USD403337S - High conductance low wall deposition upper shield - Google Patents
High conductance low wall deposition upper shield Download PDFInfo
- Publication number
- USD403337S USD403337S US29/074,544 US7454497F USD403337S US D403337 S USD403337 S US D403337S US 7454497 F US7454497 F US 7454497F US D403337 S USD403337 S US D403337S
- Authority
- US
- United States
- Prior art keywords
- upper shield
- low wall
- high conductance
- wall deposition
- conductance low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000008021 deposition Effects 0.000 title claims 2
Images
Description
FIG. 1 is a perspective view showing the top of a shield of the invention;
FIG. 2 is a perspective view showing the bottom of a shield of the invention;
FIG. 3 is a top view;
FIG. 4 is a bottom view;
FIG. 5 is a side perspective view; and,
FIG. 6 is a cross sectional view along line 6--6 of FIG. 3.
Claims (1)
- The ornamental design for a high conductance low wall deposition upper shield, as shown and described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/074,544 USD403337S (en) | 1997-08-05 | 1997-08-05 | High conductance low wall deposition upper shield |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/074,544 USD403337S (en) | 1997-08-05 | 1997-08-05 | High conductance low wall deposition upper shield |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD403337S true USD403337S (en) | 1998-12-29 |
Family
ID=71606810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/074,544 Expired - Lifetime USD403337S (en) | 1997-08-05 | 1997-08-05 | High conductance low wall deposition upper shield |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD403337S (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD599828S1 (en) * | 2008-05-07 | 2009-09-08 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD599827S1 (en) * | 2008-05-07 | 2009-09-08 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD600722S1 (en) * | 2008-05-07 | 2009-09-22 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD605206S1 (en) * | 2008-05-07 | 2009-12-01 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD620031S1 (en) * | 2008-05-07 | 2010-07-20 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD728090S1 (en) * | 2012-10-11 | 2015-04-28 | Ebm-Papst Mulfingen Gmbh & Co. Kg | Electric fan |
| USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
| USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
| USD934315S1 (en) * | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
| USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| US11581166B2 (en) | 2020-07-31 | 2023-02-14 | Applied Materials, Inc. | Low profile deposition ring for enhanced life |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5391275A (en) | 1990-03-02 | 1995-02-21 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
| US5456756A (en) | 1994-09-02 | 1995-10-10 | Advanced Micro Devices, Inc. | Holding apparatus, a metal deposition system, and a wafer processing method which preserve topographical marks on a semiconductor wafer |
| US5552124A (en) | 1994-06-22 | 1996-09-03 | Applied Materials, Inc. | Stationary focus ring for plasma reactor |
-
1997
- 1997-08-05 US US29/074,544 patent/USD403337S/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5391275A (en) | 1990-03-02 | 1995-02-21 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
| US5552124A (en) | 1994-06-22 | 1996-09-03 | Applied Materials, Inc. | Stationary focus ring for plasma reactor |
| US5456756A (en) | 1994-09-02 | 1995-10-10 | Advanced Micro Devices, Inc. | Holding apparatus, a metal deposition system, and a wafer processing method which preserve topographical marks on a semiconductor wafer |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD599828S1 (en) * | 2008-05-07 | 2009-09-08 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD599827S1 (en) * | 2008-05-07 | 2009-09-08 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD600722S1 (en) * | 2008-05-07 | 2009-09-22 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD605206S1 (en) * | 2008-05-07 | 2009-12-01 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD620031S1 (en) * | 2008-05-07 | 2010-07-20 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD728090S1 (en) * | 2012-10-11 | 2015-04-28 | Ebm-Papst Mulfingen Gmbh & Co. Kg | Electric fan |
| USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
| USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD934315S1 (en) * | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
| USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
| US11581166B2 (en) | 2020-07-31 | 2023-02-14 | Applied Materials, Inc. | Low profile deposition ring for enhanced life |
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