WO1992007840A1 - Thiazole thioester derivative - Google Patents
Thiazole thioester derivative Download PDFInfo
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- WO1992007840A1 WO1992007840A1 PCT/JP1991/001482 JP9101482W WO9207840A1 WO 1992007840 A1 WO1992007840 A1 WO 1992007840A1 JP 9101482 W JP9101482 W JP 9101482W WO 9207840 A1 WO9207840 A1 WO 9207840A1
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- -1 Thiazole thioester Chemical class 0.000 title claims description 53
- 150000001875 compounds Chemical class 0.000 claims abstract description 47
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 18
- 229930186147 Cephalosporin Natural products 0.000 claims abstract description 13
- 229940124587 cephalosporin Drugs 0.000 claims abstract description 13
- 150000001780 cephalosporins Chemical class 0.000 claims abstract description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 125000006239 protecting group Chemical group 0.000 claims description 24
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 239000011574 phosphorus Substances 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- 125000000623 heterocyclic group Chemical group 0.000 claims description 2
- 230000003301 hydrolyzing effect Effects 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 230000000844 anti-bacterial effect Effects 0.000 abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 35
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 22
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 21
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 18
- 239000002253 acid Substances 0.000 description 17
- 239000000243 solution Substances 0.000 description 14
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 11
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 8
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 8
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 5
- 235000019253 formic acid Nutrition 0.000 description 5
- 230000007062 hydrolysis Effects 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 4
- PFBUKDPBVNJDEW-UHFFFAOYSA-N dichlorocarbene Chemical group Cl[C]Cl PFBUKDPBVNJDEW-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 4
- 239000000543 intermediate Substances 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- 241000894006 Bacteria Species 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 241000192125 Firmicutes Species 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 3
- 229940092714 benzenesulfonic acid Drugs 0.000 description 3
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical class ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 3
- 238000004440 column chromatography Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 3
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical compound NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 description 2
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- KQIADDMXRMTWHZ-UHFFFAOYSA-N chloro-tri(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(C(C)C)C(C)C KQIADDMXRMTWHZ-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- JBWKIWSBJXDJDT-UHFFFAOYSA-N triphenylmethyl chloride Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 JBWKIWSBJXDJDT-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- NXZLTPQEYLXQCH-DAFODLJHSA-N (2e)-2-hydroxyiminoacetamide Chemical group NC(=O)\C=N\O NXZLTPQEYLXQCH-DAFODLJHSA-N 0.000 description 1
- XEZIFGWTSLOMMT-MEFGMAGPSA-N (2z)-2-(2-amino-1,3-thiazol-4-yl)-2-trityloxyiminoacetic acid Chemical compound S1C(N)=NC(C(=N\OC(C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)\C(O)=O)=C1 XEZIFGWTSLOMMT-MEFGMAGPSA-N 0.000 description 1
- GXHPCVJGAHVTGO-UHFFFAOYSA-N 1,1,1-trichloro-2-(chloromethoxy)ethane Chemical compound ClCOCC(Cl)(Cl)Cl GXHPCVJGAHVTGO-UHFFFAOYSA-N 0.000 description 1
- 125000004512 1,2,3-thiadiazol-4-yl group Chemical group S1N=NC(=C1)* 0.000 description 1
- BIAAQBNMRITRDV-UHFFFAOYSA-N 1-(chloromethoxy)-2-methoxyethane Chemical compound COCCOCCl BIAAQBNMRITRDV-UHFFFAOYSA-N 0.000 description 1
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 1
- HZONRRHNQILCNO-UHFFFAOYSA-N 1-methyl-2h-pyridine Chemical compound CN1CC=CC=C1 HZONRRHNQILCNO-UHFFFAOYSA-N 0.000 description 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 1
- 125000006183 2,4-dimethyl benzyl group Chemical group [H]C1=C(C([H])=C(C(=C1[H])C([H])([H])*)C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 1
- CIACLSGBPZWWNK-UHFFFAOYSA-N 2-(chloromethoxy)-2-methylpropane Chemical compound CC(C)(C)OCCl CIACLSGBPZWWNK-UHFFFAOYSA-N 0.000 description 1
- 125000003821 2-(trimethylsilyl)ethoxymethyl group Chemical group [H]C([H])([H])[Si](C([H])([H])[H])(C([H])([H])[H])C([H])([H])C(OC([H])([H])[*])([H])[H] 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- LPZOCVVDSHQFST-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-ethylpyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)CC LPZOCVVDSHQFST-UHFFFAOYSA-N 0.000 description 1
- NXZLTPQEYLXQCH-UHFFFAOYSA-N 2-hydroxyiminoacetamide Chemical group NC(=O)C=NO NXZLTPQEYLXQCH-UHFFFAOYSA-N 0.000 description 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- 241000486679 Antitype Species 0.000 description 1
- XJUZRXYOEPSWMB-UHFFFAOYSA-N Chloromethyl methyl ether Chemical compound COCCl XJUZRXYOEPSWMB-UHFFFAOYSA-N 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- BQYAYJLTUMUXEP-UHFFFAOYSA-N N-(2,2-dichloroethenyl)-N-methylformamide Chemical compound ClC(Cl)=CN(C=O)C BQYAYJLTUMUXEP-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- ZDVDCDLBOLSVGM-UHFFFAOYSA-N [chloro(phenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(Cl)C1=CC=CC=C1 ZDVDCDLBOLSVGM-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- YCXVDEMHEKQQCI-UHFFFAOYSA-N chloro-dimethyl-propan-2-ylsilane Chemical compound CC(C)[Si](C)(C)Cl YCXVDEMHEKQQCI-UHFFFAOYSA-N 0.000 description 1
- XOLPGSHGGPYYQX-UHFFFAOYSA-N chloro-methyl-di(propan-2-yl)silane Chemical compound CC(C)[Si](C)(Cl)C(C)C XOLPGSHGGPYYQX-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000007327 hydrogenolysis reaction Methods 0.000 description 1
- 230000033444 hydroxylation Effects 0.000 description 1
- 238000005805 hydroxylation reaction Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MHYGQXWCZAYSLJ-UHFFFAOYSA-N tert-butyl-chloro-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](Cl)(C(C)(C)C)C1=CC=CC=C1 MHYGQXWCZAYSLJ-UHFFFAOYSA-N 0.000 description 1
- 150000007970 thio esters Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
- C07D277/62—Benzothiazoles
- C07D277/68—Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
- C07D277/70—Sulfur atoms
- C07D277/74—Sulfur atoms substituted by carbon atoms
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Definitions
- the present invention relates to a novel thiazole thioester derivative, and more particularly, to a (Z) 1-2- (2-aminothiazole-14-yl) 1 having excellent antibacterial activity against Gram-positive bacteria and Gram-negative bacteria.
- a method for producing a cephalosporin derivative having a [1-2-hydroxyiminoacetamide] group is known [R. Bucourt et. Al., Tetrahedron, 1978, 34, 2233; JP-A-56-21600; JP-A-2'-73090]. ,
- Ph represents a phenyl group
- the above-mentioned method is not suitable for the production of a cefm compound using a compound of the formula (1), (2) or (3), which is expensive as a condensing agent for 1-hydroxybenzotriazole and dicyclohexylcarbodiyl.
- This method is not preferable as a production method on an industrial scale in that a medium or the like must be used.
- the thiazole thioester compound represented by the formula (I) provided by the present invention can be produced at a very low cost, and has excellent antibacterial activity against Gram-positive bacteria and Gram-negative bacteria.
- (Z) — 2- (2-Aminothiazol-4-yl) cephalosporin derivative having a 2-hydroxyiminoacetamide group at the 7-position (for example, JP-A-58-184036, (See JP-A-62-492 and JP-A-2-22283) are found to be extremely useful as production intermediates.
- JP-A-58-184036 See JP-A-62-492 and JP-A-2-22283
- the ⁇ hydroxy protecting group '' which can be represented by is any hydroxy protecting group which can be easily removed by a deprotecting group reaction such as hydrolysis or hydrogenolysis using an acid or a base as a catalyst. it can, for example, trityl, (p-Anishiru) Jifuenirumechiru such as Ariru substituted methylol 0 Le group;.
- hydroxy protecting groups preferred are (p-anisyl), diphenylmethyl, t-butoxymethyl, tetrahydroviranyl, (1-methyl-1-methoxy) ethyl, and the like. Is preferred o
- reaction formula A The thiazole thioester compound of the formula (I) of the present invention can be produced, for example, by the method shown in the following reaction formula A. Reaction formula A
- R 2 represents a carboxy protecting group
- three Xs each independently represent an aryl group or an alkoxy group
- three Ys each independently represent an alkyl group. Or two of them, Y, together with the N atom to which they are attached, may further contain a heteroatom such as N, S, O, etc.
- a 5- or 6-membered nitrogen-containing heterocyclic group Preferably a 5- or 6-membered nitrogen-containing heterocyclic group).
- a “carboxy protecting group” represented by R 2 is any carboxy protecting group that can be easily removed by a deprotecting reaction such as hydrolysis using an acid or base as a catalyst, for example, methyl, ethyl, propyl And tert-butyl and the like; and substituted or unsubstituted aralkyl groups such as p-ditrophenylmethyl and diphenylmethyl.
- the phosphorus compound represented by X 3 P includes a phosphine compound and a phosphorous acid compound, and specifically includes triarylphosphines such as triphenylphosphine; trimethyl phosphate, triethyl phosphite, and the like. And the like.
- tertiary amine compounds represented by Y 3 N include, for example, N-alkyl-substituted nitrogen-containing heterocyclic compounds such as N-methylmorpholine, N-methylpyridine and N-methylpyrrolidine; triethylamine, ⁇ , ⁇ — Trialkylamines such as disopropylethylamine, and the like.
- the protecting group is added to the hydroxyimino group of the compound of the formula ( ⁇ ) as a raw material.
- reagents for introducing a protecting group include aryl-substituted methyl chlorides such as trityl chloride and (P-anisyl) diphenylmethyl chloride; methoxymethyl chloride, and t-butoxymethyl chloride.
- the reaction can be carried out in the presence of a base such as pyridine or triethylamine, or an acid such as benzenesulfonic acid or ⁇ -toluenesulfonic acid, if necessary.
- a base such as pyridine or triethylamine
- an acid such as benzenesulfonic acid or ⁇ -toluenesulfonic acid
- a solvent for the reaction for example, a solvent that does not participate in the reaction, such as tetrahydrofuran, ethyl acetate, dichloromethylene, and N, N-dimethylformamide can be used.
- the reaction temperature is not particularly limited, but usually room temperature is used.
- the compound of the formula (W) is produced by reacting the compound of the formula (m) obtained in the step (A) with thiourea.
- the reaction of the compound of formula (m) with thiourea is usually preferably carried out in a mixed solvent of water such as tetrahydrofuran, ethanol, N, N-dimethylformamide and the like. It can range from about 0 to about 70 ° C, preferably from about 10 to about 40 ° C.
- the amount of thiourea used is not strictly limited, but is generally in the range of 1 to 10 mol, especially 1 to 2 mol, per mol of the compound of the formula (ffl).
- This step (C) is a step of hydrolyzing the compound of the formula (IV) obtained in the above step (B) to obtain a free carboxylic acid of the formula (V).
- the hydrolysis reaction of the compound of the formula (IV) can be performed in the presence of a base according to a conventional method. Suitable bases that can be used include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogen carbonate and the like.
- the reaction is preferably performed using a solvent.
- a mixed solvent of tetrahydrofuran, dioxane, ethanol, methanol, or the like and water can be used.
- the reaction temperature can usually be in the range of about 0 to about 200 ° C, preferably about 80 to about 120 ° C.
- the amount of dithiobenzothiazole used is not particularly limited.
- the compound (V) can be used in an amount of 1 to 10 mol, preferably 1 to 1.5 mol, per 1 mol of the compound.
- the phosphorus compound and the tertiary amine compound are each in an amount of about 1 to about 1.5 mol per 1 mol of the compound of the formula (V).
- the reaction is generally carried out in a solvent inert to the reaction, such as acetonitrile, acetone, tetrahydrofuran, and dichloromethane, at a temperature in the range of about -20 to about 100 ° C, preferably about 0 to about 60 ° C. Can be.
- a solvent inert such as acetonitrile, acetone, tetrahydrofuran, and dichloromethane
- the compound of formula (1-1) thus formed is separated and purified from the reaction mixture after completion of the reaction by a method known in the art, for example, crystallization, filtration, washing, drying, etc. can do.
- the compound of the formula (I-11) may be further converted to a compound of the formula (I) in which R, is a hydrogen atom by removing the hydroxy protecting group (Rn), if necessary. can do.
- the removal of the hydroxy protecting group can be performed by selecting deprotection reaction conditions known per se according to the type of the protecting group. For example, when the hydroxy protecting group is trityl, tetrahydroviranyl, (p-disyl) diphenylmethyl, 2,4-dimethoxybenzyl, etc., for example, hydrochloric acid, sulfuric acid, phosphoric acid, etc.
- the acid can be used usually in a catalytic amount or a large excess, and the reaction temperature is in the range of about 120 ° C to about 80 ° C, especially about 0 ° C to about 60 ° C. can do.
- the thiazole thioester compound of the formula (1-1) provided by the present invention is useful as an intermediate for producing a cephalosporin derivative having antibacterial activity.
- the compound of the formula (I-11) of the present invention is
- R 3 represents a hydrogen atom or a carboxy protecting group
- R 4 represents a hydrogen atom or a 3-position substituent commonly found in cephalosporin compounds, and reacted with a 7-aminocephem compound represented by the following formula:
- R 3 and R 4 are as defined above,
- the reaction between the compound of the formula (I-11) and the compound of the formula (VI) according to the present invention is inactive in the reaction of, for example, acetone, tetrahydrofuran, ethyl acetate, dichloromethylene, N, N-dimethylformamide and the like.
- a suitable solvent it can be carried out usually at a temperature in the range of about 150 to about 100 ° C, especially about 15 to about 60 ° C.
- the removal of the hydroxy protecting group (R u) from the resulting compound of the formula ( ⁇ ) can be carried out by selecting the deprotecting group reaction conditions known per se according to the type of the protecting group. For example, when the hydroxy protecting group is trityl, tetrahydroviranyl, (p-anisyl) diphenylmethyl, 2,4-dimethylbenzyl, etc., these protecting groups can be removed by hydrolysis using an acid. it can.
- Suitable acids that can be used for this hydrolysis include, for example, inorganic acids such as hydrochloric acid, sulfuric acid and phosphoric acid; trifluoroacetic acid, formic acid, acetic acid, propionic acid, benzenesulfonic acid, P-toluenesulfonic acid, methanesulfonic acid Organic acids such as acids can be mentioned. Usually, the acid It can be used in a medium amount or a large excess amount.
- the reaction temperature is usually preferably in the range of about 120 ° C. to about 8 ° C., especially about 0 ° C. to about 60 ° C.
- the reaction time can be generally about 0.5 to 24 hours.
- alcohols such as methanol and ethanol; ethers such as dioxane and tetrahydrofuran; ketones such as acetone; nitriles such as acetonitrile; or a mixed solvent of these solvents and water can be used.
- ethers such as dioxane and tetrahydrofuran
- ketones such as acetone
- nitriles such as acetonitrile
- a mixed solvent of these solvents and water can be used.
- a large excess of acid may be used as a solvent.
- the resulting cephalosporin derivative is obtained by removing unreacted raw materials, by-products, solvents, etc. from the reaction mixture by a conventional method (extraction, evaporation, washing, concentration, precipitation, filtration, drying, etc.) It can be isolated by treating it by a processing method (adsorption, elution, distillation, precipitation, precipitation, chromatography, etc.).
- the reaction proceeds under neutral conditions, and as a result, the desired cephalosporin derivative can be obtained with high purity and high yield.
- IR (KB r, dis c., Cm " 1 ) 3450, 3250, 3100, 2980, 1730, 1610, 1530, 1440, 1370, 1260, 1230, 1170, 1030, 960, 765,
- I R (KB r, d i s c., Cm-ri 3450, 3060, 1710, 1610, 1540, 1440, 1370, 1310, 1205, 1050, 980, 915, 900, 860, 760, 700
- I R (KB r, d i s c., Cm-3330, 2980, 1870, 1750, 1710, 1660, 1520, 1360, 1220, 1120, 980, 800
- the compound provided by the present invention exhibits excellent antibacterial activity against Gram-positive bacteria and Gram-negative bacteria.
- the desired cephalosporin derivative can be obtained with high purity and high yield.
Abstract
A compound represented by general formula (I), which is useful as an intermediate for the production of (Z)-2-(2-aminothiazol-4-yl)-2-hydroxyiminoacetamide-substituted cephalosporin derivatives having an excellent antibacterial activity, wherein R1 represents hydrogen or a hydroxyl protecting group.
Description
明 細 書 Specification
チアゾールチオヱステル誘導体 Thiazole thioester derivatives
技術分野 Technical field
本発明は、 新規なチアゾールチオエステル誘導体に関し、 さらに詳し くは、 グラム陽性菌及びグラム陰性菌に対し優れた抗菌活性を示す (Z ) 一 2— (2—ァミノチアゾール一 4一ィル) 一 2—ヒ ドロキシィミノア セトアミ ド基を有するセファロスポリン誘導体を製造するための中間体 として有用な下記式 The present invention relates to a novel thiazole thioester derivative, and more particularly, to a (Z) 1-2- (2-aminothiazole-14-yl) 1 having excellent antibacterial activity against Gram-positive bacteria and Gram-negative bacteria. The following formula useful as an intermediate for producing a cephalosporin derivative having a 2-hydroxyiminoacetoamide group:
で示される化合物に関する。 With respect to the compound represented by
背景技術 Background art
従来、 下記式 (1 ) の (Z ) — 2— (2—トリチルアミノチアゾール —4—ィル) 一 2—トリチルォキシィミノ酢酸、 下記式 (2 ) の (Z ) —2— (2—トリチルォキシィミノ) ー2— (2—ァミノチアゾール一 4一ィル) 酢酸又は下記式 (3 ) の (Z ) — 2— (2— (2—トリチル ァミノチアゾールー 4一ィル) 一 2—テトラヒドロビラニルォキシィミ ノ酢酸等を 7—アミノセフエム化合物と反応させた後、 保護基を除去す ることにより、 7— C ( Z ) — 2— ( 2—ァミノチアゾールー 4一ィル) 一 2—ヒドロキシイミノアセトアミ ド] 基を有するセファロスポリン誘 導体を製造する方法は公知である [R. Bucourt et. al. , Tetrahedron,
1978, 34, 2233 ;特開昭 56— 21600号公報;特開平 2 ' - 73090号公報参照] 。 、 Conventionally, (Z) —2- (2-tritylaminothiazole-4-yl) -12-trityloxyiminoacetic acid of the following formula (1), (Z) —2— (2) of the following formula (2) —Trityloxyimino) -2- (2-aminothiazole-41-yl) acetic acid or (Z) of the following formula (3) —2 -— (2- (2-tritylaminothiazole-4-1) 7) C- (Z) -2- (2-aminothiazole) by reacting 12-tetrahydrobiranyloxyiminoacetic acid and the like with a 7-aminocephem compound and removing the protecting group. A method for producing a cephalosporin derivative having a [1-2-hydroxyiminoacetamide] group is known [R. Bucourt et. Al., Tetrahedron, 1978, 34, 2233; JP-A-56-21600; JP-A-2'-73090]. ,
(1) (2) (1) (2)
(3) 上記各式中、 Phはフエ二ル基を表わす、 (3) In each of the above formulas, Ph represents a phenyl group,
しかしながら、 上記の方法は、 式 (1) 、 (2) 又は (3) の化合物 を用いてセフエム化合物を製造する場合、 縮合剤として高価な 1ーヒド ロキシベンゾトリァゾ一ル及びジシクロへキシルカルボジィミ ド等を使 用しなければならない点で工業的規模での製造法としては好ましいもの とはいえない。 However, the above-mentioned method is not suitable for the production of a cefm compound using a compound of the formula (1), (2) or (3), which is expensive as a condensing agent for 1-hydroxybenzotriazole and dicyclohexylcarbodiyl. This method is not preferable as a production method on an industrial scale in that a medium or the like must be used.
これに対し、 今回、 本発明により提供される前記式 (I) で示される チアゾールチオエステル化合物は、 非常に安価に製造することができ、 グラム陽性菌及びグラム陰性菌に対して優れた抗菌活性を示す (Z) — 2 - (2—ァミノチアゾールー 4—ィル) 一 2—ヒドロキシイミノアセ トアミ ド基を 7位に有するセファロスポリン誘導体 (例えば、 特開昭 5 8— 184036号公報、 特開昭 62— 492号公報、 特開平 2— 22 283号公報参照) の製造中間体として極めて有用であることを見い出
し、 本発明を完成するに至った。 In contrast, the thiazole thioester compound represented by the formula (I) provided by the present invention can be produced at a very low cost, and has excellent antibacterial activity against Gram-positive bacteria and Gram-negative bacteria. (Z) — 2- (2-Aminothiazol-4-yl) cephalosporin derivative having a 2-hydroxyiminoacetamide group at the 7-position (for example, JP-A-58-184036, (See JP-A-62-492 and JP-A-2-22283) are found to be extremely useful as production intermediates. Thus, the present invention has been completed.
発明の開示 、 Disclosure of the invention,
前記式 ( I ) の化合物において、 = Ν Ο ί^基は Z—型 (s y η—型) 又は Ε—型 (a n t i—型) のいずれかの立体配置を有することができ ■> るが、 一般に Z—異性体が好適である。 In the compound of the formula (I), the = = Ο ί ^ group can have any of the Z-type (sy η-type) or Ε-type (anti-type) configuration. Generally, the Z-isomer is preferred.
また、 によって表わされうる 「ヒ ドロキシ保護基」 は、 酸又は塩 基を触媒として用いた加水分解、 水素添加分解等の脱保護基反応により 容易に除去しうる任意のヒ ドロキシ保護基であることができ、 例えば、 トリチル、 (p—ァニシル) ジフエニルメチルの如きァリール置換メチ 0 ル基; メ .トキシメチル、 t一ブトキシメチル、 2—メ トキシエトキシメ チル、 2, 2 , 2—トリクロロェトキシメチル、 ビス (2—クロロェトキ シ) メチル、 2— (トリメチルシリル) ェトキシメチル、 テ トラヒ ドロ ビラニルの如き置換メチル基; 1一エトキシェチル、 (1一メチル— 1 ーメ トキシ) ェチル、 2, 2, 2 -トリクロロェチルの如き置換ェチル基; ; トリメチルシリル、 トリェチルシリル、 イソプロピルジメチルシリル、 tーブチルジメチルシリル、 (トリフエニルメチル) ジメチルシリル、 t -ブチルジフェニルシリル、 メチルジイソプロピルシリル、 トリイソ プロビルシリルの如きアルキル置換シリル基等が挙げられる。 The `` hydroxy protecting group '' which can be represented by is any hydroxy protecting group which can be easily removed by a deprotecting group reaction such as hydrolysis or hydrogenolysis using an acid or a base as a catalyst. it can, for example, trityl, (p-Anishiru) Jifuenirumechiru such as Ariru substituted methylol 0 Le group;. main Tokishimechiru, t one butoxymethyl, 2 main Tokishietokishime chill, 2, 2, 2-trichloromethyl E butoxy methyl Substituted methyl groups such as, bis (2-chloroethoxy) methyl, 2- (trimethylsilyl) ethoxymethyl, tetrahydroviranyl; 1-ethoxyhexyl, (1-methyl-1-methoxy) ethyl, 2,2,2-trichloro such substituents Echiru group Echiru; trimethylsilyl, Toryechirushiriru, isopropyl dimethylsilyl, t Buchirujime Rushiriru, (triphenylmethyl) dimethylsilyl, t - butyldiphenylsilyl, methyl diisopropyl silyl, alkyl substituted silyl group such as triiso Purobirushiriru.
これらのヒ ドロキシ保護基の中、 好適なものとしては (p—ァニシル) , ジフエ二ルメチル、 t一ブトキシメチル、 テトラヒ ドロビラニル、 (1 ーメチルー 1—メ トキシ) ェチル等が挙げられ、 殊にトリチル基が好適 め o Of these hydroxy protecting groups, preferred are (p-anisyl), diphenylmethyl, t-butoxymethyl, tetrahydroviranyl, (1-methyl-1-methoxy) ethyl, and the like. Is preferred o
本発明の式 ( I ) のチアゾールチオエステル化合物は、 例えば、 下記 反応式 Aに示す方法によって製造することができる。
反応式 A The thiazole thioester compound of the formula (I) of the present invention can be produced, for example, by the method shown in the following reaction formula A. Reaction formula A
(W) (V) (W) (V)
上記反応式において、 はヒドロキシ保護基を表わし、 R 2はカル ボキシ保護基を表わし、 3つの Xはそれぞれ独立にァリ一ル基又はアル コキシ基を表わし、 3つの Yはそれぞれ独立にアルキル基を表すか、 或 いはそのうちの 2つの Yはこれらが結合している N原子と一緒になって さらに N、 S、 Oなどのへテロ原子を含んでいてもよい含窒素複素環式 基 (好ましくは 5又は 6員の含窒素複素環式基) を表わす。 In the above reaction formula, represents a hydroxy protecting group, R 2 represents a carboxy protecting group, three Xs each independently represent an aryl group or an alkoxy group, and three Ys each independently represent an alkyl group. Or two of them, Y, together with the N atom to which they are attached, may further contain a heteroatom such as N, S, O, etc. Preferably a 5- or 6-membered nitrogen-containing heterocyclic group).
R 2によって表わされる 「カルボキシ保護基」 は酸又は塩基を触媒と して用いる加水分解等の脱保護基反応により容易に除去しうる任意の力 ルボキシ保護基であり、 例えば、 メチル、 ェチル、 プロピル、 tert—プ チルなどのアルキル基; p—二トロフエニルメチル、 ジフエニルメチル などの置換もしくは未置換のァラルキル基、 等が挙げられる。
また、 X 3 Pで示されるリン化合物にはホスフィン化合物及び亜リン ' 酸化合物が包含され、 具体的には、 例えばトリフエニルホスフィンのよ うなトリァリールホスフィン類; トリメチルホスフェート、 トリェチル . ホスフエ一トなどのトリアルキルホスフエ一ト類、 等が挙げられる。 A “carboxy protecting group” represented by R 2 is any carboxy protecting group that can be easily removed by a deprotecting reaction such as hydrolysis using an acid or base as a catalyst, for example, methyl, ethyl, propyl And tert-butyl and the like; and substituted or unsubstituted aralkyl groups such as p-ditrophenylmethyl and diphenylmethyl. Further, the phosphorus compound represented by X 3 P includes a phosphine compound and a phosphorous acid compound, and specifically includes triarylphosphines such as triphenylphosphine; trimethyl phosphate, triethyl phosphite, and the like. And the like.
さらに、 Y 3Nで示される 3級ァミン化合物としては、 例えば、 N— メチルモルホリン、 N—メチルピリジン、 N—メチルピロリジンなどの N—アルキル置換含窒素複素環式化合物; トリェチルァミ ン、 Ν, Ν— ジィソプロピルェチルァミンなどのトリアルキルァミン類、 等が挙げら れる。 Further, tertiary amine compounds represented by Y 3 N include, for example, N-alkyl-substituted nitrogen-containing heterocyclic compounds such as N-methylmorpholine, N-methylpyridine and N-methylpyrrolidine; triethylamine, Ν, Ν — Trialkylamines such as disopropylethylamine, and the like.
以下、 反応式 Αに示す反応について工程ごとにさらに詳しく説明する。 工程 (A) : Hereinafter, the reaction represented by the reaction formula (1) will be described in more detail step by step. Process (A):
本工程は、 原料の式 (Π ) の化合物のヒ ドロキシィミノ基に保護基 In this step, the protecting group is added to the hydroxyimino group of the compound of the formula (式) as a raw material.
( R i ) を導入する工程である。 This is the step of introducing (R i).
保護基を導入するための試薬としては、 例えば、 トリチルクロライ ド、 ( P—ァニシル) ジフエニルメチルクロライ ドの如きァリール置換メチ ルクロライ ド; メ トキシメチルクロライ ド、 t—ブトキシメチルク口ラ イ ド、 2—メ トキシェトキシメチルクロライ ド、 2 , 2, 2—トリクロ口 ェトキシメチルクロライ ド、 ビス (2—クロ口エトキン) メチルクロラ イ ド、 2— (トリメチルシリル) エトキシメチルクロライ ドの如き置換 メチルクロライ ド類; 1ーェトキシェチルクロライ ド、 1—メチルー 1 ーメ トキシェチルクロライ ド、 2 , 2, 2—トリクロ口ェチルクロライ ド の如き置換ェチルクロライ ド類; トリメチルシリルクロライ ド、 トリェ チルシリルクロライ ド、 イソプロピルジメチルシリルクロライ ド、 t— ブチルジフエニルシリルクロライ ド、 メチルジイソプロビルシリルクロ
ライド、 トリイソプロビルシリルク口ライ ドの如きアルキル置換シリル ' クロライ ド類; ジヒドロビランィソプロべニルメチルエーテルの如きェ 一テル類、 等を挙げることができる。 これら保護基導入試薬の使用量は 特に制限されないが、 通常、 式 (Π ) の化合物 1モル当り 1〜1 0モル、 特に 1〜2モルの範囲内が適当である。 Examples of reagents for introducing a protecting group include aryl-substituted methyl chlorides such as trityl chloride and (P-anisyl) diphenylmethyl chloride; methoxymethyl chloride, and t-butoxymethyl chloride. Ride, 2-methoxyethoxymethyl chloride, 2,2,2-trichloroethoxymethyl chloride, bis (2-chloroethoxyquin) methyl chloride, 2- (trimethylsilyl) ethoxymethyl chloride Substituted methyl chlorides such as Ride; substituted methyl chlorides such as 1-ethoxyl-chloride, 1-methyl-1-methoxyl-chloride, 2,2,2-trichloromethyl chloride; trimethylsilyl chloride Ride, triethylsilyl chloride, isopropyldimethylsilyl chloride, t-butyldi Phenylsilyl chloride, methyldiisopropylsilyl chloride And alkyl-substituted silyl chlorides such as triisopropylsilyl chloride; ethers such as dihydrobilanisoproenylmethyl ether; and the like. The amount of the protecting group-introducing reagent to be used is not particularly limited, but is usually in the range of 1 to 10 mol, preferably 1 to 2 mol, per 1 mol of the compound of the formula (III).
反応は必要に応じて、 ピリジン、 トリェチルァミン等の塩基、 あるい はベンゼンスルホン酸、 ρ —トルエンスルホン酸等の酸の存在下で行う ことができる。 反応にあたっては一般に溶媒を用いることが好ましく、 · 例えば、 テトラヒドロフラン、 酢酸ェチル、 ジクロロメチレン、 N, N —ジメチルホルムアミ ドなどの反応に関与しない溶媒を用いることがで きる。 反応温度は特に制限されないが、 通常は室温が用いられる。 The reaction can be carried out in the presence of a base such as pyridine or triethylamine, or an acid such as benzenesulfonic acid or ρ-toluenesulfonic acid, if necessary. In general, it is preferable to use a solvent for the reaction. For example, a solvent that does not participate in the reaction, such as tetrahydrofuran, ethyl acetate, dichloromethylene, and N, N-dimethylformamide can be used. The reaction temperature is not particularly limited, but usually room temperature is used.
工程 (B ) : Process (B):
本工程では、 工程 (A) で得られる式 (m) の化合物をチォ尿素と反 応させることにより式 (W) の化合物が製造される。 In this step, the compound of the formula (W) is produced by reacting the compound of the formula (m) obtained in the step (A) with thiourea.
式 (m) の化合物とチォ尿素との反応は、 通常、 テトラヒドロフラン、 エタノール、 N, N—ジメチルホルムアミ ド等の溶媒と水との混合溶媒 中で行うのが好ましく、 また、 反応温度は一般に約 0〜約 7 0 °C、 好ま しくは約 1 0〜約 4 0 °Cの範囲とすることができる。 The reaction of the compound of formula (m) with thiourea is usually preferably carried out in a mixed solvent of water such as tetrahydrofuran, ethanol, N, N-dimethylformamide and the like. It can range from about 0 to about 70 ° C, preferably from about 10 to about 40 ° C.
チォ尿素の使用量は厳密に制限されるものではないが、 一般に、 式 (ffl) の化合物 1モル当り 1〜1 0モル、 特に 1〜2モルの範囲内が適 当である。 The amount of thiourea used is not strictly limited, but is generally in the range of 1 to 10 mol, especially 1 to 2 mol, per mol of the compound of the formula (ffl).
工程 (C ) : Process (C):
本工程 (C) は、 上記工程 (B ) で得られる式 (IV) の化合物を加水 分解して、 式 (V) の遊離カルボン酸を得る工程である。
式 (IV) の化合物の加水分解反応は常法に従って塩基の存在下に行う ' ことができる。 使用しうる好適な塩基としては、 水酸化ナトリウム、 水 酸化力リウム、 炭酸ナトリウム、 炭酸水素ナトリウム等が挙げられる。 該反応は溶媒を用いて行なうのが好ましく、 例えば、 テトラヒ ドロフラ ン、 ジォキサン、 エタノール、 メタノール等と水との混合溶媒を用いる ことができる。 反応温度は通常約 0〜約 200°C、 好ましくは、 約 80 〜約 120°Cの範囲内とすることができる。 This step (C) is a step of hydrolyzing the compound of the formula (IV) obtained in the above step (B) to obtain a free carboxylic acid of the formula (V). The hydrolysis reaction of the compound of the formula (IV) can be performed in the presence of a base according to a conventional method. Suitable bases that can be used include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogen carbonate and the like. The reaction is preferably performed using a solvent. For example, a mixed solvent of tetrahydrofuran, dioxane, ethanol, methanol, or the like and water can be used. The reaction temperature can usually be in the range of about 0 to about 200 ° C, preferably about 80 to about 120 ° C.
工程 (D) : Process (D):
本工程において、 式 (V) の化合物がリン化合物 (X2P) 及び 3級 D ァミン化合物 (Y3N) の存在下に、 ジチォベンゾチアゾールと反応せ しめられ、 目的とする式 (I一 1) の化合物が製造される。 In this step, in the presence of a compound of phosphorus compounds of formula (V) (X 2 P) and tertiary D Amin compound (Y 3 N), crimped react with di Chio benzothiazole, expression of interest (I The compound of 1) is produced.
ジチォベンゾチアゾールの使用量は特に制限されないが、 通常、 式 The amount of dithiobenzothiazole used is not particularly limited.
(V) の化合物 1モル当り 1〜 10モル、 好ましくは 1〜 1.5モルの 範囲内で使用することができる。 また、 リン化合物及び 3級ァミン化合 , 物はそれぞれ式 (V) の化合物 1モルに対して約 1〜約 1.5モルの範 The compound (V) can be used in an amount of 1 to 10 mol, preferably 1 to 1.5 mol, per 1 mol of the compound. The phosphorus compound and the tertiary amine compound are each in an amount of about 1 to about 1.5 mol per 1 mol of the compound of the formula (V).
囲内で用いるのが好都合である。 It is convenient to use it within the enclosure.
反応は一般に、 ァセトニトリル、 アセトン、 テトラヒドロフラン、 ジ クロロメチレンなどの反応に不活性な溶媒中で、 約— 20〜約 100°C、 好ましくは約 0〜約 60°Cの範囲内の温度で行うことができる。 The reaction is generally carried out in a solvent inert to the reaction, such as acetonitrile, acetone, tetrahydrofuran, and dichloromethane, at a temperature in the range of about -20 to about 100 ° C, preferably about 0 to about 60 ° C. Can be.
かく して生成する式 (1— 1) の化合物は、 それき体既知の方法、 例 えば、 結晶化、 濾過、 洗浄、 乾燥等の手段により、 反応終了後の反応混 合物から分離、 精製することができる。 The compound of formula (1-1) thus formed is separated and purified from the reaction mixture after completion of the reaction by a method known in the art, for example, crystallization, filtration, washing, drying, etc. can do.
式(I一 1)の化合物はさらに必要に応じて、 ヒ ドロキシ保護基(Rn) を除去することにより、 R,が水素原子である式 ( I ) の化合物に
することができる。 このヒ ドロキシ保護基の除去は、 保護基の種類に応' じてそれ自体既知の脱保護反応条件を選択して行なうことができる。 例 えば、 ヒドロキシ保護基がトリチル、 テトラヒドロビラニル、 (p—ァ 二シル) ジフエ二ルメチル、 2 , 4—ジメ トキシベンジル基等である場 合には、 例えば、 塩酸、 硫酸、 リン酸等の無機酸や、 トリフルォロ酢酸、 ぎ酸、 酢酸、 プロピオン酸、 ベンゼンスルホン酸、 Ρ τトルエンスルホ ン酸、 メタンスルホン酸等の有機酸を用いた加水分解により除去するこ とができる。 酸は通常、 触媒量ないし大過剰量で用いることができ、 ま た、 反応温度は約一 2 0 °C〜約 8 0 °C、 特に約 0 °C〜約 6 0 °Cの範囲内 とすることができる。 The compound of the formula (I-11) may be further converted to a compound of the formula (I) in which R, is a hydrogen atom by removing the hydroxy protecting group (Rn), if necessary. can do. The removal of the hydroxy protecting group can be performed by selecting deprotection reaction conditions known per se according to the type of the protecting group. For example, when the hydroxy protecting group is trityl, tetrahydroviranyl, (p-disyl) diphenylmethyl, 2,4-dimethoxybenzyl, etc., for example, hydrochloric acid, sulfuric acid, phosphoric acid, etc. It can be removed by hydrolysis using an inorganic acid or an organic acid such as trifluoroacetic acid, formic acid, acetic acid, propionic acid, benzenesulfonic acid, ττ toluenesulfonic acid, and methanesulfonic acid. The acid can be used usually in a catalytic amount or a large excess, and the reaction temperature is in the range of about 120 ° C to about 80 ° C, especially about 0 ° C to about 60 ° C. can do.
本発明により提供される前記式 (1— 1 ) のチアゾールチオエステル 化合物は、 抗菌活性を有するセファロスポリン誘導体を製造するための 中間体として有用である。 例えば、 本発明の式 (I一 1 ) の化合物を下 The thiazole thioester compound of the formula (1-1) provided by the present invention is useful as an intermediate for producing a cephalosporin derivative having antibacterial activity. For example, the compound of the formula (I-11) of the present invention is
式中、 R 3は水素原子又はカルボキシ保護基を表わし、 R 4は水素原 子又はセファロスポリン化合物に通常みられる 3位置換基を表わす、 で示される 7—ァミノセフエム化合物と反応させて下記式 In the formula, R 3 represents a hydrogen atom or a carboxy protecting group, R 4 represents a hydrogen atom or a 3-position substituent commonly found in cephalosporin compounds, and reacted with a 7-aminocephem compound represented by the following formula:
で示される化合物を生成せしめ、 次いで R uのヒ ドロキシ保護基を除去 することにより下記式 The compound shown by the following formula is formed, and then the hydroxy protecting group of Ru is removed to obtain the following formula
で示されるセファロスポリン誘導体に導くことができる。 Can be led to the cephalosporin derivative represented by
本発明の式 (I一 1 ) の化合物と式 (VI) の化合物との反応は、 例え ばァセトン、 テトラヒ ドロフラン、 酢酸ェチル、 ジクロロメチレン、 N, N—ジメチルホルムアミ ド等の反応に不活性な溶媒中において、 通常、 約一 5 0〜約 1 0 0 °C、 特に約一 1 5〜約 6 0 °Cの範囲内の温度で行う ことができる。 The reaction between the compound of the formula (I-11) and the compound of the formula (VI) according to the present invention is inactive in the reaction of, for example, acetone, tetrahydrofuran, ethyl acetate, dichloromethylene, N, N-dimethylformamide and the like. In a suitable solvent, it can be carried out usually at a temperature in the range of about 150 to about 100 ° C, especially about 15 to about 60 ° C.
生成する式 (νπ) の化合物からのヒ ドロキシ保護基 (R u ) の除去は その保護基の種類に応じてそれ自体既知の脱保護基反応条件を選択して 行なうことができる。 例えば、 ヒ ドロキシ保護基がトリチル、 テトラヒ ドロビラニル、 (p—ァニシル) ジフエニルメチル、 2 , 4—ジメ トキ シベンジル基等である場合には、 これらの保護基は酸を用いた加水分解 により除去することができる。 この加水分解に使用しうる適当な酸とし ては、 例えば、 塩酸、 硫酸、 リン酸等の無機酸; トルフルォロ酢酸、 ぎ 酸、 酢酸、 プロピオン酸、 ベンゼンスルホン酸、 P—トルエンスルホン 酸、 メタンスルホン酸等の有機酸を挙げることができる。 通常、 酸は触
媒量ないし大過剰量で用いることができる。 反応温度は、 通常、 約一 2 0 °C〜約 8ひて、 特に約 0 °C〜約 6 0 °Cの範囲内が好ましい。 反応時間 は、 通常、 0 . 5〜2 4時間程度とすることができる。 反応にあたって は、 メタノール、 エタノール等のアルコール類; ジォキサン、 テトラヒ ドロフラン等のエーテル;ァセトンなどのケトン類;ァセトニトリル等 の二トリル類あるいはこれらの溶媒と水との混合溶媒を甩いることがで きる。 また大過剰の酸を用いて溶媒と兼甩してもよい。 The removal of the hydroxy protecting group (R u) from the resulting compound of the formula (νπ) can be carried out by selecting the deprotecting group reaction conditions known per se according to the type of the protecting group. For example, when the hydroxy protecting group is trityl, tetrahydroviranyl, (p-anisyl) diphenylmethyl, 2,4-dimethylbenzyl, etc., these protecting groups can be removed by hydrolysis using an acid. it can. Suitable acids that can be used for this hydrolysis include, for example, inorganic acids such as hydrochloric acid, sulfuric acid and phosphoric acid; trifluoroacetic acid, formic acid, acetic acid, propionic acid, benzenesulfonic acid, P-toluenesulfonic acid, methanesulfonic acid Organic acids such as acids can be mentioned. Usually, the acid It can be used in a medium amount or a large excess amount. The reaction temperature is usually preferably in the range of about 120 ° C. to about 8 ° C., especially about 0 ° C. to about 60 ° C. The reaction time can be generally about 0.5 to 24 hours. In the reaction, alcohols such as methanol and ethanol; ethers such as dioxane and tetrahydrofuran; ketones such as acetone; nitriles such as acetonitrile; or a mixed solvent of these solvents and water can be used. Also, a large excess of acid may be used as a solvent.
生成するセファロスポリン誘導体は、 反応液から、 未反応原料、 副生 成物、 溶媒等を常法 (抽出、 蒸発、 洗浄、 濃縮、 沈殿、 濾過、 乾燥等) により除去した後、 常用の後処理法 (吸着、 溶離、 蒸留、 沈殿、 析出、 クロマトグラフィー等) によって処理することにより単離することがで さる。 The resulting cephalosporin derivative is obtained by removing unreacted raw materials, by-products, solvents, etc. from the reaction mixture by a conventional method (extraction, evaporation, washing, concentration, precipitation, filtration, drying, etc.) It can be isolated by treating it by a processing method (adsorption, elution, distillation, precipitation, precipitation, chromatography, etc.).
本発明のチアゾールチオエステル化合物を用いることにより、 反応が 中性条件下で進行し、 その結果、 高純度かつ高収率で目的のセファロス ポリン誘導体が得られる。 By using the thiazole thioester compound of the present invention, the reaction proceeds under neutral conditions, and as a result, the desired cephalosporin derivative can be obtained with high purity and high yield.
実施例 Example
以下、 実施例により本発明をさらに具体的に説明する。 Hereinafter, the present invention will be described more specifically with reference to examples.
実施例 1 Example 1
ェチル 2—ヒ ドロキシイミノー 3—ォキソ一 4一クロロブチレ一ト ( 5 0. 0 g、 0 . 2 6モル) と塩化トリチル (7 9 . 0 g、 0 . 2 8モル)
をジクロロメチレン (340m l ) に溶かした後、 5 °Cに冷却した。 こ' の反応液にトリエチルァミン (39.、 4m l ) のジクロロメチレン (5 0m l ) 溶液を滴下した。 反応液を 25 °Cに戻した後、 3時間かくはん した。 水 (200m l ) を加え、 ジクロロメチレンで抽出後、 水洗した c 溶媒を留去し、 残留物をテトラヒドロフラン (THF) (330m l ) に溶かし、 チォ尿素 (39.3 g、 0.52モル)、酢酸ナトリウム (7 0. 3 g、 0.52モル) を水溶液 (330m l ) として加えた。 混合物 は 40°Cで 7時間かくはんした。 反応液は酢酸ェチルで抽出し水洗した c 溶媒を留去し、 残留物に酢酸ェチルを加え冷却した。 析出物を濾過し、 結晶化合物としてェチル (Z) -2- (2—ァミノチアゾールー 4ーィ ル)一 2—トリチルォキシィミノアセテートを得た (50.5 g、 収率: 34%) 。 2-ethylhydroxymino 3-oxo-41-chlorobutyrate (50.0 g, 0.26 mol) and trityl chloride (79.0 g, 0.28 mol) Was dissolved in dichloromethylene (340 ml) and cooled to 5 ° C. A solution of triethylamine (39., 4 ml) in dichloromethylene (50 ml) was added dropwise to the reaction solution. After returning the reaction solution to 25 ° C, the mixture was stirred for 3 hours. After adding water (200 ml) and extracting with dichloromethylene, the solvent c washed with water was distilled off, the residue was dissolved in tetrahydrofuran (THF) (330 ml), and thiourea (39.3 g, 0.52 mol), sodium acetate ( (0.3 g, 0.52 mol) was added as an aqueous solution (330 ml). The mixture was stirred at 40 ° C for 7 hours. The reaction mixture was extracted with ethyl acetate and washed with water. The solvent c was distilled off, and ethyl acetate was added to the residue, followed by cooling. The precipitate was filtered to obtain ethyl (Z) -2- (2-aminothiazole-4-yl) -12-trityloxyiminoacetate as a crystalline compound (50.5 g, yield: 34%). .
I R (KB r, d i s c. , cm"1) 3450、 3250、 3100、 2980、 1730、 1610、 1530、 1440、 1370、 1260、 1230、 1 170、 1030、 960、 765、 IR (KB r, dis c., Cm " 1 ) 3450, 3250, 3100, 2980, 1730, 1610, 1530, 1440, 1370, 1260, 1230, 1170, 1030, 960, 765,
750、 695 750, 695
NMR (CDC 13, 5) 1.28 ( t, J = 7H z, 3H) . 4.37 (q, J = 7 H z , 2 H) . 6. 43 ( s, 1 H) 、 7. 1 0- 7. 53 (m, 15H z) NMR (CDC 13, 5) 1.28 (t, J = 7Hz, 3H) .4.37 (q, J = 7Hz, 2H) .6.43 (s, 1H), 7.10-7. 53 (m, 15H z)
実施例 2 Example 2
ェチル (Z) — 2— (2—ァミノチアゾ一ルー 4一ィル) 一 2—トリ ' チルォキシィミノアセテート (41.、l g、 0.09モル) をジォキサン (296ml) に溶かし、 2 N水酸化ナトリウム (90ml) を加え、 1時間加熱還流した。 反応液を濃縮し、 残留物に水を加え溶液とした後、 酢酸ェチルで洗浄した。 水層は 2N塩酸で pH4.0に調整し、 析出を 濾過した。 ジェチルエーテルで洗浄し、 乾燥後、 結晶状化合物として (Z) — 2— (2—ァミノチアゾール一4一ィル) 一 2—トリチルォキ シィミノ酢酸を得た (31.0 g、 収率: 80%) 。 Ethyl (Z) — 2— (2-Aminothiazoyl 4-41-yl) Dissolve 2-1-2-tri'-tiloxyiminoacetate (41., lg, 0.09 mol) in dioxane (296 ml) and give 2 N hydroxylation Sodium (90 ml) was added, and the mixture was heated under reflux for 1 hour. The reaction solution was concentrated, water was added to the residue to form a solution, and the solution was washed with ethyl acetate. The aqueous layer was adjusted to pH 4.0 with 2N hydrochloric acid, and the precipitate was filtered. After washing with getyl ether and drying, (Z) —2- (2-aminothiazole-4-yl) -12-trityloxysiminoacetic acid was obtained as a crystalline compound (31.0 g, yield: 80%) ).
I R (KB r, d i s c. , cm-1) 3440、 3250、 3060、 IR (KB r, dis c., Cm- 1 ) 3440, 3250, 3060,
1710、 1610、 1530、 1490、 1440、 1370、 1270、 1180、 965、 840、 745、 695 1710, 1610, 1530, 1490, 1440, 1370, 1270, 1180, 965, 840, 745, 695
NMR (DMSO-de, <5) 6.70 (s, 1H) 、 7.00〜 7.51NMR (DMSO-de, <5) 6.70 (s, 1H), 7.00-7.51
(m, 15H) (m, 15H)
実施例 3 Example 3
ェチル (Z) -2- (2—ァミノチアゾールー 4一ィル) 一2—トリ チルォキシィミノ酢酸 (5.15 g、 12.0ミ リモル) のァセトニトリ ル溶液に N—メチルピロリ ドン (1.0m 1、 10.4ミ リモル) 、 N— メチルモルホリン (1.15ml、 10.4ミ リモル) そして 2 , 2—ジ ベンゾヺァゾリルジスルフィ ド (3.98 g、 12.0ミ リモル) を室温 で加えた。 この混合物を 0°Cに冷却し、 トリェチルホスファイ ト (2.
26m l . 13.2ミ リモル) を加え、 16時間かくはんした。 不溶物 ' を濾別し、 ァセトニトリルで洗浄後乾燥し、 (Z) -2- (2—ァミノ チアゾールー 4一ィル) _2—トリチルォキシィミノ酢酸 2—べンゾチ ァゾリルチオエステル (4.34 g、 収率: 63%) を得た。 N-methylpyrrolidone (1.0 ml, 10.4 mmol) in acetonitrile solution of ethyl (Z) -2- (2-aminothiazole-4-yl) 12-trityloxyiminoacetic acid (5.15 g, 12.0 mmol) ), N-methylmorpholine (1.15 ml, 10.4 mimol) and 2,2-dibenzodiazolyl disulfide (3.98 g, 12.0 mimol) were added at room temperature. The mixture was cooled to 0 ° C and triethyl phosphite (2. 13.2 mmol) and stirred for 16 hours. The insoluble matter was filtered off, washed with acetonitrile and dried. (Z) -2- (2-aminothiazole-4-yl) _2-trityloxyiminoacetic acid 2-benzothiazolylthioester (4.34 g , Yield: 63%).
融点: 159〜161°C Melting point: 159-161 ° C
I R (KB r, d i s c. , cm-リ 3450、 3060、 1710、 1610、 1540、 1440、 1370、 1310、 1205、 1 050、 980、 915、 900、 860、 760、 700 I R (KB r, d i s c., Cm-ri 3450, 3060, 1710, 1610, 1540, 1440, 1370, 1310, 1205, 1050, 980, 915, 900, 860, 760, 700
NMR (DMS O— d6, δ) 6. 86 (s, 1 H) 7. 67 (s, 15 H) 、 7. 60〜 7. 75 (m, 2H) . 8. 10〜 8. 38 (m, 2H) NMR (DMS O— d 6 , δ) 6.86 (s, 1 H) 7.67 (s, 15 H), 7.60 to 7.75 (m, 2H). 8.10 to 8.38 ( m, 2H)
元素分析値: C31H22N402S3として Elementary analysis: as C 31 H 22 N 4 0 2 S 3
計算値 C : 64.36、 H : 3.81、 N : 9.69、 S : 16.61 実測値 C : 64.11、 H : 3.77、 N : 9.57、 S : 16.41 実施例 4 Calculated values C: 64.36, H: 3.81, N: 9.69, S: 16.61 Observed values C: 64.11, H: 3.77, N: 9.57, S: 16.41 Example 4
(Z) -2- (2—ァミノチアゾール—4一ィル) 一 2—トリチルォ キシィミノ酢酸 (1. 07 g、 2. 5ミ リモル) のァセトニトリル溶液 (10m l ) に N—メチルピロリ ドン ( 0.2 m 1、 2.1ミ リモル) 、 N, N—ジィソプロピルェチルァミン (0.38m l、 2.1 ミ リモル) そして 2, 2—ジベンゾチアゾリルジスルフィ ド (0.83 g、 2.5ミ
リモル) を室 ί¾で加えた。 反応液は o°cに冷却し、 トリェチルホスファ ' イ ト (0.47ml、 2.7ミ リモル)、を加えた後、 16時間かくはんし た。 不溶物を濾別し、 ァセトニトリルで洗浄後乾燥し、 (Z) — 2— (2—アミノチアゾールー 4一ィル) 一 2—トリチルォキシィミノ酢酸 2—ベンズチアゾリルチオエステル (0.87 g、 収率: 60%) を得 た。 (Z) -2- (2-Aminothiazole-4-yl) A solution of 1-2-trityloxixiaminoacetic acid (1.07 g, 2.5 mmol) in acetonitrile (10 ml) was added to N-methylpyrrolidone (0.2 ml). m 1, 2.1 mimol), N, N-diisopropylethylamine (0.38 ml, 2.1 mimol) and 2,2-dibenzothiazolyl disulfide (0.83 g, 2.5 mi) Was added in room ί¾. The reaction solution was cooled to o ° C, and triethyl phosphite (0.47 ml, 2.7 mmol) was added, followed by stirring for 16 hours. The insolubles were filtered off, washed with acetonitrile and dried, and (Z) -2- (2-aminothiazol-4-yl) -12-trityloxyiminoacetic acid 2-benzthiazolylthioester (0.87 g) , Yield: 60%).
参考例 1一Reference Example 11
7—ァミノ一 3— [ (Z) -2- (1, 2, 3—チアジアゾールー 4— ィル) ェチニル] 一 3—セフエム一 4—カルボン酸ジフエニルメチル (0.48 g、 1ミ リモル) を THF (30ml) に溶解し、 (Z) — 2- (2—ァミノチアゾール一4—ィル) 一 2—トリチルォキシィミノ 酢酸 2—べンゾチアゾリルチオエステル (0.57 g、 1ミ リモル) を 加え、 25 °Cで 8時間かくはんした。 反応液を濃縮した後、 残留物を力 ラムクロマトグラフィ一で精製し、 粉末状化合物としてジフエ二ルメチ ル 7— [ (Z) -2- (2—アミノチアゾールー 4—ィル) 一 2—トリ チルォキシィミノァセトアミ ド] 一 3— [ (Z) -2- (1, 2, 3—チ
アジアゾ一ルー 4一ィル) ェチニル] 一 3—セフエム一 4一カルボキシ レート (0.179 g、 収率: 89% を得た。 7-Amino-3-([Z) -2- (1,2,3-thiadiazol-4-yl) ethynyl] 13-cefm-14-diphenylmethyl carboxylate (0.48 g, 1 mmol) was converted into THF ( (Z) — 2- (2-aminothiazole-14-yl) -12-trityloxyiminoacetic acid 2-benzothiazolylthioester (0.57 g, 1 mmol) And stirred at 25 ° C for 8 hours. After concentrating the reaction mixture, the residue was purified by column chromatography to obtain diphenylmethyl 7-[(Z) -2- (2-aminothiazol-4-yl) -12-triethyl as a powdery compound. Chilloxyminoacetamide] 1 3— [(Z) -2- (1, 2, 3—H (Asian 4-ethyl) ethynyl] -3- (4-phen-carboxylate) (0.179 g, yield: 89%).
I R CKB r, d i s c. , cm"1) 3430、 3050、 1780、 1715、 1675、 1610、 1520、 1490、 143.5、 1365、 1295、 1215、 1170、 1080、 1030、 995、 955、 900、 885、 750、 690、 630IR CKB r, dis c., Cm " 1 ) 3430, 3050, 1780, 1715, 1675, 1610, 1520, 1490, 143.5, 1365, 1295, 1215, 1170, 1080, 1030, 995, 955, 900, 885, 750, 690, 630
NMR (CDC 13, δ) 3.45 (m, 2H) 、 5.41 (d, J = 5 Hz, lH) 、 6.10 (d d, J =5H z, J = 9Hz, 1 H) . 6.66 (s, 1 H) . 6.74 (d, J = 12H z, 1 H) . 6.84 (s, lH) 、 6.94 (d, J =l 2Hz, 1H) 、 7.10〜 8.00 (m, 25H) 、 9.01 (s, 1 H) NMR (CDC 13, δ) 3.45 (m, 2H), 5.41 (d, J = 5 Hz, lH), 6.10 (dd, J = 5 Hz, J = 9 Hz, 1 H) .6.66 (s, 1 H) 6.74 (d, J = 12Hz, 1H) .6.84 (s, lH), 6.94 (d, J = l 2Hz, 1H), 7.10 to 8.00 (m, 25H), 9.01 (s, 1H)
参考例 1一 2 Reference Example 11-2
参考例 1— 1の生成物 (1.77 g、 2ミ リモル) を 88%ぎ酸 (5 ml) に加え、 25 °Cで 2.5時間かくはんした。 反応液を減圧下、 濃 縮し、 残留物をイソプロピルエーテルに加えた。 析出物を濾過し、 イソ プロピルエーテルで洗浄した。 この反応物にァニソール (3ml) を加
え、 5°Cに冷却した後、 トルフルォロ酢酸 (10m l ) を加え、 1時間 かくはんした。 この反応液をイソプ Οピルエーテルに加えた。 析出物を 濾過し、 イソプロピルエーテルで洗浄後乾燥し、 粉末状化合物として 7 — [ (Z) — 2— (2—アミノチアゾールー 4—ィル) 一 2—ヒドロキ シイミノアセトアミ ド] —3— [ (Z) - 2- (1, 2, 3—チアジアゾ ール一 4一ィル) ーェチニル] _3—セフエムー 4—カルボキシレート のトリフルォロ酢酸塩 (0.95 g、 収率: 80%) を得た。 The product of Reference Example 1-1 (1.77 g, 2 mmol) was added to 88% formic acid (5 ml), and the mixture was stirred at 25 ° C for 2.5 hours. The reaction solution was concentrated under reduced pressure, and the residue was added to isopropyl ether. The precipitate was filtered and washed with isopropyl ether. Add anisol (3 ml) to the reaction. After cooling to 5 ° C., trifluoroacetic acid (10 ml) was added, and the mixture was stirred for 1 hour. This reaction solution was added to isopropyl ether. The precipitate is filtered, washed with isopropyl ether and dried, and as a powdery compound, 7-[(Z) -2- (2-aminothiazol-4-yl) -12-hydroxyiminoacetamide] -3 — [(Z)-2- (1,2,3-thiadiazol-1 4-yl) -ethynyl] _3-seffemu-4-carboxylate trifluoroacetate (0.95 g, 80% yield) was obtained. .
I R (KB r, d i s c. , cm"1) 3300、 3100、 1780、 IR (KB r, dis c., Cm " 1 ) 3300, 3100, 1780,
1680、 1600、 1600、 1540、 1410、 1360、 1240、 1200、 1140、 1010、 800、 720 1680, 1600, 1600, 1540, 1410, 1360, 1240, 1200, 1140, 1010, 800, 720
NMR (DMSO-de, δ 3.50 (m, 2H)、 5.20 (d, J =4. 5H z, l H) 、 5. 76 (d d, J = 4. 5H z, J = 9 H z, l H) 、 6. 66 (d, J = 12H z, 1 H) 、 6. 83 (s , l H) 、 6. 92 (d, J = 12 H z, 1 H) 、 7. 33 (b s, 2H) 、 9.00 (s, lH) 、 9.50 (d, J = 9Hz; 1H) NMR (DMSO-de, δ 3.50 (m, 2H), 5.20 (d, J = 4.5 Hz, lH), 5.76 (dd, J = 4.5 Hz, J = 9 Hz, lH ), 6.66 (d, J = 12Hz, 1H), 6.83 (s, lH), 6.92 (d, J = 12Hz, 1H), 7.33 (bs, 2H) ), 9.00 (s, lH), 9.50 (d, J = 9Hz ; 1H)
参考例 2— 1 Reference Example 2-1
ビバロイルォキシメチル 7—アミノー 3— [ (Z) -2 - (1, 2, 3' ーチアジアゾール一 4一ィル) ェチニル] 一 3—セフエム一 4一カルボ キシレートのシユウ酸塩 (0. 103 g、 0.2ミ リモル) を THF (8 m l ) に溶解し、 (Z) -2- (2—ァミノチアゾールー 4—ィル) ― 2— トリチルォキシィ ミ ノ酢酸 2—べンゾチアゾリルチオエステル (0. 1 13 g> 0.2ミ リモル) を加え、 25°Cで 1.6時間かくはんし た。 反応液を濃縮した後、 残留物をカラムクロマトグラフィーで精製し、 粉末状化合物 (0. 129 g、 収率: 71%) としてピバロィルォキシ メチル 7— [ (Z) —2— (2—ァミノチアゾール一4一ィル) 一 2— 卜リチルォキシィミノァセトアミ ド] 一 3— [ (Z) — 2— (1, 2, 3 ーチアジアゾールー 4一ィル) ーェチニル] —3—セフエムー 4一カル ボキシレートを得た。 Bivaloyloxymethyl 7-amino-3-[(Z) -2-(1,2,3'thiadiazol-41-yl) ethynyl] -13-cefm-14-carboxylate oxalate (0. 103 g, 0.2 mmol) in THF (8 ml) was dissolved in (Z) -2- (2-aminothiazol-4-yl)-2-trityloxyminoacetate 2-benzothiazolyl The thioester (0.113 g> 0.2 millimol) was added and stirred at 25 ° C for 1.6 hours. After concentrating the reaction mixture, the residue was purified by column chromatography to give pivaloyloxymethyl 7-[(Z) -2- (2-aminothiazole) as a powdery compound (0.129 g, yield: 71%). 1-41) 1 2—Trityloxyximinoacetamide] 1 3 — [(Z) —2— (1,2,3-thiadiazol-4-1-yl) -ethynyl] —3—sefumu 4 One carboxylate was obtained.
I R (KB r, d i s c. , cm-1) 3300、 3100、 1 770、 IR (KB r, dis c., Cm- 1 ) 3300, 3100, 1 770,
1670、 1600、 1540、 1410、 1360、 1240、 1220、 1 155、 1010、 1000、 800、 7 10 1670, 1600, 1540, 1410, 1360, 1240, 1220, 1 155, 1010, 1000, 800, 7 10
NMR (C D C 1 3 , δ) 1. 20 ( s , 9 H) 、 3. 1 9、 3. 6 1 (A B q, J = 1 8 H z , 2H) 、 5. 2 1 (d, J = 5H z, 1 H) 、 5. 8 2、 5. 9 4 (A B q, J = 5 H z , 2 H) 、 5. 96 (d d, J = 5H z, J = 9H z, 1 H) 、 6. 79 (d, J = 12H z, 1 H) 、 6.82 (s, 1 H) 、 7.01 (d, J = NMR (CDC 13, δ) 1.20 (s, 9H), 3.19, 3.61 (AB q, J = 18Hz, 2H), 5.21 (d, J = 5Hz, 1H), 5.82, 5.94 (AB q, J = 5Hz, 2H), 5.96 (dd, J = 5Hz, J = 9Hz, 1H), 6.79 (d, J = 12 Hz, 1 H), 6.82 (s, 1 H), 7.01 (d, J =
1 2 H z, l H) 、 7. 20〜7. 50 (m, 1 5H) 、 8. 3 7 (s, 1 H) 1 2 H z, l H), 7.20 to 7.50 (m, 15 H), 8.37 (s, 1 H)
参考例 2—1の生成物 (0.20 g、 0.23ミ リモル) を 25°Cで 8 8%ぎ酸に溶かし、 2時間かぐはんした。 反応液にベンゼンを加え、 減 圧で濃縮した。 残留物にベンゼンを加え、 しばらくかくはんした後、 デ カンテーシヨンでベンゼン層を除いた。 残留物は五酸化リン上で減圧下 乾燥した。 このものを含水酢酸ェチルにけんだくさせ、 炭酸水素ナトリ ゥムを加え pH 6.5に調整した。 酢酸ェチル層を分液し水洗後、 硫酸 マグネシウムで乾燥した。 溶媒を留去し、 黄色の粉末状化合物としてピ バロィルォキシメチル 7— [ (Z) — 2— (2—アミノチアゾールー 4 —ィル) 一 2—ヒドロキシイミノアセトアミ ド] —3— [ (Z) — 2— (1, 2, 3—チアジアゾール一 4一ィル) ェチニル] —3—セフエムー 4—カルボキシレート (0.10 g、 収率: 73%) を得た。 The product of Reference Example 2-1 (0.20 g, 0.23 mimol) was dissolved in 88% formic acid at 25 ° C and stirred for 2 hours. Benzene was added to the reaction solution, and the mixture was concentrated under reduced pressure. Benzene was added to the residue, stirred for a while, and the benzene layer was removed by decantation. The residue was dried over phosphorus pentoxide under reduced pressure. This was dissolved in aqueous ethyl acetate, and sodium hydrogen carbonate was added to adjust the pH to 6.5. The ethyl acetate layer was separated, washed with water, and dried over magnesium sulfate. The solvent was distilled off, and pivaloyloxymethyl 7-[(Z) —2- (2-aminothiazol-4-yl) -1-2-hydroxyiminoacetamide] —3— was obtained as a yellow powdery compound. [(Z) —2- (1,2,3-thiadiazol-41-yl) ethynyl] —3-cephemu-4-carboxylate (0.10 g, yield: 73%) was obtained.
I R (KB r, d i s c. , cm- 3330、 2980、 1870、 1750、 1710、 1660、 1520、 1360、 1220、 1120、 980、 800 I R (KB r, d i s c., Cm-3330, 2980, 1870, 1750, 1710, 1660, 1520, 1360, 1220, 1120, 980, 800
NMR (CDC 13, 5) 1.18 (s, 9H) 、 3.42、 3.62 (A
B q, J = 18H z, 2H) 、 5.21 (d, J=5Hz, 1H) 、 5.45 (b s, 2H) 、 5.8ひ (d, J = 5 H z , 1H) 、 5. 91 (d, J = 5H z, 1H) 、 5.98 (d d, J = 5 H z, J = 9Hz, lH) 、 6.00 (d, J = 12H z, 1H) 、 6.84 (d, J =12Hz, lH) 、 7.14 (s, lH) 、 8.40 (s, 1H) 、 11.06 (b s, 1H) NMR (CDC 13, 5) 1.18 (s, 9H), 3.42, 3.62 (A B q, J = 18Hz, 2H), 5.21 (d, J = 5Hz, 1H), 5.45 (bs, 2H), 5.8 (d, J = 5Hz, 1H), 5.91 (d, J = 5Hz, 1H), 5.98 (dd, J = 5Hz, J = 9Hz, lH), 6.00 (d, J = 12Hz, 1H), 6.84 (d, J = 12Hz, lH), 7.14 (s , LH), 8.40 (s, 1H), 11.06 (bs, 1H)
参考例 3— 1 Reference Example 3-1
7—ァミノ一 3—ビニルー 3—セフエムー 4一力ルボン酸ジフエニル メチル (0.392 g、 1ミ リモル) を THF (15ml) に溶解し、 (Z) -2- (2—ァミノチアゾールー 4—ィル) 一 2— トリチルォキ シィミノ酢酸 2—べンゾチアゾリルチオエステル (0.567 g、 1ミ リモル) を加え、 25 °Cで 15時間かくはんした。 反応液を濃縮した後、 残留物をカラムクロマトグラフィ一で精製し、 粉末状化合物としてジフ ェニルメチル 7— [ (Z) 一 2— (2—ァミノチアゾール一 4 _ィル) — 2—トリチルォキシィミノァセトアミ ド] 一 3—ビニル一 3—セフエ ムー 4—カルボキシレート (0.706 g、 収率: 88%) を得た。
T R (KB r , d i s c. , cm"1) 3430、 3050、 1780、 1710、 1680、 1620、、 1510、 1470、 1430、 1355、 1295、 1210、 1160、 1085、 1020、7-Amino-3-vinyl-3-cefume-4 Dissolve diphenylmethyl rubinate (0.392 g, 1 mmol) in THF (15 ml) and add (Z) -2- (2-aminothiazole-4-) B) To the mixture was added 12-trityloximinoacetic acid 2-benzothiazolylthioester (0.567 g, 1 mmol), and the mixture was stirred at 25 ° C for 15 hours. After concentrating the reaction mixture, the residue was purified by column chromatography to obtain diphenylmethyl 7-[(Z) -12- (2-aminothiazole-14-yl) -2-trityloxy as a powdery compound. [Siminoacetamide] -13-vinyl-13-cefume-4-carboxylate (0.706 g, yield: 88%) was obtained. TR (KB r, dis c., Cm " 1 ) 3430, 3050, 1780, 1710, 1680, 1620, 1510, 1470, 1430, 1355, 1295, 1210, 1160, 1085, 1020,
995、 955、 9ひ 0、 885、 755、 690、 635 NMR (CD C 13, 6) 3.37. 3.57 (AB q, J = 18H z,995, 955, 9H 0, 885, 755, 690, 635 NMR (CD C 13, 6) 3.37.3.57 (AB q, J = 18Hz,
2H) 、 5.08 (d, J = 5Hz, 1H) 、 5.31 (d, J =2H), 5.08 (d, J = 5Hz, 1H), 5.31 (d, J =
10 H z , lH) 、 5.46 (d, J =l 7Hz, 1H) 、 5.97 (d d, J = 5 H z , J = 9Hz, lH) 、 6.71 (s, 1H) . 7. 15 ( s, 1H) . 7. 17 (d d, J = 10H z, 5 = 11 Hz, 1H) 、 7.20-7.60 (m, 25H) 10 Hz, lH), 5.46 (d, J = 1 7 Hz, 1H), 5.97 (dd, J = 5 Hz, J = 9 Hz, lH), 6.71 (s, 1H) .7.15 (s, 1H) 7.17 (dd, J = 10Hz, 5 = 11 Hz, 1H), 7.20-7.60 (m, 25H)
参考例 3— 2 Reference Example 3-2
参考例 3—1の生成物 (0.70 g、 0.87ミ リモル) を 25°Cで 8 8%ぎ酸 (5m l ) に溶かし、 2時間かくはんした。 反応液にベンゼン を加え、 減圧で濃縮した。 残留物にイソプロピルエーテルを加え、 しば らくかくはんした後、 濾過した。 この化合物をァニソール (2 m l ) に 溶かし、 5°Cに冷却した。 トリフルォロ酢酸 (85m l ) を加え、 1時
間かくはんした。 反応液は減圧下に濃縮し、 残留物をイソプロピルエー' テルに加えた。 析出物を濾過し、 イツプロピルエーテルで洗浄し乾燥し た。 このものを水に懸濁し、 炭酸水素ナトリウムで pH6.5に調整し、 不溶物を濾過した。 濾液は氷冷し、 2 N塩酸で pH 2.5に調整後、 析 5 出物を濾過し、 水洗した後乾燥し、 7— C (Z) -2- (2—アミノチ ァゾール一 4一ィル) 一 2—ヒドロキシィミノァセトアミ ド] 一 3—ビ 二ルー 3—セフエムー 4—カルボン酸 (0.14g、 収率: 34%) を 得た。 The product of Reference Example 3-1 (0.70 g, 0.87 mimol) was dissolved in 88% formic acid (5 ml) at 25 ° C and stirred for 2 hours. Benzene was added to the reaction solution, and the mixture was concentrated under reduced pressure. Isopropyl ether was added to the residue, stirred for a while, and then filtered. This compound was dissolved in anisol (2 ml) and cooled to 5 ° C. Add trifluoroacetic acid (85 ml) and add 1 hour It was stirring. The reaction solution was concentrated under reduced pressure, and the residue was added to isopropyl ether. The precipitate was filtered, washed with isopropyl ether and dried. This was suspended in water, adjusted to pH 6.5 with sodium hydrogen carbonate, and insolubles were filtered. The filtrate is ice-cooled, adjusted to pH 2.5 with 2N hydrochloric acid, and the precipitate is filtered, washed with water and dried, and dried with 7-C (Z) -2- (2-aminothiazole-141-yl). [1-2-Hydroxyiminoacetamide]] 1-3-vinyl 3-cefume-4-carboxylic acid (0.14 g, yield: 34%) was obtained.
I R KB r, d i s c. , cm"1) 3325、 3100、 1775、 o 1690、 1625、 1600、 1570、 1525、 1415、 IR KB r, dis c., Cm " 1 ) 3325, 3100, 1775, o 1690, 1625, 1600, 1570, 1525, 1415,
1400、 1360、 1305、 1245、 1180、 1140、 1015、 900、 810、 780、 750、 600、 560 MR (DMS O- d6. 5) 3.52、 3.84 (AB q, J = 18 Hz, 2H) 、 5.18 (d, J = 5Hz, lH) 、 5.30 (d, 。 J = 11 H z , lH) 、 5.58 (d, J = 18 H z , 1 H) Λ 1400, 1360, 1305, 1245, 1180, 1140, 1015, 900, 810, 780, 750, 600, 560 MR (DMS O- d 6. 5) 3.52, 3.84 (AB q, J = 18 Hz, 2H), 5.18 (d, J = 5 Hz, lH), 5.30 (d,. J = 11 Hz, lH), 5.58 (d, J = 18 Hz, 1H) Λ
5.79 (d d, J = 5Hz, J = 9Hz, 1 H) 、 6.68 (s, lH) 、 6.93 (dd, J =l 1Hz, J = 18H z, 1 H) 、 7.10 (s, 1H) 、 9.48 (d, J = 9Hz, 1 H) 5.79 (dd, J = 5Hz, J = 9Hz, 1H), 6.68 (s, lH), 6.93 (dd, J = 1Hz, J = 18Hz, 1H), 7.10 (s, 1H), 9.48 ( d, J = 9Hz, 1H)
産業上の利用可能性 ' Industrial applicability ''
本発明により提供される化合物は、 グラム陽性菌及びグラム陰性菌に 対して優れた抗菌活性を示す (Z) -2- (2—ァミノチアゾールー 4 一ィル) 一 2—ヒドロキシイミノアセトアミ ド基を有するセファロスポ リン誘導体を製造するための中間体として有用であり、 該化合物を用い ることにより、 反応を中性条件下で進行させることができ、 その結果、
高純度 つ高収率で目的のセファロスポリン誘導体を得ることができる。
The compound provided by the present invention exhibits excellent antibacterial activity against Gram-positive bacteria and Gram-negative bacteria. (Z) -2- (2-aminothiazol-4-yl) -12-hydroxyiminoacetamide Is useful as an intermediate for producing a cephalosporin derivative having a thiol group, and by using this compound, the reaction can be allowed to proceed under neutral conditions. The desired cephalosporin derivative can be obtained with high purity and high yield.
Claims
請 求 の 範 囲 The scope of the claims
. 式 Expression
で示される化合物。 A compound represented by the formula:
2 . ベンゾチアゾールー 2—ィルー 2 ( ( Z ) _ 2—ァミノチアゾー ルー 4—ィル) 一 2—トリチルォキシィミノチオアセテートである請求 の範囲第 1項記載の化合物。 2. The compound according to claim 1, which is benzothiazole-2-yl-2 ((Z) _2-aminothiazolu-4-yl) -1-2-trityloxyiminothioacetate.
3 . 式 3 expression
で示される化合物を式 A compound represented by the formula
X3P 又は Y3N X 3 P or Y 3 N
式中、 3つの Xはそれぞれ独立にァリール基又はアルコキシ基を表 わし、 3つの Yはそれぞれ独立にアルキル基を表わすか、 或いはそ のうちの 2つの Yはこれらが結合している N原子と一緒になつてさ らに N、 S、 0などのへテロ原子を含んでいてもよい含窒素複素環 式基を表わす、
で示されるリン化合物又は 3級アミン化合物の存在下に式
で示されるジチォベンゾチアゾールと反応せしめ、 そして必要に応じて. 得られる生成物からヒドロキシ保護基 (R u) を除去することを特徴と する請求の範囲第 1項記載の化合物の製造方法。 In the formula, three Xs each independently represent an aryl group or an alkoxy group, and three Ys each independently represent an alkyl group, or two of the Ys represent the N atom to which they are bonded. Together represent a nitrogen-containing heterocyclic group which may further contain a hetero atom such as N, S, 0, etc. In the presence of a phosphorus compound or a tertiary amine compound represented by the formula 2. The method for producing a compound according to claim 1, wherein the compound is reacted with dithiobenzothiazole represented by the formula, and if necessary, the hydroxy protecting group (Ru) is removed from the obtained product.
式中、 R はヒドロキシ保護基を表わし、 R 2はカルボキシ保護基 を表わす、 Wherein R represents a hydroxy protecting group, R 2 represents a carboxy protecting group,
で示される化合物をチォ尿素と反応させ、 生成する式 Reacting thiourea with a compound of formula
式中、 及び R 2は上記の意味を有する、 Wherein: and R 2 have the above meanings;
で示される化合物を加水分解することにより式 (V) の化合物を製造す る請求の範囲第 3項記載の方法。 4. The method according to claim 3, wherein the compound of the formula (V) is produced by hydrolyzing the compound of the formula (V).
5 . 式 5 Expression
COORj 式中、 R3は水素原子又はカルボキシ保護基を表わし、 R4は水素原 子又はセファロスポリン化合物に通常みられる 3位置換基を表わす、 で示される 7—ァミノセフエム化合物と反応させ、 そして得られる化合 物からヒドロキシ保護基 (Ru) を除去することを特徴とする式 Wherein R 3 represents a hydrogen atom or a carboxy protecting group, R 4 represents a hydrogen atom or a 3-position substituent commonly found in cephalosporin compounds, and is reacted with a 7-aminocephem compound represented by the formula: A formula characterized by removing a hydroxy protecting group (Ru) from the obtained compound.
で示されるセファロスポリン誘導体の製造方法。
A method for producing a cephalosporin derivative represented by the formula:
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JP2/298661 | 1990-11-02 | ||
JP29866190 | 1990-11-02 |
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WO1992007840A1 true WO1992007840A1 (en) | 1992-05-14 |
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PCT/JP1991/001482 WO1992007840A1 (en) | 1990-11-02 | 1991-10-30 | Thiazole thioester derivative |
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EP0555769A2 (en) * | 1992-02-14 | 1993-08-18 | Hoechst Aktiengesellschaft | Process for the preparation of Cephem-Prodrug-esters |
WO1996020198A1 (en) * | 1994-12-23 | 1996-07-04 | Biochemie Gesellschaft Mbh | Production of cefotaxime and new sodium salts |
WO2003040116A1 (en) * | 2001-11-09 | 2003-05-15 | Antibioticos S.P.A. | A process for the preparation of cephalosporins side chains |
JP2006511561A (en) * | 2002-12-20 | 2006-04-06 | アンティビオーティコス エッセ.ピ.ア. | Crystalline cefdinir salt |
JP2012246291A (en) * | 2011-05-30 | 2012-12-13 | Bcworld Pharm Co Ltd | New method for preparing imatinib base |
CN106749333A (en) * | 2016-12-29 | 2017-05-31 | 江苏豪森药业集团有限公司 | The preparation method of Cefdinir |
CN108546270A (en) * | 2017-05-31 | 2018-09-18 | 郑州大学第附属医院 | The method for preparing Cefdinir |
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US5637721A (en) * | 1992-02-14 | 1997-06-10 | Hoechst Aktiengesellschaft | Process for the preparation of cephem prodrug esters |
EP0555769A3 (en) * | 1992-02-14 | 1993-11-24 | Hoechst Ag | Process for the preparation of cephem-prodrug-esters |
EP0555769A2 (en) * | 1992-02-14 | 1993-08-18 | Hoechst Aktiengesellschaft | Process for the preparation of Cephem-Prodrug-esters |
US5589594A (en) * | 1992-02-14 | 1996-12-31 | Hoechst Aktiengesellschaft | Process for the preparation of cephem prodrug esters |
AU711228B2 (en) * | 1994-12-23 | 1999-10-07 | Biochemie Gesellschaft Mbh | Production of cefotaxime and new sodium salts |
US5831086A (en) * | 1994-12-23 | 1998-11-03 | Biochemie Gesellschaft M.B.H. | Production of cefotaxime and new sodium salts |
WO1996020198A1 (en) * | 1994-12-23 | 1996-07-04 | Biochemie Gesellschaft Mbh | Production of cefotaxime and new sodium salts |
WO2003040116A1 (en) * | 2001-11-09 | 2003-05-15 | Antibioticos S.P.A. | A process for the preparation of cephalosporins side chains |
CN1309713C (en) * | 2001-11-09 | 2007-04-11 | 安蒂比奥蒂科斯有限公司 | A process for the preparation of cephalosporins side chains |
JP2006511561A (en) * | 2002-12-20 | 2006-04-06 | アンティビオーティコス エッセ.ピ.ア. | Crystalline cefdinir salt |
JP2012246291A (en) * | 2011-05-30 | 2012-12-13 | Bcworld Pharm Co Ltd | New method for preparing imatinib base |
CN106749333A (en) * | 2016-12-29 | 2017-05-31 | 江苏豪森药业集团有限公司 | The preparation method of Cefdinir |
CN106749333B (en) * | 2016-12-29 | 2019-05-14 | 江苏豪森药业集团有限公司 | The preparation method of Cefdinir |
CN108546270A (en) * | 2017-05-31 | 2018-09-18 | 郑州大学第附属医院 | The method for preparing Cefdinir |
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