UST961007I4 - Production of electrically conductive paths on an insulating substrate - Google Patents

Production of electrically conductive paths on an insulating substrate Download PDF

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Publication number
UST961007I4
UST961007I4 US05/712,373 US71237376A UST961007I4 US T961007 I4 UST961007 I4 US T961007I4 US 71237376 A US71237376 A US 71237376A US T961007 I4 UST961007 I4 US T961007I4
Authority
US
United States
Prior art keywords
substrate
contacting
conductive paths
nickel
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
US05/712,373
Inventor
Alan W. Jukes
Michael J. Packham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Application granted granted Critical
Publication of UST961007I4 publication Critical patent/UST961007I4/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/185Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging

Abstract

this process applies to printed circuits obtained by the imagewise deposition of nickel using a procedure such as that described in U.S. Pat. No. 3,853,589 followed by electroless copper plating onto the nickel pattern. We have found that by depositing the nickel before the copper, as compared with direct deposition of the copper, gives less deposition on the areas between the conductive paths and hence better insulation between them.
The process can be performed in five stages including (a) coating a substrate, for instance by a gravure technique, with an active agent including a water-soluble quaternized bipyridilium compound, e.g. N,N'-dimethyl-4,4'-bipyridilium dimethosulphate or N,N'-bis(4-cyanophenyl)4,4"-bipyridilium dichloride and a suitable binder therefore such as polyvinyl alcohol, (b) imagewise exposing the coating where the conductive paths are to be deposited to sensitizing radiation, (c) contacting the surface with a solution of palladium chloride in hydrochloric acid, preferably containing 0.5 to 0.15 g/l PdCl2, (d) contacting the substrate with an aqueous electroless nickel plating bath, preferably at pH 8 to 9, and (e) contacting the substrate with an electroless copper plating bath.
Further reduction in the metal deposition between the conductive paths is obtained by contacting the surface of the substrate with an aqueous solution of a reducing agent such as sodium hypophosphite between steps (c) and (d), rubbing the surface of the substrate between steps (d) and (e), or both procedures.
US05/712,373 1975-08-12 1976-08-06 Production of electrically conductive paths on an insulating substrate Pending UST961007I4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
UK33542/75 1975-08-12
GB33542/75A GB1499552A (en) 1975-08-12 1975-08-12 Production of electrically conductive paths on an insulating substrate

Publications (1)

Publication Number Publication Date
UST961007I4 true UST961007I4 (en) 1977-08-02

Family

ID=10354299

Family Applications (1)

Application Number Title Priority Date Filing Date
US05/712,373 Pending UST961007I4 (en) 1975-08-12 1976-08-06 Production of electrically conductive paths on an insulating substrate

Country Status (2)

Country Link
US (1) UST961007I4 (en)
GB (1) GB1499552A (en)

Also Published As

Publication number Publication date
GB1499552A (en) 1978-02-01

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