WO1993016921A1 - Method of reducing moisture content of hermetic packages containing semiconductor devices - Google Patents
Method of reducing moisture content of hermetic packages containing semiconductor devices Download PDFInfo
- Publication number
- WO1993016921A1 WO1993016921A1 PCT/US1993/001623 US9301623W WO9316921A1 WO 1993016921 A1 WO1993016921 A1 WO 1993016921A1 US 9301623 W US9301623 W US 9301623W WO 9316921 A1 WO9316921 A1 WO 9316921A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- package
- cyanate ester
- moisture content
- hermetic
- semiconductor device
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title claims abstract description 13
- 239000004643 cyanate ester Substances 0.000 claims abstract description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 10
- 239000000853 adhesive Substances 0.000 claims description 10
- 230000001070 adhesive effect Effects 0.000 claims description 10
- 238000007789 sealing Methods 0.000 claims description 9
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 claims description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 5
- 239000001569 carbon dioxide Substances 0.000 claims description 5
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000009472 formulation Methods 0.000 claims description 3
- 230000006378 damage Effects 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910000833 kovar Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910015363 Au—Sn Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- 230000000266 injurious effect Effects 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/16—Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
- H01L23/18—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
- H01L23/26—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device including materials for absorbing or reacting with moisture or other undesired substances, e.g. getters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
Definitions
- the present invention relates to a method of reducing the water moisture content in a hermetic package containing a semiconductor device to minimize the possibility of damage to the semiconductor device which may be caused by the presence of water in the package.
- Hermetic packages for semiconductor devices are typically ceramic packages sealed with caps or lids using glass or metal seals. Hermetic sealing is employed to prevent entry into the package of undesirable chemicals which could damage the semiconductor device contained therein. However, the presence of moisture, even in very small or trace amounts, within the hermetic package can also damage the semiconductor device. To avoid any damage to the semiconductor device from moisture contained witi in the package after hermetic sealing, it is necessary to have the moisture content less than 5,000 ppm, otherwise moisture induced corrosion failure of the semiconductor device may result.
- One of the sources of moisture in the package can be the inorganic adhesive used to attach the semiconductor device to a substrate.
- inorganic adhesive such as silver filled glass paste have been used. These adhesives do not release moisture upon heating for curing.
- common die attach adhesive containing polymers, epoxy, polyimide, etc. give off moisture upon heating for curing and therefore cannot be used where low moisture conditions within the hermetic package are required.
- the present invention provides a method of reducing the water moisture content in a hermetic package containing a semiconductor device to prevent damage to the semiconductor.
- a method of reducing the water moisture content which comprises incorporating within the package a small but effective amount of a cyanate ester.
- the cyanate ester is reacted with water moisture to produce an intermediate imidocarbonic acid which becomes moleculariy rearranged upon formation into a stable carbamate molecular structure.
- the carbamate Upon exposure of the molecular carbamate structure to an elevated temperature such as would be used to cure the die attach adhesive securing the semiconductor device to the substrate, the carbamate further reacts with water to produce carbon dioxide.
- the presence of carbon dioxide within the hermetic package is not deleterious or damaging to the semiconductor device and corrosion of the device, as may be induced by the presence of water moisture within the package, is thereby avoided.
- Figure 1 is a description of the chemical reactions which the cyanate ester undergo to reduce the moisture content within a hermetic package
- Figure 2 is a graph showing the effects of aging at 150 °C comparing the amount of moisture and carbon dioxide which is released.
- cyanate ester undergoes the chemical reactions described in Figure 1. As can be seen, the cyanate ester reacts with the water moisture to produce an imidocarbonic acid as an intermediate which quickly rearranges upon formation into a stable carbamate.
- the carbamate upon exposure to an elevated temperature of at least 100°C yields carbon dioxide which is not injurious to semiconductor device in the package.
- the cyanate ester may be incorporated within the package in any suitable manner.
- One manner of incorporating cyanate ester in the package is to incorporate it in a die attach adhesive. Examples of suitable die attach adhesive compositions in which cyanate ester has been incorporated appear below in Table I.
- the moisture content in a hermetic pack in which the cyanate ester has been incorporated has been found to be extremely low. In fact, the moisture content is even lower than that of a blank cavity or of package which does not contain any adhesive or other source of moisture.
- the data shown in Table II compares the moisture content for polyimide, epoxy die attach materials, a blank hermetic package, and a package in which cyanate ester has been incorporated.
- the moisture content in a package employing epoxy resin but which does not include cyanate ester within it is 57,500 ppm as compared to less than 100 ppm moisture in a comparably sized ceramic package in which cyanate ester has been incorporated.
- Two common methods of sealing hermetic packages containing semiconductor devices are to braise a lid, such as a gold plated "Kovar" lid, onto the package with a suitable gold alloy such as an Au-Sn alloy.
- Another method is glass sealing.
- glass sealing a glass is used to form a sandwiched seal between a ceramic lid and a ceramic substrate.
- glass sealing is more popular because of its lower cost.
- current techniques of glass sealing require sealing temperatures well above 400 °C and are therefore not suitable for many applications because such elevated temperatures may damage some semiconductor devices.
- a cyanate ester into the standard ceramic hermetic package is to apply a small amount of cyanate ester to the backside of the lid, such as either a "Kovar" lid or ceramic lid.
- a formulation may comprise a cyanate ester compound.
- the formulation may also include fillers, alumina and/or silicon carbide.
- the package and lid is then sealed at an elevated temperature, e.g., 275°C to 400°C.
- a small amount of alkylphenol and/or a metal curing catalyst may be added to the cyanate ester to increase adhesiveness.
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07843735 US5195299B1 (en) | 1992-02-28 | 1992-02-28 | Method of reducing moisture content of hermetic packages containing semiconductor devices |
US07/843,735 | 1992-02-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1993016921A1 true WO1993016921A1 (en) | 1993-09-02 |
Family
ID=25290873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1993/001623 WO1993016921A1 (en) | 1992-02-28 | 1993-02-25 | Method of reducing moisture content of hermetic packages containing semiconductor devices |
Country Status (5)
Country | Link |
---|---|
US (1) | US5195299B1 (fi) |
AU (1) | AU3776293A (fi) |
MX (1) | MX9301072A (fi) |
TW (1) | TW239898B (fi) |
WO (1) | WO1993016921A1 (fi) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5489637A (en) * | 1992-05-28 | 1996-02-06 | Johnson Matthey Inc | Low temperature flexible die attach adhesive and articles using same |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5371178A (en) * | 1990-10-24 | 1994-12-06 | Johnson Matthey Inc. | Rapidly curing adhesive and method |
US5386000A (en) * | 1990-10-24 | 1995-01-31 | Johnson Matthey Inc. | Low temperature flexible die attach adhesive and articles using same |
US5524422A (en) * | 1992-02-28 | 1996-06-11 | Johnson Matthey Inc. | Materials with low moisture outgassing properties and method of reducing moisture content of hermetic packages containing semiconductor devices |
US5504374A (en) * | 1994-02-14 | 1996-04-02 | Lsi Logic Corporation | Microcircuit package assembly utilizing large size die and low temperature curing organic die attach material |
US5708129A (en) * | 1995-04-28 | 1998-01-13 | Johnson Matthey, Inc. | Die attach adhesive with reduced resin bleed |
US5783621A (en) * | 1996-06-10 | 1998-07-21 | Johnson Matthey, Inc. | Method of decreasing bleed fom organic-based formulations and anti-bleed compositions |
US6462108B1 (en) | 2000-07-20 | 2002-10-08 | National Starch And Chemical Investment Holding Corporation | High Tg potting compound |
US20060113683A1 (en) * | 2004-09-07 | 2006-06-01 | Nancy Dean | Doped alloys for electrical interconnects, methods of production and uses thereof |
US20070138442A1 (en) * | 2005-12-19 | 2007-06-21 | Weiser Martin W | Modified and doped solder alloys for electrical interconnects, methods of production and uses thereof |
WO2017065282A1 (ja) * | 2015-10-16 | 2017-04-20 | 東京エレクトロン株式会社 | 基板液処理方法、基板液処理装置及び記憶媒体 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1743167A (en) * | 1923-12-29 | 1930-01-14 | Westinghouse Electric & Mfg Co | Method of and means for providing inert atmospheres |
US2895270A (en) * | 1955-11-14 | 1959-07-21 | Minnesota Mining & Mfg | Packaging material |
US3586926A (en) * | 1967-11-30 | 1971-06-22 | Nippon Electric Co | Hermetically sealed semiconductor device with absorptive agent |
US4280885A (en) * | 1979-11-09 | 1981-07-28 | Savery James W | Method of and apparatus for active electro-chemical water and similar environmental contaminant elimination in semi-conductor and other electronic and electrical devices and the like |
US4375498A (en) * | 1980-02-09 | 1983-03-01 | Peintures Corona S.A. | Wet-on-wet coating process |
US5114003A (en) * | 1991-03-28 | 1992-05-19 | E. I. Du Pont De Nemours And Company | Tablet vial with desiccant in bottom |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5150195A (en) * | 1990-10-24 | 1992-09-22 | Johnson Matthey Inc. | Rapid-curing adhesive formulation for semiconductor devices |
-
1992
- 1992-02-28 US US07843735 patent/US5195299B1/en not_active Expired - Lifetime
-
1993
- 1993-02-25 WO PCT/US1993/001623 patent/WO1993016921A1/en active Application Filing
- 1993-02-25 AU AU37762/93A patent/AU3776293A/en not_active Abandoned
- 1993-02-26 MX MX9301072A patent/MX9301072A/es unknown
- 1993-03-02 TW TW082101538A patent/TW239898B/zh active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1743167A (en) * | 1923-12-29 | 1930-01-14 | Westinghouse Electric & Mfg Co | Method of and means for providing inert atmospheres |
US2895270A (en) * | 1955-11-14 | 1959-07-21 | Minnesota Mining & Mfg | Packaging material |
US3586926A (en) * | 1967-11-30 | 1971-06-22 | Nippon Electric Co | Hermetically sealed semiconductor device with absorptive agent |
US4280885A (en) * | 1979-11-09 | 1981-07-28 | Savery James W | Method of and apparatus for active electro-chemical water and similar environmental contaminant elimination in semi-conductor and other electronic and electrical devices and the like |
US4375498A (en) * | 1980-02-09 | 1983-03-01 | Peintures Corona S.A. | Wet-on-wet coating process |
US5114003A (en) * | 1991-03-28 | 1992-05-19 | E. I. Du Pont De Nemours And Company | Tablet vial with desiccant in bottom |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5612403A (en) * | 1990-10-24 | 1997-03-18 | Johnson Matthey, Inc. | Low temperature flexible die attach adhesive and articles using same |
US5489637A (en) * | 1992-05-28 | 1996-02-06 | Johnson Matthey Inc | Low temperature flexible die attach adhesive and articles using same |
Also Published As
Publication number | Publication date |
---|---|
US5195299B1 (en) | 1996-02-13 |
TW239898B (fi) | 1995-02-01 |
MX9301072A (es) | 1993-11-01 |
US5195299A (en) | 1993-03-23 |
AU3776293A (en) | 1993-09-13 |
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