USD655262S1 - Side wall for reactor for manufacturing semiconductor - Google Patents

Side wall for reactor for manufacturing semiconductor Download PDF

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Publication number
USD655262S1
USD655262S1 US29/389,569 US201129389569F USD655262S US D655262 S1 USD655262 S1 US D655262S1 US 201129389569 F US201129389569 F US 201129389569F US D655262 S USD655262 S US D655262S
Authority
US
United States
Prior art keywords
reactor
side wall
manufacturing semiconductor
semiconductor
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/389,569
Inventor
Manabu Honma
Katsuyuki Hishiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: Hishiya, Katsuyuki, HONMA, MANABU
Application granted granted Critical
Publication of USD655262S1 publication Critical patent/USD655262S1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

FIG. 1 is front perspective view of a side wall for reactor for manufacturing semiconductor illustrating our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a top view thereof; and,
FIG. 7 is a bottom view thereof.

Claims (1)

    CLAIM
  1. The ornamental design for side wall for reactor for manufacturing semiconductor, as shown and described.
US29/389,569 2010-10-21 2011-04-13 Side wall for reactor for manufacturing semiconductor Expired - Lifetime USD655262S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010-025243 2010-10-21
JP2010025243 2010-10-21

Publications (1)

Publication Number Publication Date
USD655262S1 true USD655262S1 (en) 2012-03-06

Family

ID=45758275

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/389,569 Expired - Lifetime USD655262S1 (en) 2010-10-21 2011-04-13 Side wall for reactor for manufacturing semiconductor

Country Status (2)

Country Link
US (1) USD655262S1 (en)
TW (1) TWD146033S (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD711331S1 (en) * 2013-11-07 2014-08-19 Applied Materials, Inc. Upper chamber liner
USD711843S1 (en) * 2013-06-28 2014-08-26 Hitachi Kokusai Electric Inc. Reaction tube
USD719114S1 (en) * 2013-06-28 2014-12-09 Hitachi Kokusai Electric Inc. Reaction tube
USD720707S1 (en) * 2013-06-28 2015-01-06 Hitachi Kokusai Electric Inc. Reaction tube
USD725055S1 (en) * 2013-06-28 2015-03-24 Hitachi Kokusai Electric Inc. Reaction tube
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5676869A (en) * 1994-11-07 1997-10-14 Tokyo Electron Limited Vertical heat treatment apparatus
US6101844A (en) * 1998-02-10 2000-08-15 Silcon Valley Group Thermal Double wall reaction chamber glassware
US6884297B2 (en) * 2003-03-31 2005-04-26 Ips Ltd. Thin film deposition reactor
US6911093B2 (en) * 2003-06-02 2005-06-28 Lsi Logic Corporation Lid liner for chemical vapor deposition chamber
US20060124058A1 (en) * 2002-11-11 2006-06-15 Hitachi Kokusai Electric Inc. Substrate processing device
US20070113783A1 (en) * 2005-11-19 2007-05-24 Applied Materials, Inc. Band shield for substrate processing chamber
US20070181062A1 (en) * 2006-02-07 2007-08-09 Kim Il-Kyoung Semiconductor device manufacturing apparatus including temperature measuring unit
US7371998B2 (en) * 2006-07-05 2008-05-13 Semitool, Inc. Thermal wafer processor
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD588078S1 (en) * 2006-06-16 2009-03-10 Tokyo Electron Limited Heat dissipation deterrence link for semiconductor manufacture
US20090159004A1 (en) * 2007-12-20 2009-06-25 Elpida Memory, Inc. Vertical chemical vapor deposition apparatus having nozzle for spraying reaction gas toward wafers
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US8002895B2 (en) * 2006-08-04 2011-08-23 Tokyo Electron Limited Heat processing apparatus for semiconductor process

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5676869A (en) * 1994-11-07 1997-10-14 Tokyo Electron Limited Vertical heat treatment apparatus
US6101844A (en) * 1998-02-10 2000-08-15 Silcon Valley Group Thermal Double wall reaction chamber glassware
US20060124058A1 (en) * 2002-11-11 2006-06-15 Hitachi Kokusai Electric Inc. Substrate processing device
US6884297B2 (en) * 2003-03-31 2005-04-26 Ips Ltd. Thin film deposition reactor
US6911093B2 (en) * 2003-06-02 2005-06-28 Lsi Logic Corporation Lid liner for chemical vapor deposition chamber
US20070113783A1 (en) * 2005-11-19 2007-05-24 Applied Materials, Inc. Band shield for substrate processing chamber
US20070181062A1 (en) * 2006-02-07 2007-08-09 Kim Il-Kyoung Semiconductor device manufacturing apparatus including temperature measuring unit
USD588078S1 (en) * 2006-06-16 2009-03-10 Tokyo Electron Limited Heat dissipation deterrence link for semiconductor manufacture
US7371998B2 (en) * 2006-07-05 2008-05-13 Semitool, Inc. Thermal wafer processor
US8002895B2 (en) * 2006-08-04 2011-08-23 Tokyo Electron Limited Heat processing apparatus for semiconductor process
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090159004A1 (en) * 2007-12-20 2009-06-25 Elpida Memory, Inc. Vertical chemical vapor deposition apparatus having nozzle for spraying reaction gas toward wafers
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD711843S1 (en) * 2013-06-28 2014-08-26 Hitachi Kokusai Electric Inc. Reaction tube
USD719114S1 (en) * 2013-06-28 2014-12-09 Hitachi Kokusai Electric Inc. Reaction tube
USD720707S1 (en) * 2013-06-28 2015-01-06 Hitachi Kokusai Electric Inc. Reaction tube
USD725055S1 (en) * 2013-06-28 2015-03-24 Hitachi Kokusai Electric Inc. Reaction tube
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
USD711331S1 (en) * 2013-11-07 2014-08-19 Applied Materials, Inc. Upper chamber liner
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus

Also Published As

Publication number Publication date
TWD146033S (en) 2012-03-21

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