USH1063H - Negative type light-sensitive silver halide photographic material - Google Patents
Negative type light-sensitive silver halide photographic material Download PDFInfo
- Publication number
- USH1063H USH1063H US07/432,045 US43204589A USH1063H US H1063 H USH1063 H US H1063H US 43204589 A US43204589 A US 43204589A US H1063 H USH1063 H US H1063H
- Authority
- US
- United States
- Prior art keywords
- group
- silver halide
- amount
- light
- sensitive silver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- -1 silver halide Chemical class 0.000 title claims abstract description 164
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 117
- 239000004332 silver Substances 0.000 title claims abstract description 117
- 239000000463 material Substances 0.000 title claims abstract description 38
- 108010010803 Gelatin Proteins 0.000 claims abstract description 51
- 239000000839 emulsion Substances 0.000 claims abstract description 51
- 239000008273 gelatin Substances 0.000 claims abstract description 51
- 229920000159 gelatin Polymers 0.000 claims abstract description 51
- 235000019322 gelatine Nutrition 0.000 claims abstract description 51
- 235000011852 gelatine desserts Nutrition 0.000 claims abstract description 51
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 42
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000000499 gel Substances 0.000 claims abstract description 10
- 239000000084 colloidal system Substances 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims description 40
- 125000003118 aryl group Chemical group 0.000 claims description 24
- 229920000642 polymer Polymers 0.000 claims description 22
- 125000000623 heterocyclic group Chemical group 0.000 claims description 21
- 239000004816 latex Substances 0.000 claims description 19
- 229920000126 latex Polymers 0.000 claims description 19
- 125000003545 alkoxy group Chemical group 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 17
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 125000003277 amino group Chemical group 0.000 claims description 8
- 125000001931 aliphatic group Chemical group 0.000 claims description 7
- 125000002252 acyl group Chemical group 0.000 claims description 6
- 125000004104 aryloxy group Chemical group 0.000 claims description 5
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims description 5
- 125000000626 sulfinic acid group Chemical group 0.000 claims description 3
- 230000000087 stabilizing effect Effects 0.000 claims description 2
- 101100434170 Oryza sativa subsp. japonica ACR2.1 gene Proteins 0.000 claims 1
- 101100434171 Oryza sativa subsp. japonica ACR2.2 gene Proteins 0.000 claims 1
- 239000010410 layer Substances 0.000 description 48
- 239000000975 dye Substances 0.000 description 34
- 125000000217 alkyl group Chemical group 0.000 description 22
- 125000004432 carbon atom Chemical group C* 0.000 description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 16
- 125000001424 substituent group Chemical group 0.000 description 14
- 230000001235 sensitizing effect Effects 0.000 description 13
- 239000000203 mixture Substances 0.000 description 12
- 238000011282 treatment Methods 0.000 description 11
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 230000018109 developmental process Effects 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- 125000005843 halogen group Chemical group 0.000 description 7
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000001624 naphthyl group Chemical group 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 229920001519 homopolymer Polymers 0.000 description 5
- 125000002950 monocyclic group Chemical group 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 125000004442 acylamino group Chemical group 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 239000001913 cellulose Substances 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 4
- 235000010980 cellulose Nutrition 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 125000005647 linker group Chemical group 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 125000004414 alkyl thio group Chemical group 0.000 description 3
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000002619 bicyclic group Chemical group 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229920000578 graft copolymer Polymers 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 125000004076 pyridyl group Chemical group 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 150000003283 rhodium Chemical class 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- 150000003852 triazoles Chemical group 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- LUBJCRLGQSPQNN-UHFFFAOYSA-N 1-Phenylurea Chemical compound NC(=O)NC1=CC=CC=C1 LUBJCRLGQSPQNN-UHFFFAOYSA-N 0.000 description 2
- LPYUENQFPVNPHY-UHFFFAOYSA-N 3-methoxycatechol Chemical compound COC1=CC=CC(O)=C1O LPYUENQFPVNPHY-UHFFFAOYSA-N 0.000 description 2
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 102000004190 Enzymes Human genes 0.000 description 2
- 108090000790 Enzymes Proteins 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- XEIPQVVAVOUIOP-UHFFFAOYSA-N [Au]=S Chemical compound [Au]=S XEIPQVVAVOUIOP-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000005250 alkyl acrylate group Chemical group 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 150000003851 azoles Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 235000010338 boric acid Nutrition 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- HBNYJWAFDZLWRS-UHFFFAOYSA-N ethyl isothiocyanate Chemical compound CCN=C=S HBNYJWAFDZLWRS-UHFFFAOYSA-N 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 150000002391 heterocyclic compounds Chemical class 0.000 description 2
- 239000003906 humectant Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 2
- 125000004957 naphthylene group Chemical group 0.000 description 2
- CELWCAITJAEQNL-UHFFFAOYSA-N oxan-2-ol Chemical compound OC1CCCCO1 CELWCAITJAEQNL-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 150000004714 phosphonium salts Chemical group 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 235000018102 proteins Nutrition 0.000 description 2
- 108090000623 proteins and genes Proteins 0.000 description 2
- 102000004169 proteins and genes Human genes 0.000 description 2
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 238000010189 synthetic method Methods 0.000 description 2
- 125000001391 thioamide group Chemical group 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- QDNPCYCBQFHNJC-UHFFFAOYSA-N 1,1'-biphenyl-3,4-diol Chemical compound C1=C(O)C(O)=CC=C1C1=CC=CC=C1 QDNPCYCBQFHNJC-UHFFFAOYSA-N 0.000 description 1
- GZDSKMWVHQYLSJ-UHFFFAOYSA-N 1,1-dichloroethene;methyl prop-2-enoate;prop-2-enoic acid Chemical compound ClC(Cl)=C.OC(=O)C=C.COC(=O)C=C GZDSKMWVHQYLSJ-UHFFFAOYSA-N 0.000 description 1
- FVRXOULDGSWPPO-UHFFFAOYSA-N 1,2-dihydropyrazole-3-thione Chemical compound SC1=CC=NN1 FVRXOULDGSWPPO-UHFFFAOYSA-N 0.000 description 1
- 150000005206 1,2-dihydroxybenzenes Chemical class 0.000 description 1
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical compound C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical class C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical compound C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- 229940043375 1,5-pentanediol Drugs 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Substances C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical class SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- LLCOQBODWBFTDD-UHFFFAOYSA-N 1h-triazol-1-ium-4-thiolate Chemical class SC1=CNN=N1 LLCOQBODWBFTDD-UHFFFAOYSA-N 0.000 description 1
- XIROXSOOOAZHLL-UHFFFAOYSA-N 2',3',4'-Trihydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C(O)=C1O XIROXSOOOAZHLL-UHFFFAOYSA-N 0.000 description 1
- XIWRQEFBSZWJTH-UHFFFAOYSA-N 2,3-dibromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1Br XIWRQEFBSZWJTH-UHFFFAOYSA-N 0.000 description 1
- YZDIUKPBJDYTOM-UHFFFAOYSA-N 2,5-diethylbenzene-1,4-diol Chemical compound CCC1=CC(O)=C(CC)C=C1O YZDIUKPBJDYTOM-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- YMPSGFXVICLNOY-UHFFFAOYSA-N 2-(butoxymethyl)prop-2-enamide;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCCOCC(=C)C(N)=O YMPSGFXVICLNOY-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 1
- CBHTTYDJRXOHHL-UHFFFAOYSA-N 2h-triazolo[4,5-c]pyridazine Chemical class N1=NC=CC2=C1N=NN2 CBHTTYDJRXOHHL-UHFFFAOYSA-N 0.000 description 1
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 1
- LTACQVCHVAUOKN-UHFFFAOYSA-N 3-(diethylamino)propane-1,2-diol Chemical compound CCN(CC)CC(O)CO LTACQVCHVAUOKN-UHFFFAOYSA-N 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical class SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 1
- UIHHTFWECCZVRB-UHFFFAOYSA-N 4-amino-2-phenyl-4h-pyrazol-3-one Chemical compound O=C1C(N)C=NN1C1=CC=CC=C1 UIHHTFWECCZVRB-UHFFFAOYSA-N 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- WWOBYPKUYODHDG-UHFFFAOYSA-N 4-chlorocatechol Chemical compound OC1=CC=C(Cl)C=C1O WWOBYPKUYODHDG-UHFFFAOYSA-N 0.000 description 1
- 125000004860 4-ethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])C([H])([H])[H] 0.000 description 1
- PCNFLKVWBDNNOW-UHFFFAOYSA-N 4-hydrazinylbenzoic acid Chemical compound NNC1=CC=C(C(O)=O)C=C1 PCNFLKVWBDNNOW-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- JXRGUPLJCCDGKG-UHFFFAOYSA-N 4-nitrobenzenesulfonyl chloride Chemical compound [O-][N+](=O)C1=CC=C(S(Cl)(=O)=O)C=C1 JXRGUPLJCCDGKG-UHFFFAOYSA-N 0.000 description 1
- BISHACNKZIBDFM-UHFFFAOYSA-N 5-amino-1h-pyrimidine-2,4-dione Chemical compound NC1=CNC(=O)NC1=O BISHACNKZIBDFM-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- 101100177155 Arabidopsis thaliana HAC1 gene Proteins 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 102000011632 Caseins Human genes 0.000 description 1
- 108010076119 Caseins Proteins 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- 229940090898 Desensitizer Drugs 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000003109 Disodium ethylene diamine tetraacetate Substances 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 1
- 239000004593 Epoxy Chemical class 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- RYECOJGRJDOGPP-UHFFFAOYSA-N Ethylurea Chemical compound CCNC(N)=O RYECOJGRJDOGPP-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical class NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical class O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- GMEHFXXZSWDEDB-UHFFFAOYSA-N N-ethylthiourea Chemical compound CCNC(N)=S GMEHFXXZSWDEDB-UHFFFAOYSA-N 0.000 description 1
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 102100040160 Rabankyrin-5 Human genes 0.000 description 1
- 101710086049 Rabankyrin-5 Proteins 0.000 description 1
- 101150108015 STR6 gene Proteins 0.000 description 1
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- MVLAOHLVHJYFIF-UHFFFAOYSA-N [4-[formamido-(4-methylphenyl)sulfonylamino]phenyl] acetate Chemical compound C1=CC(OC(=O)C)=CC=C1N(NC=O)S(=O)(=O)C1=CC=C(C)C=C1 MVLAOHLVHJYFIF-UHFFFAOYSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000000274 adsorptive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000004466 alkoxycarbonylamino group Chemical group 0.000 description 1
- 125000005195 alkyl amino carbonyloxy group Chemical group 0.000 description 1
- 125000005115 alkyl carbamoyl group Chemical group 0.000 description 1
- 125000005153 alkyl sulfamoyl group Chemical group 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000011126 aluminium potassium sulphate Nutrition 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 235000006708 antioxidants Nutrition 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000001769 aryl amino group Chemical group 0.000 description 1
- 125000005116 aryl carbamoyl group Chemical group 0.000 description 1
- 125000005162 aryl oxy carbonyl amino group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- AMTXUWGBSGZXCJ-UHFFFAOYSA-N benzo[e][1,3]benzoselenazole Chemical group C1=CC=C2C(N=C[se]3)=C3C=CC2=C1 AMTXUWGBSGZXCJ-UHFFFAOYSA-N 0.000 description 1
- KXNQKOAQSGJCQU-UHFFFAOYSA-N benzo[e][1,3]benzothiazole Chemical compound C1=CC=C2C(N=CS3)=C3C=CC2=C1 KXNQKOAQSGJCQU-UHFFFAOYSA-N 0.000 description 1
- WMUIZUWOEIQJEH-UHFFFAOYSA-N benzo[e][1,3]benzoxazole Chemical compound C1=CC=C2C(N=CO3)=C3C=CC2=C1 WMUIZUWOEIQJEH-UHFFFAOYSA-N 0.000 description 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical class C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- PSJCFABZBPCBNQ-UHFFFAOYSA-N butyl 2-methylprop-2-enoate;prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1.CCCCOC(=O)C(C)=C PSJCFABZBPCBNQ-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 150000001661 cadmium Chemical class 0.000 description 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229960004106 citric acid Drugs 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 235000019301 disodium ethylene diamine tetraacetate Nutrition 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- JOXWSDNHLSQKCC-UHFFFAOYSA-N ethenesulfonamide Chemical class NS(=O)(=O)C=C JOXWSDNHLSQKCC-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000006627 ethoxycarbonylamino group Chemical group 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N ethyl formate Chemical class CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- YVRWSHBSELXXRQ-UHFFFAOYSA-N ethyl n-anilino-n-(4-methylphenyl)sulfonylcarbamate Chemical compound C=1C=C(C)C=CC=1S(=O)(=O)N(C(=O)OCC)NC1=CC=CC=C1 YVRWSHBSELXXRQ-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical class OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 1
- 108010025899 gelatin film Proteins 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 235000013905 glycine and its sodium salt Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Chemical class 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 238000013532 laser treatment Methods 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- QICZWSAAJCZAJA-UHFFFAOYSA-N n-(4-dodecylanilino)formamide Chemical compound CCCCCCCCCCCCC1=CC=C(NNC=O)C=C1 QICZWSAAJCZAJA-UHFFFAOYSA-N 0.000 description 1
- LLGRMPUCXVCEMW-UHFFFAOYSA-N n-(4-ethylanilino)formamide Chemical compound CCC1=CC=C(NNC=O)C=C1 LLGRMPUCXVCEMW-UHFFFAOYSA-N 0.000 description 1
- SKKBQXQQMZZDBZ-UHFFFAOYSA-N n-(4-hexoxy-n-(4-methylphenyl)sulfonylanilino)formamide Chemical compound C1=CC(OCCCCCC)=CC=C1N(NC=O)S(=O)(=O)C1=CC=C(C)C=C1 SKKBQXQQMZZDBZ-UHFFFAOYSA-N 0.000 description 1
- UBAAGBJKCKRZFY-UHFFFAOYSA-N n-(4-hydroxy-n-(4-methylphenyl)sulfonylanilino)formamide Chemical compound C1=CC(C)=CC=C1S(=O)(=O)N(NC=O)C1=CC=C(O)C=C1 UBAAGBJKCKRZFY-UHFFFAOYSA-N 0.000 description 1
- DDPJROKUKMXGPW-UHFFFAOYSA-N n-(4-methylanilino)formamide Chemical compound CC1=CC=C(NNC=O)C=C1 DDPJROKUKMXGPW-UHFFFAOYSA-N 0.000 description 1
- RIMXIAKFSZVMOD-UHFFFAOYSA-N n-(4-methylphenyl)sulfonyl-n'-phenylacetohydrazide Chemical compound C=1C=C(C)C=CC=1S(=O)(=O)N(C(=O)C)NC1=CC=CC=C1 RIMXIAKFSZVMOD-UHFFFAOYSA-N 0.000 description 1
- YALFWDFYLAHMCK-UHFFFAOYSA-N n-[4-(2-formylhydrazinyl)-3-methylphenyl]acetamide Chemical compound CC(=O)NC1=CC=C(NNC=O)C(C)=C1 YALFWDFYLAHMCK-UHFFFAOYSA-N 0.000 description 1
- HGMLAWUVRVDZAY-UHFFFAOYSA-N n-[4-(benzylamino)anilino]formamide Chemical compound C1=CC(NNC=O)=CC=C1NCC1=CC=CC=C1 HGMLAWUVRVDZAY-UHFFFAOYSA-N 0.000 description 1
- ILFKOROXPGVKCP-UHFFFAOYSA-N n-[4-(diethylamino)anilino]formamide Chemical compound CCN(CC)C1=CC=C(NNC=O)C=C1 ILFKOROXPGVKCP-UHFFFAOYSA-N 0.000 description 1
- CEDQGNQFKZOLQC-UHFFFAOYSA-N n-[4-(ethylcarbamothioylamino)anilino]formamide Chemical compound CCNC(=S)NC1=CC=C(NNC=O)C=C1 CEDQGNQFKZOLQC-UHFFFAOYSA-N 0.000 description 1
- JIDHTEGXKCPFRM-UHFFFAOYSA-N n-[4-(octylamino)anilino]formamide Chemical compound CCCCCCCCNC1=CC=C(NNC=O)C=C1 JIDHTEGXKCPFRM-UHFFFAOYSA-N 0.000 description 1
- JCHSMXCKXYYEDA-UHFFFAOYSA-N n-[4-[2-(2,4-ditert-butylphenoxy)butylcarbamoylamino]anilino]formamide Chemical compound C=1C=C(C(C)(C)C)C=C(C(C)(C)C)C=1OC(CC)CNC(=O)NC1=CC=C(NNC=O)C=C1 JCHSMXCKXYYEDA-UHFFFAOYSA-N 0.000 description 1
- BMFOOOAODJUKFF-UHFFFAOYSA-N n-[4-[4-[2,4-bis(2-methylbutan-2-yl)phenoxy]butylcarbamoylamino]-n-(4-methylphenyl)sulfonylanilino]formamide Chemical compound CCC(C)(C)C1=CC(C(C)(C)CC)=CC=C1OCCCCNC(=O)NC1=CC=C(N(NC=O)S(=O)(=O)C=2C=CC(C)=CC=2)C=C1 BMFOOOAODJUKFF-UHFFFAOYSA-N 0.000 description 1
- ZKMXAPDXIAMBNJ-UHFFFAOYSA-N n-[4-[[methyl(phenyl)carbamothioyl]amino]-n-(4-methylphenyl)sulfonylanilino]formamide Chemical compound C=1C=CC=CC=1N(C)C(=S)NC(C=C1)=CC=C1N(NC=O)S(=O)(=O)C1=CC=C(C)C=C1 ZKMXAPDXIAMBNJ-UHFFFAOYSA-N 0.000 description 1
- ALDLYNPBJNWNPX-UHFFFAOYSA-N n-[n-(4-methylphenyl)sulfonyl-4-(oxan-2-yloxy)anilino]formamide Chemical compound C1=CC(C)=CC=C1S(=O)(=O)N(NC=O)C(C=C1)=CC=C1OC1OCCCC1 ALDLYNPBJNWNPX-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- KSMRQHOUTCWXMT-UHFFFAOYSA-N o-ethyl n-[4-[formamido-(4-methylphenyl)sulfonylamino]phenyl]carbamothioate Chemical compound C1=CC(NC(=S)OCC)=CC=C1N(NC=O)S(=O)(=O)C1=CC=C(C)C=C1 KSMRQHOUTCWXMT-UHFFFAOYSA-N 0.000 description 1
- MEWFMWDYZGDIPI-UHFFFAOYSA-N o-phenyl n-[4-[formamido-(4-methylphenyl)sulfonylamino]phenyl]carbamothioate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)N(NC=O)C(C=C1)=CC=C1NC(=S)OC1=CC=CC=C1 MEWFMWDYZGDIPI-UHFFFAOYSA-N 0.000 description 1
- KPCHOCIEAXFUHZ-UHFFFAOYSA-N oxadiazole-4-thiol Chemical class SC1=CON=N1 KPCHOCIEAXFUHZ-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000003452 oxalyl group Chemical group *C(=O)C(*)=O 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000003969 polarography Methods 0.000 description 1
- 229920002587 poly(1,3-butadiene) polymer Polymers 0.000 description 1
- 229920000233 poly(alkylene oxides) Chemical class 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GNHOJBNSNUXZQA-UHFFFAOYSA-J potassium aluminium sulfate dodecahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.O.O.[Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GNHOJBNSNUXZQA-UHFFFAOYSA-J 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 230000003389 potentiating effect Effects 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000005554 pyridyloxy group Chemical group 0.000 description 1
- 125000005030 pyridylthio group Chemical group N1=C(C=CC=C1)S* 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000004040 pyrrolidinones Chemical class 0.000 description 1
- ZVJHJDDKYZXRJI-UHFFFAOYSA-N pyrroline Natural products C1CC=NC1 ZVJHJDDKYZXRJI-UHFFFAOYSA-N 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000011369 resultant mixture Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 230000001953 sensory effect Effects 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- PPASLZSBLFJQEF-RKJRWTFHSA-M sodium ascorbate Substances [Na+].OC[C@@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RKJRWTFHSA-M 0.000 description 1
- 235000010378 sodium ascorbate Nutrition 0.000 description 1
- 229960005055 sodium ascorbate Drugs 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 1
- PPASLZSBLFJQEF-RXSVEWSESA-M sodium-L-ascorbate Chemical compound [Na+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RXSVEWSESA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 101150035983 str1 gene Proteins 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 1
- 150000003452 sulfinic acid derivatives Chemical class 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229920006027 ternary co-polymer Polymers 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000003396 thiol group Chemical class [H]S* 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 125000005147 toluenesulfonyl group Chemical group C=1(C(=CC=CC1)S(=O)(=O)*)C 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/061—Hydrazine compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
Definitions
- This invention relates to a negative type light-sensitive silver halide photographic material.
- An object of the present invention is to provide a negative type light-sensitive silver halide photographic material which can solve the above-mentioned problems, namely capable of developing sufficient amount of silver without waste within a short time, and having an image of high contrast.
- a negative type light-sensitive silver halide photographic material comprising at least one light-sensitive silver halide emulsion provided on a support, wherein the ratio of silver amount to gelatin amount (Ag/Gel) (wherein said silver amount is the total silver amount in one or more layers provided in the same side as said light-sensitive silver halide emulsion layer with respect to the support, and said gelatin amount is the total gelatin amount in one or more gelatin layers provided in the same side as said light-sensitive silver halide emulsion layer with respect to the support) is 1.0 or more, and a hydrophilic colloid layer in said light-sensitive silver halide emulsion contains a hydrazine compound.
- the light-sensitive silver halide photographic material should contain 2 g/m 2 or less, more preferably 0.2 to 1.5 g/m 2 of a polymer latex therein.
- the present inventors have found that in order to obtain sufficient density after development processing by ultra-fast processing, increase of Ag/Gel should be extremely preferable rather than mere increase of the silver amount coated, to have accomplished the above invention.
- increase of Ag/Gel should be extremely preferable rather than mere increase of the silver amount coated, to have accomplished the above invention.
- by merely increasing Ag/Gel there is a tendency that cracking may occur when the raw film and the film after processing is stored under low humidity conditions (at relative humidity of 30% or lower) during storage, and hence it has been found that a polymer latex of 2 g/m 2 or lower should be desirably contained in the light-sensitive silver halide photographic material. Also, by doing so, the problem of coating irregularity has been reduced.
- the gelatin amount in the present invention is the sum of the gelatin amount in the gelatin layers of one layer or more in the side including the light-sensitive silver halide emulsion layer with respect to the support (even in the case of the gelatin derivative as described below, the amount of the gelatin derivative is considered as the gelatin amount), and is not limited only to the gelatin amount in the silver halide emulsion layer. Also, the silver amount is the total silver amount in the respective layers, when it is provided by coating in a plural number of layers in the same side with respect to the support.
- the hydrazine compound to be used in the present invention may include compounds represented by the following formula [I], [I-a], [I-b]or [I-c]. ##STR1## wherein R 1 and R 2 each represent hydrogen atom, a monovalent aromatic residue, a monovalent heterocyclic residue or a monovalent aliphatic residue, Q 1 and Q 2 each represent hydrogen atom, an alkylsulfonyl group which may be substituted or unsubstituted, an arylsulfonyl group which may be substituted or unsubstituted, and Xl represents oxygen atom or sulfur atom.
- R 1 and R 2 each represent an aryl group or a heterocyclic group
- R represents a divalent organic linking group
- n is 0 to 6
- m is 0 or 1
- respective R's may be either the same or different.
- R 21 represents an aliphatic group, an aromatic group or a heterocyclic group
- R 22 represents hydrogen atom, an alkoxy group which may be substituted, a heterocyclic oxy group, an amino group or an aryloxy group
- P 1 and P 2 each represent hydrogen atom, an acyl group or a sulfinic acid group.
- Ar represents an aryl group containing at least one of diffusion resisitant group or silver halide adsorption promoting group
- R 31 represents a substituted alkyl group.
- hydrazine compounds represented by Formula [I] to be used in the present invention the compounds wherein X 1 is oxygen atom and R 2 is hydrogen atom are particularly preferred.
- aromatic residues there may be included phenyl group, naphthyl group and these groups having substituents (e.g. alkyl, alkoxy, acylhydrazino, dialkylamino, alkoxycarbonyl, cyanol, carboxyl, nitro, alkylthio, hydroxy, sulfonyl, carbamoyl groups, halogen atoms, acylamino, sulfonamide, thiourea groups, etc ).
- substituents e.g. alkyl, alkoxy, acylhydrazino, dialkylamino, alkoxycarbonyl, cyanol, carboxyl, nitro, alkylthio, hydroxy, sulfonyl, carbamoyl groups, halogen atoms, acylamino, sulfonamide, thiourea groups, etc ).
- substituents may include 4-methylphenyl, 4-ethylphenyl, 4-oxyethylphenyl, 4-dodecylphenyl, 4-carboxyphenyl, 4-diethylaminophenyl, 4-octylaminophenyl, 4-benzylaminophenyl, 4-acetamido-2-methylphenyl, 4-(3-ethylthioureido)phenyl,4-[2-(2,4-di-tert-butylphenoxy)butylamido]phenyl, 4-[2-(2,4-di-tert-butylphenoxy)butylamido]phenyl groups, etc.
- heterocyclic groups 5-membered or 6-membered monocyclic or fused rings having at least one of oxygen, nitrogen, sulfur or selenium atom may be included, and these may have substituents.
- specific examples may include residues such as pyrroline, pyridine, quinoline, indole, oxazole, benzooxazole, naphthoxazole, imidazole, benzoimidazole, thiazoline, thiazole, benzothiazole, naphthothiazole, selenazole, benzoselenazole, naphthoselenazole rings, etc.
- heterocyclic rings may be also substituted with alkyl groups having 1 to 4 carbon atoms, alkoxy groups having 1 to 4 carbon atoms, aryl group having 6 to 18 carbon atoms, halogen atoms, alkoxycarbonyl group, cyano group, amide group, etc.
- Examples of the straight or branched alkyl group may include alkyl groups having 1 to 18, preferably 1 to 8 carbon atoms, specifically methyl, ethyl, isobutyl, 1-octyl groups and the like.
- Examples of the cycloalkyl group may include those having 3 to 10 carbon atoms, specifically cyclopropyl, cyclohexyl, adamantyl groups and the like.
- substituent on the alkyl group or the cycloalkyl group there may be included alkoxy, alkoxycarbonyl, carbamoyl, hydroxy, alkylthio, amide, acyloxy, cyano, sulfonyl groups, halogen atoms, aryl groups, etc., and specific examples of those substituted can include 3-methoxypropyl, ethoxycarbonylmethyl, 4-chlorocyclohexyl, benzyl, p-methylbenzyl, p-chlorobenzyl groups, etc.
- alkenyl group for example, allyl group, and as the alkynyl group, propargyl group may be included.
- R 1 and R 2 each represent an aryl group or a heterocyclic group
- R represents a divalent organic linking group
- n represents 0 to 6
- m represents 0 or 1.
- the aryl group represented by R 1 and R 2 may include phenyl group, naphthyl group, and the heterocyclic group represented by R 1 and R 2 may include pyridyl group, benzothiazolyl group, quinolyl group, thienyl group, etc., but R 1 and R 2 may be preferably aryl groups.
- the aryl group or heterocyclic group represented by R 1 and R 2 can introduce various substituents therein. Examples of substituents may include halogen atoms (e.g. chlorine, fluorine, etc.), alkyl groups (e.g. methyl, ethyl, dodecyl, etc.), alkoxy groups (e.g.
- acylamino groups ⁇ e.g. acetylamino, pivalylamino, benzoylamino, tetradecanoylamino ⁇ -(2 4-di-t-amylphenoxy) butyrylamino. etc. ⁇
- sulfonylamino groups e.g. methanesulfonylamino, butanesulfonylamino, dodecanesulfonylamino, benzenesulfonylamino, etc.
- urea groups e.g.
- phenylurea, ethylurea, etc. thiourea groups (e.g. phenylthiourea, ethylthiourea, etc.), hydroxy group, amino group, alkylamino groups (e.g. methylamino, dimethylamino, etc.), carboxy group, alkoxycarbonyl groups (e.g. ethoxycarbonyl), carbamoyl group, sulfo group and so on.
- Examples of the divalent organic linking group represented by R may include alkylene groups (e.g. methylene, ethylene, trimethylene, tetramethylene, etc.), arylene groups (e.g.
- phenylene, naphthylene, etc. aralkylene groups, etc.
- the alkylene group may contain oxy group, thio group, seleno group, carbonyl group, ##STR7## group (R 3 represents hydrogen atom, an alkyl group, an aryl group), sulfonyl group, etc. in the bond.
- R 3 represents hydrogen atom, an alkyl group, an aryl group
- sulfonyl group etc. in the bond.
- Into the group represented by R can be introduced various substituents.
- substituents may include --CONHNHR 4 (R 4 has the same meaning as R 1 and R 2 as described above), alkyl groups, alkoxy groups, halogen atoms, hydroxy group, carboxy group, acyl groups, aryl groups, etc.
- R may be preferably a alkylene group.
- the aliphatic group represented by R 21 may be preferably one having 6 or more carbon atoms, particularly a straight, branched or cyclic alkyl group having 8 to 50 carbon atoms.
- the branched alkyl group may be cyclized so as to form a saturated hetero ring containing one or more hetero atoms.
- the alkyl group may have substituent such as aryl group, alkoxy group, sulfoxy group, etc.
- the aromatic group represented by R 21 is a monocyclic or bicyclic aryl group or unsaturated heterocyclic group.
- the unsaturated heterocyclic group may be condensed with the monocyclic or bicyclic group to form a heteroaryl group.
- benzene ring there may be included benzene ring, naphthalene ring, pyridine ring, pyrimidine group, imidazole ring, pyrazole ring, quinoline ring, isoquinoline ring, benzimidazole ring, thiazole ring, benzothiazole ring, etc., but amount them those containing benzene ring are preferred.
- R 21 particularly preferred is an aryl group.
- the aryl group or unsaturated heterocyclic group represented by R 21 may be substituted, and representative substituents may include straight, branched or cyclic alkyl groups (preferably monocyclic or bicyclic ones with an alkyl moiety having 1 to 20 carbon atoms), alkoxy groups (having preferably 1 to 20 carbon atoms), substituted amino groups (preferably amino groups substituted with alkyl groups having 1 to 20 carbon atoms), acylamino groups (having preferably 2 to 30 carbon atoms), sulfonamide groups (having preferably 1 to 30 carbon atoms), ureido groups (having preferably 1 to 30 carbon atoms) and others.
- substituents may include straight, branched or cyclic alkyl groups (preferably monocyclic or bicyclic ones with an alkyl moiety having 1 to 20 carbon atoms), alkoxy groups (having preferably 1 to 20 carbon atoms), substituted amino groups (preferably amino groups substituted with alkyl groups having 1 to 20 carbon
- the alkoxy group which may be substituted may have 1 to 20 carbon atoms and may be substituted with halogen atoms, aryl groups, etc.
- the aryloxy group or the heterocyclic oxy group which may be also substituted may be preferably monocyclic, and the substituent may include halogen atoms, alkyl groups, alkoxy group, cyano group, etc.
- R 22 Of the groups represented by R 22 , preferable are alkoxy groups or amino groups which may be also substituted.
- a 1 and A 2 in the group ##STR10## group may be an alkyl group, alkoxy group which may be substituted, or a cyclic structure containing --O--, --S--, --N-- group bond.
- R 22 cannot be hydrazino group.
- R 21 or R 22 in Formula [I - b] may be one having a ballast group conventionally used in the immobile additive for photography such as coupler, etc. incorporated therein.
- the ballast group is a group having 8 or more carbon atoms relatively inert to photographic characteristic, and can be chosen from, for example, alkyl groups, alkoxy groups, phenyl groups, alkylphenyl groups, phenoxy groups, alkylphenoxy groups, etc.
- R 21 or R 22 in Formula [I- b] may be also one having a group for strengthening adsorption to the surface of silver halide grains incorporated therein.
- adsorptive groups there may be included the groups as disclosed in U.S. Pat. No. 4,355,105 such as thiourea group, heterocyclic thioamide group, mercaptoheterocyclic group, triazole group, etc.
- the compounds represented by the group [I - b] are particularly preferable. ##STR11## In the Formula [I - b - a],
- R 23 and R 24 each represent hydrogen atom, an alkyl group which may be substituted (e.g. methyl, ethyl, butyl, dodecyl, 2-hydroxypropyl, 2-cyanoethyl, 2-chloroethyl group), a phenyl, naphthyl, cyclohexyl, pyridyl, pyrrolidyl group which may be substituted (e.g.
- phenyl p-methylphenyl, naphthyl, ⁇ -hydroxy-naphthyl, cyclohexyl, p-methylcyclohexyl, pyridyl, 4-propyl-2-pyridyl, pyrrolidyl, 4-methyl-2-pyrrolidyl group);
- R 25 represents hydrogen atom or a benzyl, alkoxy and alkyl group which may be substituted (e.g. benzyl, p-methylbenzyl, methoxy, ethoxy, ethyl, butyl group);
- R 26 and R 27 each represent a divalent aromatic group (e.g. phenylene or naphthylene group), Y represents sulfur atoms or oxygen atom, L represents a divalent linking group (e.g. --SO 2 CH 2 CH 2 NH--SO 2 NH--, --OCH 2 SO 2 NH--, --O--, --CH ⁇ N--);
- R 28 represents --NR'R" or --OR 29 ;
- R', R" and R 29 each represent hydrogen atom, an alkyl group which may be substituted (e.g. methyl, ethyl, dodecyl group), a phenyl group which may be substituted (e.g. phenyl, p-methylphenyl, p-methoxyphenyl group) or a naphthyl group which may be substituted (e.g. ⁇ -naphthyl group, ⁇ -naphthyl group), m, n represent 0 or 1, and when R 28 represents OR 29 , Y should preferably represent sulfur atom.
- Ar represents an aryl group containing at least one of diffusion resistant groups or silver halide adsorption promoting groups, and as the diffusion resistant group, a ballast group conventionally used in immobile additives for photography such as coupler, etc. is preferable.
- the ballast group is a group having 8 or more carbon atoms relatively inert to photographic characteristic, and can be chosen from, for example, alkyl groups, alkoxy groups, phenyl groups, alkylphenyl groups, phenoxy groups, alkylphenoxy groups, etc.
- silver halide adsorption promoting group there may be included the groups as disclosed in U.S. Pat. No. 4,385,108 such as thiourea group, thiourethane group, heterocyclic thioamide group, mercaptoheterocyclic group, triazole group, etc.
- R 3 represents a substituted alkyl group, and the alkyl group may be a straight, branched or cyclic alkyl group, including methyl, ethyl, propyl, butyl, isopropyl, pentyl, cyclohexyl and the like.
- alkoxy e.g. methoxy, ethoxy
- aryloxy e.g. phenoxy, p-chlorophenoxy
- heterocyclic oxy e.g. pyridyloxy
- mercapto alkylthio (e.g. methylthio, ethylthio), arylthio (e.g. phenylthio, p-chlorophenylthio), heterocyclic thio (e.g. pyridylthio, pyrimidylthio, thiadiazolylthio), alkylsulfonyl (e.g.
- acetyloxy acetyloxy, benzoyloxy
- alkylaminocarbonyloxy e.g. methylaminocarbonyloxy
- arylaminocarbonyloxy e.g. phenylaminocarbonyloxy
- sulfo sulfamoyl
- alkylsulfamoyl e.g. methylsulfamoyl
- arylsulfamoyl e.g. phenylsulfamoyl
- the hydrogen atom of hydrazide may be also substituted with a substituent such as sulfonyl group (e.g. methanesulfonyl, toluenesulfonyl), acyl group (e.g. acetyl, trifluoroacetyl), oxalyl group (e.g. ethoxalyl), etc.
- sulfonyl group e.g. methanesulfonyl, toluenesulfonyl
- acyl group e.g. acetyl, trifluoroacetyl
- oxalyl group e.g. ethoxalyl
- the position where the above hydrazine compound is to be added is in the silver halide emulsion layer and/or the non-light-sensitive layer existing on the silver halide emulsion layer on the support, but preferably in the silver halide emulsion layer and/or its subbing layer.
- the amount added should be preferably 10 -5 to 10 -1 mole/1 mole of silver, further preferably 10 -4 to 10 -2 mole/1 mole of silver.
- the average grain size refers to its diameter in the case of spherical particles, or the diameter when calculated on the circular image with the same area as its projected image in the case of grains with shapes other than spherical shape.
- 60% or more of the total grains should have particle sizes within the range of ⁇ 10% of the average grain size.
- silver halide emulsion to be used in the present invention (hereinafter called silver halide emulsion or merely emulsion)
- any of silver bromide, silver iodobromide, silver iodochloride, silver chloroiodobromide, silver chloride, silver chlorobromide, silver iodide may be used.
- the silver halide emulsion used in the present invention may have a single composition, or alternatively grains with a plurality of compositions may be also contained within the single layer or a plurality of layers.
- metal ions by use of at least one selected from cadmium salts, zinc salts, lead salts, thallium salts, iridium salts (complexes containing them), rhodium salts (complexes containing them) and iron salts (complexes containing them) in the process of forming and/or growing the grains to incorporate these metal elements internally of the grains and/or on the grain surfaces, and a water-soluble rhodium salt is particularly preferably. Also, by placing in a reductive appropriate atmosphere, reduced sensitizing nuclei can be imparted internally of the grains and/or on the grain surfaces. When a water-soluble rhodium salt is added, the amount added may be preferably 1 ⁇ 10 -7 to 1 ⁇ 10 -4 mole/1 mole AgX.
- the silver halide grains to be used in the silver halide emulsion may either have a uniform silver halide composition distribution within the grain or a core-shell grain with different silver halide compositions in the inner portion and in the surface layer of the grain.
- the silver halide grains to be used in the silver halide emulsion may be either those in which latent images are formed primarily on the surface or those primarily internally of the grains.
- the silver halide grains to be used in the silver halide emulsion may be either those having regular crystal forms such as cubic, octahedral, tetradecahedral bodies, or irregular shapes such as spherical, plate shapes. Also, they may have composite form of these crystal forms, and may contain grains of various forms mixed therein.
- silver halide emulsion two or more kinds of silver halide emulsions which have been formed separately may be used in a mixture.
- the silver halide emulsion should be preferably sensitized by use of chemical sensitizers and the sensitizing methods as described in G.B. Pat. Nos. 618,061, 1,315,755, 1,396,696, Japanese Patent Publication No. 15748/1969, U.S. Pat. Nos.
- the silver halide emulsion to be used in the light-sensitive material according to the present invention can be chemically sensitized to a required wavelength region by use of a dye which has been known as the sensitizing dye in the field of photography.
- the sensitizing dye may be also used alone, but may be also used in combination of two or more kinds. Together with the sensitizing dye, there may be also contained a supersensitizer which is a dye having itself no spectral sensitizing action, or a compound absorbing substantially no visible light, and potentiating the sensitizing action of the sensitizing dye may be also contained in the emulsion.
- the useful sensitizing dye to be used in the blue-sensitive silver halide nucleus emulsion layer there may be included, for example, those as described in West German Pat. No. 929,080, U.S. Pat. Nos. 2,231,658, 2,493,748, 2,503,776, 2,519,001, 2,912,329, 2,656,959, 3,672,897, 3,694,217, 4,025,349, 4,046,572, G.B. Pat. No. 1,242,588, Japanese Patent Publication Nos. 14030/1969, 1977.
- the useful sensitizing dye to be used in the green-sensitive silver halide emulsion there may be included, for example, cyanine dyes, melocyanine dyes or complex cyanine dyes as described in U.S. Pat. Nos. 1,939,201, 2,072,908, 2,739,149, 2,945,763, G. B. Pat. No. 505,979 as representative ones.
- the useful sensitizing dye to be used in the red-sensitive silver halide emulsion there may be included, for example, cyanine dyes, melocyanine dyes or complex cyanine dyes as described in U.S. Pat. Nos. 2,269,234, 2,270,378, 2,442,710, 2,454,629, 2,776,280 as representative ones.
- cyanine dyes or complex cyanine dyes as described in U.S. Pat. Nos. 2,213,995, 2,493,748, 2,519,001, West German Pat. No. 929,080 can be advantageously used in the green-sensitive silver halide emulsion or the red-sensitive silver halide emulsion.
- a compound known as the antifoggant or stabilizer in the field of photography can be added during chemical aging, on completion of chemical aging and/or after completion of chemical aging before coating of the silver halide emulsion.
- antifoggant, stabilizer may include azaindenes such as pentazaindenes as disclosed in U.S. Pat. Nos. 2,713,541, 2,743,180, 2,743,181, tetrazaindenes as disclosed in U.S. Pat. Nos. 2,716,062, 2,444,607, 2,444,605, 2,756,147, 2,835,581, 2,852,375, Research Disclosure I4851, triazaindenes as disclosed in U.S. Pat. No. 2,772,146, polymerized azaindenes as disclosed in Japanese Unexamined Patent Publication No. 211142/1982; quaternary phosphonium salts such as thiazolium salts as disclosed in U.S. Pat.
- azaindenes such as pentazaindenes as disclosed in U.S. Pat. Nos. 2,713,541, 2,743,180, 2,743,181, tetrazaindenes as disclosed in U.S. Pat. Nos. 2,
- heterocyclic compounds including azoles such as tetrazoles as disclosed in West German Patent No. 1,189,380, triazole as disclosed in U.S. Pat. No. 3,157,509, benztriazoles as disclosed in U.S. Pat. No. 2,704,721, urazoles as disclosed in U.S. Pat. No. 3,287,135, pyrazoles as disclosed in U.S. Pat. No. 3,106,467, imidazoles as disclosed in U.S. Pat. No. 2,271,229, and azoles such as polymerized benzotriazoles as disclosed in Japanese Unexamined Patent Publication No. 90844/1984, etc., pyrimidines as disclosed in U.S. Pat. No.
- hydrophilic colloid layers in the light-sensitive material to be used in the present invention various additives for photography can be used, if necessary, such as gelatin plasticizers, film hardeners, surfactants, image stabilizers, UV-ray absorbers, antistain agents, pH controllers, antioxidants, antistatic agents, thickeners, graininess improvers, dyes, mordants, brighteners, developing speed controllers, matte agents, etc., within the range which does not impair the effect of the present invention.
- a polymer latex should be preferably contained, and examples of the polymer latex to be incorporated in said light-sensitive material may include preferably hydrates of vinyl polymers such as acrylates, methacrylates, styrene, etc. as disclosed in U.S. Pat. Nos. 2,772,166, 3,325,286, 3,411,911, 3,311,912, 3,525,620, Research Disclosure No. 195, 19551 published in July, 1989.
- polymer latex which may be preferably used, there may be included homopolymers of methaalkyl acrylate such as methyl methacryate, ethyl methacrylate, etc, homopolymers of styrene, or copolymers of methaalkyl acrylate or styrene with acrylic acid, N-methylolacryl-amide, glycidol methacrylate, etc., homopolymers of alkyl acrylate such as methyl acrylate, ethyl acrylate, butyl acrylate, etc. or copolymers of alkyl acrylate with acrylic acid, N-methylolacrylamide, etc.
- methaalkyl acrylate such as methyl methacryate, ethyl methacrylate, etc
- homopolymers of styrene or copolymers of methaalkyl acrylate or styrene with acrylic acid, N-methylolacryl
- the content of the copolymer component such as acrylic acid, etc. being up to 30% by weight
- the preferable range of the average particle size of the polymer latex to be used in the present invention may be 0.005 to 1 ⁇ , particularly preferably 0.2 to 0.1 ⁇ .
- the polymer latex to be used in the present invention may be contained either on one surface with respect to the support or both surfaces. More preferably, it should be contained on both surfaces. When it is contained on both surfaces with respect to the support, the kind and/or the amount of the polymer latex contained on the respective surfaces may be either the same or different:
- the layer in which the polymer latex is added may be any layer.
- the polymer latex when it is contained in the side containing the silver halide light-sensitive layer with respect to the support, the polymer latex may be contained in the silver halide light-sensitive layer, or alternatively in the non-light-sensitive colloid layer of the uppermost layer which is generally called protective layer.
- the polymer latex may be contained in either single layer in the surface comprising a plurality of layers or in plural layers (not limited to 2 layers) comprising any desired combination of layers.
- gelatin As the binder in the light-sensitive material to be used in the present invention, gelatin is used, and this gelatin includes gelatin derivatives, etc., and also cellulose derivatives, graft polymers of gelatin with other polymers, and other proteins, sugar derivatives, cellulose derivatives, hydrophilic colloids of synthetic hydrophilic polymeric substances, etc. which may be either of homopolymers or copolymers can be also used in combination.
- gelatin in addition to lime-treated gelatin, acid-treated gelatin, enzyme-treated gelatin as described in Bulletin of Society of Science Photography of Japan (Bull. Soi. Sci. Phot. Japan) No. 16, p. 30 (1966) may be also used, and also hydrolyzates or enzyme decomposed products of gelatin can be used.
- gelatin derivatives there may be employed those obtained by reacting various compounds such as acid halide, acid anhydride, isocyanates, bromoacetic acid, alkanesulfones, vinylsulfonamides, maleinimide compounds, polyalkylene oxides, epoxy compounds, etc. with gelatin. Specific examples are disclosed in U.S. Pat. Nos. 2,614,928, 3,132,945, 3,186,846, 3,312,553, G.B. Patent Nos. 861,414, 1,033,189, 1,005,784, Japanese Patent Publication No. 26845/1967.
- albumin As the protein, albumin, casein, as the cellulose derivative, hydroxyethyl cellulose, carboxymethyl cellulose, cellulose sulphate or as the sugar derivative, sodium alginate, starch derivative may be also used in combination with gelatin.
- graft polymer of gelatin with other polymers those having homo- or copolymer of a vinyl type monomer such as acrylic acid, methacrylic acid, derivatives thereof such as ester, amide, etc., acrylonitrile, styrene, etc. grafted onto gelatin can be used.
- graft copolymers of polymers compatibility to some extent with gelatin such as polymers of acrylic acid, acrylamide, methacrylamide, hydroxyalkyl methacrylate, etc. are preferred. Examples of these are disclosed in U.S. Pat. Nos. 2,763,625, 2,831,767, 2,956,884.
- the amount of gelatin coated, when containing no polymer latex other than subbing layer on the surface corresponding to the surface of the light-sensitive material, may be preferably 1.8 g/m 2 to 5.5 g/m 2 , particularly 2.0 to 4.8 g/m 2 per one surface of the support.
- a polymer latex When a polymer latex is contained on that surface, it should be preferably 1.5 to 6.0 g/m 2 , particularly preferably 1.8 to 5.5 g/m 2 .
- the support to be used in the light-sensitive material of the present invention may include flexible reflective support such as papers laminated with ⁇ -olefin polymer (e.g. polyethylene/butene copolymer), etc., synthetic papers, etc., films comprising semi-synthetic or synthetic polymers such as cellulose acetate, cellulose nitrate, polystyrene, polyvinyl chloride, polyethylene terephthalate, polycarbonate, polyamide, etc., and flexible supports having reflective layer provided on these films, metal, etc.
- flexible reflective support such as papers laminated with ⁇ -olefin polymer (e.g. polyethylene/butene copolymer), etc., synthetic papers, etc., films comprising semi-synthetic or synthetic polymers such as cellulose acetate, cellulose nitrate, polystyrene, polyvinyl chloride, polyethylene terephthalate, polycarbonate, polyamide, etc.
- polyethylene terephthalate is particularly preferred.
- subbing layer which can be used in the present invention, there may be included the subbing working layer in organic solvent system containing polyhydroxybenzenes as disclosed in Japanese Unexamined Patent Publication No. 3972/1984, etc., aqueous latex subbing working layers as disclosed in Japanese Unexamined Patent Publication No. 11118/1974, 104913/1977, 19941/1984, 19940/1984, 1984, 112326/1976, 117617/1976, 58469/1976, 114120/1976, 121323/1976, 123129/1976, 114121/1976, 139320/1977, 65422/1977, 109923/1977, 119919/1977, 1980, 128332/1982, 19941/1984.
- organic solvent system containing polyhydroxybenzenes as disclosed in Japanese Unexamined Patent Publication No. 3972/1984, etc.
- aqueous latex subbing working layers as disclosed in Japanese Unexamined Patent Publication No. 11118/1974, 104913/1977, 19941/1984, 1994
- said subbing layer can be generally subjected on its surface to chemical or physical treatment.
- treatment there may be included surface activating treatments such as chemical treatment, mechanical treatment, corona dicharging treatment, flame treatment, UV-ray treatment, high frequency treatment, glow discharging treatment, active plasma treatment, laser treatment, mixed acid treatment, ozone oxidation treatment, etc.
- the subbing layer is distinguished from the coating layer according to the present invention and the coating timing and conditions are not limited at all.
- filter dyes and other dyes for various purposes such as halation prevention can be used.
- the dyes employed may include triaryl dyes, oxanol dyes, hemioxanol dyes, malocyanine dyes, cyanine dyes, styryl dyes, azo dyes. Among them, oxanol dyes, hemioxanol dyes and melocyanine dyes are useful. Specific examples of the dyes which can be used may include those as disclosed in West German Patent No. 616,007, G.B. Patent Nos. 584,609, 1,177,429, Japanese Patent Publication Nos.
- these dyes should be preferably used, and it is particularly preferable to use them so that the sensitivity to the light of 400 nm may be incorporated to 30-fold or more of the sensitivity to the light of 360 nm.
- the light-sensitive material of the present invention can be exposed by use of an electromagnetic wave in the spectral region to which the emulsion layer constituting said light-sensitive material has sensitivity.
- the present invention can give remarkable effect when applied to a light-sensitive material for printing for which very high dimensional stability before and after processing is required.
- the developing agent to be used in development of the light-sensitive silver halide photographic material according to the present invention may include those as mentioned below.
- HO--(CH ⁇ CH) n --OH type developing agents are hydroquinone, and otherwise catechol, pyrogallol and their derivatives, and also ascorbic acid, chlorohydroquinone, bromohydroquinone, methylhydroquinone, 2,3-dibromohydroquinone, 2,5-diethylhydroquinone, catechol, 4-chlorocatechol, 4-phenylcatechol, 3-methoxy-catechol, 4-acetyl-pyrogallol, sodium ascorbate.
- 3-pyrazolidones such as 1-phenyl-3-pyrazolidone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone; 1-phenyl-4-amino-5-pyrazolone, 5-aminouracil, etc.
- a sulfite such as sodium sulfite, potassium sulfite, etc. can be used without impairing the effect of the present invention.
- hydroxylamine, a hydrazide compound can be used as the preservative, and in this case, its amount may be preferably 5 to 500 g, more preferably 20 to 200 g per one liter of the developer.
- glycols as an organic solvent, and as such glycol, ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butanediol, 1,5-pentane diol, etc. may be preferably used.
- the amount of these glycols used may be 5 to 500 g, more preferably 20 to 200 g per one liter of the developer.
- These organic solvents can be used either alone or in combination.
- the light-sensitive silver halide photographic material according to the present invention can be subjected to developing processing by use of a developer containing a development inhibitor, whereby a light-sensitive material very excellent in storage stability can be obtained.
- the light-sensitive silver halide photographic material according to the present invention can be processed under various conditions.
- the processing temperature may be, for example, a developing temperature of 50° C. or lower, particularly around 25° to 40° C., and also the developing time should be preferably completed within less than 20 seconds, particularly 19 seconds or less. Further, the present invention can exhibit its effect most effectively when the developing time is within the range of 15 seconds or less, and further 15 to 10 seconds.
- processing steps than developing, for example, water washing, stopping, stabilizing, fixing, and further previous film hardening, neutralization, etc. can be employed as desired, and these can be also suitably omitted.
- various acids, salts, fixing promoters, humectants, surfactants, chelating agents, film hardeners, etc. can be contained.
- thiosulfates, sulfites, potassium, sodium, ammonium salts of these acids as acids, sulfuric acid, hydrochloric acid, nitric acid, boric acid, formic acid, acetic acid, propionic acid, oxalic acid, tartaric acid, citric acid, malic acid, phthalic acid, etc. and as salts, potassium, sodium, ammonium salts, etc.
- thiourea derivatives examples include thiourea derivatives, alcohols having triple bond within the molecule as disclosed in Japanese Patent Publication No. 35754/1970, Japanese Unexamined Patent Publication Nos. 122535/1983, 122536/1983, thioethers, as disclosed in U.S. Pat. No. 4,126,459, or cyclodextran ethers which make free anions, crown ethers, diazabicycloundecene, di(hydroxyethyl)butamine, etc.
- humectant alkanolamines, alkylene glycols, etc. may be included.
- aminoacetic acids such as nitrilotriacetic acid, EDTA, etc. may be included.
- film hardener chromium alum, potassium alum, and other Al compounds, etc. can be incorporated.
- the present invention can exhibit its advantages greatly when ultra-fast processing with a processing time of 20 to 60 seconds is applied.
- the ultra-fast processing as mentioned in the present specification refers to a processing in which the total time after the tip end of a film is inserted into an automatic developing machine, passing through the developing tank, the cross-over portion, the fixing tank, the cross-over portion, the water washing tank, the cross-over portion, the drying portion, until the tip end of the film comes out from the drying portion (in other words the quotient of the entire length of the processing line divided by the line conveying speed) is 20 seconds to 60 seconds.
- 1.2 g of the hydrazine compound shown in Table 2 was added to the emulsion A per 1 mole of silver.
- the antifoggant 30 mg/m 2 of 1-phenyl-5-mercaptotetrazole and 20 mg/m 2 of 5-methylbenzotriazole
- the development controller 30 mg/m 2 of a nonylphenoxy-polyethylene glycol (ethylene oxide units 30) and 1 g/m 2 of an acrylic acid-butyl methacrylate-styrene polymer latex, and further bisvinylsulfomethyl ether and glyoxazole of the film hardening agent were successively added, and the resultant mixture was coated on a polyethylene terephthalate base simultaneously with a protective layer.
- gelatin amount relative to the silver amount is shown in Table 2. Then, these samples were exposed through a glass wedge by P-627 FM roomlight printer (manufactured by Dainippon Screen), and processed with the developer and the fixed shown below. In this processing, developing time was 15 seconds (35° C.).
- the pH of the fixer was adjusted to 6 with acetic acid.
- the amount of the silver coated was analyzed by a fluorescent X-ray analyzer.
- the silver amount after processing is shown in the silver amount which gives the maximum density.
- ⁇ is defined for density from 0.3 to 3.0.
- the product with ⁇ 6 can be practically applied with difficulty because fine lines are practically collapsed.
- the dot quality was evaluated based on the sensory examination by enlarging the dot formed by bringing the contact screen in close dot contact with the film during exposure with a 100-fold magnifier.
- the rank 5 indicates the highest state, with the states of rank 2 or lower standing no practical application.
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Abstract
Disclosed is a negative type light-sensitive silver halide photographic material comprising at least one light-sensitive silver halide emulsion provided on a support, wherein the ratio of silver amount to gelatin amount (Ag/Gel) (wherein the silver amount is the total silver amount in one or more layers provided in the same side as the light-sensitive silver halide emulsion layer with respect to the support, and the gelatin amount is the total gelatin amount in one or more gelatin layers provided in the same side as the light-sensitive silver halide emulsion layer with respect to the support) is 1.0 or more, and a hydrophilic colloid layer in the light-sensitive silver halide emulsion contains a hydrazine compound.
Description
This invention relates to a negative type light-sensitive silver halide photographic material.
In recent years, in the field of printing plates, the developing method by use of a developer of hydroquinone alone called lith-developing for obtaining an image of high contrast has been the main stream, but this method is poor in preservability of the developer, and also since the developing time is long, a rapid access development using phenidone or metol as the developing agent is incorporated.
However, if such developer is used, the high contrast characteristic of lith-developing will be lost.
Accordingly, so as to have high contrast characteristic comparable with lith-developing in spite of fast processing, the method of adding a tetrazolium compound or a hydrazine compound into the film has been proposed, and it has been reported that an image of high contrast can be obtained by this method even by fast processing with a developing time of 20 to 30 seconds.
However, the trend of fast processing in recent years is demanding even ultra-fast processing such as shorter than 20 seconds, and also the situation is such that also the image quality inferior to the present level is not tolerable. When the light-sensitive material of the prior art is subjected to ultra-fast processing with a developing time as short as 15 seconds by use of a processing solution of the prior art, the amount of the silver developed is small to give no sufficient density as unsuitable for practical application.
Further, in this field of art, there is the working of etching chemically developed silver, which is called "reduction", and the image developed is demanded to have sufficient amount of silver, and also from the standpoint of saving of resources, it is preferable that 90% of the silver coated should participate effectively in the development.
Thus, it has been desired to have a means which enables development of sufficient silver amount without waste within a short time and can give an image of high contrast.
An object of the present invention is to provide a negative type light-sensitive silver halide photographic material which can solve the above-mentioned problems, namely capable of developing sufficient amount of silver without waste within a short time, and having an image of high contrast.
The above object can be accomplished by a negative type light-sensitive silver halide photographic material comprising at least one light-sensitive silver halide emulsion provided on a support, wherein the ratio of silver amount to gelatin amount (Ag/Gel) (wherein said silver amount is the total silver amount in one or more layers provided in the same side as said light-sensitive silver halide emulsion layer with respect to the support, and said gelatin amount is the total gelatin amount in one or more gelatin layers provided in the same side as said light-sensitive silver halide emulsion layer with respect to the support) is 1.0 or more, and a hydrophilic colloid layer in said light-sensitive silver halide emulsion contains a hydrazine compound.
In the present invention, it is desirable that the light-sensitive silver halide photographic material should contain 2 g/m2 or less, more preferably 0.2 to 1.5 g/m2 of a polymer latex therein.
More specifically, the present inventors have found that in order to obtain sufficient density after development processing by ultra-fast processing, increase of Ag/Gel should be extremely preferable rather than mere increase of the silver amount coated, to have accomplished the above invention. However, by merely increasing Ag/Gel, there is a tendency that cracking may occur when the raw film and the film after processing is stored under low humidity conditions (at relative humidity of 30% or lower) during storage, and hence it has been found that a polymer latex of 2 g/m2 or lower should be desirably contained in the light-sensitive silver halide photographic material. Also, by doing so, the problem of coating irregularity has been reduced.
The specific content of the present invention will be explained below.
The gelatin amount in the present invention is the sum of the gelatin amount in the gelatin layers of one layer or more in the side including the light-sensitive silver halide emulsion layer with respect to the support (even in the case of the gelatin derivative as described below, the amount of the gelatin derivative is considered as the gelatin amount), and is not limited only to the gelatin amount in the silver halide emulsion layer. Also, the silver amount is the total silver amount in the respective layers, when it is provided by coating in a plural number of layers in the same side with respect to the support.
The hydrazine compound to be used in the present invention may include compounds represented by the following formula [I], [I-a], [I-b]or [I-c]. ##STR1## wherein R1 and R2 each represent hydrogen atom, a monovalent aromatic residue, a monovalent heterocyclic residue or a monovalent aliphatic residue, Q1 and Q2 each represent hydrogen atom, an alkylsulfonyl group which may be substituted or unsubstituted, an arylsulfonyl group which may be substituted or unsubstituted, and Xl represents oxygen atom or sulfur atom. ##STR2## wherein R1 and R2 each represent an aryl group or a heterocyclic group, R represents a divalent organic linking group, n is 0 to 6, m is 0 or 1, and when n is 2 or more, respective R's may be either the same or different. ##STR3## wherein R21 represents an aliphatic group, an aromatic group or a heterocyclic group, R22 represents hydrogen atom, an alkoxy group which may be substituted, a heterocyclic oxy group, an amino group or an aryloxy group, P1 and P2 each represent hydrogen atom, an acyl group or a sulfinic acid group. ##STR4## wherein Ar represents an aryl group containing at least one of diffusion resisitant group or silver halide adsorption promoting group, and R31 represents a substituted alkyl group.
Of the hydrazine compounds represented by Formula [I] to be used in the present invention, the compounds wherein X1 is oxygen atom and R2 is hydrogen atom are particularly preferred.
As the monovalent organic residue of the above R1 and R2, aromatic residues, heterocyclic residues and aliphatic residues are included.
As the aromatic residues, there may be included phenyl group, naphthyl group and these groups having substituents (e.g. alkyl, alkoxy, acylhydrazino, dialkylamino, alkoxycarbonyl, cyanol, carboxyl, nitro, alkylthio, hydroxy, sulfonyl, carbamoyl groups, halogen atoms, acylamino, sulfonamide, thiourea groups, etc ). Specific examples having substituents may include 4-methylphenyl, 4-ethylphenyl, 4-oxyethylphenyl, 4-dodecylphenyl, 4-carboxyphenyl, 4-diethylaminophenyl, 4-octylaminophenyl, 4-benzylaminophenyl, 4-acetamido-2-methylphenyl, 4-(3-ethylthioureido)phenyl,4-[2-(2,4-di-tert-butylphenoxy)butylamido]phenyl, 4-[2-(2,4-di-tert-butylphenoxy)butylamido]phenyl groups, etc.
As the heterocyclic groups, 5-membered or 6-membered monocyclic or fused rings having at least one of oxygen, nitrogen, sulfur or selenium atom may be included, and these may have substituents. Specific examples may include residues such as pyrroline, pyridine, quinoline, indole, oxazole, benzooxazole, naphthoxazole, imidazole, benzoimidazole, thiazoline, thiazole, benzothiazole, naphthothiazole, selenazole, benzoselenazole, naphthoselenazole rings, etc.
These heterocyclic rings may be also substituted with alkyl groups having 1 to 4 carbon atoms, alkoxy groups having 1 to 4 carbon atoms, aryl group having 6 to 18 carbon atoms, halogen atoms, alkoxycarbonyl group, cyano group, amide group, etc.
As the aliphatic residues, straight and branched alkyl groups, cycloalkyl groups and these groups attached with substituents, as well as alkenyl and alkynyl groups are included.
Examples of the straight or branched alkyl group may include alkyl groups having 1 to 18, preferably 1 to 8 carbon atoms, specifically methyl, ethyl, isobutyl, 1-octyl groups and the like.
Examples of the cycloalkyl group may include those having 3 to 10 carbon atoms, specifically cyclopropyl, cyclohexyl, adamantyl groups and the like. As the substituent on the alkyl group or the cycloalkyl group, there may be included alkoxy, alkoxycarbonyl, carbamoyl, hydroxy, alkylthio, amide, acyloxy, cyano, sulfonyl groups, halogen atoms, aryl groups, etc., and specific examples of those substituted can include 3-methoxypropyl, ethoxycarbonylmethyl, 4-chlorocyclohexyl, benzyl, p-methylbenzyl, p-chlorobenzyl groups, etc.
As the alkenyl group, for example, allyl group, and as the alkynyl group, propargyl group may be included.
Specific examples of the hydrazine compound to be used in the present invention are shown below, but the present invention is not limited by these at all.
(I-1) 1-Formyl-2-{4-[2-(2,4-di-tert-butylphenoxy)butylamido]phenyl}hydrazine
(I-2) 1-Formyl-2-{4-[2-(2,4-di-tert-butylphenoxy)butylureido]phenyl}hydrazine
(I-3) 1-Formyl-2-(4-diethylaminophenyl)hydrazine
(I-4) 1-Formyl-2-(p-tolyl)hydrazine
(I-5) 1-Formyl-2-(4-ethylphenyl)hydrazine
(I-6) 1-Formyl-2-(4-acetamido-2-methylphenyl)hydrazine
(I-7) 1-Formyl-2-(4-oxyethylphenyl)hydrazine
(I-8) 1-Formyl-2-(4-N,N-dihydroxyethylaminophenyl)hydrazine
(I-9) 1-Formyl-2-(4-(3-ethylthioureido)phenyl)hydrazine
(I-10) 1-Thioformyl-2-(4-[2-(2,4-di-tert-butylphenoxy)-butylamido]phenyl)hydrazine
(I-11) 1-Formyl-2-(4-benzylaminophenyl)hydrazine
(I-12) 1-Formyl-2-(4-octylaminophenyl)hydrazine
(I-13) 1-Formyl-2-(4-dodecylphenyl)hydrazine
(I-14) 1-Acetyl-2-{4-[2-(2,4-di-tert-butylphenoxy)-butylamido]phenyl}hydrazine
(I-15) 4-Carboxyphenylhydrazine
(I-16) 1-Acetyl-1-(4-methylphenylsulfonyl)-2-phenylhydrazine
(I-17) 1-Ethoxycarbonyl-1-(4-methylphenylsulfonyl)-2-phenylhydrazine
(I-18) 1-Formyl-2-(4-hydroxyphenyl)-2-(4-methylphenylsulfonyl)hydrazine
(I-19) 1-(4-Acetoxyphenyl)-2-formyl-1-(4-methylphenylsulfonyl)hydrazine
(I-20) 1-Formyl-2-(4-hexanoxyphenyl)-2-(4-methylphenylsulfonyl)hydrazine
(I-21) 1-Formyl-2-[4-(tetrahydro-2H-pyran-2-yloxy)phenyl]-2-(4-methylphenylsulfonyl)hydrazine
(I-22) 1-Formyl-2-(4-(3-hexylureidophenyl))-2-(4-methylphenylsulfonyl)hydrazine
(I-23) 1-Formyl-2-(4-methylphenylsulfonyl)-2-[4-(phenoxythiocarbonylamino)phenyl]hydrazine
(I-24) 1-(4-Ethoxythiocarbonylaminophenyl)-2-formyl-1-(4-methylphenylsulfonyl)hydrazine
(I-25) 1-Formyl-2-(4-methylphenylsulfonyl)-2-[4-(3-methyl-3-phenyl-2-thioureido)phenyl]hydrazine
(I-26) 1-{{4-{3-[4-(2,4-bis-t-amylphenoxy)butyl]ureido}phenyl}}-2-formyl-1-(4-methyl-phenylsulfonyl)hydrazine ##STR5##
Next, Formulae [I - a], [I -b] and [I - c] are to be described in more detail below. ##STR6## In the formula, R1 and R2 each represent an aryl group or a heterocyclic group, R represents a divalent organic linking group, and n represents 0 to 6 and m represents 0 or 1.
Here, the aryl group represented by R1 and R2 may include phenyl group, naphthyl group, and the heterocyclic group represented by R1 and R2 may include pyridyl group, benzothiazolyl group, quinolyl group, thienyl group, etc., but R1 and R2 may be preferably aryl groups. The aryl group or heterocyclic group represented by R1 and R2 can introduce various substituents therein. Examples of substituents may include halogen atoms (e.g. chlorine, fluorine, etc.), alkyl groups (e.g. methyl, ethyl, dodecyl, etc.), alkoxy groups (e.g. methoxy, ethoxy, isopropoxy, butoxy, octyloxy, dodecyloxy, etc.), acylamino groups {e.g. acetylamino, pivalylamino, benzoylamino, tetradecanoylamino α-(2 4-di-t-amylphenoxy) butyrylamino. etc.}, sulfonylamino groups (e.g. methanesulfonylamino, butanesulfonylamino, dodecanesulfonylamino, benzenesulfonylamino, etc.), urea groups (e.g. phenylurea, ethylurea, etc.), thiourea groups (e.g. phenylthiourea, ethylthiourea, etc.), hydroxy group, amino group, alkylamino groups (e.g. methylamino, dimethylamino, etc.), carboxy group, alkoxycarbonyl groups (e.g. ethoxycarbonyl), carbamoyl group, sulfo group and so on. Examples of the divalent organic linking group represented by R may include alkylene groups (e.g. methylene, ethylene, trimethylene, tetramethylene, etc.), arylene groups (e.g. phenylene, naphthylene, etc.), aralkylene groups, etc., and the alkylene group may contain oxy group, thio group, seleno group, carbonyl group, ##STR7## group (R3 represents hydrogen atom, an alkyl group, an aryl group), sulfonyl group, etc. in the bond. Into the group represented by R can be introduced various substituents.
Examples of substituents may include --CONHNHR4 (R4 has the same meaning as R1 and R2 as described above), alkyl groups, alkoxy groups, halogen atoms, hydroxy group, carboxy group, acyl groups, aryl groups, etc.
R may be preferably a alkylene group.
Of the compounds represented by Formula [I - a], preferable are compounds wherein R1 and R2 are substituted or unsubstituted phenyl groups, n=m=1 and R represents an alkylene group.
Representative compounds represented by the above Formula [I - a] are shown below. ##STR8##
In the following, Formula [I - b] is to be described. ##STR9## The aliphatic group represented by R21 may be preferably one having 6 or more carbon atoms, particularly a straight, branched or cyclic alkyl group having 8 to 50 carbon atoms. Here, the branched alkyl group may be cyclized so as to form a saturated hetero ring containing one or more hetero atoms. The alkyl group may have substituent such as aryl group, alkoxy group, sulfoxy group, etc.
The aromatic group represented by R21 is a monocyclic or bicyclic aryl group or unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be condensed with the monocyclic or bicyclic group to form a heteroaryl group.
For example, there may be included benzene ring, naphthalene ring, pyridine ring, pyrimidine group, imidazole ring, pyrazole ring, quinoline ring, isoquinoline ring, benzimidazole ring, thiazole ring, benzothiazole ring, etc., but amount them those containing benzene ring are preferred.
As R21, particularly preferred is an aryl group.
The aryl group or unsaturated heterocyclic group represented by R21 may be substituted, and representative substituents may include straight, branched or cyclic alkyl groups (preferably monocyclic or bicyclic ones with an alkyl moiety having 1 to 20 carbon atoms), alkoxy groups (having preferably 1 to 20 carbon atoms), substituted amino groups (preferably amino groups substituted with alkyl groups having 1 to 20 carbon atoms), acylamino groups (having preferably 2 to 30 carbon atoms), sulfonamide groups (having preferably 1 to 30 carbon atoms), ureido groups (having preferably 1 to 30 carbon atoms) and others.
Of the groups represented by R22 in the formula [I - b], the alkoxy group which may be substituted may have 1 to 20 carbon atoms and may be substituted with halogen atoms, aryl groups, etc.
Of the groups represented by R22 in the formula [I - b], the aryloxy group or the heterocyclic oxy group which may be also substituted may be preferably monocyclic, and the substituent may include halogen atoms, alkyl groups, alkoxy group, cyano group, etc.
Of the groups represented by R22, preferable are alkoxy groups or amino groups which may be also substituted.
In the case of an amino group, A1 and A2 in the group ##STR10## group may be an alkyl group, alkoxy group which may be substituted, or a cyclic structure containing --O--, --S--, --N-- group bond. However, R22 cannot be hydrazino group.
R21 or R22 in Formula [I - b] may be one having a ballast group conventionally used in the immobile additive for photography such as coupler, etc. incorporated therein. The ballast group is a group having 8 or more carbon atoms relatively inert to photographic characteristic, and can be chosen from, for example, alkyl groups, alkoxy groups, phenyl groups, alkylphenyl groups, phenoxy groups, alkylphenoxy groups, etc.
R21 or R22 in Formula [I- b] may be also one having a group for strengthening adsorption to the surface of silver halide grains incorporated therein. As such adsorptive groups, there may be included the groups as disclosed in U.S. Pat. No. 4,355,105 such as thiourea group, heterocyclic thioamide group, mercaptoheterocyclic group, triazole group, etc. Among the compounds represented by the group [I - b], the compounds represented by Formula [I - b - a] are particularly preferable. ##STR11## In the Formula [I - b - a],
R23 and R24 each represent hydrogen atom, an alkyl group which may be substituted (e.g. methyl, ethyl, butyl, dodecyl, 2-hydroxypropyl, 2-cyanoethyl, 2-chloroethyl group), a phenyl, naphthyl, cyclohexyl, pyridyl, pyrrolidyl group which may be substituted (e.g. phenyl, p-methylphenyl, naphthyl, α-hydroxy-naphthyl, cyclohexyl, p-methylcyclohexyl, pyridyl, 4-propyl-2-pyridyl, pyrrolidyl, 4-methyl-2-pyrrolidyl group);
R25 represents hydrogen atom or a benzyl, alkoxy and alkyl group which may be substituted (e.g. benzyl, p-methylbenzyl, methoxy, ethoxy, ethyl, butyl group);
R26 and R27 each represent a divalent aromatic group (e.g. phenylene or naphthylene group), Y represents sulfur atoms or oxygen atom, L represents a divalent linking group (e.g. --SO2 CH2 CH2 NH--SO2 NH--, --OCH2 SO2 NH--, --O--, --CH═N--);
R28 represents --NR'R" or --OR29 ;
R', R" and R29 each represent hydrogen atom, an alkyl group which may be substituted (e.g. methyl, ethyl, dodecyl group), a phenyl group which may be substituted (e.g. phenyl, p-methylphenyl, p-methoxyphenyl group) or a naphthyl group which may be substituted (e.g. α-naphthyl group, β-naphthyl group), m, n represent 0 or 1, and when R28 represents OR29, Y should preferably represent sulfur atom.
Representative compounds represented by the above Formulae [I - b] and [I - b - a] are shown below.
Specific compounds of Formula [I-b]: ##STR12## Of the above specific compounds, by taking examples of the compounds I-b-45 and I-b-47, their synthetic methods are shown below. ##STR13##
A mixture of 153 g of 4-nitrophenylhydrazide and 500 ml of diethyloxalate is refluxed for one hour. While the reaction is proceeded, ethanol is removed and finally the mixture is cooled to precipitate crystals. After filtration, the product is washed several times with petroleum ether and recrystallized. Then, 50 g of the crystals (A) obtained are dissolved by heating in 1000 ml of methanol, and reduced in a H2 atmosphere pressurized at 50 psi in the presence of Pd/C (palladium-carbon) catalyst to obtain the compound (B).
To a solution of 22 g of the compound (B) dissolved in 200 ml of acetonitrile and 16 g of pyridine is added an acetonitrile solution containing 24 g of the compound (C) at room temperature. After the insolubles are filtered off, the filtrate is concentrated and purified by recrystallization to obtain 31 g of the compound (D).
Thirty (30) g of the compound (D) is hydrogenated similarly as described above to obtain 20 g of the compound (E).
To a solution of 10 g of the compound (E) dissolved in 100 ml of acetonitrile is added 3.0 g of ethylisothio-cyanate, and the mixture is refluxed for one hour. After evaporation of the solvent, the residue is purified by recrystallization to obtain 7.0 g of the compound (F). To a solution of 5.0 g of the compound (F) dissolved in 50 ml of methanol is added methylamine (8 ml of aqueous 40% solution), followed by stirring. After concentrating slightly methanol, the precipitated solid is taken out and purified by recrystallization to obtain Compound I - b - 45. ##STR14##
Into a stirred solution of 22 g of the compound (B) dissolved in 200 ml of pyridine, 22 g of p-nitrobenzenesulfonyl chloride is added. The reaction mixture is poured into water, and the post-precipitated solid is taken out to obtain the compound (C). From the compound (C), according to the same reactions as in the case of Compound I - b - 45 following the synthesis scheme, Compound I - b - 47 is obtained.
Next, Formula [I - c] is to be described. ##STR15##
In Formula [I - c], Ar represents an aryl group containing at least one of diffusion resistant groups or silver halide adsorption promoting groups, and as the diffusion resistant group, a ballast group conventionally used in immobile additives for photography such as coupler, etc. is preferable. The ballast group is a group having 8 or more carbon atoms relatively inert to photographic characteristic, and can be chosen from, for example, alkyl groups, alkoxy groups, phenyl groups, alkylphenyl groups, phenoxy groups, alkylphenoxy groups, etc.
As the silver halide adsorption promoting group, there may be included the groups as disclosed in U.S. Pat. No. 4,385,108 such as thiourea group, thiourethane group, heterocyclic thioamide group, mercaptoheterocyclic group, triazole group, etc.
R3 represents a substituted alkyl group, and the alkyl group may be a straight, branched or cyclic alkyl group, including methyl, ethyl, propyl, butyl, isopropyl, pentyl, cyclohexyl and the like.
As the substituent to be introduced into these alkyl group, there may be included groups of alkoxy (e.g. methoxy, ethoxy), aryloxy (e.g. phenoxy, p-chlorophenoxy), heterocyclic oxy (e.g. pyridyloxy), mercapto, alkylthio (e.g. methylthio, ethylthio), arylthio (e.g. phenylthio, p-chlorophenylthio), heterocyclic thio (e.g. pyridylthio, pyrimidylthio, thiadiazolylthio), alkylsulfonyl (e.g. methanesulfonyl, butanesulfonyl), arylsulfonyl (e.g. benzenesulfonyl), heterocyclic sulfonyl (e.g. pyridylsulfonyl, morpholinosulfonyl), acyl (e.g. acetyl, benzoyl), cyano, chloro, bromo, alkoxycarbonyl (e.g. ethoxycarbonyl, methoxycarbonyl), aryloxycarbonyl (e.g. phenoxycarbonyl), carboxy, carbamoyl, alkylcarbamoyl (e.g. N-methylcarbamoyl, N,N-dimethylcarbamoyl), arylcarbamoyl (e.g. N-phenylcarbamoyl), amino, alkylamino (e.g. methylamino, N,N-dimethylamino), arylamino (e.g. phenylamino, naphthylamino), acylamino (e.g. acetylamino, benzoylamino), alkoxycarbonylamino (e.g. ethoxycarbonylamino), aryloxycarbonylamino (e.g. phenoxycarbonylamino), acyloxy (e.g. acetyloxy, benzoyloxy), alkylaminocarbonyloxy (e.g. methylaminocarbonyloxy), arylaminocarbonyloxy (e.g. phenylaminocarbonyloxy), sulfo, sulfamoyl, alkylsulfamoyl (e.g. methylsulfamoyl), arylsulfamoyl (e.g. phenylsulfamoyl), etc.
The hydrogen atom of hydrazide may be also substituted with a substituent such as sulfonyl group (e.g. methanesulfonyl, toluenesulfonyl), acyl group (e.g. acetyl, trifluoroacetyl), oxalyl group (e.g. ethoxalyl), etc.
Representative compounds represented by the above Formula [I - c] are shown below. ##STR16##
Next, a synthesis example of Compound I - c - 5 is described. ##STR17##
According to the procedure similar to the synthetic method of Compound I - b - 45, Compound I - c - 5 is obtained.
The position where the above hydrazine compound is to be added is in the silver halide emulsion layer and/or the non-light-sensitive layer existing on the silver halide emulsion layer on the support, but preferably in the silver halide emulsion layer and/or its subbing layer.
The amount added should be preferably 10-5 to 10-1 mole/1 mole of silver, further preferably 10-4 to 10-2 mole/1 mole of silver.
In the present invention, it is preferable to use light-sensitive silver halide grains with an average grain size of 0.05 to 0.3μ. Here, the average grain size refers to its diameter in the case of spherical particles, or the diameter when calculated on the circular image with the same area as its projected image in the case of grains with shapes other than spherical shape.
It is preferred that 60% or more of the total grains should have particle sizes within the range of ±10% of the average grain size.
For the silver halide emulsion to be used in the present invention (hereinafter called silver halide emulsion or merely emulsion), any of silver bromide, silver iodobromide, silver iodochloride, silver chloroiodobromide, silver chloride, silver chlorobromide, silver iodide may be used. Also, the silver halide emulsion used in the present invention may have a single composition, or alternatively grains with a plurality of compositions may be also contained within the single layer or a plurality of layers.
To the silver halide grains to be used in the silver halide emulsion, there can be added metal ions by use of at least one selected from cadmium salts, zinc salts, lead salts, thallium salts, iridium salts (complexes containing them), rhodium salts (complexes containing them) and iron salts (complexes containing them) in the process of forming and/or growing the grains to incorporate these metal elements internally of the grains and/or on the grain surfaces, and a water-soluble rhodium salt is particularly preferably. Also, by placing in a reductive appropriate atmosphere, reduced sensitizing nuclei can be imparted internally of the grains and/or on the grain surfaces. When a water-soluble rhodium salt is added, the amount added may be preferably 1×10-7 to 1×10-4 mole/1 mole AgX.
The silver halide grains to be used in the silver halide emulsion may either have a uniform silver halide composition distribution within the grain or a core-shell grain with different silver halide compositions in the inner portion and in the surface layer of the grain.
The silver halide grains to be used in the silver halide emulsion may be either those in which latent images are formed primarily on the surface or those primarily internally of the grains.
The silver halide grains to be used in the silver halide emulsion may be either those having regular crystal forms such as cubic, octahedral, tetradecahedral bodies, or irregular shapes such as spherical, plate shapes. Also, they may have composite form of these crystal forms, and may contain grains of various forms mixed therein.
As the silver halide emulsion, two or more kinds of silver halide emulsions which have been formed separately may be used in a mixture.
The silver halide emulsion should be preferably sensitized by use of chemical sensitizers and the sensitizing methods as described in G.B. Pat. Nos. 618,061, 1,315,755, 1,396,696, Japanese Patent Publication No. 15748/1969, U.S. Pat. Nos. 1,574,944, 1,623,499, 1,673,522, 2,278,947, 2,399,083, 2,410,689, 2,419,974, 2,448,060, 2,487,850, 2,518,698, 2,521,926, 2,642,361, 2,694,637, 2,728,668, 2,739,060, 2,743,182, 2,743,183, 2,983,609, 2,983,610, 3,021,215, 3,026,203, 3,297,446, 3,297,447, 3,361,564, 3,411,914, 3,554,757, 3,565,631, 3,565,633, 3,591,385, 3,656,955, 3,761,267, 3,772,031, 3,857,711, 3,891,446, 3,901,714, 3,904,415, 3,930,867, 3,984,249, 4,054,457, 4,067,740 and The Theory of the Photographic Process. 4th Ed. Macmillan. 1977 by T. H. James, page 67˜76.
The silver halide emulsion to be used in the light-sensitive material according to the present invention can be chemically sensitized to a required wavelength region by use of a dye which has been known as the sensitizing dye in the field of photography. The sensitizing dye may be also used alone, but may be also used in combination of two or more kinds. Together with the sensitizing dye, there may be also contained a supersensitizer which is a dye having itself no spectral sensitizing action, or a compound absorbing substantially no visible light, and potentiating the sensitizing action of the sensitizing dye may be also contained in the emulsion.
As the useful sensitizing dye to be used in the blue-sensitive silver halide nucleus emulsion layer, there may be included, for example, those as described in West German Pat. No. 929,080, U.S. Pat. Nos. 2,231,658, 2,493,748, 2,503,776, 2,519,001, 2,912,329, 2,656,959, 3,672,897, 3,694,217, 4,025,349, 4,046,572, G.B. Pat. No. 1,242,588, Japanese Patent Publication Nos. 14030/1969, 1977.
As the useful sensitizing dye to be used in the green-sensitive silver halide emulsion, there may be included, for example, cyanine dyes, melocyanine dyes or complex cyanine dyes as described in U.S. Pat. Nos. 1,939,201, 2,072,908, 2,739,149, 2,945,763, G. B. Pat. No. 505,979 as representative ones.
Further, as the useful sensitizing dye to be used in the red-sensitive silver halide emulsion, there may be included, for example, cyanine dyes, melocyanine dyes or complex cyanine dyes as described in U.S. Pat. Nos. 2,269,234, 2,270,378, 2,442,710, 2,454,629, 2,776,280 as representative ones. Also, cyanine dyes or complex cyanine dyes as described in U.S. Pat. Nos. 2,213,995, 2,493,748, 2,519,001, West German Pat. No. 929,080 can be advantageously used in the green-sensitive silver halide emulsion or the red-sensitive silver halide emulsion.
In the silver halide emulsion to be used in the present invention, for the purpose of preventing fog or maintaining photographic performances during the preparation steps, storage or photographic processing of the light-sensitive material, a compound known as the antifoggant or stabilizer in the field of photography can be added during chemical aging, on completion of chemical aging and/or after completion of chemical aging before coating of the silver halide emulsion.
Examples of the antifoggant, stabilizer may include azaindenes such as pentazaindenes as disclosed in U.S. Pat. Nos. 2,713,541, 2,743,180, 2,743,181, tetrazaindenes as disclosed in U.S. Pat. Nos. 2,716,062, 2,444,607, 2,444,605, 2,756,147, 2,835,581, 2,852,375, Research Disclosure I4851, triazaindenes as disclosed in U.S. Pat. No. 2,772,146, polymerized azaindenes as disclosed in Japanese Unexamined Patent Publication No. 211142/1982; quaternary phosphonium salts such as thiazolium salts as disclosed in U.S. Pat. Nos. 2,131,038, 3,342,596, 3,954,478, pyrylium salts as disclosed in U.S. Pat. No. 3,148,067, and phosphonium salts as disclosed in Japanese Patent Publication No. 40665/1975; mercapto-substituted heterocyclic compounds such as mercaptotetrazoles, mercaptotriazoles, mercaptodiazole as disclosed in U.S. Pat. Nos. 2,403,927, 3,266,897, 3,708,303, Japanese Unexamined Patent Publication Nos. 135835/1980, 71047/1984, mercaptothiazoles as disclosed in U.S. Pat. No. 2,824,001, mercaptobenzthiazoles, mercaptobenzimidazoles as disclosed in U.S. Pat. No. 3,937,987; mercaptooxadiazoles as disclosed in U.S. Pat. No. 2,843,491, mercapto-substituted heterocyclic compounds such as mercaptothiadiazoles as disclosed in U.S. Pat. No. 3,364,028, polyhydroxybenzenes such as catechols as disclosed in U.S. Pat. No. 3,236,652, Japanese Patent Publication No. 10256/1968, rezorcine as disclosed in Japanese Patent Publication No. 44413/1981, and gallic acid esters as disclosed in Japanese Patent Publication No. 4133/1968; heterocyclic compounds including azoles such as tetrazoles as disclosed in West German Patent No. 1,189,380, triazole as disclosed in U.S. Pat. No. 3,157,509, benztriazoles as disclosed in U.S. Pat. No. 2,704,721, urazoles as disclosed in U.S. Pat. No. 3,287,135, pyrazoles as disclosed in U.S. Pat. No. 3,106,467, imidazoles as disclosed in U.S. Pat. No. 2,271,229, and azoles such as polymerized benzotriazoles as disclosed in Japanese Unexamined Patent Publication No. 90844/1984, etc., pyrimidines as disclosed in U.S. Pat. No. 3,161,515, 3-pyrazolidones as disclosed in U.S. Pat. No. 2,751,297, and heterocyclic compounds such as polymerized pyrrolidones, namely polyvinyl pyrrolidones, etc. as disclosed in U.S. Pat. No. 3,021,213; various inhibitor precursors as disclosed in Japanese Unexamined Patent Publication Nos. 130929/1979, 137945/1984, 140445/1984, G.B. Patent No. 1,356,142, U.S. Pat. Nos. 3,575,699, 3,649,267; sulfinic acid, sulfinic acid derivatives as disclosed in U.S. Pat. No. 3,047,393; and inorganic salts as disclosed in U.S. Pat. Nos. 2,566,263, 2,839,405, 2,488,709, 2,728,663.
Further, in all the hydrophilic colloid layers in the light-sensitive material to be used in the present invention, various additives for photography can be used, if necessary, such as gelatin plasticizers, film hardeners, surfactants, image stabilizers, UV-ray absorbers, antistain agents, pH controllers, antioxidants, antistatic agents, thickeners, graininess improvers, dyes, mordants, brighteners, developing speed controllers, matte agents, etc., within the range which does not impair the effect of the present invention.
In the light-sensitive material according to the present invention, a polymer latex should be preferably contained, and examples of the polymer latex to be incorporated in said light-sensitive material may include preferably hydrates of vinyl polymers such as acrylates, methacrylates, styrene, etc. as disclosed in U.S. Pat. Nos. 2,772,166, 3,325,286, 3,411,911, 3,311,912, 3,525,620, Research Disclosure No. 195, 19551 published in July, 1989.
As the polymer latex which may be preferably used, there may be included homopolymers of methaalkyl acrylate such as methyl methacryate, ethyl methacrylate, etc, homopolymers of styrene, or copolymers of methaalkyl acrylate or styrene with acrylic acid, N-methylolacryl-amide, glycidol methacrylate, etc., homopolymers of alkyl acrylate such as methyl acrylate, ethyl acrylate, butyl acrylate, etc. or copolymers of alkyl acrylate with acrylic acid, N-methylolacrylamide, etc. (preferably the content of the copolymer component such as acrylic acid, etc. being up to 30% by weight), homopolymers of butadiene or copolymers of butadiene with at least one of styrene, butoxymethylacrylamide acrylic acid, vinylidene chloride-methyl acrylate-acrylic acid ternary copolymer, etc.
The preferable range of the average particle size of the polymer latex to be used in the present invention may be 0.005 to 1μ, particularly preferably 0.2 to 0.1μ.
The polymer latex to be used in the present invention may be contained either on one surface with respect to the support or both surfaces. More preferably, it should be contained on both surfaces. When it is contained on both surfaces with respect to the support, the kind and/or the amount of the polymer latex contained on the respective surfaces may be either the same or different:
The layer in which the polymer latex is added may be any layer. For example, when it is contained in the side containing the silver halide light-sensitive layer with respect to the support, the polymer latex may be contained in the silver halide light-sensitive layer, or alternatively in the non-light-sensitive colloid layer of the uppermost layer which is generally called protective layer. Of course, when other layers, for example, intermediate layers exist between the silver halide light-sensitive layer and the uppermost layer, it may be contained in such intermediate layer. Further, the polymer latex may be contained in either single layer in the surface comprising a plurality of layers or in plural layers (not limited to 2 layers) comprising any desired combination of layers.
As the binder in the light-sensitive material to be used in the present invention, gelatin is used, and this gelatin includes gelatin derivatives, etc., and also cellulose derivatives, graft polymers of gelatin with other polymers, and other proteins, sugar derivatives, cellulose derivatives, hydrophilic colloids of synthetic hydrophilic polymeric substances, etc. which may be either of homopolymers or copolymers can be also used in combination.
As gelatin, in addition to lime-treated gelatin, acid-treated gelatin, enzyme-treated gelatin as described in Bulletin of Society of Science Photography of Japan (Bull. Soi. Sci. Phot. Japan) No. 16, p. 30 (1966) may be also used, and also hydrolyzates or enzyme decomposed products of gelatin can be used. As the gelatin derivatives, there may be employed those obtained by reacting various compounds such as acid halide, acid anhydride, isocyanates, bromoacetic acid, alkanesulfones, vinylsulfonamides, maleinimide compounds, polyalkylene oxides, epoxy compounds, etc. with gelatin. Specific examples are disclosed in U.S. Pat. Nos. 2,614,928, 3,132,945, 3,186,846, 3,312,553, G.B. Patent Nos. 861,414, 1,033,189, 1,005,784, Japanese Patent Publication No. 26845/1967.
As the protein, albumin, casein, as the cellulose derivative, hydroxyethyl cellulose, carboxymethyl cellulose, cellulose sulphate or as the sugar derivative, sodium alginate, starch derivative may be also used in combination with gelatin.
As the above-mentioned graft polymer of gelatin with other polymers, those having homo- or copolymer of a vinyl type monomer such as acrylic acid, methacrylic acid, derivatives thereof such as ester, amide, etc., acrylonitrile, styrene, etc. grafted onto gelatin can be used. Particularly, graft copolymers of polymers compatibility to some extent with gelatin, such as polymers of acrylic acid, acrylamide, methacrylamide, hydroxyalkyl methacrylate, etc. are preferred. Examples of these are disclosed in U.S. Pat. Nos. 2,763,625, 2,831,767, 2,956,884.
The amount of gelatin coated, when containing no polymer latex other than subbing layer on the surface corresponding to the surface of the light-sensitive material, may be preferably 1.8 g/m2 to 5.5 g/m2, particularly 2.0 to 4.8 g/m2 per one surface of the support. When a polymer latex is contained on that surface, it should be preferably 1.5 to 6.0 g/m2, particularly preferably 1.8 to 5.5 g/m2.
The support to be used in the light-sensitive material of the present invention may include flexible reflective support such as papers laminated with α-olefin polymer (e.g. polyethylene/butene copolymer), etc., synthetic papers, etc., films comprising semi-synthetic or synthetic polymers such as cellulose acetate, cellulose nitrate, polystyrene, polyvinyl chloride, polyethylene terephthalate, polycarbonate, polyamide, etc., and flexible supports having reflective layer provided on these films, metal, etc.
Among them, polyethylene terephthalate is particularly preferred.
As the subbing layer which can be used in the present invention, there may be included the subbing working layer in organic solvent system containing polyhydroxybenzenes as disclosed in Japanese Unexamined Patent Publication No. 3972/1984, etc., aqueous latex subbing working layers as disclosed in Japanese Unexamined Patent Publication No. 11118/1974, 104913/1977, 19941/1984, 19940/1984, 1984, 112326/1976, 117617/1976, 58469/1976, 114120/1976, 121323/1976, 123129/1976, 114121/1976, 139320/1977, 65422/1977, 109923/1977, 119919/1977, 1980, 128332/1982, 19941/1984.
Also, said subbing layer can be generally subjected on its surface to chemical or physical treatment. As said treatment, there may be included surface activating treatments such as chemical treatment, mechanical treatment, corona dicharging treatment, flame treatment, UV-ray treatment, high frequency treatment, glow discharging treatment, active plasma treatment, laser treatment, mixed acid treatment, ozone oxidation treatment, etc.
The subbing layer is distinguished from the coating layer according to the present invention and the coating timing and conditions are not limited at all.
In the present invention, filter dyes and other dyes for various purposes such as halation prevention can be used. The dyes employed may include triaryl dyes, oxanol dyes, hemioxanol dyes, malocyanine dyes, cyanine dyes, styryl dyes, azo dyes. Among them, oxanol dyes, hemioxanol dyes and melocyanine dyes are useful. Specific examples of the dyes which can be used may include those as disclosed in West German Patent No. 616,007, G.B. Patent Nos. 584,609, 1,177,429, Japanese Patent Publication Nos. 7777/1951, 1964, 38129/1979, 85130/1973, 99620/1974, 111420/1974, 129537/1974, 28827/1975, 108115/1977, 185038/1982, 24845/1984, U.S. Pat. Nos. 1,878,961, 1,884,035, 1,912,797, 2,098,891, 2,150,695, 2,274,782, 2,298,731, 2,409,612, 2,461,484, 2,527,583, 2,533,472, 2,865,752, 2,956,879, 3,094,418, 3,125,448, 3,148,187, 3,177,078, 3,247,127, 3,260,601, 3,282,699, 3,409,433, 3,540,887, 3,575,704, 3,653,905, 3,718,472, 3,865,817, 4,070,352, 4,071,312, PB report No. 74175, Photo Abstr. 128 (1921).
Particularly, in film for daylight contact work light-sensitive material, these dyes should be preferably used, and it is particularly preferable to use them so that the sensitivity to the light of 400 nm may be incorporated to 30-fold or more of the sensitivity to the light of 360 nm.
Further, in the practice of the present invention, it is also possible to use an organic desensitizer with the sum of the anode potential and the cathode potential of polarography being positive as described in Japanese Unexamined Patent Publication No. 26041/1986.
The light-sensitive material of the present invention can be exposed by use of an electromagnetic wave in the spectral region to which the emulsion layer constituting said light-sensitive material has sensitivity.
The present invention can give remarkable effect when applied to a light-sensitive material for printing for which very high dimensional stability before and after processing is required.
The developing agent to be used in development of the light-sensitive silver halide photographic material according to the present invention may include those as mentioned below.
Representative of the HO--(CH═CH)n --OH type developing agents are hydroquinone, and otherwise catechol, pyrogallol and their derivatives, and also ascorbic acid, chlorohydroquinone, bromohydroquinone, methylhydroquinone, 2,3-dibromohydroquinone, 2,5-diethylhydroquinone, catechol, 4-chlorocatechol, 4-phenylcatechol, 3-methoxy-catechol, 4-acetyl-pyrogallol, sodium ascorbate.
As the heterocyclic type developer, there may be included 3-pyrazolidones such as 1-phenyl-3-pyrazolidone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone; 1-phenyl-4-amino-5-pyrazolone, 5-aminouracil, etc.
Otherwise, the developers as described in T. H. James The Theory of The Photographic Process, Fourth Edition), p. 291-334 and Journal of the American Chemical Society, vol. 73, p. 3,100 (1951) can be effectively used in the present invention. These developing agents can be used either singly or as a combination of two or more kinds, but preferably two or more kinds may be used in combination.
Also, in the developer to be used for development of the light-sensitive material, as the preservative, for example, a sulfite such as sodium sulfite, potassium sulfite, etc. can be used without impairing the effect of the present invention. Also, hydroxylamine, a hydrazide compound can be used as the preservative, and in this case, its amount may be preferably 5 to 500 g, more preferably 20 to 200 g per one liter of the developer.
Also, in the developer may be contained glycols as an organic solvent, and as such glycol, ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butanediol, 1,5-pentane diol, etc. may be preferably used. The amount of these glycols used may be 5 to 500 g, more preferably 20 to 200 g per one liter of the developer. These organic solvents can be used either alone or in combination.
The light-sensitive silver halide photographic material according to the present invention can be subjected to developing processing by use of a developer containing a development inhibitor, whereby a light-sensitive material very excellent in storage stability can be obtained.
The light-sensitive silver halide photographic material according to the present invention can be processed under various conditions. The processing temperature may be, for example, a developing temperature of 50° C. or lower, particularly around 25° to 40° C., and also the developing time should be preferably completed within less than 20 seconds, particularly 19 seconds or less. Further, the present invention can exhibit its effect most effectively when the developing time is within the range of 15 seconds or less, and further 15 to 10 seconds.
Other processing steps than developing, for example, water washing, stopping, stabilizing, fixing, and further previous film hardening, neutralization, etc. can be employed as desired, and these can be also suitably omitted.
In the present invention, in the fixer which can be used during processing, in addition to thiosulfate, sulfite, etc., various acids, salts, fixing promoters, humectants, surfactants, chelating agents, film hardeners, etc. can be contained. For example, there may be included as thiosulfates, sulfites, potassium, sodium, ammonium salts of these acids, as acids, sulfuric acid, hydrochloric acid, nitric acid, boric acid, formic acid, acetic acid, propionic acid, oxalic acid, tartaric acid, citric acid, malic acid, phthalic acid, etc. and as salts, potassium, sodium, ammonium salts, etc. of these acids. As the fixing promoter, there may be included thiourea derivatives, alcohols having triple bond within the molecule as disclosed in Japanese Patent Publication No. 35754/1970, Japanese Unexamined Patent Publication Nos. 122535/1983, 122536/1983, thioethers, as disclosed in U.S. Pat. No. 4,126,459, or cyclodextran ethers which make free anions, crown ethers, diazabicycloundecene, di(hydroxyethyl)butamine, etc. As the humectant, alkanolamines, alkylene glycols, etc. may be included. As the chelating agent, aminoacetic acids such as nitrilotriacetic acid, EDTA, etc. may be included. As the film hardener, chromium alum, potassium alum, and other Al compounds, etc. can be incorporated.
The present invention can exhibit its advantages greatly when ultra-fast processing with a processing time of 20 to 60 seconds is applied. Although such ultra-fast processing has been desired, the ultra-fast processing as mentioned in the present specification refers to a processing in which the total time after the tip end of a film is inserted into an automatic developing machine, passing through the developing tank, the cross-over portion, the fixing tank, the cross-over portion, the water washing tank, the cross-over portion, the drying portion, until the tip end of the film comes out from the drying portion (in other words the quotient of the entire length of the processing line divided by the line conveying speed) is 20 seconds to 60 seconds. Here, the reason why the time at the cross-over portions is included, as is well known in this field of art, because the processing steps are regarded to substantially proceed, since the liquid in the preceding process is swelled in the gelatin film also in the cross-over portion.
The present invention is described in detail by referring to Examples, by which the present invention is not limited at all.
An aqueous silver nitrate solution and an aqueous solution of sodium chloride and potassium bromide were mixed in an aqueous gelatin solution at pAg=7.7 by use of the control double jet method to form silver halide grains, followed by desalting in conventional manner to obtain a silver halide emulsion. The silver halide emulsions obtained at this time are shown in Table 1.
TABLE 1
______________________________________
Halide composition
Average grain
Emulsion
Cl/Br size μm Crystal habit
______________________________________
A 98/2 0.12 Cubic
B 70/30 0.22 "
C 0/100 0.25 "
______________________________________
Then, 1.2 g of the hydrazine compound shown in Table 2 was added to the emulsion A per 1 mole of silver. Further, as the antifoggant, 30 mg/m2 of 1-phenyl-5-mercaptotetrazole and 20 mg/m2 of 5-methylbenzotriazole, as the development controller, 30 mg/m2 of a nonylphenoxy-polyethylene glycol (ethylene oxide units 30) and 1 g/m2 of an acrylic acid-butyl methacrylate-styrene polymer latex, and further bisvinylsulfomethyl ether and glyoxazole of the film hardening agent were successively added, and the resultant mixture was coated on a polyethylene terephthalate base simultaneously with a protective layer. The gelatin amount relative to the silver amount is shown in Table 2. Then, these samples were exposed through a glass wedge by P-627 FM roomlight printer (manufactured by Dainippon Screen), and processed with the developer and the fixed shown below. In this processing, developing time was 15 seconds (35° C.).
______________________________________
<Developer recipe>
Hydroquinone 34 g
N-methyl-p-aminophenol 0.23 g
Disodium ethylenediaminetetraacetate
1 g
3-Diethylamino-1,2-propane diol
15 g
5-Methylbenztriazole 0.4 g
Na.sub.2 SO.sub.3 76 g
NaBr 3 g
NaCl 1.3 g
1 mole/phosphoric acid solution
400 ml
(after addition of NaOH necessary for adjustment
to pH 11.5, made up to one liter with water)
<Fixer recipe>
(Composition A)
Ammonium thiosulfate (72.5% W/V aqueous solution)
240 ml
Sodium sulfite 17 g
Sodium acetate trihydrate 6.5 g
Boric acid 6 g
Sodium citrate dihydrate 2 g
(Composition B)
Pure water (deionized water)
17 ml
Sulfuric acid (50% W/V aqueous solution)
4.7 g
Aluminum sulfate (8.1% W/V aqueous solution
26.5 g
as calculated on Al.sub.2 O.sub.3)
______________________________________
During use of the fixer, the above compositions A and B During use of were dissolved in this order in 500 ml of water and then made up to one liter before use. The pH of the fixer was adjusted to 6 with acetic acid.
The amount of the silver coated was analyzed by a fluorescent X-ray analyzer.
The silver amount after processing is shown in the silver amount which gives the maximum density.
TABLE 2
__________________________________________________________________________
Gelatin amount
Gelatin amount
in emulsion
in protective
Coated silver
Developed
Hydrazine
layer layer amount silver amount
The present
No.
compound
(g/m.sup.2)
(g/m.sup.2)
(g/m.sup.2)
(g/m.sup.2)
γ
invention
__________________________________________________________________________
1 I-2 1.0 0 2.0 2.0 12.0
◯
2 " " 0.2 " 1.9 11.4
◯
3 " 1.3 0.2 " 2.0 10.3
◯
4 " " 0.9 " 1.5 6.8
X
5 " 1.0 0.2 3.0 3.0 12.0
◯
6 " " 0.7 " 2.8 11.2
◯
7 " 1.5 0.7 " 2.9 10.3
◯
8 " " 1.7 " 2.9 6.5
X
9 " 2.0 0.5 4.0 3.9 11.8
◯
10 " " 1.2 " 3.8 11.2
◯
11 " " 2.4 " 2.8 6.5
X
12 " 3.0 0.5 " 3.8 11.3
◯
13 " " 1.5 " 2.9 6.3
X
14 -- 3.0 0.5 " 3.6 5.4
X
__________________________________________________________________________
γ is defined for density from 0.3 to 3.0.
The product with γ<6 can be practically applied with difficulty because fine lines are practically collapsed.
As is apparent from Table 2, it can be understood that 90% or more of Ag coated was developed, and also a high contrast image with γ of 6 or more is given, when the ratio of the silver amount to gelatin is 1.0 or more.
To the emulsion B subjected to gold-sulfur sensitization was added 1.2 g of the hydrazine compound shown in Table 3 and also 300 mg of the sensitizing dye shown below per one mole of silver, followed by coating similarly as in Example 1. The gelatin amount relative to the silver amount is shown in Table 3. These samples were subjected to wedge exposure by xenon light, and processed similarly as in Example 1. ##STR18##
TABLE 3
__________________________________________________________________________
Gel amount
Gel amount
Coated
Developed
in emulsion
in protec-
silver
silver Dot
Hydrazine
layer tive layer
amount
amount quality
The present
No.
compound
(g/m.sup.2)
(g/m.sup.2)
(g/m.sup.2)
(g/m.sup.2)
γ
rank
invention
__________________________________________________________________________
1 I-1 1.0 0 2.0 2.0 11.9
5 ◯
2 " " 0.2 " 1.9 11.4
5 ◯
3 " 1.5 0.3 " 1.9 11.3
4 ◯
4 " " 0.7 " 1.5 6.8
2 X
5 " 2.0 0.5 3.0 2.9 10.9
5 ◯
6 " " 1.2 " 2.5 6.8
2 X
7 " 2.5 0.4 " 2.7 10.5
4 ◯
8 " " 1.0 " 2.3 6.4
2 X
9 " 3.0 0.5 4.0 3.8 10.2
4 ◯
10 " " 1.2 " 3.4 6.0
2 X
11 -- 3.0 0.5 " 3.7 5.3
1 X
__________________________________________________________________________
The dot quality was evaluated based on the sensory examination by enlarging the dot formed by bringing the contact screen in close dot contact with the film during exposure with a 100-fold magnifier.
The rank 5 indicates the highest state, with the states of rank 2 or lower standing no practical application.
From Table 3, it can be understood that 90% or more of the silver coated is developed and also γ is 6.0 or more, when the ratio of the silver amount to the gelatin amount is 1.0 or more.
To the emulsion of C applied with gold-sulfur sensitization, 1.2 g of the hydrazine compound shown in Table 4 was added per one mole of silver, and 200 mg of the sensitizing dye shown below per one mole of silver, followed by coating similarly as in Example 1. The amount of the gelatin amount relative to the silver amount is shown in Table 4. These samples were subjected to wedge exposure by xenon light, and processed similarly as in Example 1. ##STR19##
TABLE 4
__________________________________________________________________________
Gel amount
Gel amount
Coated
Developed
in emulsion
in protec-
silver
silver Dot
Hydrazine
layer tive layer
amount
amount quality
The present
No.
compound
(g/m.sup.2)
(g/m.sup.2)
(g/m.sup.2)
(g/m.sup.2)
γ
rank
invention
__________________________________________________________________________
1 I-1 1.0 0 2.0 2.0 11.9
5 ◯
2 " " 0.2 " 1.9 11.3
5 ◯
3 " 1.5 0.2 " 1.9 11.2
4 ◯
4 " " 0.7 " 1.5 6.7
2 X
5 " 2.0 0.5 3.0 2.9 10.8
5 ◯
6 " " 1.2 " 2.5 6.5
2 X
7 " 2.5 0.2 " 2.7 10.3
4 ◯
8 " " 0.7 " 2.3 6.2
2 X
9 " 3.0 0.5 4.0 3.8 10.0
4 ◯
10 " " 1.2 " 3.4 6.0
2 X
11 -- " 0.5 " 3.7 5.1
1 X
__________________________________________________________________________
From Table 4, it can be understood that 90% or more of the silver amount coated is developed, and γ is 6.0 or more and also the dot quality is excellent, when the ratio of the silver amount to gelatin is 1.0 or more.
Claims (9)
1. A negative type light-sensitive silver halide photographic material for producing a high contrast image in a developing process wherein the photographic material is in the developer for 19 seconds or less, said negative type light sensitive silver halide photographic material comprising light-sensitive silver halide emulsion provided on a support, wherein the ratio of silver amount to gelatin amount (Ag/Gel) (wherein said silver amount is the total silver amount in one or more layers provided in the same side as said light-sensitive silver halide emulsion layer with respect to the support, and said gelatin amount is the total gelatin amount in one or more gelatin layers provided in the same side as said light-sensitive silver halide emulsion layer with respect to the support) is 1.0 or more, and a hydrophilic colloid layer in said light-sensitive silver halide emulsion contains a hydrazine compound of the Formula (I-b) shown below: ##STR20## wherein R21 represents an aliphatic group, an aromatic group or a heterocyclic group, R22 represents hydrogen atom, an alkoxy group, a heterocyclic oxy group, an amino group or an aryloxy group, P1 and P2 each represent hydrogen atom, an acyl group or a sulfinic acid group.
2. The negative type light-sensitive photographic material according to claim 1, wherein said hydrazine compound is one of the following compounds: ##STR21##
3. The negative type light-sensitive silver halide photographic material according to claim 1, wherein said hydrazine compound is used in an amount of 10-5 to 10-1 mole/1 mole of silver.
4. The negative type light-sensitive silver halide photographic material according to claim 1, wherein the amount of said gelatin coated, when containing no polymer latex other than subbing layer on the surface corresponding to the surface of the light-sensitive material, is 1.8 g/m2 to 5.5 g/m2, and when a polymer latex is contained on that surface, is 1.5 to 6.0 g/m2.
5. In a method of developing a negative type light-sensitive silver halide photographic material wherein the negative type light-sensitive silver halide material is subjected to a developing step in a developer, followed by stopping, stabilizing and fixing, the improvement wherein the developing step is for 19 seconds or less and the negative-type light sensitive silver halide material comprises light-sensitive silver halide emulsion provided on a support, wherein the ratio of silver amount to gelatin amount (Ag/Gel) (wherein said silver amount is the total silver amount in one or more layers provided in the same side as said light-sensitive silver halide emulsion layer with respect to the support, and said gelatin amount is the total gelatin amount in one or more gelatin layers provided in the same side as said light-sensitive silver halide emulsion layer with respect to the support) is 1.0 or more, and a hydrophilic colloid layer in said light-sensitive silver halide emulsion contains a hydrazine compound of the formula (I-b) shown below: ##STR22## wherein R21 represents an aliphatic group, an aromatic group or a heterocyclic group, R22 represents hydrogen atom, an alkoxy group which may be substituted, a heterocyclic oxy group, an amino group or an aryloxy group, P1 and P2 each represent hydrogen atom, an acyl group or a sulfinic acid group.
6. The method of developing a negative type light-sensitive silver halide photographic material according to claim 5, wherein said hydrazine compound is used in an amount of 10-5 to 10-1 mole/mole of silver.
7. The method of developing a negative type light-sensitive silver halide photographic material according to claim 5, wherein the amount of said gelatin coated, when containing no polymer latex other than subbing layer on the surface corresponding to the surface of the light-sensitive material, is 1.8 g/m2 to 5.5 g/m2 and when a polymer latex is contained on that surface, is 1.5 to 6.0 g/m2.
8. The method of claim 5, wherein the developing time is 15 seconds or less.
9. The method of claim 8, wherein the developing time is 10 to 15 seconds.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63281304A JPH02129626A (en) | 1988-11-09 | 1988-11-09 | Negative silver halide photographic sensitive material |
| JP63-281304 | 1988-11-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USH1063H true USH1063H (en) | 1992-06-02 |
Family
ID=17637212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/432,045 Abandoned USH1063H (en) | 1988-11-09 | 1989-11-06 | Negative type light-sensitive silver halide photographic material |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | USH1063H (en) |
| EP (1) | EP0368229A3 (en) |
| JP (1) | JPH02129626A (en) |
| CA (1) | CA2002517A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6541190B1 (en) * | 2001-10-30 | 2003-04-01 | Eastman Kodak Company | Odorless photographic fixing composition and method of use |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2805248B2 (en) * | 1990-11-23 | 1998-09-30 | コニカ株式会社 | Silver halide photographic material with improved pressure resistance |
| US5252426A (en) * | 1991-07-29 | 1993-10-12 | E. I. Du Pont De Nemours And Company | Mono- and difluoroacetylphenyl hydrazine compounds as silver halide adjuvants |
| JP2824876B2 (en) * | 1991-08-28 | 1998-11-18 | 富士写真フイルム株式会社 | Silver halide photographic material |
| JP3051898B2 (en) * | 1991-09-03 | 2000-06-12 | 富士写真フイルム株式会社 | Silver halide photographic light-sensitive material and its developing method |
| JP3038422B2 (en) * | 1992-10-13 | 2000-05-08 | コニカ株式会社 | Silver halide photographic emulsion and silver halide photographic light-sensitive material |
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| US4988603A (en) | 1988-01-11 | 1991-01-29 | Konica Corporation | Method for the formation of high-contrast images using a developer comprising a hydrazine derivative |
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| JPH0621919B2 (en) * | 1985-03-28 | 1994-03-23 | 富士写真フイルム株式会社 | Silver halide photographic light-sensitive material |
| JPS62178246A (en) * | 1986-01-31 | 1987-08-05 | Mitsubishi Paper Mills Ltd | Image forming method |
| JPH0731381B2 (en) * | 1986-09-05 | 1995-04-10 | 富士写真フイルム株式会社 | Ultra-high contrast negative type silver halide photographic light-sensitive material |
| JPS63163336A (en) * | 1986-12-25 | 1988-07-06 | Mitsubishi Paper Mills Ltd | Processing method for silver halide photographic materials |
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1988
- 1988-11-09 JP JP63281304A patent/JPH02129626A/en active Pending
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1989
- 1989-11-06 US US07/432,045 patent/USH1063H/en not_active Abandoned
- 1989-11-07 EP EP19890120561 patent/EP0368229A3/en not_active Withdrawn
- 1989-11-08 CA CA002002517A patent/CA2002517A1/en not_active Abandoned
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| US4737452A (en) | 1984-02-28 | 1988-04-12 | Fuji Photo Film Co., Ltd. | Silver halide photographic materials |
| US4634661A (en) | 1985-07-18 | 1987-01-06 | Eastman Kodak Company | High contrast photographic elements exhibiting stabilized sensitivity |
| US4686167A (en) | 1985-09-26 | 1987-08-11 | Anitec Image Corporation | Compositions comprising ethane dioic acid hydrazide compounds and derivatives useful as dot-promoting agents |
| US4828968A (en) | 1985-10-18 | 1989-05-09 | Fuji Photo Film Co., Ltd. | Method of developing photographic light-sensitive materials |
| US4830950A (en) | 1986-01-14 | 1989-05-16 | Fuji Photo Film Co., Ltd. | Silver halide photographic material |
| US4816373A (en) | 1986-01-31 | 1989-03-28 | Mitsubishi Paper Mills, Ltd. | Method of producing images |
| US4988603A (en) | 1988-01-11 | 1991-01-29 | Konica Corporation | Method for the formation of high-contrast images using a developer comprising a hydrazine derivative |
| US4971890A (en) | 1988-05-11 | 1990-11-20 | Fuji Photo Film Co., Ltd. | Silver halide photographic material |
| US4950578A (en) | 1988-07-19 | 1990-08-21 | Fuji Photo Film Co., Ltd. | Silver halide photographic material |
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| US6541190B1 (en) * | 2001-10-30 | 2003-04-01 | Eastman Kodak Company | Odorless photographic fixing composition and method of use |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0368229A3 (en) | 1992-04-29 |
| EP0368229A2 (en) | 1990-05-16 |
| JPH02129626A (en) | 1990-05-17 |
| CA2002517A1 (en) | 1990-05-09 |
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Legal Events
| Date | Code | Title | Description |
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| AS | Assignment |
Owner name: KONICA CORPORATION, A CORP. OF JAPAN, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:HOSOI, YUJI;REEL/FRAME:005228/0396 Effective date: 19891031 |
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