US6087896A - Compensation technique using MOS capacitance - Google Patents
Compensation technique using MOS capacitance Download PDFInfo
- Publication number
- US6087896A US6087896A US09/163,789 US16378998A US6087896A US 6087896 A US6087896 A US 6087896A US 16378998 A US16378998 A US 16378998A US 6087896 A US6087896 A US 6087896A
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- United States
- Prior art keywords
- capacitance
- nfet
- pfet
- circuit
- voltage
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05F—SYSTEMS FOR REGULATING ELECTRIC OR MAGNETIC VARIABLES
- G05F3/00—Non-retroactive systems for regulating electric variables by using an uncontrolled element, or an uncontrolled combination of elements, such element or such combination having self-regulating properties
- G05F3/02—Regulating voltage or current
- G05F3/08—Regulating voltage or current wherein the variable is DC
- G05F3/10—Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics
- G05F3/16—Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics being semiconductor devices
- G05F3/20—Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics being semiconductor devices using diode- transistor combinations
- G05F3/24—Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics being semiconductor devices using diode- transistor combinations wherein the transistors are of the field-effect type only
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/14—Power supply arrangements, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels
- G11C5/147—Voltage reference generators, voltage or current regulators; Internally lowered supply levels; Compensation for voltage drops
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C7/00—Arrangements for writing information into, or reading information out from, a digital store
- G11C7/14—Dummy cell management; Sense reference voltage generators
Definitions
- the present invention relates generally to semiconductor devices.
- the present invention relates to a method of compensating a capacitance formed in an N-channel Field Effect Transistor (an "NFET").
- NFET Field Effect Transistor
- a reference voltage is often used to compare voltages, determine the state of a memory cell, perform analog to digital conversions, and the like.
- a stable reference voltage is therefore often crucial to the successful operation of many electronic circuits.
- E g fluctuates with temperature (as shown in FIG. 2), and is typically 1.12 eV for silicon (Si) and 1.42 eV for gallium arsenide (GaAs) at room temperature.
- a common approach at providing a compensating circuit is to utilize an NFET capacitor 14 in an operational amplifier ("op amp") portion 12 (i.e., the circuit components within the dashed line) of a reference voltage circuit 10.
- op amp operational amplifier
- the NFET capacitor 14 provides good voltage stability once steady state operations have been achieved, at power-up the capacitance of the NFET capacitor 14 can vary widely.
- the voltage of the reference circuit, which the NFET capacitor 14 is designed to compensate is often susceptible to large voltage swings, as shown by curve 18 in FIG. 4.
- it is common for improperly tuned reference voltage circuits to enter into an oscillating voltage pattern which impedes steady state operation of the circuit (as shown in the area 20 of FIG. 4).
- these voltage oscillations are induced by the parasitic capacitance present in other components used in the reference voltage circuit (including, for example, resistors 16 (as shown in FIG. 3)).
- a parasitic capacitance may arise in a resistor 16 in an integrated circuit because the resistor 16 is commonly formed from a diffusion, which has an associated parasitic capacitance.
- Capacitors and other electronic components are commonly formed from FETs using known processes, because using a FET is significantly less expensive.
- a FET component reduces the number of masks needed to produce an integrated circuit.
- resistors 16 are formed from a diffusion. When an inverse biased junction is applied across the resistor 16, a parasitic capacitance often arises. As a result, the parasitic capacitance of the resistors 16 (and other components) may induce a phase shift in the feedback loop of the reference circuit and may affect the stability of the reference voltage circuitry. Additionally, as shown in FIG. 4, the parasitic capacitance may result in a reference voltage which oscillates and never reaches a steady state value. Additionally, in the reference voltage circuitry 10, the NFET capacitor 14 is a low threshold voltage NFET.
- a low threshold voltage FET is utilized in the present application because the value of the capacitance for this particular FET starts to increase (i.e., ramp-up) when the voltage between nodes A and B is much lower. Since a low threshold voltage FET can only be built into the substrate of the FET, the substrate of the capacitor must be tied to ground. Thus, an NFET capacitor 14 must be utilized as the compensating capacitor.
- the use of FETs as capacitors often results in a capacitor with a varying capacitance.
- the capacitance may vary widely depending upon the voltage across the poles (for example, A and B of the NFET capacitor 14 shown in FIG. 3).
- the capacitance may vary significantly such that obtaining a steady state capacitance is delayed and often problematic.
- circuits are specifically designed with components operating within a predetermined range of values (capacitance, resistance, etc.). When the component's operating value (in this case the capacitance) fluctuates, the electronic circuit commonly will not perform as expected or as intended. Circuit designers require reliable components that operate within predetermined specifications. Hence, integrated circuit components which do not provide predictable and stable values, such as the NFET capacitor 14 in FIG. 3, must be improved.
- the present invention provides an electrical circuit which provides a stable capacitance over a range of voltages. More particularly, the present invention provides a stable capacitance over a wide range of voltages by using a low threshold voltage (i.e, less than 0.5 volts) NFET coupled to a PFET.
- a low threshold voltage i.e, less than 0.5 volts
- the preferred embodiment of the present invention provides a steady capacitance, and thus a steady reference voltage in the form of a back-up capacitor, a PFET.
- the PFET is coupled to the input and outputs of an NFET capacitor such that when the NFET is receiving insufficient input voltage to provide the needed capacitance, the PFET is receiving sufficient input voltage, and vice versa.
- a compensating capacitance circuit is provided which enables sufficient capacitance to exist over a wider voltage range than is possible with solely an NFET capacitor. This greater capacitance range can be suitably used to stabilize the output voltage of a band-gap reference circuit.
- the present invention minimizes the effect of parasitic capacitances upon the output voltage of the band-gap reference circuit and thereby decreases and, in many cases, eliminates the effects of parasitic capacitance induced oscillations of the output voltage.
- FIG. 1 is a schematic representation of the energy gap between the conduction band and the valence band of a semiconductor substrate.
- FIG. 2 is a graphical representation of the variation of the band gap energy with temperature in silicon and gallium arsenide semiconductor substrates.
- FIG. 3 is schematic representation of a prior art band-gap reference voltage circuit.
- FIG. 4 is a graphical representation of the voltage versus time performance of the output voltage of the circuit shown in FIG. 3.
- FIG. 5a is an electrical schematic representation of an NFET capacitor.
- FIG. 5b is a cross-sectional view of an NFET capacitor.
- FIG. 6 is a graphical representation of the capacitance versus voltage characteristics of the NFET shown in FIGS. 5a and 5b.
- FIG. 7a is an electrical schematic representation of a PFET capacitor.
- FIG. 7b is a cross-sectional view of a PFET capacitor.
- FIG. 8 is a graphical representation of the capacitance versus voltage characteristics of the PFET shown in FIGS. 7a and 7b.
- FIG. 9 is an electrical schematic representation of an exemplary combination of an NFET capacitor and a PFET capacitor under a preferred embodiment of the present invention.
- FIG. 10 is a graphical representation of the capacitance versus voltage characteristics of the combined NFET and PFET capacitance circuit shown in FIG. 9.
- FIG. 11 is a graphical representation of the voltage versus time performance of an exemplary band-gap reference circuit utilizes a combination of an NFET capacitor and a PFET capacitor circuit to stabilize any oscillations that may arise under a preferred embodiment of the present invention.
- the present invention provides a compensating capacitance circuit which provides sufficient capacitance to enable a reference circuit to obtain steady state operations. More particularly, the present invention combines the performance of an NFET and a PFET capacitor in obtaining a resulting capacitance which is responsive to a wide range of input voltage levels. By combining the capacitance of an NFET and a PFET, the present invention diminishes the concern over parasitic capacitances which arise in many closed loop electronics architectures. Additionally, the present invention provides a predetermined capacitance to the op-amp in a band-gap reference circuit which requires a steady capacitance over a wide range of voltages.
- the present invention is described in the context of a band-gap reference, it is to be understood that the present invention is not to be so limited. Any transistorized circuit which requires a predetermined capacitance over a range of voltages may be accomplished by the present invention. Additionally, the present invention may be suitably associated with any capacitance value by utilizing known FET capacitor fabrication techniques. The known techniques for providing FET capacitors are beyond the scope of this description.
- an NFET capacitor 14 may be suitably provided by connecting an input lead 24 to the gate 26 of the NFET capacitor 14, grounding the substrate 30, and connecting the source 32 and drain 34 together to an output lead 36.
- This configuration results in two plates separated by an insulator 38, wherein the first plate is the gate 26 and the second plate is combination of the source 32, the drain 34, and the channel 40 formed between the source 32 and drain 34.
- the NFET capacitor 14 provided by the configuration shown in FIGS. 5a and 5b, suitably provides the capacitance versus voltage response characteristics shown in FIG. 6. As shown, the capacitance initially is very small, if not negligible, until the voltage across the NFET capacitor 14 reaches a threshold voltage V th . Commonly, the negligible capacitance value "C" is one-tenth the steady state capacitance value "D". Thus, a wide disparity in capacitances (and thus output voltages) may occur when an NFET alone is utilized as a compensator in low voltage devices. In a practical embodiment, the capacitance may be set at any desired value in relation to a threshold voltage using known processes. This description does not set forth such techniques, and merely uses the graphs of FIGS. 6, 8, and 10 as representative of the characteristics of NFET and PFET capacitors, and the combination thereof.
- a PFET capacitor 59 may be suitably configured by connecting the substrate 50, via lead 52, to the output lead 54.
- the gate 56 is connected to the input lead 58, and the source 60 and drain 62 are connected to the output lead 54.
- a channel 64 is formed between the source 60, the drain 62, and the substrate 50.
- the channel 64 is separated from the gate 56 by the isolator 66. Basically, this configuration utilizes the substrate 50 and the gate 56 as the plates of a capacitor. This configuration results in a capacitor which has the capacitance versus voltage response characteristics as shown in FIG. 8.
- the capacitance is nearly a constant value "E” across a wide range of voltages, dips briefly when the voltage across the PFET capacitor 59 approaches the threshold voltage "G" of the capacitor, and then returns to a constant capacitance "F” for higher voltages.
- the PFET capacitor 59 provides suitable steady-state capacitance at lower voltages, but dips at the threshold voltage.
- the fabrication of an actual PFET capacitor 59 is commonly known and will not be described herein.
- An architecture in accordance with the present invention suitably combines a low threshold voltage NFET capacitor 14 (as shown in FIG. 5) with a PFET capacitor 59 (as shown in FIG. 7) resulting in the combined capacitative circuit shown in FIG. 9.
- lead 72 which connects the capacitive compensation circuit to the remainder of the band-gap reference circuit
- lead 58 i.e., to the PFET capacitor 59
- lead 74 (which connects to the output of the band-gap reference circuit) is connected to lead 36 and lead 54.
- the capacitance versus voltage characteristics may be as shown in FIG. 10.
- the resulting capacitance "R” is the combined capacitive effect of the capacitances obtained separately by the NFET capacitor 14 and the PFET capacitor 59.
- “R” is typically greater than either “C” or “E” across the voltage range.
- the value of "R” can preferably be set to any desired value by properly sizing the PFET and the NFET capacitors.
- the threshold voltage of the combined circuit (as indicated by "H") is generally greater than the individual threshold voltages of the NFET capacitor 14 or the PFET capacitor 59.
- this circuit is constructed such that the resulting capacitance "R" is sufficient to compensate for voltage fluctuations present in the band-gap reference (due to insufficient voltage drop across the capacitor during power-up), and sufficient to obtain a substantially constant output reference voltage 90 in a relatively quick settling time 92, as shown in FIG. 11.
- the present invention provides a capacitive compensator in an op-amp for a band gap reference circuit which ensures a steady output voltage may be generated.
- the capacitance circuit of the present invention may be utilized in any electrical circuit which utilizes FETs as capacitors and desires a stable capacitance over a range of voltages.
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Radar, Positioning & Navigation (AREA)
- Automation & Control Theory (AREA)
- Control Of Electrical Variables (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims (13)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/163,789 US6087896A (en) | 1998-09-30 | 1998-09-30 | Compensation technique using MOS capacitance |
| PCT/US1999/019472 WO2000019434A1 (en) | 1998-09-30 | 1999-08-26 | Compensation technique using mos capacitance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/163,789 US6087896A (en) | 1998-09-30 | 1998-09-30 | Compensation technique using MOS capacitance |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US6087896A true US6087896A (en) | 2000-07-11 |
Family
ID=22591580
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/163,789 Expired - Lifetime US6087896A (en) | 1998-09-30 | 1998-09-30 | Compensation technique using MOS capacitance |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6087896A (en) |
| WO (1) | WO2000019434A1 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030231072A1 (en) * | 2002-05-30 | 2003-12-18 | International Business Machines Corporation | Voltage controlled oscillator circuit and method |
| US6838957B2 (en) * | 2000-12-21 | 2005-01-04 | Intel Corporation | Differential metal oxide semiconductor capacitor |
| US20060022745A1 (en) * | 2004-07-27 | 2006-02-02 | Kabushiki Kaisha Toshiba | Semiconductor integrated circuit device |
| US7724005B1 (en) * | 2007-07-24 | 2010-05-25 | Clemson University | High-frequency structures for nanoelectronics and molecular electronics |
| US20110037519A1 (en) * | 2009-08-14 | 2011-02-17 | Qualcomm Incorporated | Amplifier with variable matching circuit to improve linearity |
| US20140003162A1 (en) * | 2012-06-27 | 2014-01-02 | Samsung Electronics Co., Ltd. | Small signal receiver and integrated circuit including the same |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4937476A (en) * | 1988-06-16 | 1990-06-26 | Intel Corporation | Self-biased, high-gain differential amplifier with feedback |
| US5360989A (en) * | 1990-06-18 | 1994-11-01 | Kabushiki Kaisha Toshiba | MIS type capacitor having reduced change in capacitance when biased in forward and reverse directions |
| EP0720238A2 (en) * | 1994-12-31 | 1996-07-03 | Robert Bosch Gmbh | Circuit arrangement for reducing the voltage dependence of a MOS-capacitor |
| US5801412A (en) * | 1995-09-04 | 1998-09-01 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device having a capacitance element with excellent area efficiency |
| US5801411A (en) * | 1996-01-11 | 1998-09-01 | Dallas Semiconductor Corp. | Integrated capacitor with reduced voltage/temperature drift |
| US5900766A (en) * | 1997-07-11 | 1999-05-04 | Hewlett-Packard Company | Coupling charge compensation device for VLSI circuits |
| US5920221A (en) * | 1997-07-14 | 1999-07-06 | Vanguard International Semiconductor Corporation | RC delay circuit for integrated circuits |
-
1998
- 1998-09-30 US US09/163,789 patent/US6087896A/en not_active Expired - Lifetime
-
1999
- 1999-08-26 WO PCT/US1999/019472 patent/WO2000019434A1/en active Application Filing
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4937476A (en) * | 1988-06-16 | 1990-06-26 | Intel Corporation | Self-biased, high-gain differential amplifier with feedback |
| US5360989A (en) * | 1990-06-18 | 1994-11-01 | Kabushiki Kaisha Toshiba | MIS type capacitor having reduced change in capacitance when biased in forward and reverse directions |
| EP0720238A2 (en) * | 1994-12-31 | 1996-07-03 | Robert Bosch Gmbh | Circuit arrangement for reducing the voltage dependence of a MOS-capacitor |
| US5801412A (en) * | 1995-09-04 | 1998-09-01 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device having a capacitance element with excellent area efficiency |
| US5801411A (en) * | 1996-01-11 | 1998-09-01 | Dallas Semiconductor Corp. | Integrated capacitor with reduced voltage/temperature drift |
| US5900766A (en) * | 1997-07-11 | 1999-05-04 | Hewlett-Packard Company | Coupling charge compensation device for VLSI circuits |
| US5920221A (en) * | 1997-07-14 | 1999-07-06 | Vanguard International Semiconductor Corporation | RC delay circuit for integrated circuits |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6838957B2 (en) * | 2000-12-21 | 2005-01-04 | Intel Corporation | Differential metal oxide semiconductor capacitor |
| US20030231072A1 (en) * | 2002-05-30 | 2003-12-18 | International Business Machines Corporation | Voltage controlled oscillator circuit and method |
| US6859112B2 (en) | 2002-05-30 | 2005-02-22 | International Business Machines Corporation | CMOS voltage controlled oscillator circuit for operation with low supply voltage and method for same |
| US20060022745A1 (en) * | 2004-07-27 | 2006-02-02 | Kabushiki Kaisha Toshiba | Semiconductor integrated circuit device |
| US7724005B1 (en) * | 2007-07-24 | 2010-05-25 | Clemson University | High-frequency structures for nanoelectronics and molecular electronics |
| US20110037519A1 (en) * | 2009-08-14 | 2011-02-17 | Qualcomm Incorporated | Amplifier with variable matching circuit to improve linearity |
| US8779857B2 (en) | 2009-08-14 | 2014-07-15 | Qualcomm Incorporated | Amplifier with variable matching circuit to improve linearity |
| US20140003162A1 (en) * | 2012-06-27 | 2014-01-02 | Samsung Electronics Co., Ltd. | Small signal receiver and integrated circuit including the same |
| US9209764B2 (en) * | 2012-06-27 | 2015-12-08 | Samsung Electronics Co., Ltd. | Small signal receiver and integrated circuit including the same |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2000019434A1 (en) | 2000-04-06 |
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