WO1992003588A1 - Heater for an effusion cell - Google Patents
Heater for an effusion cell Download PDFInfo
- Publication number
- WO1992003588A1 WO1992003588A1 PCT/FI1990/000201 FI9000201W WO9203588A1 WO 1992003588 A1 WO1992003588 A1 WO 1992003588A1 FI 9000201 W FI9000201 W FI 9000201W WO 9203588 A1 WO9203588 A1 WO 9203588A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- effusion cell
- foil
- ribbon
- crucible
- heater
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/62—Heating elements specially adapted for furnaces
- H05B3/64—Heating elements specially adapted for furnaces using ribbon, rod, or wire heater
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
- C30B23/066—Heating of the material to be evaporated
Definitions
- Invention relates to effusion cell used in Molecular Beam and Chei ⁇ iical Bean* EpiLaxy jyste-ns including a crucible for ' source material and a heater for heating the crucible.
- MBE Molecular Beam Epitaxy
- UHV ultra high vacuum
- the substrate determines the crystallinity and orientation of the grown layer.
- the deposition rate is typically one micrometer per hour with thickness control of tenths of a monolayer and with purity levels of better than ten parts per million.
- Predetermined doping and compositional profiles can be fabricated in a layer-by- layer manner, with device-quality minority and majority carrier characteristics.
- CBE Chemical Beam Epitaxy
- MBE solid sources employed in conventional MBE are replaced by gaseous sources.
- MOCVD metalorganic chemical vapor deposition
- UHV ultra high vacuum
- CBE possesses the molecular beam nature and the use of all-vapor source simultaneously. Therefore it provides extraordinary versatility in the growth of layered semiconductor systems while permitting the use of phosphorus.
- CBE has been proven to grow very high quality GalnAsP/InP, one of the most important semiconductor heterostructures practically unattainable by MBE.
- the Knudsen-type effusion cell is used in the vacuum chamber.
- a high temperature is needed and exact temperature stability control is necessary.
- the high temperatures might cause troubles because in the temperature range up to 1600°C impurities from the cell construction might mix with the molecular beams.
- the heating of the source material is obtained by different kinds of heating elements.
- Well-known is an effusion cell where the resistor filament line goes from one end of the cell to another end and back again mainly in the direction of the tubular cell. This kind of resistor is very sensitive to the deformation in high temperatures because of the thermal strain.
- Another well-known heater resistor in the effusion cell is a double coil made of wire.
- the double coil arrangement is the only possibility to prevent the magnetic field effect achieved by this kind of coil. It is because two coils can be made to effect to the opposite directions and so to compensate the dipole fields of the two coils.
- the thin wire coil gives unbalanced heat transmission distribution from the resistor to the crucible. Therefore the temperature difference between the resistor and the outer level of the crucible is remarkably high. The consequence of that situation is that high temperature resistor coil easily causes impurities in to the molecular beam.
- the purpose of this invention is to provide a new effusion ceil for Molecular and Cnemical Beam Epitaxy.
- the heater for the crucible mainly consists of two coils made of thin foil ribbons which have been corrugated to make ribbon stiffer.
- the corrugated foil ribbon is mechanically stiff and stable.
- the heat transmission distribution from the resistor to the crucible is good because the thin foil can cover nearly the whole surface area of the effusion cell.
- the temperature difference between the resistor and the crucible is insignificant causing almost no impurities in the molecular beam.
- Figure 1 presents a sectional view of the effusion cell.
- Figure 2 presents the section II-II of the figure 1.
- Figure 3 presents the heating filaments of the effusion cell.
- Figure 4 presents an enlarged section of the filament mounting in the effusion cell.
- Figure 5 presents a cross section V-V of the effusion cell.
- the effusion cell in figure 1 is mainly comprised of the supporting structure, means for holding solid sources for emanating and means for heating the solid source.
- the supporting structure comprises the feedthrough 1, the flange 2, the base rod 3, outer core 12 and inner core 13. Inside the tube formed cores 12 and 13 there is the crucible 27 for holding solid sources to be emanated surrounded by the heating filaments 16a and 16b.
- the heating filaments 16a and 16b are resistors which are made of foil ribbons and connected to the electric power source by the current leads 17a and 17b. Electric current is brought through the flange 2 by cords 29a and 29b which have been attached to the connectors 19a and 19b by screws 18a and 18b.
- the effusion cell has a four point connecting plug 30 with two tags 31 for the heating filaments and two tags 32 for the thermoelement.
- thermoelements 9a and 9b are seen in another sectional view of the effusion cell in the figure 2 .
- Thermoelements 9a and 9b measure the temperature of the crucible 27 and they are connected to the tags 32 by cords 33a and 33b.
- the figure 3 presents the heating filaments 16a and 16b of the effusion cell.
- the filaments 16a and 16b are made of foil ribbons of tantalum metal and form two spiral coils which have been bifilarly wound together.
- every second round of the coils belongs to the filament 16a and every other round of the coils belongs to the filament 16b.
- Bifilarly wound filaments create no disturbing magnetic field when electric current is lead to the coils because two opposite coils compensate their dipole fields.
- the both filaments 16a and 16b have been joined to the hot ring 14 also made of foil material.
- the thickness of the hot ring 14 has been chosen so that the total connecting cross-sectional area in the ring is less than the cross-sectional area of the foil ribbon. Because the ring also acts as a resistor the consequence is that the ring 14 will be slightly hotter than the filament 16a or 16b itself. By this way the orifice of the crucible 27 will be at higher temperature compared to the rest of the crucible. Consequently this arrangement improves the beam quality.
- FIG 4 is presented an enlarged section of the filament coil mounting in the effusion cell.
- the both filaments 16a and 16b have been mounted to the grooves 35 between the steps 36 in the filament holder 20.
- the figure 4 shows also very clearly the cross sectional form of the filament coil 16a.
- the filament coil 16a is basically a flat stripe that has been wound to the coil so that the cross section is concave or arched. This form makes the filament coil 16a very stable against deformation in high temperatures.
- the filament 16a is supported only by its edges. Because -the contact areas between the filament and the holder 20 are very small the heat transfer from the filament to the holder will also be minimized. To make sure that the filament 16a stays in its place the filament has been fitted to the groove 35. During the operation the filament grabs efficiently to the corners 38 because of the thermal expansion.
- Figure 5 presents a cross section of the effusion cell.
- the filament coil 16a is mounted inside the outer core 12 and inner core 13 of the cell.
- the filament 16a is placed to the grooves 35 between the steps 36 in the filament holder 20.
- Inside the filament coil 16a the crucible 27 is seen in the figure 5.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP90912353A EP0547048B1 (en) | 1990-08-24 | 1990-08-24 | Heater for an effusion cell |
DE69021219T DE69021219T2 (en) | 1990-08-24 | 1990-08-24 | HEATING FOR EFFUSION CELL. |
CA002090730A CA2090730A1 (en) | 1990-08-24 | 1990-08-24 | Heater for an effusion cell |
PCT/FI1990/000201 WO1992003588A1 (en) | 1990-08-24 | 1990-08-24 | Heater for an effusion cell |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002090730A CA2090730A1 (en) | 1990-08-24 | 1990-08-24 | Heater for an effusion cell |
PCT/FI1990/000201 WO1992003588A1 (en) | 1990-08-24 | 1990-08-24 | Heater for an effusion cell |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1992003588A1 true WO1992003588A1 (en) | 1992-03-05 |
Family
ID=25675950
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FI1990/000201 WO1992003588A1 (en) | 1990-08-24 | 1990-08-24 | Heater for an effusion cell |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO1992003588A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0581496A2 (en) * | 1992-07-20 | 1994-02-02 | Intevac, Inc. | Molecular beam epitaxy (MBE) effusion source utilizing heaters to achieve temperature gradients |
WO2001027363A1 (en) * | 1999-10-13 | 2001-04-19 | Abb Research Ltd. | A device and a method for heat treatment of an object in a susceptor |
US6521047B1 (en) * | 1999-11-08 | 2003-02-18 | Joint Industrial Processors For Electronics | Process and apparatus for liquid delivery into a chemical vapor deposition chamber |
FR2878863A1 (en) * | 2004-12-07 | 2006-06-09 | Addon Sa | VACUUM DEPOSITION DEVICE WITH RECHARGEABLE RESERVOIR AND CORRESPONDING VACUUM DEPOSITION METHOD. |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE876875C (en) * | 1951-08-17 | 1953-05-18 | Heraeus Gmbh W C | Electric resistance heating element |
GB1076297A (en) * | 1964-09-11 | 1967-07-19 | Gen Electric | Vaporizer filament |
DE1925033A1 (en) * | 1968-05-18 | 1969-11-27 | Fuji Photo Film Co Ltd | Electric heating element |
DE1921938A1 (en) * | 1968-05-03 | 1970-11-05 | American Packaging Corp | Radiator |
DE2608510A1 (en) * | 1976-03-02 | 1977-09-08 | Dov Z Glucksman | Tubular heating element with tape shaped resistor - has air blown over resistor tape wound along cross shaped former inside tube |
EP0122088A1 (en) * | 1983-03-30 | 1984-10-17 | Vg Instruments Group Limited | Improvements in or relating to sources used in molecular beam epitaxy |
DE3601010A1 (en) * | 1986-01-15 | 1987-07-16 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | DEVICE FOR PARTLY COATING THE INTERNAL SURFACE OF LAMP BULBS |
EP0249516A1 (en) * | 1986-05-15 | 1987-12-16 | Commissariat A L'energie Atomique | Cell for epitaxial growth by molecular jets, and associated process |
-
1990
- 1990-08-24 WO PCT/FI1990/000201 patent/WO1992003588A1/en active IP Right Grant
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE876875C (en) * | 1951-08-17 | 1953-05-18 | Heraeus Gmbh W C | Electric resistance heating element |
GB1076297A (en) * | 1964-09-11 | 1967-07-19 | Gen Electric | Vaporizer filament |
DE1921938A1 (en) * | 1968-05-03 | 1970-11-05 | American Packaging Corp | Radiator |
DE1925033A1 (en) * | 1968-05-18 | 1969-11-27 | Fuji Photo Film Co Ltd | Electric heating element |
DE2608510A1 (en) * | 1976-03-02 | 1977-09-08 | Dov Z Glucksman | Tubular heating element with tape shaped resistor - has air blown over resistor tape wound along cross shaped former inside tube |
EP0122088A1 (en) * | 1983-03-30 | 1984-10-17 | Vg Instruments Group Limited | Improvements in or relating to sources used in molecular beam epitaxy |
DE3601010A1 (en) * | 1986-01-15 | 1987-07-16 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | DEVICE FOR PARTLY COATING THE INTERNAL SURFACE OF LAMP BULBS |
EP0249516A1 (en) * | 1986-05-15 | 1987-12-16 | Commissariat A L'energie Atomique | Cell for epitaxial growth by molecular jets, and associated process |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN, Vol. 10, No. 63, C332, Abstract of JP 60200895, publ 1985-10-11 (KOGYO GIJUTSUIN). * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0581496A2 (en) * | 1992-07-20 | 1994-02-02 | Intevac, Inc. | Molecular beam epitaxy (MBE) effusion source utilizing heaters to achieve temperature gradients |
EP0581496A3 (en) * | 1992-07-20 | 1994-06-22 | Intevac Inc | Molecular beam epitaxy (mbe) effusion source utilizing heaters to achieve temperature gradients |
WO2001027363A1 (en) * | 1999-10-13 | 2001-04-19 | Abb Research Ltd. | A device and a method for heat treatment of an object in a susceptor |
US6481368B1 (en) | 1999-10-13 | 2002-11-19 | Abb Research Ltd | Device and a method for heat treatment of an object in a susceptor |
US6521047B1 (en) * | 1999-11-08 | 2003-02-18 | Joint Industrial Processors For Electronics | Process and apparatus for liquid delivery into a chemical vapor deposition chamber |
FR2878863A1 (en) * | 2004-12-07 | 2006-06-09 | Addon Sa | VACUUM DEPOSITION DEVICE WITH RECHARGEABLE RESERVOIR AND CORRESPONDING VACUUM DEPOSITION METHOD. |
WO2006061517A1 (en) * | 2004-12-07 | 2006-06-15 | Addon | Device for vacuum deposition with recharging reservoir and corresponding vacuum deposition method |
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