USD407073S - Electrostatic chuck with improved spacing and charge migration reduction mask - Google Patents
Electrostatic chuck with improved spacing and charge migration reduction mask Download PDFInfo
- Publication number
- USD407073S USD407073S US29/081,237 US8123797F USD407073S US D407073 S USD407073 S US D407073S US 8123797 F US8123797 F US 8123797F US D407073 S USD407073 S US D407073S
- Authority
- US
- United States
- Prior art keywords
- electrostatic chuck
- charge migration
- reduction mask
- migration reduction
- improved spacing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
FIG. 1 is a top view of the electrostatic chuck having the improved spacing and charge migration reduction mask;
FIG. 2 is an elevation view of the electrostatic chuck when looking up along the y-axis in FIG. 1, the view when looking down along the y-axis being a mirror image of FIG. 2;
FIG. 2A is a detailed view of part of the surface of the electrostatic chuck seen in FIG. 2;
FIG. 3 is a bottom view of the electrostatic chuck;
FIG. 4 is an elevation view of the electrostatic chuck when looking to the right along the x-axis in FIG. 1;
FIG. 4A is a detailed view of part of the surface of the electrostatic chuck seen in FIG. 4;
FIG. 5 is an elevation view of the electrostatic chuck when looking to the left along the x-axis in FIG. 1 and; and,
FIG. 5A is a detailed view of part of the surface of the electrostatic chuck seen in FIG. 5.
Claims (1)
- The ornamental design for an electrostatic chuck with improved spacing and charge migration reduction mask, as shown herein.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/081,237 USD407073S (en) | 1997-12-24 | 1997-12-24 | Electrostatic chuck with improved spacing and charge migration reduction mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/081,237 USD407073S (en) | 1997-12-24 | 1997-12-24 | Electrostatic chuck with improved spacing and charge migration reduction mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD407073S true USD407073S (en) | 1999-03-23 |
Family
ID=71725669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/081,237 Expired - Lifetime USD407073S (en) | 1997-12-24 | 1997-12-24 | Electrostatic chuck with improved spacing and charge migration reduction mask |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD407073S (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD980176S1 (en) * | 2020-06-02 | 2023-03-07 | Applied Materials, Inc. | Substrate processing system carrier |
| US11842917B2 (en) | 2019-05-20 | 2023-12-12 | Applied Materials, Inc. | Process kit ring adaptor |
-
1997
- 1997-12-24 US US29/081,237 patent/USD407073S/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11842917B2 (en) | 2019-05-20 | 2023-12-12 | Applied Materials, Inc. | Process kit ring adaptor |
| USD980176S1 (en) * | 2020-06-02 | 2023-03-07 | Applied Materials, Inc. | Substrate processing system carrier |
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