample S as the working beam g m2 .
  • the polarizing beam splitter B2 taps off the Zeeman beam g 1 and directs this onto, for example, three successive mirrors M1 , M2, M3, all this in such a way that the tapped-off beam g- can impinge, as the reference beam, on the rear face of the non-polar ⁇ izing beam splitter N.
  • the polarization state of the reference beam g 1 is rotated by an angle of 45° with the aid of a polarization unit G2, for example a Glan-Thompson prism.
  • the Glan-Thompson prism G2 is drawn between the mirror M3 and the rear face of the non-polarizing beam splitter N, but that is not strictly necessary. Any other position on the path along which the reference beam g 1 propagates is likewise possible.
  • the reference beam g 1 interferes with the modified work ⁇ ing beam g' m2 after combination on the rear face of the non-polar- izing beam splitter N.
  • the composite reference beam is then split again with the aid of a Wollaston prism W into the two orthogonal polarizations (p and s).
  • the electrical signals V1 , V2 contain the same optical information as those in Figure 3, apart from the double reflection in Figure 4, in analogy to the ellipsometer according to Figure 1.
  • the set-up according to Figure 4 has important resemblan ⁇ ces to the set-up according to Figure 1.
  • An important difference is not only the use of a Zeeman laser Z, but also that the beam g 2 , which impinges on the front face of the non-polarizing beam split ⁇ ter N, is only used for the benefit of the measuring objectives.
  • the non-polarizing beam splitter N transmits part of the incident Zeeman beam g 2 , just as the non-polarizing beam splitter N in the set-up according to Figure 1 transmits part of the incident beam g to provide a reference beam g r .
  • the set-up according to Figure 4 has advantages over that according to Figure 3. All the components of the ellipsometer, except the mirror M (and obviously the sample S) can be arranged in one compact housing, in which there is an opening for the working beam g m2 and the returning modified working beam g' m2 . Because, in the set-up according to Figure 3, the incident working beam g 2 and the modified working beam g' 2 travel along different optical paths, this is not as simple with the set-up according to Figure 3. More ⁇ over, the alignment of the sample S with respect to the ellipso- meter is much simpler.
  • the present invention is not limited to the embodiments as shown in the accompanying figures. If desired, the optical paths of the various working and reference beams may be varied with the aid of mirrors, glass fibres and/or polarization units.

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Abstract

Ellipsomètre comportant au moins un laser Zeeman (Z) destiné à produire deux faisceaux (g1, g2) à léger déplacement de fréquence et (après transmission dans un cristal biréfringent (lame quart d'onde)) à polarisation linéaire mais perpendiculaire l'un à l'autre, un séparateur de faisceau non polarisant (N) en aval duquel un faisceau utile (g'm2) modifié par échantillon (S) entraîne une interférence d'un faisceau de référence (g1), et une unité (W) servant à séparer deux composantes (p et s) orthogonales du faisceau d'interférence ainsi créé et à produire deux tensions alternatives (V1, V2) correspondant à ces composantes, des dispositifs polariseurs (G1, G2) étant prévus pour régler les sens de polarisation du faisceau utile (g2) et/ou du faisceau de référence (g1) afin de provoquer l'interférence voulue des deux faisceaux.
PCT/NL1993/000283 1992-12-31 1993-12-30 Ellipsometre de zeeman WO1994016310A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU58441/94A AU5844194A (en) 1992-12-31 1993-12-30 Zeeman ellipsometer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL9202303A NL194893C (nl) 1992-12-31 1992-12-31 Zeeman-ellipsometer.
NL9202303 1992-12-31

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Publication Number Publication Date
WO1994016310A1 true WO1994016310A1 (fr) 1994-07-21

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1111734C (zh) * 1997-05-09 2003-06-18 代尔夫特技术大学 使用两个激光器的椭圆偏振仪
US7282729B2 (en) * 2003-08-20 2007-10-16 Xyratex Technology Limited Fabry-Perot resonator apparatus and method for observing low reflectivity surfaces
DE102007062052A1 (de) * 2007-12-21 2009-06-25 Siemens Ag Schichtdickenmessung an transparenten Schichten
US7688435B2 (en) 1997-09-22 2010-03-30 Kla-Tencor Corporation Detecting and classifying surface features or defects by controlling the angle of the illumination plane of incidence with respect to the feature or defect
US7714995B2 (en) 1997-09-22 2010-05-11 Kla-Tencor Corporation Material independent profiler
CN103234909A (zh) * 2013-04-26 2013-08-07 北京理工大学 一种快速脉冲激光偏振度测量装置

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1111734C (zh) * 1997-05-09 2003-06-18 代尔夫特技术大学 使用两个激光器的椭圆偏振仪
US7688435B2 (en) 1997-09-22 2010-03-30 Kla-Tencor Corporation Detecting and classifying surface features or defects by controlling the angle of the illumination plane of incidence with respect to the feature or defect
US7714995B2 (en) 1997-09-22 2010-05-11 Kla-Tencor Corporation Material independent profiler
US7282729B2 (en) * 2003-08-20 2007-10-16 Xyratex Technology Limited Fabry-Perot resonator apparatus and method for observing low reflectivity surfaces
DE102007062052A1 (de) * 2007-12-21 2009-06-25 Siemens Ag Schichtdickenmessung an transparenten Schichten
CN103234909A (zh) * 2013-04-26 2013-08-07 北京理工大学 一种快速脉冲激光偏振度测量装置

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AU5844194A (en) 1994-08-15
NL194893B (nl) 2003-02-03
NL9202303A (nl) 1994-07-18

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