WO1992015633A3 - Gestion amelioree des solutions d'effluents contenant des matieres photoresistantes - Google Patents

Gestion amelioree des solutions d'effluents contenant des matieres photoresistantes Download PDF

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Publication number
WO1992015633A3
WO1992015633A3 PCT/US1992/001403 US9201403W WO9215633A3 WO 1992015633 A3 WO1992015633 A3 WO 1992015633A3 US 9201403 W US9201403 W US 9201403W WO 9215633 A3 WO9215633 A3 WO 9215633A3
Authority
WO
WIPO (PCT)
Prior art keywords
waste solution
solution containing
rejection
photoresist materials
improved management
Prior art date
Application number
PCT/US1992/001403
Other languages
English (en)
Other versions
WO1992015633A2 (fr
Inventor
John Walter Strantz Jr
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of WO1992015633A2 publication Critical patent/WO1992015633A2/fr
Publication of WO1992015633A3 publication Critical patent/WO1992015633A3/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0081—After-treatment of organic or inorganic membranes
    • B01D67/0093—Chemical modification
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

La présente invention a trait à la gestion d'une solution d'effluents contenant des résines photorésistantes en déversant lesdits effluents non décantés sur un dispositif à membrane muni d'une membrane Desal 5 tendant à accroître suffisamment la division de masse moléculaire des molécules organiques non chargées pour que, sur la base de la masse, le passage de l'agent alcalifiant est supérieur à 90 %, le rejet de matière photorésistante est pratiquement total, le rejet de colorant est supérieur à 90 % et le rejet de demande chimique en oxygène est supérieur à 80 %, de manière à obtenir une solution filtrée propre pouvant être recyclée et un concentrat à éliminer.
PCT/US1992/001403 1991-03-01 1992-03-02 Gestion amelioree des solutions d'effluents contenant des matieres photoresistantes WO1992015633A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US663,004 1991-03-01
US07/663,004 US5112491A (en) 1991-03-01 1991-03-01 Management of waste solution containing photoresist materials

Publications (2)

Publication Number Publication Date
WO1992015633A2 WO1992015633A2 (fr) 1992-09-17
WO1992015633A3 true WO1992015633A3 (fr) 1992-10-29

Family

ID=24660110

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1992/001403 WO1992015633A2 (fr) 1991-03-01 1992-03-02 Gestion amelioree des solutions d'effluents contenant des matieres photoresistantes

Country Status (2)

Country Link
US (1) US5112491A (fr)
WO (1) WO1992015633A2 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5275734A (en) * 1992-08-04 1994-01-04 International Business Machines Corporation Chemical pre-treatment and biological destruction of propylene carbonate waste streams effluent streams to reduce the biological oxygen demand thereof
US5262054A (en) 1992-12-30 1993-11-16 E. I. Du Pont De Nemours And Company Process for opening reverse osmosis membranes
US5403895A (en) * 1993-04-07 1995-04-04 The University Of North Carolina At Chapel Hill Synthesis of aminated PVCs by controlled reaction with piperazine
DE4319994A1 (de) * 1993-06-17 1994-12-22 Bayer Ag Verfahren zur Aufkonzentration von Lack-Overspray
US5350714A (en) * 1993-11-08 1994-09-27 Shipley Company Inc. Point-of-use purification
US5811224A (en) * 1994-08-24 1998-09-22 Bayer Corporation Process for rejuvenating developer in printing plate development
EP0747773A4 (fr) * 1994-12-27 1997-06-18 Mitsubishi Chem Corp Procede et appareil pour traiter un revelateur pour materiau photosensible sans halogenure d'argent et contenant des pigments, et machine a developper automatique
US6074561A (en) * 1995-10-23 2000-06-13 Phoenankh Corp. Apparatus and method for recovering photoresist developers and strippers
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
US6106722A (en) * 1997-08-12 2000-08-22 Kinetico Incorporated Filtering photoresist-containing liquid
JP2003167358A (ja) * 2001-11-29 2003-06-13 Nagase & Co Ltd レジスト剥離廃液の再生装置及び再生方法
CN108905626B (zh) * 2018-07-20 2021-06-08 北京亿家清泉环保科技有限公司 一种复合超滤膜及其制备方法和应用
EP3875642A1 (fr) * 2020-03-04 2021-09-08 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Procédé de traitement des eaux de rinçage provenant de la fabrication de cartes de circuit imprimé et/ou de substrats

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0254550A1 (fr) * 1986-07-23 1988-01-27 Sumitomo Heavy Industries, Ltd Traitement d'une solution de déchets de photoréserves
JPS6331591A (ja) * 1986-07-23 1988-02-10 Sumitomo Heavy Ind Ltd フオトレジスト廃液処理方法
JPS63178888A (ja) * 1987-01-17 1988-07-22 Sumitomo Heavy Ind Ltd フオトレジスト含有廃液の処理方法
EP0401964A2 (fr) * 1989-06-07 1990-12-12 E.I. Du Pont De Nemours And Company Traitement de membranes pour l'osmose inverse

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2388077A1 (fr) * 1977-04-22 1978-11-17 Rhone Poulenc Ind Liant pour la preparation de compositions aqueuses pour couchage de papiers et cartons pour impression
JPH03294989A (ja) * 1990-08-09 1991-12-26 Yoshiro Nakamatsu 薄型金種選択迅速軽量小銭キーパー

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0254550A1 (fr) * 1986-07-23 1988-01-27 Sumitomo Heavy Industries, Ltd Traitement d'une solution de déchets de photoréserves
JPS6331591A (ja) * 1986-07-23 1988-02-10 Sumitomo Heavy Ind Ltd フオトレジスト廃液処理方法
JPS63178888A (ja) * 1987-01-17 1988-07-22 Sumitomo Heavy Ind Ltd フオトレジスト含有廃液の処理方法
EP0401964A2 (fr) * 1989-06-07 1990-12-12 E.I. Du Pont De Nemours And Company Traitement de membranes pour l'osmose inverse

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 12, no. 242 (C-510)8 July 1988 & JP,A,63 031 591 ( SUMITOMO HEAVY IND LTD ) 10 February 1988 *
PATENT ABSTRACTS OF JAPAN vol. 12, no. 455 (C-548)29 November 1988 & JP,A,63 178 888 ( SUMITO HEAVY IND LTD ) 22 July 1988 *

Also Published As

Publication number Publication date
US5112491A (en) 1992-05-12
WO1992015633A2 (fr) 1992-09-17

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