JPS5624254B2 - - Google Patents
Info
- Publication number
- JPS5624254B2 JPS5624254B2 JP13333677A JP13333677A JPS5624254B2 JP S5624254 B2 JPS5624254 B2 JP S5624254B2 JP 13333677 A JP13333677 A JP 13333677A JP 13333677 A JP13333677 A JP 13333677A JP S5624254 B2 JPS5624254 B2 JP S5624254B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13333677A JPS5466122A (en) | 1977-11-07 | 1977-11-07 | Pattern formation material |
PCT/JP1978/000021 WO1979000283A1 (en) | 1977-11-07 | 1978-11-06 | Positive type resist polymer composition and method of making resist patterns |
DE7878900234T DE2861975D1 (en) | 1977-11-07 | 1978-11-06 | Positive type resist polymer composition and method of making resist patterns |
EP78900234A EP0006939B1 (en) | 1977-11-07 | 1979-06-06 | Positive type resist polymer composition and method of making resist patterns |
US06/112,309 US4273856A (en) | 1977-11-07 | 1979-07-02 | Positive resist terpolymer composition and method of forming resist pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13333677A JPS5466122A (en) | 1977-11-07 | 1977-11-07 | Pattern formation material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5466122A JPS5466122A (en) | 1979-05-28 |
JPS5624254B2 true JPS5624254B2 (ja) | 1981-06-04 |
Family
ID=15102327
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13333677A Granted JPS5466122A (en) | 1977-11-07 | 1977-11-07 | Pattern formation material |
Country Status (5)
Country | Link |
---|---|
US (1) | US4273856A (ja) |
EP (1) | EP0006939B1 (ja) |
JP (1) | JPS5466122A (ja) |
DE (1) | DE2861975D1 (ja) |
WO (1) | WO1979000283A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6230665U (ja) * | 1985-08-10 | 1987-02-24 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5466829A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Pattern formation materil |
JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
DE3036615A1 (de) * | 1980-09-29 | 1982-05-13 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von resiststrukturen |
EP0090089B1 (en) * | 1981-12-19 | 1988-10-05 | Daikin Kogyo Co., Ltd. | Resist material and process for forming fine resist pattern |
DE3246825A1 (de) * | 1982-02-24 | 1983-09-01 | Max Planck Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen | Positives resistmaterial |
KR100599754B1 (ko) | 2004-06-29 | 2006-07-12 | 삼성에스디아이 주식회사 | 이차 전지와 이차 전지의 캡 조립체 및 캡 조립체의 단자조립 방법 |
US9502710B2 (en) | 2012-09-06 | 2016-11-22 | Johnson Controls Technology Llc | Cell terminal seal system and method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3981985A (en) * | 1972-12-21 | 1976-09-21 | U.S. Philips Corporation | Positive-working electron resists |
JPS51117577A (en) * | 1975-03-20 | 1976-10-15 | Philips Nv | Positive operation type electron resist |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52153672A (en) * | 1976-06-16 | 1977-12-20 | Matsushita Electric Ind Co Ltd | Electron beam resist and its usage |
-
1977
- 1977-11-07 JP JP13333677A patent/JPS5466122A/ja active Granted
-
1978
- 1978-11-06 DE DE7878900234T patent/DE2861975D1/de not_active Expired
- 1978-11-06 WO PCT/JP1978/000021 patent/WO1979000283A1/ja unknown
-
1979
- 1979-06-06 EP EP78900234A patent/EP0006939B1/en not_active Expired
- 1979-07-02 US US06/112,309 patent/US4273856A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3981985A (en) * | 1972-12-21 | 1976-09-21 | U.S. Philips Corporation | Positive-working electron resists |
JPS51117577A (en) * | 1975-03-20 | 1976-10-15 | Philips Nv | Positive operation type electron resist |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6230665U (ja) * | 1985-08-10 | 1987-02-24 |
Also Published As
Publication number | Publication date |
---|---|
EP0006939A1 (en) | 1980-01-23 |
US4273856A (en) | 1981-06-16 |
JPS5466122A (en) | 1979-05-28 |
EP0006939A4 (en) | 1980-05-21 |
WO1979000283A1 (en) | 1979-05-31 |
EP0006939B1 (en) | 1982-07-28 |
DE2861975D1 (en) | 1982-09-16 |