USD403337S - High conductance low wall deposition upper shield - Google Patents

High conductance low wall deposition upper shield Download PDF

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Publication number
USD403337S
USD403337S US29/074,544 US7454497F USD403337S US D403337 S USD403337 S US D403337S US 7454497 F US7454497 F US 7454497F US D403337 S USD403337 S US D403337S
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US
United States
Prior art keywords
upper shield
low wall
high conductance
wall deposition
conductance low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/074,544
Inventor
David Tsuenwai Or
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/074,544 priority Critical patent/USD403337S/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: OR, DAVID TSUENEWAI
Application granted granted Critical
Publication of USD403337S publication Critical patent/USD403337S/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

FIG. 1 is a perspective view showing the top of a shield of the invention;
FIG. 2 is a perspective view showing the bottom of a shield of the invention;
FIG. 3 is a top view;
FIG. 4 is a bottom view;
FIG. 5 is a side perspective view; and,
FIG. 6 is a cross sectional view along line 6--6 of FIG. 3.

Claims (1)

  1. The ornamental design for a high conductance low wall deposition upper shield, as shown and described.
US29/074,544 1997-08-05 1997-08-05 High conductance low wall deposition upper shield Expired - Lifetime USD403337S (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US29/074,544 USD403337S (en) 1997-08-05 1997-08-05 High conductance low wall deposition upper shield

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/074,544 USD403337S (en) 1997-08-05 1997-08-05 High conductance low wall deposition upper shield

Publications (1)

Publication Number Publication Date
USD403337S true USD403337S (en) 1998-12-29

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US29/074,544 Expired - Lifetime USD403337S (en) 1997-08-05 1997-08-05 High conductance low wall deposition upper shield

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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD599828S1 (en) * 2008-05-07 2009-09-08 Komatsu Ltd. Fan shroud for construction machinery
USD599827S1 (en) * 2008-05-07 2009-09-08 Komatsu Ltd. Fan shroud for construction machinery
USD600722S1 (en) * 2008-05-07 2009-09-22 Komatsu Ltd. Fan shroud for construction machinery
USD605206S1 (en) * 2008-05-07 2009-12-01 Komatsu Ltd. Fan shroud for construction machinery
USD620031S1 (en) * 2008-05-07 2010-07-20 Komatsu Ltd. Fan shroud for construction machinery
USD728090S1 (en) * 2012-10-11 2015-04-28 Ebm-Papst Mulfingen Gmbh & Co. Kg Electric fan
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
USD934315S1 (en) * 2020-03-20 2021-10-26 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5391275A (en) 1990-03-02 1995-02-21 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
US5456756A (en) 1994-09-02 1995-10-10 Advanced Micro Devices, Inc. Holding apparatus, a metal deposition system, and a wafer processing method which preserve topographical marks on a semiconductor wafer
US5552124A (en) 1994-06-22 1996-09-03 Applied Materials, Inc. Stationary focus ring for plasma reactor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5391275A (en) 1990-03-02 1995-02-21 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
US5552124A (en) 1994-06-22 1996-09-03 Applied Materials, Inc. Stationary focus ring for plasma reactor
US5456756A (en) 1994-09-02 1995-10-10 Advanced Micro Devices, Inc. Holding apparatus, a metal deposition system, and a wafer processing method which preserve topographical marks on a semiconductor wafer

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD599828S1 (en) * 2008-05-07 2009-09-08 Komatsu Ltd. Fan shroud for construction machinery
USD599827S1 (en) * 2008-05-07 2009-09-08 Komatsu Ltd. Fan shroud for construction machinery
USD600722S1 (en) * 2008-05-07 2009-09-22 Komatsu Ltd. Fan shroud for construction machinery
USD605206S1 (en) * 2008-05-07 2009-12-01 Komatsu Ltd. Fan shroud for construction machinery
USD620031S1 (en) * 2008-05-07 2010-07-20 Komatsu Ltd. Fan shroud for construction machinery
USD728090S1 (en) * 2012-10-11 2015-04-28 Ebm-Papst Mulfingen Gmbh & Co. Kg Electric fan
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD934315S1 (en) * 2020-03-20 2021-10-26 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life

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