US69327A - Improved adjustable frame for stretching hides - Google Patents

Improved adjustable frame for stretching hides Download PDF

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US69327A
US69327A US69327DA US69327A US 69327 A US69327 A US 69327A US 69327D A US69327D A US 69327DA US 69327 A US69327 A US 69327A
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hide
und
hides
adjustable frame
stretching
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    • CCHEMISTRY; METALLURGY
    • C14SKINS; HIDES; PELTS; LEATHER
    • C14BMECHANICAL TREATMENT OR PROCESSING OF SKINS, HIDES OR LEATHER IN GENERAL; PELT-SHEARING MACHINES; INTESTINE-SPLITTING MACHINES
    • C14B1/00Manufacture of leather; Machines or devices therefor
    • C14B1/26Leather tensioning or stretching frames; Stretching-machines; Setting-out boards; Pasting boards

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Treatment And Processing Of Natural Fur Or Leather (AREA)

Description

- il r a nitth glatte gutem ffice.
WILLIAM DUNN, OF NEWARK, NEW JERSEY.
Lettera .Patent No. 69,827, dated October 1, 1867.
IMPBOVED ADJUSTABLE FRAME POB STRETUHING HIDES.
Be it known that I, WILLIAM DESS, of the city ol' Newark, in the county of Essex, and State of New Jersey, have invented a new und useful machine for stretching hides which I call An Improved Adjustable Frame for Stretching Hides," of which the following is a full, clear, and exact description, reference being had to the annexed drawings, making part hi' this speclication, of which Fignre 1 is a side view, and
Figure 2 un end view.
Fig. 1. A A is u stationary frame, on the top or hack of which the hide is thrown. B B, movable planks orl mfiles," to which the edges of hides are tacked on each side of the frame. These plnnks work independently of erich other, and each in one continuons piece,or divided in the centre and connected by a hinge, C. D D are lovers, and E chains or loops, by which the planks B B are drawn down, and the hide stretched when drawn down by the levers. F F are iron racks and stops, by which the planks B B nre held in place. fg are chain und books, which by the application of the lever D nt this point draw down and secure in position thc middle oi' planks B B, thus stretching the belly of the hide, which is the part susceptible of the greatest extension, to its utmost capacity without danger of bursting the other parts by too great n strain.
Fig. 2. A It is :m end view of the stationary frame. B B, ends oi"- movable planks or toggles." F F, iron racks and stops, hy which the planks B B are heid to places when drawn down by the lever G. G is the hide, which is laid over the top or hack of the stationary frame A A, and is tucked to the movable planks or toggles B B at bottom and ends. The dotted lines It h, in tig. 1, show the positions of the movable planks or toggles when the hide is irst tacked on; the dotted lines I I show their position when the hide is stretched. The toggles" on the ends oi' the stationary frame A A are worked hy tlie application of the lever, as shown on the drawing, and when drawn out are held in position by wedges set in between the back of the toggle" and the upright of the stationary frame.
The main object of the machine is to stretch hides which are to be enamelled for carriage-tops, die. The hide is tanned nml wet when put on the frame to be stretched and lei't to dry. Non' the nature of a hide is such that while some parts swell, (as the belly and ilonks,} and are susceptible of n great deal of stretch, other parts, (such as the hack and shonlders,) are susceptible of very little stretch, und hence the necessity of n machine which will graduate itself to some extent, nt least, to such parts in proportion to its stretching potter. The grentz ditiiculty in stretching hides is their liability to burst or tear in some places before the other parts are properly stretched, and this is sure to occur where the power is applied equally, or in one line, or with one motion, so that in those cases the hide has to he left but partinliy `-tched in some places, und when put on the ennmelling-frame those places will not he level but will packer up, to `ne great annoyance oi the workmen und detriment of the work. By examining the drawing which accompanies these specifications, it will be observed that one slide of the hide can he stretched more than the other if necessary, as is often the case, for the workmen seldom place tho hide accurately squure on the frame, nor is the hide ever exactly equal on both sides of the backbone. The movable planks or togglcs" working independently ofeach other, one side of thc hide can he stretched six, eight, or ten inches, and thc other, one, two, or three inches, or not :it all; or one end of euch side cnn he stretched and thc other not at nil, or the centres can be stretched without the ends, und, in n word, hy this invention the hide can he stretched in any way required with entire safety, nud without danger ol' bursting or tcnring.
I ,-iniln thntmy invention eoctnnily overcomes these objections. und stretches the hide to its fullest extent iii every part, und an experience of over thirty years in the leather business gives me reason to think that I judge correctly.
What I claim as my invention, und desire to secure by Letters lntent, is-
fl'he npplicntion oi' movnblc plunkn to u stationary freine in the manner set lnrth, und worked hy levers as shown, the planks divided in the middle und connected by n hinge, or nach plank in one continuous piece, und working independently nl' euch other, thus adjusting itscll' to the formation of the hide, und stretching nach part to its fullest capacity.
WiLhlAhi DUNN.
Wi messes:
J Ultounmz, Punten ltettv.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100176494A1 (en) * 2009-01-13 2010-07-15 Ming-Fa Chen Through-Silicon Via With Low-K Dielectric Liner

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100176494A1 (en) * 2009-01-13 2010-07-15 Ming-Fa Chen Through-Silicon Via With Low-K Dielectric Liner

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