WO1994010211B1 - Aminoplast-curable film-forming compositions providing films having resistance to acid etching - Google Patents

Aminoplast-curable film-forming compositions providing films having resistance to acid etching

Info

Publication number
WO1994010211B1
WO1994010211B1 PCT/US1993/010172 US9310172W WO9410211B1 WO 1994010211 B1 WO1994010211 B1 WO 1994010211B1 US 9310172 W US9310172 W US 9310172W WO 9410211 B1 WO9410211 B1 WO 9410211B1
Authority
WO
WIPO (PCT)
Prior art keywords
methylol
film
groups
composition
forming composition
Prior art date
Application number
PCT/US1993/010172
Other languages
French (fr)
Other versions
WO1994010211A1 (en
Filing date
Publication date
Application filed filed Critical
Priority to KR1019980706638A priority Critical patent/KR100186927B1/en
Priority to CA002145850A priority patent/CA2145850C/en
Priority to AU54106/94A priority patent/AU673561B2/en
Priority to DE69308585T priority patent/DE69308585T2/en
Priority to EP93924406A priority patent/EP0666874B1/en
Priority to JP6511209A priority patent/JP2672031B2/en
Priority to KR1019950701698A priority patent/KR0179461B1/en
Priority to BR9307434A priority patent/BR9307434A/en
Publication of WO1994010211A1 publication Critical patent/WO1994010211A1/en
Publication of WO1994010211B1 publication Critical patent/WO1994010211B1/en

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Abstract

An aminoplast-curable film-forming composition is disclosed. The film-forming composition is a crosslinkable composition comprising (1) a material containing a plurality of carbamate and/or urea functional groups and (2) an aminoplast crosslinking agent. The composition provides a coating with improved acid etch resistance, making the coating particularly useful as an automotive clear coat.

Claims

FOR THE PURPOSES OF INFORMATION ONLYCodes used to identify States party to the PCT on the front pages of pamphl 2ts publishing international applications under the PCT.AT Austria GB United Kingdom MR MauritaniaAU Australia CE Georgia MW MalawiBB Barbados CN Guinea NE NigerBE Belgium CR Greece NL NetherlandsBF Burkina Faso HU Hungary NO NorwayBC Bulgaria IE Ireland NZ New ZealandBJ Benin IT Italy PL PolandBR Brazil JP Japan PT PortugalBY Belarus KE Kenya RO RomaniaCA Canada KG Kyrgystan RU Russian FederationCF Central African Rep ublic KP Democratic People's Republic SD SudanCG Congo of Korea SE SwedenCH Switzerland KR Republic of Korea SI SloveniaCl Cόte d'lvoire KZ Kazakhstan SK SlovakiaCM Cameroon LI Liechtenstein SN SenegalCN China LK Sri Lanka TD ChadCS Czechoslovakia LU Luxembourg TC TogoCZ Czech Republic LV Latvia TJ TajikistanDE Germany MC Monaco TT Trinidad and TobagoDK Denmark MD Republic of Moldova UA UkraineES Spain MC Madagascar US United Slates of AmericaFl Finland ML Mali uz UzbekistanFR France MN Mongolia VN Viet NamCA Gabon 1 AMENDED CLAIMS[received by the International Bureau on 13 June 1994 (13.06.94); original claims 2-5 and 10-12 cancelled; remaining claims amended and renumbered as claims 1-5 (2 pages)]
1. A curable film-forming composition comprising (1) 50 to 90 percent by weight based on weight of resin solids in the film- forming composition of a material selected from the group consisting of polyesters, polyurethanes or mixtures thereof and containing a plurality of terminal or pendant urea or carbamate groups only of the structure:
X - C - N - H
Figure imgf000003_0001
and/or urethane group of the structure:
H
Figure imgf000003_0002
where X is -N I or -O and R is H or alkyl of 1-18 carbon atoms or R is bonded to X and forms part of a 5 or 6 membered ring and R1 is alkyl of 1 to 18 carbon atoms; and (2) 10 to 50 percent by weight based on weight of resin solids in the film-forming composition of an aminoplast crosslinking agent containing methylol and/or methylol ether groups; said film-forming composition being crosslinkable through reaction of said pendant or terminal groups with said methylol and/or methylol ether groups wherein the equivalent ratio of said pendant or terminal groups to methylol or methylol ether groups is from 0.5 to 2:1 and is sufficient to form a crosslinked film; said film-forming composition being further characterized as having a calculated hydroxyl value less than 50 based on solid weight of said film-forming composition, excluding any hydroxyl functionality associated with N-methylol groups so as to result in a crosslinked coating which has a substantial number of urethane and/or urea crosslinks arising from said reaction of pendant or terminal groups with said methylol and/or methylol ether groups, giving said crosslinked coating a high level of acid etch resistance.
2. The composition of claim 1 in which the material has on average at least two of said terminal or pendant groups per molecule.
3. The composition of claim 1 in which the material has an equivalent weight of from about 140 to 2500 based on equivalents of said terminal or pendant groups.
4. The composition of claim 1 in which X is -O and R is selected from the class consisting of H and alkyl containing from 1 to 6 carbon atoms and R' is alkyl containing from 1 to 6 carbon atoms.
5. The composition of claim 1 in which the aminoplast is a condensate of melamine with formaldehyde and optionally an alcohol containing from 1 to 6 carbon atoms.
PCT/US1993/010172 1992-10-30 1993-10-25 Aminoplast-curable film-forming compositions providing films having resistance to acid etching WO1994010211A1 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
KR1019980706638A KR100186927B1 (en) 1992-10-30 1993-10-25 Aminoplast-curable film-forming compositions providing films having resistance to acid etching
CA002145850A CA2145850C (en) 1992-10-30 1993-10-25 Aminoplast-curable film-forming compositions providing films having resistance to acid etching
AU54106/94A AU673561B2 (en) 1992-10-30 1993-10-25 Aminoplast-curable film-forming compositions providing filmshaving resistance to acid etching
DE69308585T DE69308585T2 (en) 1992-10-30 1993-10-25 AMINOPLAST CURABLE FILM-FORMING COMPOSITIONS TO FILM WITH ACID RESISTANCE TO ACID
EP93924406A EP0666874B1 (en) 1992-10-30 1993-10-25 Aminoplast-curable film-forming compositions providing films having resistance to acid etching
JP6511209A JP2672031B2 (en) 1992-10-30 1993-10-25 Aminoplast-curable film-forming composition that gives a film having acid etching resistance
KR1019950701698A KR0179461B1 (en) 1992-10-30 1993-10-25 Aqueous aminoplast-curable film-forming compositions providing films having resistance to acid etching
BR9307434A BR9307434A (en) 1992-10-30 1993-10-25 Carious film-forming composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US96878692A 1992-10-30 1992-10-30
US07/968,786 1992-10-30

Publications (2)

Publication Number Publication Date
WO1994010211A1 WO1994010211A1 (en) 1994-05-11
WO1994010211B1 true WO1994010211B1 (en) 1994-07-21

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Family Applications (1)

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PCT/US1993/010172 WO1994010211A1 (en) 1992-10-30 1993-10-25 Aminoplast-curable film-forming compositions providing films having resistance to acid etching

Country Status (12)

Country Link
US (2) US6228974B1 (en)
EP (2) EP0666874B1 (en)
JP (4) JP2672031B2 (en)
KR (2) KR100186927B1 (en)
AU (2) AU673561B2 (en)
BR (1) BR9307434A (en)
CA (1) CA2145850C (en)
DE (2) DE69308585T2 (en)
ES (2) ES2101353T3 (en)
MX (1) MX9306714A (en)
TW (1) TW288027B (en)
WO (1) WO1994010211A1 (en)

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