USD642605S1 - Lid assembly for a substrate processing chamber - Google Patents

Lid assembly for a substrate processing chamber Download PDF

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Publication number
USD642605S1
USD642605S1 US29/358,979 US35897910F USD642605S US D642605 S1 USD642605 S1 US D642605S1 US 35897910 F US35897910 F US 35897910F US D642605 S USD642605 S US D642605S
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United States
Prior art keywords
lid assembly
processing chamber
substrate processing
view
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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US29/358,979
Inventor
Tetsuya Ishikawa
Alexander Tam
David H. Quach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
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Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/358,979 priority Critical patent/USD642605S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ISHIKAWA, TETSUYA, QUACH, DAVID H., TAM, ALEXANDER
Priority to TW099303810F priority patent/TWD141830S1/en
Application granted granted Critical
Publication of USD642605S1 publication Critical patent/USD642605S1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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FIG. 1 is a top plan view of a lid assembly for a substrate processing chamber showing our new design.
FIG. 2 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 2 of FIG. 1.
FIG. 3 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 3 of FIG. 1.
FIG. 4 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 4 of FIG. 1.
FIG. 5 is a side elevation view of the lid assembly of FIG. 1, rotated 180°, as viewed from line FIG. 5 of FIG. 1.
FIG. 6 is an isometric top view of the lid assembly of FIG. 1.
FIG. 7 is another isometric top view of the lid assembly of FIG. 1.
FIG. 8 is an isometric bottom view of the lid assembly of FIG. 1; and,
FIG. 9 is a bottom plan view of the lid assembly of FIG. 1.
The broken line showing of structural features is included for the purpose of illustrating non-claimed subject matter and forms no part of the claimed design.

Claims (1)

  1. The ornamental design for a lid assembly for a substrate processing chamber, as shown and described.
US29/358,979 2010-04-02 2010-04-02 Lid assembly for a substrate processing chamber Expired - Lifetime USD642605S1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US29/358,979 USD642605S1 (en) 2010-04-02 2010-04-02 Lid assembly for a substrate processing chamber
TW099303810F TWD141830S1 (en) 2010-04-02 2010-08-03 Lid assembly for substrate processing chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/358,979 USD642605S1 (en) 2010-04-02 2010-04-02 Lid assembly for a substrate processing chamber

Publications (1)

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USD642605S1 true USD642605S1 (en) 2011-08-02

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US29/358,979 Expired - Lifetime USD642605S1 (en) 2010-04-02 2010-04-02 Lid assembly for a substrate processing chamber

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US (1) USD642605S1 (en)
TW (1) TWD141830S1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD841506S1 (en) * 2017-02-27 2019-02-26 Flir Systems, Inc. Detector
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
US12080522B2 (en) 2020-04-22 2024-09-03 Applied Materials, Inc. Preclean chamber upper shield with showerhead
US12100577B2 (en) 2019-08-28 2024-09-24 Applied Materials, Inc. High conductance inner shield for process chamber

Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD291118S (en) * 1984-10-02 1987-07-28 Eltech Systems Corporation Cover for a ladle or the like
US6050446A (en) * 1997-07-11 2000-04-18 Applied Materials, Inc. Pivoting lid assembly for a chamber
US6110556A (en) 1997-10-17 2000-08-29 Applied Materials, Inc. Lid assembly for a process chamber employing asymmetric flow geometries
US6302964B1 (en) 1998-06-16 2001-10-16 Applied Materials, Inc. One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system
US20020017243A1 (en) 2000-06-15 2002-02-14 Pyo Sung Gyu Showerhead in chemical-enhanced chemical vapor deposition equipment
US6364949B1 (en) 1999-10-19 2002-04-02 Applied Materials, Inc. 300 mm CVD chamber design for metal-organic thin film deposition
US20020092471A1 (en) 2001-01-17 2002-07-18 Samsung Electronics Co., Ltd. Semiconductor deposition apparatus and shower head
US6517634B2 (en) * 2000-02-28 2003-02-11 Applied Materials, Inc. Chemical vapor deposition chamber lid assembly
US6719851B1 (en) 2000-09-26 2004-04-13 Applied Materials, Inc. Lid assembly for opening a process chamber lid and uses therefor
US20060021573A1 (en) 2004-06-28 2006-02-02 Cambridge Nanotech Inc. Vapor deposition systems and methods
US7024105B2 (en) * 2003-10-10 2006-04-04 Applied Materials Inc. Substrate heater assembly
US20080072820A1 (en) 2006-06-30 2008-03-27 Applied Materials, Inc. Modular cvd epi 300mm reactor
US7396480B2 (en) * 2004-02-26 2008-07-08 Applied Materials, Inc. Method for front end of line fabrication
US20090095221A1 (en) 2007-10-16 2009-04-16 Alexander Tam Multi-gas concentric injection showerhead
US20090241833A1 (en) 2008-03-28 2009-10-01 Moshtagh Vahid S Drilled cvd shower head
US20090308318A1 (en) 2002-11-14 2009-12-17 Ling Chen Apparatus and method for hybrid chemical processing
US20100107977A1 (en) 2001-02-09 2010-05-06 Tokyo Electron Limited Film forming apparatus
US7905959B2 (en) 2001-07-16 2011-03-15 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques

Patent Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD291118S (en) * 1984-10-02 1987-07-28 Eltech Systems Corporation Cover for a ladle or the like
US6050446A (en) * 1997-07-11 2000-04-18 Applied Materials, Inc. Pivoting lid assembly for a chamber
US6110556A (en) 1997-10-17 2000-08-29 Applied Materials, Inc. Lid assembly for a process chamber employing asymmetric flow geometries
US6302964B1 (en) 1998-06-16 2001-10-16 Applied Materials, Inc. One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system
US6364949B1 (en) 1999-10-19 2002-04-02 Applied Materials, Inc. 300 mm CVD chamber design for metal-organic thin film deposition
US6517634B2 (en) * 2000-02-28 2003-02-11 Applied Materials, Inc. Chemical vapor deposition chamber lid assembly
US20020017243A1 (en) 2000-06-15 2002-02-14 Pyo Sung Gyu Showerhead in chemical-enhanced chemical vapor deposition equipment
US6719851B1 (en) 2000-09-26 2004-04-13 Applied Materials, Inc. Lid assembly for opening a process chamber lid and uses therefor
US20020092471A1 (en) 2001-01-17 2002-07-18 Samsung Electronics Co., Ltd. Semiconductor deposition apparatus and shower head
US20100107977A1 (en) 2001-02-09 2010-05-06 Tokyo Electron Limited Film forming apparatus
US7905959B2 (en) 2001-07-16 2011-03-15 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US20090308318A1 (en) 2002-11-14 2009-12-17 Ling Chen Apparatus and method for hybrid chemical processing
US7024105B2 (en) * 2003-10-10 2006-04-04 Applied Materials Inc. Substrate heater assembly
US7520957B2 (en) * 2004-02-26 2009-04-21 Applied Materials, Inc. Lid assembly for front end of line fabrication
US7396480B2 (en) * 2004-02-26 2008-07-08 Applied Materials, Inc. Method for front end of line fabrication
US7767024B2 (en) * 2004-02-26 2010-08-03 Appplied Materials, Inc. Method for front end of line fabrication
US20060021573A1 (en) 2004-06-28 2006-02-02 Cambridge Nanotech Inc. Vapor deposition systems and methods
US20080072820A1 (en) 2006-06-30 2008-03-27 Applied Materials, Inc. Modular cvd epi 300mm reactor
US20090095221A1 (en) 2007-10-16 2009-04-16 Alexander Tam Multi-gas concentric injection showerhead
US20090241833A1 (en) 2008-03-28 2009-10-01 Moshtagh Vahid S Drilled cvd shower head

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Tam, et al., U.S. Appl. No. 12/831,522, filed Jul. 7, 2010, entitled "Showerhead Assembly With Metrology Port Purge."

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD841506S1 (en) * 2017-02-27 2019-02-26 Flir Systems, Inc. Detector
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
US12100577B2 (en) 2019-08-28 2024-09-24 Applied Materials, Inc. High conductance inner shield for process chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
US12080522B2 (en) 2020-04-22 2024-09-03 Applied Materials, Inc. Preclean chamber upper shield with showerhead

Also Published As

Publication number Publication date
TWD141830S1 (en) 2011-08-01

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