WO1991011820A1 - Optical surface polishing method - Google Patents

Optical surface polishing method Download PDF

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Publication number
WO1991011820A1
WO1991011820A1 PCT/US1991/000398 US9100398W WO9111820A1 WO 1991011820 A1 WO1991011820 A1 WO 1991011820A1 US 9100398 W US9100398 W US 9100398W WO 9111820 A1 WO9111820 A1 WO 9111820A1
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WO
WIPO (PCT)
Prior art keywords
elements
wafer
boule
rods
optical material
Prior art date
Application number
PCT/US1991/000398
Other languages
French (fr)
Inventor
John J. Zayhowski
Original Assignee
Massachusetts Institute Of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Institute Of Technology filed Critical Massachusetts Institute Of Technology
Publication of WO1991011820A1 publication Critical patent/WO1991011820A1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/0627—Construction or shape of active medium the resonator being monolithic, e.g. microlaser
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/0602—Crystal lasers or glass lasers
    • H01S3/0604—Crystal lasers or glass lasers in the form of a plate or disc
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49789—Obtaining plural product pieces from unitary workpiece
    • Y10T29/4979—Breaking through weakened portion
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/4998—Combined manufacture including applying or shaping of fluent material
    • Y10T29/49982—Coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49995—Shaping one-piece blank by removing material

Definitions

  • Miniature, monolithic, solid state lasers such as the microchip laser, are produced by placing a length of gain material within a short resonant cavity.
  • the resonant cavity is created by forming mirrored surfaces on the gain material itself.
  • the gain medium must be polished flat and parallel on two opposing sides. While such lasers can be formed if the surface of the gain medium is slightly convex, they can not be formed if the gain material has a concave surface or if the surfaces are not parallel such that shape of the gain material has the form of a wedge between the two surfaces.
  • a relatively restricted region can be produced on each polished wafer 10 which has the required parallelism.
  • the material becomes wedge shaped (shown exaggerated for clarity) , and microchip lasers taken from that portion of the wafer do not form a proper resonant cavity with this shape.
  • the cutting of a large wafer into sections relieves stress at the surface of the wafer, causing the sections to distort. This can cause a low yield of usable sections because the distortion tends to destroy the parallel relationship between the surfaces.
  • the invention provides a new and improved method of producing a desired surface on an optical material.
  • One aspect of the method of processing includes producing a number of optical elements, arranging the elements such that adjacent elements are separated by a material having a hardness different from the optical elements being processed, processing (e.g. polishing) the surfaces of the elements and then removing the material separating the optical elements.
  • Preferred embodiments include the following aspects.
  • the step of producing the elements results in decrease in stress at the surface of the elements.
  • the step of producing the elements includes cutting elements from a boule and the step of processing includes polishing the elements to produce convex surfaces. Cutting elements from the boule includes cutting a wafer from the boule and scoring the surfaces of the wafer into a waffle pattern.
  • the separating material between the elements may be a void caused by the scoring of the optical material. The wafer is cut into elements along the scoring.
  • elements are cut from the boule by coring to produce a plurality of rods which are embedded in a material having a hardness less than the optical material.
  • the rods and embedding material are sliced to form a wafer.
  • the embedding material may be an epoxy.
  • elements cut from a boule are polished to produce concave surfaces.
  • the elements are cut from the boule by coring to produce a number of rods of optical material which are embedded in a material having a hardness greater than the optical material.
  • the rods and the harder material are sliced to form a wafer.
  • the embedding of the rods in a material having a hardness greater than the optical material includes the steps of forming, from a material harder than the optical material, a die defining a volume having a number of holes large enough to accommodate the rods.
  • the present invention provides a method of forming large numbers of small optical elements with the desired surface curvature while they remain part of a single wafer.
  • Fig. 1 is a cross-sectional view of a wafer polished using the techniques known to the prior art
  • Fig. 1A is a plan view of the wafer of Fig. 1;
  • Fig. 2 is a cross-sectional view of a wafer polished using one preferred embodiment of the invention
  • Fig. 2A is a plan view of the wafer of Fig. 2
  • Fig. 2B is a cross- sectional view of individual sections of the wafer of Fig. 2A after being cut from the wafer
  • Fig. 2C is a plan view of the individual sections of Fig. 2B
  • Fig. 3 is a flow chart of the process for manufacturing the embodiment of Fig. 2;
  • Fig. 4 is a cross-sectional view of a wafer created by embedding pieces of material to be polished into a matrix of a softer second material and then polishing
  • Fig. 4A is a cross-sectional view of a wafer created by embedding small pieces of material into a matrix of a harder second material and then polishing
  • Fig. 4B is a plan view of the wafers of Figs. 4 and 4A
  • Fig. 4C is a perspective view of a jig with attached rods of optical material
  • Fig. 4D is a perspective view of die of harder material as used in Fig. 4A;
  • Fig. 5 is a flow chart of the process for manufacturing the embodiment of Fig. 4;
  • Fig. 6 is a cross-sectional view of a wafer created by embedding material to be polished into a thinner matrix of a second material and then polishing.
  • Fig. 6A is a plan view of the wafer of Fig. 6.
  • Fig. 7 is a flow chart of the process for manufacturing the embodiment of Fig. 6.
  • a wafer 10 of a optical material for example a glass or crystal
  • the wafer 10 is then inscribed with grooves 20 on one or both surfaces (step 312, Fig. 3).
  • the depth of the grooves 20 is such that the wafer 10 can still be handled without cracking along the grooves 20.
  • the grooves 20 are less than the thickness of the wafer 10.
  • the grooves 20 correspond to the positions where cuts will be made to produce a plurality of smaller sections 24.
  • the grooves 20 are wider than the width of the final cut.
  • the wafer 10 is again polished (step 314, Fig. 3) to remove any distortion of the surface which results from the release of stress by the creation of the grooves 20.
  • This additional polishing creates convex surfaces on each of the sections 24.
  • the amount of convexity can be adjusted by controlling the amount of material removed.
  • the wafer 10 then can undergo subsequent processing (step 316, Fig. 3) , such as the depositing of dielectric mirrors on each of the surfaces, before being separated 26 along the grooves 20 (step 318, Fig. 3) into smaller optical elements 24, each with convex surfaces, Figs. 2B and 2C.
  • small pieces of the optical material 26 to be polished are embedded (step 510, Fig. 5) in a matrix of a second material 28, as in Fig. 4B.
  • the resulting composite is then cut (step 512, Fig. 5) into wafers 12 and polished (step 514, Fig. 5).
  • the second material 28 is softer than the optical material 26, the optical material 26 will have a convex surface 32 after polishing, as shown in Fig. 4.
  • the second material 28 is harder than the optical material 26, the optical material will have a concave surface 34 after polishing, as shown in Fig. 4.
  • the wafer 12 then undergoes subsequent processing (step 516, Fig. 5) as a wafer 12 before the second material 28 is removed (step 518, Fig. 5).
  • one method of embedding the optical material 26 in a softer material 28 is to core a boule of optical material to produce a plurality of rods 36 of optical material. These rods 36 are arranged in a jig 38 in generally parallel relationship.
  • the jig 38 forms the base of a mold (shown in phantom) 40 which is then filled with an epoxy 28.
  • the epoxy 28 fills the interstitial space between the rods 36.
  • the composite structure of epoxy 28 and rods 26 is removed from the mold and jig and sliced into wafers 12. The wafers are then processed as previously described.
  • a concave surface is desired, the material must be embedded in a harder material. Since, for example, crystalline optical materials are typically harder than epoxies, another method for embedding the optical material into a harder material must be used.
  • One suitable method, Fig. 4D is to form a die 42 from a harder material, for example, by boring a plurality of generally parallel holes 44 in a volume of the harder material, each hole being just large enough to accommodate a rod of optical material 36 to be polished.
  • the rods 36 of optical material produced by coring a boule, as previously described, are then inserted into the holes 44.
  • the die 42 with inserted gain rods 36 is then sliced into wafers (step 512, Fig. 5) and processed as described previously.
  • the second material 28 in each of these embodiments can be removed chemically, mechanically, or thermally, depending on the properties of the two materials used.
  • a wafer 12 is created by embedding (step 710, Fig. 7) small pieces of optical material 26 in a thinner lattice of a second material 28.
  • the resulting wafer 12 is then polished (step 712, Fig. 7) to produce a convex surface on each of the pieces of the optical material 26.
  • the wafer 12 then undergoes subsequent processing (step 714, Fig. 7) as a wafer 12 before the second material 28 is removed (step 716, Fig. 7) .
  • the second material 28 can be removed chemically, mechanically, or thermally, depending on the properties of the two materials used.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

A method of producing a desired surface (32, 34) on an optical material (26) including producing a plurality of elements (26) of the optical material such that each element (26) has an upper and a lower surface, arranging the plurality of elements (26) such that adjacent elements (26) are separated by an interstitial material (28) having a hardness different from the optical material being processed, processing the surfaces (32, 34) or the elements (26) and removing the interstitial material (28).

Description

OPTICAL SURFACE POLISHING METHOD
Background Of The Invention
This invention relates to forming surfaces on optical elements. Miniature, monolithic, solid state lasers, such as the microchip laser, are produced by placing a length of gain material within a short resonant cavity. Typically, the resonant cavity is created by forming mirrored surfaces on the gain material itself. For this type of resonant cavity to be effective, the gain medium must be polished flat and parallel on two opposing sides. While such lasers can be formed if the surface of the gain medium is slightly convex, they can not be formed if the gain material has a concave surface or if the surfaces are not parallel such that shape of the gain material has the form of a wedge between the two surfaces.
Referring to Figs. 1 and 1A, using conventional polishing techniques, a relatively restricted region can be produced on each polished wafer 10 which has the required parallelism. Towards the edges of the wafer the material becomes wedge shaped (shown exaggerated for clarity) , and microchip lasers taken from that portion of the wafer do not form a proper resonant cavity with this shape. In addition, the cutting of a large wafer into sections relieves stress at the surface of the wafer, causing the sections to distort. This can cause a low yield of usable sections because the distortion tends to destroy the parallel relationship between the surfaces. Summary"Of The Invention
The invention provides a new and improved method of producing a desired surface on an optical material. One aspect of the method of processing includes producing a number of optical elements, arranging the elements such that adjacent elements are separated by a material having a hardness different from the optical elements being processed, processing (e.g. polishing) the surfaces of the elements and then removing the material separating the optical elements. Preferred embodiments include the following aspects. The step of producing the elements results in decrease in stress at the surface of the elements. The step of producing the elements includes cutting elements from a boule and the step of processing includes polishing the elements to produce convex surfaces. Cutting elements from the boule includes cutting a wafer from the boule and scoring the surfaces of the wafer into a waffle pattern. The separating material between the elements may be a void caused by the scoring of the optical material. The wafer is cut into elements along the scoring.
In other preferred embodiments, elements are cut from the boule by coring to produce a plurality of rods which are embedded in a material having a hardness less than the optical material. The rods and embedding material are sliced to form a wafer. The embedding material may be an epoxy.
In still other preferred embodiments, elements cut from a boule are polished to produce concave surfaces. The elements are cut from the boule by coring to produce a number of rods of optical material which are embedded in a material having a hardness greater than the optical material. The rods and the harder material are sliced to form a wafer. The embedding of the rods in a material having a hardness greater than the optical material includes the steps of forming, from a material harder than the optical material, a die defining a volume having a number of holes large enough to accommodate the rods. The present invention provides a method of forming large numbers of small optical elements with the desired surface curvature while they remain part of a single wafer. Other advantages and features will become apparent from the following description of the preferred embodiment and from the claims.
Description Of The Preferred Embodiment A more complete understanding of the invention may be obtained from the following detailed description when taken in conjunction with the drawings, in which:
Fig. 1 is a cross-sectional view of a wafer polished using the techniques known to the prior art; Fig. 1A is a plan view of the wafer of Fig. 1;
Fig. 2 is a cross-sectional view of a wafer polished using one preferred embodiment of the invention; Fig. 2A is a plan view of the wafer of Fig. 2; Fig. 2B is a cross- sectional view of individual sections of the wafer of Fig. 2A after being cut from the wafer; Fig. 2C is a plan view of the individual sections of Fig. 2B; Fig. 3 is a flow chart of the process for manufacturing the embodiment of Fig. 2;
Fig. 4 is a cross-sectional view of a wafer created by embedding pieces of material to be polished into a matrix of a softer second material and then polishing; Fig. 4A is a cross-sectional view of a wafer created by embedding small pieces of material into a matrix of a harder second material and then polishing; Fig. 4B is a plan view of the wafers of Figs. 4 and 4A; Fig. 4C is a perspective view of a jig with attached rods of optical material; Fig. 4D is a perspective view of die of harder material as used in Fig. 4A;
Fig. 5 is a flow chart of the process for manufacturing the embodiment of Fig. 4;
Fig. 6 is a cross-sectional view of a wafer created by embedding material to be polished into a thinner matrix of a second material and then polishing. Fig. 6A is a plan view of the wafer of Fig. 6.
Fig. 7 is a flow chart of the process for manufacturing the embodiment of Fig. 6. Referring to Figs. 1, 1A, and 3, in one of the preferred embodiments, a wafer 10 of a optical material (for example a glass or crystal) to be polished is sliced from a boule of the material and is polished flat and parallel (step 310, Fig. 3) using conventional techniques. Referring also to Figs. 2 and 2A, the wafer 10 is then inscribed with grooves 20 on one or both surfaces (step 312, Fig. 3). The depth of the grooves 20 is such that the wafer 10 can still be handled without cracking along the grooves 20. Typically, the grooves 20 are less than the thickness of the wafer 10. The grooves 20 correspond to the positions where cuts will be made to produce a plurality of smaller sections 24. The grooves 20 are wider than the width of the final cut.
After the grooves 20 are created using a diamond saw or chemical etching techniques, the wafer 10 is again polished (step 314, Fig. 3) to remove any distortion of the surface which results from the release of stress by the creation of the grooves 20. This additional polishing creates convex surfaces on each of the sections 24. The amount of convexity can be adjusted by controlling the amount of material removed. The wafer 10 then can undergo subsequent processing (step 316, Fig. 3) , such as the depositing of dielectric mirrors on each of the surfaces, before being separated 26 along the grooves 20 (step 318, Fig. 3) into smaller optical elements 24, each with convex surfaces, Figs. 2B and 2C.
In another embodiment, referring to Figs. 4, 4A, 4B, and 5, small pieces of the optical material 26 to be polished are embedded (step 510, Fig. 5) in a matrix of a second material 28, as in Fig. 4B. The resulting composite is then cut (step 512, Fig. 5) into wafers 12 and polished (step 514, Fig. 5). If the second material 28 is softer than the optical material 26, the optical material 26 will have a convex surface 32 after polishing, as shown in Fig. 4. If the second material 28 is harder than the optical material 26, the optical material will have a concave surface 34 after polishing, as shown in Fig. 4. The wafer 12 then undergoes subsequent processing (step 516, Fig. 5) as a wafer 12 before the second material 28 is removed (step 518, Fig. 5).
Specifically, referring to Fig. 4C, if the optical material 26 is to have a convex surface after polishing, one method of embedding the optical material 26 in a softer material 28 is to core a boule of optical material to produce a plurality of rods 36 of optical material. These rods 36 are arranged in a jig 38 in generally parallel relationship. The jig 38 forms the base of a mold (shown in phantom) 40 which is then filled with an epoxy 28. The epoxy 28 fills the interstitial space between the rods 36. Once the epoxy 28 is hardened, the composite structure of epoxy 28 and rods 26 is removed from the mold and jig and sliced into wafers 12. The wafers are then processed as previously described. If, for some reason, a concave surface is desired, the material must be embedded in a harder material. Since, for example, crystalline optical materials are typically harder than epoxies, another method for embedding the optical material into a harder material must be used. One suitable method, Fig. 4D, is to form a die 42 from a harder material, for example, by boring a plurality of generally parallel holes 44 in a volume of the harder material, each hole being just large enough to accommodate a rod of optical material 36 to be polished. The rods 36 of optical material, produced by coring a boule, as previously described, are then inserted into the holes 44. The die 42 with inserted gain rods 36 is then sliced into wafers (step 512, Fig. 5) and processed as described previously. Once the processing is completed, the second material 28 in each of these embodiments can be removed chemically, mechanically, or thermally, depending on the properties of the two materials used.
In yet another embodiment, referring to Figs. 6, 6A and 7, a wafer 12, is created by embedding (step 710, Fig. 7) small pieces of optical material 26 in a thinner lattice of a second material 28. The resulting wafer 12 is then polished (step 712, Fig. 7) to produce a convex surface on each of the pieces of the optical material 26. The wafer 12 then undergoes subsequent processing (step 714, Fig. 7) as a wafer 12 before the second material 28 is removed (step 716, Fig. 7) . Again, the second material 28 can be removed chemically, mechanically, or thermally, depending on the properties of the two materials used. Other embodiments are within the following claims. What is claimed is:

Claims

Claims 1. A method of processing an optical material so as to produce a predetermined surface on an element of the material; producing a plurality of elements of the material, each element having an upper and a lower surface; arranging the plurality of elements such that adjacent elements are separated by interstitial material of a hardness different from the material being processed; processing said surfaces of said elements; and removing said interstitial material.
2. The method of claim 1 wherein the step of producing the plurality of elements results in relieving stress at the surface of the elements.
3. The method of claim 1 wherein the optical material is a glass.
4. The method of claim 1 wherein the optical material is a crystal.
5. The method of claim 1 wherein said step of producing a plurality of elements comprises the step of cutting said elements from a boule and wherein the step of processing said elements comprises the step of polishing said elements to produce convex surfaces.
6. The method of claim 5 wherein the step of cutting elements from said boule comprises the step of cutting a wafer from said boule and wherein the step of arranging the plurality of elements comprises the step of scoring the surfaces of the wafer into a waffle pattern, and wherein said interstitial material comprises the void formed by scoring.
7. The method of claim 6 wherein, following the step of polishing said elements, the wafer is cut along said scoring.
8. The method of claim 5 wherein the step of cutting elements from said boule comprises the step of coring said boule to produce a plurality of rods and the step of arranging said elements of said material comprises the steps of: embedding said rods in a material having a hardness less than the optical material to form a composite structure and slicing said composite structure to form a wafer.
9. The method of claim 8 wherein the material having a hardness less than the optical material is an epoxy.
10. The method of claim 1 wherein said step of producing a plurality of elements comprises the step of cutting said elements from a boule and wherein the step of processing said elements comprises the step of polishing said elements to produce concave surfaces.
11. The method of claim 10 wherein the step of cutting elements from said boule comprises the step of coring said boule to produce a plurality of rods and the step of arranging said elements of said material comprises the steps of: embedding said rods in a material having a hardness greater than the optical material to form a composite structure; and slicing said composite structure to form a wafer.
12. The method of claim 11 wherein the embedding of said rods in a material having a hardness greater than the optical material comprises the steps of: forming a die from a material harder than said optical material, said die comprising a volume defining a plurality of holes, said holes being large enough to accommodate said rods; and inserting said rods into said die.
13. The method of claim 1 wherein said processing produces an optical quality surface.
14. A method of producing a microchip laser comprising the steps of: producing a boule of gain material; slicing said boule into wafers; polishing a wafer so as to form a flat upper surface and a flat lower surface; said upper surface approximately parallel with said lower surface; scoring at least one said surface of said wafer into a plurality of elements arranged in a waffle pattern; polishing said scored wafer to form convex surfaces on each said element in said waffle pattern; processing the wafer to produce a resonant cavity on each said element on said wafer; and cutting the wafer along the scoring to separate each said individual resonant cavity element.
PCT/US1991/000398 1990-01-30 1991-01-22 Optical surface polishing method WO1991011820A1 (en)

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US472,100 1990-01-30

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EP0523861A2 (en) * 1991-06-21 1993-01-20 Mitsui Petrochemical Industries, Ltd. Optical device and method of manufacturing the same
WO1995010159A2 (en) * 1993-10-04 1995-04-13 Laser Power Corporation High resolution image projection system and method employing lasers
GB2331074A (en) * 1997-11-01 1999-05-12 Pilkington Micronics Limited Channelled glass substrate
US5990983A (en) * 1994-09-30 1999-11-23 Laser Power Corporation High resolution image projection system and method employing lasers
US6154259A (en) * 1996-11-27 2000-11-28 Photera Technologies, Inc. Multi-beam laser scanning display system with speckle elimination

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US6966820B1 (en) 2000-01-27 2005-11-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration High quality optically polished aluminum mirror and process for producing
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JP5572355B2 (en) * 2009-09-30 2014-08-13 富士フイルム株式会社 Lens array and lens array laminate
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Cited By (10)

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EP0523861A2 (en) * 1991-06-21 1993-01-20 Mitsui Petrochemical Industries, Ltd. Optical device and method of manufacturing the same
US5728509A (en) * 1991-06-21 1998-03-17 Mitsui Petrochemical Industries, Ltd. Method of manufacturing an optical device
US5999325A (en) * 1991-06-21 1999-12-07 Mitsui Chemicals, Inc. Optical device and method of manufacturing the same
US6178035B1 (en) 1991-06-21 2001-01-23 Mitsui Chemicals, Inc. Optical device and method of manufacturing the same
EP0523861B1 (en) * 1991-06-21 2001-03-28 Mitsui Chemicals, Inc. Optical device and method of manufacturing the same
WO1995010159A2 (en) * 1993-10-04 1995-04-13 Laser Power Corporation High resolution image projection system and method employing lasers
WO1995010159A3 (en) * 1993-10-04 1995-06-29 Laser Power Corp High resolution image projection system and method employing lasers
US5990983A (en) * 1994-09-30 1999-11-23 Laser Power Corporation High resolution image projection system and method employing lasers
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GB2331074A (en) * 1997-11-01 1999-05-12 Pilkington Micronics Limited Channelled glass substrate

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US5095664A (en) 1992-03-17

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