WO1990008110A1 - Compositions a base de verre devitrifiant pour substrats de circuits imprimes a faible expansion et encres - Google Patents
Compositions a base de verre devitrifiant pour substrats de circuits imprimes a faible expansion et encres Download PDFInfo
- Publication number
- WO1990008110A1 WO1990008110A1 PCT/US1990/000005 US9000005W WO9008110A1 WO 1990008110 A1 WO1990008110 A1 WO 1990008110A1 US 9000005 W US9000005 W US 9000005W WO 9008110 A1 WO9008110 A1 WO 9008110A1
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- WO
- WIPO (PCT)
- Prior art keywords
- percent
- oxide
- glass
- weight
- composition
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 53
- 239000000203 mixture Substances 0.000 title claims abstract description 30
- 239000000758 substrate Substances 0.000 title claims abstract description 22
- 239000000976 ink Substances 0.000 title abstract description 38
- 238000009472 formulation Methods 0.000 title abstract description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910052802 copper Inorganic materials 0.000 claims abstract description 23
- 239000010949 copper Substances 0.000 claims abstract description 23
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 14
- 239000000395 magnesium oxide Substances 0.000 claims description 11
- 239000000919 ceramic Substances 0.000 claims description 10
- 239000000945 filler Substances 0.000 claims description 10
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 9
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 6
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- UFQXGXDIJMBKTC-UHFFFAOYSA-N oxostrontium Chemical compound [Sr]=O UFQXGXDIJMBKTC-UHFFFAOYSA-N 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 239000011787 zinc oxide Substances 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 abstract description 8
- 239000010703 silicon Substances 0.000 abstract description 8
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 abstract description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000010410 layer Substances 0.000 abstract 1
- 239000002356 single layer Substances 0.000 abstract 1
- DAFHKNAQFPVRKR-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylpropanoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)C DAFHKNAQFPVRKR-UHFFFAOYSA-N 0.000 description 16
- 239000000843 powder Substances 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 239000003981 vehicle Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000000470 constituent Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000010304 firing Methods 0.000 description 3
- -1 for example Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229910001260 Pt alloy Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- IHWJXGQYRBHUIF-UHFFFAOYSA-N [Ag].[Pt] Chemical compound [Ag].[Pt] IHWJXGQYRBHUIF-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- ZYBBYRATQFXGNW-UHFFFAOYSA-N aluminum zinc barium(2+) silicate Chemical compound [Si]([O-])([O-])([O-])[O-].[Al+3].[Ba+2].[Zn+2] ZYBBYRATQFXGNW-UHFFFAOYSA-N 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009837 dry grinding Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- JUWSSMXCCAMYGX-UHFFFAOYSA-N gold platinum Chemical compound [Pt].[Au] JUWSSMXCCAMYGX-UHFFFAOYSA-N 0.000 description 1
- 230000007775 late Effects 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000010665 pine oil Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000205 poly(isobutyl methacrylate) Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 238000001238 wet grinding Methods 0.000 description 1
- 229910052844 willemite Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- 229910021489 α-quartz Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
- H01L21/481—Insulating layers on insulating parts, with or without metallisation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0036—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
- C03C10/0045—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents containing SiO2, Al2O3 and MgO as main constituents
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
Definitions
- This invention relates to novel devitrifying glasses and to substrates and inks made therefrom.
- novel devitrifying glasses which have temperature coefficients of expansion very closely matched to that of silicon and which are suitable for use as substrate material for direct mounting of very large silicon chips.
- the substrates are made by mixing the devitrifying glass with a ceramic filler. The mixture is then pressed and sintered into a fused body.
- the use of large silicon chips permits high density packaging of circuits, subassemblies and the like with the fewest number of processing steps.
- heat is generated in the chip, and thus large chips cannot be successfully mounted on a substrate unless the temperature coefficient of expansion of the chip material closely matches that of the substrate material.
- the devitrifying glasses which we formulated in the past in addition to having temperature coefficients of expansion essentially the same as that of silicon also have a high flow temperature (i.e., from 800°-900°C) during initial firing and possess excellent reheat stability up to about 1000°C after devitrification.
- the devitrifying glasses which were formulated in the past are comprised of zinc-barium-aluminum-silicate glasses that also contain minor amounts of phosphorous pentoxide, zirconium silicate and a member of the group of calcium oxide, magnesium oxide or mixtures thereof.
- the devitrifying glasses that we formulated in the past were made up of a mixture of seven or eight different materials. These different materials were mixed, on a weight basis, in the proper proportions.
- the present invention is directed to new formulations for a devitrifying glass having a temperature coefficient of expansion which closely matches that of silicon, and which requires only five materials mixed in the proper proportions. Moreover the thermal coefficient of expansion of a substrate comprised of this new devitrifying glass may be adjusted by the addition of an appropriate dielectric filler material to match that of gallium arsenide as well as silicon. Further, this devitrifying glass is particularly suitable for use as a constituent of various inks including (1) an overglaze ink coating compatible with copper electrodes, (2) a hermetic dielectric ink compatible with copper electrodes, (3) a copper via-fill ink for copper-dielectric multilayers, and (4) an inner layer copper ink for copper-dielectric multilayers.
- the relatively high softening temperature of the subject glasses means their inks can be refired in making subsequent layers without undue adverse effects on previous layers.
- the devitrifying glass formulations of the present invention comprise, on a weight basis: from about 26 to about 33 percent of zinc oxide (ZnO); from about 4 to about 8 percent of magnesium oxide
- MgO barium oxide
- SrO strontium oxide
- the above ingredients are mixed, dried and melted in an inert, e.g., platiunum, vessel at a temperature of about 1600°-1650°C .
- the melt is then quenched on counter rotating rollers to form vitreous glass flakes. These flakes are then made into a fine powder, having a particle size of about 1-5 micrometers, by a combination of dry and wet grinding in known manner.
- devitrifying glass suitably having a particle size of about 3-8 micrometers and ceramic filler, such as alumina, are blended with a suitable organic binder, solvent, surfactant and plasticizer, and tape cast and sintered to form a substrate.
- the ceramic filler aluminum oxide powder useful herein has a mean particle size of 0.62 micrometer.
- a commercially available useful product is AKP-20 from Sumitomo Chemical Company, Ltd. of Japan.
- the thermal coefficient of expansion can be increased to match that of gallium arsenide.
- the thermal coefficient of expansion can be decreased by adding willemite, cordierite or silicon dioxide as fillers in the fabrication of the substrate.
- devitrifying glass formulations of the present invention are superior to co-fired substrates based on alumina ceramics for several reasons.
- alumina ceramics require very high processing temperatures (1400° - 1 550° C), thus making it necessary to utilize more refractory metallizations, such as tungsten and molybdenum in making electrical contacts.
- substrates comprised of devitrifying glass based dielectrics can be processed at relatively low temperatures (900°C), permitting more conductive metals
- alumina ceramics have thermal expansion coefficients higher than that of silicon or gallium arsenide, and, hence, are not suitable for large area chip bonding.
- the devitrifying glass of the present invention is also suitable for use in preparing various types of inks employed in the fabrication of printed circuits by adding the glass particles to suitable metal powders and adding a suitable organic vehicle. Such printing inks can then be used for forming multilayer circuit boards on aluminum nitride or silicon carbide.
- Suitable metals for use as inks can be copper, for firing in nitrogen, or silver, silver-platinum alloy, gold or gold-platinum alloy, which can be fired in air.
- the organic vehicles are solutions of resin binders such as, for example, cellulose derivatives, particularly ethyl cellulose commercially available as ET-100 from Hercules, Inc.,. synthetic resins such as poly aery lates, polymethacrylates, polyesters, polyolefins and the like in a suitable solvent.
- resin binders such as, for example, cellulose derivatives, particularly ethyl cellulose commercially available as ET-100 from Hercules, Inc.,. synthetic resins such as poly aery lates, polymethacrylates, polyesters, polyolefins and the like in a suitable solvent.
- a preferred binder is poly(isobutylmethacrylate).
- conventional solvents utilized in inks of the type described herein may be used.
- Preferred commercially available solvents include, for example, pine oil, terpineol, butyl carbitol acetate, 2,2,4- trimethyl-2,3- ⁇ entanediol monisobutyrate, available from Texas Eastman Company under the trademark Texanol and the like.
- the above resin binders may be utilized individually or in any combination of two or more.
- a suitable viscosity modifier can be added to the resin material if desired.
- a modifier can be, for example, a castor oil derivative available from N. L. Industries under the trademark Thixatrol.
- the organic vehicles also suitably contain a surfactant such as olelyamine, available as Armeen O, or a high molecular weight N-alkyl-l,3-diaminopropane dioleate, available as Duomeen TDO, both from AKZO Chemie America.
- a surfactant such as olelyamine, available as Armeen O, or a high molecular weight N-alkyl-l,3-diaminopropane dioleate, available as Duomeen TDO, both from AKZO Chemie America.
- mixing is suitably carried out in a conventional apparatus which mixes in combination with subjecting the dispersion to high shearing action, such as a three roll mill.
- overglaze inks comprise between 50-90% by weight of the devitrifying glass of the invention and about 10- 50% of an organic vehicle.
- Dielectric inks comprise between 50- 90% of a mixture of ceramic fillers and the devitrifying glass of the invention, preferably 50-85% of the mixture being the devitrifying glass, and 10-15% of an organic vehicle.
- Copper via-fill inks can comprise at least about 50% by weight of copper, at least 25% by weight of the devitrifying glass of the invention and an organic vehicle.
- Copper inner layer inks can comprise copper, a small amount of the devitrifying glass of the invention, a small amount of metal oxides and an .organic vehicle.
- percent is by weight and temperature is given in degrees Celsius.
- EXAMPLE 1 Preparation of a Barium Oxide Containing Glass. The following oxides were mixed and melted at 1600°-
- the above oxides were mixed, melted at 1 00°-1650°C in a platinum crucible and quenched.
- Duomeen TDO 0.2 The glass powder and the organic vehicle were mixed on a three roll mill.
- the ink was screen printed and fired in nitrogen at 900° C , and tested for hermeticity and resistance to mild acids and mild alkali. The results were satisfactory. Leakage current was less than 10 ⁇ 6 A/cm ⁇ , which was also satisfactory.
- Duomeen TDO 0.2 The ink was screen printed and fired in nitrogen at 900° C .
- the ink was inert to mild acid and mild alkali and had a satisfactory leakage current of less than 10" 6 A/cm ⁇ .
- This ink was formulated as in Example 3 and used in combination with the dielectric ink of Example 4 to make a copper - dielectric multilayer printed circuit. There was no cracking or blistering in the vias.
- Example 3 This ink was formulated as in Example 3 and used in combination with the dielectric ink of Example 4 to make a copper - dielectric multilayer printed circuit. There was no via cracking or blistering in multilayer structures.
- EXAMPLE 7 Preparation of an Inner Layer Copper Ink.
- the above ink was also used for buried copper conductors in the copper/dielectric structure as above. No blistering was noted after firing, and the adhesion of a copper layer formed from the above ink was good on both the substrate and the dielectric.
- the devitirfying glass formulations of the present invention are useful both in making a substrate and in making multilayer copper-dielectric structures supported by a substrate of printed circuits on which silicon or gallium arsenide chips may be mounted, and then applying a hermetic-sealing overglaze to such fabricated printed circuits.
- such printed circuits may be comprised of co-fired buried copper layers within the substrate that make use of the devitrifying glass formulations of the present invention.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Dispersion Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
Les compositions à base de verre dévitrifiant à faible expansion décrites sont utiles dans des substrats monocouche ou multicouche destinés à la fabrication de cartes de circuits imprimés et présentant des coefficients d'expansion thermique qui correspondent à ceux des puces en silicium ou en arséniure de gallium de grande dimension. De telles compositions à base de verre dévitrifiant sont également utiles pour des encres à film épais compatibles avec de tels substrats, que ces encres soient du type couche de glaçage terminale, du type diélectrique, du type servant pour le remplissage de passages pour cuivres ou du type servant pour cuivres de couches internes.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29910489A | 1989-01-19 | 1989-01-19 | |
GB898921386A GB8921386D0 (en) | 1989-09-21 | 1989-09-21 | Devitrifying glass composition for low expansion substrate |
GB8921386.2 | 1989-09-21 | ||
US45099089A | 1989-12-15 | 1989-12-15 | |
US450,990 | 1989-12-15 | ||
US299,104 | 1994-09-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1990008110A1 true WO1990008110A1 (fr) | 1990-07-26 |
Family
ID=27264703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1990/000005 WO1990008110A1 (fr) | 1989-01-19 | 1990-01-02 | Compositions a base de verre devitrifiant pour substrats de circuits imprimes a faible expansion et encres |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0454734A4 (fr) |
JP (1) | JPH04502750A (fr) |
WO (1) | WO1990008110A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7037944B2 (en) | 2000-10-04 | 2006-05-02 | Aventis Pharma S.A. | Combination of a CB1 receptor antagonist and of sibutramine, the pharmaceutical compositions comprising them and their use in the treatment of obesity |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4191789A (en) * | 1978-11-02 | 1980-03-04 | Bell Telephone Laboratories, Incorporated | Fabrication of bi-level circuits |
US4570337A (en) * | 1982-04-19 | 1986-02-18 | Olin Corporation | Method of assembling a chip carrier |
US4620264A (en) * | 1983-12-23 | 1986-10-28 | Hitachi, Ltd. | Multi-layer ceramic wiring circuit board and process for producing the same |
US4714687A (en) * | 1986-10-27 | 1987-12-22 | Corning Glass Works | Glass-ceramics suitable for dielectric substrates |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3460967A (en) * | 1965-10-23 | 1969-08-12 | Owens Illinois Inc | Surface treatment of glasses |
-
1990
- 1990-01-02 WO PCT/US1990/000005 patent/WO1990008110A1/fr not_active Application Discontinuation
- 1990-01-02 EP EP19900902042 patent/EP0454734A4/en not_active Withdrawn
- 1990-01-02 JP JP50212190A patent/JPH04502750A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4191789A (en) * | 1978-11-02 | 1980-03-04 | Bell Telephone Laboratories, Incorporated | Fabrication of bi-level circuits |
US4570337A (en) * | 1982-04-19 | 1986-02-18 | Olin Corporation | Method of assembling a chip carrier |
US4620264A (en) * | 1983-12-23 | 1986-10-28 | Hitachi, Ltd. | Multi-layer ceramic wiring circuit board and process for producing the same |
US4714687A (en) * | 1986-10-27 | 1987-12-22 | Corning Glass Works | Glass-ceramics suitable for dielectric substrates |
Non-Patent Citations (1)
Title |
---|
See also references of EP0454734A4 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7037944B2 (en) | 2000-10-04 | 2006-05-02 | Aventis Pharma S.A. | Combination of a CB1 receptor antagonist and of sibutramine, the pharmaceutical compositions comprising them and their use in the treatment of obesity |
Also Published As
Publication number | Publication date |
---|---|
EP0454734A4 (en) | 1992-03-11 |
EP0454734A1 (fr) | 1991-11-06 |
JPH04502750A (ja) | 1992-05-21 |
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