WO1992006487A1 - Dispositif de spectrometrie a decharge luminescente alimentee par radiofrequence et avec geometrie de support de l'echantillon situee a l'exterieur de l'appareil - Google Patents

Dispositif de spectrometrie a decharge luminescente alimentee par radiofrequence et avec geometrie de support de l'echantillon situee a l'exterieur de l'appareil Download PDF

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Publication number
WO1992006487A1
WO1992006487A1 PCT/US1991/007178 US9107178W WO9206487A1 WO 1992006487 A1 WO1992006487 A1 WO 1992006487A1 US 9107178 W US9107178 W US 9107178W WO 9206487 A1 WO9206487 A1 WO 9206487A1
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WO
WIPO (PCT)
Prior art keywords
sample
vacuum chamber
glow discharge
chamber
radio frequency
Prior art date
Application number
PCT/US1991/007178
Other languages
English (en)
Inventor
R. Kenneth Marcus
Original Assignee
Clemson University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clemson University filed Critical Clemson University
Priority to DE69128342T priority Critical patent/DE69128342T2/de
Priority to EP91919679A priority patent/EP0503058B1/fr
Publication of WO1992006487A1 publication Critical patent/WO1992006487A1/fr

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/67—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using electric arcs or discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised

Definitions

  • the present invention is directed generally to the direct analysis of solids and particularly to a radio frequency (RF) powered glow discharge sputtering source fo analysis of non-conducting solids as well as metals, alloys, semiconductors and the like.
  • RF radio frequency
  • the conducting sample being analyzed takes the form of a cathode.
  • the sampl cathode and an anode sleeve are housed in a vacuum chamber which usually also acts as an anode and is filled with an inert gas such as argon such that a sufficiently high potential placed across the electrodes causes the gas to disassociate into electrons and positively charged ions, which form part of what is sometimes called the "glow discharge.”
  • the region of the vacuum chamber in which muc of this dissociation occurs is sometimes called the "discharge excitation region" or the "negative glow region.”
  • the negative field potential attracts the positively charged ions which hit the cathode surface and dislodge atoms, ions and molecules of the cathode material This is the so-called “sputtering" phenomenon.
  • the sputtering process acts as a cascade of inelastic collisions with the incoming ion imparting some portion of its kinetic energy, which approaches that of the applied potential, into the cathode material's lattice structure. Provided the sputtering ion has sufficient energy and directionality, the cascade will propagate back to the surface and result in the ejection of cathode material. The ejected atoms of the cathode material diffuse into the glow discharge region and become part of the so-called glo discharge.
  • Sputter yields the ratio of the average numbe of sputtered atoms to incident ions, are a function of the relative masses of the collision partners, the incident angle and energy of the sputtering ion, and the cathode material's binding energy.
  • Glow discharges are currently employed for elemental analysis by atomic absorption, atomic emission, atomic mas spectrometry, and a number of laser-based spectroscopic methods. These glow discharge sources have been limited b the requirement that the sample be conductive in nature so that it may act as a cathode in a conventional d.c. diode design. Thus, for some nonconducting materials it became necessary to place the nonconducting analyte in a conducting solution. However, some nonconducting materia are not conveniently dissolved. In an effort to analyze nonconducting solids without dissolution, nonconducting powder samples have been mixed with a conducting powder matrix.
  • the resulting powder mixture is pressed into a disc sample, which, because of the conductive portion, allows for the required flow of current, but which also permits the sputtering of atoms of the nonconductive material upon impingement by a discharged ion.
  • the mixing of the original sample with the conducting material introduces certain problems. For example, the dilutive effect of th conducting material results in both a loss of sensitivity and an increase in the likelihood of contamination.
  • many nonconducting solids are not easily transformed into powders, and the transformation of the solid into a powder precludes any depth resolved analyses
  • Nonmachineable bulk solids must first be ground into a powder and then pressed to form a solid powder sample of compatible size and shape. Additionally, the combination of powdered nonconductive samples with a conducting material results in both a loss of sensitivity and an increase in the likelihood of contamination.
  • a Grimm-Type high frequency powered glow discharge device such as disclosed in French Publication No. 2 616 545 (December 16, 1988) , which mounts the sample outside the vacuum chamber, disposes the cathode between the sample and the anode, and thus runs the risk of contamination from sputtering of the cathode material.
  • an object of the present invention to provide a novel method for direct analysis of solids. It is a further object of the present invention to provide a novel apparatus employing glow discharges to atomize solid samples for direct analysis.
  • It is still another object of the present invention to provide such an apparatus which provides for the fast, successive analysis of a plurality of samples. Yet another object of the present invention is to provide an apparatus and method for atomizing solid samples for analysis regardless of the electrical conductivity of the sample and without the need for such modifications of the sample as machining, dissolving, pulverizing, pressin or molding.
  • a further object of the present invention is to provide an apparatus and method for atomizing solid sampl for analysis without having to insert the sample into the chamber where the glow discharge plasma is formed.
  • an apparatus and method for analyzing sample materials in the solid state includes an enclosure that defines a vacuum chamber with a vacuum port connectable t means for evacuating the vacuum chamber.
  • the enclosure defines at least one gas inlet port connectable to means for supplying gas into the vacuum chamber.
  • the gas to be supplied to the vacuum chamber is an inert gas such as argon.
  • the enclosure includes an electrode which is provided with a surface that is exposed to the interior o the vacuum chamber.
  • the enclosure defines an output port that is connectable to means for analyzing the contents o the vacuum chamber.
  • th vacuum chamber enclosure defines an external mount for receiving a solid sample external to the vacuum chamber.
  • the enclosure defines a sample port that communicates between the interior of the vacuum chamber and the exteri of the vacuum chamber.
  • the external mount includes a mounting surface that defines a portion of the exterior surface of the enclosure. The mounting surface is dispose to adjoin a portion of the enclosure which defines the sample port.
  • the external mount further includes an external mounting plate that defines a sample hole therethrough and communicates with the sample port defined by the enclosure.
  • the mounting plate can be formed as a unitary structure with the enclosure.
  • a sample mold is provided to hold compacted powderous sample material.
  • the mold is provided with features which permit cooling of the sample material.
  • the securing means can include a flexible sealing gasket, torque bolt, and an insulating spacer.
  • the torque bolt is disposed outside the vacuum chamber so as to be able to bias and secure the sample against the sample sealing gasket.
  • the gasket is configured so as to be disposable against and between the surface of the sample that is to b received by the external mount and exposed to the interior of the vacuum chamber and the surface of the sample mounting plate that faces away from the interior of the vacuum chamber.
  • the insulating spacer is disposed between the sample and the end of the torque bolt and electrically insulates the sample from the bolt as well as protecting the sample from being crushed or damaged by the direct contact of the bolt.
  • the sample sealing gasket is configured so that it maintains both a vacuum tight sea and a separation distance of less than one dark space between the surface of the sample and the surface of the mounting plate.
  • means are provided for applying a radio frequency electromagnetic potential between the electrode defined by the vacuum chamber and the sample to be received by the external mount.
  • the RF application means can include a radio frequency generator, a matching network, a radio frequency coaxial cable, a male coaxial connector, a female coaxial connector, an elongated conductor (which can be surrounded by an electrically insulating sheath) , and a ground lead connected to the electrode defined by the enclosure.
  • the electrode defined by the enclosure is electrically connected to the mounting plate.
  • An elongated cavity is defined longitudinally through the torque bolt and the spacer and is configured to receive the conductor and the insulating sheath.
  • One of the coaxial connectors is connected between one end of the coaxial cable and the conductor, while the other of the coaxial connectors is connected to the opposite end of the torque bolt than the end that is disposed to press against the insulating spacer.
  • the connectors When the connectors are connected to one another the free end of the conductor engages the surface of the sample opposite the surface which is exposed to the interior of the vacuum chamber.
  • the radio frequency generator is connected to the opposite end of the coaxial cable via the matching network, which is connected to the radio frequency generator in series.
  • the surface of the electrode defined by the enclosur and exposed to the interior of the vacuum chamber where t glow discharge occurs, must be much larger than the surfa of the sample that is exposed to the interior of the vacu chamber via the sample hole.
  • a ratio of 50 to 1 for the area of the grounded enclosure electrode to the area of t sample circumscribed by the sample hole may be large enough. However, a 500 to 1 ratio is satisfactory.
  • the inert gas is introduced into the chamber and maintained at a low pressure.
  • the walls of t chamber are connected to ground, and the sample is secure to the external mount so that the sample surface exposed the interior of the chamber is located less than one dark space from the surface of the mounting plate of the external mount, which is the portion of the enclosure electrode located closest to the sample.
  • the conductor i positioned so as to touch the rear of the sample, i.e., t surface of the sample opposite the surface disposed so th it becomes located less than one dark space separation distance from the surface of the mounting plate of the external mount.
  • the RF generator is activated to provide anywhere from 1 to 100 watts of power.
  • the glow discharge is maintained in the chamber such that the inert gas becomes ionized, and the ionized gas sputters the sample surface exposed to the interior of the vacuum chamber.
  • the sputtered sample material becomes available for analysis.
  • the sputtered particles can be collected and analyzed (with a mass spectrometer for example) .
  • the electromagnetic radiation emanating from the glow discharge can be collected and analyzed (for atomic emission or atomic absorption for example) .
  • More than one output port can be provided for the enclosure.
  • One of the output ports can include a fused silica window.
  • the window can be oriented directly in a line of sight to the surface of the sample exposed to the interior of the vacuum chamber or at a right angle to this head-on line of sight.
  • the signal-to-noise ratio can be maximized by directing the input of the analyzing instrument at a position within this range of positions for the window.
  • the RF power supplied to the sample can be modulated on and off, and the analyzing instrumentation can be synchronized to operate according to the modulation of the RF power supply.
  • the pressure of the inert gas in the vacuum chamber can be maintained by adjusting the evacuating means and the flow of gas into the chamber via the gas inlet. Desirably, the pressure within the chamber should be maintained at a sufficiently low pressure so as to reduce the redeposition of the sputtered sample material onto the surface of the sample.
  • the present invention permits the analysis of nonconducting materials without matrix modification.
  • the present invention solves the problem of placing a nonconducting analyte in solution by omitting this step and analyzing the solid material directly. Additionally, by allowing for the direct analysis of samples of the nonconducting material, the present invention solves the problem of machining the nonconducting solid into a cylinder for a hollow cathode electrode configuration. This capability, especially in combination with the external mount geometry described herein, provides a much simpler, cheaper and easier to operate system than any prior known means for analysis of electrically insulating materials.
  • Figure 1 is a graphical representation of the effect of the application of a high voltage pulse to an insulatin surface
  • Figure 2 is a graphical representation of the effect of the application of a 2 kV peak-to-peak square wave potential to a pair of electrodes;
  • FIG. 3 is a schematic diagram of a sample holder in accordance with the present invention.
  • Figure 4 is an exploded schematic diagram of a direct insertion probe in accordance with the present invention i axial alignment with a translator and a six-way cross;
  • Figure 5 is a diagram of the present invention as assembled for mass spectrometry analysis;
  • Figure 6 is a diagram of the present invention as assembled for atomic emission analysis
  • Figure 7 is a radio frequency glow discharge mass spectrometry spectrum of a copper sample generated in accordance with the present invention.
  • Figure 8 is a graphical representation of the effect of changes in power and pressure on a copper matrix ion signal generated by the method of the present invention
  • Figure 9 is a graphical representation of the effect of changes in power and pressure on the copper (I) emissio signal generated by the method of the present invention
  • Figures 10a, 10b and 10c are diagrams illustrating th effect of discharge pressure on dark space thickness
  • Figure 11 is a radio frequency glow discharge mass spectrometry spectrum of a copper-beryllium alloy generate in accordance with the present invention
  • Figure 12 is a plot of a single ion monitoring trace of a 5 Fe (93 ppm) ion signal as achieved by the present invention
  • Figure 13 is a radio frequency glow discharge mass spectrometry spectrum of a pressed disc formed from a mixture of transition metal oxides generated in accordance with the present invention
  • Figure 14 is a radio frequency glow discharge mass spectrometry spectrum of a vitrified simulated defense waste glass generated in accordance with the present invention
  • Figure 15 is a radio frequency glow discharge atomic emission spectrum of a copper-beryllium alloy generated in accordance with the present invention
  • Figure 16 is a schematic representation of an embodiment of a radio frequency powered glow discharge atomization/excitation source using an external sample mount geometry in accordance with the present invention
  • Figure 17 is a schematic representation in accordance with the present invention of an embodiment of instrumentation for radio frequency powered glow discharge atomic emission spectrometry using an external sample moun geometry source of the type shown in Figure 16;
  • Fig. 18(a) schematically illustrates an embodiment of an elevated perspective view of a component of an embodiment of the apparatus of the present invention
  • Fig. 18(b) is a schematic illustration of a side view of embodiments of components of an embodiment of the apparatus of the present invention.
  • V a 2 kilovolt (kV) peak-to-peak square wave potential
  • the electrode is bombarded alternately by high energy ions and low energy electrons and is, therefore, employed as the sputtering target (cathode) . While the potential supplied to the electrodes are alternating, a time averaged cathode and anode are established. As will be discussed in greater detail below, self-biasing is also a function of the respective electrode sizes. Thus, it is preferable to apply the RF potential to the sputtering target and to make its exposed area much smaller than the vacuum chamber anode, which is usually held at ground potential.
  • FIG. 3 diagrammatically illustrates a preferred sample holder which is generally designated by the numeral 10.
  • the body 12 of the holder 10 is a stainless steel cylinder capped at one end by a plate 14 which has electrical and cooling water connections, shown schematically.
  • the opposite end of the body is enclosed by a cathode mounting plate 16 which has a recession 18 preferably 0.5 inches in diameter and 0.125 inches deep into which the sample 20 is press fit.
  • the holder body is encased in a glass ceramic sleeve 22 which acts to reduce the amount of sputtering of the holder body.
  • An electrically grounded stainless steel "anode” sleeve 24 is mounted thereabout.
  • the minimum distance required for the formation of a plasma is referred to as a dark space.
  • the stainles steel sleeve 24 is preferably less than one dark space fro the holder body 12 to prohibit the formation of a plasma i the enclosed regions.
  • the entire sample holder/sleeve assembly is mounted on a flange which mates with a six-way cross ion source region described below.
  • the inner walls of the vacuum chamber act as an anode.
  • Figure 4 schematically illustrates an embodiment of a direct insertion probe (DIP) for use with the present invention.
  • the probe 210 mates with a six-way cross 250 through a translator stage 240.
  • the translator stage including bellows 242 in conjunction with ball valve 219 serves as a vacuum interlock allowing for insertion an withdrawal of the probe without adjustment of the argon pressure within the six-way cross vacuum chamber, thereby permitting faster analysis of a series of samples.
  • a sample holder body 212 is mounted onto the probe 214.
  • a small sample pin 220 is mounted to the sample holder at its tip 216 within a recess 218.
  • a grounded anode cap 224 is drawn over the sample holder and secured thereon. As in the above discussed configurations, the anode cap is within one dark space from the cathode to preclude discharge therein.
  • a series of sample holders may be provided such that numerous samples can be prepared for a fast, easy analysis of a batch of materials.
  • the glow discharge plasma was powered by a Model RF-10 radio frequency generator, available from RF Plasma Product. This unit has a maximum power output of 1 kilowatt (kW) at a frequency of 13.56 MHz.
  • an impedance matching network is incorporated in series with the generator.
  • the matching network is an LC circuit which is tuned such that the total impedance of the network and the plasma equal the output impedance of the generator.
  • Figure 5 is a diagrammatic representation of an embodiment of the apparatus of the present invention as assembled for mass spectrometry analysis.
  • the glow discharge ion source 10 is mounted coaxial with the mass spectrometer axis.
  • FIG. 6 diagrammatically represents a embodiment of the apparatus of the present invention as assembled for atomic emission analysis.
  • the glow discharg ion source 10 is mounted at a 90° angle to the atomic emission axis.
  • Monochromator 120 isolates a narrow region of wavelengths for detection by photometer 130.
  • FIG. 7 is the radi frequency-glow discharge mass spectrometry (rf-GDMS) spectrum of the copper sample under discharge conditions o 0.2 torr argon pressure and 10 watts power.
  • the spectra are atomic in nature with the spectrum dominated by ions o the matrix species and various discharge gas species. Scale expansion of the spectrum reveals the existence of species related to residual gases due to non-ideal vacuum conditions: H 2 0 + at mass 18, N 2 + at 28, and C0 2 + at mass 44.
  • Figures 10a, 10b and 10c schematically illustrate th effect of discharge pressure on the dark space 49 thickne and the relationship between the interfacial region 50 an the sampling cone 52.
  • discharge pressures decrease, electron mean free paths increase such that the cathode fall (potential drop) occurs over longer distances away from the cathode surface 54, and thereby extending the interfacial region 50 toward the exit orifice 56.
  • discharge power voltage
  • Visual observatio of the plasma shows a correlation between the position of the interface 50 between the negative glow 51 and the dark space 49 and the matrix ion signal detected.
  • the discharg conditions in which maximum signal is observed are those shown in Figure 10b where the sampling cone orifice 56 is at the interfacial region 50, the area of greatest ion density. This spatial relationship is caused by the loss of sufficient energy by secondary electrons emitted from the cathode surface 54 to be effective in direct electron impact ionization collisions with sputtered atoms.
  • sampling for mass spectrometric analysis is highly region-specific requiring adjustments of both pressure and power in order to position the negative glow/dark space interface at the sampling cone.
  • the entire plasm is analyzed, resulting in a more straightforward relationship between power and pressure and the relative signal for each species, as is illustrated with respect to copper (I) in Figure 9.
  • the signal becomes stronger with increased power and increased pressure.
  • Figure 11 is a mass spectrum of the NBS SRM C1122 copper-beryllium alloy under discharge conditions of 0.15 torr argon pressure and
  • Figure 12 is a single ion monitoring trace of th 54 Fe (93 ppm) ion signal. After an initial 20 minute plasma induction period, the measured ion signal varies by only about 3 percent over the following 40 minute time period. Temporal stability is important for a method such as quadrupole mass spectrometry, which is a sequential analysis technique.
  • Example 2 To investigate the sputtering of nonconductors, a mixture of transition metal oxides was prepared from Spex (Edison, New Jersey) Hi-Pure powders pressed into the for of a disc.
  • the measured ion current for the metal ions are on the same order of magnitude as the metal alloy of Example 1, thus indicating that the oxygen in the sample simply represents an additional element in the matrix which will be sputter atomized like the metal atoms.
  • the spectrum also indicates, through the presence of water and related residual gases, that care should be taken to properly dry and degas the oxide powder samples prior to analysis.
  • the ability to produce atomic ions from a sample of this type is indicative of the applicability of the RF-GDMS source to the analysis of ceramic and cement powders.
  • Example 3 To investigate the ability of the glow discharge to sputter glass matrix samples, mass spectra were obtained from a glass frit precursor and a vitrified simulated defense waste glass which is commonly employed in the immobilization of high level nuclear waste. As in the cas of the metal oxide powders of Example 2 , the frit sample was prepared by compacting it into disc form. Figure 14 i a GDMS spectrum of the vitrified simulated defense waste glass under discharge conditions of 0.15 torr argon pressure and 20 watts RF power using the sample holder of Figure 3. As was the case for other nonconducting matrices, the plasma was stable.
  • Example 4 The application of the glow discharge ion source of the present invention to the analysis of materials by atomic emission is demonstrated in Figure 15.
  • Figure 15 is the emission spectrum of the NBS C1122 copper-beryllium alloy (analyzed by mass spectrometry in Example 1) under discharge conditions of 0.9 torr argon pressure and 15 watts RF power using the sample holder of Figure 3.
  • a glow discharge atomization/excitation source incorporating an external sample mount geometry is illustrated schematically in Figure 16 and designated generally by the numeral 40.
  • the apparatus includes an enclosure that defines a vacuum chamber.
  • the walls of the enclosure which is shown in Figure 16 in a rectangular shape but may take other shapes, are desirably formed of a stainless steel body 68.
  • the stainless steel walls forming the interior surface of the vacuum chamber define an electrode surface area exposed to the interior of the vacuum chamber and can be electrically connected to ground 120, as shown schematically in Figure 17 for example.
  • the enclosure further defines a sample port that communicates between the interior and the exterior of the vacuum chamber.
  • the sample port is an opening 76 defined in chamber body 68.
  • the enclosure defines an external mount for receiving a solid sample external to the vacuum chamber.
  • the external mount can include a li flange surface 74, which generally is defined in stainless steel body 68 and is oriented to face away from the interior of the chamber. Lip flange surface 74 forms part of the exterior surface of the chamber and frames sample port opening 76. Since lip flange surface 74 is defined i stainless steel body 68, the external mount is electricall connected to the stainless steel walls defining the electrode surface area exposed to the interior of the vacuum chamber.
  • the external mount can include an external mounting plate in the form of an orifice disk 70.
  • the external mounting plate is electrically connected, as by metal screws for example, to enclosure body 68.
  • the external mounting plate defines a sample hole in the form of an orifice 71 that is circumscribed by sample port 76 and so controls the exposure of surface 63 of sample 62 to negative glow 64.
  • Orifice 71 defined in orifice disk 7 desirably can have a circular shape with a diameter on the order of about two to twelve millimeters.
  • An orifice of 2 mm provides a higher power density, which is desirable t enhance emission intensity. At some point, the orifice becomes too small to be able to accommodate dark spaces.
  • a conformable mounting plate sealing gasket in the form of an O-ring 72 is desirably disposed between the interior surface of the periphery of orifice disk 70 and lip flange surface 74 formed around sample port opening 76.
  • the central opening defined in O-ring 72 is large enough to surround sample port opening 76.
  • the O-ring gasket is able to conform its shape sufficiently under the application of pressure so that a vacuum tight seal is formed between the mounting plate and the exterior of the vacuum chamber enclosure.
  • O-ring 72 is desirably formed of a rubber soft enough to ensure an excellent seal under vacuum conditions.
  • a torque bolt can be provided to bias and secure the sample so as to expose a surface of the sample to the interior of the vacuum chamber.
  • a brass torque bolt 78 is disposed outside the vacuum chamber defined by the enclosure.
  • a ceramic spacer 80 is desirably disposed between the bolt and the sample.
  • a conformable sample sealing gasket in the form of an O-ring 73 is configured so as to be disposable against and between a first surface and a second surface so as to provide a vacuum tight seal and maintain a less than one dark space separation between the first surface and the second surface when the torque bolt secures the sample against the sample sealing gasket.
  • a conformable sample sealing gasket in the form of an O-ring 73 is configured so as to be disposable against and between a first surface and a second surface so as to provide a vacuum tight seal and maintain a less than one dark space separation between the first surface and the second surface when the torque bolt secures the sample against the sample sealing gasket.
  • O-ring 73 is disposed between the exterior surface of orifice disk 70 and surface 63 of sample 62. Accordingly, a separation distance of less than one dark space is maintained between the first surface, which is the sample's surface 63 facing toward the interior of the vacuum chamber, and the second surface, which is the mounting plate surface facing away from the interior of the vacuum chamber, when torque bolt 78 secures sample 62 against sample sealing gasket 73.
  • a suitable gasket for O-ring 73 is formed of TEFLON for example because of higher heat resistant properties of this material than rubber.
  • the mounting plate such as orifice disk 70, can be formed as a unitary part of enclosure body 68. However, such embodiments would forego the advantages of the interchangeability of mounting plate with differently sized and/or shaped orifices.
  • a sample holder is provided in the form of a mold. Some samples are provided in a powdered form, and testing of such samples requires a mold in which the powdered sample material can be compacted and held. As shown in Figures 18(a) and (b) for example, the sample securing and dark space maintaining means can include a holder 210, which can be formed of an electrically conducting material such as copper for example.
  • Holder 210 defines a recess 212 having side walls 214 (shown in phantom in Figure 18(b)) spaced apart from one another over an area larger than the area of the sample hole 71 in the mounting plate 70, or the sample por defined in the enclosure if the mounting plate is part of unitary structure including the chamber body.
  • the compacted powdered sample material is received in the recess 212, which typically is about 2 mm deep and about one half inch in diameter for a circular disk-shaped holde 210 of 2 inch diameter.
  • the one-half inch breadth of recess 212 is smalle than the open diameter of O-ring 73, which must surround recess 212 to provide the requisite vacuum seal against holder surface 216, which is disposed to face the interior of the vacuum chamber.
  • the sample material typically will fill the recess up to the level of the surface 216.
  • the opposite surface 218 of holder 210 will be electrically connected to the RF power source.
  • the breadth of the orifice 71 is smaller than the breadth of the recess. In this way, only the compacted surface of the sample material becomes exposed to the glow discharge, and no portion of the holder becomes exposed to the glow discharge.
  • the holder 210 is not sputtered during the glow discharge phenomenon.
  • the holder preferably will be formed of a material such as metal which is strong enough to withstand the pressure applied by torque bolt 78 needed to secure the holder to the external mount via an O-ring 73 or other gasket separation that produces the less than one dark space distance between the surface of the compacted sample material and the external mount electrically connected to ground along with the remainder of the enclosure electrode.
  • the dark space for any given sample material should fall within the range of from about 0.5 mm to about 4.0 mm.
  • the dark space is inversely proportional to the power of the glow discharge and also inversely proportional to the pressure in the vacuum chamber during the glow discharge phenomenon.
  • the dark space might be on the order of about 0.2 mm at a discharge power of about 10.0 watts.
  • rotation of the torque bolt can result in more or less deformation of the sample sealing gasket, and such control over the extent of gasket deformation can serve to adjust the separation to less than one dark space while still maintaining the requisite vacuum seal.
  • the torque bolt, the insulating spacer, the conformable sample sealing gasket, the mounting plate, the mounting plate sealing gasket, and the lip flange surface cooperate to provide means for securing the sample to the external mount wherein at least a portion of the sample forms a vacuum seal around the sample opening defined in the vacuum chamber and maintains less than one dark space separation from the counterelectrode defined by the enclosure.
  • the enclosure electrode is sometimes referred to as the counterelectrode.
  • the counterelectrode The absence of any structures between the counterelectrode and the sample prevents the sputtering of any such intervening structures that might otherwise cause adulteration of the sputtered sample material and the uncertainties and complexities attendant such adulteration.
  • the mechanism securing the sample remains outside the vacuum chamber, and this prevents material from the securing mechanism from being sputtered and complicating the analysis of the sample.
  • the external mount geometry of the apparatus of the present invention can readily accommodate a sample of almost any size or shape.
  • the only dimensional requirement demanded of the sample is that the relevant portion of surface 63 of sample 62 must be sufficiently uniform, allowing for the ability of 0- ring 73 to conform sufficiently to irregular shapes and still form a vacuum seal, so that a vacuum seal can be formed when surface 63 is pressed against O-ring 73.
  • orifice disk 70 configured with a surface topography appropriate to ensure the requisite vacuum tight seal.
  • orifice disk 70 can be replaced with another orifice disk having a differently sized or shaped orifice, if desired.
  • orifice 71 can take the shape of an elongated slot having a uniform width along its entire length.
  • means are provided for applying a radio frequency electromagnetic potential between the counterelectrode, which is exposed to the interior of the vacuum chamber, and the sample to be received by the external mount.
  • an RF feedthrough 86 can be electrically attached to the end of a coaxial RF power cable (RG 213/U) 88, which can be inserted into an elongated cavity 90 defined longitudinally through bolt 78 and spacer 80.
  • a coaxial RF power cable (RG 213/U) 88 can be connected to an elongated copper conductor rod 92 via a male type-N coaxial connector 94, wherein conductor rod 92 can be configured with a circular transverse cross- sectional diameter of 3.2 millimeters.
  • a female coaxial connector 96 can be defined at the end of bolt 78 opposite the end of bolt 78 disposed to press against spacer 80.
  • a circular cylindrical annular glass insulator member 98 can serve as an electrically insulating sheath that surrounds conductor 92 and effectively prevents arcing between conductor 92 and bolt 78.
  • sample 62 is often referred to as the cathode by analogy to the dc discharge apparatus. This convention is used in the present description.
  • chamber body 68 acts as an anode and is connected to ground
  • Chamber body 68 serves as the larger counterelectrode, and sample 62 serves as the smaller electrode.
  • a counterelectrode to electrode surface area ratio of about 500 has been found to be effective, and with a ratio of this magnitude, substantially all of the bias voltage should reside on sample 62.
  • an RF generator 98 and a matching network 100 are electrically connected to RF power cable 88.
  • a suitable RF generator and matching network are a model RF5S and a model AM-5, respectively, available from RF Plasma Products, Inc., of Marlton, New Jersey.
  • a driving potential provided by RF generator 98 desirably is sinusoidally modul ⁇ ited at 13.56 megahertz.
  • RF generator 98 can supply power over a range of from zero to 100 watts. The optimum power for any given sample, depends in large measure on the type of material forming the sample.
  • a matching network 100 employs a capacitive coupling in which a blocking capacitor is connected in series with the RF generator 98 to prevent any net current from flowing through the electrode circuit.
  • the capacitive matching network connected in series between the cathode and the RF power supply is essential when using one of the presently available RF power sources to generate the glow discharge.
  • the dc self-bias potential is directly (and approximately linearly) related to RF generator output power and inversely related to the discharge pressure within the discharge chamber. It appears that current is the dominant avenue for increasing discharge power. Moreover, operation at high pressure might be preferable from an analytical standpoint.
  • the extent of excitation should generally increase with RF power and decrease with increasing chamber pressure.
  • the sputter rate in the RF discharge increases 'ith chamber pressure at a constant RF power, and this probably is a result of an associated discharge current increase.
  • the sputter rate increases with RF power for any given chamber pressure.
  • Conditions of high pressure in the range of 6 to 10 torr and high RF power appeared to provide attractive emission intensities of sputtered species. Such conditions represent an effective trade-off between atomization rate and the extent of excitation.
  • the use of the discharge chamber walls, rather than the sample, as the "powered" electrode, may improve the efficiency of the coupling of the RF power to the discharge, as well as help avoid any coupling differences from sample-to-sample. Additionally, the size of the sampling orifice may have an effect on analytical characteristics such that an optimum diameter for the orifice might exist.
  • Cooling of the discharge chamber and sample also could be advantageous, owing to the associated reduction of water vapor in the discharge.
  • a holder such as for powdered sample materials
  • provision can be made in conjunction with the holder so that the holder can be cooled, and such cooling can keep the sample cooled by conduction heat transfer.
  • Such cooling means are disclosed for example in U.S. Patent No. 4,853,539 to Hall et al. the disclosure of which is hereby incorporated herein by reference.
  • a coolant is circulated, as by a pump, through a coolant channel 220 (shown in phantom by the dashed lines) provided through holder 210 and connected to a coolant supply 222 via conduits 224, coolant supply 222 also including means for circulating the coolant such as a pump.
  • the RF frequency is modulated so as to provide the power to the sample in pulses which have a frequency of anywhere from 1 to 1,000 Hertz.
  • the length of each pulse can be anywhere from about 1 millisecond to about one-half second.
  • the glow discharge By pulsing the power provided to the sample, the glow discharge is in effect turned on and off between very low powers to very high powers. This permits the sample to cool off between power pulses.
  • the use of these short bursts of power permit the application of higher powers during the power bursts than otherwise would be possible if the power were provided at the steady state rate of the RF power source.
  • the glow discharge can be operated at higher overall average powers than is the case without pulsing the discharge.
  • the pulsed discharge at the higher powers can be synchronized with the analyzing instrumentation so that the detection of the analyzing instrumentation only occurs at the optimum time relative to the occurrence of the short pulse of high power.
  • the synchronous optimum timing may vary depending upon the type of analysis being performed. This so-called synchronous detection process improves the quality of the data that can be gathered by the analyzing instrumentation.
  • the vacuum chamber enclosure defines at least one output port connectable to means for analyzing the contents of the vacuum chamber.
  • each output port can include an optical window.
  • the walls of the enclosure defining the vacuum chamber can include one or more optica windows.
  • two optica windows are provided.
  • a fused silica window 60 is mounted directly opposite sample 62, such that both the discharge glow 64 and the sample surface 63 may be viewed simultaneously.
  • a second fused silica window 66 is define as part of the side of chamber body 68 adjacent to the sid of chamber 68 onto which sample 62 is mounted. Window 66 is oriented for the purpose of allowing optical monitoring of negative glow 64 while avoiding noise which might otherwise originate from surface 63 of sample 62.
  • the optical geometry which includes a window 60 mounted directly opposite the sample 62 is known as the "glow + cathode” geometry.
  • the optical geometry using a window 66 mounted perpendicular to the sample axis (indicated by arrow 41) is known as the "glow only” geometry.
  • the dual window design such as shown in Figure 16, facilitates direct comparison of analyte emission intensities, signal-to-noise ratios, and emission spectra obtained with each of the two optical geometries.
  • the wav stem arrows designated hv in Figure 16 are intended to represent electromagnetic wave energy emitted through window 60 or 66 for analysis by further analyzing instrumentation.
  • the optical geometry should include at least two windows disposed as in the "glow only" geometry.
  • the two windows should be disposed in direct line of sight of one another and to opposite sides of the glow discharge.
  • a vacuum chamber 68 includes a pair of oppositely disposed output ports in the form of windows 66 disposed on opposite sides of glow discharge 64.
  • Each window 66 is in a direct line of sight of the other window 66, but shielded from a line of sight which would encompass sample 62.
  • each output port can include or be connectable to an intermediate vacuum lock where ions or other sputtered species may be collected for further transmission to an analyzing instrument such as a mass spectrometer for example.
  • an analyzing instrument such as a mass spectrometer for example.
  • Excitation temperatures for the RF discharge source, particularly in the glow plus cathode mode, are significantly higher, and this fact demonstrates the great potential of the RF glow discharge sources for the emission detection of sputtered species, including elements that possess high-lying resonance states.
  • Signal-to-noise ratios obtained from the glow only and glow plus cathode optical geometries appear statistically equal, while emission intensities of the glow plus cathode optical geometry are two to five times higher than the intensities obtained using the glow only optical geometry. Since much of the noise associated with the emission measurements may originate from the sample surface itself, higher signal- to-noise ratios may be obtainable with the glow only optical configuration. However, because of the much lower emission intensities obtained with the glow only configuration, the glow plus cathode geometry might be more analytically attractive.
  • the enclosure defines at least one gas inlet port connectable to means for supplyi ⁇ g gas into the vacuum chamber.
  • an inert gas such as argon enters the discharge chamber defined by chamber body 68 through one or both of two
  • Inlet ports 82 are mounted on the top of the chamber and disposed equidistant from sampling orifice 71 in orifice disk 70.
  • the enclosure defines a vacuum port connectable to means for evacuating the vacuum chamber.
  • a vacuum port 84 which leads to an adjustable-flow (bellows) vacuum valve (not shown) that controls the degree of vacuum present within the discharg chamber defined by chamber body 68.
  • the support gas flow rate of the inert gas introduced through ports 82 for any given pressure within the chamber may be manipulated by simultaneous adjustment of the vacuum valve and gas line needle valve (not shown) controlling the introduction of the inert gas.
  • the range of pressures suitable for maintaining the RF glow discharge phenomenon are from abo 0.1 to 10 torr.
  • Fig. 17 The use of the external mount geometry RF glow discharge atomization/excitation source of the present invention in connection with atomic emission spectrometry is illustrated schematically in Fig. 17 for example.
  • Photons emitted from negative glow 64 are collected by means of a plano-convex lens 102 and focused via a focusi lens 110 onto the entrance slit 104 of a 240 millimeter focal length Czerney Turner mount monochromator 106 equipped with a 2400 g/mm holographic grating 108.
  • Such monochromator is available from CVI Laser Corp. of
  • a photomultiplier tube 112 such as an RCA 1P28TM is powere by a dc voltage regulated power supply (not shown) and is employed as a transducer. Photocurrent exiting the photomultiplier tube 112 is fed into a digital picoammeter 114 (model 480TM available from Keithley Instruments, Inc., of Cleveland, Ohio) such that emission intensities may be recorded manually. Emission spectra are obtained via an X recorder 116 (model 200 TM, Houston Instruments, of Austin, Texas) connected to the output of picoammeter 114.
  • the external mount geometry RF glow discharge atomization/excitation source is desirably mounted on an XY optical mount (not shown) so that the two different optical geometries can be easily interconverted by rotatio of the mount relative to the optical equipment such as monochromator 106, which is controlled by monochromator control electronics 118.

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
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  • General Physics & Mathematics (AREA)
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  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)

Abstract

L'invention se rapporte à un procédé et à un appareil, qui servent à analyser les matériaux (62) composant un échantillon solide monté à l'extérieur de l'appareil et dans lesquels une décharge luminescente (64) basse pression est déclenchée par application d'un potentiel (99) de radiofréquence sur un échantillon (62) solide continu solidaire et sur une anode (68) électriquement mise à la terre, en présence d'un gaz inerte. La décharge luminescente (64) est maintenue jusqu'à ce que le gaz inerte soit ionisé, lequel une fois ionisé, pulvérise le matériau de l'échantillon (62), qui, une fois pulvérisé, passe dans une zone (32) de l'analyseur pour être analysé.
PCT/US1991/007178 1990-10-01 1991-09-30 Dispositif de spectrometrie a decharge luminescente alimentee par radiofrequence et avec geometrie de support de l'echantillon situee a l'exterieur de l'appareil WO1992006487A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE69128342T DE69128342T2 (de) 1990-10-01 1991-09-30 Vorrichtung zur radiofrequenzbetriebenen glimmentladungsspektrometrie mit ausserhalb liegender geometrie der probenhalterung
EP91919679A EP0503058B1 (fr) 1990-10-01 1991-09-30 Dispositif de spectrometrie a decharge luminescente alimentee par radiofrequence et avec geometrie de support de l'echantillon situee a l'exterieur de l'appareil

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/591,544 US5086226A (en) 1989-05-31 1990-10-01 Device for radio frequency powered glow discharge spectrometry with external sample mount geometry
US591,544 1990-10-01

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EP0711993A1 (fr) * 1993-07-26 1996-05-15 Kawasaki Steel Corporation Procede et appareil d'analyse spectrale d'une emission
WO2007113072A1 (fr) * 2006-03-29 2007-10-11 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Procédé et dispositif de détermination simultanée de différences de hauteurs et de compositions par spectroscopie par décharge corona

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US5325021A (en) * 1992-04-09 1994-06-28 Clemson University Radio-frequency powered glow discharge device and method with high voltage interface
US5408315A (en) * 1993-07-28 1995-04-18 Leco Corporation Glow discharge analytical instrument for performing excitation and analyzation on the same side of a sample
GB2296369A (en) * 1994-12-22 1996-06-26 Secr Defence Radio frequency ion source
US6124675A (en) * 1998-06-01 2000-09-26 University Of Montreal Metastable atom bombardment source
WO2000055600A2 (fr) * 1999-02-25 2000-09-21 Clemson University Echantillonnage et analyse de matiere particulaire portee par l'air a l'aide d'une emission atomique a decharge incandescente et de spectrometries de masse
US6157546A (en) * 1999-03-26 2000-12-05 Ericsson Inc. Shielding apparatus for electronic devices
US6465776B1 (en) 2000-06-02 2002-10-15 Board Of Regents, The University Of Texas System Mass spectrometer apparatus for analyzing multiple fluid samples concurrently
WO2002060566A1 (fr) * 2001-01-29 2002-08-08 Clemson University Pression atmospherique, decharge luminescente, source d'emission optique pour l'echantillonnage direct de substances liquides
FR2826121B1 (fr) * 2001-06-18 2004-02-20 Jobin Yvon Sas Dispositif et procede de positionnement d'un echantillon monte sur un spectrometre a decharge luminescente
US7298091B2 (en) * 2002-02-01 2007-11-20 The Regents Of The University Of California Matching network for RF plasma source
JP5771458B2 (ja) * 2011-06-27 2015-09-02 株式会社日立ハイテクノロジーズ 質量分析装置及び質量分析方法
US20130255877A1 (en) * 2012-03-20 2013-10-03 Flextronics Ap, Llc Multifunctional thermo-vacuum-air pressurized forming machine
US9536725B2 (en) 2013-02-05 2017-01-03 Clemson University Means of introducing an analyte into liquid sampling atmospheric pressure glow discharge
CN106687807B (zh) * 2014-09-04 2018-09-04 莱克公司 用于定量分析的基于受调节的辉光放电的软电离
US10281405B2 (en) 2016-01-08 2019-05-07 Clemson University Research Foundation Ambient desorption-optical emission spectroscopy using a microplasma desorption/excitation source
EP3485294A4 (fr) * 2016-07-17 2020-02-26 B.G. Negev Technologies and Applications Ltd., at Ben-Gurion University Système de conversion ascendante pour l'imagerie et la communication
JP6765328B2 (ja) * 2017-03-15 2020-10-07 株式会社堀場製作所 作成方法、グロー放電発光分析方法、器具、及びグロー放電発光分析装置
GB2583897A (en) * 2019-04-05 2020-11-18 Servomex Group Ltd Glow plasma stabilisation
CA3063389C (fr) 2019-12-02 2021-03-30 2S Water Incorporated Appareil de decharge luminescente a solution conductrice d'electricite
CA3068769A1 (fr) 2020-01-20 2021-07-20 2S Water Incorporated Pointe d`electrode a liquide
RU206533U1 (ru) * 2021-03-09 2021-09-15 Александр Михайлович Панин Фотометр для спектрального анализа

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Cited By (3)

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Publication number Priority date Publication date Assignee Title
EP0711993A1 (fr) * 1993-07-26 1996-05-15 Kawasaki Steel Corporation Procede et appareil d'analyse spectrale d'une emission
EP0711993A4 (fr) * 1993-07-26 1997-09-10 Kawasaki Steel Co Procede et appareil d'analyse spectrale d'une emission
WO2007113072A1 (fr) * 2006-03-29 2007-10-11 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Procédé et dispositif de détermination simultanée de différences de hauteurs et de compositions par spectroscopie par décharge corona

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EP0503058A1 (fr) 1992-09-16
JPH0563899B2 (fr) 1993-09-13
EP0503058A4 (en) 1993-05-05
EP0503058B1 (fr) 1997-12-03
DE69128342D1 (de) 1998-01-15
US5086226A (en) 1992-02-04
JPH05501636A (ja) 1993-03-25
DE69128342T2 (de) 1998-03-26

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