USRE36573E - Method for producing thick ceramic films by a sol gel coating process - Google Patents
Method for producing thick ceramic films by a sol gel coating process Download PDFInfo
- Publication number
- USRE36573E USRE36573E US08/938,996 US93899697A USRE36573E US RE36573 E USRE36573 E US RE36573E US 93899697 A US93899697 A US 93899697A US RE36573 E USRE36573 E US RE36573E
- Authority
- US
- United States
- Prior art keywords
- iaddend
- iadd
- film
- substrate
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 52
- 238000000576 coating method Methods 0.000 title claims description 40
- 238000004519 manufacturing process Methods 0.000 title abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 61
- 239000002131 composite material Substances 0.000 claims abstract description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 60
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 43
- 230000008569 process Effects 0.000 claims description 33
- 239000000843 powder Substances 0.000 claims description 29
- 239000011248 coating agent Substances 0.000 claims description 25
- 239000006185 dispersion Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 239000010935 stainless steel Substances 0.000 claims description 18
- 229910001220 stainless steel Inorganic materials 0.000 claims description 18
- 229910002086 ceria-stabilized zirconia Inorganic materials 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 238000010304 firing Methods 0.000 claims description 14
- 125000002524 organometallic group Chemical group 0.000 claims description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 12
- 238000002156 mixing Methods 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- 229910000975 Carbon steel Inorganic materials 0.000 claims description 9
- 239000011575 calcium Substances 0.000 claims description 9
- 229910052791 calcium Inorganic materials 0.000 claims description 9
- 239000010962 carbon steel Substances 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 9
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 8
- 150000003839 salts Chemical class 0.000 claims description 8
- -1 salts carboxylates Chemical class 0.000 claims description 8
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 8
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 8
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- 239000000470 constituent Substances 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 6
- DJOYTAUERRJRAT-UHFFFAOYSA-N 2-(n-methyl-4-nitroanilino)acetonitrile Chemical compound N#CCN(C)C1=CC=C([N+]([O-])=O)C=C1 DJOYTAUERRJRAT-UHFFFAOYSA-N 0.000 claims description 5
- 229910001053 Nickel-zinc ferrite Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 3
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 3
- XYJRXVWERLGGKC-UHFFFAOYSA-D pentacalcium;hydroxide;triphosphate Chemical compound [OH-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O XYJRXVWERLGGKC-UHFFFAOYSA-D 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000011888 foil Substances 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 150000004703 alkoxides Chemical class 0.000 claims 3
- 150000002576 ketones Chemical class 0.000 claims 3
- 150000007942 carboxylates Chemical class 0.000 claims 2
- 150000001247 metal acetylides Chemical class 0.000 claims 1
- 239000003973 paint Substances 0.000 abstract description 8
- 239000002245 particle Substances 0.000 abstract description 4
- 239000011368 organic material Substances 0.000 abstract description 3
- 239000002002 slurry Substances 0.000 abstract 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 36
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 30
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 14
- 239000010410 layer Substances 0.000 description 12
- 238000004528 spin coating Methods 0.000 description 12
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 12
- 239000008367 deionised water Substances 0.000 description 11
- 229910021641 deionized water Inorganic materials 0.000 description 11
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 10
- 239000012071 phase Substances 0.000 description 9
- 229960000583 acetic acid Drugs 0.000 description 8
- 229910001026 inconel Inorganic materials 0.000 description 8
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 8
- 229910000831 Steel Inorganic materials 0.000 description 7
- 150000001768 cations Chemical class 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229920001223 polyethylene glycol Polymers 0.000 description 7
- 239000010959 steel Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 6
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000001464 adherent effect Effects 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 5
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000003618 dip coating Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000010422 painting Methods 0.000 description 4
- 238000004626 scanning electron microscopy Methods 0.000 description 4
- 238000003980 solgel method Methods 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- 238000007792 addition Methods 0.000 description 3
- 238000005524 ceramic coating Methods 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 229940046892 lead acetate Drugs 0.000 description 3
- 229910002077 partially stabilized zirconia Inorganic materials 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000005030 aluminium foil Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- VSGNNIFQASZAOI-UHFFFAOYSA-L calcium acetate Chemical compound [Ca+2].CC([O-])=O.CC([O-])=O VSGNNIFQASZAOI-UHFFFAOYSA-L 0.000 description 2
- 239000001639 calcium acetate Substances 0.000 description 2
- 229960005147 calcium acetate Drugs 0.000 description 2
- 235000011092 calcium acetate Nutrition 0.000 description 2
- 150000001721 carbon Chemical class 0.000 description 2
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000012362 glacial acetic acid Substances 0.000 description 2
- RLJMLMKIBZAXJO-UHFFFAOYSA-N lead nitrate Chemical compound [O-][N+](=O)O[Pb]O[N+]([O-])=O RLJMLMKIBZAXJO-UHFFFAOYSA-N 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- NFSAPTWLWWYADB-UHFFFAOYSA-N n,n-dimethyl-1-phenylethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=CC=C1 NFSAPTWLWWYADB-UHFFFAOYSA-N 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- ZGSOBQAJAUGRBK-UHFFFAOYSA-N propan-2-olate;zirconium(4+) Chemical compound [Zr+4].CC(C)[O-].CC(C)[O-].CC(C)[O-].CC(C)[O-] ZGSOBQAJAUGRBK-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000004901 spalling Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910002076 stabilized zirconia Inorganic materials 0.000 description 2
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 2
- NGDQQLAVJWUYSF-UHFFFAOYSA-N 4-methyl-2-phenyl-1,3-thiazole-5-sulfonyl chloride Chemical compound S1C(S(Cl)(=O)=O)=C(C)N=C1C1=CC=CC=C1 NGDQQLAVJWUYSF-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910001308 Zinc ferrite Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- VGBWDOLBWVJTRZ-UHFFFAOYSA-K cerium(3+);triacetate Chemical compound [Ce+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VGBWDOLBWVJTRZ-UHFFFAOYSA-K 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052588 hydroxylapatite Inorganic materials 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- IKNCGYCHMGNBCP-UHFFFAOYSA-N propan-1-olate Chemical compound CCC[O-] IKNCGYCHMGNBCP-UHFFFAOYSA-N 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- PEHFQFMIFBWEMT-UHFFFAOYSA-M strontium;cerium(3+);acetate;nitrate Chemical compound [Sr+2].[Ce+3].CC([O-])=O.[O-][N+]([O-])=O PEHFQFMIFBWEMT-UHFFFAOYSA-M 0.000 description 1
- RXSHXLOMRZJCLB-UHFFFAOYSA-L strontium;diacetate Chemical compound [Sr+2].CC([O-])=O.CC([O-])=O RXSHXLOMRZJCLB-UHFFFAOYSA-L 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000012720 thermal barrier coating Substances 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- PMTRSEDNJGMXLN-UHFFFAOYSA-N titanium zirconium Chemical compound [Ti].[Zr] PMTRSEDNJGMXLN-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- OBROYCQXICMORW-UHFFFAOYSA-N tripropoxyalumane Chemical compound [Al+3].CCC[O-].CCC[O-].CCC[O-] OBROYCQXICMORW-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- WGEATSXPYVGFCC-UHFFFAOYSA-N zinc ferrite Chemical compound O=[Zn].O=[Fe]O[Fe]=O WGEATSXPYVGFCC-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62218—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic films, e.g. by using temporary supports
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
- C23C18/127—Preformed particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
Definitions
- This invention relates to the production of thick ceramic films, including composite films, on selected substrates, using a sol-gel coating technique. More particularly this invention relates to a technique for depositing polycrystalline ceramic films such as lead zirconate titanate and partially stabilized zirconia, in thicknesses greater than 10 ⁇ m.
- Ceramic coatings can be prepared by thermal or plasma spraying and physical vapour deposition (PVD) techniques.
- PVD physical vapour deposition
- a bulk powder is passed through a plasma and directed towards a substrate where it cools on contact. Films up to 10 mm thick can be produced in this way but usually need post-deposition heating as the deposited film tends to be porous (10% porosity is considered good).
- Another drawback of the plasma spray technique is that only line of sight geometries can be successfully coated.
- PVD expensive vacuum systems are required to coat high quality ceramic films of less than 10 ⁇ m. In addition this technique is also limited to line of sight geometries.
- sol-gel processing An alternative method, which has gained considerable ground and credibility in recent years, is sol-gel processing.
- Organo-metallic precursor compounds of the desired ceramic oxides are mixed and dissolved in a suitable solvent.
- the resultant solution is then hydrolysed to form a structured solution or gel containing organo-metallic polymers or macroclusters.
- Additives can be added to control the viscosity and surface tension of the sol gel solution.
- Films are prepared by either spin, dip or spray coating or painting onto an appropriate substrate.
- the coated substrate is then fired to remove the organic material and a post-fire heating step is usually performed to fully develop the final ceramic structure.
- the sol gel process has several advantages over other fabrication methods. It is simple, more economically feasible and permits coating of complex geometries, not necessarily line of sight.
- Ceramic films up to about 0.5 ⁇ m can be deposited in a single layer but films up to about 3.0 ⁇ m have been produced using a complex vacuum controlled firing treatment. Thicker films, up to about 10 ⁇ m in thickness have been produced by successive coatings in 0.1 ⁇ m layers. Clearly a 10 ⁇ m film made 0.1 ⁇ m at a time is a very time consuming and laborious process. In order to exploit the desired properties of the ceramic, it is essential that the ceramic film should be crack-free. Sol Gel films are, however, very susceptible to substrate interaction, defects and stresses within the film. Generally the thinner the film the lower the internal stresses and the number of defects.
- Solvents and organics can escape from 0.1 ⁇ m layers relatively easily but for thicker layers this is not so resulting in defects which can act as nucleation centres for crack propagation.
- Sol gel films are also substrate dependent and most films are limited to metallized silicon or other highly polished substrates. Conventional sol gel technology cannot, therefore, be used to produce thick, large area sol gel films.
- An object of the present invention is to provide an improved method for applying adherent ceramic films to metallic substrates in thicknesses greater than 5 ⁇ m and at least up to 200 ⁇ m without cracking.
- Another object is to provide an improved sol-gel process for producing polycrystalline ceramic coatings on a wide range of substrates.
- a process for producing a crack-free crystalline film selected from stabilized zirconia .[.or.]. .Iadd.and .Iaddend.titania on a substrate selected from aluminum foil and stainless steel comprising:
- sol gel mixture selected from titania and zirconia and a solution of a metal salt with up to 90% by weight of yttria or ceria stabilized zirconia powder or pure titania powder in a size range between .1 and 10 microns so as to produce a stable dispersion.
- sol-gel processing techniques first require the preparation of an organo-metallic solution of the desired ceramic oxide precursors in an organic solvent, followed by hydrolysation and pyrolysation to remove the organic phase. Similar techniques are followed in the present invention with the important distinction that the primary organo-metallic solution is mixed with ceramic particles and subjected to ultrasonic mixing to form a sol gel based paint which can be deposited on simple or complex geometry substrates by either spin, dip or spray coating or painting, followed by hydrolysation, pyrolysation and heating in air. Typical formulations are described below and it is emphasized that these formulations are not critical but may be varied widely.
- Zirconium propoxide, acetylacetone and methoxyethanol were mixed in a molar ratio of 1:1:4. Water, glycerol and ethylene glycol were then added to adjust viscosity.
- Ceramic powders were added to the solutions (a)-(f) above and mixed ultrasonically to provide uniform stable dispersions.
- Ceramic powders may be selected from a wide range of materials, including alumina, silica titania, zirconia, silicon carbide, titanium carbide and PZT. Preferred ceramic powders in selected sol gel solutions are shown in Table 1 below.
- the paints prepared above may be applied to any suitable substrate either by dipping, spin coating or spraying or painting as any conventional sol gel is used.
- Planar, coaxial and complex geometry substrates can be readily coated. Examples of these include metals, inside and outside of tubes, complex objects such as steel nuts and orthopaedic implants.
- Films of greater than 5 ⁇ m and up to at least 200 ⁇ m in thickness can be applied by spin coating multiple layers. A single layer up to 6 ⁇ m in thickness can be deposited without cracking.
- the ceramic/sol gel paint Following deposition of the ceramic/sol gel paint on the substrate, it is heated in air to a temperature between 400° C. and 700° C., depending upon the particular substrate and coating, for a period of 1 to 30 minutes so as to remove the organic materials and form the oxide compounds. After the first firing, additional layers may be deposited and fired until the desired thickness has been obtained. Thereafter, the films may be heated at a temperature between 400° C. and 1000° C., preferably about 550° C. for a period of up to about 4 hours, preferably about 1 hour.
- Titania films using both the calcium zirconate and calcium titanate sol gel could be deposited onto stainless steel and fired at 700° C. and could be heated at 900° C. However upon cooling from 900° C. to room temperature, the substrate began to bow and the titania coating began to "pop off". The failure of the titania film is believed due to the thermal expansion mismatch between the ceramic and the substrate. Zirconia films were prepared in similar manner as the titania but did not fail. Therefore, it appears that zirconia does not suffer from thermal expansion mismatch as greatly as the titania.
- YSZ and CSZ films were prepared using a calcium modified zirconia sol gel solution and were deposited onto soft steel, stainless steel, inconel and carbon/carbon composite. Spin coated films produced excellent results and provided films which were adherent. The surface morphology of these coatings was rough and irregular. However, when electroded with silver paint the films were found to be insulating indicating that they are pin hole and crack-free. Polishing the sample with 0.3 ⁇ m diamond paste resulted in smooth and shiny surface on the ceramic. Scanning electrode microscopy observation of the polished sample did not disclose any holes, pores or defects in the sample. Film thicknesses were determined by mounting the sample edgewise in epoxy resin, polishing the edge and comparing the sample to a grid within an optical microscope.
- the film thickness of a 20 layer coating was 60 ⁇ m.
- CSZ films (20 layers) were prepared by spin coating onto a 2 cm by 3.5 cm inconel coupon, firing at 700° C. and heated overnight at 900° C. The sample was then thermal cycled 10 times from room temperature to 1300° C. The sample showed no delamination or spalling after the test.
- YSZ and CSZ films were successfully coated onto a variety of substrates, these include soft steel, stainless steel, inconel and carbon/carbon composites coupons and soft steel, stainless steel and inconel rods.
- the PZT films produced according to the present invention find industrial application in the production of integrated sensor and actuator devices in which the piezoelectric device and semiconductor circuitry are deposited on the same chip to form so called “smart structures".
- Piezoelectric PZT films deposited on optical fibres may be used as integrated optical phase modulators or to produce steerable optical fibres.
- the zirconia and alumina coatings have structural applications. Examples of these are:
- Thermal barrier coatings where the ceramic is used to provide a thermal gradient between the surface of the film and the metal substrate. This allows metallic components in turbine engines and heat exchanger to be operated at high temperatures.
- Films were deposited onto planar substrates by spin coating and subsequently fired at 400° C. Thicker films were achieved by repeating the sequence until the desired thickness was obtained. The films were then heated at 650° C. for 1 hour. Fibres and wires were coated using an automated dipping system.
- PZT films deposited onto planar substrates produced crack free films that were 9-60 ⁇ m thick.
- the films were found insulating indicating that they were pinhole free. Under observation by scanning electron microscopy, the films appeared .Iadd.to be .Iaddend.dense.
- the dielectric and piezoelectric properties obtained for these films was comparable to bulk material. In fact these films were found to be of sufficient quality to produce piezoelectric cantilevers which were 4 cm long and 0.5 cm wide and, at the fundamental resonance frequencies, vibrate with deflections observable with naked eye (0.8 mm).
- PZT coatings on fibres and wires achieved coatings of 10-30 ⁇ m in thickness. These coatings were also of high enough quality to produce an "In-line Optic Phase Modular" device where the PZT was 30 ⁇ m thick.
- the development of zirconia and titania films was carried out in two stages.
- the first stage involved the fabrication of zirconia and titania films without adding inorganic additives to the sol gel solution and the second investigated the use of inorganic additives to improve both the distribution of the particles within the film and its adhesion to substrates.
- Titania and zirconia sol gel mixtures were prepared by mixing 4 g of either zirconium propoxide or titanium isopropoxide with 3 g acetic acid, 2 g DDW, 0.5 g polyethylene glycol and 0.5 g glycerol. Either 4 g of yttria partially stabilized zirconia or titania powder was added to the appropriate sol gel solution and the mixture sonified for at least 5 min. The films were then deposited onto aluminium foil and stainless steel coupons by spin coating and firing at 500° C. Films heated above 600° C. tended not to adhere to the substrate and could be rubbed off.
- Modified sol gel mixtures were made by adding a metal salt.
- 2 g of a metal salt (either lead nitrate, lead acetate, calcium nitrate, calcium acetate, strontium acetate, strontium nitrate cerium acetate, cerium nitrate and yttrium acetate and yttrium nitrate) was dissolved in 4 g of acetic acid.
- acetic acid 8 g of zirconium propoxide or titanium isopropoxide or a mixture of zirconium propoxide (6 g) and titanium isopropoxide (4 g) was added along with 2.5 g DDW, 1 g polyethylene glycol and 1 g glycerol.
- Ceramic powder (4 g), either yttria or ceria partially stabilized zirconia (YSZ or CSZ) or titania was added to the solution and sonified for at least 5 min. The films were then deposited on to stainless steel coupons as in the previous example and were found to have excellent adhesion. Without wishing to be bound by this explanation it is believed that the added metal cation suppresses the disruptive tetragonal to monoclinic phase change which occurs in zirconia. Sol gel zirconia undergoes a number of phase changes as a result of changes in temperature. Conventional sol gel films (ones prepared without the addition of ceramic powders) are amorphous when deposited at room temperatures. The material becomes tetragonal when heated to between 400-600° C.
- This phase persists when the material is cooled back down to room temperatures. However, if the film is heated above 600° C. and cooled back to room temperature, the monoclinic phase is also present in the material. This monoclinic phase is 5 volume % larger than the tetragonal. The corresponding variations in the volume throughout the multiphase material causes the ceramic to break apart (resulting in poor adhesion). However, when metal cations such as calcium, magnesium, cerium or yttrium are added to conventional zirconia sol gel solutions, this tetragonal to monoclinic phase transformation is suppressed and the integrity of the ceramic body is maintained throughout the temperature range below 2300° C.
- metal cations such as calcium, magnesium, cerium or yttrium
- metal cations discussed calcium is preferred because of its high solubility in all of the solvents used to make the sol gel solutions.
- Other metal cations, while also capable of suppressing the tetragonal to monoclinic phase change, are not as soluble as calcium and are more difficult to work with.
- Modified sol gel dispersions of CSZ and YSZ were either spin or dip coated onto soft steel, stainless steel, Inconel® and carbon/carbon composite.
- the dispersions were prepared by dissolving 2 g of calcium nitrate in 4 g of acetic acid. To the resulting solution 8.5 g of zirconium propoxide, 2.5 g DDW and 1 g each of polyethylene glycol and glycerol. Ceramic powder (4 g) was added as before. Coatings on soft steel were fired and heated for at least 8 hours at 500° C. Coatings on stainless steel and Inconel® were fired at 700° C. and heated for at least 8 hours at 700° C. and 900° C. respectively. Coatings on carbon/ carbon composites were fired at 450° C. Rods of carbon steel, stainless steel and inconel were dip coated and fired and heated in a manner similar to the coupons.
- Calcium zirconate coatings were deposited onto stainless steel coupons by spin coating, firing at 700° C. and heating at 900° C. for at least 8 hours.
- the calcium zirconate sol gel was prepared by dissolving propoxide (8.5 g), DDW (2.5 g) and 1 g each of polyethylene glycol and glycerol. Calcium zirconate powder (4 g) was added to the resulting solution and dispersed by sonifying for at least 5 minutes.
- Dielectric coatings have been fabricated by dip and spin coating multiple layers of either ceria stabilized zirconia (CSZ) or alumina films onto alumina substrates. These coatings which range from 10-60 ⁇ m in thickness have withstood RF voltages of up to 3.2 kV.
- CSZ ceria stabilized zirconia
- CSZ films have been deposited on stainless and carbon steel nuts by painting multiple layers and heating to 500° C. for 24 hours.
- a 11/2 inch diameter carbon steel tube was coated on both the inside and outside with CSZ by dip coating multiple layers.
- the fired coating improved extrusion speed and surface equality of polymers produced, as compared to uncoated capillary dies.
- High frequency transducers which exhibit thickness mode resonance in the frequency range 35-60 MHz have been fabricated by depositing PZT coatings on aluminum substrates.
- Silicon carbide (4 g) (1-10 micron, Johnson Mathey) as added to a solution of Ca(NO 3 ) 2 (2 g), acetic acid (3 g), zirconium isopropoxide (8 g), water (1 g), glycerol (1 g) and poly(ethylene glycol)(1 g).
- Ten layers were deposited on a silicon substrate by spin coating and fired at 600° C. between each coating. The film was then heated overnight at 600° C. The resulting films were adherent and SEM analysis showed them to be dense and approximately 12-15 ⁇ m in thickness.
- Ten layers were deposited on a silicon substrate by spin coating and fired at 600° C. between each coating. The film was then heated overnight at 600° C. The resulting films were adherent and SEM analysis showed them to be dense and approximately 12 ⁇ m in thickness.
- a silicon carbide paint and titanium nitride paint were prepared as in Examples 11 and 12 respectively. Alternating layers were applied by spin coating and fired at 600° C. between each coating. The film was then heated overnight at 600° C. The resulting films were adherent and SEM analysis showed them to be dense and approximately 12 ⁇ m in thickness.
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Abstract
Description
TABLE 1
______________________________________
Nickel
Zinc
Powder PZT.sup.1
Zirconia.sup.2
Alumina.sup.3
Silica.sup.4
Ferrite.sup.5
Titania.sup.6
______________________________________
(Yttria)
Yes Yes Yes Yes No Yes
Zirconia
(Ceria)
Yes Yes Yes Yes No Yes
Zirconia
PZT Yes Yes Yes Yes No No
Alumina
Yes Yes Yes Yes No No
Titania
Yes Yes Yes Yes No Yes
Calcium
Yes Yes No No No Yes
Zirconate
Silica No Yes Yes Yes No No
Silicon
No Yes Yes No No No
Carbide
Titanium
No Yes Yes No No No
Nitride
Calcium
No Yes Yes No No No
Hydroxy-
apatite
Nickel No No No No Yes No
Zinc
Ferrite
______________________________________
Claims (17)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/938,996 USRE36573E (en) | 1995-03-22 | 1997-09-26 | Method for producing thick ceramic films by a sol gel coating process |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/409,127 US5585136A (en) | 1995-03-22 | 1995-03-22 | Method for producing thick ceramic films by a sol gel coating process |
| US08/938,996 USRE36573E (en) | 1995-03-22 | 1997-09-26 | Method for producing thick ceramic films by a sol gel coating process |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US08/409,127 Reissue US5585136A (en) | 1995-03-22 | 1995-03-22 | Method for producing thick ceramic films by a sol gel coating process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USRE36573E true USRE36573E (en) | 2000-02-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US08/409,127 Ceased US5585136A (en) | 1995-03-22 | 1995-03-22 | Method for producing thick ceramic films by a sol gel coating process |
| US08/938,996 Expired - Lifetime USRE36573E (en) | 1995-03-22 | 1997-09-26 | Method for producing thick ceramic films by a sol gel coating process |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
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| US08/409,127 Ceased US5585136A (en) | 1995-03-22 | 1995-03-22 | Method for producing thick ceramic films by a sol gel coating process |
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|---|---|
| US (2) | US5585136A (en) |
| EP (1) | EP0815285B1 (en) |
| JP (1) | JPH11502262A (en) |
| KR (1) | KR100390037B1 (en) |
| AT (1) | ATE204617T1 (en) |
| AU (1) | AU4617496A (en) |
| CA (1) | CA2213209C (en) |
| DE (1) | DE69614673T2 (en) |
| DK (1) | DK0815285T3 (en) |
| ES (1) | ES2159716T3 (en) |
| PT (1) | PT815285E (en) |
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| US6432238B1 (en) * | 1998-12-30 | 2002-08-13 | Samsung Electro-Mechanicals Co., Ltd. | Method for fabricating piezoelectric/electrostrictive thick film using seeding layer |
| US6426114B1 (en) | 2000-05-02 | 2002-07-30 | The University Of British Columbia | Sol-gel calcium phosphate ceramic coatings and method of making same |
| US6770325B2 (en) | 2000-05-19 | 2004-08-03 | The University Of British Columbia | Process for making chemically bonded composite hydroxide ceramics |
| WO2002072495A3 (en) * | 2001-03-09 | 2002-11-14 | Datec Coating Corp | Sol-gel derived resistive and conductive coating |
| US20020127335A1 (en) * | 2001-03-12 | 2002-09-12 | Lee Yong-Kyun | Method for preparing and forming a thick coating of PZT using sol-gel process |
| US7777062B2 (en) * | 2003-02-03 | 2010-08-17 | Eidgenossische Technische Hochschule Zurich | Method for production of a B/N/C/Si ceramic from a borazine precursor, ceramics made by said method and use of the ceramic made by said method |
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| US20040247791A1 (en) * | 2003-06-03 | 2004-12-09 | United States Department Of Energy | Method for preparing nanocrystalline ceramic thin films |
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| WO2004113255A1 (en) * | 2003-06-23 | 2004-12-29 | Datec Coating Corporation | A colloidal composite sol gel formulation with an expanded gel network for making thick inorganic coatings |
| US20070228033A1 (en) * | 2004-05-19 | 2007-10-04 | Koninklijke Philips Electronics N.V. | Layer for Use in a Domestic Appliance |
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Also Published As
| Publication number | Publication date |
|---|---|
| PT815285E (en) | 2001-12-28 |
| HK1007889A1 (en) | 1999-04-30 |
| KR100390037B1 (en) | 2003-10-22 |
| EP0815285B1 (en) | 2001-08-22 |
| DE69614673T2 (en) | 2002-06-27 |
| EP0815285A1 (en) | 1998-01-07 |
| CA2213209A1 (en) | 1996-09-26 |
| JPH11502262A (en) | 1999-02-23 |
| KR19980703207A (en) | 1998-10-15 |
| DK0815285T3 (en) | 2001-10-08 |
| WO1996029447A1 (en) | 1996-09-26 |
| DE69614673D1 (en) | 2001-09-27 |
| AU4617496A (en) | 1996-10-08 |
| US5585136A (en) | 1996-12-17 |
| ES2159716T3 (en) | 2001-10-16 |
| ATE204617T1 (en) | 2001-09-15 |
| CA2213209C (en) | 2003-10-21 |
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