WO1979000283A1 - Positive type resist polymer composition and method of making resist patterns - Google Patents
Positive type resist polymer composition and method of making resist patterns Download PDFInfo
- Publication number
- WO1979000283A1 WO1979000283A1 PCT/JP1978/000021 JP7800021W WO7900283A1 WO 1979000283 A1 WO1979000283 A1 WO 1979000283A1 JP 7800021 W JP7800021 W JP 7800021W WO 7900283 A1 WO7900283 A1 WO 7900283A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- unit
- units
- positive type
- polymer composition
- copolymer consisting
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE7878900234T DE2861975D1 (en) | 1977-11-07 | 1978-11-06 | Positive type resist polymer composition and method of making resist patterns |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13333677A JPS5466122A (en) | 1977-11-07 | 1977-11-07 | Pattern formation material |
JP77/133336 | 1977-11-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1979000283A1 true WO1979000283A1 (en) | 1979-05-31 |
Family
ID=15102327
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1978/000021 WO1979000283A1 (en) | 1977-11-07 | 1978-11-06 | Positive type resist polymer composition and method of making resist patterns |
Country Status (5)
Country | Link |
---|---|
US (1) | US4273856A (ja) |
EP (1) | EP0006939B1 (ja) |
JP (1) | JPS5466122A (ja) |
DE (1) | DE2861975D1 (ja) |
WO (1) | WO1979000283A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5466829A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Pattern formation materil |
JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
DE3036615A1 (de) * | 1980-09-29 | 1982-05-13 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von resiststrukturen |
CA1207099A (en) * | 1981-12-19 | 1986-07-02 | Tsuneo Fujii | Resist material and process for forming fine resist pattern |
DE3246825A1 (de) * | 1982-02-24 | 1983-09-01 | Max Planck Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen | Positives resistmaterial |
JPS6230665U (ja) * | 1985-08-10 | 1987-02-24 | ||
KR100599754B1 (ko) | 2004-06-29 | 2006-07-12 | 삼성에스디아이 주식회사 | 이차 전지와 이차 전지의 캡 조립체 및 캡 조립체의 단자조립 방법 |
US9502710B2 (en) | 2012-09-06 | 2016-11-22 | Johnson Controls Technology Llc | Cell terminal seal system and method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3981985A (en) * | 1972-12-21 | 1976-09-21 | U.S. Philips Corporation | Positive-working electron resists |
JPS51117577A (en) * | 1975-03-20 | 1976-10-15 | Philips Nv | Positive operation type electron resist |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52153672A (en) * | 1976-06-16 | 1977-12-20 | Matsushita Electric Ind Co Ltd | Electron beam resist and its usage |
-
1977
- 1977-11-07 JP JP13333677A patent/JPS5466122A/ja active Granted
-
1978
- 1978-11-06 WO PCT/JP1978/000021 patent/WO1979000283A1/ja unknown
- 1978-11-06 DE DE7878900234T patent/DE2861975D1/de not_active Expired
-
1979
- 1979-06-06 EP EP78900234A patent/EP0006939B1/en not_active Expired
- 1979-07-02 US US06/112,309 patent/US4273856A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3981985A (en) * | 1972-12-21 | 1976-09-21 | U.S. Philips Corporation | Positive-working electron resists |
JPS51117577A (en) * | 1975-03-20 | 1976-10-15 | Philips Nv | Positive operation type electron resist |
Non-Patent Citations (1)
Title |
---|
See also references of EP0006939A4 * |
Also Published As
Publication number | Publication date |
---|---|
DE2861975D1 (en) | 1982-09-16 |
JPS5624254B2 (ja) | 1981-06-04 |
EP0006939A1 (en) | 1980-01-23 |
JPS5466122A (en) | 1979-05-28 |
EP0006939B1 (en) | 1982-07-28 |
EP0006939A4 (en) | 1980-05-21 |
US4273856A (en) | 1981-06-16 |
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