USD744016S1 - Etching tray with lid - Google Patents

Etching tray with lid Download PDF

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Publication number
USD744016S1
USD744016S1 US29/469,994 US201329469994F USD744016S US D744016 S1 USD744016 S1 US D744016S1 US 201329469994 F US201329469994 F US 201329469994F US D744016 S USD744016 S US D744016S
Authority
US
United States
Prior art keywords
lid
tray
etching tray
etching
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/469,994
Inventor
Allen Turner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stingray Group LLC
Original Assignee
Stingray Group LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stingray Group LLC filed Critical Stingray Group LLC
Priority to US29/469,994 priority Critical patent/USD744016S1/en
Assigned to STINGRAY GROUP, LLC reassignment STINGRAY GROUP, LLC ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TURNER, ALLEN
Application granted granted Critical
Publication of USD744016S1 publication Critical patent/USD744016S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • B22F2003/241—Chemical after-treatment on the surface
    • B22F2003/244—Leaching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F5/00—Manufacture of workpieces or articles from metallic powder characterised by the special shape of the product
    • B22F2005/001—Cutting tools, earth boring or grinding tool other than table ware
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C26/00—Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels

Description

FIG. 1 is a front view of the lid attached to the tray.
FIG. 2 is a top perspective view of the lid attached to the tray.
FIG. 3 is a top perspective view of the lid.
FIG. 4 is a front side view of the lid.
FIG. 5 is a back side view of the lid.
FIG. 6 is a top view of the lid.
FIG. 7 is a bottom view of the lid.
FIG. 8 is a left side view of the lid.
FIG. 9 is a right side view of the lid.
FIG. 10 is a bottom perspective view of the lid.
FIG. 11 is a top perspective view of the tray.
FIG. 12 is a front side view of the tray.
FIG. 13 is a back side view of the tray.
FIG. 14 is a top view of the tray.
FIG. 15 is a bottom view of the tray.
FIG. 16 is a left side view of the tray.
FIG. 17 is a right side view of the tray; and,
FIG. 18 is a bottom perspective view of the tray.
The broken line portions of the etching tray with lid are not claimed as part of the claimed design.

Claims (1)

    CLAIM
  1. I claim the ornamental design for the etching tray with lid, as shown and described.
US29/469,994 2013-10-16 2013-10-16 Etching tray with lid Active USD744016S1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US29/469,994 USD744016S1 (en) 2013-10-16 2013-10-16 Etching tray with lid

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/055,628 US9534298B2 (en) 2013-10-16 2013-10-16 Etching tray and lid for acid etching PCD cutting inserts
US29/469,994 USD744016S1 (en) 2013-10-16 2013-10-16 Etching tray with lid

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US14/055,628 Continuation US9534298B2 (en) 2013-10-16 2013-10-16 Etching tray and lid for acid etching PCD cutting inserts

Publications (1)

Publication Number Publication Date
USD744016S1 true USD744016S1 (en) 2015-11-24

Family

ID=52808646

Family Applications (2)

Application Number Title Priority Date Filing Date
US14/055,628 Active 2034-09-16 US9534298B2 (en) 2013-10-16 2013-10-16 Etching tray and lid for acid etching PCD cutting inserts
US29/469,994 Active USD744016S1 (en) 2013-10-16 2013-10-16 Etching tray with lid

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US14/055,628 Active 2034-09-16 US9534298B2 (en) 2013-10-16 2013-10-16 Etching tray and lid for acid etching PCD cutting inserts

Country Status (1)

Country Link
US (2) US9534298B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8778132B2 (en) 2010-02-19 2014-07-15 Stingray Group, Llc Support fixture for acid etching of PCD inserts
USD744069S1 (en) 2013-09-05 2015-11-24 Stingray Group Llc Etching fixture cap
USD744068S1 (en) 2013-09-05 2015-11-24 Stingray Group Llc Etching fixture cap
US9534298B2 (en) 2013-10-16 2017-01-03 Stingray Group, Llc Etching tray and lid for acid etching PCD cutting inserts

Citations (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1411868A (en) 1920-06-07 1922-04-04 Harry H Myers Milk-bottle protector
US1692710A (en) * 1925-02-25 1928-11-20 John A Spahn Conduit bushing
US1935100A (en) * 1932-12-24 1933-11-14 Wheeling Stamping Co Collapsible tube and cap assembly and method of effecting the same
US2127268A (en) * 1937-07-09 1938-08-16 Wheeling Stamping Co Cap and tube assembly
US2727651A (en) * 1953-04-28 1955-12-20 Elmer J Mickelson Resilient pipe cap
US3136323A (en) 1960-05-02 1964-06-09 Tasope Ltd Etching machine
US3986610A (en) 1975-01-29 1976-10-19 Roman Ceramics Canister for a bottle and the like
US4084080A (en) 1976-09-28 1978-04-11 Mcmahan William T Towel heater and dispenser
US4139005A (en) * 1977-09-01 1979-02-13 Dickey Gilbert C Safety release pipe cap
US4475977A (en) 1983-05-23 1984-10-09 Retrotec, Inc. Nitride etch bath
US4475665A (en) 1980-12-22 1984-10-09 Chemical Handling Equipment Co., Inc. Air logic controller and metering pump unit for an apparatus for transferring, pumping and metering liquid chemicals
USD392985S (en) * 1996-10-22 1998-03-31 Tee-Lok Corporation Truss table locator stop
JP2004028787A (en) 2002-06-25 2004-01-29 Fujitsu Ltd Total reflection fluorescent x-ray analysis method, total reflection fluorescent x-ray analysis pretreatment device, and total reflection fluorescent x-ray analyzer
USD519135S1 (en) * 2004-01-16 2006-04-18 Thermal Dynamics Corporation Tip for a plasma arc torch
US20070169419A1 (en) 2006-01-26 2007-07-26 Ulterra Drilling Technologies, Inc. Sonochemical leaching of polycrystalline diamond
US20070284152A1 (en) 2004-09-21 2007-12-13 Smith International, Inc. Thermally stable diamond polycrystalline diamond constructions
USD575610S1 (en) * 2006-03-10 2008-08-26 Wirtgen Gmbh Chisel holder
US7558369B1 (en) 2006-05-09 2009-07-07 Smith International, Inc. Nondestructive method of measuring a region within an ultra-hard polycrystalline construction
US7616734B1 (en) 2006-05-09 2009-11-10 Smith International, Inc. Multi-step method of nondestructively measuring a region within an ultra-hard polycrystalline construction
US7649173B2 (en) 2006-09-30 2010-01-19 Semiconductor Manufacturing International (Shanghai) Corporation Method of preparing a sample for transmission electron microscopy
US20100012391A1 (en) 2008-07-18 2010-01-21 James Shamburger Method and apparatus for selectively leaching portions of PDC cutters used in drill bits
US20100011673A1 (en) 2008-07-18 2010-01-21 James Shamburger Method and apparatus for selectively leaching portions of PDC cutters through templates formed in mechanical shields placed over the cutters
US7864919B1 (en) 2005-10-18 2011-01-04 Smith International, Inc. Nondestructive method of measuring a region within an ultra-hard polycrystalline construction
US20110056141A1 (en) 2009-09-08 2011-03-10 Us Synthetic Corporation Superabrasive Elements and Methods for Processing and Manufacturing the Same Using Protective Layers
US20110233169A1 (en) * 2010-03-29 2011-09-29 Biomet 3I, Llc Titanium nano-scale etching on an implant surface
US20110250498A1 (en) 2008-10-10 2011-10-13 Mino Green Method of fabricating structured particles composed of silicon or a silicon-based material
US20120048468A1 (en) 2010-02-19 2012-03-01 Allen Turner Support fixture for acid etching of pcd inserts
US8130903B2 (en) 2005-10-18 2012-03-06 Smith International, Inc. Nondestructive device and method for evaluating ultra-hard polycrystalline constructions
JP2012132826A (en) 2010-12-22 2012-07-12 Siltronic Ag Method for analyzing metal impurities of silicon wafer
USD669968S1 (en) * 2010-09-08 2012-10-30 Asahi Kasei Chemicals Corporation Pipe for a filter
USD678481S1 (en) * 2011-04-26 2013-03-19 Joe Bivar Branco Pipe cap
USD693390S1 (en) * 2012-04-16 2013-11-12 Bomag Gmbh Cone quick-change tool holder
JP2014041030A (en) 2012-08-21 2014-03-06 Shin Etsu Handotai Co Ltd Impurity analysis method of semiconductor substrate
US20140115971A1 (en) 2008-10-30 2014-05-01 Us Synthetic Corporation Polycrystalline diamond compacts and related methods
USD711442S1 (en) * 2013-07-15 2014-08-19 Wirtgen Gmbh Chisel holder
US20150059977A1 (en) 2013-09-05 2015-03-05 Stingray Group, Llc Support fixture and cap for the acid etching of pcd cutting inserts
USD724196S1 (en) 2013-12-17 2015-03-10 Stingray Group, Llc Heater block for pressure digestion vessels
US20150101753A1 (en) 2013-10-16 2015-04-16 Stingray Group, Llc Etching tray and lid for acid etching pcd cutting inserts

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3426791A (en) * 1967-03-08 1969-02-11 Nasa Slosh alleviator
US4098398A (en) * 1977-05-09 1978-07-04 Exxon Research & Engineering Co. Container for recycle of motor oil

Patent Citations (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1411868A (en) 1920-06-07 1922-04-04 Harry H Myers Milk-bottle protector
US1692710A (en) * 1925-02-25 1928-11-20 John A Spahn Conduit bushing
US1935100A (en) * 1932-12-24 1933-11-14 Wheeling Stamping Co Collapsible tube and cap assembly and method of effecting the same
US2127268A (en) * 1937-07-09 1938-08-16 Wheeling Stamping Co Cap and tube assembly
US2727651A (en) * 1953-04-28 1955-12-20 Elmer J Mickelson Resilient pipe cap
US3136323A (en) 1960-05-02 1964-06-09 Tasope Ltd Etching machine
US3986610A (en) 1975-01-29 1976-10-19 Roman Ceramics Canister for a bottle and the like
US4084080A (en) 1976-09-28 1978-04-11 Mcmahan William T Towel heater and dispenser
US4139005A (en) * 1977-09-01 1979-02-13 Dickey Gilbert C Safety release pipe cap
US4475665A (en) 1980-12-22 1984-10-09 Chemical Handling Equipment Co., Inc. Air logic controller and metering pump unit for an apparatus for transferring, pumping and metering liquid chemicals
US4475977A (en) 1983-05-23 1984-10-09 Retrotec, Inc. Nitride etch bath
USD392985S (en) * 1996-10-22 1998-03-31 Tee-Lok Corporation Truss table locator stop
JP2004028787A (en) 2002-06-25 2004-01-29 Fujitsu Ltd Total reflection fluorescent x-ray analysis method, total reflection fluorescent x-ray analysis pretreatment device, and total reflection fluorescent x-ray analyzer
USD519135S1 (en) * 2004-01-16 2006-04-18 Thermal Dynamics Corporation Tip for a plasma arc torch
US8147572B2 (en) 2004-09-21 2012-04-03 Smith International, Inc. Thermally stable diamond polycrystalline diamond constructions
US20070284152A1 (en) 2004-09-21 2007-12-13 Smith International, Inc. Thermally stable diamond polycrystalline diamond constructions
US7864919B1 (en) 2005-10-18 2011-01-04 Smith International, Inc. Nondestructive method of measuring a region within an ultra-hard polycrystalline construction
US8130903B2 (en) 2005-10-18 2012-03-06 Smith International, Inc. Nondestructive device and method for evaluating ultra-hard polycrystalline constructions
US20070169419A1 (en) 2006-01-26 2007-07-26 Ulterra Drilling Technologies, Inc. Sonochemical leaching of polycrystalline diamond
USD575610S1 (en) * 2006-03-10 2008-08-26 Wirtgen Gmbh Chisel holder
US7558369B1 (en) 2006-05-09 2009-07-07 Smith International, Inc. Nondestructive method of measuring a region within an ultra-hard polycrystalline construction
US7616734B1 (en) 2006-05-09 2009-11-10 Smith International, Inc. Multi-step method of nondestructively measuring a region within an ultra-hard polycrystalline construction
US7801268B1 (en) 2006-05-09 2010-09-21 Smith International, Inc. Nondestructive method of measuring a region within an ultra-hard polycrystalline construction
US8014492B1 (en) 2006-05-09 2011-09-06 Smith International, Inc. Multi-step method of nondestructively measuring a region within an ultra-hard polycrystalline construction
US7649173B2 (en) 2006-09-30 2010-01-19 Semiconductor Manufacturing International (Shanghai) Corporation Method of preparing a sample for transmission electron microscopy
US20100012391A1 (en) 2008-07-18 2010-01-21 James Shamburger Method and apparatus for selectively leaching portions of PDC cutters used in drill bits
US20100011673A1 (en) 2008-07-18 2010-01-21 James Shamburger Method and apparatus for selectively leaching portions of PDC cutters through templates formed in mechanical shields placed over the cutters
US20110250498A1 (en) 2008-10-10 2011-10-13 Mino Green Method of fabricating structured particles composed of silicon or a silicon-based material
US20140115971A1 (en) 2008-10-30 2014-05-01 Us Synthetic Corporation Polycrystalline diamond compacts and related methods
US20110056141A1 (en) 2009-09-08 2011-03-10 Us Synthetic Corporation Superabrasive Elements and Methods for Processing and Manufacturing the Same Using Protective Layers
US20120048468A1 (en) 2010-02-19 2012-03-01 Allen Turner Support fixture for acid etching of pcd inserts
US20110233169A1 (en) * 2010-03-29 2011-09-29 Biomet 3I, Llc Titanium nano-scale etching on an implant surface
USD669968S1 (en) * 2010-09-08 2012-10-30 Asahi Kasei Chemicals Corporation Pipe for a filter
JP2012132826A (en) 2010-12-22 2012-07-12 Siltronic Ag Method for analyzing metal impurities of silicon wafer
USD678481S1 (en) * 2011-04-26 2013-03-19 Joe Bivar Branco Pipe cap
USD693390S1 (en) * 2012-04-16 2013-11-12 Bomag Gmbh Cone quick-change tool holder
JP2014041030A (en) 2012-08-21 2014-03-06 Shin Etsu Handotai Co Ltd Impurity analysis method of semiconductor substrate
USD711442S1 (en) * 2013-07-15 2014-08-19 Wirtgen Gmbh Chisel holder
US20150059977A1 (en) 2013-09-05 2015-03-05 Stingray Group, Llc Support fixture and cap for the acid etching of pcd cutting inserts
US20150101753A1 (en) 2013-10-16 2015-04-16 Stingray Group, Llc Etching tray and lid for acid etching pcd cutting inserts
USD724196S1 (en) 2013-12-17 2015-03-10 Stingray Group, Llc Heater block for pressure digestion vessels

Also Published As

Publication number Publication date
US9534298B2 (en) 2017-01-03
US20150101753A1 (en) 2015-04-16

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