US8698399B2 - Multi-wavelength pumping to sustain hot plasma - Google Patents

Multi-wavelength pumping to sustain hot plasma Download PDF

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US8698399B2
US8698399B2 US13/119,491 US201013119491A US8698399B2 US 8698399 B2 US8698399 B2 US 8698399B2 US 201013119491 A US201013119491 A US 201013119491A US 8698399 B2 US8698399 B2 US 8698399B2
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plasma
gas
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US20110291566A1 (en
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Ilya V. Bezel
Anatoly Shchemelinin
Eugene Shifrin
Matthew W. Derstine
Richard W. Solarz
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KLA Corp
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    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21BFUSION REACTORS
    • G21B1/00Thermonuclear fusion reactors
    • G21B1/11Details
    • G21B1/23Optical systems, e.g. for irradiating targets, for heating plasma or for plasma diagnostics
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00Energy generation of nuclear origin
    • Y02E30/10Nuclear fusion reactors

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  • Light sources that use a plasma that is sustained by a laser can produce the deep ultraviolet radiation that is used for such applications. These light sources operate by focusing a laser into a gas volume, where the laser energy is sufficient to excite the gas into a plasma that emits light. Focusing the laser into the volume is called pumping the plasma, and the laser is often referred to as the pump laser.
  • the pump laser can be continuous, intensity modulated, or pulsed. Such laser-sustained sources exhibit temperatures that are well in excess of those available from electrical discharge-sustained sources. These higher temperatures equate to brighter light sources, and at shorter wavelengths.
  • a method of sustaining a plasma by focusing a first wavelength of electromagnetic radiation into a gas within a volume, where the first wavelength is substantially absorbed by a first species of the gas and excites the first species of the gas into a first region of a plasma having a first size and a first temperature.
  • a second wavelength of electromagnetic radiation is focused into the first region of the plasma, where the second wavelength is different than the first wavelength and is substantially absorbed by a second species of the gas and excites the second species of the gas into a second region of the plasma within the first region of the plasma having a second size that is smaller than the first size and a second temperature that is greater than the first temperature.
  • the relatively colder first plasma region enables the formation of the relatively hotter second plasma region disposed within it.
  • the first species of the gas is a relatively lower temperature species of the gas and the second species of the gas is a relatively higher temperature species of the gas.
  • the first species of the gas is gas in an ionization state abundant at a relatively lower temperature and the second species of the gas is gas in an ionization state at a relatively higher temperature.
  • the first species of the gas is gas in an excitation state abundant at a relatively lower temperature and the second species of the gas is gas in an excitation state at a relatively higher temperature.
  • the first species of the gas is free electron gas in a plasma at a relatively lower temperature and the second species of the gas is gas at a relatively higher temperature.
  • the first species of the gas is a first gas and the second species of the gas is a second gas that is different than and mixed with the first gas.
  • the first wavelength is provided by a first light source and the second wavelength is provided by a second light source that is separate from the first light source.
  • the first wavelength is provided by a first laser and the second wavelength is provided by a second laser that is separate from the first laser.
  • the first wavelength and the second wavelength are both provided by a single light source.
  • one or both of the first and second wavelengths are applied in a manner that is one of continuous, modulated, and pulsed.
  • the first laser is applied only during the plasma ignition time to facilitate absorption of the second laser.
  • the plasma is sustained by the second laser alone.
  • the plasma is sustained by the second laser that is a 532 nanometer laser and the gas volume is xenon at about one atmosphere to three hundred atmospheres.
  • the first and the second laser is applied only during the plasma ignition time to facilitate absorption of the third laser. In some embodiments the plasma is sustained by the third laser alone.
  • the second wavelength is within one of the visible spectrum or the ultraviolet spectrum.
  • the first wavelength is in the range from about 360 nanometers to about 560 nanometers and the gas volume is xenon at about one atmosphere to about three hundred atmospheres.
  • the first wavelength is produced with an approximately one micron laser.
  • the first wavelength is produced with a carbon dioxide ten micron laser.
  • the second wavelength is produced with a frequency doubled laser.
  • the first wavelength and the second wavelength are both provided by a single frequency doubled laser.
  • an apparatus for producing a plasma having a volume for enclosing a gas, a first electromagnetic radiation source for producing a first beam of electromagnetic radiation at a first wavelength, first optics for focusing the first beam into the gas within the volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first size and a first temperature, a second electromagnetic radiation source for producing a second beam of electromagnetic radiation at a second wavelength that is different from the first wavelength, and second optics for focusing the second beam into the first plasma region, where the second wavelength is substantially absorbed by a second species of the gas and delivers energy into a second region of the plasma within the first region of the plasma having a second size that is smaller than the first size and a second temperature that is greater than the first temperature.
  • an apparatus for producing a plasma having a volume for enclosing a gas, an electromagnetic radiation source for producing a first wavelength of electromagnetic radiation and a second wavelength of electromagnetic radiation that is different from the first wavelength, optics for focusing the first wavelength into the gas within the volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first size and a first temperature, and the optics further for focusing the second wavelength into the first plasma region, where the second wavelength is substantially absorbed by a second species of the gas and excites delivers energy into a second plasma region having a second size that is smaller than the first size and a second temperature that is greater than the first temperature.
  • FIG. 1 is a functional block diagram of a light source according to an embodiment of the present invention.
  • FIG. 2 depicts graphs of the calculated absorption spectra for argon for different plasma temperatures, and at a constant pressure of about seven atmospheres.
  • FIG. 3 depicts graphs of the calculated absorption spectra for xenon for different plasma temperatures, and at a constant pressure of about seven atmospheres.
  • Various embodiments of the present invention use two or more pumping wavelengths, where each wavelength targets a specific transition point in the energy spectrum of one or more of the gas species used to form the plasma, while avoiding other transition points. For example, one wavelength is selected to create a relatively larger, relatively colder first plasma region, and another wavelength is selected to create a relatively smaller, relatively hotter second plasma region that is contained within the first region.
  • This method can be expanded with additional wavelengths to enable the formation of successively hotter, more centrally-located regions of the plasma that are nested within successively colder, more peripherally-located regions of the plasma, like a nested shells of plasma regions that are hotter as one moves toward the center, and that are colder as one moves toward the outside edges.
  • the volume in which the plasma is created is formed of one gas or a mixture of gasses.
  • lasers are used to pump the plasma, while in other embodiments other light sources are used to pump the plasma.
  • the word “laser” is often used herein, but it is understood that other pumping light sources are contemplated in these and other embodiments.
  • a first light 102 produces a first beam 104 that is at least partially reflected off of a first mirror 106 and into an ellipse 108 .
  • the first beam 104 has a peak at a first wavelength. In some embodiments, the first beam 104 exhibits energy at substantially only the first wavelength.
  • the ellipse 108 focuses the first beam 104 to the focal point of the ellipse 108 . Contained within the ellipse 108 is a volume of one or more gases, and the first beam 104 forms a first, relatively colder region of a plasma from the gas within the volume.
  • a second light 112 produces a second beam 114 that is at least partially reflected off of a second minor 116 and into the ellipse 108 .
  • the second beam 114 has a peak at a second wavelength.
  • the second wavelength is different than the first wavelength.
  • the second beam 114 exhibits energy at substantially only the second wavelength.
  • the ellipse 108 focuses the second beam 114 to the focal point of the ellipse 108 .
  • the second beam 114 forms a second, relatively hotter region of the plasma from the gas within the volume.
  • the terms “relatively hotter” and “relatively colder” as used herein do not refer to some external or absolute standard, but are in reference to one another internally, in that one of the plasma regions is hotter in reference to the other, and the other plasma region is colder in reference to the one. Thus, the terms as used herein do not indicate that the plasma regions so designated are any colder or any hotter than a plasma produced by a different apparatus.
  • the combined light 122 formed by the first region and the second region of the plasma is focused into a homogenizer 124 .
  • the combined light 122 is comprised of light of two different color temperatures, a relatively colder (dimmer) light from the first plasma, and a relatively hotter (brighter) light from the second plasma.
  • the second region of the plasma is formed, originated, and typically wholly located within boundaries of the first region of the plasma. If only the second beam 114 where to be directed into the volume, the second region of the plasma would either not be able to form or would not be able to reach the relatively hotter temperature. This is so because of a possibility of a few conditions that might be present. For example, the power of the second beam 114 might be too low to ignite and sustain a plasma (alternately said — there might not exist a second light source 112 for the second beam 114 that is powerful enough to sustain on its own a plasma at the given wavelength). Further, the wavelength of the second beam 114 might not absorb sufficiently in the relatively colder gas volume so as to ignite or sustain a plasma.
  • the wavelength and power of the second beam 114 can be selected at a low power that is sufficient to sustain the second region of the plasma within the first region, and at a wavelength that is absorbed preferentially by the hot gas species at the interior of the first and second regions, while being relatively transmissive through the relatively colder gas species of the first region.
  • the wavelength of the second beam 114 can be selected to form a hotter second region of the plasma, without being concerned about having a light source 112 that is powerful enough to sustain the plasma on its own—which light source 112 might not even exist.
  • the second region of the plasma depends upon the formation of the first region of the plasma in which it is confined, in order to exist.
  • the light sources 102 and 112 use lasers, while in other embodiments, light sources other than lasers are used.
  • a single light source is used, but that light source exhibits more than one peak wavelength, where each wavelength produces a different region of the plasma, in the manner as described above.
  • a powerful visible or ultraviolet laser is used as the light source.
  • a green, blue, or ultraviolet 1 laser directly diode or frequency converted—for example a frequency doubled Nd:YAG or Nd:YLF laser with a power level in excess of a few hundred watts can be used to provide both wavelengths.
  • more than two light sources are used to form more than two regions of the plasma in the volume, or a light source having more than two peak wavelengths is used to form more than two regions of the plasma.
  • the first laser is applied only during the plasma ignition time to facilitate absorption of the second laser.
  • the plasma is sustained by the second laser alone.
  • the plasma is sustained by the second laser that is in the range from about 360 nanometers to about 560 nanometers and the gas volume is xenon at about one atmosphere to about three hundred atmospheres.
  • the first and the second laser are applied only during the plasma ignition time to facilitate absorption of the third laser. In some embodiments the plasma is sustained by the third laser alone.
  • Absorption mechanisms include (a) free electron (Bremsstrahlung) absorption, (b) bound electron to free electron absorption, (c) bound electron level transitions, and (d) miscellaneous other mechanisms.
  • FIGS. 2 and 3 depict calculated graphs of the absorption spectra for argon ( FIG. 2 ) and xenon ( FIG. 3 ) for different plasma temperatures at a constant pressure (about seven atmospheres).
  • the temperatures plotted are ten thousand Kelvin (indicated at 200 ), fifteen thousand Kelvin (indicated at 201 ), twenty thousand Kelvin (indicated at 202 ), and twenty-five thousand Kelvin (indicated at 203 ).
  • Bremsstrahlung absorption appears to dominate for wavelengths greater than about three thousand nanometers.
  • bound electron level transitions have a structured spectrum. The lines are broadened by different mechanisms (collisional, Doppler, etc.). Bremsstrahlung absorption has a smooth spectrum without spectral features. Bound to free transitions have a structured spectrum with sharp rises at energies corresponding to the onset of ionization. Bounded regions of the graphs represent examples of a possible choice of the wavelengths for a first laser (indicated at 210 - 215 ) and a second laser (indicated at 220 - 222 ).
  • the first laser is readily absorbed in the relatively colder (ten thousand Kelvin to fifteen thousand Kelvin) plasma region.
  • the relatively colder region of the plasma is substantially transparent to the second laser, which is preferentially absorbed by the relatively hotter (twenty thousand Kelvin to twenty-five thousand Kelvin) plasma region.
  • the gas or plasma By tuning the wavelength, one is able to select what species, if any, in the gas or plasma will absorb the energy of the light beam. For each wavelength, the gas or plasma requires a certain temperature in order to become absorptive. This temperature is generally defined by the bound electron level transition at the lowest transition level. Once the temperature is high enough to populate the lower level, the gas starts absorbing at this transition.
  • the first pump beam is focused inside the target gas volume.
  • the plasma is sustained when the power density of the first beam is high enough to compensate for the temperature losses of the plasma.
  • Increasing the intensity of the first beam generates a larger plasma, but not necessarily a hotter plasma.
  • the plasma that is thus created is relatively transparent to a second pump beam wavelength that creates a hotter second plasma region.
  • the periphery of the hotter region of the plasma in one case might have a temperature of about one electron volt, while the maximum gas temperature cannot exceed about a tenth of an electron volt because of its contact with the walls of the volume.
  • a surrounding colder region of the plasma reduces thermal conductivity losses of the hotter region of the plasma by insulating it from the volume boundaries.
  • the hotter region of the plasma in an ellipse might absorb a substantial portion of the light irradiated by the colder region of the plasma. This enables some indirect pumping of the hotter region of the plasma with the first beam. All of these mechanisms tend to enable the use of a less powerful, more practical light beam to create a hotter and smaller region of the plasma.
  • the second laser has enough power to sustain the second region of the plasma without the assistance from the first laser, it can be used alone.
  • powerful visible or ultraviolet lasers are beneficial for sustaining a relatively hot plasma.
  • green, blue, or ultraviolet 1 (direct diode or frequency converted) lasers such as frequency doubled Nd:YAG lasers, which are commercially available with power levels in excess of a few hundred watts.
  • the second region of the plasma is sustained with a pulsed laser.
  • This second region of the plasma remains small because the pulses of the second laser are relatively short and the second region of the plasma does not have time to grow appreciably.
  • the first region of the plasma is necessary in order to initiate the second region of the plasma at the beginning of each pulse cycle.
  • Two or more light sources operating at the same or at different wavelengths can be used for pumping the plasma.
  • the use of one light source is primarily to sustain the outer-most region of the plasma, while the other light sources are used to generate hotter, nested regions of the plasma.
  • One broad-band light source such as an industrial diode laser, can be used to pump both regions of the plasma.
  • the wavelength band should be wider than the absorption line.
  • Multiple wavelengths coupled to a single waveguide or fiber can be used to pump both regions of the plasma.
  • first and higher harmonics of a frequency converted laser can be used as the pump.
  • One light source operated in the visible or ultraviolet spectral range can be used to sustain the relatively hotter region of the plasma.
  • Options include diode, fiber, thin disk, ion, or other solid state or free-space lasers that either operate in this wavelength region or are frequency converted to this wavelength region.
  • the plasma created by one wavelength may be transparent for a wavelength that can pump a hotter region of the plasma.
  • a second wavelength such that it is focused inside the sustained plasma almost without losses.
  • the second smaller and hotter region of the plasma is sustained inside the first region. Energy losses for the hotter region of the plasma sustained inside the colder region of the plasma are reduced, and thus the plasma temperature can be higher even when pumped by a light source with relatively smaller power.
  • Different wavelengths can be used to pump the same species, such as different transitions in the same ionic state, or transitions in different ionic states in the plasma.
  • Continuous frequency-doubled Nd:YAG laser for example, Trumpf Inc. intracavity doubled thin disk laser
  • Continuous frequency-doubled fiber laser for example, IPG Photonics, Inc.
  • providing the output at in the wavelength range from about 500 nanometers to about 560 nanometers can be used to sustain a very hot plasma in xenon at about one atmosphere to three hundred atmospheres.
  • Different wavelengths can be used to pump different species, such as by pumping a gas mixture.
  • a gas mixture For example, xenon and mercury.
  • the outer region of the plasma is sustained by pumping xenon transitions and the hotter region of the plasma is created by pumping mercury or mercury ions.
  • a longer wavelength light source such as a carbon dioxide laser, can be used to sustain the plasma through Bremsstrahlung absorption, while a shorter wavelength light source can be used to pump line transitions in the atomic or ionic species.
  • a continuous power light source can be used for sustaining the exterior region of the plasma, with a pulsed light source used to generate the hotter interior region of the plasma.
  • the secondary pulsed wavelength pumps either ions or hotter atoms.
  • the high power of the secondary light source can be provided with the use of a pulsed fiber, diode, or other (Nd:YAG, Ti:sapphire, etc.) laser.
  • the pulsed light source is capable of generating a smaller plasma when the diffusion time of the plasma is longer than the pumping pulse duration.
  • the presence of the colder continuous power plasma allows maintaining an average thermal balance and having enough hot atoms and ions for the secondary wavelength pumping initialization at the beginning of each pulse.
  • the proposed system can be implemented with an intra-cavity frequency doubled continuous power laser, such as manufactured by IPG Photonics or Trumpf.
  • IPG Photonics or Trumpf.
  • the one micron fundamental wavelength of these lasers is used to sustain the lower-temperature region of the plasma, and the half-micron second harmonic is used to pump the hotter plasma region inside the first region.
  • An argon plasma with separate argon ion pumping by a second light source is an argon plasma with separate argon ion pumping by a second light source.
  • An argon volume can be effectively pumped with a near infrared laser.
  • the plasma in the argon volume is sustained with a 978 nanometer eight hundred watt LaserLine diode laser.
  • the first region of the plasma that is generated is mostly transparent for near infrared and visible light. This enables generating a relatively smaller, hotter second region of the plasma by pumping only the argon ions with a 514 nanometer argon ion laser (available up to ten watts continuous power).
  • the argon laser can be focused within a very small spot (such as less than one micron), which creates a relatively hotter second region of the plasma.
  • An alternate for the argon laser second light source is a dual-wavelength near infrared laser.
  • an argon plasma is pumped with a 975 nanometer or a 978 nanometer laser. This generates a low temperature first plasma, using no more than about an eight hundred watt laser. However, eight hundred watts was found to not be sufficient for sustaining at argon plasma at other wavelengths.
  • additional levels can be pumped with an additional laser.
  • options include a 1068 nanometer fiber laser, or lasers operating at 957 nanometers or 975 nanometers.
  • One embodiment uses a dual-wavelength laser such as a high-power (greater than one kilowatt) LaserLine Inc. laser. Both pumping wavelengths in this case use the same laser and optics.
  • This can be done by tuning the wavelength to the (multiple) ion absorption line or to a line of absorption of highly excited neutral species of the gas(es), while simultaneously avoiding strong absorption features of colder species.
  • the wavelength bandwidth can be chosen to match or be narrower than the absorption line width of the (multiple) ion species or highly excited neutral species.
  • One example of such a choice is a 964 nanometer second light for mercury gas. The first ion of mercury absorbs 964 nanometer light on an excited transition, whereas there is no absorption of 964 nanometer light in atomic mercury.
  • a plasma was not sustainable in a ten atmosphere argon bulb with an eight hundred watt infrared laser until the wavelength was tuned to the 978 nanometer transition of the highly excited argon atom.
  • the colder parts of the plasma did not have enough population of the excited states to absorb this light in the outer regions of the plasma.
  • Plasma operation (collectable ultraviolet power and temperature) was shown to strongly depend on the laser wavelength for xenon, with the preferred operation regime possible when avoiding the absorption line at 982 nanometers. Originating from a lower-excited state of the xenon gas, this line is absorbing in the outer regions of the plasma, resulting in poorer performance (larger, less efficiently pumped).
  • transition wavelength As a function of the energy of the level on which the transition originates, one can make an informed decision as to which frequency to use, as depicted in FIGS. 2 and 3 .

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Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3900803A (en) 1974-04-24 1975-08-19 Bell Telephone Labor Inc Lasers optically pumped by laser-produced plasma
JPS62145790A (ja) 1985-12-20 1987-06-29 Toshiba Corp 短波長放射光システム
US5790574A (en) * 1994-08-24 1998-08-04 Imar Technology Company Low cost, high average power, high brightness solid state laser
EP0858249A1 (de) 1997-02-07 1998-08-12 Hitachi, Ltd. Röntgenstrahlenquelle mittels laser erzeugtem Plasma, und Vorrichtung für Halbleiterlithographie und Verfahren unter Verwendung derselben
US6151155A (en) * 1998-07-29 2000-11-21 The Regents Of The University Of Michigan Guided wave methods and apparatus for nonlinear frequency generation
US6370178B1 (en) * 1998-12-21 2002-04-09 Imed Lasers Wide area laser and multi-pass laser optical cavity for use therein
US20020093653A1 (en) 2001-01-16 2002-07-18 Vincent Detalle Method and apparatus for enhanced laser-induced plasma spectroscopy using mixed-wavelength laser pulses
US6525868B2 (en) * 2000-06-20 2003-02-25 Actinix System and method for generating coherent radiation at vacuum ultraviolet wavelengths using efficient four wave mixing
US20040155207A1 (en) * 2003-02-07 2004-08-12 Juergen Kleinschmidt Arrangement for the generation of EUV radiation
WO2005089131A2 (en) 2004-03-17 2005-09-29 Cymer, Inc. Lpp euv light source
US20070158594A1 (en) 2005-12-28 2007-07-12 Ushiodenki Kabushiki Kaisha Extreme uv radiation source device
US7627007B1 (en) * 2004-08-25 2009-12-01 Kla-Tencor Technologies Corporation Non-critical phase matching in CLBO to generate sub-213nm wavelengths
US7642205B2 (en) * 2005-04-08 2010-01-05 Mattson Technology, Inc. Rapid thermal processing using energy transfer layers

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000299197A (ja) * 1999-04-13 2000-10-24 Agency Of Ind Science & Technol X線発生装置
TW502559B (en) * 1999-12-24 2002-09-11 Koninkl Philips Electronics Nv Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
JP2002289397A (ja) * 2001-03-23 2002-10-04 Takayasu Mochizuki レーザプラズマ発生方法およびそのシステム
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
JP5156192B2 (ja) * 2006-01-24 2013-03-06 ギガフォトン株式会社 極端紫外光源装置
JP4937643B2 (ja) * 2006-05-29 2012-05-23 株式会社小松製作所 極端紫外光源装置
JP5802410B2 (ja) * 2010-03-29 2015-10-28 ギガフォトン株式会社 極端紫外光生成装置

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3900803A (en) 1974-04-24 1975-08-19 Bell Telephone Labor Inc Lasers optically pumped by laser-produced plasma
JPS62145790A (ja) 1985-12-20 1987-06-29 Toshiba Corp 短波長放射光システム
US5790574A (en) * 1994-08-24 1998-08-04 Imar Technology Company Low cost, high average power, high brightness solid state laser
EP0858249A1 (de) 1997-02-07 1998-08-12 Hitachi, Ltd. Röntgenstrahlenquelle mittels laser erzeugtem Plasma, und Vorrichtung für Halbleiterlithographie und Verfahren unter Verwendung derselben
US6151155A (en) * 1998-07-29 2000-11-21 The Regents Of The University Of Michigan Guided wave methods and apparatus for nonlinear frequency generation
US6370178B1 (en) * 1998-12-21 2002-04-09 Imed Lasers Wide area laser and multi-pass laser optical cavity for use therein
US6525868B2 (en) * 2000-06-20 2003-02-25 Actinix System and method for generating coherent radiation at vacuum ultraviolet wavelengths using efficient four wave mixing
US20020093653A1 (en) 2001-01-16 2002-07-18 Vincent Detalle Method and apparatus for enhanced laser-induced plasma spectroscopy using mixed-wavelength laser pulses
US20040155207A1 (en) * 2003-02-07 2004-08-12 Juergen Kleinschmidt Arrangement for the generation of EUV radiation
WO2005089131A2 (en) 2004-03-17 2005-09-29 Cymer, Inc. Lpp euv light source
US7627007B1 (en) * 2004-08-25 2009-12-01 Kla-Tencor Technologies Corporation Non-critical phase matching in CLBO to generate sub-213nm wavelengths
US7642205B2 (en) * 2005-04-08 2010-01-05 Mattson Technology, Inc. Rapid thermal processing using energy transfer layers
US20070158594A1 (en) 2005-12-28 2007-07-12 Ushiodenki Kabushiki Kaisha Extreme uv radiation source device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
M. Ghotbi et al., "Optical Second Harmonic Generation Properties of BiB3O6," Opt. Express, Nov. 2004, vol. 12, No. 24. Nov. 29, 2004.

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9831626B2 (en) 2014-10-02 2017-11-28 Samsung Electronics Co., Ltd. Broadband light source and optical inspector having the same
US9891175B2 (en) 2015-05-08 2018-02-13 Kla-Tencor Corporation System and method for oblique incidence scanning with 2D array of spots
US10257918B2 (en) 2015-09-28 2019-04-09 Kla-Tencor Corporation System and method for laser-sustained plasma illumination
US20170153145A1 (en) * 2015-11-30 2017-06-01 Kla-Tencor Corporation Non-Contact Thermal Measurements of VUV Optics
US10139283B2 (en) * 2015-11-30 2018-11-27 Kla-Tencor Corporation Non-contact thermal measurements of VUV optics
US10568195B2 (en) 2018-05-30 2020-02-18 Kla-Tencor Corporation System and method for pumping laser sustained plasma with a frequency converted illumination source
US20220255289A1 (en) * 2019-08-29 2022-08-11 Shanghai Institute Of Microsystem And Information Technology, Chinese Academy Of Sciences Laser
US11876340B2 (en) * 2019-08-29 2024-01-16 Shanghai Institute Of Microsystem And Information Technology, Chinese Academy Of Sciences Laser

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