USB236609I5 - - Google Patents

Info

Publication number
USB236609I5
USB236609I5 US23660972A USB236609I5 US B236609 I5 USB236609 I5 US B236609I5 US 23660972 A US23660972 A US 23660972A US B236609 I5 USB236609 I5 US B236609I5
Authority
US
United States
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of USB236609I5 publication Critical patent/USB236609I5/en
Application granted granted Critical
Publication of US3925187A publication Critical patent/US3925187A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
US236609A 1971-03-25 1972-03-21 Apparatus for the formation of coatings on a substratum Expired - Lifetime US3925187A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7110598A FR2129996B1 (en) 1971-03-25 1971-03-25

Publications (2)

Publication Number Publication Date
USB236609I5 true USB236609I5 (en) 1975-01-28
US3925187A US3925187A (en) 1975-12-09

Family

ID=9074128

Family Applications (1)

Application Number Title Priority Date Filing Date
US236609A Expired - Lifetime US3925187A (en) 1971-03-25 1972-03-21 Apparatus for the formation of coatings on a substratum

Country Status (2)

Country Link
US (1) US3925187A (en)
FR (1) FR2129996B1 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH611938A5 (en) * 1976-05-19 1979-06-29 Battelle Memorial Institute
US4199448A (en) * 1976-06-09 1980-04-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Reverse osmosis membrane of high urea rejection properties
USRE32849E (en) * 1978-04-13 1989-01-31 Litton Systems, Inc. Method for fabricating multi-layer optical films
US4142958A (en) * 1978-04-13 1979-03-06 Litton Systems, Inc. Method for fabricating multi-layer optical films
DE2847620C2 (en) * 1978-11-02 1984-10-18 Siemens AG, 1000 Berlin und 8000 München Device for the production of electrical components, in particular film capacitors
CH640886A5 (en) * 1979-08-02 1984-01-31 Balzers Hochvakuum METHOD FOR APPLYING HARD WEAR-RESISTANT COATS ON DOCKS.
US4305801A (en) * 1980-04-16 1981-12-15 The United States Of America As Represented By The United States Department Of Energy Line-of-sight deposition method
US5250327A (en) * 1986-04-28 1993-10-05 Nissin Electric Co. Ltd. Composite substrate and process for producing the same
FR2619247A1 (en) * 1987-08-05 1989-02-10 Realisations Nucleaires Et METAL ION IMPLANTER
DE3737142A1 (en) * 1987-11-02 1989-05-11 Christiansen Jens GENERATION OF (THICK) LAYERS FROM HIGH-MELTING OR SUBLIMING MATERIAL (CONDUCTING, SEMICONDUCTING AND NON-CONDUCTING) AND MIXTURES OF THEM WITH PSEUDO RADIO EMISSIONS
US5087478A (en) * 1989-08-01 1992-02-11 Hughes Aircraft Company Deposition method and apparatus using plasma discharge
US5601652A (en) * 1989-08-03 1997-02-11 United Technologies Corporation Apparatus for applying ceramic coatings
US5855950A (en) * 1996-12-30 1999-01-05 Implant Sciences Corporation Method for growing an alumina surface on orthopaedic implant components
GB2321063A (en) * 1997-01-08 1998-07-15 Oxford Plasma Technology Ltd Reactive particle beam sputtering
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
US6413380B1 (en) 2000-08-14 2002-07-02 International Business Machines Corporation Method and apparatus for providing deposited layer structures and articles so produced
DE112007000440B4 (en) 2006-03-07 2021-01-07 Global Advanced Metals, Usa, Inc. Process for producing deformed metal articles

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3472751A (en) * 1965-06-16 1969-10-14 Ion Physics Corp Method and apparatus for forming deposits on a substrate by cathode sputtering using a focussed ion beam
US3484358A (en) * 1966-09-01 1969-12-16 Bell Telephone Labor Inc Method and apparatus for reactive sputtering wherein the sputtering target is contacted by an inert gas
US3408283A (en) * 1966-09-15 1968-10-29 Kennecott Copper Corp High current duoplasmatron having an apertured anode positioned in the low pressure region
GB1217685A (en) * 1967-06-05 1970-12-31 Smiths Industries Ltd Improvements in or relating to methods and apparatus for sputtering of materials
US3409529A (en) * 1967-07-07 1968-11-05 Kennecott Copper Corp High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability

Also Published As

Publication number Publication date
US3925187A (en) 1975-12-09
FR2129996A1 (en) 1972-11-03
FR2129996B1 (en) 1975-01-17

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