US7348063B2 - Film substrate and its manufacturing method - Google Patents
Film substrate and its manufacturing method Download PDFInfo
- Publication number
- US7348063B2 US7348063B2 US11/394,009 US39400906A US7348063B2 US 7348063 B2 US7348063 B2 US 7348063B2 US 39400906 A US39400906 A US 39400906A US 7348063 B2 US7348063 B2 US 7348063B2
- Authority
- US
- United States
- Prior art keywords
- film substrate
- substrate
- group
- organic
- metal compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime, expires
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- 239000000758 substrate Substances 0.000 title claims abstract description 188
- 238000004519 manufacturing process Methods 0.000 title description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims abstract description 41
- 229920000620 organic polymer Polymers 0.000 claims abstract description 37
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229920000642 polymer Polymers 0.000 claims abstract description 18
- 238000009833 condensation Methods 0.000 claims abstract description 14
- 230000005494 condensation Effects 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims description 39
- 239000002184 metal Substances 0.000 claims description 39
- 229920008347 Cellulose acetate propionate Polymers 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 25
- 229920002678 cellulose Polymers 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 18
- 125000001424 substituent group Chemical group 0.000 claims description 16
- 125000004429 atom Chemical group 0.000 claims description 12
- 239000006185 dispersion Substances 0.000 claims description 12
- 239000004973 liquid crystal related substance Substances 0.000 claims description 11
- 238000001035 drying Methods 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 125000002252 acyl group Chemical group 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 238000005266 casting Methods 0.000 claims description 6
- 125000004185 ester group Chemical group 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 125000001153 fluoro group Chemical group F* 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052732 germanium Inorganic materials 0.000 claims description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 150000001340 alkali metals Chemical class 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 239000000178 monomer Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 22
- 239000000243 solution Substances 0.000 description 58
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 43
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 34
- 238000003756 stirring Methods 0.000 description 29
- 230000000052 comparative effect Effects 0.000 description 27
- 238000006467 substitution reaction Methods 0.000 description 24
- 238000002360 preparation method Methods 0.000 description 23
- 230000035699 permeability Effects 0.000 description 18
- 235000019441 ethanol Nutrition 0.000 description 17
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 14
- 229910001220 stainless steel Inorganic materials 0.000 description 14
- 239000010935 stainless steel Substances 0.000 description 14
- 239000011521 glass Substances 0.000 description 13
- 239000002904 solvent Substances 0.000 description 13
- UDOLCQFNFRGMKX-UHFFFAOYSA-N acetic acid;propanoic acid;propan-2-one Chemical compound CC(C)=O.CC(O)=O.CCC(O)=O UDOLCQFNFRGMKX-UHFFFAOYSA-N 0.000 description 12
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 11
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 8
- 238000006482 condensation reaction Methods 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 229920000592 inorganic polymer Polymers 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- -1 acryl Chemical group 0.000 description 6
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 6
- 239000013557 residual solvent Substances 0.000 description 6
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 6
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 6
- 239000003377 acid catalyst Substances 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- UHXOHPVVEHBKKT-UHFFFAOYSA-N 1-(2,2-diphenylethenyl)-4-[4-(2,2-diphenylethenyl)phenyl]benzene Chemical compound C=1C=C(C=2C=CC(C=C(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=2)C=CC=1C=C(C=1C=CC=CC=1)C1=CC=CC=C1 UHXOHPVVEHBKKT-UHFFFAOYSA-N 0.000 description 3
- FQJQNLKWTRGIEB-UHFFFAOYSA-N 2-(4-tert-butylphenyl)-5-[3-[5-(4-tert-butylphenyl)-1,3,4-oxadiazol-2-yl]phenyl]-1,3,4-oxadiazole Chemical compound C1=CC(C(C)(C)C)=CC=C1C1=NN=C(C=2C=C(C=CC=2)C=2OC(=NN=2)C=2C=CC(=CC=2)C(C)(C)C)O1 FQJQNLKWTRGIEB-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004695 Polyether sulfone Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920006393 polyether sulfone Polymers 0.000 description 3
- 125000001325 propanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 2
- QDFXRVAOBHEBGJ-UHFFFAOYSA-N 3-(cyclononen-1-yl)-4,5,6,7,8,9-hexahydro-1h-diazonine Chemical compound C1CCCCCCC=C1C1=NNCCCCCC1 QDFXRVAOBHEBGJ-UHFFFAOYSA-N 0.000 description 2
- OGGKVJMNFFSDEV-UHFFFAOYSA-N 3-methyl-n-[4-[4-(n-(3-methylphenyl)anilino)phenyl]phenyl]-n-phenylaniline Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)=C1 OGGKVJMNFFSDEV-UHFFFAOYSA-N 0.000 description 2
- JOOXCMJARBKPKM-UHFFFAOYSA-N 4-oxopentanoic acid Chemical compound CC(=O)CCC(O)=O JOOXCMJARBKPKM-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- PNXNSVYZNGNYIN-UHFFFAOYSA-N acetic acid;butanoic acid;propanoic acid Chemical compound CC(O)=O.CCC(O)=O.CCCC(O)=O PNXNSVYZNGNYIN-UHFFFAOYSA-N 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 2
- 210000002858 crystal cell Anatomy 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 0 *N(C)C(C)=O.CO.COC.COC(C)=O.CS.CS(C)(=O)=O.CSC Chemical compound *N(C)C(C)=O.CO.COC.COC(C)=O.CS.CS(C)(=O)=O.CSC 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- DQFMPTUTAAIXAN-UHFFFAOYSA-N 4,4-dimethyl-1h-imidazol-5-one Chemical compound CC1(C)NC=NC1=O DQFMPTUTAAIXAN-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229920001342 Bakelite® Polymers 0.000 description 1
- XXVNCGRONFBXJI-UHFFFAOYSA-N CC1=CC=C(C2=NN=C(C3=CC=CC(C4=NN=C(C5=CC=C(C)C=C5)O4)=C3)O2)C=C1 Chemical compound CC1=CC=C(C2=NN=C(C3=CC=CC(C4=NN=C(C5=CC=C(C)C=C5)O4)=C3)O2)C=C1 XXVNCGRONFBXJI-UHFFFAOYSA-N 0.000 description 1
- 229920000623 Cellulose acetate phthalate Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910020388 SiO1/2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- ZCHPKWUIAASXPV-UHFFFAOYSA-N acetic acid;methanol Chemical compound OC.CC(O)=O ZCHPKWUIAASXPV-UHFFFAOYSA-N 0.000 description 1
- KSZVHVUMUSIKTC-UHFFFAOYSA-N acetic acid;propan-2-one Chemical compound CC(C)=O.CC(O)=O KSZVHVUMUSIKTC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 229940081734 cellulose acetate phthalate Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- MGQFVQQCNPBJKC-UHFFFAOYSA-N dibutoxy(diethyl)silane Chemical compound CCCCO[Si](CC)(CC)OCCCC MGQFVQQCNPBJKC-UHFFFAOYSA-N 0.000 description 1
- GQNWJCQWBFHQAO-UHFFFAOYSA-N dibutoxy(dimethyl)silane Chemical compound CCCCO[Si](C)(C)OCCCC GQNWJCQWBFHQAO-UHFFFAOYSA-N 0.000 description 1
- OSMIWEAIYFILPL-UHFFFAOYSA-N dibutoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCCCC)(OCCCC)C1=CC=CC=C1 OSMIWEAIYFILPL-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- ZWPNXHXXRLYCHZ-UHFFFAOYSA-N diethyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(CC)OC(C)C ZWPNXHXXRLYCHZ-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- BPXCAJONOPIXJI-UHFFFAOYSA-N dimethyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(C)OC(C)C BPXCAJONOPIXJI-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- QAPWZQHBOVKNHP-UHFFFAOYSA-N diphenyl-di(propan-2-yloxy)silane Chemical compound C=1C=CC=CC=1[Si](OC(C)C)(OC(C)C)C1=CC=CC=C1 QAPWZQHBOVKNHP-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- BPAMVBCECDGPHD-UHFFFAOYSA-N ethanol;pyrrolidin-2-one Chemical compound CCO.O=C1CCCN1 BPAMVBCECDGPHD-UHFFFAOYSA-N 0.000 description 1
- NASVITFAUKYCPM-UHFFFAOYSA-N ethanol;tetraethyl silicate Chemical compound CCO.CCO[Si](OCC)(OCC)OCC NASVITFAUKYCPM-UHFFFAOYSA-N 0.000 description 1
- CTCOPPBXAFHGRB-UHFFFAOYSA-N ethanolate;germanium(4+) Chemical compound [Ge+4].CC[O-].CC[O-].CC[O-].CC[O-] CTCOPPBXAFHGRB-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- MYEJNNDSIXAGNK-UHFFFAOYSA-N ethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(OC(C)C)OC(C)C MYEJNNDSIXAGNK-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 125000005417 glycidoxyalkyl group Chemical group 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- WFKAJVHLWXSISD-UHFFFAOYSA-N isobutyramide Chemical compound CC(C)C(N)=O WFKAJVHLWXSISD-UHFFFAOYSA-N 0.000 description 1
- 229940040102 levulinic acid Drugs 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- VPLNCHFJAOKWBT-UHFFFAOYSA-N phenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C1=CC=CC=C1 VPLNCHFJAOKWBT-UHFFFAOYSA-N 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- SGCFZHOZKKQIBU-UHFFFAOYSA-N tributoxy(ethenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C=C SGCFZHOZKKQIBU-UHFFFAOYSA-N 0.000 description 1
- GIHPVQDFBJMUAO-UHFFFAOYSA-N tributoxy(ethyl)silane Chemical compound CCCCO[Si](CC)(OCCCC)OCCCC GIHPVQDFBJMUAO-UHFFFAOYSA-N 0.000 description 1
- GYZQBXUDWTVJDF-UHFFFAOYSA-N tributoxy(methyl)silane Chemical compound CCCCO[Si](C)(OCCCC)OCCCC GYZQBXUDWTVJDF-UHFFFAOYSA-N 0.000 description 1
- INUOIYMEJLOQFN-UHFFFAOYSA-N tributoxy(phenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C1=CC=CC=C1 INUOIYMEJLOQFN-UHFFFAOYSA-N 0.000 description 1
- WEUBQNJHVBMUMD-UHFFFAOYSA-N trichloro(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Cl)(Cl)Cl WEUBQNJHVBMUMD-UHFFFAOYSA-N 0.000 description 1
- VIFIHLXNOOCGLJ-UHFFFAOYSA-N trichloro(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CC[Si](Cl)(Cl)Cl VIFIHLXNOOCGLJ-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- PGOAAUBOHVGLCX-UHFFFAOYSA-N trichloro-[3-(2,3,4,5,6-pentafluorophenyl)propyl]silane Chemical compound FC1=C(F)C(F)=C(CCC[Si](Cl)(Cl)Cl)C(F)=C1F PGOAAUBOHVGLCX-UHFFFAOYSA-N 0.000 description 1
- MLXDKRSDUJLNAB-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F MLXDKRSDUJLNAB-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- RKFOUDRIIBYXLR-UHFFFAOYSA-N trimethoxy-(1,1,2,3,3-pentafluoro-3-phenylpropyl)silane Chemical compound FC(C([Si](OC)(OC)OC)(F)F)C(C1=CC=CC=C1)(F)F RKFOUDRIIBYXLR-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/06—Polysulfones; Polyethersulfones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B15/00—Preparation of other cellulose derivatives or modified cellulose, e.g. complexes
- C08B15/05—Derivatives containing elements other than carbon, hydrogen, oxygen, halogens or sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B3/00—Preparation of cellulose esters of organic acids
- C08B3/22—Post-esterification treatments, including purification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L1/00—Compositions of cellulose, modified cellulose or cellulose derivatives
- C08L1/08—Cellulose derivatives
- C08L1/10—Esters of organic acids, i.e. acylates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L1/00—Compositions of cellulose, modified cellulose or cellulose derivatives
- C08L1/08—Cellulose derivatives
- C08L1/10—Esters of organic acids, i.e. acylates
- C08L1/14—Mixed esters, e.g. cellulose acetate-butyrate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/02—Polyamines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31971—Of carbohydrate
Definitions
- the present invention relates to a transparent film substrate, and particularly to a film substrate with high transparency and low moisture permeability for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery.
- an electronic displaying element such as an organic EL displaying element, an electronic optical element such as CCD or a CMOS sensor, or a solar battery
- a glass plate has been conventionally used due to its high thermal stability, high transparency and low moisture permeability.
- a substrate which is light, flexible, and tough, has been required as a substrate thereof in place for a glass plate, which is relatively heavy and fragile.
- plastic substrates such as a polyethersulfone substrate, a polycarbonate substrate, and a laminate of a polyethersulfone plate with an acryl resin plate as disclosed in Japanese Patent O.P.I. Publication No.
- a first object of the invention is to provide a film substrate with high transparency and low moisture permeability for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery.
- a second object of the invention is to provide a film substrate giving an organic EL displaying element with a long life and high contrast.
- a third object of the invention is to provide a film substrate for an electronic displaying element with reduced color deviation in a liquid crystal display employing a birefringence image displaying method.
- the present invention has been attained by the following constitutions:
- a film substrate of an electronic displaying element, an electronic optical element, a touch panel, or a solar battery wherein the film substrate is composed mainly of an organic polymer having water solubility of 0 to 5 g based on 100 g of 25° C. water and having acetone solubility of 25 to 100 g based on 100 g of 25° C. acetone and an inorganic condensation polymer of a reactive metal compound capable of being condensed;
- the organic polymer comprises a repeating unit represented by formula (1), (2), (3), (4) or (5) in its main chain, or a group represented by formula (6) or (7) in its side chain,
- R represents a hydrogen atom or a monovalent substituent
- the reactive metal compound is at least one pair of a reactive metal compound having two substituents capable of being hydrolyzed per one metal atom and a reactive metal compound having three substituents capable of being hydrolyzed per one metal atom;
- the tetravalent metal is selected from the group consisting of silicon, zirconium, titanium and germanium;
- the inorganic condensation polymer is a condensation polymer comprising in the chemical structure a monomer unit derived from a compound represented by formula (8): (Rf) n Si(X 1 ) 4-n formula (8) wherein Rf represents an alkyl group having a fluorine atom or an aryl group having a fluorine atom; X 1 represents a group capable of being hydrolyzed; and n represents an integer of 1 to 3;
- the film substrate of item 1 above wherein the film substrate further contains an alkali metal in an amount of zero to less than 5,000 ppm by weight based on the weight of the substrate;
- the film substrate of item 1 above wherein the film substrate is a substrate for an organic EL displaying element;
- the film substrate of item 13 above wherein the film substrate is a substrate for an organic EL displaying element, and the organic polymer has a positive wavelength dispersion property;
- a film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery wherein the film substrate is an organic-inorganic polymer hybrid film substrate composed mainly of an organic polymer having water solubility of 0 to 5 g based on 100 g of 25° C. water and having acetone solubility of 25 to 100 g based on 100 g of 25° C. acetone and a reactive metal compound capable of being condensed after hydrolysis to produce a condensation or the condensation polymer;
- the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of item 21 above wherein the organic polymer comprises in the chemical structure at least one selected from the group consisting of repeating units represented by formulae (1), (2), (3), (4) and (5) described above and groups represented by formulae (6) and (7) described above,
- a method of manufacturing a film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery as recited in any one of items 21 through 30 above, the method comprising the steps of casting on a support a composition containing an organic polymer, a reactive metal compound capable of being condensed after hydrolysis to produce a condensed polymer or the condensation polymer, and an alkali metal in an amount of less than 5,000 ppm, and then drying to obtain a film substrate on the support;
- the organic polymer (hereinafter referred to also as the organic polymer in the invention) has a solubility of 0 to 5 g based on 100 g of 25° C. water and a solubility of 25 to 100 g based on 100 g of 25° C. acetone.
- the organic polymer in the invention preferably comprises, in the chemical structure, at least one selected from the repeating units represented by formulae (1) through (5) and the groups represented by formulae (6) through (7).
- the organic polymer in the invention has preferably a positive wavelength dispersion property.
- the organic polymer having a positive wavelength dispersion property means an organic polymer in that when an acetone solution of the above organic polymer (another organic solvent or a mixture solvent of acetone with another solvent may be used for dissolving the organic polymer in the invention) is cast on a glass plate, and drying to form a film with a dry thickness of 100 ⁇ m, a value obtained by dividing a retardation within the plane R (600) of the film at wavelength 600 nm by a retardation within the plane R (450) of the film at wavelength 450 nm is more than 1.
- the film substrate having a positive wavelength dispersion property can compensate a polarized light over the entire visible wavelength, provides an image free from color deviation when used in a liquid crystal display employing a birefringence image displaying method, and provides good contrast when used in an organic EL displaying element.
- the organic polymer in the invention having a positive wavelength dispersion property there is a cellulose ester.
- the cellulose ester is preferably a cellulose ester having an acyl group having 2 to 4 carbon atoms as an ester group.
- X represents a substitution degree of an acetyl group
- Y represents a substitution degree of a propanoyl group or a substitution degree of a butanoyl group
- the range satisfying 2.3 ⁇ X+Y ⁇ 2.85 is preferable in view of moisture permeability of the formed film substrate and phase separation of the cellulose ester.
- the cellulose ester in the invention is especially preferably cellulose acetate propionate.
- Examples of the cellulose ester in the invention include cellulose acetate, cellulose acetate propionate, cellulose acetate butyrate, cellulose acetate phthalate, and cellulose acetate propionate butyrate.
- the cellulose ester having propionate or butyrate in addition to acetate for example, cellulose acetate propionate, cellulose acetate butyrate or cellulose acetate propionate butyrate is preferably used.
- the butyryl group forming butyrate may be straight-chained or branched.
- the cellulose acetate propionate having a propionyl group as the ester group has excellent water resistance and useful for a film substrate of a liquid crystal display.
- the acyl substitution degree can be measured according to a method described in ASTM-D817-96.
- the number average molecular weight of the organic polymer in the invention is preferably 10,000 to 1,000,000, and more preferably 50,000 to 300,000.
- the number average molecular weight of the cellulose ester is preferably 70,000 to 250,000, and more preferably 80,000 to 150,000.
- the content of the organic polymer in the invention in the film substrate is preferably 50 to 99% by weight, and more preferably 70 to 90% by weight.
- the “metal” means metals as described on page 71 of Saito Kazuo et al., “Shukihyo no Kagaku”, published by Iwanami Shoten, that is, metals including a semi-metal.
- the reactive metal compound capable of being condensed used in the invention
- a metal alkoxide or a reactive metal halide for example, a metal alkoxide or a reactive metal halide.
- the metal in the metal alkoxide or in the reactive metal halide is preferably a tetravalent metal.
- the metal is more preferably selected from the group consisting of silicon, zirconium, titanium and germanium, and is especially preferably silicon.
- Condensation reaction in the invention does not necessarily require the presence of water, but when the metal in the metal compound in the invention is silicon, is preferably carried out in the presence of water.
- examples of metal compounds having two substituents capable of being hydrolyzed per one metal atom include dimethyldimethoxysilane, dimethyldiethoxysilane, dimethyldiisopropoxysilane, dimethyldibutoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, diethyldiisopropoxysilane, diethyldibutoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, diphenyldiisopropoxysilane, diphenyldibutoxysilane, 3-glycidoxypropylmethyldimethoxysilane, dichlorodimethylsilane, and dichlorodiethylsilane.
- examples of metal compounds having three substituents capable of being hydrolyzed per one metal atom include methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltributoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltributoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltributoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltributoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 2-(3,4-epoxycyclo
- examples of metal compounds having four substituents capable of being hydrolyzed per one metal atom include tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, titanium tetraethoxide, zirconium tetra-n-butoxide, and germanium tetraethoxide.
- polycondensation reaction is preferably carried out in the presence of the metal compounds having four substituents capable of being hydrolyzed per one metal atom.
- substituents other than the substituents capable of being hydrolyzed in the metal compounds having two substituents capable of being hydrolyzed per one metal atom or the metal compounds having three substituents capable of being hydrolyzed per one metal atom are preferably a substituted or unsubstituted alkyl group and a substituted or unsubstituted aryl group.
- the substituents of the alkyl group and the aryl group include an alkyl group (for example, a methyl group, an ethyl group, etc.); a cycloalkyl group (for example, a cyclopentyl group, a cyclohexyl group, etc.); an aralkyl group (for example, a benzyl group, a phenetyl group, etc.); an aryl group (for example, a phenyl group, a naphthyl group, etc.); a heterocyclic group (for example, a furanyl group, a thiophenyl group, a pyridyl group, etc.); an alkoxy group (for example, a methoxy group, an ethoxy group, etc.); an aryloxy group (for example, a phenoxy group, etc.); an acyl group; a halogen atom; a cyano group; an amino group; an al
- polycondensation reaction is carried out in the presence of compounds represented by formula (8), for example, (3,3,3-trifluoropropyl)trimethoxysilane, pentafluorophenylpropyltrimethoxysilane, (heptadecafluoro-1,1,2,2-tetrahydrodecyl)triethoxysilane, (3,3,3-trifluoropropyl)trichlorosilane, pentafluorophenylpropyl-trichlorosilane, and (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trichlorosilane.
- compounds represented by formula (8) for example, (3,3,3-trifluoropropyl)trimethoxysilane, pentafluorophenylpropyltrimethoxysilane, (heptadecafluoro-1,1,2,2-tetrahydrodecyl)triethoxysilane
- the inorganic condensation polymer in the invention (hereinafter referred to also as the condensation polymer in the invention) can be formed by condensation reaction of the metal compounds in the invention.
- the film substrate of the invention is composed of preferably a hybrid of the organic polymer in the invention and the condensation polymer in the invention, so-called an organic polymer-inorganic polymer hybrid.
- sol-gel processing As a method for preparing such a hybrid, there is a method called sol-gel processing.
- the organic polymer-inorganic polymer hybrid herein referred to means a polymer in the form of molecular dispersion, in which an organic polymer and an inorganic polymer combine with each other through a hydrogen bond, a covalent bond or an ionic bond.
- the domain of the polymer hybrid occupies a size of from sub-micrometer to sub-nanometer.
- a method of preparing the polymer hybrid there is a method in which an organic polymer is mixed with an inorganic polymer precursor and then polymerized, a method in which an organic polymer is mixed with an inorganic oligomer and then polymerized, or a method in which an organic polymer is mixed with an inorganic polymer.
- the film substrate of the invention can be prepared according to the following method. That is, for example, the sol-gel processing is applied to a solution in which the organic polymer in the invention and the reactive metal compound capable of being condensed in the invention are dissolved in an appropriate solvent to carry out condensation reaction.
- the condensation reaction is carried out preferably in the presence of an acid catalyst accelerating the reaction.
- the resulting reaction mixture is extruded or cast on a support, dried to obtain the film substrate, and optionally subjected to heat treatment, ultraviolet irradiation treatment or plasma treatment providing a film substrate to have been cross-linked.
- the acid catalyst examples include an inorganic acid such as hydrochloric acid, sulfuric acid, or nitric acid, and an organic acid such as acetic acid, trifluoroacetic acid, levulinic acid, citric acid, p-toluene sulfonic acid, or methane sulfonic acid.
- the resulting reaction mixture may be neutralized with a base.
- the alkali metal content of the resulting mixture is preferably zero to less than 5000 ppm by weight based on the total solid content of the mixture.
- the acid catalyst may be used together with lewis acid, for example, a salt of acetic acid, another organic acid or phosphoric acid with a metal such germanium, titanium, aluminum, antimony or tin, or a halide of such metal.
- lewis acid for example, a salt of acetic acid, another organic acid or phosphoric acid with a metal such germanium, titanium, aluminum, antimony or tin, or a halide of such metal.
- the condensation reaction of the metal compound in the invention may be completed in the reaction mixture before casting on a support or completed in the film formed after casting on a support, but is preferably completed in the reaction mixture before the casting.
- the condensation reaction may not be completed depending upon usage, but is preferably completed.
- bases can be used instead of the acid catalyst.
- the bases include amines, for example, monoethanolamine, diethanolamine, triethanolamine, diethylamine, triethylamine, etc.; bicyclic amines, for example, DBU (diazabicycloundecene, DBN (diazabicyclononene), etc.; ammonia; and phosphine.
- the acids or bases can be used in combination plural times.
- the catalyst used in the condensation reaction can be neutralized, removed under reduced pressure if they are volatile, or removed by washing with water.
- a water miscible organic solvent is usually used as a solvent for dissolving the organic polymer in the invention and the metal compound in the invention to obtain the solution.
- the solvent is preferably volatile since the solvent is necessary to be evaporated after casting or extruding the solution on a support to obtain a film substrate.
- the solvent is a solvent, which does not react with the metal compound or catalyst used and which does not dissolve a support on which a solution containing the solvent is cast or excluded.
- the organic polymer in the invention and the metal compound in the invention may be dissolved in a different solvent, separately, and then the resulting solutions may be mixed.
- a mixture solvent of two or more solvents may be used.
- the water miscible organic solvent include alcohols such as ethyl alcohol, methyl alcohol, isopropyl alcohol, n-propyl alcohol, methoxymethyl alcohol, etc, acetone, methyl ethyl ketone, tetrahydrofuran, 1,4-dioxane, 1,3-dioxolan, dimethylimidazolinone, dimethylformamide, dimethylacetoamide, acetonitrile, dimethylsulfoxide, and sulfolane.
- the solvent is preferably 1,3-dioxolan, ethyl alcohol, acetone, or methyl ethyl ketone.
- the content of the condensation polymer in the invention in the film substrate is preferably 1 to 50% by weight, and more preferably 10 to 30% by weight.
- the thickness of the film substrate of the invention is preferably 10 ⁇ m to 1 mm, and more preferably 30 to 500 ⁇ m.
- the surface of the film substrate of the invention for a displaying element may be optionally covered with a layer of metal oxides, metal nitrides, metal oxynitrides or organic polymeric compounds or a laminate of these layers.
- the film substrate having a transparent conductive layer such as an ITO layer on one side thereof and having such a layer on the other side can reduce moisture absorption on the both sides, and overcome warpage occurring due to difference in stress of the different layers.
- the layer may be provided on both sides of the film substrate. Moisture permeability of the substrate, on which such a layer is provided, can be effectively reduced.
- Examples of the metal oxides, metal nitrides or metal oxynitrides used to form such a layer include oxides, nitrides or oxynitrides of one or more kinds of elements selected from the group consisting of silicon, zirconium, titanium, tungsten, tantalum, aluminum, zinc, indium, chromium, vanadium, tin and niobium. Among these, silicon oxide, aluminum oxide, and silicon nitride are especially preferable.
- a layer of the metal oxides, metal nitrides or metal oxynitrides can be formed according to a vacuum evaporation method, a spattering method, or an ion-plating method.
- the film substrate of the invention is useful for a substrate of an electronic displaying element such as a liquid crystal displaying element or an organic EL displaying element; an electronic optical element; a touch panel or a solar battery; and especially useful for a substrate of an organic EL displaying element.
- an electronic displaying element such as a liquid crystal displaying element or an organic EL displaying element
- an electronic optical element such as a touch panel or a solar battery
- a substrate of an organic EL displaying element such as a liquid crystal displaying element or an organic EL displaying element
- an electronic optical element such as a liquid crystal displaying element or an organic EL displaying element
- a touch panel or a solar battery and especially useful for a substrate of an organic EL displaying element.
- Tetraethoxysilane of 29.2 g and 10.8 g of methyltriethoxysilane were dissolved in 29.2 g of ethanol, and added with 29.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 348.2 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 ⁇ m.
- Tetraethoxysilane of 29.2 g, 5.4 g of methyltriethoxysilane and 2.4 g of (3-glycidoxypropyltrimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 331.7 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 ⁇ m.
- Tetraethoxysilane of 29.2 g, 5.4 g of methyltriethoxysilane and 3.0 g of dimethyldiethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 333.1 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 ⁇ m.
- Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane and 7.3 g of diphenyldimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 ⁇ m.
- Film substrate 5 of the invention was prepared in the same manner as in film substrate 3 of the invention, except that 25.2 g of an aqueous 0.85 weight % sulfuric acid solution was added instead of 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution.
- Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane and 7.3 g of diphenyldimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then added with 8.6 ml of an aqueous 0.5 mmol/liter sodium hydroxide solution with stirring, then cast on a glass plate and dried to obtain a thickness of 50 ⁇ m.
- Tetraethoxysilane of 29.2 g, 3.6 g of methyltriethoxysilane, 3.0 g of dimethyldiethoxysilane and 2.2 g of (3,3,3-trifluoropropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 333.1 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 ⁇ m.
- Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane, 4.9 g of diphenyldimethoxysilane and 2.2 g of (3,3,3-trifluoropropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. Five hours after the addition, the resulting solution was cast on a glass plate and dried to obtain a thickness of 50 ⁇ m.
- the cellulose acetate propionate used for preparation of film substrates 1 through 8 above had a number average molecular weight of 100,000, an acetyl substitution degree of 2.00, and a propionyl substitution degree of 0.80.
- a 40 weight % tetraethoxysilane ethanol solution of 10 g and 7.2 g of a 10 weight % polyvinyl pyrrolidone ethanol solution were mixed, and then added with 0.5 g of water and 0.1 g of an aqueous 1 mol/liter hydrochloric acid solution with stirring. The resulting mixture was stirred for 24 hours, then cast on a glass plate and dried to obtain a thickness of 50 ⁇ m.
- a 10 weight % methanol solution of polyvinyl acetate as a precursor of polyvinyl alcohol was prepared.
- the polyvinyl acetate methanol solution of 5 g and 5 g of a 10 weight % tetramethoxysilane methanol solution were mixed, and then added with 1.6 g of an aqueous 0.1 mol/liter hydrochloric acid solution.
- the resulting mixture was allowed to stand at 60° C. for 24 hours, cast on a glass plate, and dried to obtain a thickness of 50 ⁇ m.
- comparative film substrate 11 Sumilight FS-1300 produced by Sumitomo Bakelite Co., Ltd., a polyethersulfone film with a thickness of 50 ⁇ m, was designated as comparative film substrate 11.
- comparative film substrate 12 Pureace produced by Teijin Co., Ltd., a polycarbonate film with a thickness of 100 ⁇ m, was designated as comparative film substrate 12.
- Titanium tetraisopropoxide of 4.26 g was dissolved in 4 g of tetrahydrofuran. The resulting solution was mixed with stirring to 48.0 g of a 10 weight % cellulose acetate propionate 2-methoxyethanol solution maintained at 50° C. The resulting mixture solution was stirred at 25° C. for 8 hours, and then cast on a glass plate and dried to obtain a thickness of 50 ⁇ m.
- the cellulose acetate propionate used for preparation of film substrate 13 above had a number average molecular weight of 100,000, an acetyl substitution degree of 2.00, and a propionyl substitution degree of 0.80.
- inventive film substrates 1 through 8, inventive film substrate 13 and comparative film substrates 9 through 12 prepared above were evaluated for light (visible) transmittance, haze, moisture permeability, and retardation.
- the light (visible) transmittance and haze were measured through a TUEBIDITY METER T-2600DA produced by Tokyo Denshoku Co., Ltd.
- Birefringence was measured through an automatic birefringence meter KOBRA-21ADH, produced by Oji Keisoku Kiki Co., Ltd., and the retardation was represented as the product of the thickness (nm) of a film substrate and the difference between the refractive index in an X direction and the refractive index in a Y direction perpendicular to the X direction, each direction being within the plane of the substrate.
- the moisture permeability was measured according to a method described in JIS-Z-0208. The results are shown in Table 1.
- comparative substrate Nos. 9, 10, 11 and 12 provided high moisture permeability
- comparative substrate Nos. 11 and 12 provided high birefringence, resulting in undesirable results
- inventive substrates Nos. 1 through 8, and inventive substrate No. 13 provided high transparency, low moisture permeability, and low retardation, resulting in good results.
- a 60 nm film was formed on both sides of inventive substrates Nos. 1 through 8 and comparative substrates Nos. 9 through 12, setting SiO 1/2 as a target, employing a magnetron sputtering apparatus.
- two substrate samples of a 100 mm ⁇ 100 mm size per each substrate were prepared.
- On an area of 72 mm ⁇ 72 mm of one substrate sample was formed a 150 nm thick ITO (indium tin oxide) layer having a 4.5 mm pitch (4.0 mm of a solid line width and 0.5 mm of a gap) in the form of stripe.
- ITO indium tin oxide
- Each of the thus prepared samples was subjected to ultrasonic washing with isopropyl alcohol, dried with dried nitrogen gas, and then cleaned for 5 minutes employing UV light and ozone.
- a positive hole injection layer through an electron injection layer were formed on the ITO layer through a mask capable of providing a solid layer with an area of 72 mm ⁇ 72 mm. That is, the sample was fixed on a holder of a vacuum evaporation apparatus.
- N,N′-diphenyl-N,N′-bis(3-methylphenyl)-[1,1′-biphenyl]-4,4′-diamine were placed in a first molybdenum resistive heating boat
- 200 mg of 4,4′-bis(2,2′-diphenylvinyl)biphenyl(DPVBi) were placed in a second molybdenum resistive heating boat
- 200 mg of OXD-7 (described below) were placed in a third molybdenum resistive heating boat
- the boats were placed in the vacuum evaporation apparatus.
- the heating boat carrying TPD was heated by applying an electric current to evaporate TDP on the sample at an evaporation rate of from 0.1 to 0.3 nm/sec and to form a positive hole injection layer with a thickness of 60 nm on the ITO layer.
- the heating boat carrying DPVBi was heated to 220° C. by applying an electric current to evaporate DPVBi on the positive hole injection layer at an evaporation rate of from 0.1 to 0.3 nm/sec and to form a light emission layer with a thickness of 40 nm.
- the heating boat carrying OXD-7 was heated by applying an electric current to evaporate OXD-7 on the light emission layer at an evaporation rate of 0.1 nm/sec, and to form an electron injection layer with a thickness of 20 nm. Temperature of the sample during evaporation was room temperature.
- the vacuum tank was opened, and a mask was brought into close contact with the electron injection layer at the portion corresponding to the area described above of 72 mm ⁇ 72 mm to form a film having a 1.5 mm pitch (a solid line width of 1.4 and a gap of 0.1 mm) in the form of stripe.
- magnesium was placed in the molybdenum heating boat and silver was placed in the tungsten evaporation basket. Then, the pressure in the vacuum tank was reduced to 2 ⁇ 10 ⁇ 4 Pa, and magnesium was evaporated at an evaporation rate of from 1.5 to 2.0 nm/sec by applying an electric current to the boat carrying the magnesium.
- a counter electrode composed of a mixture of magnesium and silver was formed.
- the mask was brought into close contact with the electron injection layer so that the counter electrode and the transparent electrode crossed and a terminal of each electrode was open.
- a two-liquid type epoxy adhesive (Araldide, produced by Ciba Geigy Co., Ltd.) was coated through a dispenser at a line width of 1 mm on the perimeter of the area of 72 mm ⁇ 72 mm in which the counter electrode and ITO electrode crossed.
- the other substrate sample was laminated onto the resulting coated substrate at a nitrogen atmosphere, and the adhesive was hardened to obtain an organic EL displaying element.
- a polarizing plate and a 1 ⁇ 4 ⁇ plate was laminated on the outer surface of the film substrate with an anode (ITO) of the resulting organic EL displaying element.
- ITO anode
- a direct current of 10 V was applied under atmospheric pressure to the resulting element, and the half life of luminance was measured.
- the half life of luminance was represented by a relative value when the half life of luminance of a comparative organic EL displaying element prepared employing comparative film substrate 12 was set at 100. The results are shown in Table 2.
- Organic EL element employing 164 inventive film substrate 1 Organic EL element employing 175 inventive film substrate 2 Organic EL element employing 179 inventive film substrate 3 Organic EL element employing 188 inventive film substrate 4 Organic EL element employing 189 inventive film substrate 5 Organic EL element employing 202 inventive film substrate 6 Organic EL element employing 210 inventive film substrate 7 Organic EL element employing 216 inventive film substrate 8 Organic EL element employing 62 comparative film substrate 9 Organic EL element employing 51 comparative film substrate 10 Organic EL element employing 72 comparative film substrate 11 Organic EL element employing 100 comparative film substrate 12
- organic EL element employing comparative film substrates 9, 10, 11 and 12 provided low contrast, resulting in undesirable results.
- organic EL displaying element employing inventive film substrates 1 through 8 provided high contrast, resulting in good results.
- organic EL displaying elements employing the film substrate of the invention have long life and high contrast. Accordingly, the film substrate of the invention has proved to be an excellent film substrate for an organic EL displaying element.
- the polarizing plate used in a color liquid crystal display VL-1530S produced by Fujitsu Co., Ltd. was peeled from the liquid crystal cell. Subsequently, each of inventive film substrates 1 to 8 and comparative film substrates 9 to 12 were laminated on the liquid crystal cell, and further, the peeled polarizing plate were again laminated on the film substrate. The resulting laminate was installed in the color liquid crystal display, and color deviation thereof was compared with that of the display without the film substrate. Comparative film substrates 9 to 12 provided an increased color deviation, resulting in undesirable results. On the other hand, inventive film substrates 1 to 8 provided a reduced color deviation, resulting in good results.
- Tetraethoxysilane of 29.2 g and 10.8 g of methyltriethoxysilane were dissolved in 29.2 g of ethanol, and added with 29.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 348.2 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, and filtered with Azumi filter paper No. 244 produced by Azumi Roshi Co., Ltd. to obtain a dope 21.
- the cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 2.00, and a propionyl substitution degree of 0.8.
- the resultant dope 21 was cast onto a stainless steel belt in the loop form at 25° C.
- the cast dope was dried for two minutes on the stainless steel belt whose reverse side was brought into contact with 40° C. water, while 40° C. air was applied, then cooled for 15 seconds on the stainless steel belt whose reverse side was brought into contact with 15° C. cooled water, and peeled from the belt to obtain a web.
- the amount of the residual solvent in the web was 40% by weight.
- the both edges of the peeled web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.05 at 90° C. by changing the interval of the clips in the transverse direction. After that, the stretched web was dried at 125° C. for 10 minutes while transporting with the rollers in a drying zone.
- a film substrate 21 (inventive) with a thickness of 80 ⁇ m and a width of 1.3 m was obtained.
- Tetraethoxysilane of 29.2 g, 5.4 g of methyltriethoxysilane and 2.4 g of (3-glycidoxypropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 331.7 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, and filtered with Azumi filter paper No. 244 produced by Azumi Roshi Co., Ltd. to obtain a dope 22.
- the cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 1.9, and a propionyl substitution degree of 0.7.
- the resultant dope 22 was cast onto a stainless steel belt in the loop form at 25° C.
- the cast dope was dried for two minutes on the stainless steel belt whose reverse side was brought into contact with 40° C. water, then cooled for 15 seconds on the stainless steel belt whose reverse side was brought into contact with 15° C. cooled water, and then peeled from the belt to obtain a web.
- the amount of the residual solvent in the peeled web was 40% by weight.
- the both edges of the peeled web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.03 at 90° C. by changing the interval of the clips in the transverse direction. After that, the stretched web was dried at 130° C. for 10 minutes while transporting with the rollers in a drying zone.
- a film substrate 22 (inventive) with a thickness of 80 ⁇ m and a width of 1.3 m was obtained.
- Tetraethoxysilane of 29.2 g, 5.4 g of methyltriethoxysilane and 3.0 g of dimethyldiethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring.
- the resulting mixture was added to 331.1 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring.
- the resulting solution was refluxed for 2 hours, and filtered to obtain a dope 23.
- the cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 2.0, and a propionyl substitution degree of 0.8.
- the resultant dope 23 was cast onto a stainless steel belt in the loop form at 25° C.
- the cast dope was dried for two minutes on the stainless steel belt whose reverse side was brought into contact with 40° C. water, then cooled for 15 seconds on the belt whose reverse side was brought into contact with 15° C. cooled water, and then peeled from the belt to obtain a web.
- the amount of the residual solvent in the peeled web was 40% by weight.
- the both edges of the peeled web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.05 at 90° C. by changing the interval of the clips in the transverse direction. After that, the stretched web was dried at 120° C. for 15 minutes while transporting with the rollers in a drying zone.
- a film substrate 23 (inventive) with a thickness of 80 ⁇ m and a width of 1.3 m was obtained.
- Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane and 7.3 g of diphenyldimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, and filtered with Azumi filter paper No. 244 produced by Azumi Roshi Co., Ltd. to obtain a dope 24.
- the cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 1.8, and a propionyl substitution degree of 0.6.
- the resultant dope 24 was cast onto a stainless steel belt in the loop form at 30° C.
- the cast dope was dried for one minute on the stainless steel belt whose reverse side was heated with 45° C. air, while 55° C. air was applied from the cast dope side, then cooled for 15 seconds on the belt whose reverse side was brought into contact with 15° C. cooled water, and then peeled from the belt to obtain a web.
- the amount of the residual solvent in the peeled web was 80% by weight.
- the resulting web was transported with the rollers in a drying zone maintained at 80° C. Thereafter, the both edges of the web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.07 at 90° C.
- Tetraethoxysilane of 29.2 g, 3.6 g of methyltriethoxysilane, 3.0 g of dimethyldiethoxysilane and 2.2 g of (3,3,3-trifluoropropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 333.1 g of a 14.29 weight % cellulose acetate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, and filtered with Azumi filter paper No. 244 produced by Azumi Roshi Co., Ltd. to obtain a dope 25.
- the cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 2.5.
- the resultant dope 25 was cast onto a stainless steel belt in the loop form at 30° C.
- the cast dope was dried for 90 seconds on the stainless steel belt whose reverse side was heated with 43° C. air, while 50° C. air was applied from the cast dope side, then cooled for 10 seconds on the belt whose reverse side was brought into contact with 12° C. cooled water, and then peeled from the belt to obtain a web.
- the amount of the residual solvent in the peeled web was 70% by weight.
- the resulting web was transported with the rollers in a drying zone maintained at 80° C. Thereafter, the both edges of the web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.06 at 90° C.
- Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane, 4.9 g of diphenyldimethoxysilane and 2.2 g of (3,3,3-trifluoropropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. Five hours after, the resulting solution was filtered with Azumi filter paper No.
- the cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 1.8, and a propionyl substitution degree of 0.8.
- the resultant dope 26 was cast onto a stainless steel belt in the loop form at 30° C.
- the cast dope was dried for 90 seconds on the stainless steel belt whose reverse side was heated with 55° C. air, while 60° C. air was applied from the cast dope side, cooled for 10 seconds on the belt whose reverse side was brought into contact with 12° C. cooled water, and then peeled from the belt to obtain a web.
- the amount of the residual solvent in the peeled web was 40% by weight.
- the resulting web was transported with the rollers in a drying zone maintained at 80° C. Thereafter, the both edges of the web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.06 at 90° C.
- a film substrate 27 (comparative) was prepared in the same manner as in film substrate 21 above, except that the following dope A was used instead of dope 21.
- a film substrate 28 (comparative) was prepared in the same manner as in film substrate 21 above, except that the following dope B was used instead of dope 21.
- Dope B Cellulose acetate propionate 90 g (number average molecular weight: 100,000; Acetyl substitution degree: 2.0; propionyl substitution degree: 0.8) Acetone 360 g
- Inventive film substrates 21 through 26, and comparative film substrates 27 and 28 prepared above were evaluated for light (visible) transmittance, haze, moisture permeability, and retardation.
- the light (visible) transmittance and haze were measured through a TURBIDITY METER T-2600DA produced by Tokyo Denshoku Co., Ltd.
- the substrates were measured through an automatic birefringence meter KOBRA-21ADH, produced by Oji Keisoku Kiki Co., Ltd., and retardation (R 0 ) within the planes was computed from measurement of the three dimensional refractive indices.
- the moisture permeability was measured according to a method described in JIS-Z-0208.
- the center line average surface roughness R a of the substrates was measured through an optical interference surface roughness meter (produced by WYKO Co., Ltd.). The results are shown in Table 3.
- comparative substrate Nos. 27 and 28 provided high moisture permeability.
- inventive substrates Nos. 21 through 26 provided low moisture permeability, good optical properties, and good surface roughness.
- the present invention can provide a film substrate with high transparency, low moisture permeability and low retardation for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery.
- the present invention can provide a film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery, which is suitable for a displaying element employing a birefringence image displaying method.
- the present invention can provide a film substrate for an electronic displaying element, giving an organic EL displaying element with a long life and high contrast.
- the present invention can provide a film substrate for an electronic displaying element with a reduced color deviation in a liquid crystal display employing a birefringence image displaying method.
Abstract
A film substrate of an electronic displaying element, an electronic optical element, a touch panel, or a solar battery is disclosed which is composed mainly of an organic polymer having water solubility of 0 to 5 g based on 100 g of 25° C. water and having acetone solubility of 25 to 100 g based on 100 g of 25° C. acetone and an inorganic condensation polymer of a reactive metal compound capable of being condensed.
Description
This application is a Divisional of U.S. patent application Ser. No. 10/011,447 filed Oct. 22, 2001, now U.S. Pat. No. 7,141,304, issued Nov. 28, 2006, which claimed the priority of Japanese Patent Application No. 392502/2000 filed Dec. 25, 2000, the priority of both are claimed and both are incorporated herein by reference.
The present invention relates to a transparent film substrate, and particularly to a film substrate with high transparency and low moisture permeability for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery.
As a substrate for a liquid crystal displaying element, an electronic displaying element such as an organic EL displaying element, an electronic optical element such as CCD or a CMOS sensor, or a solar battery, a glass plate has been conventionally used due to its high thermal stability, high transparency and low moisture permeability. However, as portable information devices or a cell phone prevail in recent years, a substrate, which is light, flexible, and tough, has been required as a substrate thereof in place for a glass plate, which is relatively heavy and fragile. So, plastic substrates such as a polyethersulfone substrate, a polycarbonate substrate, and a laminate of a polyethersulfone plate with an acryl resin plate as disclosed in Japanese Patent O.P.I. Publication No. 5-142525, have been proposed and put into practical use. However, their high price and their poorness of optical properties such as light transmittance and birefringence have been an obstacle to prevalence of these substrates. Further, since these plastic substrates have a negative wavelength dispersion property, compensation of polarized light cannot be made over the entire visible wavelength region in a liquid display employing a birefringence image displaying method, for example, a liquid display of a STN mode, a VA mode or an IPS mode, resulting in color deviation of a displaying color image, and contrast are lowered in an organic EL displaying element. As a resin having a positive wavelength dispersion property there are mentioned cellulose derivatives, for example, cellulose acetate propionate, however, these cellulose derivatives are not suitable for a substrate of image displaying elements on account of their too high moisture permeability.
A first object of the invention is to provide a film substrate with high transparency and low moisture permeability for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery.
A second object of the invention is to provide a film substrate giving an organic EL displaying element with a long life and high contrast.
A third object of the invention is to provide a film substrate for an electronic displaying element with reduced color deviation in a liquid crystal display employing a birefringence image displaying method.
The present invention has been attained by the following constitutions:
1. a film substrate of an electronic displaying element, an electronic optical element, a touch panel, or a solar battery, wherein the film substrate is composed mainly of an organic polymer having water solubility of 0 to 5 g based on 100 g of 25° C. water and having acetone solubility of 25 to 100 g based on 100 g of 25° C. acetone and an inorganic condensation polymer of a reactive metal compound capable of being condensed;
2. the film substrate of item 1 above, wherein the organic polymer comprises a repeating unit represented by formula (1), (2), (3), (4) or (5) in its main chain, or a group represented by formula (6) or (7) in its side chain,
3. the film substrate of item 1 above, wherein the organic polymer has a positive wavelength dispersion property;
4. the film substrate of item 1 above, wherein the organic polymer is a cellulose ester;
5. the film substrate of item 1 above, wherein the cellulose ester has a cellulose ester having an acyl group having 2 to 4 carbon atoms as its ester group;
6. the film substrate of item 5 above, wherein the cellulose ester is cellulose acetate propionate;
7. the film substrate of item 1 above, wherein the reactive metal compound is at least one pair of a reactive metal compound having two substituents capable of being hydrolyzed per one metal atom and a reactive metal compound having three substituents capable of being hydrolyzed per one metal atom;
8. the film substrate of item 1 above, wherein the metal of the reactive metal compound is a tetravalent metal;
9. the film substrate of item 8 above, wherein the tetravalent metal is selected from the group consisting of silicon, zirconium, titanium and germanium;
10. the film-substrate of item 1 above, wherein the inorganic condensation polymer is a condensation polymer comprising in the chemical structure a monomer unit derived from a compound represented by formula (8):
(Rf)nSi(X1)4-n formula (8)
wherein Rf represents an alkyl group having a fluorine atom or an aryl group having a fluorine atom; X1 represents a group capable of being hydrolyzed; and n represents an integer of 1 to 3;
(Rf)nSi(X1)4-n formula (8)
wherein Rf represents an alkyl group having a fluorine atom or an aryl group having a fluorine atom; X1 represents a group capable of being hydrolyzed; and n represents an integer of 1 to 3;
11. the film substrate of item 1 above, wherein the film substrate further contains an alkali metal in an amount of zero to less than 5,000 ppm by weight based on the weight of the substrate;
12. the film substrate of item 1 above, wherein the film substrate is a substrate for an organic EL displaying element;
13. the film substrate of item 1 above, wherein the film substrate is a substrate for an organic EL displaying element, and the organic polymer has a positive wavelength dispersion property;
21. a film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery, wherein the film substrate is an organic-inorganic polymer hybrid film substrate composed mainly of an organic polymer having water solubility of 0 to 5 g based on 100 g of 25° C. water and having acetone solubility of 25 to 100 g based on 100 g of 25° C. acetone and a reactive metal compound capable of being condensed after hydrolysis to produce a condensation or the condensation polymer;
22. the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of item 21 above, wherein the organic polymer comprises in the chemical structure at least one selected from the group consisting of repeating units represented by formulae (1), (2), (3), (4) and (5) described above and groups represented by formulae (6) and (7) described above,
23. the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of item 21 or 22 above, wherein the organic polymer has a positive wavelength dispersion property;
24. the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of item 22 or 23 above, wherein the organic polymer is a cellulose ester;
25. the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of item 24 above, wherein the cellulose ester has a cellulose ester having an acyl group having 2 to 4 carbon atoms in its ester group;
26. the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of item 25 above, wherein the cellulose ester is cellulose acetate propionate;
27. the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of any one of items 21 through 26 above, wherein the film substrate comprises, as the reactive metal compound, at least one pair of a reactive metal compound having two substituents capable of being condensed after hydrolysis per one metal atom and a reactive metal compound having three substituents capable of being condensed after hydrolysis per one metal atom;
28. the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of any one of items 21 through 27 above, wherein the metal of the reactive metal compound is a tetravalent metal;
29. the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of item 28 above, wherein the tetravalent metal is selected from the group consisting of silicon, zirconium, titanium and germanium;
30. the film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery of any one of items 21 through 29 above, wherein the film substrate comprises a compound represented by formula (8):
(Rf)nSi(X1)4-n formula (8)
wherein Rf represents an alkyl group having a fluorine atom or an aryl group having a fluorine atom; X1 represents a group capable of being hydrolyzed; and n represents an integer of 1 to 3;
(Rf)nSi(X1)4-n formula (8)
wherein Rf represents an alkyl group having a fluorine atom or an aryl group having a fluorine atom; X1 represents a group capable of being hydrolyzed; and n represents an integer of 1 to 3;
31. a method of manufacturing a film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery as recited in any one of items 21 through 30 above, the method comprising the steps of casting on a support a composition containing an organic polymer, a reactive metal compound capable of being condensed after hydrolysis to produce a condensed polymer or the condensation polymer, and an alkali metal in an amount of less than 5,000 ppm, and then drying to obtain a film substrate on the support;
32. the film substrate of any one of items 21 through 30 above, wherein the film substrate is a substrate for an organic EL displaying element; or
33. the film substrate of item 21 or 22 above, wherein the organic polymer has a positive wavelength dispersion property, and the film substrate is a substrate for an organic EL displaying element.
The present invention will be detailed below.
In the invention, the organic polymer (hereinafter referred to also as the organic polymer in the invention) has a solubility of 0 to 5 g based on 100 g of 25° C. water and a solubility of 25 to 100 g based on 100 g of 25° C. acetone. The organic polymer in the invention preferably comprises, in the chemical structure, at least one selected from the repeating units represented by formulae (1) through (5) and the groups represented by formulae (6) through (7).
In the invention, the organic polymer in the invention has preferably a positive wavelength dispersion property. The organic polymer having a positive wavelength dispersion property means an organic polymer in that when an acetone solution of the above organic polymer (another organic solvent or a mixture solvent of acetone with another solvent may be used for dissolving the organic polymer in the invention) is cast on a glass plate, and drying to form a film with a dry thickness of 100 μm, a value obtained by dividing a retardation within the plane R (600) of the film at wavelength 600 nm by a retardation within the plane R (450) of the film at wavelength 450 nm is more than 1.
The film substrate having a positive wavelength dispersion property can compensate a polarized light over the entire visible wavelength, provides an image free from color deviation when used in a liquid crystal display employing a birefringence image displaying method, and provides good contrast when used in an organic EL displaying element.
As an example of the organic polymer in the invention having a positive wavelength dispersion property, there is a cellulose ester. The cellulose ester is preferably a cellulose ester having an acyl group having 2 to 4 carbon atoms as an ester group. When in the cellulose ester, X represents a substitution degree of an acetyl group, and Y represents a substitution degree of a propanoyl group or a substitution degree of a butanoyl group, it is preferred that 2.3<X+Y<2.85 and 0<X<2.85. The range satisfying 2.3<X+Y<2.85 is preferable in view of moisture permeability of the formed film substrate and phase separation of the cellulose ester. In the cellulose ester having a propanoyl group as the ester group, a higher substitution degree of the propanoyl group is preferable. The cellulose ester in the invention is especially preferably cellulose acetate propionate.
Examples of the cellulose ester in the invention include cellulose acetate, cellulose acetate propionate, cellulose acetate butyrate, cellulose acetate phthalate, and cellulose acetate propionate butyrate. In the invention, the cellulose ester having propionate or butyrate in addition to acetate, for example, cellulose acetate propionate, cellulose acetate butyrate or cellulose acetate propionate butyrate is preferably used. The butyryl group forming butyrate may be straight-chained or branched. The cellulose acetate propionate having a propionyl group as the ester group has excellent water resistance and useful for a film substrate of a liquid crystal display. The acyl substitution degree can be measured according to a method described in ASTM-D817-96.
The number average molecular weight of the organic polymer in the invention is preferably 10,000 to 1,000,000, and more preferably 50,000 to 300,000. The number average molecular weight of the cellulose ester is preferably 70,000 to 250,000, and more preferably 80,000 to 150,000.
The content of the organic polymer in the invention in the film substrate is preferably 50 to 99% by weight, and more preferably 70 to 90% by weight.
In the invention, the “metal” means metals as described on page 71 of Saito Kazuo et al., “Shukihyo no Kagaku”, published by Iwanami Shoten, that is, metals including a semi-metal.
As the reactive metal compound (hereinafter referred to also as the metal compound in the invention) capable of being condensed used in the invention, there is mentioned, for example, a metal alkoxide or a reactive metal halide. The metal in the metal alkoxide or in the reactive metal halide is preferably a tetravalent metal. The metal is more preferably selected from the group consisting of silicon, zirconium, titanium and germanium, and is especially preferably silicon. Condensation reaction in the invention does not necessarily require the presence of water, but when the metal in the metal compound in the invention is silicon, is preferably carried out in the presence of water.
In the reactive metal compound capable of being condensed used in the invention, examples of metal compounds having two substituents capable of being hydrolyzed per one metal atom include dimethyldimethoxysilane, dimethyldiethoxysilane, dimethyldiisopropoxysilane, dimethyldibutoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, diethyldiisopropoxysilane, diethyldibutoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, diphenyldiisopropoxysilane, diphenyldibutoxysilane, 3-glycidoxypropylmethyldimethoxysilane, dichlorodimethylsilane, and dichlorodiethylsilane.
In the reactive metal compound capable of being condensed used in the invention, examples of metal compounds having three substituents capable of being hydrolyzed per one metal atom include methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltributoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltributoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltributoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltributoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-chloropropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, (3-acryloxypropyl)trimethoxysilane, acetoxytrietoxysilane, (heptadecafluoro-1,1,2,2-tetrahydrodecyltrimethoxysilane, (3,3,3-trifluoropropyl)trimethoxysilane, methyltrichlorosilane, ethyltrichlorosilane, and phenyltrichlorosilane. In the reactive metal compound capable of being condensed, examples of metal compounds having four substituents capable of being hydrolyzed per one metal atom include tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, titanium tetraethoxide, zirconium tetra-n-butoxide, and germanium tetraethoxide. In the invention, polycondensation reaction is preferably carried out in the presence of the metal compounds having four substituents capable of being hydrolyzed per one metal atom. In view of reducing moisture permeability, substituents other than the substituents capable of being hydrolyzed in the metal compounds having two substituents capable of being hydrolyzed per one metal atom or the metal compounds having three substituents capable of being hydrolyzed per one metal atom are preferably a substituted or unsubstituted alkyl group and a substituted or unsubstituted aryl group. The substituents of the alkyl group and the aryl group include an alkyl group (for example, a methyl group, an ethyl group, etc.); a cycloalkyl group (for example, a cyclopentyl group, a cyclohexyl group, etc.); an aralkyl group (for example, a benzyl group, a phenetyl group, etc.); an aryl group (for example, a phenyl group, a naphthyl group, etc.); a heterocyclic group (for example, a furanyl group, a thiophenyl group, a pyridyl group, etc.); an alkoxy group (for example, a methoxy group, an ethoxy group, etc.); an aryloxy group (for example, a phenoxy group, etc.); an acyl group; a halogen atom; a cyano group; an amino group; an alkylthio group; a glycidyl group; a glycidoxy group; and a vinyl group. Among the substituted alkyl groups, a glycidoxy alkyl group is preferable.
Further, it is preferred in the invention that polycondensation reaction is carried out in the presence of compounds represented by formula (8), for example, (3,3,3-trifluoropropyl)trimethoxysilane, pentafluorophenylpropyltrimethoxysilane, (heptadecafluoro-1,1,2,2-tetrahydrodecyl)triethoxysilane, (3,3,3-trifluoropropyl)trichlorosilane, pentafluorophenylpropyl-trichlorosilane, and (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trichlorosilane.
The inorganic condensation polymer in the invention (hereinafter referred to also as the condensation polymer in the invention) can be formed by condensation reaction of the metal compounds in the invention. The film substrate of the invention is composed of preferably a hybrid of the organic polymer in the invention and the condensation polymer in the invention, so-called an organic polymer-inorganic polymer hybrid. In order to prepare the film substrate of the invention, it is preferable to prepare a hybrid of the organic polymer in the invention and the inorganic polymer in the invention. As a method for preparing such a hybrid, there is a method called sol-gel processing. The organic polymer-inorganic polymer hybrid herein referred to means a polymer in the form of molecular dispersion, in which an organic polymer and an inorganic polymer combine with each other through a hydrogen bond, a covalent bond or an ionic bond. The domain of the polymer hybrid occupies a size of from sub-micrometer to sub-nanometer. As a method of preparing the polymer hybrid, there is a method in which an organic polymer is mixed with an inorganic polymer precursor and then polymerized, a method in which an organic polymer is mixed with an inorganic oligomer and then polymerized, or a method in which an organic polymer is mixed with an inorganic polymer.
The film substrate of the invention can be prepared according to the following method. That is, for example, the sol-gel processing is applied to a solution in which the organic polymer in the invention and the reactive metal compound capable of being condensed in the invention are dissolved in an appropriate solvent to carry out condensation reaction. The condensation reaction is carried out preferably in the presence of an acid catalyst accelerating the reaction. The resulting reaction mixture is extruded or cast on a support, dried to obtain the film substrate, and optionally subjected to heat treatment, ultraviolet irradiation treatment or plasma treatment providing a film substrate to have been cross-linked.
Examples of the acid catalyst include an inorganic acid such as hydrochloric acid, sulfuric acid, or nitric acid, and an organic acid such as acetic acid, trifluoroacetic acid, levulinic acid, citric acid, p-toluene sulfonic acid, or methane sulfonic acid. After the sol gel reaction is completed in the presence of an acid catalyst, the resulting reaction mixture may be neutralized with a base. When the reaction mixture is neutralized with a base, the alkali metal content of the resulting mixture is preferably zero to less than 5000 ppm by weight based on the total solid content of the mixture. The acid catalyst may be used together with lewis acid, for example, a salt of acetic acid, another organic acid or phosphoric acid with a metal such germanium, titanium, aluminum, antimony or tin, or a halide of such metal. The condensation reaction of the metal compound in the invention may be completed in the reaction mixture before casting on a support or completed in the film formed after casting on a support, but is preferably completed in the reaction mixture before the casting. The condensation reaction may not be completed depending upon usage, but is preferably completed.
As the catalyst, bases can be used instead of the acid catalyst. Examples of the bases include amines, for example, monoethanolamine, diethanolamine, triethanolamine, diethylamine, triethylamine, etc.; bicyclic amines, for example, DBU (diazabicycloundecene, DBN (diazabicyclononene), etc.; ammonia; and phosphine. Further, the acids or bases can be used in combination plural times.
The catalyst used in the condensation reaction can be neutralized, removed under reduced pressure if they are volatile, or removed by washing with water.
As a solvent for dissolving the organic polymer in the invention and the metal compound in the invention to obtain the solution, a water miscible organic solvent is usually used. The solvent is preferably volatile since the solvent is necessary to be evaporated after casting or extruding the solution on a support to obtain a film substrate. Further, the solvent is a solvent, which does not react with the metal compound or catalyst used and which does not dissolve a support on which a solution containing the solvent is cast or excluded. The organic polymer in the invention and the metal compound in the invention may be dissolved in a different solvent, separately, and then the resulting solutions may be mixed.
A mixture solvent of two or more solvents may be used. Examples of the water miscible organic solvent include alcohols such as ethyl alcohol, methyl alcohol, isopropyl alcohol, n-propyl alcohol, methoxymethyl alcohol, etc, acetone, methyl ethyl ketone, tetrahydrofuran, 1,4-dioxane, 1,3-dioxolan, dimethylimidazolinone, dimethylformamide, dimethylacetoamide, acetonitrile, dimethylsulfoxide, and sulfolane. The solvent is preferably 1,3-dioxolan, ethyl alcohol, acetone, or methyl ethyl ketone.
The content of the condensation polymer in the invention in the film substrate is preferably 1 to 50% by weight, and more preferably 10 to 30% by weight.
The thickness of the film substrate of the invention is preferably 10 μm to 1 mm, and more preferably 30 to 500 μm.
The surface of the film substrate of the invention for a displaying element may be optionally covered with a layer of metal oxides, metal nitrides, metal oxynitrides or organic polymeric compounds or a laminate of these layers. The film substrate having a transparent conductive layer such as an ITO layer on one side thereof and having such a layer on the other side can reduce moisture absorption on the both sides, and overcome warpage occurring due to difference in stress of the different layers. The layer may be provided on both sides of the film substrate. Moisture permeability of the substrate, on which such a layer is provided, can be effectively reduced. Examples of the metal oxides, metal nitrides or metal oxynitrides used to form such a layer include oxides, nitrides or oxynitrides of one or more kinds of elements selected from the group consisting of silicon, zirconium, titanium, tungsten, tantalum, aluminum, zinc, indium, chromium, vanadium, tin and niobium. Among these, silicon oxide, aluminum oxide, and silicon nitride are especially preferable. A layer of the metal oxides, metal nitrides or metal oxynitrides can be formed according to a vacuum evaporation method, a spattering method, or an ion-plating method.
The film substrate of the invention is useful for a substrate of an electronic displaying element such as a liquid crystal displaying element or an organic EL displaying element; an electronic optical element; a touch panel or a solar battery; and especially useful for a substrate of an organic EL displaying element.
The present invention will be explained below with reference to examples, but is not limited thereto.
<Preparation of Film Substrate 1 of the Invention>
Tetraethoxysilane of 29.2 g and 10.8 g of methyltriethoxysilane were dissolved in 29.2 g of ethanol, and added with 29.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 348.2 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 μm.
<Preparation of Film Substrate 2 of the Invention>
Tetraethoxysilane of 29.2 g, 5.4 g of methyltriethoxysilane and 2.4 g of (3-glycidoxypropyltrimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 331.7 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 μm.
<Preparation of Film Substrate 3 of the Invention>
Tetraethoxysilane of 29.2 g, 5.4 g of methyltriethoxysilane and 3.0 g of dimethyldiethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 333.1 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 μm.
<Preparation of Film Substrate 4 of the Invention>
Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane and 7.3 g of diphenyldimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 μm.
<Preparation of Film Substrate 5 of the Invention>
Film substrate 5 of the invention was prepared in the same manner as in film substrate 3 of the invention, except that 25.2 g of an aqueous 0.85 weight % sulfuric acid solution was added instead of 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution.
<Preparation of Film Substrate 6 of the Invention>
Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane and 7.3 g of diphenyldimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then added with 8.6 ml of an aqueous 0.5 mmol/liter sodium hydroxide solution with stirring, then cast on a glass plate and dried to obtain a thickness of 50 μm.
<Preparation of Film Substrate 7 of the Invention>
Tetraethoxysilane of 29.2 g, 3.6 g of methyltriethoxysilane, 3.0 g of dimethyldiethoxysilane and 2.2 g of (3,3,3-trifluoropropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 333.1 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, then cast on a glass plate and dried to obtain a thickness of 50 μm.
<Preparation of Film Substrate 8 of the Invention>
Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane, 4.9 g of diphenyldimethoxysilane and 2.2 g of (3,3,3-trifluoropropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. Five hours after the addition, the resulting solution was cast on a glass plate and dried to obtain a thickness of 50 μm.
The cellulose acetate propionate used for preparation of film substrates 1 through 8 above had a number average molecular weight of 100,000, an acetyl substitution degree of 2.00, and a propionyl substitution degree of 0.80.
<Preparation of Comparative Film Substrate 9>
A 40 weight % tetraethoxysilane ethanol solution of 10 g and 7.2 g of a 10 weight % polyvinyl pyrrolidone ethanol solution were mixed, and then added with 0.5 g of water and 0.1 g of an aqueous 1 mol/liter hydrochloric acid solution with stirring. The resulting mixture was stirred for 24 hours, then cast on a glass plate and dried to obtain a thickness of 50 μm.
<Preparation of Comparative Film Substrate 10>
A 10 weight % methanol solution of polyvinyl acetate as a precursor of polyvinyl alcohol was prepared. The polyvinyl acetate methanol solution of 5 g and 5 g of a 10 weight % tetramethoxysilane methanol solution were mixed, and then added with 1.6 g of an aqueous 0.1 mol/liter hydrochloric acid solution. The resulting mixture was allowed to stand at 60° C. for 24 hours, cast on a glass plate, and dried to obtain a thickness of 50 μm.
<Preparation of Comparative Film Substrate 11>
Sumilight FS-1300 produced by Sumitomo Bakelite Co., Ltd., a polyethersulfone film with a thickness of 50 μm, was designated as comparative film substrate 11.
<Preparation of Comparative Film Substrate 12>
Pureace produced by Teijin Co., Ltd., a polycarbonate film with a thickness of 100 μm, was designated as comparative film substrate 12.
<Preparation of Film Substrate 13 of the Invention>
Titanium tetraisopropoxide of 4.26 g was dissolved in 4 g of tetrahydrofuran. The resulting solution was mixed with stirring to 48.0 g of a 10 weight % cellulose acetate propionate 2-methoxyethanol solution maintained at 50° C. The resulting mixture solution was stirred at 25° C. for 8 hours, and then cast on a glass plate and dried to obtain a thickness of 50 μm. The cellulose acetate propionate used for preparation of film substrate 13 above had a number average molecular weight of 100,000, an acetyl substitution degree of 2.00, and a propionyl substitution degree of 0.80.
Inventive film substrates 1 through 8, inventive film substrate 13 and comparative film substrates 9 through 12 prepared above were evaluated for light (visible) transmittance, haze, moisture permeability, and retardation. The light (visible) transmittance and haze were measured through a TUEBIDITY METER T-2600DA produced by Tokyo Denshoku Co., Ltd. Birefringence was measured through an automatic birefringence meter KOBRA-21ADH, produced by Oji Keisoku Kiki Co., Ltd., and the retardation was represented as the product of the thickness (nm) of a film substrate and the difference between the refractive index in an X direction and the refractive index in a Y direction perpendicular to the X direction, each direction being within the plane of the substrate. The moisture permeability was measured according to a method described in JIS-Z-0208. The results are shown in Table 1.
TABLE 1 | |||||
Light | Moisture | Re- | |||
Substrate | transmittance | Haze | permeability | tardation | |
No. | (%) | (%) | (g/m2 · 24 hr) | (nm) | Remarks |
1 | 93.1 | 0.1 | 130 | 7 | Inv. |
2 | 93.1 | 0.1 | 121 | 7 | Inv. |
3 | 93.0 | 0.1 | 118 | 7 | Inv. |
4 | 93.0 | 0.1 | 115 | 8 | Inv. |
5 | 93.0 | 0.1 | 114 | 8 | Inv. |
6 | 92.8 | 0.1 | 112 | 8 | Inv. |
7 | 92.8 | 0.1 | 107 | 7 | Inv. |
8 | 93.0 | 0.1 | 103 | 8 | Inv. |
9 | 93.3 | 0.2 | 233 | 8 | Comp. |
10 | 93.2 | 0.1 | 202 | 7 | Comp. |
11 | 88.0 | 0.1 | 208 | 13 | Comp. |
12 | 90.0 | 0.1 | 164 | 41 | Comp. |
13 | 93.0 | 0.1 | 135 | 8 | Inv. |
Inv.: Inventive, | |||||
Comp. Comparative |
As is apparent from Table 1 above, comparative substrate Nos. 9, 10, 11 and 12 provided high moisture permeability, and comparative substrate Nos. 11 and 12 provided high birefringence, resulting in undesirable results. On the other hand, inventive substrates Nos. 1 through 8, and inventive substrate No. 13 provided high transparency, low moisture permeability, and low retardation, resulting in good results.
A 60 nm film was formed on both sides of inventive substrates Nos. 1 through 8 and comparative substrates Nos. 9 through 12, setting SiO1/2 as a target, employing a magnetron sputtering apparatus. Thus, two substrate samples of a 100 mm×100 mm size per each substrate were prepared. On an area of 72 mm×72 mm of one substrate sample was formed a 150 nm thick ITO (indium tin oxide) layer having a 4.5 mm pitch (4.0 mm of a solid line width and 0.5 mm of a gap) in the form of stripe. Each of the thus prepared samples was subjected to ultrasonic washing with isopropyl alcohol, dried with dried nitrogen gas, and then cleaned for 5 minutes employing UV light and ozone. Thereafter, a positive hole injection layer through an electron injection layer were formed on the ITO layer through a mask capable of providing a solid layer with an area of 72 mm×72 mm. That is, the sample was fixed on a holder of a vacuum evaporation apparatus. Further, 200 mg of N,N′-diphenyl-N,N′-bis(3-methylphenyl)-[1,1′-biphenyl]-4,4′-diamine (TPD) were placed in a first molybdenum resistive heating boat, 200 mg of 4,4′-bis(2,2′-diphenylvinyl)biphenyl(DPVBi) were placed in a second molybdenum resistive heating boat, 200 mg of OXD-7 (described below) were placed in a third molybdenum resistive heating boat, and the boats were placed in the vacuum evaporation apparatus.
Then, the pressure in the vacuum tank was reduced to 4×10−4 Pa. The heating boat carrying TPD was heated by applying an electric current to evaporate TDP on the sample at an evaporation rate of from 0.1 to 0.3 nm/sec and to form a positive hole injection layer with a thickness of 60 nm on the ITO layer. Then, the heating boat carrying DPVBi was heated to 220° C. by applying an electric current to evaporate DPVBi on the positive hole injection layer at an evaporation rate of from 0.1 to 0.3 nm/sec and to form a light emission layer with a thickness of 40 nm. Further, the heating boat carrying OXD-7 was heated by applying an electric current to evaporate OXD-7 on the light emission layer at an evaporation rate of 0.1 nm/sec, and to form an electron injection layer with a thickness of 20 nm. Temperature of the sample during evaporation was room temperature.
Next, the vacuum tank was opened, and a mask was brought into close contact with the electron injection layer at the portion corresponding to the area described above of 72 mm×72 mm to form a film having a 1.5 mm pitch (a solid line width of 1.4 and a gap of 0.1 mm) in the form of stripe. Thereafter, magnesium was placed in the molybdenum heating boat and silver was placed in the tungsten evaporation basket. Then, the pressure in the vacuum tank was reduced to 2×10−4 Pa, and magnesium was evaporated at an evaporation rate of from 1.5 to 2.0 nm/sec by applying an electric current to the boat carrying the magnesium. At the same time the basket carrying the silver was heated so that the silver was evaporated at an evaporation rate of 0.1 nm/sec. Thus, a counter electrode composed of a mixture of magnesium and silver was formed. Herein, the mask was brought into close contact with the electron injection layer so that the counter electrode and the transparent electrode crossed and a terminal of each electrode was open. Next, a two-liquid type epoxy adhesive (Araldide, produced by Ciba Geigy Co., Ltd.) was coated through a dispenser at a line width of 1 mm on the perimeter of the area of 72 mm×72 mm in which the counter electrode and ITO electrode crossed. The other substrate sample was laminated onto the resulting coated substrate at a nitrogen atmosphere, and the adhesive was hardened to obtain an organic EL displaying element.
A polarizing plate and a ¼λ plate was laminated on the outer surface of the film substrate with an anode (ITO) of the resulting organic EL displaying element. A direct current of 10 V was applied under atmospheric pressure to the resulting element, and the half life of luminance was measured. The half life of luminance was represented by a relative value when the half life of luminance of a comparative organic EL displaying element prepared employing comparative film substrate 12 was set at 100. The results are shown in Table 2.
TABLE 2 | ||
Half life of luminance | ||
(relative value) | ||
Organic EL element employing | 164 | ||
inventive film substrate 1 | |||
Organic EL element employing | 175 | ||
inventive film substrate 2 | |||
Organic EL element employing | 179 | ||
inventive film substrate 3 | |||
Organic EL element employing | 188 | ||
inventive film substrate 4 | |||
Organic EL element employing | 189 | ||
inventive film substrate 5 | |||
Organic EL element employing | 202 | ||
inventive film substrate 6 | |||
Organic EL element employing | 210 | ||
inventive film substrate 7 | |||
Organic EL element employing | 216 | ||
inventive film substrate 8 | |||
Organic EL element employing | 62 | ||
comparative film substrate 9 | |||
Organic EL element employing | 51 | ||
comparative film substrate 10 | |||
Organic EL element employing | 72 | ||
comparative film substrate 11 | |||
Organic EL element employing | 100 | ||
comparative film substrate 12 | |||
Further, contrast of each of the resulting organic EL displaying elements was visually observed and evaluated. As a result, organic EL element employing comparative film substrates 9, 10, 11 and 12 provided low contrast, resulting in undesirable results. On the other hand, organic EL displaying element employing inventive film substrates 1 through 8 provided high contrast, resulting in good results.
As is apparent from Table 2 and the contrast evaluation, organic EL displaying elements employing the film substrate of the invention have long life and high contrast. Accordingly, the film substrate of the invention has proved to be an excellent film substrate for an organic EL displaying element.
The polarizing plate used in a color liquid crystal display VL-1530S produced by Fujitsu Co., Ltd. was peeled from the liquid crystal cell. Subsequently, each of inventive film substrates 1 to 8 and comparative film substrates 9 to 12 were laminated on the liquid crystal cell, and further, the peeled polarizing plate were again laminated on the film substrate. The resulting laminate was installed in the color liquid crystal display, and color deviation thereof was compared with that of the display without the film substrate. Comparative film substrates 9 to 12 provided an increased color deviation, resulting in undesirable results. On the other hand, inventive film substrates 1 to 8 provided a reduced color deviation, resulting in good results.
<Preparation of Film Substrate 21 of the Invention>
Tetraethoxysilane of 29.2 g and 10.8 g of methyltriethoxysilane were dissolved in 29.2 g of ethanol, and added with 29.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 348.2 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, and filtered with Azumi filter paper No. 244 produced by Azumi Roshi Co., Ltd. to obtain a dope 21. The cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 2.00, and a propionyl substitution degree of 0.8.
The resultant dope 21 was cast onto a stainless steel belt in the loop form at 25° C. The cast dope was dried for two minutes on the stainless steel belt whose reverse side was brought into contact with 40° C. water, while 40° C. air was applied, then cooled for 15 seconds on the stainless steel belt whose reverse side was brought into contact with 15° C. cooled water, and peeled from the belt to obtain a web. The amount of the residual solvent in the web was 40% by weight. Thereafter, the both edges of the peeled web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.05 at 90° C. by changing the interval of the clips in the transverse direction. After that, the stretched web was dried at 125° C. for 10 minutes while transporting with the rollers in a drying zone. Thus, a film substrate 21 (inventive) with a thickness of 80 μm and a width of 1.3 m was obtained.
<Preparation of Film Substrate 22 of the Invention>
Tetraethoxysilane of 29.2 g, 5.4 g of methyltriethoxysilane and 2.4 g of (3-glycidoxypropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 331.7 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, and filtered with Azumi filter paper No. 244 produced by Azumi Roshi Co., Ltd. to obtain a dope 22. The cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 1.9, and a propionyl substitution degree of 0.7.
The resultant dope 22 was cast onto a stainless steel belt in the loop form at 25° C. The cast dope was dried for two minutes on the stainless steel belt whose reverse side was brought into contact with 40° C. water, then cooled for 15 seconds on the stainless steel belt whose reverse side was brought into contact with 15° C. cooled water, and then peeled from the belt to obtain a web. The amount of the residual solvent in the peeled web was 40% by weight. Thereafter, the both edges of the peeled web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.03 at 90° C. by changing the interval of the clips in the transverse direction. After that, the stretched web was dried at 130° C. for 10 minutes while transporting with the rollers in a drying zone. Thus, a film substrate 22 (inventive) with a thickness of 80 μm and a width of 1.3 m was obtained.
<Preparation of Film Substrate 23 of the Invention>
Tetraethoxysilane of 29.2 g, 5.4 g of methyltriethoxysilane and 3.0 g of dimethyldiethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 331.1 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, and filtered to obtain a dope 23. The cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 2.0, and a propionyl substitution degree of 0.8.
The resultant dope 23 was cast onto a stainless steel belt in the loop form at 25° C. The cast dope was dried for two minutes on the stainless steel belt whose reverse side was brought into contact with 40° C. water, then cooled for 15 seconds on the belt whose reverse side was brought into contact with 15° C. cooled water, and then peeled from the belt to obtain a web. The amount of the residual solvent in the peeled web was 40% by weight. Thereafter, the both edges of the peeled web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.05 at 90° C. by changing the interval of the clips in the transverse direction. After that, the stretched web was dried at 120° C. for 15 minutes while transporting with the rollers in a drying zone. Thus, a film substrate 23 (inventive) with a thickness of 80 μm and a width of 1.3 m was obtained.
<Preparation of Film Substrate 24 of the Invention>
Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane and 7.3 g of diphenyldimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, and filtered with Azumi filter paper No. 244 produced by Azumi Roshi Co., Ltd. to obtain a dope 24. The cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 1.8, and a propionyl substitution degree of 0.6.
The resultant dope 24 was cast onto a stainless steel belt in the loop form at 30° C. The cast dope was dried for one minute on the stainless steel belt whose reverse side was heated with 45° C. air, while 55° C. air was applied from the cast dope side, then cooled for 15 seconds on the belt whose reverse side was brought into contact with 15° C. cooled water, and then peeled from the belt to obtain a web. The amount of the residual solvent in the peeled web was 80% by weight. The resulting web was transported with the rollers in a drying zone maintained at 80° C. Thereafter, the both edges of the web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.07 at 90° C. by changing the interval of the clips in the transverse direction. After that, the stretched web was dried at 125° C. for 10 minutes while transporting with the rollers. Thus, a film substrate 24 (inventive) with a thickness of 80 μm and a width of 1.3 m was obtained.
<Preparation of Film Substrate 25 of the Invention>
Tetraethoxysilane of 29.2 g, 3.6 g of methyltriethoxysilane, 3.0 g of dimethyldiethoxysilane and 2.2 g of (3,3,3-trifluoropropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 333.1 g of a 14.29 weight % cellulose acetate acetone solution maintained at 50° C. with stirring. The resulting solution was refluxed for 2 hours, and filtered with Azumi filter paper No. 244 produced by Azumi Roshi Co., Ltd. to obtain a dope 25. The cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 2.5.
The resultant dope 25 was cast onto a stainless steel belt in the loop form at 30° C. The cast dope was dried for 90 seconds on the stainless steel belt whose reverse side was heated with 43° C. air, while 50° C. air was applied from the cast dope side, then cooled for 10 seconds on the belt whose reverse side was brought into contact with 12° C. cooled water, and then peeled from the belt to obtain a web. The amount of the residual solvent in the peeled web was 70% by weight. The resulting web was transported with the rollers in a drying zone maintained at 80° C. Thereafter, the both edges of the web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.06 at 90° C. by changing the interval of the clips in the transverse direction. After that, the stretched web was dried at 120° C. for 15 minutes while transporting with the rollers. Thus, a film substrate 25 (inventive) with a thickness of 80 μm and a width of 1.3 m was obtained.
<Preparation of Film Substrate 26 of the Invention>
Tetraethoxysilane of 29.2 g, 7.2 g of phenyltriethoxysilane, 4.9 g of diphenyldimethoxysilane and 2.2 g of (3,3,3-trifluoropropyl)trimethoxysilane were dissolved in 29.2 g of ethanol, and added with 25.2 g of an aqueous 0.63 weight % hydrochloric acid solution with stirring. Ten minutes after the addition, the resulting mixture was added to 509.4 g of a 14.29 weight % cellulose acetate propionate acetone solution maintained at 50° C. with stirring. Five hours after, the resulting solution was filtered with Azumi filter paper No. 244 produced by Azumi Roshi Co., Ltd. to obtain a dope 26. The cellulose acetate propionate used here had a number average molecular weight of 100,000, an acetyl substitution degree of 1.8, and a propionyl substitution degree of 0.8.
The resultant dope 26 was cast onto a stainless steel belt in the loop form at 30° C. The cast dope was dried for 90 seconds on the stainless steel belt whose reverse side was heated with 55° C. air, while 60° C. air was applied from the cast dope side, cooled for 10 seconds on the belt whose reverse side was brought into contact with 12° C. cooled water, and then peeled from the belt to obtain a web. The amount of the residual solvent in the peeled web was 40% by weight. The resulting web was transported with the rollers in a drying zone maintained at 80° C. Thereafter, the both edges of the web were held with clips employing a tenter, and the web was stretched in the transverse direction by a factor of 1.06 at 90° C. by changing the interval of the clips in the transverse direction. After that, the stretched web was dried at 125° C. for 15 minutes while transporting with the rollers. Thus, a film substrate 26 (inventive) with a thickness of 80 μm and a width of 1.3 m was obtained.
<Preparation of Film Substrate 27 (Comparative)>
A film substrate 27 (comparative) was prepared in the same manner as in film substrate 21 above, except that the following dope A was used instead of dope 21.
Dope A |
Cellulose acetate propionate | 81 | g | ||
(number average molecular weight: 100,000; | ||||
Acetyl substitution degree: 2.0; | ||||
propionyl substitution degree: 0.8) | ||||
Triphenyl phosphate | 9 | g | ||
Acetone | 360 | g | ||
<Preparation of Film Substrate 28 (Comparative)>
A film substrate 28 (comparative) was prepared in the same manner as in film substrate 21 above, except that the following dope B was used instead of dope 21.
Dope B |
Cellulose acetate propionate | 90 g | ||
(number average molecular weight: 100,000; | |||
Acetyl substitution degree: 2.0; | |||
propionyl substitution degree: 0.8) | |||
Acetone | 360 g | ||
Inventive film substrates 21 through 26, and comparative film substrates 27 and 28 prepared above were evaluated for light (visible) transmittance, haze, moisture permeability, and retardation. The light (visible) transmittance and haze were measured through a TURBIDITY METER T-2600DA produced by Tokyo Denshoku Co., Ltd. The substrates were measured through an automatic birefringence meter KOBRA-21ADH, produced by Oji Keisoku Kiki Co., Ltd., and retardation (R0) within the planes was computed from measurement of the three dimensional refractive indices. The moisture permeability was measured according to a method described in JIS-Z-0208. The center line average surface roughness Ra of the substrates was measured through an optical interference surface roughness meter (produced by WYKO Co., Ltd.). The results are shown in Table 3.
TABLE 3 | ||||||
Sub- | Moisture | Light | ||||
strate | R0 | permeability | Haze | transmittance | Ra | |
No. | (nm) | (g/m2 · 24 hr) | (%) | (%) | (μm) | Remarks |
21 | 0 | 88 | 0.0 | 93 | 0.01 | Inv. |
22 | 2 | 80 | 0.0 | 93 | 0.01 | Inv. |
23 | 1 | 76 | 0.0 | 93 | 0.01 | Inv. |
24 | 2 | 89 | 0.0 | 93 | 0.01 | Inv. |
25 | 1 | 95 | 0.0 | 93 | 0.01 | Inv. |
26 | 1 | 75 | 0.0 | 93 | 0.01 | Inv. |
27 | 5 | 195 | 0.1 | 92 | 0.02 | Comp. |
28 | 3 | 340 | 0.1 | 92 | 0.02 | Comp. |
Inv.: Inventive, | ||||||
Comp. Comparative |
As is apparent from Table 3 above, comparative substrate Nos. 27 and 28 provided high moisture permeability. In contrast, inventive substrates Nos. 21 through 26 provided low moisture permeability, good optical properties, and good surface roughness.
The present invention can provide a film substrate with high transparency, low moisture permeability and low retardation for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery. The present invention can provide a film substrate for an electronic displaying element, an electronic optical element, a touch panel, or a solar battery, which is suitable for a displaying element employing a birefringence image displaying method. Further, the present invention can provide a film substrate for an electronic displaying element, giving an organic EL displaying element with a long life and high contrast. Furthermore, the present invention can provide a film substrate for an electronic displaying element with a reduced color deviation in a liquid crystal display employing a birefringence image displaying method.
Claims (11)
1. A film substrate having a thickness of 30 to 500 μm, prepared by a process comprising steps of:
a) preparing a mixture solution by mixing an organic polymer, which has water solubility of 0 to 5 g based on 100 g of 25 C water and has acetone solubility of 25 to 100 g based on 100 g of 25° C. acetone, and a reactive metal compound under a reaction accelerating condition, so as to form a condensation polymer from said reactive metal compound and a polymer hybrid from said organic polymer and said condensation polymer;
b) casting the mixture solution on a substrate;
c) drying the mixture solution on the substrate to obtain a web; and
d) stretching the web to obtain the film substrate having the thickness of 30 to 500 μm.
2. The film substrate of claim 1 , wherein the organic polymer is a cellulose ester having an acyl group having 2 to 4 carbon atoms as its ester group.
3. The film substrate of claim 2 , wherein the cellulose ester is cellulose acetate propionate.
4. The film substrate of claim 1 , wherein the metal of the reactive metal compound is a tetravalent metal.
5. The film substrate of claim 4 , wherein the tetravalent metal is selected from the group consisting of silicon, zirconium, titanium and germanium.
6. The film substrate of claim 1 , wherein the condensation polymer comprises in the chemical structure a monomer unit derived from a compound represented by formula (8)
(Rf)nSi(X1)4-n Formula (8)
(Rf)nSi(X1)4-n Formula (8)
wherein Rf represents an alkyl group having a fluorine atom or an aryl group having a fluorine atom; X1 represents a group capable of being hydrolyzed; and n represents an integer of 1 to 3.
7. The film substrate of claim 1 , wherein the film substrate further contains an alkali metal in an amount of zero to less than 5,000 ppm by weight based on the weight of the substrate.
8. The film substrate of claim 1 , wherein the film substrate is a substrate for an organic EL displaying element.
9. The film substrate of claim 1 , wherein the film substrate is a substrate for an organic EL displaying element, and the organic polymer has positive wavelength dispersion property.
10. The film substrate of claim 1 , wherein the film substrate is a substrate for a liquid crystal displaying element.
11. The film substrate of claim 1 , wherein the reactive metal compound is at least one pair of a reactive metal compound having two substituents capable of being hydrolyzed per one metal atom and a reactive metal compound having three substituents capable of being hydrolyzed per one metal atom.
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JP2002194228A (en) * | 2000-12-25 | 2002-07-10 | Konica Corp | Circuit board film and method of its manufacture |
TWI287559B (en) | 2002-08-22 | 2007-10-01 | Konica Corp | Organic-inorganic hybrid film, its manufacturing method, optical film, and polarizing film |
JP4232465B2 (en) * | 2003-01-24 | 2009-03-04 | コニカミノルタホールディングス株式会社 | Method for producing organic-inorganic hybrid film |
US7323530B2 (en) * | 2003-01-27 | 2008-01-29 | Konica Minolta Holdings, Inc. | Transparent resin film, its manufacturing method, electronic display, liquid crystal display, organic EL display, and touch panel |
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US7820255B2 (en) * | 2003-05-29 | 2010-10-26 | Konica Minolta Holdings, Inc. | Transparent film for display substrate, display substrate using the film and method of manufacturing the same, liquid crystal display, organic electroluminescence display, and touch panel |
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US8477102B2 (en) * | 2006-03-22 | 2013-07-02 | Eastman Kodak Company | Increasing conductive polymer life by reversing voltage |
JP5275589B2 (en) | 2007-08-02 | 2013-08-28 | 日本曹達株式会社 | Silsesquioxane-containing composition and silsesquioxane-containing hydroxyalkyl cellulose resin composition |
FR2969312B1 (en) * | 2010-12-20 | 2013-01-18 | Rhodia Acetow Gmbh | PHOTOVOLTAIC MODULE |
JPWO2015166764A1 (en) * | 2014-04-28 | 2017-04-20 | コニカミノルタ株式会社 | Light extraction laminate, organic electroluminescence device and method for producing the same |
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2006
- 2006-03-30 US US11/394,009 patent/US7348063B2/en not_active Expired - Lifetime
Patent Citations (1)
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US7141304B2 (en) * | 2000-12-25 | 2006-11-28 | Konica Corporation | Film substrate and its manufacturing method |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070066022A1 (en) * | 2005-09-22 | 2007-03-22 | Neng-Kuo Chen | Method of fabricating silicon nitride layer and method of fabricating semiconductor device |
US7544603B2 (en) * | 2005-09-22 | 2009-06-09 | United Microelectronics Corp. | Method of fabricating silicon nitride layer and method of fabricating semiconductor device |
Also Published As
Publication number | Publication date |
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US7141304B2 (en) | 2006-11-28 |
JP2002194228A (en) | 2002-07-10 |
US20060167201A1 (en) | 2006-07-27 |
US20020123209A1 (en) | 2002-09-05 |
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