US7172975B2 - Process for the wet chemical treatment of semiconductor wafers - Google Patents
Process for the wet chemical treatment of semiconductor wafers Download PDFInfo
- Publication number
- US7172975B2 US7172975B2 US09/425,694 US42569499A US7172975B2 US 7172975 B2 US7172975 B2 US 7172975B2 US 42569499 A US42569499 A US 42569499A US 7172975 B2 US7172975 B2 US 7172975B2
- Authority
- US
- United States
- Prior art keywords
- treatment
- semiconductor wafers
- optionally
- bath
- aqueous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime, expires
Links
- 238000011282 treatment Methods 0.000 title claims abstract description 95
- 239000004065 semiconductor Substances 0.000 title claims abstract description 44
- 235000012431 wafers Nutrition 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 title claims abstract description 21
- 239000000126 substance Substances 0.000 title claims abstract description 12
- 239000007788 liquid Substances 0.000 claims abstract description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000004094 surface-active agent Substances 0.000 claims description 9
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 7
- 239000013505 freshwater Substances 0.000 claims description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims 4
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 238000012163 sequencing technique Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
Definitions
- the present invention relates to a process for the wet chemical treatment of semiconductor wafers, in which the semiconductor wafers are treated with treatment liquids, in particular a process for the cleaning of silicon semiconductor wafers.
- the above object is achieved according to the present invention by providing a process for the wet chemical treatment of semiconductor wafers, in which the semiconductor wafers are treated with treatment liquids, wherein the semiconductor wafers are firstly treated with an aqueous HF solution, then with an aqueous O 3 solution and finally with water or an aqueous HCl solution, these treatments forming a treatment sequence.
- this treatment sequence which does not need to be interrupted by rinsing with water or another treatment liquid and is carried out exclusively at a pH which is lower than pH 7.
- the treatment according to the invention with the treatment liquids indicated is performed in treatment baths. It is preferable to circulate the treatment liquid, that is to take some of this liquid from the corresponding treatment bath and return it back after having been filtered. This saves on outlay for the required chemicals and for deionized water.
- the addition of fresh water or other liquids to the treatment baths is to be avoided since, when valves are opened, pressure impulses are created and particles can be introduced into the treatment baths.
- the treatment according to the invention is therefore different from a rinsing treatment, in which fresh treatment liquid is supplied continuously or at intervals.
- the treatments include treating the semiconductor wafers firstly in a bath with an aqueous HF solution, then in a bath with an aqueous O 3 solution and finally in a bath with water or an aqueous HCl solution, form a treatment sequence B 2
- Sequence B 2 may be preceded by a treatment B 1 of the semiconductor wafers in a bath with an aqueous SC1 solution.
- the treatment sequence B 2 may also be followed by a treatment B 3 of drying the semiconductor wafers.
- the drying treatment is preferably carried out using the centrifugal, hot water, isopropanol or marangoni principle.
- the aqueous HF solution used in the treatment sequence B 2 preferably contains HF in a concentration of from 0.001% to 2% by weight and optionally HCl in a concentration of up to 2% by weight and optionally a surfactant.
- a mixture of alkylbenzenesulfonate and fatty amine polyglycol ethers in a concentration of 0.001% to 2% by weight is particularly preferred as a surfactant additive.
- the aqueous O 3 solution used in the treatment sequence B 2 preferably contains O 3 in a concentration of from 1 to 30 ppm and optionally HF in a concentration of from 0.0001% to 2% by weight and is optionally exposed to megasonic waves.
- the liquid used last in the treatment sequence B 2 is water or an aqueous HCl solution, which preferably contains HCl in a concentration of from 0.001% to 10% by weight.
- the liquid may optionally contain O 3 and optionally be exposed to megasonic waves.
- the temperature of the bath is preferably at a temperature of from room temperature to 80° C.
- the example (B) comprised the treatment sequence: HF bath, deionized water/ozone bath, HCl bath with megasonic exposure.
- (C1) comprised the treatment sequence: HF bath, deionized water/ozone bath, rinsing with deionized water outside the bath.
- (C2) comprised the treatment sequence: HF bath, deionized water/ozone bath with subsequent rinsing using deionized water in the bath and megasonic exposure.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
Abstract
A process for the wet chemical treatment of semiconductor wafers, in which the semiconductor wafers are treated with treatment liquids, has the semiconductor wafers firstly treated with an aqueous HF solution, then treated with an aqueous O3 solution and finally treated with water or an aqueous HCl solution, these treatments forming a treatment sequence.
Description
1. Field of the Invention
The present invention relates to a process for the wet chemical treatment of semiconductor wafers, in which the semiconductor wafers are treated with treatment liquids, in particular a process for the cleaning of silicon semiconductor wafers.
2. The Prior Art
A treatment process of this type has been described, for example, by M. Meuris et al. in Solid State Technology, July 1995, p. 109.
It is an object of the present invention to provide a process by which metallic impurities and particles can be removed particularly effectively from semiconductor wafers.
The above object is achieved according to the present invention by providing a process for the wet chemical treatment of semiconductor wafers, in which the semiconductor wafers are treated with treatment liquids, wherein the semiconductor wafers are firstly treated with an aqueous HF solution, then with an aqueous O3 solution and finally with water or an aqueous HCl solution, these treatments forming a treatment sequence.
It has been found that the object is achieved by this treatment sequence, which does not need to be interrupted by rinsing with water or another treatment liquid and is carried out exclusively at a pH which is lower than pH 7. The treatment according to the invention with the treatment liquids indicated is performed in treatment baths. It is preferable to circulate the treatment liquid, that is to take some of this liquid from the corresponding treatment bath and return it back after having been filtered. This saves on outlay for the required chemicals and for deionized water. The addition of fresh water or other liquids to the treatment baths is to be avoided since, when valves are opened, pressure impulses are created and particles can be introduced into the treatment baths. The treatment according to the invention is therefore different from a rinsing treatment, in which fresh treatment liquid is supplied continuously or at intervals.
The treatments include treating the semiconductor wafers firstly in a bath with an aqueous HF solution, then in a bath with an aqueous O3 solution and finally in a bath with water or an aqueous HCl solution, form a treatment sequence B2 Sequence B2 may be preceded by a treatment B1 of the semiconductor wafers in a bath with an aqueous SC1 solution. An SC1 solution contains NH4OH and H2O2 or TMAH (=tetramethylammonium hydroxide) and H2O2 is preferred. The treatment sequence B2 may also be followed by a treatment B3 of drying the semiconductor wafers. The drying treatment is preferably carried out using the centrifugal, hot water, isopropanol or marangoni principle.
It is particularly preferable to arrange the sequencing of the treatment of the semiconductor wafers according to the term m*(B1+B2)+B3, with m being an integer number. The treatment B1 and the treatment sequence B2 are carried out in succession, and this takes place m times, before the drying treatment B3 is performed.
The aqueous HF solution used in the treatment sequence B2 preferably contains HF in a concentration of from 0.001% to 2% by weight and optionally HCl in a concentration of up to 2% by weight and optionally a surfactant. A mixture of alkylbenzenesulfonate and fatty amine polyglycol ethers in a concentration of 0.001% to 2% by weight is particularly preferred as a surfactant additive. The aqueous O3 solution used in the treatment sequence B2 preferably contains O3 in a concentration of from 1 to 30 ppm and optionally HF in a concentration of from 0.0001% to 2% by weight and is optionally exposed to megasonic waves. The liquid used last in the treatment sequence B2 is water or an aqueous HCl solution, which preferably contains HCl in a concentration of from 0.001% to 10% by weight. The liquid may optionally contain O3 and optionally be exposed to megasonic waves. The temperature of the bath is preferably at a temperature of from room temperature to 80° C.
All percents by weight are based upon the total solution weight.
Other objects and features of the present invention will become apparent from the following detailed description considered in connection with the accompanying examples which disclose embodiments of the present invention. It should be understood, however, that the examples are designed for the purpose of illustration only and not as a definition of the limits of the invention.
The comparison below of an invention example with comparative examples shows the advantageous effect of the present invention.
The table contains the results (3 sigma values) of conventional counts of particles of specific size (LPD=light point defects), which were in each case carried out on 20 polished semiconductor wafers after a wet chemical treatment sequence and drying which was the same for all the semiconductor wafers.
The example (B) comprised the treatment sequence: HF bath, deionized water/ozone bath, HCl bath with megasonic exposure.
(C1) comprised the treatment sequence: HF bath, deionized water/ozone bath, rinsing with deionized water outside the bath.
(C2) comprised the treatment sequence: HF bath, deionized water/ozone bath with subsequent rinsing using deionized water in the bath and megasonic exposure.
| Number | ||
| LPD (μM) | >0.3 | >0.2 | >0.16 | >0.12 | ||
| B | 3 | 7 | 30 | 480 | ||
| C1 | 4 | 13 | 50 | 550 | ||
| C2 | 10 | 50 | 140 | 550 | ||
Accordingly, while a few embodiments of the present invention have been shown and described, it is to be understood that many changes and modifications may be made thereunto without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (14)
1. A process for the wet chemical treatment of semiconductor wafers with treatment liquids in baths, consisting of the steps of
firstly treating the semiconductor wafers in a bath with an aqueous HF solution containing HF and optionally HCl and optionally a surfactant;
then treating the semiconductor wafers in a bath with an aqueous O3 solution containing O3 and optionally HF; and
then treating the semiconductor wafers in a bath with an aqueous HCl solution containing HCl and optionally O3;
whereby these treatment steps form a treatment sequence B2, which avoids rinsing with water or another treatment liquid and the addition of fresh water or other liquids to the treatment baths.
2. The process as claimed in claim 1 ,
wherein the treatment sequence B2 is preceded by a treatment B1 of the semiconductor wafers with an aqueous SC-1 solution.
3. The process as claimed in claim 2 ,
wherein in treatment B1 the aqueous SC-1 solution contains a liquid selected from the group consisting of NH4OH and H2O2, and TMAH (=tetramethylammonium hydroxide) and H2O2.
4. The process as claimed in claim 1 ,
wherein the treatment sequence B2 is followed by a treatment B3 comprising drying the semiconductor wafers.
5. The process as claimed in claim 4 ,
wherein the treatment of the semiconductor wafers is sequenced according to the term m* (B1+B2)+B3,
m being an integer number and the treatment B1 and the treatment sequence B2 being carried out in succession, and
this taking place m times, before the drying treatment B3 is performed.
6. The process as claimed in claim 4 ,
wherein the drying treatment is carried out using a step selected from the group consisting of centrifuging, using hot water, using isopropanol, and using marangoni principle.
7. The process as claimed claim 1 ,
wherein in treatment sequence B2, the aqueous HF solution contains HF in a concentration of from 0.001% to 2% by weight and optionally HCl in a concentration of up to 2% by weight and optionally a surfactant; and
wherein all percents by weight are based upon the total solution weight.
8. The process as claimed in claim 1 ,
wherein in treatment sequence B2, the aqueous O3 solution contains O3 in a concentration of from 1 ppm to 30 ppm and is optionally exposed to megasonic waves.
9. The process as claimed in claim 1 ,
wherein the treatment liquid used last in the treatment sequence B2 contains ozone and is optionally exposed to megasonic waves.
10. A process for the wet chemical treatment of semiconductor wafers with treatment liquids in baths, consisting of the steps of
firstly treating the semiconductor wafers in a bath with an aqueous HF solution containing HF and optionally HCl and optionally a surfactant;
then treating the semiconductor wafers in a bath with an aqueous O3 solution containing O3 and optionally HF; and
then treating the semiconductor wafers in a bath with an aqueous HCl solution containing HCl and optionally O3 with exposure to megasonic waves,
whereby these treatment steps form a treatment sequence B2, which avoids rinsing with water or another treatment liquid and the addition of fresh water or other liquids to the treatment baths.
11. A process for the wet chemical treatment of semiconductor wafers with treatment liquids in baths, comprising the steps of
firstly treating the semiconductor wafers in a bath with an aqueous HF solution containing HF and optionally HCl and optionally a surfactant;
then treating the semiconductor wafers in a bath with an aqueous O3 solution containing O3 and optionally HF; and
then treating the semiconductor wafers in a bath with an aqueous HCl solution containing HCl and optionally O3;
whereby these treatment steps form a treatment sequence B2; and
circulating the treatment liquids of said baths by taking a part from each of said baths, filtering and returning the part to the corresponding treatment bath.
12. A process for the wet chemical treatment of semiconductor wafers with treatment liquids in baths, comprising the steps of
firstly treating the semiconductor wafers in a bath with an aqueous HF solution containing HF and optionally HCl and optionally a surfactant;
then treating the semiconductor wafers in a bath with an aqueous O3 solution containing O3 and optionally HF; and
then treating the semiconductor wafers in a bath with an aqueous HCl solution containing HCl and optionally O3 with exposure to megasonic waves;
whereby these treatment steps form a treatment sequence B2; and
circulating the treatment liquids of said baths by taking a part from each of said baths, filtering and returning the part to the corresponding treatment bath.
13. A process for the wet chemical treatment of semiconductor wafers with treatment liquids in baths, comprising the steps of
firstly treating the semiconductor wafers in a bath with an aqueous HF solution containing HF and optionally HCl and optionally a surfactant;
then treating the semiconductor wafers in a bath with an aqueous O3 solution containing O3 and optionally HF; and
then treating the semiconductor wafers in a bath with an aqueous HCl solution containing HCl and optionally O3; and
circulating the treatment liquids of said baths by taking a part from each of said baths, filtering and returning the part to the corresponding treatment bath;
whereby these treatment steps form a treatment sequence B2, which avoids rinsing with water or another treatment liquid and the addition of fresh water or other liquids to the treatment baths.
14. A process for the wet chemical treatment of semiconductor wafers with treatment liquids in baths, comprising the steps of
firstly treating the semiconductor wafers in a bath with an aqueous HF solution containing HF and optionally HCl and optionally a surfactant;
then treating the semiconductor wafers in a bath with an aqueous O3 solution containing O3 and optionally HF; and
then treating the semiconductor wafers in a bath with an aqueous HCl solution containing HCl and optionally O3 with exposure to megasonic waves; and
circulating the treatment liquids of said baths by taking a part from each of said baths, filtering and returning the part to the corresponding treatment bath;
whereby these treatment steps form a treatment sequence B2, which avoids rinsing with water or another treatment liquid and the addition of fresh water or other liquids to the treatment baths.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19853486A DE19853486A1 (en) | 1998-11-19 | 1998-11-19 | Process for the wet chemical treatment of semiconductor wafers |
| DE198534868 | 1998-11-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20010003680A1 US20010003680A1 (en) | 2001-06-14 |
| US7172975B2 true US7172975B2 (en) | 2007-02-06 |
Family
ID=7888395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/425,694 Expired - Lifetime US7172975B2 (en) | 1998-11-19 | 1999-10-22 | Process for the wet chemical treatment of semiconductor wafers |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7172975B2 (en) |
| EP (1) | EP1005072B1 (en) |
| JP (1) | JP3181900B2 (en) |
| KR (1) | KR100351229B1 (en) |
| DE (2) | DE19853486A1 (en) |
| SG (1) | SG83159A1 (en) |
| TW (1) | TW444292B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1132951A1 (en) * | 2000-03-10 | 2001-09-12 | Lucent Technologies Inc. | Process of cleaning silicon prior to formation of the gate oxide |
| DE10036691A1 (en) * | 2000-07-27 | 2002-02-14 | Wacker Siltronic Halbleitermat | Process for the chemical treatment of semiconductor wafers |
| TW554258B (en) * | 2000-11-30 | 2003-09-21 | Tosoh Corp | Resist stripper |
| JP2003086554A (en) * | 2001-09-11 | 2003-03-20 | Mitsubishi Heavy Ind Ltd | Semiconductor substrate manufacturing apparatus and method therefor |
| DE10239773B3 (en) * | 2002-08-29 | 2004-02-26 | Wacker Siltronic Ag | Cleaning a semiconductor wafer comprises treating the wafer under megasound with an aqueous solution containing ozone, and treating the wafer with an aqueous solution containing hydrofluoric acid and hydrochloric acid |
| EP1408534B1 (en) * | 2002-10-11 | 2007-02-07 | S.O.I. Tec Silicon on Insulator Technologies S.A. | A method and a device for producing an adhesive surface of a substrate |
| FR2864457B1 (en) * | 2003-12-31 | 2006-12-08 | Commissariat Energie Atomique | METHOD OF WET CLEANING A SURFACE, IN PARTICULAR A MATERIAL OF SILICON GERMANIUM TYPE. |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5014737A (en) * | 1989-11-13 | 1991-05-14 | Allan Berman | Quartz integrated trough/sump recirculating filtered high-purity chemical bath |
| JPH0831837A (en) | 1994-07-12 | 1996-02-02 | Mitsubishi Materials Shilicon Corp | Deposition method of polysilicon for eg |
| EP0701275A2 (en) | 1994-08-26 | 1996-03-13 | MEMC Electronic Materials, Inc. | Pre-thermal treatment cleaning process |
| EP0731498A2 (en) | 1995-03-10 | 1996-09-11 | Kabushiki Kaisha Toshiba | Surface processing method and surface processing device for silicone substrates |
| EP0731495A2 (en) | 1995-03-10 | 1996-09-11 | ASTEC Halbleitertechnologie GmbH | Process and device for cleaning semiconductor wafers |
| US5593538A (en) * | 1995-09-29 | 1997-01-14 | Motorola, Inc. | Method for etching a dielectric layer on a semiconductor |
| EP0844650A2 (en) | 1996-11-15 | 1998-05-27 | MEMC Electronic Materials, Inc. | Method of etching SiO2 and process of cleaning silicon wafers using dilute chemical etchants and a megasonic field |
| EP0859404A2 (en) | 1997-01-16 | 1998-08-19 | Mitsubishi Materials Silicon Corporation | Washing solution of semiconductor substrate and washing method using the same |
| US5803980A (en) | 1996-10-04 | 1998-09-08 | Texas Instruments Incorporated | De-ionized water/ozone rinse post-hydrofluoric processing for the prevention of silicic acid residue |
| US6132522A (en) * | 1996-07-19 | 2000-10-17 | Cfmt, Inc. | Wet processing methods for the manufacture of electronic components using sequential chemical processing |
| US6273098B1 (en) * | 1997-11-24 | 2001-08-14 | Cypress Semiconductor Corporation | Extension of the useful life of a chemical bath used to process a substrate |
-
1998
- 1998-11-19 DE DE19853486A patent/DE19853486A1/en not_active Withdrawn
-
1999
- 1999-10-18 SG SG9905190A patent/SG83159A1/en unknown
- 1999-10-22 US US09/425,694 patent/US7172975B2/en not_active Expired - Lifetime
- 1999-10-28 DE DE59900712T patent/DE59900712D1/en not_active Expired - Lifetime
- 1999-10-28 EP EP99120902A patent/EP1005072B1/en not_active Expired - Lifetime
- 1999-11-15 KR KR1019990050533A patent/KR100351229B1/en active IP Right Grant
- 1999-11-16 JP JP32522899A patent/JP3181900B2/en not_active Expired - Lifetime
- 1999-11-18 TW TW088120123A patent/TW444292B/en not_active IP Right Cessation
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5014737A (en) * | 1989-11-13 | 1991-05-14 | Allan Berman | Quartz integrated trough/sump recirculating filtered high-purity chemical bath |
| JPH0831837A (en) | 1994-07-12 | 1996-02-02 | Mitsubishi Materials Shilicon Corp | Deposition method of polysilicon for eg |
| EP0701275A2 (en) | 1994-08-26 | 1996-03-13 | MEMC Electronic Materials, Inc. | Pre-thermal treatment cleaning process |
| EP0731498A2 (en) | 1995-03-10 | 1996-09-11 | Kabushiki Kaisha Toshiba | Surface processing method and surface processing device for silicone substrates |
| EP0731495A2 (en) | 1995-03-10 | 1996-09-11 | ASTEC Halbleitertechnologie GmbH | Process and device for cleaning semiconductor wafers |
| US5593538A (en) * | 1995-09-29 | 1997-01-14 | Motorola, Inc. | Method for etching a dielectric layer on a semiconductor |
| US6132522A (en) * | 1996-07-19 | 2000-10-17 | Cfmt, Inc. | Wet processing methods for the manufacture of electronic components using sequential chemical processing |
| US5803980A (en) | 1996-10-04 | 1998-09-08 | Texas Instruments Incorporated | De-ionized water/ozone rinse post-hydrofluoric processing for the prevention of silicic acid residue |
| EP0844650A2 (en) | 1996-11-15 | 1998-05-27 | MEMC Electronic Materials, Inc. | Method of etching SiO2 and process of cleaning silicon wafers using dilute chemical etchants and a megasonic field |
| EP0859404A2 (en) | 1997-01-16 | 1998-08-19 | Mitsubishi Materials Silicon Corporation | Washing solution of semiconductor substrate and washing method using the same |
| US6273098B1 (en) * | 1997-11-24 | 2001-08-14 | Cypress Semiconductor Corporation | Extension of the useful life of a chemical bath used to process a substrate |
Non-Patent Citations (6)
| Title |
|---|
| Abstract [1983:45 13 999] for Proceedings of the second Int. Symp. on Cleaning Techn. in Semiconductor Device Manufacturing, Electrochem. Soc., 1992 pp. 18-25. |
| Abstract for JP 4-26 120 A. |
| M. Meuris et al., Solid State Technologie, Jul. 95, p. 109. |
| Meuris M et al: "The IMEC Clean: A New Concept For Particle And Metal Removed On Si Surfaces", Solid State Technology, US, Cowan Publ. Corp. Washington vol. 38, No. 7, 1995, p. 109-110, 112, 114 XP 000523398, ISSN: 0038-111X, p. 110, L.5-44. |
| Patent Abstracts of Japan, vol. 1996, No. 06, Jun. 28, 1996 & JP 08031837A (Mitsubishi Materials Shilicon Corp; Others: 01), Feb. 2, 1996. |
| The English Derwent Abstract 1996-404246[41] corresp. to EP 0731495A2 is enclosed. |
Also Published As
| Publication number | Publication date |
|---|---|
| DE59900712D1 (en) | 2002-02-28 |
| EP1005072A1 (en) | 2000-05-31 |
| TW444292B (en) | 2001-07-01 |
| US20010003680A1 (en) | 2001-06-14 |
| KR20000035475A (en) | 2000-06-26 |
| SG83159A1 (en) | 2001-09-18 |
| JP2000164560A (en) | 2000-06-16 |
| EP1005072B1 (en) | 2002-01-02 |
| DE19853486A1 (en) | 2000-05-31 |
| JP3181900B2 (en) | 2001-07-03 |
| KR100351229B1 (en) | 2002-09-09 |
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