WO1992013062A1 - Jetting device for treating cell - Google Patents

Jetting device for treating cell Download PDF

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Publication number
WO1992013062A1
WO1992013062A1 PCT/JP1992/000028 JP9200028W WO9213062A1 WO 1992013062 A1 WO1992013062 A1 WO 1992013062A1 JP 9200028 W JP9200028 W JP 9200028W WO 9213062 A1 WO9213062 A1 WO 9213062A1
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WO
WIPO (PCT)
Prior art keywords
gas
cylinder
piston
cell treatment
injection device
Prior art date
Application number
PCT/JP1992/000028
Other languages
French (fr)
Japanese (ja)
Inventor
Minoru Igari
Minoru Takahashi
Ichiro Takakura
Naohiko Takahashi
Masahiko Kitayama
Original Assignee
Nippon Zeon Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP3075539A external-priority patent/JPH04237486A/en
Priority claimed from JP3075538A external-priority patent/JPH04237485A/en
Application filed by Nippon Zeon Co., Ltd. filed Critical Nippon Zeon Co., Ltd.
Publication of WO1992013062A1 publication Critical patent/WO1992013062A1/en

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    • CCHEMISTRY; METALLURGY
    • C12BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12NMICROORGANISMS OR ENZYMES; COMPOSITIONS THEREOF; PROPAGATING, PRESERVING, OR MAINTAINING MICROORGANISMS; MUTATION OR GENETIC ENGINEERING; CULTURE MEDIA
    • C12N15/00Mutation or genetic engineering; DNA or RNA concerning genetic engineering, vectors, e.g. plasmids, or their isolation, preparation or purification; Use of hosts therefor
    • C12N15/09Recombinant DNA-technology
    • C12N15/87Introduction of foreign genetic material using processes not otherwise provided for, e.g. co-transformation
    • CCHEMISTRY; METALLURGY
    • C12BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12MAPPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
    • C12M35/00Means for application of stress for stimulating the growth of microorganisms or the generation of fermentation or metabolic products; Means for electroporation or cell fusion

Definitions

  • the present invention relates to a cell processing injection device used to cause transformation of cells.
  • this injection device for example, injects a cell treatment material such as metal fine powder to which genetic material is attached at a high speed, and injects the genetic material into cells by applying the sample to cells, including cells. It is used for high-speed injection of cells to cause cell fusion.
  • plastic piston with cell treatment material attached to its tip is accelerated at high speed using explosives, compressed air, etc., and collides with a plate with small holes, etc.
  • a processing material is injected.
  • the means for adjusting the speed of the piston that is, the cell treatment material
  • the means for adjusting the speed of the piston is not particularly effective in an apparatus using explosives except for changing the amount of explosive.
  • the present invention provides a cell processing injection device having a new configuration capable of sufficiently increasing the speed of the piston, that is, the cell processing material, and according to the piston speed. It is an object of the present invention to provide a cell processing spray device capable of easily and widely adjusting the spray speed of a cell processing material.
  • the cell processing injection device of the present invention includes a gas generator that generates a high-pressure gas instantaneously, a gas reservoir that is connected to the gas generator, and that receives the gas, and a gas reservoir that is connected to the gas reservoir. It has the same or smaller cross-sectional area as the gas reservoir, stores the piston with the cell treatment material attached to the tip, and moves the piston toward the tip by the gas from the gas reservoir.
  • the cylinder has a small hole and a small hole, and is provided on the tip of the cylinder or on the extension of the small hole. The cylinder collides with the piston to eject the cell treatment material from the small hole to the sample. And a resistor that is provided between the gas reservoir and the cylinder, and that adds resistance to the flow of gas to the cylinder.
  • the device can have a higher piston speed than the conventional one.
  • the volume can be adjusted between the gas generating section and the piston in the cylinder, and the flow of the gas to the cylinder can be reduced. It may be provided with a tank for receiving and storing parts. In this case, the piston speed can be arbitrarily adjusted by adjusting the tank volume of the cell processing injection device.
  • the gas generating section of the cell processing injection device may be composed of an explosive and an ignition mechanism for igniting the explosive or a high-pressure gas tank and an injection valve connected thereto. it can.
  • the resistor is provided to partition the gas flow
  • a plate made of paper, plastic, or the like that is broken by gas can be used, and the shape can be a flat plate, a conical shape projecting toward the gas generating portion, or the like.
  • a partition plate provided so as to partition the gas flow and having an opening having a cross-sectional area smaller than the cross-sectional area of the cylinder may be used.
  • the opening may be formed of one hole, or may be cup-shaped, and the opening may be formed of a plurality of holes.
  • the injection device for cell treatment of the present invention further comprises an outlet hole for allowing a part of the gas flow to the cylinder to flow between the gas generating portion and the piston in the cylinder;
  • the injection speed may be adjustable by providing a pressure regulating valve connected to this outlet hole to open and release gas when the pressure reaches a preset value.
  • FIG. 1 is a perspective view of a first embodiment of the present invention
  • Fig. 2 is a longitudinal sectional view of the main part of the example
  • FIG. 3 is a longitudinal sectional view of a main part of the second embodiment
  • FIG. 4 is a longitudinal sectional view of a main part of the third embodiment
  • FIG. 5 is a longitudinal sectional view of a main part of the fourth embodiment
  • FIG. 6 is a longitudinal sectional view of a main part of the fifth embodiment
  • FIG. 7 is a longitudinal sectional view of a main part of the sixth embodiment.
  • FIG. 1 and 2 show an injection device 10 for cell treatment according to a first embodiment of the present invention.
  • This device 10 is entirely covered with a detachable case 12 mounted on a base 11.
  • a vacuum pump By suctioning the internal air from the suction port 13 with the case 12 covered by a vacuum pump (not shown), the entire interior of the case 12 can be reduced in pressure.
  • a support 14 is provided on the base 11, and a holder 15 is mounted on the support 11 so that a vertical position can be adjusted by operating a holding screw 16.
  • the holder 15 supports the cylinder 17, and an empty gun cartridge 18 containing gunpowder can be loaded into the upper end of the cylinder 17.
  • the ignition of the ignition mechanism 19 is operated by a solenoid, and the operation is performed outside the case 12.
  • the inside of the cylinder 17 is a gas reservoir 21, and a cylinder 22 is detachably screwed to a tip of the gas reservoir 21.
  • the cylinder 22 houses the piston 23 inside.
  • the piston 23 is made of plastic, and a rib can be protruded around the rear to press the inner surface of the cylinder 22 to hold the position, and a recess is formed at the tip.
  • the cell treatment material 24 for example, tungsten fine powder with genetic material attached thereto, for example, It is attached by the surface tension of water.
  • a root of a front cover 25 is detachably attached to a tip end, that is, a lower end of the cylinder 22 by a bayonet-type screw.
  • the front cover 25 covers the sample 26 placed on the base 11 and holds the injection section 27 between the front end of the cylinder 22 and the injection section 27.
  • the jetting portion 27 has a small hole 28, and collides the piston 23 to eject the cell treatment material 24 from the small hole 28.
  • Exhaust holes 29, 30, ... are provided near the tip of the cylinder 22, and exhaust holes 31, ... communicating with the exhaust holes 30, ... are also provided at the base of the front cover 25. ... are provided.
  • a resistor 32 is provided between the tip of the cylindrical body 17 and the cylinder 22 so as to partition the gas flow between the gas reservoir 21 and the cylinder 22. I have.
  • the resistor 32 is a flat plate made of a plate made of paper, plastic, or the like that can be broken by gas.
  • the ignition mechanism 19 is operated.
  • the empty cannon High-pressure gas is generated from the gunpowder in the cartridge 18, and this gas fills the gas reservoir 21, destroys the resistor 32, proceeds into the cylinder 22, and removes the screw.
  • the ton 23 is pressed to accelerate at a high speed and collide with the injection part 27. Due to this collision, the cell treatment material 24 is ejected through the small hole 28, and the cell treatment such as injecting the genetic material into the cells is achieved by hitting the sample 26.
  • the air remaining in front of the piston 23 is exhausted from the exhaust holes 29,..., 30,, 31,.... Once this device is used, the piston 23 and resistor 32 are damaged and must be replaced with the empty gun-to-trigger 18.
  • FIG. 3 shows an injection device 40 for cell treatment according to a second embodiment of the present invention.
  • the other configuration is the same as that of the device of the first embodiment except that the antibody 32 of the cell processing injection device 10 of the first embodiment is replaced by another resistor 41.
  • the same reference numerals are given to the corresponding parts of the device of the first embodiment.
  • the resistor 41 of this device is made of a plate made of paper, plastic, or the like, which bursts by gas, and has a circular shape protruding toward the gas generating portion. ing.
  • the cell processing injection device 40 of the second embodiment is also used and operates in the same manner as the device 10 of the first embodiment. Since the resistor 41 of this device has a conical shape protruding in the gas generation direction, it can be prevented from breaking down to a pressure higher than that of the resistor 32 in the first embodiment. At higher pressures, flow gas through pistons 23 and It is possible to accelerate the speed of the operation.
  • FIG. 4 shows a cell processing injection device 50 according to a third embodiment of the present invention.
  • the other configuration is the same as that of the device of the first embodiment, except that the antibody 32 of the injection device for cell treatment 10 of the first embodiment is replaced by another resistor 51.
  • the same reference numerals are given to the corresponding parts of the device of the first embodiment.
  • the resistor 51 of this device is formed of a flat partition plate for partitioning the gas flow, and has an opening 52 formed of the first hole.
  • the cross-sectional area of the opening 52 is smaller than the cross-sectional area of the cylinder 22.
  • This device 50 is used in the same manner as the device 10 of the first embodiment, and operates almost in the same manner.
  • the resistor 51 of this device does not break, but gives resistance to the gas flow through the opening 52. Since the gas generation in the gas generation section 20 is extremely fast, high-pressure gas can be stored in the gas storage chamber 21 only by the flow resistance of the opening 52. Therefore, after the gas once becomes high pressure, it flows into the cylinder 22 and the piston 23 advances, so that the piston 23 is accelerated at a high speed.
  • the collision velocity of the piston was 660 mZs when no resistor was used, whereas this resistor 51 (the cross-sectional area of the opening was the cross-sectional area of the cylinder)
  • the time was 1800 ms when using (half).
  • FIG. 5 shows an injection device 60 for cell treatment according to a fourth embodiment of the present invention.
  • the cylinder of the injection device 10 for cell treatment of the first embodiment In this example, the body 17 is replaced with a cylindrical body 61 having a large diameter at the base, and another resistor 62 is used in place of the resistor 32, and the other configuration is the same as that of the device of the first embodiment. Similarly, the same reference numerals are given to the corresponding parts of the device of the first embodiment.
  • the resistor 62 of this device is formed of a cup-shaped partition plate for partitioning the gas flow, and has an opening 63 formed of a plurality of holes. The cross-sectional area is smaller than the cross-sectional area of the cylinder 22.
  • An intermediate chamber 64 having a larger sectional area than that of the cylinder 22 is formed between the gas reservoir 21 and the cylinder 22, and the cylinder 22 is formed in the intermediate chamber. It will be connected to the gas reservoir 21 via 6 4.
  • This device 60 is used and operates in the same manner as the device 50 of the third embodiment.
  • FIG. 6 shows a cell processing injection device 70 according to a fifth embodiment of the present invention.
  • This device 70 is capable of adjusting the injection speed of the device 50 of the third embodiment.
  • the holder 15 and the cylinder 17 of the third embodiment are replaced with holders 71 and a cylinder 72 of another configuration, and the other parts are the device 50 of the third embodiment.
  • the same components as those in the third embodiment are denoted by the same reference numerals as those in the third embodiment.
  • the holder 71 has a small diameter at the lower end, and the cylindrical body 72 has an outflow hole 73 on the peripheral surface near the empty gun cartridge 18 and a screw groove 74 on the outer periphery.
  • an adjusting ring 75 is screwed into the screw groove 74 so that a spring 76 pressed by the adjusting ring 75 can move up and down on the outer periphery of the cylindrical body 72.
  • Mating and outlet holes 7 3 A pressure regulating valve 78 is added to press the movable ring 77 having a substantially force-up shape which receives gas from... against the housing 71 o
  • This device 70 is also used in the same manner as the device 50 of the third embodiment, and operates to eject the cell treatment material 24.
  • this device 70 since there is a pressure regulating valve 78, the movable ring 77 is pressed with an appropriate strength by operating the adjusting ring 75 in advance, so that the inside of the gas reservoir 21 is When the pressure becomes constant, the gas entering the movable ring 77 from the outlet holes 73, ... pushes down the movable ring 77 against the panel 76, and the gas is discharged to the outside. For this reason, the speed of the piston 23, that is, the injection speed of the cell treatment material 24 is adjusted.
  • FIG. 7 shows a cell processing injection device 80 according to a sixth embodiment of the present invention.
  • This device 80 is also capable of adjusting the injection speed of the device 50 of the third embodiment.
  • the cylinder 17 and the cylinder 22 of the third embodiment are replaced with a cylinder 81 and a cylinder 82 of another configuration, and the other parts are the devices of the third embodiment.
  • the configuration is the same as that of 50, and the components are denoted by the same reference numerals as the corresponding components of the device of the third embodiment.
  • the cylindrical body 81 has an outflow hole 83 on the peripheral surface near the empty gun cartridge I 8, and forms a peripheral groove 84 with the holder 15.
  • a keyway 85 is provided on the peripheral surface.
  • the adjustment ring 86 has a substantially inverted cup shape, has a thread groove 88 on the inner surface, and is rotatably fitted to the peripheral groove 84.
  • the movable ring 8 7 The cylinder 82 is fitted to the outer periphery so as to be vertically movable and screwed into a screw groove 88 to form a tank 89 with the inside of the adjusting ring 86.
  • the movable ring 87 has a small screw 90, and the small screw 90 is fitted into the key groove 85 so that the movable ring 87 cannot be rotated. Thereafter, by rotating the adjustment ring 87, the volume of the tank 89 can be adjusted by moving the adjustment ring 87 up and down.
  • This device 80 is also used in the same manner as the device 50 of the third embodiment, and operates to eject the cell treatment material 24. Since the device 80 has a tank 89, the tank 89 can be adjusted by operating the adjusting ring 86 in advance to adjust the capacity of the tank 89. Receives an appropriate amount of gas from the outflow holes 83,...-The pressure in the gas reservoir 21 can be limited, so that the speed of the piston 23, that is, the injection speed of the cell treatment material 2, is adjusted. Is done.
  • the injection of the cell processing material 24 by the cell processing injection device 80 will be described.
  • the tank 89 adjusts the speed of the piston 23, that is, the injection speed of the cell treatment material 24, by receiving the gas and adjusting the pressure behind the piston 23. Therefore, the injection speed decreases as the volume increases.
  • the resistor 51 provides resistance to the flow of gas to the piston 23, and the piston proceeds at a low speed before the gas generator 21 yet generates enough gas. This is intended to prevent this from occurring and to increase the speed of the piston and expand the speed adjustment range.
  • the present invention may have various configurations other than these examples.
  • all of the above examples use explosives as the gas generating unit, but use high-pressure gas such as one that blows out compressed air with a blow-off valve, similar to an air gun. Things can also be used.
  • the injection section may be provided at the tip of the cylinder as shown in the figure, or may be provided at a distance from the tip of the cylinder. If the injection speed of the resistor is to be increased and widened, the low-speed device can be omitted. Any configuration, such as an inserted one, can be used.
  • the configuration of the pressure regulating valve and tank for adjusting the injection speed is also the same as the above example. It is not limited.
  • the configuration of the tank may be such that a part of the cylinder is made large in diameter and the two large diameter parts are expanded and contracted. In short, it is necessary to receive gas and adjust the volume. It is optional as long as it is possible.
  • the positions of the outflow holes used for these may be provided not only upstream of the resistor as shown in the figure, but also downstream.
  • the illustrated device is used under reduced pressure, but may be used under normal pressure depending on the application. The invention's effect
  • the injection device for cell treatment of the present invention has the resistor, so that the gas from the gas generating unit is temporarily stored in the gas storage chamber instead of immediately pressing the piston. Therefore, the conventional operation in which the piston proceeds to complete the injection before the gas becomes sufficiently high in pressure is improved, and the piston advances after the gas becomes high in pressure, and the high speed operation is performed. Injection speed.
  • the combustion speed of the explosives is accelerated by the high pressure in the gas reservoir, so that the injection speed is extremely high.
  • the injection speed becomes high, if the speed can be adjusted using a pressure regulating valve or tank, the adjustment range will be wide and it will be used in various application fields. Become.

Abstract

A gas storing room (21) and a resisting piece (32) are provided between a gas generating part (20) and a cylinder (22) within which a piston (23) moves. The resisting piece (32) comprises a board made of paper to be broken when subjected to the gas pressure and a partitioning plate having an opening. Such a structure as above adapts the piston (23) to move forward not immediately after generation of gas but after the rise of gas pressure in the gas storing room (21) and thus the piston is accelerated to high speed by the full use of the high pressure, whereby jetting speed of a cell treating material (24) is increased. Another structure to arrange a tank (89) adjustable in volume between the gas generating part (20) and piston (23) is also possible. In this structure, gas from the gas generating part (20) enters the tank (89) and therefore the pressure in the rear of the piston (23) is regulated according to the volume of the tank (89) so that the speed of the piston, that is, the jetting speed of the cell treating material (24) may be regulated.

Description

明 糊 細胞処理用噴射装置 技術分野  Akira glue Cell processing injection equipment Technical field
本発明は、 細胞に形質転換を起こ させるために使用 さ れる細胞処理用噴射装置に関する。  The present invention relates to a cell processing injection device used to cause transformation of cells.
すなわち、 こ の噴射装置は、 例えば、 遺伝物質を付着 させた金属微粒粉等の細胞処理材を高速で噴射し、 細胞 を含む,試料に当てて遺伝物質を細胞内に注入 した り、 細 胞に細胞を高速噴射して細胞融合を起こ させた りする用 途に利用 される ものである。 背景技術  That is, this injection device, for example, injects a cell treatment material such as metal fine powder to which genetic material is attached at a high speed, and injects the genetic material into cells by applying the sample to cells, including cells. It is used for high-speed injection of cells to cause cell fusion. Background art
細胞処理用噴射装置と して、 火薬、 圧縮空気等を用い て先端に細胞処理材を付着させたプラスチ ッ ク製 ビス ト ンを高速に加速し、 小孔を有する板等に衝突させ、 細胞 処理材を噴射する よ う に した ものが知 られている。  As an injection device for cell treatment, plastic piston with cell treatment material attached to its tip is accelerated at high speed using explosives, compressed air, etc., and collides with a plate with small holes, etc. There is known one in which a processing material is injected.
こ の従来の装置では、 ピス ト ンすなわち細胞処理材の 速度を高速にする こ とが困難である。 実験によれば、 火 薬を用いる装置において、 火薬使用量を大巾に増や して も、 速度の上昇はご く わずかである。 こ の原因は、 ビス ト ンがシ リ ン ダに対 してわずかな抵抗で動 く ため、 火薬 が十分に燃焼して高い圧力を発生する前に、 銃身前方に 進行 し衝突を して しま う からである。 即ち製作や取 り扱 いを簡便にする 目的でピス ト ン と シ リ ンダとの間には極 く 僅かの摩擦力 しか生 じない構造となっている。 そのた め ピス ト ンは、 火薬燃焼速度が最大にな り ピス ト ン後部 のガス圧の上昇速度がピーク に達する までの間装塡位置 に留ま っている こ とが出来ず、 火薬燃焼の極く 初期段階 でビス ト ンが銃身前方に移動した り銃身外に排出された りするため、 ピス ト ン後部のガス圧は充分上昇する こ と ができない。 このよ うな条件下では、 火薬装填量の多寡 は、 殆どピス ト ン速度に影響を与えないのである。 With this conventional apparatus, it is difficult to increase the speed of the piston, that is, the cell treatment material. Experiments have shown that, even if the amount of explosive used is greatly increased, the speed of the device using explosives is negligible. This is due to the fact that the biston moves with little resistance to the cylinder, causing it to travel forward and collide before the gunpowder burns enough to generate high pressure. Because That is, production and handling For the sake of simplicity, the structure is such that very little frictional force is generated between the piston and the cylinder. As a result, the piston cannot stay at the equipment position until the explosive combustion speed reaches its maximum and the gas pressure rise rate at the rear of the piston reaches a peak, and the explosive combustion occurs. In the very early stage, the gas pressure at the rear of the piston cannot rise sufficiently because the piston moves forward in the barrel and is discharged outside the barrel. Under these conditions, the amount of explosive charge has little effect on piston speed.
また、 圧縮空気等を用いる場合も、 同様に、 噴出弁を 開 く と、 ビス ト ンの背後が十分に高圧になる前に ビス ト ンが進行して しまい、 高速にする こ とが困難である。  Similarly, when using compressed air, if the injection valve is opened, the biston will advance before the pressure behind it becomes sufficiently high, making it difficult to increase the speed. is there.
また、 こ の装置では、 ピス ト ンすなわち細胞処理材の 速度を調節する手段は、 火薬を用いる装置においては、 火薬の量を変化させる方法以外に特に有効な方法はな く 、 また、 高圧ガスを用いる装置において も、 ガス圧を調節 する方法程度しかない。 したがって、 速度調節は困難で あ り、 しかも調節範囲は狭いという欠点がある。 発明の開示  In this apparatus, the means for adjusting the speed of the piston, that is, the cell treatment material, is not particularly effective in an apparatus using explosives except for changing the amount of explosive. There is only a method of adjusting the gas pressure in an apparatus that uses a gas. Therefore, there is a drawback that speed adjustment is difficult and the adjustment range is narrow. Disclosure of the invention
そ こ で、 本発明は、 ピス ト ンすなわち細胞処理材の速 度を十分高速にする こ とのでき る、 新たな構成の細胞処 理用噴射装置を得る こ と、 及びピス ト ン速度に従って細 胞処理材の噴射速度を容易にかつ広範囲に速度調節でき る細胞処理用噴射装置を得る こ とを目的とする ものであ る o Therefore, the present invention provides a cell processing injection device having a new configuration capable of sufficiently increasing the speed of the piston, that is, the cell processing material, and according to the piston speed. It is an object of the present invention to provide a cell processing spray device capable of easily and widely adjusting the spray speed of a cell processing material. O
本発明の細胞処理用噴射装置は、 高圧ガスを瞬時に発 生させる ガス発生部と、 こ のガス発生部に連な り、 ガス を受け入れる ガス溜室と、 こ のガス溜室に連な り、 ガス 溜室と同 じ又は小さな断面積を有 し、 先端に細胞処理材 が付着させられた ビス 卜 ンを収納 し、 ガス溜室からのガ スによ り こ の ピス ト ンを先端方向へ進行させる シ リ ン ダ と、 小孔を有 し、 こ のシ リ ン ダの先端又は先端延長上に 設けられ、 ピス ト ンを衝突させて細胞処理材を小孔から 試料に噴射させる噴射部と、 前記ガス溜室と シ リ ン ダと の間に設けられ、 シ リ ンダへのガスの流れに抵抗を加え る抵抗体とを有する こ とを特徴とする ものであ り、 こ の 装置は、 従来の ものよ り、 ピス ト ン速度を高 く する こ と ができ る。  The cell processing injection device of the present invention includes a gas generator that generates a high-pressure gas instantaneously, a gas reservoir that is connected to the gas generator, and that receives the gas, and a gas reservoir that is connected to the gas reservoir. It has the same or smaller cross-sectional area as the gas reservoir, stores the piston with the cell treatment material attached to the tip, and moves the piston toward the tip by the gas from the gas reservoir. The cylinder has a small hole and a small hole, and is provided on the tip of the cylinder or on the extension of the small hole. The cylinder collides with the piston to eject the cell treatment material from the small hole to the sample. And a resistor that is provided between the gas reservoir and the cylinder, and that adds resistance to the flow of gas to the cylinder. The device can have a higher piston speed than the conventional one.
また、 本発明の細胞処理用噴射装置は、 ガス発生部と シ リ ン ダ中の ピス ト ン との間に、 容積を調節する こ とが でき、 シ リ ン ダへのガスの流れの一部を受け入れて溜め る タ ン クを設けてなる もの とする こ と もでき る。 この場 合には、 細胞処理用噴射装置のタ ン ク の容積調節によ り、 ピス ト ン速度を任意に調節する こ とができ る。  Further, in the injection device for cell treatment of the present invention, the volume can be adjusted between the gas generating section and the piston in the cylinder, and the flow of the gas to the cylinder can be reduced. It may be provided with a tank for receiving and storing parts. In this case, the piston speed can be arbitrarily adjusted by adjusting the tank volume of the cell processing injection device.
こ の細胞処理用噴射装置のガス発生部は、 火薬及びこ れを点火させる点火機構よ り なる も の、 あるいは、 高圧 ガスタ ン ク及びこれに連なる噴出弁よ り なる ものを使用 する こ とができ る。  The gas generating section of the cell processing injection device may be composed of an explosive and an ignition mechanism for igniting the explosive or a high-pressure gas tank and an injection valve connected thereto. it can.
抵抗体と しては、 ガスの流れを仕切る よ う に設け られ、 ガスによ り破壤される紙、 プラスチ ッ ク等製の板体が使 用でき、 その形状は、 平板状、 ガス発生部方向に向かつ て突出する円錐状等とする こ とができる。 また、 ガスの 流れを仕切る よ う に設けられ、 シ リ ンダの断面積よ り小 さい断面積の開口部を有する仕切板を使用する こ と もで き、 その形状は、 平板状であって、 開口部が 1 の孔よ り なる もの、 カ ッ プ状であって、 開口部が複数の孔よ りな る もの等とする こ とができ る。 The resistor is provided to partition the gas flow, A plate made of paper, plastic, or the like that is broken by gas can be used, and the shape can be a flat plate, a conical shape projecting toward the gas generating portion, or the like. In addition, a partition plate provided so as to partition the gas flow and having an opening having a cross-sectional area smaller than the cross-sectional area of the cylinder may be used. The opening may be formed of one hole, or may be cup-shaped, and the opening may be formed of a plurality of holes.
さ らに、 本発明の細胞処理用噴射装置は、 ガス発生部 と シ リ ン ダ中の ピス ト ン との間に、 シ リ ンダへのガスの 流れの一部を流出させる流出孔と、 こ の流出孔に接続し て予め設定した圧力になる と開いてガスを外部へ放出さ せる調圧弁を設けて、 噴射速度を調節可能と して も よい。 図面の簡単な説明  Further, the injection device for cell treatment of the present invention further comprises an outlet hole for allowing a part of the gas flow to the cylinder to flow between the gas generating portion and the piston in the cylinder; The injection speed may be adjustable by providing a pressure regulating valve connected to this outlet hole to open and release gas when the pressure reaches a preset value. BRIEF DESCRIPTION OF THE FIGURES
図 1 は、 本発明の第 1 実施例の斜視図、  FIG. 1 is a perspective view of a first embodiment of the present invention,
図 2 は、 同例の要部縦断面図、  Fig. 2 is a longitudinal sectional view of the main part of the example,
図 3 は、 第 2 実施例の要部縦断面図、  FIG. 3 is a longitudinal sectional view of a main part of the second embodiment,
図 4 は、 第 3 実施例の要部縦断面図、  FIG. 4 is a longitudinal sectional view of a main part of the third embodiment,
図 5 は、 第 4 実施例の要部縦断面図、  FIG. 5 is a longitudinal sectional view of a main part of the fourth embodiment,
図 6 は、 第 5 実施例の要部縦断面図、  FIG. 6 is a longitudinal sectional view of a main part of the fifth embodiment,
図 7 は、 第 6 実施例の要部縦断面図である 発明を実施するための最良の形態  FIG. 7 is a longitudinal sectional view of a main part of the sixth embodiment.
以下、 図面に従って本発明の実施例について具体的(: 説明する。 Hereinafter, embodiments of the present invention will be specifically described with reference to the drawings. explain.
図 1 , 2 に本発明にょる第 1 実施例の細胞処理用噴射 装置 1 0 を示す。 こ の装置 1 0 は、 台部 1 1 上に着脱自 在のケース 1 2 を載せて、 全体を被われている。 ケース 1 2 を被せた状態で吸引口 1 3 から真空ポンプ (図示 し ない) で内部の空気を吸引する こ とによ り、 ケース 1 2 内部全体を減圧状態にする こ とができ る。  1 and 2 show an injection device 10 for cell treatment according to a first embodiment of the present invention. This device 10 is entirely covered with a detachable case 12 mounted on a base 11. By suctioning the internal air from the suction port 13 with the case 12 covered by a vacuum pump (not shown), the entire interior of the case 12 can be reduced in pressure.
台部 1 1 には、 支柱 1 4 が設け られ、 これにホルダ 1 5 が押さえネ ジ 1 6 を操作する こ とによ り上下位置調節 可能となる よ う取付け られている。  A support 14 is provided on the base 11, and a holder 15 is mounted on the support 11 so that a vertical position can be adjusted by operating a holding screw 16.
ホルダ 1 5 は筒体 1 7 を支持し、 こ の筒体 1 7 の上端 部内には火薬を内蔵 した空砲カー ト リ ッ ジ 1 8 を装填す る こ とができ、 筒体 1 7上部にはこの空砲カー ト リ ッ ジ 1 8 を装塡、 点火する点火機構 1 9 が設け られ、 これ ら の空砲カー ト リ ッ ジ 1 8 と点火機構とでガス発生部 2 0 を構成している。 なお、 こ の点火機構 1 9 の点火はソ レ ノ イ ドで作動する よ う にされ、 その操作はケース 1 2 外 カヽら行われる。  The holder 15 supports the cylinder 17, and an empty gun cartridge 18 containing gunpowder can be loaded into the upper end of the cylinder 17. Is equipped with an empty gun cartridge 18 and is provided with an ignition mechanism 19 for igniting, and the empty gun cartridge 18 and the ignition mechanism constitute a gas generating section 20. . The ignition of the ignition mechanism 19 is operated by a solenoid, and the operation is performed outside the case 12.
筒体 1 7 の内部はガス溜室 2 1 とな り、 その先端には シ リ ン ダ 2 2 が着脱自在にネ ジ止めされている。 こ のシ リ ン ダ 2 2 は、 内部に ピス ト ン 2 3 を収納する。 ピス ト ン 2 3 は、 プラ スチ ッ ク製であ り、 後部周囲に リ ブを突 出きせてシ リ ン ダ 2 2 内面を押 してその位置を保持し、 先端には凹部が形成され、 こ こ に細胞処理材 2 4 、 例え ば遺伝物質を付着させたタ ン グステ ン微粒粉が、 例えば 水の表面張力によ り付着させられる。 The inside of the cylinder 17 is a gas reservoir 21, and a cylinder 22 is detachably screwed to a tip of the gas reservoir 21. The cylinder 22 houses the piston 23 inside. The piston 23 is made of plastic, and a rib can be protruded around the rear to press the inner surface of the cylinder 22 to hold the position, and a recess is formed at the tip. Here, the cell treatment material 24, for example, tungsten fine powder with genetic material attached thereto, for example, It is attached by the surface tension of water.
シ リ ン ダ 2 2 の先端すなわち下端には、 前部カバー 2 5 の根元部がバヨ ネ ッ ト式ネ ジによ り着脱自在に取付け られている。 こ の前部カバ一 2 5 は、 台部 1 1 上に置か れる試料 2 6 を被う と と もに、 シ リ ンダ 2 2 の前端との 間に噴射部 2 7 を挟んで保持する。 こ の噴射部 2 7 は小 孔 2 8 を有し、 ピス ト ン 2 3 を衝突させ細胞処理材 2 4 を小孔 2 8 から噴射させる。  A root of a front cover 25 is detachably attached to a tip end, that is, a lower end of the cylinder 22 by a bayonet-type screw. The front cover 25 covers the sample 26 placed on the base 11 and holds the injection section 27 between the front end of the cylinder 22 and the injection section 27. The jetting portion 27 has a small hole 28, and collides the piston 23 to eject the cell treatment material 24 from the small hole 28.
シ リ ンダ 2 2 の先端近 く には排気孔 2 9 , 3 0 , …が設けられ、 また前部カバ一 2 5 の根元部に も排気孔 3 0 , …に連通する排気孔 3 1 , …が設けられている。 筒体 1 7 の先端と シ リ ンダ 2 2 との間には、 抵抗体 3 2 が、 ガス溜室 2 1 とシ リ ンダ 2 2 との間でガスの流れ を仕切る よ う に設けられている。 こ の抵抗体 3 2 は、 ガ スによ り破壊しう る紙、 プラスチ ッ ク等製の板体よ りな り、 平板状となっている。  Exhaust holes 29, 30, ... are provided near the tip of the cylinder 22, and exhaust holes 31, ... communicating with the exhaust holes 30, ... are also provided at the base of the front cover 25. ... are provided. A resistor 32 is provided between the tip of the cylindrical body 17 and the cylinder 22 so as to partition the gas flow between the gas reservoir 21 and the cylinder 22. I have. The resistor 32 is a flat plate made of a plate made of paper, plastic, or the like that can be broken by gas.
次にこのよ うな構成を有する細胞処理用噴射装置の作 動について説明する。  Next, the operation of the cell processing injection device having such a configuration will be described.
初めに、 次のよ う に して準備をする。 台部 1 1 上に試 料 2 6 を置 く 。 シ リ ンダ 2 2 に細胞処理材 2 4 を付着さ せた ピス ト ン 2 3 を収納 し、 抵抗体 3 2 を挟んで茼体 1 7 に取付ける。 空砲カー ト リ ッ ジ 1 8 を装填し、 ホルダ 1 5 を適当な高さに固定する。 ケース 1 2 を被せて、 ケ ース 1 2 内を減圧する。  First, prepare as follows. Place sample 26 on base 1 1. The piston 23 with the cell treatment material 24 attached to the cylinder 22 is housed, and attached to the body 17 with the resistor 32 interposed therebetween. Load empty cartridge 18 and secure holder 15 at the appropriate height. Cover Case 12 and reduce the pressure inside Case 12.
次に、 点火機構 1 9 を作動させる。 こ うする と、 空砲 カ ー ト リ ッ ジ 1 8 内の火薬から高圧ガスが発生 し、 こ の ガスはガス溜室 2 1 に充満 した後、 抵抗体 3 2 を破壊 し シ リ ン ダ 2 2 内に進み、 ビス ト ン 2 3 を押 して高速に加 速 し、 噴射部 2 7 に衝突させる。 こ の衝突によ り細胞処 理材 2 4 は小孔 2 8 を通 して噴射され、 試料 2 6 に当た つて、 遺伝物質を細胞内に注入する等の細胞処理が実現 される。 この と き排気孔 2 9 , …、 3 0 , 、 3 1 , … から ピス ト ン 2 3 前方に残留 している空気が排出される , なお、 一旦こ の装置を使用する と、 ピス ト ン 2 3 及び 抵抗体 3 2 は破損するので、 空になった空砲力 一 ト リ ッ ジ 1 8 と と も に交換しなければな らない。 Next, the ignition mechanism 19 is operated. When you do this, the empty cannon High-pressure gas is generated from the gunpowder in the cartridge 18, and this gas fills the gas reservoir 21, destroys the resistor 32, proceeds into the cylinder 22, and removes the screw. The ton 23 is pressed to accelerate at a high speed and collide with the injection part 27. Due to this collision, the cell treatment material 24 is ejected through the small hole 28, and the cell treatment such as injecting the genetic material into the cells is achieved by hitting the sample 26. At this time, the air remaining in front of the piston 23 is exhausted from the exhaust holes 29,…, 30,, 31,…. Once this device is used, the piston 23 and resistor 32 are damaged and must be replaced with the empty gun-to-trigger 18.
図 3 に本発明による第 2 実施例の細胞処理用噴射装置 4 0 を示す。 第 1 実施例の細胞処理用噴射装置 1 0 の抵 抗体 3 2 を他の抵抗体 4 1 に置き換えただけであって、 他の構成は第 1 実施例の装置と同様であ り、 各部に第 1 実施例の装置の対応部所と同 じ符号を付して示す。 こ の 装置の抵抗体 4 1 は、 ガスによ り破壤し う る紙、 プラ ス チ ッ ク等製の板体よ り な り、 ガス発生部方向に向かって 突出する円維状とな っている。  FIG. 3 shows an injection device 40 for cell treatment according to a second embodiment of the present invention. The other configuration is the same as that of the device of the first embodiment except that the antibody 32 of the cell processing injection device 10 of the first embodiment is replaced by another resistor 41. The same reference numerals are given to the corresponding parts of the device of the first embodiment. The resistor 41 of this device is made of a plate made of paper, plastic, or the like, which bursts by gas, and has a circular shape protruding toward the gas generating portion. ing.
こ の第 2 実施例の細胞処理用噴射装置 4 0 も、 第 1 実 施例の装置 1 0 と同様に して使用 され、 作動する。 こ の 装置の抵抗体 4 1 はガス発生方向に向かって突出する円 錐状であるため、 第 1 実施例における抵抗体 3 2 よ り高 い圧力 まで破壊 しないよ う にする こ とができ、 よ り 高い 圧力にな つてから ピス ト ン 2 3 にガスを流し、 よ り高速 に ビス ト ンを加速する こ とが可能となる。 The cell processing injection device 40 of the second embodiment is also used and operates in the same manner as the device 10 of the first embodiment. Since the resistor 41 of this device has a conical shape protruding in the gas generation direction, it can be prevented from breaking down to a pressure higher than that of the resistor 32 in the first embodiment. At higher pressures, flow gas through pistons 23 and It is possible to accelerate the speed of the operation.
図 4 に本発明による第 3 実施例の細胞処理用噴射装置 5 0 を示す。 第 1 実施例の細胞処理用噴射装置 1 0 の抵 抗体 3 2 を他の抵抗体 5 1 に置き換えただけであって、 他の構成は第 1 実施例の装置と同様であ り、 各部に第 1 実施例の装置の対応部所と同 じ符号を付して示す。 こ の 装置の抵抗体 5 1 は、 ガスの流れを仕切る平板状の仕切 板よ りな り、 1 の孔よ りなる開口部 5 2 を有している。 こ の開口部 5 2 の断面積はシ リ ンダ 2 2 の断面積よ り 小 さ く されている。  FIG. 4 shows a cell processing injection device 50 according to a third embodiment of the present invention. The other configuration is the same as that of the device of the first embodiment, except that the antibody 32 of the injection device for cell treatment 10 of the first embodiment is replaced by another resistor 51. The same reference numerals are given to the corresponding parts of the device of the first embodiment. The resistor 51 of this device is formed of a flat partition plate for partitioning the gas flow, and has an opening 52 formed of the first hole. The cross-sectional area of the opening 52 is smaller than the cross-sectional area of the cylinder 22.
こ の装置 5 0 も、 第 1 実施例の装置 1 0 と同様に して 使用され、 ほぼ同様に作動する。 こ の装置の抵抗体 5 1 は、 破壊する ものではな く 、 開口部 5 2 によ り ガスの流 れに抵抗を与える ものである。 ガス発生部 2 0 のガス発 生は極めて高速であるので、 開口部 5 2 の流動抵抗だけ でガス溜室 2 1 内に高圧ガスを溜める こ とができ る。 し たがって、 ガスは、 一旦高圧になった後、 シ リ ンダ 2 2 に流れて ピス ト ン 2 3 が進行するので、 ピス ト ン 2 3 は 高速に加速される。  This device 50 is used in the same manner as the device 10 of the first embodiment, and operates almost in the same manner. The resistor 51 of this device does not break, but gives resistance to the gas flow through the opening 52. Since the gas generation in the gas generation section 20 is extremely fast, high-pressure gas can be stored in the gas storage chamber 21 only by the flow resistance of the opening 52. Therefore, after the gas once becomes high pressure, it flows into the cylinder 22 and the piston 23 advances, so that the piston 23 is accelerated at a high speed.
実験による と、 ピス ト ンの衝突時速度が、 抵抗体を用 いない場合に 6 6 0 m Z s であるのに対し、 こ の抵抗体 5 1 (開口部断面積をシ リ ンダ断面積の 2 分の 1 と し た) を用いた場合には 1 0 8 0 m s となった。  According to experiments, the collision velocity of the piston was 660 mZs when no resistor was used, whereas this resistor 51 (the cross-sectional area of the opening was the cross-sectional area of the cylinder) The time was 1800 ms when using (half).
図 5 に本発明による第 4 実施例の細胞処理用噴射装置 6 0 を示す。 第 1 実施例の細胞処理用噴射装置 1 0 の筒 体 1 7 を根元部が大径の筒体 6 1 に置き換え、 抵抗体 3 2 の代わり に他の抵抗体 6 2 を用いた ものであ って、 他 の構成は第 1 実施例の装置と同様であ り、 、各部に第 1 実 施例の装置の対応部所と同 じ符号を付して示す。 こ の装 置の抵抗体 6 2 は、 ガスの流れを仕切る カ ッ プ状の仕切 板よ り な り、 複数の孔よ りなる開口部 6 3 を有している この開口部 6 3 の合計断面積はシ リ ンダ 2 2 の断面積よ り小さ く されている。 なお、 ガス溜室 2 1 と シ リ ンダ 2 2 との間にはシ リ ン ダ 2 2 よ り大きな断面積を有する中 間室 6 4 が形成され、 シ リ ンダ 2 2 はこ の中間室 6 4 を 介 してガス溜室 2 1 に連なる こ とになる。 FIG. 5 shows an injection device 60 for cell treatment according to a fourth embodiment of the present invention. The cylinder of the injection device 10 for cell treatment of the first embodiment In this example, the body 17 is replaced with a cylindrical body 61 having a large diameter at the base, and another resistor 62 is used in place of the resistor 32, and the other configuration is the same as that of the device of the first embodiment. Similarly, the same reference numerals are given to the corresponding parts of the device of the first embodiment. The resistor 62 of this device is formed of a cup-shaped partition plate for partitioning the gas flow, and has an opening 63 formed of a plurality of holes. The cross-sectional area is smaller than the cross-sectional area of the cylinder 22. An intermediate chamber 64 having a larger sectional area than that of the cylinder 22 is formed between the gas reservoir 21 and the cylinder 22, and the cylinder 22 is formed in the intermediate chamber. It will be connected to the gas reservoir 21 via 6 4.
こ の装置 6 0 も、 第 3 実施例の装置 5 0 と同様に して 使用され、 作動する。  This device 60 is used and operates in the same manner as the device 50 of the third embodiment.
図 6 に本発明による第 5 実施例の細胞処理用噴射装置 7 0 を示す。 こ の装置 7 0 は第 3 実施例の装置 5 0 の噴 射速度を調節可能と した ものである。 こ の装置 7 0 では、 第 3 実施例のホルダ 1 5 、 筒体 1 7 を、 他の構成のホル ダ 7 1 、 筒体 7 2 に置き換え、 他の部分は第 3 実施例の 装置 5 0 と同様に構成した ものであ り、 各部に第 3 実施 例の装置の対応部所と同 じ符号を付して示す。 ホル ダ 7 1 は下端部が小径とな り、 筒体 7 2 は空砲カー ト リ ッ ジ 1 8 近 く の周面に流出孔 7 3 , …を、 外周にネ ジ溝 7 4 を有する。 さ らに こ の装置 7 0 では、 ネ ジ溝 7 4 に調節 環 7 5 を螺合させ、 こ の調節環 7 5 に押されたバネ 7 6 が、 筒体 7 2 外周に上下動可能に嵌合 して流出孔 7 3 , …からガスを受ける略力 ッ プ状の可動環 7 7 をホ儿 ダ 7 1 に押付ける よ う に してなる調圧弁 7 8 が付加されてい る o FIG. 6 shows a cell processing injection device 70 according to a fifth embodiment of the present invention. This device 70 is capable of adjusting the injection speed of the device 50 of the third embodiment. In this device 70, the holder 15 and the cylinder 17 of the third embodiment are replaced with holders 71 and a cylinder 72 of another configuration, and the other parts are the device 50 of the third embodiment. The same components as those in the third embodiment are denoted by the same reference numerals as those in the third embodiment. The holder 71 has a small diameter at the lower end, and the cylindrical body 72 has an outflow hole 73 on the peripheral surface near the empty gun cartridge 18 and a screw groove 74 on the outer periphery. Further, in this device 70, an adjusting ring 75 is screwed into the screw groove 74 so that a spring 76 pressed by the adjusting ring 75 can move up and down on the outer periphery of the cylindrical body 72. Mating and outlet holes 7 3, A pressure regulating valve 78 is added to press the movable ring 77 having a substantially force-up shape which receives gas from… against the housing 71 o
こ の装置 7 0 も、 第 3 実施例の装置 5 0 と同様に して 使用され、 作動 して細胞処理材 2 4 を噴射する。 こ の装 置 7 0 では、 調圧弁 7 8 があるため、 予め調節環 7 5 を 操作して可動環 7 7 を適宜強さで押付けてお く こ とによ り、 ガス溜室 2 1 内が一定の圧力になる と、 流出孔 7 3 , …から可動環 7 7 内に入ったガスが可動環 7 7 をパネ 7 6 に抗して押し下げ、 ガスは外部に放出される。 このた めビス ト ン 2 3 の速度すなわち細胞処理材 2 4 の噴射速 度が調節される。  This device 70 is also used in the same manner as the device 50 of the third embodiment, and operates to eject the cell treatment material 24. In this device 70, since there is a pressure regulating valve 78, the movable ring 77 is pressed with an appropriate strength by operating the adjusting ring 75 in advance, so that the inside of the gas reservoir 21 is When the pressure becomes constant, the gas entering the movable ring 77 from the outlet holes 73, ... pushes down the movable ring 77 against the panel 76, and the gas is discharged to the outside. For this reason, the speed of the piston 23, that is, the injection speed of the cell treatment material 24 is adjusted.
図 7 に本発明による第 6 実施例の細胞処理用噴射装置 8 0 を示す。 こ の装置 8 0 も第 3 実施例の装置 5 0 の噴 射速度を調節可能と した ものである。 この装置 8 0 では、 第 3 実施例の筒体 1 7、 シ リ ンダ 2 2 を、 他の構成の筒 体 8 1 、 シ リ ンダ 8 2 に置き換え、 他の部分は第 3 実施 例の装置 5 0 と同様に構成した ものであ り、 各部に第 3 実施例の装置の対応部所と同 じ符号を付して示す。 筒体 8 1 は空砲カー ト リ ッ ジ I 8 近 く の周面に流出孔 8 3 , …を有し、 ホルダ 1 5 との間に周溝 8 4 を形成し、 シ リ ンダ 8 2 は周面にキー溝 8 5 を有する。 さ らにこ の装置 8 0 では、 調節環 8 6 及び可動環 8 7が付加されている。 調節環 8 6 は、 略逆カ ッ プ状であ り、 内面にネ ジ溝 8 8 を有し、 周溝 8 4 に回動可能に嵌合する。 可動環 8 7 は、 シ リ ンダ 8 2 外周に上下動可能に嵌合 してネ ジ溝 8 8 に 螺合 し、 調節環 8 6 の内部との間にタ ン ク 8 9 を形成す る。 またこ の可動環 8 7 は小ネ ジ 9 0 を有して'お り、 こ の小ネ ジ 9 0 をキー溝 8 5 に嵌合させて可動環 8 7 を回 動不能と して、 その後調節環 8 7 を回動させる こ とによ り調節環 8 7 を上下動させて、 タ ン ク 8 9 の容積を調節 する こ とができ る。 FIG. 7 shows a cell processing injection device 80 according to a sixth embodiment of the present invention. This device 80 is also capable of adjusting the injection speed of the device 50 of the third embodiment. In this device 80, the cylinder 17 and the cylinder 22 of the third embodiment are replaced with a cylinder 81 and a cylinder 82 of another configuration, and the other parts are the devices of the third embodiment. The configuration is the same as that of 50, and the components are denoted by the same reference numerals as the corresponding components of the device of the third embodiment. The cylindrical body 81 has an outflow hole 83 on the peripheral surface near the empty gun cartridge I 8, and forms a peripheral groove 84 with the holder 15. A keyway 85 is provided on the peripheral surface. Further, in this device 80, an adjusting ring 86 and a movable ring 87 are added. The adjustment ring 86 has a substantially inverted cup shape, has a thread groove 88 on the inner surface, and is rotatably fitted to the peripheral groove 84. The movable ring 8 7 The cylinder 82 is fitted to the outer periphery so as to be vertically movable and screwed into a screw groove 88 to form a tank 89 with the inside of the adjusting ring 86. The movable ring 87 has a small screw 90, and the small screw 90 is fitted into the key groove 85 so that the movable ring 87 cannot be rotated. Thereafter, by rotating the adjustment ring 87, the volume of the tank 89 can be adjusted by moving the adjustment ring 87 up and down.
こ の装置 8 0 も、 第 3 実施例の装置 5 0 と同様に して 使用 され、 作動 して細胞処理材 2 4 を噴射する。 こ の装 置 8 0 では、 タ ン ク 8 9 があるため、 予め調節環 8 6 を 操作してタ ン ク 8 9 の容量を調節 してお く こ とによ り、 タ ン ク 8 9 が流出孔 8 3 , …からガスを適宜量受け入れ- ガス溜室 2 1 内の圧力を制限する こ とができ、 こ のため ビス ト ン 2 3 の速度すなわち細胞処理材 2 の噴射速度 が調節される。  This device 80 is also used in the same manner as the device 50 of the third embodiment, and operates to eject the cell treatment material 24. Since the device 80 has a tank 89, the tank 89 can be adjusted by operating the adjusting ring 86 in advance to adjust the capacity of the tank 89. Receives an appropriate amount of gas from the outflow holes 83,...-The pressure in the gas reservoir 21 can be limited, so that the speed of the piston 23, that is, the injection speed of the cell treatment material 2, is adjusted. Is done.
こ の細胞処理用噴射装置 8 0 によ る、 細胞処理材 2 4 の噴射について説明する。  The injection of the cell processing material 24 by the cell processing injection device 80 will be described.
第 1 実施例の装置 1 0 と同様の準備を して、 点火機構 1 9 を作動させる と、 空砲カ ー ト リ ッ ジ 1 8 内の火薬か ら高圧ガスが発生 し、 このガスは抵抗体 5 1 の開口部 5 2 の流動抵抗によ り、 ガス溜室 2 1 及びタ ン ク 8 9 内に 充満 し、 こ の後、 シ リ ン ダ 8 2 内に進み、 ピス ト ン 2 3 を押して高速に加速し、 噴射部 2 7 に衝突させる。 こ の 衝突によ り細胞処理材 2 4 は小孔 2 8 を通 して噴射され、 試料 2 6 に当たって、 遺伝物質を細胞内に注入する等の 細胞処理が実現される。 こ の と き排気孔 2 9 , 、 3 0 …、 3 1 , …から ピス ト ン 2 3 前方に残留 している空気 が排出される。 When the ignition mechanism 19 is operated with the same preparation as the device 10 of the first embodiment, high-pressure gas is generated from the gunpowder in the empty gun cartridge 18, and this gas is used as a resistive element. 5 Due to the flow resistance of the opening 52, the gas reservoir 21 and the tank 89 are filled, and then the cylinder 82 is moved to the piston 23. Press to accelerate at high speed and collide with the jetting part 27. Due to this collision, the cell treatment material 24 is ejected through the small holes 28 and hits the sample 26 to inject genetic material into the cells. Cell processing is realized. At this time, the air remaining in front of the piston 23 is exhausted from the exhaust holes 29,, 30…, 31,….
すなわち、 タ ン ク 8 9 は、 ガスを受け入れ、 ピス ト ン 2 3 背後の圧力を調節する こ とによ り、 ピス ト ン 2 3 の 速度つま り細胞処理材 2 4 の噴射速度調節する ものであ り、 その容積が大きいほ ど噴射速度が低速となる。  That is, the tank 89 adjusts the speed of the piston 23, that is, the injection speed of the cell treatment material 24, by receiving the gas and adjusting the pressure behind the piston 23. Therefore, the injection speed decreases as the volume increases.
抵抗体 5 1 は、 ピス ト ン 2 3 へのガスの流れに抵抗を 与え、 ガス発生部 2 1 が未だ十分にガスを発生しないう ちに、 ピス ト ンが低速のま ま進行して しま う こ とを防止 し、 ピス ト ンの高速化並びに速度の調節範囲の拡大を図 る ものである。  The resistor 51 provides resistance to the flow of gas to the piston 23, and the piston proceeds at a low speed before the gas generator 21 yet generates enough gas. This is intended to prevent this from occurring and to increase the speed of the piston and expand the speed adjustment range.
以上、 本発明による細胞処理用噴射装置の実施例につ いて述べたが、 本発明はこれ らの例のほか、 各種の構成 とする こ とができる。 例えば、 上記例は何れ もガス発生 部と して、 火薬を用いたものを利用 しているが、 空気銃 と同様な圧縮空気を噴出弁によ り噴出させる もの等の高 圧ガスを用いた ものも利用する こ とができ る。 噴射部も、 図示のよ う にシ リ ンダの先端に設けるほか、 シ リ ン ダ先 端から離して設ける構造とする こ と もでき る。 抵抗体に ついても噴射速度を高速化、 広範囲化する ものであるな ら、 低速用の装置については省略する こ とができ、 また そ'の構成も上記例のもののほか、 単に外部から ピンを差 し込んだもの等、 任意の構成とする こ とができ る。 噴射 速度を調節するための調圧弁、 タ ン クの構成も上記例に 限る ものではない。 Although the embodiments of the cell processing injection device according to the present invention have been described above, the present invention may have various configurations other than these examples. For example, all of the above examples use explosives as the gas generating unit, but use high-pressure gas such as one that blows out compressed air with a blow-off valve, similar to an air gun. Things can also be used. The injection section may be provided at the tip of the cylinder as shown in the figure, or may be provided at a distance from the tip of the cylinder. If the injection speed of the resistor is to be increased and widened, the low-speed device can be omitted. Any configuration, such as an inserted one, can be used. The configuration of the pressure regulating valve and tank for adjusting the injection speed is also the same as the above example. It is not limited.
例えば、 タ ン クの構成はシ リ ンダの一部を大径に して 二の大径部分を伸縮させる構成等とする こ と もでき、 要 するにガスを受け入れてその容積を調節する こ とのでき る ものであれば任意である。  For example, the configuration of the tank may be such that a part of the cylinder is made large in diameter and the two large diameter parts are expanded and contracted. In short, it is necessary to receive gas and adjust the volume. It is optional as long as it is possible.
特に、 これ らに用いる流出孔の位置は、 図示のよ う に 抵抗体の上流に設けるだけでな く 、 下流に設ける構成も 可能である。 さ らに、 図示の装置は減圧状態で使用する よ う にな っているが、 用途によ っては常圧状態で使用す る こ と もでき る。 発明の効果  In particular, the positions of the outflow holes used for these may be provided not only upstream of the resistor as shown in the figure, but also downstream. In addition, the illustrated device is used under reduced pressure, but may be used under normal pressure depending on the application. The invention's effect
本発明の細胞処理用噴射装置は、 上述のよ う に、 抵抗 体を有するので、 ガス発生部からのガスが直ちに ピス ト ンを押すのではな く 、 一旦ガス溜室に溜め られる。 従つ て、 ガスが十分高圧になる前に ピス ト ンが進行して噴射 を完了 して しま う という従来の作動は改善され、 ガスが 高圧にな っ た後に ピス ト ンが進行し、 高速の噴射速度か 得られる。 特に、 ガス発生部に火薬を用いた場合は、 ガ ス溜室が高圧になる こ とで火薬の燃焼も高速化されるの で、 噴射速度は極めて良好に高速化される。 また、 噴射 速度が高速になる こ とから、 調圧弁やタ ン クを用いて速 度調節を可能とする と、 その調節範囲が広い もの とな り 多様な応用分野に使用 し う る もの となる。  As described above, the injection device for cell treatment of the present invention has the resistor, so that the gas from the gas generating unit is temporarily stored in the gas storage chamber instead of immediately pressing the piston. Therefore, the conventional operation in which the piston proceeds to complete the injection before the gas becomes sufficiently high in pressure is improved, and the piston advances after the gas becomes high in pressure, and the high speed operation is performed. Injection speed. In particular, when explosives are used in the gas generating section, the combustion speed of the explosives is accelerated by the high pressure in the gas reservoir, so that the injection speed is extremely high. In addition, since the injection speed becomes high, if the speed can be adjusted using a pressure regulating valve or tank, the adjustment range will be wide and it will be used in various application fields. Become.

Claims

Contract
1 . 高圧ガスを瞬時に発生させるガス発生部と、 こ のガス発生部に連な り、 ガスを受け入れるガス溜室 の  1. A gas generator that generates high-pressure gas instantaneously, and a gas reservoir that is connected to the gas generator and receives gas
と、  When,
こ のガス溜室に連な り、 ガス溜室と同 じ又は小さな断 面積を有し、 先端に囲細胞処理材が付着させられた ピス ト ンを収納 し、 ガス溜室からのガスによ り この ピス ト ンを 先端方向へ進行させる シ リ ンダと、  Connected to this gas reservoir, it has the same or smaller cross-sectional area as the gas reservoir, and stores a piston with the surrounding cell treatment material attached to the tip, and receives the gas from the gas reservoir. A cylinder that advances the piston toward the distal end,
小孔を有し、 このシ リ ンダの先端又は先端延長上に設 けられ、 ピス ト ンを衝突させて細胞処理材を小孔から試 料に噴射させる噴射部と、 前記ガス溜室とシ リ ンダとの間に設けられ、 シ リ ンダ へのガスの流れに抵抗を加える抵抗体と  An injection section having a small hole, which is provided on the tip or extension of the tip of the cylinder, and which collides with a piston to inject the cell treatment material from the small hole to the sample; A resistor provided between the cylinder and the cylinder to add resistance to the flow of gas to the cylinder;
を有する こ とを特徴とする細胞処理用噴射装置。  An injection device for cell treatment, comprising:
2. ガス発生部が、 火薬及びこれを点火させる点火機 構よ り なる請求項 1 記載の細胞処理用噴射装置。  2. The injection device for cell treatment according to claim 1, wherein the gas generator comprises an explosive and an igniter for igniting the explosive.
3. ガス発生部が、 高圧ガスタ ン ク及びこれに連なる 噴出弁よ りなる請求項 1 記載の細胞処理用噴射装置。  3. The injection device for cell treatment according to claim 1, wherein the gas generating unit comprises a high-pressure gas tank and a jet valve connected thereto.
4. 抵抗体が、 ガスの流れを仕切る よ う に設けられ、 ガスによ り破壤される紙、 プラスチ ッ ク等製の板体よ り なる請求項 1 , 2 又は 3 記載の細胞処理用噴射装置。  4. The cell treatment device according to claim 1, 2 or 3, wherein the resistor is provided to partition a gas flow, and is made of a plate made of paper, plastic, or the like, which is broken by the gas. Injection device.
5. 板体が平板'状である請求項 4 記載の細胞処理用噴 射装置。  5. The spray device for cell treatment according to claim 4, wherein the plate is a flat plate.
6. 板体がガス発生部方向に向かって突出する円維状 である請求項 4 記載の細胞処理用噴射装置。 6. A plate-shaped body protruding toward the gas generator The injection device for cell treatment according to claim 4, which is:
7. 抵抗体が、 ガスの流れを仕切る よ う に設けられ、 シ リ ン ダの断面積よ り小さい断面積の開口部を有する仕 切板よ り なる請求項 1 , 2 又は 3 記載の細胞処理用噴射  7. The cell according to claim 1, 2 or 3, wherein the resistor comprises a partition plate provided to partition a gas flow and having an opening having a cross-sectional area smaller than that of the cylinder. Injection for processing
8. 仕切板が平板状であって、 開口部が 1 の孔よ り な る請求項 7 記載の細胞処理用噴射装置。 8. The injection device for cell treatment according to claim 7, wherein the partition plate has a flat plate shape, and the opening is formed by one hole.
9. 仕切板がカ ッ プ状であ って、 開口部が複数の孔ょ り なる請求項 7 記載の細胞処理用噴射装置。  9. The injection device for cell treatment according to claim 7, wherein the partition plate is cup-shaped, and the opening has a plurality of holes.
1 0. ガス発生部と シ リ ンダ中の ビス ト ン との間に設け られ、 シ リ ン ダへのガスの流れの一部を流出させる流出 孔と、 こ の流出孔に連な り、 予め設定した圧力になる と 開いてガスを外部へ放出させる調圧弁を有し、 噴射速度 が調節可能とな った請求項 1 〜 9 の何れかに記載の細胞 処理用噴射装置。  10. An outlet provided between the gas generating section and the piston in the cylinder to allow a part of the gas flow to the cylinder to flow, and connected to the outlet, The cell processing injection device according to any one of claims 1 to 9, further comprising a pressure regulating valve that opens when the pressure reaches a preset value and releases the gas to the outside, and the injection speed can be adjusted.
1 1 . ガス発生部と シ リ ンダ中の ビス ト ン との間に設け られ、 容積を調節する こ とができ、 シ リ ンダへのガスの 流れの一部を受け入れて溜める タ ン クを有し、 噴射速度 が調節可能とな った請求項 1 〜 9 の何れかに記載の細胞 処理用噴射装置。  1 1. A tank is provided between the gas generating section and the piston in the cylinder, the volume of which can be adjusted, and a tank that receives a part of the gas flow to the cylinder and stores it. The cell processing injection device according to any one of claims 1 to 9, wherein the injection device has an adjustable injection speed.
1 2. 高圧ガスを瞬時に発生させるガス発生部と、  1 2. A gas generator that generates high-pressure gas instantaneously,
こ のガス発生部に連な り、 ガスを受け入れるガス溜室 と、  A gas storage chamber connected to the gas generating section for receiving gas;
こ のガス溜室に連な り、 ガス溜室と同 じ又は小さな断 面積を有 し、 先端に細胞処理材が付着させられた ピス ト ンを収納 し、 ガス溜室からのガスによ り この ピス ト ンを 先端方向へ進行させる シ リ ンダと、 A piston connected to this gas reservoir, having the same or smaller cross-sectional area as the gas reservoir, and having a cell treatment material attached to the tip. A cylinder for storing the piston and advancing the piston toward the distal end by gas from the gas reservoir.
小孔を有し、 こ のシ リ ンダの先端又は先端延長上に設 けられ、 ピス ト ンを衝突させて細胞処理材を小孔から試 料に噴射させる噴射部と、  An injection unit having a small hole, which is provided on the tip or extension of the tip of the cylinder, and which collides with a piston to inject the cell treatment material from the small hole into the sample;
ガス発生部と シ リ ンダ中の ビス ト ン との間に、 容積を 調節する こ とができ、 シ リ ンダへのガスの流れの一部を 受け入れて溜める タ ン ク と  The volume can be adjusted between the gas generator and the piston in the cylinder, and a tank that receives and stores a part of the gas flow to the cylinder.
を有する こ とを特徴とする細胞処理用噴射装置。  An injection device for cell treatment, comprising:
PCT/JP1992/000028 1991-01-18 1992-01-16 Jetting device for treating cell WO1992013062A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP3/75539 1991-01-18
JP3/75538 1991-01-18
JP3075539A JPH04237486A (en) 1991-01-18 1991-01-18 Jetter for treating cell
JP3075538A JPH04237485A (en) 1991-01-18 1991-01-18 Regulator for jetting speed of jetter for treating cell

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WO1992013062A1 true WO1992013062A1 (en) 1992-08-06

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PARTICULATE SCIENCE AND TECHNOLOGY, Vol. 5, No. 1, 1987, SANDFORD, J.C. et al., "Delivery of substances into cells and tissues using a particle bombardment process", p. 30-33. *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108553748A (en) * 2018-05-11 2018-09-21 江秀秀 Internal various kinds of cell is implanted into instrument under B ultrasound monitoring

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