WO1987006773A1 - Gas laser device - Google Patents
Gas laser device Download PDFInfo
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- WO1987006773A1 WO1987006773A1 PCT/JP1987/000260 JP8700260W WO8706773A1 WO 1987006773 A1 WO1987006773 A1 WO 1987006773A1 JP 8700260 W JP8700260 W JP 8700260W WO 8706773 A1 WO8706773 A1 WO 8706773A1
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- WO
- WIPO (PCT)
- Prior art keywords
- gas
- laser
- discharge
- main discharge
- discharge electrode
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
Definitions
- the present invention relates to a gas laser device g, and more particularly to a supply of a laser gas between discharge electrodes.
- the excimer laser which emits laser light by exciting the excimer state, has high efficiency and high output power. Since it is possible, it has been widely developed in recent years. In particular, because of its non-coherent nature, it can be used for, for example, tris d'arafi. ⁇ '
- a through-flow fan is provided in a cylindrical channel 100. Gas is flowed in the circumferential direction by the through-flow fan, and the gas passing through the heat exchanger 102 is discharged to the discharge section 103. Is configured to be
- one discharge pulse (hereinafter, one pulse) is applied in order to apply the energy of electrons to the gas by the discharge. It is necessary to blow off the gas every time, but in the above method, the pre-ionization gap where the gas is blown out is located on both sides of the main discharge electrode 104 of the discharge part 103. It is between 105 and 106.
- the present invention has been made in view of the above circumstances, and has as its object to reduce the gas circulation flow rate and reduce the load on the gas circulation device. Disclosure of light
- a small hole or a slit is formed in the discharge portion—surface of one of the main discharge electrodes, and the laser gas can be injected into the discharge region from this hole. To do so.
- the gas is ejected from one main discharge electrode directly to the other main discharge electrode into the discharge region, so that the discharge is performed extremely efficiently, and Gas circulating flow rate can be reduced because gas is not required to be circulated in the preliminary ionization gap that does not affect the performance of the user. Is reduced. Furthermore, it is possible to oscillate up to the number of repetitions, which was impossible with the conventional device.
- FIG. 1 is an explanatory view of an essential part of an excimer laser device according to an embodiment of the present invention
- FIG. 2 is a diagram showing a conventional laser device.
- FIG. 1 is a diagram showing a structure of a main part of a discharge section of an excimer laser device according to an embodiment of the present invention.
- This device is provided so as to face a first main discharge electrode (force source) 1 on a flat plate having a large number of holes h formed on the surface thereof and the first main discharge electrode.
- the main discharge of 2 includes gas discharge sections 4 a and 4 b disposed on both sides of the electrode 2, and includes a gas circulation device disposed in the vicinity of the gas supply section 3.
- Krypton fluoride (KrF) gas is ejected from the gas supply unit 3 through the hole h of the first main discharge electrode 1 by a once-through fan (not shown).
- 6 is a pre-discharge electrode
- g is a pre-ionization gap for equalizing discharge and increasing efficiency
- 7 is a capacitor for discharging the pre-discharge electrode
- 8 is a capacitor.
- 9 is a ground plate
- 10 is a capacitor circuit for generating a main discharge
- 11 is a first main circuit from the capacitor circuit 10.
- the gas laser device of the present invention may be used as an exposure device in a photolithography or as a processing device, and as an energy supply means for various devices. This is particularly effective for gas laser devices that require laser oscillation at a high repetition rate. '
- the shape of the gas supply hole formed in the main discharge electrode, the shape of the main discharge electrode, and the shape of the gas discharge portion, etc., are not limited to the examples. It can be changed as needed.
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
In a gas laser device in which a laser gas is injected between first and second main discharge electrodes (1 and 2) that are arranged in an opposing manner so that there takes place laser oscillation, an improvement is made in that small holes or slits (h) are bored throughout the surface in a discharge portion of the first main discharge electrode so that the laser gas may be injected into the discharge region through the holes or the slits. Therefore, the discharge takes place efficiently and the gas can be circulated in reduced amounts.
Description
明 钿 書 ガス レ ー ザ装置 技 術 分 野 Certificates Gas laser equipment Technical field
こ の発明 はガス レ ー ザ装 g に係 り 、 特に放電電極間 への レ ー ザガス の供給に関す る 。 技 術 The present invention relates to a gas laser device g, and more particularly to a supply of a laser gas between discharge electrodes. Technology
ァ ル ゴ ン 、 ク リ プ 卜 ン、 キセ ノ ン等の希ガス を塩素 フ ッ 、 臭素等のノヽ ロ ゲ ン と反応 さ せ る と共に、 放電 に よ る 電子の ェネ ルギー を付与 し > エキ シ マ状態に励 起せ し め る こ と に よ つ て、 レ ー ザ光を発す る よ ό に し た ェキ シ マ レ一ザは、 高効率.、. 高出力の発振力 <可能で あ る と か ら近年、 広 く 開発が進め ら れて き てお り 、 特に、 そ の非 コ ヒ ー レ ン 卜 な性質か ら フ 才 ト リ ソ ダラ フ ィ 一等への利用が注 目 さ れてい る ο ' It reacts rare gases such as argon, crypton, and xenon with chlorine, fluorine, bromine, and other halogens, and imparts the energy of electrons by discharging. The excimer laser, which emits laser light by exciting the excimer state, has high efficiency and high output power. Since it is possible, it has been widely developed in recent years. In particular, because of its non-coherent nature, it can be used for, for example, tris d'arafi. Ο '
ェキ シ マ レ一ザを は じ め と す る ガス レ ー ザ装置 に お い て は 、 例えば第 2 図 に示す如 く 円筒形の チ ャ ン ノく一 1 0 0 内 に貫流フ ァ ン 1 0 1 を Ε設 し 、 該貫流フ ァ ン に よ つ て円周方向 に ガス を流. し 、 .熱交換器 1 0 2 を通 つ た ガス が放 部 1 0 3 に射出せ し め ら れ る よ う に構 成 さ れてい る In a gas laser device including an excimer laser, for example, as shown in Fig. 2, a through-flow fan is provided in a cylindrical channel 100. Gas is flowed in the circumferential direction by the through-flow fan, and the gas passing through the heat exchanger 102 is discharged to the discharge section 103. Is configured to be
駆動 に 際 し て は、 放電に よ る ¾子の エネ ルギー を ガ ス に付与す る た め に 1 放電パルス （以下、 1 パルス ）
毎に ガス を吹 き 払 う 必要があ る が、 上記方式で は、 ガ ス を吹 き 払 う 範囲が放電部 1 0 3 の主放電電極 1 0 4 の 両側 に あ る 予備電離 ギ ャ ッ プ 1 0 5 , 1 0 6 間 と な る 。 At the time of driving, one discharge pulse (hereinafter, one pulse) is applied in order to apply the energy of electrons to the gas by the discharge. It is necessary to blow off the gas every time, but in the above method, the pre-ionization gap where the gas is blown out is located on both sides of the main discharge electrode 104 of the discharge part 103. It is between 105 and 106.
従 っ て、 1 パ ルス あ た り のガス の循環流量が多 く な る た め、 パ ルス の周波数が高 く な る と 、 ガス循環装置 の負担が大 き く な り 、 それに耐え る た め に は装置が大 型化 し て し ま う 等、 い ろ い ろ な不都合が生 じ て い た。 Therefore, the circulation rate of gas per pulse increases, and as the pulse frequency increases, the load on the gas circulator increases, and the gas can withstand it. For this reason, there were various inconveniences such as the equipment becoming larger.
本発明 は、 前記実情 に鑑みてな さ れた も ので、 ガス 循環流量を少な く し、 ガス循環装置への負担を低滅す る こ と を 目 的 と す る 。 明 の 開 示 The present invention has been made in view of the above circumstances, and has as its object to reduce the gas circulation flow rate and reduce the load on the gas circulation device. Disclosure of light
そ こ で本発 明 で は 、 一方 の 主放電電極の放電部分 —面に小 さ ぃ孔又はス リ ッ ト を あ け、 こ の孔か ら 放電 領域に レ ー ザガス を射出せ し め る よ う に し Τ い る 。 Therefore, in the present invention, a small hole or a slit is formed in the discharge portion—surface of one of the main discharge electrodes, and the laser gas can be injected into the discharge region from this hole. To do so.
かか る 構造に よ ήば 、 ガス は一方の主放電電極か ら 他方の主放電電極へ と 直接放電領域に射出せ し め ら れ る た め、 極めて効率良 く 放電が行な われ、 レ ー ザの性 能に影響の な い予備電離ギ ヤ ッ プ部分の ガス循環を行 な わ な く て も すむた め、 ガス循環流量を少な く す る こ と がで き ガス循環装置の負担が軽減 さ れ る 。 更に は、 従来装置で は不可能で あ っ た高辏 り 返 し数ま での発振 が可能 と な る 。
図 面 の 簡 単 な 説 明 According to such a structure, the gas is ejected from one main discharge electrode directly to the other main discharge electrode into the discharge region, so that the discharge is performed extremely efficiently, and Gas circulating flow rate can be reduced because gas is not required to be circulated in the preliminary ionization gap that does not affect the performance of the user. Is reduced. Furthermore, it is possible to oscillate up to the number of repetitions, which was impossible with the conventional device. Brief explanation of drawings
第 1 図 は、 本発明実施例の エキ シ マ レ ー ザ装置の要 部説明 図、 第 2 図 は、 従来例の レ ー ザ装置を、示す図で あ る O 発明を実施す る た めの最良の形態 以下、 本発明の実施例 につ いて図面を参照 し つつ詳 細 に 説明す る。 FIG. 1 is an explanatory view of an essential part of an excimer laser device according to an embodiment of the present invention, and FIG. 2 is a diagram showing a conventional laser device. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
第 1 図 は、 本発明実施例の エキ シ マ レ ー ザ装置の放 電部の要部の構造を示す図であ る 。 FIG. 1 is a diagram showing a structure of a main part of a discharge section of an excimer laser device according to an embodiment of the present invention.
こ の装置 は、 表面に多数の孔 h の形成 さ れた平板上 の第 1 の主放電電極 （ 力 ソ ー ド ） 1 と 該第 1 の主放電 電極に相対向 し て配設 さ れた チ ヤ ン （ c h a n g ) 型 の第 2 の主放電電極 （ア ノ ー ド） 2 と 、 前記第 1 の主 放電電極 1 の裏面側 に配設 さ れた ガス供給部 3 と ；： ίί 記第 2 の主放電.電極 2 の両側に配設 さ れ.たガ .ス排出部 4 a , 4 b と を具備 し てぉ 、 ガス 供耠部 3 の近傍に 配設 さ れたガス循環装置の貫流フ ァ ン （図示せず） に よ っ てガス供铪部 3 か ら第 1 の主放電電極 1 の孔 h を 介 し て弗化 ク リ プ ト ン （ K r F ) ガスが射出せ し め ら れ こ の第 1 お よ び第 2 の主放電電極間 に形成 さ れる 放 電部 5·で前記ガスが励起 （エキ シ マ ） 状態に さ れ、 基 底状態に落 ち る と き に レ ー ザ光を発す る よ う に し た も ので基底状態に落 ち た エキ シ マ は解離 し 、 ガス排出部
か ら排出せ し め られ再び循環装置 に民 る 0 This device is provided so as to face a first main discharge electrode (force source) 1 on a flat plate having a large number of holes h formed on the surface thereof and the first main discharge electrode. A second main discharge electrode (anode) 2 of a chang type; and a gas supply unit 3 disposed on the back side of the first main discharge electrode 1; The main discharge of 2 includes gas discharge sections 4 a and 4 b disposed on both sides of the electrode 2, and includes a gas circulation device disposed in the vicinity of the gas supply section 3. Krypton fluoride (KrF) gas is ejected from the gas supply unit 3 through the hole h of the first main discharge electrode 1 by a once-through fan (not shown). When the gas is excited (excimer) at the discharge section 5 formed between the first and second main discharge electrodes, the gas drops to the base state. Emits laser light So was also in cormorants by solution was while the blood drop to the ground state dissociates, gas discharge unit Discharged from the water and returned to the circulation system 0
6 は予備放電電極、 g は放電を一様化 し効率を上げ る ため の予備電離ギ ャ ッ プ、 7 予備放電電極に铪電 す る た めの コ ン デ ン サ、 8 は コ ン デ ン サ端子、 9 はァ 一.ス板、 1 0 は主放電を生起する た め の コ ン デ ン サ回 路、 1 1 は こ の コ ン デ ン サ回路 1 0 か ら第 1 の主放電 電極 1 への铪電を行な う た め の給電用 プ レ ー ト であ る かか る 装置で は、 放電部に対 し て極めて効率良 く ガ ス の供耠がな さ れ る 上、 ガス の排出 は、 第 2 の主放電 電極の両側に設け ら れたガス排出部を介 し て レ ー ザ発 振 に悪影響を与え る 部分のガス のみ を吹 き払 う よ う に な さ れ る た め、 設定 し た繰 り 返 し数に必要な ガス流量 を必要最少限度 に低減す る,こ と がで さ る o 産 業 上 の 利 用 可 能 性 以上の よ う に、 本発明の ガス レ ー ザ装置 は、 フ ォ ト リ ソ グラ フ ィ 一 に お け る 露光装置 と し て、 あ る い は、 加工装置 と し て、 更に各種装置の エネ ルギー供給手段 と し て有効で あ り 、 特に、 高繰 り 返 し数での レ ー ザ発 振の必要な ガス レ ー ザ装置 に有効であ る 。 ' 6 is a pre-discharge electrode, g is a pre-ionization gap for equalizing discharge and increasing efficiency, 7 is a capacitor for discharging the pre-discharge electrode, and 8 is a capacitor. 9 is a ground plate, 10 is a capacitor circuit for generating a main discharge, and 11 is a first main circuit from the capacitor circuit 10. In a device that is a power supply plate for supplying power to the discharge electrode 1, gas is supplied to the discharge portion with high efficiency. In addition, the gas is discharged so that only the gas which has a bad influence on the laser oscillation through the gas discharge portions provided on both sides of the second main discharge electrode is blown off. Therefore, the gas flow rate required for the set number of repetitions can be reduced to the minimum necessary.o More than the industrial availability In addition, the gas laser device of the present invention may be used as an exposure device in a photolithography or as a processing device, and as an energy supply means for various devices. This is particularly effective for gas laser devices that require laser oscillation at a high repetition rate. '
な お、 主放電電極に形成さ れ る ガス供給孔の形状は じ め主放電電極の形状、 お よ びガス排出部等の形状に つ い て は、 実施例 に限定 さ れ る こ と な く 適宜変更可能 で あ る 。
The shape of the gas supply hole formed in the main discharge electrode, the shape of the main discharge electrode, and the shape of the gas discharge portion, etc., are not limited to the examples. It can be changed as needed.
Claims
5 Five
WO 87/06773 一 一 PCT/JP87/00260 WO 87/06773 1-1 PCT / JP87 / 00260
請 求 の 範 囲 The scope of the claims
相対向 し て配設 さ れた第 1 お よ び第 2 の主放電電極 間 に レ ー ザガス を射出せ し め、 レ ー ザ発振を生起せ し め る よ う に し た ガス レ ー ザ装置 に お い て、 A gas laser in which laser gas is emitted between the first and second main discharge electrodes disposed opposite to each other to cause laser oscillation. In the device,
前記第 1 の主放電電極の放電面に多数個の ガス供铪 孔を配設 し 、 該ガス供耠孔を介 し て、 前記第 2 の主放 電電極に 向 けて レ ー ザガス を射出す る よ う に し た こ と を特徴 と す る ガス レ ー ザ装置。
A large number of gas supply holes are provided on the discharge surface of the first main discharge electrode, and laser gas is directed toward the second main discharge electrode via the gas supply holes. A gas laser device characterized in that the gas laser is emitted.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9567186 | 1986-04-24 | ||
| JP61/95671 | 1986-04-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1987006773A1 true WO1987006773A1 (en) | 1987-11-05 |
Family
ID=14143963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1987/000260 WO1987006773A1 (en) | 1986-04-24 | 1987-04-23 | Gas laser device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS6344779A (en) |
| WO (1) | WO1987006773A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7260134B2 (en) * | 2004-02-06 | 2007-08-21 | Coherent, Inc. | Dielectric coupled CO2 slab laser |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014531352A (en) | 2011-10-06 | 2014-11-27 | ジェイエスピー インターナショナル エスエイアールエルＪｓｐ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｓａｒｌ | Molding of plastic particulate material |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5068789A (en) * | 1973-10-23 | 1975-06-09 | ||
| JPS5783078A (en) * | 1980-09-18 | 1982-05-24 | Comp Generale Electricite | Gas laser |
-
1986
- 1986-06-30 JP JP15304486A patent/JPS6344779A/en active Pending
-
1987
- 1987-04-23 WO PCT/JP1987/000260 patent/WO1987006773A1/en unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5068789A (en) * | 1973-10-23 | 1975-06-09 | ||
| JPS5783078A (en) * | 1980-09-18 | 1982-05-24 | Comp Generale Electricite | Gas laser |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7260134B2 (en) * | 2004-02-06 | 2007-08-21 | Coherent, Inc. | Dielectric coupled CO2 slab laser |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6344779A (en) | 1988-02-25 |
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